X-ray fluorescence analyzer

Abstract

The utility model provides an X-ray fluorescence analyzer which comprises a first cavity, a second cavity, a third cavity and a fourth cavity, the first cavity comprises a plurality of carrying tables, and the carrying tables are used for placing wafers; a second cavity including an X-ray detector; the moving device is used for transferring the wafer into the second cavity, so that the X-ray detector detects the film thickness of the thin film at the calibration position of the wafer; and the vacuum pump is used for extracting gas in the first cavity and the second cavity, so that the pressure of the gas in the first cavity and the second cavity reaches preset pressure. According to the utility model, the number of the carrying tables is increased in the first cavity, when films at the calibration positions of wafers with the same number as the carrying tables are detected, all the wafers can be transferred to the first cavity at the same time, so that the first cavity is vacuumized and broken, the times of vacuumizing and breaking during detection are reduced, the detection time is further reduced, and the detection efficiency is improved. The detection efficiency of the analyzer is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of X-ray, in particular to an X-ray fluorescence analyzer. Background Art

[0002] XRF detection technology has a wide range of applications in the semiconductor technology field. XRF detection equipment usually includes an X-ray light source and a detector. The light source can emit X-rays in a specific wavelength band by exciting target materials of different elements with different energies. These rays are converged and focused on the calibration area of the sample to excite secondary X-ray fluorescence of the film layer at the calibration area. The detector analyzes the energy spectrum and intensity of these fluorescences to obtain the thickness of the film layer. Existing XRF detection equipment only supports single-channel detection, and only one wafer is allowed to enter the detection equipment at a time, resulting in low detection efficiency. Summary of the Utility Model

[0003] Aiming at the problems in the prior art, the purpose of the utility model is to provide an X-ray fluorescence analyzer, which reduces the detection time of each wafer and improves the detection efficiency of the X-ray fluorescence analyzer.

[0004] An embodiment of the utility model provides an X-ray fluorescence analyzer, including:

[0005] A first cavity, including a plurality of carriers for placing wafers;

[0006] A second cavity, including an X-ray detector;

[0007] A moving device for transferring the wafer into the second cavity so that the X-ray detector can detect the film thickness of the film at the calibration position of the wafer;

[0008] A vacuum pump for pumping the gas in the first cavity and the second cavity so that the gas pressure in the first cavity and the second cavity reaches a preset pressure.

[0009] In some embodiments, the plurality of carriers are located on the same plane.

[0010] In some embodiments, the moving device includes a plurality of sliders, each slider is correspondingly connected to a carrier, and the slider drives the carrier to move from the first cavity to the second cavity.

[0011] In some embodiments, the moving device is a first robotic arm.

[0012] In some embodiments, the second cavity includes a detection platform, and the first robotic arm is used to transfer the wafer from the carrier to the detection platform.

[0013] In some embodiments, it further includes a movable plate disposed between the first cavity and the second cavity for isolating or communicating the first cavity and the second cavity.

[0014] In some embodiments, it further includes a second robotic arm for transferring the wafer to the stage.

[0015] In some embodiments, it further includes a calibration platform. The wafer is transferred from the wafer cassette to the calibration platform by the second robotic arm to calibrate the position and angle of the wafer.

[0016] In some embodiments, the vacuum pump includes a first vacuum pump and a second vacuum pump. The first vacuum pump is used to detect and extract the gas in the first cavity to make the gas pressure in the first cavity reach a preset pressure; the second vacuum pump is used to detect and extract the gas in the second cavity to make the gas pressure in the second cavity reach a preset pressure.

[0017] In some embodiments, the X-ray detector includes an X-ray light source and a detector. The X-ray light source is used to irradiate X-ray light to the calibration position on the surface of the wafer, and the detector is used to receive the X-ray fluorescence spectrum generated by the wafer to be detected and send it to the processor for analysis by the processor.

[0018] The X-ray fluorescence analyzer provided by the present invention has the following advantages:

[0019] By increasing the number of stages in the first cavity, when detecting the film thickness of the calibration positions of the same number of wafers as the stages, after all the wafers are transferred to the first cavity, the first cavity is evacuated, and after all the wafers are tested and transferred to the first cavity, the first cavity is broken vacuum. Compared with the prior art, the number of evacuations and vacuum breaks during detection is reduced, thereby reducing the detection time and improving the detection efficiency of the analyzer. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Other features, objects, and advantages of the present invention will become more apparent by reading the detailed description of the non-limiting embodiments with reference to the following drawings.

[0021] Figure 1 is a top view schematic diagram of an X-ray fluorescence analyzer according to an embodiment of the present invention;

[0022] Figure 2 is a side view schematic diagram of an X-ray fluorescence analyzer according to an embodiment of the present invention;

[0023] Figure 3 is a schematic diagram of transferring the 1# wafer and the 2# wafer into the first cavity;

[0024] Figure 4 It is a schematic diagram of transferring the 1# wafer to the second cavity;

[0025] Figure 5 It is a schematic diagram of transferring the 2# wafer to the second cavity;

[0026] Figure 6 It is a schematic diagram of transferring the 3# wafer to the first cavity.

[0027] Reference numerals:

[0028] 1 First cavity

[0029] 2 Second cavity

[0030] 3 Slide block

[0031] 4 Vacuum pump

[0032] 5 Carrier stage

[0033] 6 X-ray detector

[0034] 61 X-ray light source

[0035] 62 Detector

[0036] 7 Movable plate

[0037] 8 Second robotic arm

[0038] 9 Calibration platform

[0039] 10 Wafer cassette

[0040] 11 Processor Detailed implementation manners

[0041] Example embodiments will now be described more fully with reference to the accompanying drawings. However, the example embodiments can be implemented in various forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this application will be thorough and complete, and will fully convey the concept of the example embodiments to those skilled in the art. Like reference numerals in the figures denote like or similar structures, and thus their repeated description will be omitted. "Or" or "or" in the specification may mean "and" or "or".

[0042] In the description of the present application, the reference to expressions such as "one embodiment", "some embodiments", "example", "specific example", or "some examples" means that the specific features, structures, materials, or characteristics represented in connection with the embodiment or example are included in at least one embodiment or example of the present application. Moreover, the specific features, structures, materials, or characteristics represented can be combined in a suitable manner in any one or more embodiments or examples. In addition, without contradiction, those skilled in the art can combine and combine the different embodiments or examples represented in the present application and the features of different embodiments or examples.

[0043] In addition, the terms "first" and "second" are used only for the purpose of indication and cannot be construed as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first" and "second" may explicitly or implicitly include at least one of such features. In the description of the present application, "a plurality of" means two or more unless otherwise specifically defined.

[0044] To solve the problems in the prior art, the present utility model provides an X-ray fluorescence analyzer. The X-ray fluorescence analyzer includes: a first cavity including a plurality of carriers for placing wafers; a second cavity including an X-ray detector; a moving device for transferring the wafer into the second cavity so that the X-ray detector detects the film thickness of the film at the calibration position of the wafer; and a vacuum pump for pumping the gas in the first cavity and the second cavity so that the gas pressures in the first cavity and the second cavity reach a preset pressure. By increasing the number of carriers in the first cavity, when detecting the film thickness at the calibration positions of the same number of wafers as the carriers, after all the wafers are transferred into the first cavity, the first cavity is evacuated, and after all the wafers are tested and transferred into the first cavity, the first cavity is broken vacuum. Compared with the prior art, the number of evacuating and breaking vacuum during detection is reduced, thereby reducing the detection time and improving the detection efficiency of the analyzer.

[0045] The following further elaborates on the structure of the X-ray fluorescence analyzer of the present utility model in conjunction with the drawings and specific embodiments. It can be understood that each specific embodiment does not limit the protection scope of the present utility model.

[0046] Figure 1 The top view schematic diagram of the X-ray fluorescence analyzer provided by an embodiment of the present utility model is shown; Figure 2 The side view schematic diagram of the X-ray fluorescence analyzer provided by an embodiment of the present utility model is shown. As Figure 1 and Figure 2As shown in the figure, an X-ray fluorescence analyzer of the present utility model includes a first cavity 1, a second cavity 2, a moving device, and a vacuum pump 4.

[0047] Among them, the first cavity 1 includes a plurality of carriers 5 for placing wafers; the second cavity 2 includes an X-ray detector 6. The moving device is used to transfer the wafer into the second cavity 2 so that the X-ray detector 6 can detect the film thickness of the film at the calibration position of the wafer. The vacuum pump 4 is used to extract the gas in the first cavity 1 and the second cavity 2 so that the gas pressure in the first cavity 1 and the second cavity 2 reaches a preset pressure.

[0048] It should be noted that when the wafer enters the second cavity 2, the vacuum degree of the second cavity 2 must reach a preset value. To save the detection time, the vacuum pump 4 needs to continuously evacuate the second cavity 2; the first cavity 1 is evacuated when the wafer needs to enter the second cavity 2, and the first cavity 1 is broken vacuum when the wafer needs to be sent out of the first cavity 1.

[0049] When detecting the thickness of the film at the calibration position of the wafer, first transfer the wafer to the corresponding carrier 5 in sequence, and then the vacuum pump 4 evacuates the first cavity 1. When the vacuum degree of the first cavity 1 reaches the preset value, the moving device transfers the wafer into the second cavity 2 for film thickness testing.

[0050] The number of carriers 5 in this embodiment is 2. Therefore, 2 wafers can be sent into the first cavity 1 at the same time. As Figure 3 shown, wafer No. 1 and wafer No. 2 are placed in the first cavity 1, and then the first cavity 1 is evacuated; as Figure 4 shown, when the vacuum degree of the first cavity 1 reaches the preset value, first send wafer No. 1 into the second cavity 2 for film thickness detection; as Figure 5 shown, send wafer No. 1 back to the first cavity 1, and send wafer No. 2 into the second cavity for thickness detection; as Figure 6 shown, after the detection of wafer No. 1 and wafer No. 2 is completed, the first cavity 1 is broken vacuum, wafer No. 1 is taken out, wafer No. 3 is put into the first cavity 1, then wafer No. 2 is taken out, and wafer No. 4 is put in, and then the above-mentioned evacuation and detection steps are repeated to complete the film thickness detection of the calibration positions of multiple wafers.

[0051] Due to the setting of multiple carriers 5 in the first cavity 1, when detecting the film thickness at the calibration positions of the same number of wafers as the carriers 5, after all the wafers are transferred to the first cavity 1, the first cavity 1 is evacuated, and after all the wafers are tested and transferred to the first cavity 1, the first cavity 1 is broken vacuum, and then the wafers are taken out. Compared with the prior art, the number of evacuations and vacuum breaks during detection is reduced, thereby reducing the detection time and improving the detection efficiency of the analyzer.

[0052] As Figure 1 shown, multiple carriers 5 of the embodiments of the present utility model are located on the same plane. Exemplarily, there are 2 carriers 5 in this embodiment, and the 2 carriers 5 are arranged horizontally in parallel, and a wafer #1 and a wafer #2 are respectively placed on the carriers 5.

[0053] However, the number and the setting position of the carriers 5 are not limited to the number and the position shown in this application, and the number of the carriers 5 and the positions for setting multiple carriers 5 can also be increased according to actual requirements, and no limitation is made here.

[0054] Further, the moving device includes multiple sliders 3, and each slider 3 is correspondingly connected to a carrier 5, and the slider 3 drives the carrier 5 to move from the first cavity to the second cavity 20. In some embodiments, the specific movement of the slider 3 can be driven by a driving module such as a motor or a cylinder, and no limitation is made here. In some other embodiments, the moving device is a first robotic arm, and the wafer is transferred from the first cavity 1 to the second cavity 2 by the first robotic arm. The robotic arm is flexible in movement and has high efficiency in transferring wafers.

[0055] As Figure 1 shown, the second cavity 2 includes an X-ray detector 6. When the moving device transfers the wafer into the second cavity 2, the X-ray detector 6 is used to detect the film thickness of the calibration position film of the wafer. Specifically, as Figure 2 shown, the X-ray detector 6 includes an X-ray light source 61 and a detector 62. The X-ray light source 61 is used to irradiate X-ray light to the calibration position on the surface of the wafer, and the detector 62 is used to receive the X-ray fluorescence spectrum generated by the wafer to be detected and send it to the processor 11 for the processor 11 to analyze. The processor 11 obtains the thickness of the film according to the proportional relationship between the light intensity of the X-ray fluorescence spectrum and the thickness of the film element.

[0056] In still another embodiment, the second cavity 20 includes a detection platform (not shown in the figure), and the first robotic arm is used to transfer the wafer from the carrier 50 to the detection platform, and the detection platform provides good support for the wafer.

[0057] Please continue to refer to Figure 2, the channel structure of the X-ray analyzer further includes a movable plate 7 disposed between the first cavity 1 and the second cavity 2 for isolating or communicating the first cavity 1 and the second cavity 2. When the wafer is transferred from the calibration platform 9 to the stage 5, the movable plate 7 isolates the first cavity 1 and the second cavity 2. The first cavity 1 is in an atmospheric state, while the second cavity 2 is in a vacuum state; when the wafer enters the second cavity 2 from the first cavity 1, or when the wafer enters the first cavity 1 from the second cavity 2, the movable plate 7 communicates the first cavity 1 and the second cavity 2. The second cavity 2 always maintains a high vacuum state during the detection process to improve the accuracy of the detection results and save the vacuum pumping time. In some embodiments, the movable plate 7 is rotatably connected to the top or bottom end of the first cavity 1 or the second cavity 2 to isolate or communicate the first cavity 1 and the second cavity 2 accordingly.

[0058] In this embodiment, the first cavity 1 and the second cavity 2 share the same vacuum pump 4 for vacuum pumping. In another embodiment, the vacuum pump 4 can also be provided to include a first vacuum pump and a second vacuum pump. The first vacuum pump is used for detection to extract the gas in the first cavity 1 so that the gas pressure in the first cavity 1 reaches a preset pressure; the second vacuum pump is used for detection to extract the gas in the second cavity 2 so that the gas pressure in the second cavity 2 reaches a preset pressure. When the gas in the vacuum pumping cavities of the first cavity 1 and the second cavity 2 is pumped, they exist independently and do not interfere with each other.

[0059] As Figure 1 shown, the X-ray analyzer further includes a second robotic arm 8 for transferring the wafer 6 to the stage 5 to achieve automatic wafer transfer and improve the wafer transfer efficiency.

[0060] Furthermore, the X-ray analyzer further includes a calibration platform 9. The wafer is transferred from the wafer cassette 10 to the calibration platform 9 by the second robotic arm 8 to calibrate the position and angle of the wafer. When using the X-ray analyzer to test the thickness of the relevant thin film on the wafer, the position of the wafer needs to be adjusted so that when the wafer enters the second cavity, the X-ray detector can detect the thickness of the thin film at the calibration position.

[0061] In summary, the X-ray fluorescence analyzer provided by the present utility model has the following advantages:

[0062] By increasing the number of stages in the first cavity, when detecting the thickness of the thin films at the calibration positions of the same number of wafers as the stages, after all the wafers are transferred to the first cavity, the first cavity is evacuated, and after all the wafers are tested and transferred to the first cavity, the first cavity is broken vacuumed. Compared with the prior art, the number of evacuations and vacuum breaks during detection is reduced, thereby reducing the detection time and improving the detection efficiency of the analyzer.

[0063] The above content is a further detailed description of the present utility model in combination with specific preferred embodiments. It cannot be determined that the specific implementation of the present utility model is only limited to these descriptions. For those of ordinary skill in the technical field to which the present utility model belongs, without departing from the concept of the present utility model, several simple deductions or substitutions can still be made, and all should be regarded as belonging to the protection scope of the present utility model.

Claims

1. An X-ray fluorescence analyzer, characterized in that: include: The first cavity includes a plurality of carriers, and the carriers are used to place wafers; A second cavity including an X-ray detector; A moving device, used for transferring the wafer into the second chamber, so that the X-ray detector detects the film thickness of the film at the calibration position of the wafer; The vacuum pump is used to extract the gas in the first cavity and the second cavity so that the gas pressure in the first cavity and the second cavity reaches a preset pressure.

2. The X-ray fluorescence analyzer according to claim 1, characterized in that: The multiple carriers are located on the same plane.

3. The X-ray fluorescence analyzer according to claim 1, characterized in that: The moving device includes a plurality of sliders, each of which is connected to a corresponding carrier, and the slider drives the carrier to move from the first cavity to the second cavity.

4. The X-ray fluorescence analyzer according to claim 1, characterized in that: The moving device is a first mechanical arm.

5. The X-ray fluorescence analyzer according to claim 4, characterized in that: The second chamber includes a detection platform, and the first robot arm is used to transfer the wafer from the carrier to the detection platform.

6. The X-ray fluorescence analyzer according to claim 1, characterized in that: It also includes a movable plate, which is placed between the first cavity and the second cavity and is used to isolate or connect the first cavity and the second cavity.

7. The X-ray fluorescence analyzer according to claim 1, characterized in that: It also includes a second robot arm for transferring the wafer to the carrier.

8. The X-ray fluorescence analyzer according to claim 7, characterized in that: It also includes a calibration platform, and the wafer is transferred from the wafer box to the calibration platform by the second robot arm to calibrate the position and angle of the wafer.

9. The X-ray fluorescence analyzer according to claim 1, characterized in that: The vacuum pump includes a first vacuum pump and a second vacuum pump. The first vacuum pump is used to detect and extract gas in the first cavity so that the gas pressure in the first cavity reaches a preset pressure; the second vacuum pump is used to detect and extract gas in the second cavity so that the gas pressure in the second cavity reaches a preset pressure.

10. The X-ray fluorescence analyzer according to claim 1, characterized in that: The X-ray detector includes an X-ray light source and a detector. The X-ray light source is used to irradiate X-ray light to the calibrated position on the surface of the wafer, and the detector is used to receive the X-ray fluorescence spectrum generated by the inspected wafer and send it to the processor for analysis by the processor.

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