Fixed-row improved photovoltaic silicon wafer cleaning machine tank body

Abstract

The utility model discloses a fixed-row improved photovoltaic silicon wafer cleaning machine tank body, which relates to the technical field of photovoltaic silicon wafer cleaning machines and comprises a tank body and a tank cover arranged at the top of the tank body, a plurality of circulating pipes and bubbling pipes are arranged at the lower end in the tank body, a deposition pipe is communicated with the bottom of the tank body, and a transverse plate is fixedly arranged at the lower end of the inner wall of the deposition pipe. A hollow pipe is rotatably arranged in the transverse plate in a penetrating mode, the upper end of the side wall of the hollow pipe is communicated with a liquid discharging pipe, the outer wall of the liquid discharging pipe is communicated with a plurality of nozzles arranged at intervals, a liquid guiding barrel is fixedly arranged at the lower end of the inner wall of the deposition pipe in a penetrating mode, the side wall of the liquid guiding barrel is communicated with a fixing pipe, and the upper end of the fixing pipe penetrates into the deposition pipe and is rotatably arranged in the hollow pipe; the pipe wall of the fixing pipe is fixedly sleeved with a pump body. The reaction by-product silicate in the tank is effectively deposited at the bottom of the tank body, and the concentration of the silicate in the liquid medicine in the tank is reduced, so that the service life of the liquid medicine is prolonged, the liquid changing frequency is reduced, and meanwhile, the effective output in the in-place time is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of photovoltaic silicon wafer cleaning machines, in particular to a photovoltaic silicon wafer cleaning machine tank body with improved fixed arrangement. Background Art

[0002] Photovoltaic silicon wafer cleaning machine is a device specially used to clean the surface of photovoltaic silicon wafers. Its main function is to remove various pollutants generated by silicon wafers during processing to ensure the cleanliness of silicon wafers, thereby improving the quality and performance of photovoltaic products.

[0003] During the preparation of solar photovoltaic cells, as the reaction time goes by during the cleaning process of the silicon wafer surface, the by-product silicate generated inside the tank body settles due to gravity and gathers at the bottom of the tank body. As the concentration gradually increases, the viscosity of the solution increases, the surface tension increases, and the reaction rate of the silicon wafer in the solution is reduced, resulting in a shortened life of the tank solution. Currently, a certain inclination angle is set on the plane at the bottom of the tank body so that the silicate is deposited to one side, and a pneumatic drain valve is connected externally to the bottom of the deposition position to discharge the silicate. However, the silicate at the bottom of the tank of the existing cleaning machine cannot be discharged quickly and in large quantities after deposition, resulting in the need for multiple liquid changes. Utility Model Content

[0004] In view of the problems existing in the above-mentioned existing photovoltaic silicon wafer cleaning machine tank body with fixed arrangement improvement, the present utility model is proposed.

[0005] Therefore, the purpose of the utility model is to provide an improved photovoltaic silicon wafer cleaning machine tank body, which solves the problem that silicates inside the existing cleaning machine tank body cannot form effective sedimentation at the bottom and the discharge efficiency is reduced under the same conditions.

[0006] In order to achieve the above purpose, the utility model provides the following technical solutions:

[0007] A fixed-row improved photovoltaic silicon wafer cleaning machine tank body, comprising a tank body and a tank cover arranged on the top of the tank body, wherein the lower end of the tank body is provided with a plurality of circulation pipes and bubbling pipes, the bottom of the tank body is connected with a deposition pipe, a horizontal plate is fixedly provided at the lower end of the inner wall of the deposition pipe, a hollow pipe is rotatably penetrated inside the horizontal plate, a liquid discharge pipe is connected with the upper end of the side wall of the hollow pipe, and a plurality of nozzles arranged at intervals are connected with the outer wall of the liquid discharge pipe;

[0008] A liquid guide barrel is fixedly inserted into the lower end of the inner wall of the deposition tube, a fixed tube is connected to the side wall of the liquid guide barrel, the upper end of the fixed tube passes through the deposition tube and is rotatably arranged in the hollow tube, and a pump body is fixedly sleeved on the tube wall of the fixed tube.

[0009] Preferably, the deposition tube is arranged in a funnel shape.

[0010] Preferably, a motor is fixedly provided at the lower end of the outer wall of the deposition tube. The output shaft of the motor penetrates into the deposition tube and is fixedly provided with a first bevel gear. A second bevel gear is fixedly sleeved at the lower end of the outer wall of the hollow tube. The first bevel gear and the second bevel gear are arranged in cooperation.

[0011] Preferably, a plurality of the spray heads are all arranged obliquely downward.

[0012] Furthermore, a scraper is fixedly provided on the pipe wall of the drain pipe. The scraper is in contact and cooperation with the upper side of the inner wall of the deposition tube.

[0013] Preferably, a liquid receiving plate is fixedly provided at the lower end of the inner wall of the liquid guiding barrel. The upper end of the liquid receiving plate is located at the lower end inside the deposition tube.

[0014] Preferably, mounting plates are fixedly provided at both ends of the upper side of the outer wall of the deposition tube. The mounting plates and the bottom of the tank body are fixedly arranged by screwing through connecting bolts.

[0015] Preferably, a guiding cover is sleeved on the outer wall of the hollow tube. The guiding cover is fixedly connected to the top of the cross plate. A through hole for the hollow tube to rotate is provided at the top of the guiding cover.

[0016] Preferably, the cross section of the scraper is arranged in an inverted triangle.

[0017] Preferably, a rubber sleeve is sleeved on the outer side of the end of the spray head. A filter screen is fixedly embedded at the end of the rubber sleeve.

[0018] In the above technical solution, the technical effects and advantages provided by the present utility model are as follows:

[0019] 1. In the present utility model, through the provided tank body and deposition tube, and by adopting the funnel-shaped deposition tube, it aims to enable the reaction by-product silicate in the tank to be effectively deposited at the bottom of the tank body, reduce the silicate concentration in the liquid medicine in the tank, thereby prolong the service life of the liquid medicine, reduce the frequency of liquid replacement, and at the same time improve the effective output within the in-situ time.

[0020] 2. In the present utility model, through the provided deposition tube, cross plate, hollow tube, drain pipe, spray head, scraper, liquid guiding barrel, fixed tube and pump body, while the silicate in the tank body is deposited and discharged, by spraying water and scraping on the inner wall of the deposition tube, the discharging effect of the deposited silicate can be improved. Description of the Drawings

[0021] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings required to be used in the embodiments. Obviously, the drawings described below are only some embodiments recorded in the present utility model. For those of ordinary skill in the art, other drawings can also be obtained based on these drawings.

[0022] Figure 1 is a schematic structural diagram of the present utility model;

[0023] Figure 2 of the present utility model Figure 1 is an enlarged schematic view of part A;

[0024] Figure 3 of the present utility model Figure 1 is an enlarged schematic view of part B;

[0025] Figure 4 is a three-dimensional structural schematic diagram of the scraper of the present utility model;

[0026] Figure 5 is a three-dimensional structural schematic diagram of the guide cover of the present utility model.

[0027] Explanation of reference numerals:

[0028] 1, trough body; 2, trough cover; 3, circulation pipe; 4, bubbling pipe; 5, sedimentation pipe; 6, cross plate; 7, hollow pipe; 8, drain pipe; 9, spray head; 10, liquid guide barrel; 11, fixed pipe; 12, pump body; 13, motor; 14, first bevel gear; 15, second bevel gear; 16, scraper; 17, liquid receiving plate; 18, mounting plate; 19, connecting bolt; 20, guide cover; 21, rubber sleeve; 22, filter screen. Detailed implementation manners

[0029] In order to enable those skilled in the art to better understand the technical solution of the present utility model, the present utility model will be further introduced in detail below with reference to the accompanying drawings.

[0030] The embodiment of the present utility model discloses a trough body of a fixed-drainage improved photovoltaic silicon wafer cleaning machine.

[0031] Embodiment 1

[0032] The present utility model provides a trough body of a fixed-drainage improved photovoltaic silicon wafer cleaning machine as Figures 1-5 shown, which includes a trough body 1 and a trough cover 2 provided on the top of the trough body 1. A plurality of circulation pipes 3 and bubbling pipes 4 are provided at the lower end inside the trough body 1. A sedimentation pipe 5 is communicated with the bottom of the trough body 1. The sedimentation pipe 5 is arranged in a funnel shape. Both ends of the upper side of the outer wall of the sedimentation pipe 5 are fixedly provided with mounting plates 18. The mounting plates 18 and the bottom of the trough body 1 are fixedly connected by screwing with connecting bolts 19.

[0033] When used in the tank body 1 of the cleaning machine, the silicate flowing out of the inside of the tank body 1 can be deposited through the sedimentation pipe 5 at the bottom of the tank body 1. Since the sedimentation pipe 5 is funnel-shaped, the silicate accumulates on the upper side of the inner wall of the sedimentation pipe 5. Compared with the inner part of the tank body that is horizontally inclined, the funnel-shaped structure enables the reaction by-product silicate in the tank to be effectively deposited at the bottom of the tank body, reducing the concentration of silicate in the liquid medicine in the tank, thereby prolonging the life of the liquid medicine and reducing the frequency of liquid replacement. The sedimentation pipe 5 is connected to the tank body 1 through the connecting bolt 19, which facilitates the convenient replacement of the sedimentation pipe 5.

[0034] Example 2

[0035] On the basis of Example 1, in order to improve the discharge effect when discharging the deposited silicate in Example 2, as Figure 1 and Figures 3-5 shown, a cross plate 6 is fixedly arranged at the lower end of the inner wall of the sedimentation pipe 5. A hollow pipe 7 is rotatably penetrated through the inside of the cross plate 6. A liquid discharge pipe 8 is communicated with the upper end of the side wall of the hollow pipe 7. A scraping plate 16 is fixedly arranged on the pipe wall of the liquid discharge pipe 8. The cross section of the scraping plate 16 is in an inverted triangle shape. The scraping plate 16 is in contact and fit with the upper side of the inner wall of the sedimentation pipe 5. A plurality of spray heads 9 arranged at intervals are communicated with the outer wall of the liquid discharge pipe 8. A plurality of spray heads 9 are all arranged obliquely downward. A liquid guide bucket 10 is fixedly penetrated through the lower end of the inner wall of the sedimentation pipe 5. A fixed pipe 11 is communicated with the side wall of the liquid guide bucket 10. The upper end of the fixed pipe 11 penetrates into the sedimentation pipe 5 and is rotatably arranged inside the hollow pipe 7. A pump body 12 is fixedly sleeved on the pipe wall of the fixed pipe 11. A liquid receiving plate 17 is fixedly arranged at the lower end of the inner wall of the liquid guide bucket 10. The upper end of the liquid receiving plate 17 is located at the lower end inside the sedimentation pipe 5. A rubber sleeve 21 is sleeved outside the end of the spray head 9. A filter screen 22 is fixedly embedded at the end of the rubber sleeve 21.

[0036] When the silicate inside the sedimentation pipe 5 needs to be discharged, first, when changing the liquid inside the tank body 1, the solution can drive most of the silicate to be discharged through the lower end of the sedimentation pipe 5. When the solution falls, the liquid receiving plate 17 can receive part of the solution and guide it into the liquid guide bucket 10. At this time, the pump body 12 is started, and the solution inside the liquid guide bucket 10 can be discharged into the hollow pipe 7 through the fixed pipe 11. At this time, under the arrangement of the liquid discharge pipe 8 and the spray head 8, the solution has a large impact force when flowing out, and can fully flush out the silicate on the upper side of the inner wall of the sedimentation pipe 5. At the same time, the hollow pipe 7 rotates, so that the scraping plate 16 rotates along the inner wall of the sedimentation pipe 5, and further discharges the silicate adhering to the inner wall of the sedimentation pipe 5.

[0037] Example 3

[0038] On the basis of Example 2, in order to enable the hollow pipe 7 to rotate stably, as Figures 1-2As shown, a motor 13 is fixedly provided at the lower end of the outer wall of the deposition tube 5. The output shaft of the motor 13 penetrates into the deposition tube 5 and is fixedly provided with a first bevel gear 14. A second bevel gear 15 is fixedly sleeved at the lower end of the outer wall of the hollow tube 7. The first bevel gear 14 and the second bevel gear 15 are arranged in cooperation. A guide cover 20 is sleeved on the outer wall of the hollow tube 7. The guide cover 20 is fixedly connected to the top of the cross plate 6. A through hole for the rotation of the hollow tube 7 is provided at the top of the guide cover 20.

[0039] When the solution is sprayed out through the nozzle 9, the motor 13 is started, so that the motor 13 drives the first bevel gear 14 to rotate. At this time, through the cooperation of the first bevel gear 14 and the second bevel gear 15, the hollow tube 7 can be rotated, so that the silicate deposited on the upper side of the inner wall of the deposition tube 5 can be fully discharged. At the same time, with the arrangement of the guide cover 20, it can prevent the silicate from covering the outside of the first bevel gear 14 and the second bevel gear 15 during the falling process, so that the driving work can be carried out stably.

[0040] Only some exemplary embodiments of the present invention are described by way of illustration above. Undoubtedly, for those of ordinary skill in the art, the described embodiments can be modified in various different ways without departing from the spirit and scope of the present invention. Therefore, the above drawings and descriptions are illustrative in nature and should not be construed as limiting the protection scope of the claims of the present invention.

Claims

1. A fixed-row improved photovoltaic silicon wafer cleaning machine tank body, comprising a tank body (1) and a tank cover (2) arranged on the top of the tank body (1), characterized in that: A plurality of circulation pipes (3) and bubbling pipes (4) are provided at the lower end of the interior of the tank body (1); a deposition pipe (5) is provided at the bottom of the tank body (1); a horizontal plate (6) is fixedly provided at the lower end of the inner wall of the deposition pipe (5); a hollow pipe (7) is rotatably penetrated inside the horizontal plate (6); a liquid discharge pipe (8) is provided at the upper end of the side wall of the hollow pipe (7); and a plurality of nozzles (9) arranged at intervals are provided at the outer wall of the liquid discharge pipe (8); A liquid guide barrel (10) is fixedly inserted into the lower end of the inner wall of the deposition tube (5), and a fixed pipe (11) is connected to the side wall of the liquid guide barrel (10). The upper end of the fixed pipe (11) passes through the deposition tube (5) and is rotatably arranged in the hollow tube (7). A pump body (12) is fixedly sleeved on the tube wall of the fixed pipe (11).

2. The photovoltaic silicon wafer cleaning machine tank body according to claim 1 is characterized in that: The deposition tube (5) is arranged in a funnel shape.

3. The photovoltaic silicon wafer cleaning machine tank body according to claim 1 is characterized in that: A motor (13) is fixedly provided at the lower end of the outer wall of the deposition tube (5); the output shaft of the motor (13) passes through the deposition tube (5) and is fixedly provided with a first bevel gear (14); a second bevel gear (15) is fixedly provided at the lower end of the outer wall of the hollow tube (7); the first bevel gear (14) and the second bevel gear (15) are arranged in coordination.

4. The photovoltaic silicon wafer cleaning machine tank body according to claim 1 is characterized in that: The plurality of nozzles (9) are all arranged to be inclined downward.

5. The photovoltaic silicon wafer cleaning machine tank body according to claim 1 is characterized in that: A scraper (16) is fixedly provided on the tube wall of the liquid discharge tube (8), and the scraper (16) is in contact with the upper side of the inner wall of the deposition tube (5).

6. The photovoltaic silicon wafer cleaning machine tank body according to claim 1, characterized in that: A liquid receiving plate (17) is fixedly provided at the lower end of the inner wall of the liquid guiding barrel (10), and the upper end of the liquid receiving plate (17) is located at the lower end of the interior of the deposition tube (5).

7. The photovoltaic silicon wafer cleaning machine tank body according to claim 1, characterized in that: Mounting plates (18) are fixedly provided at both ends of the upper side of the outer wall of the deposition tube (5), and the mounting plates (18) are screwed and fixed to the bottom of the tank body (1) via connecting bolts (19).

8. The photovoltaic silicon wafer cleaning machine tank body according to claim 1, characterized in that: The outer wall of the hollow tube (7) is sleeved with a guide cover (20), the guide cover (20) is fixedly connected to the top of the transverse plate (6), and the top of the guide cover (20) is provided with a through hole for cooperating with the rotation of the hollow tube (7).

9. The photovoltaic silicon wafer cleaning machine tank body according to claim 5, characterized in that: The scraper (16) has a cross section in the shape of an inverted triangle.

10. The photovoltaic silicon wafer cleaning machine tank body according to claim 1, characterized in that: A rubber sleeve (21) is sleeved on the outer side of the end of the spray head (9), and a filter screen (22) is fixedly embedded on the end of the rubber sleeve (21).

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