Monocrystalline silicon wafer surface cleaning device
By designing a single crystal silicon wafer surface cleaning device including spraying components and automated transmission devices, the problem of low degree of cleaning pollution and cleaning automation is solved, and efficient single crystal silicon wafer cleaning and automated production is achieved.
Patent Information
- Application Number
- CN202421857389.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-01
- Publication Date
- 2025-06-20
- Estimated Expiration
- 2034-08-01
AI Technical Summary
In the existing single crystal silicon wafer surface cleaning device, the solution inside the cleaning tank is easily contaminated, resulting in the single crystal silicon wafer bringing contaminated solution into the next cleaning tank, affecting the cleaning effect and production quality.
A single crystal silicon wafer surface cleaning device is designed, including a base, a fixing frame, a spray assembly and a drain cage. Spray water into the drain cage through a water pump to clean the single crystal silicon wafer to prevent the contaminated solution from being transferred to the next cleaning tank. At the same time, through the setting of electric slides, electric sliders and electric telescopic rods, the automatic transmission and cleaning process of drain cages are realized.
Effectively remove the contaminated solution on the surface of the single crystal silicon wafer, avoiding the transfer of the contaminated solution to the next cleaning tank, improving the cleaning quality and production efficiency, and reducing the labor intensity of staff.
Smart Images
Figure CN222999278U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to a surface cleaning device for single crystal silicon wafers, belonging to the technical field of single crystal silicon wafers. Background Art
[0002] A single crystal silicon wafer is a crystal with a basically complete lattice structure. It has different properties in different directions and is a good semiconductor material, which is widely used in the manufacture of semiconductor devices, solar cells, etc. Single crystal silicon is a relatively active non-metallic element and an important part of crystal materials, being at the forefront of the development of new materials.
[0003] During the processing of single crystal silicon wafers, a surface cleaning device is required to remove the pollutants on its surface. The cleaning process of single crystal silicon wafers includes ultrasonic alkali cleaning and ultrasonic rinsing. In the prior art, the formed single crystal silicon wafers are usually soaked in a cleaning pool for cleaning. However, after multiple cleaning operations, the solution inside the cleaning pool will be contaminated, and the single crystal silicon wafers will carry the contaminated solution into the next cleaning pool, resulting in the sequential contamination of the cleaning pools.
[0004] Therefore, a surface cleaning device for single crystal silicon wafers is proposed. Summary of the Utility Model
[0005] In view of this, the utility model provides a surface cleaning device for single crystal silicon wafers to solve or alleviate the technical problems existing in the prior art and at least provide a beneficial option.
[0006] The technical solution of the utility model is realized as follows: A surface cleaning device for single crystal silicon wafers includes a base. A fixing frame is welded on the top of the base. A spraying assembly is arranged in the middle of the top of the fixing frame. The spraying assembly includes a water tank. The water tank is fixedly connected to the middle of the top of the fixing frame. A water pump is arranged on the right side of the bottom of the inner cavity of the water tank. The output end of the water pump is communicated with a water delivery pipe. One end of the water delivery pipe is communicated with a pipe connector. Both the front and rear sides of the pipe connector are communicated with spray pipes. A plurality of nozzles are communicated inside the spray pipes.
[0007] Further preferably, an electric sliding seat is fixedly connected inside the fixing frame. An electric sliding block is slidably connected to the surface of the electric sliding seat. An electric telescopic rod is fixedly connected to the bottom of the electric sliding block. A water draining net box is fixedly connected to the bottom of the electric telescopic rod.
[0008] Further preferably, an ultrasonic rinsing pool is arranged on the left side of the top of the base, and an ultrasonic alkali cleaning pool is arranged on the right side of the top of the base. Drain pipes are arranged on the front sides of the ultrasonic rinsing pool and the ultrasonic alkali cleaning pool, and a sealing cover is threadedly connected to the front side of the drain pipe.
[0009] Further preferably, a support bracket is provided inside the water spray pipe, and the bottom of the support bracket is fixedly connected to the top of the fixed frame.
[0010] Further preferably, a fixing sleeve is fixedly connected to one end of the water spray pipe away from the pipe connector. The bottom of the fixing sleeve is fixedly connected to a support rod, and the bottom of the support rod is fixedly connected to the top of the base.
[0011] Further preferably, a flow guide plate is provided on the left side of the bottom inside the water tank, and a water injection port is provided on the top of the water tank.
[0012] Due to the adoption of the above technical solutions in the embodiments of the present utility model, it has the following advantages:
[0013] First, the present utility model sucks the water in the water tank through the input end of the water pump, and sprays the water through the water delivery pipe, pipe connector, water spray pipe and nozzle, and sprays it into the water draining net box to clean the single crystal silicon wafers that have been soaked once in the water draining net box, so as to remove the contaminated solution on the surface and avoid the transfer of the contaminated solution to the next cleaning tank, improving the cleaning and production quality.
[0014] Second, through the settings of the electric slide, electric slider and electric telescopic rod, the present utility model can drive the water draining net box to clean it in the ultrasonic rinsing tank and ultrasonic alkaline cleaning tank in turn, improving the automation degree and reducing the labor intensity of the staff. By setting the flow guide plate, it can play a role in guiding the flow and avoid the accumulation of water at the bottom of the inner cavity of the water tank. By setting the support bracket, fixing sleeve and support rod, the water spray pipe can be limited and fixed to prevent it from tipping over and falling off.
[0015] The above summary is only for the purpose of the specification and is not intended to be limiting in any way. In addition to the above-described illustrative aspects, embodiments and features, further aspects, embodiments and features of the present utility model will be readily apparent by reference to the drawings and the following detailed description. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the following drawings are only some embodiments of the present application. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.
[0017] Figure 1 It is a three-dimensional structure schematic diagram of the first perspective of the present utility model;
[0018] Figure 2 It is a three-dimensional structure schematic diagram of the second perspective of the present utility model;
[0019] Figure 3 This is a schematic structural diagram of the spray assembly of the present utility model;
[0020] Figure 4 This is a schematic structural diagram of the water draining net box of the present utility model.
[0021] Reference numerals: 1, base; 2, drain pipe; 3, ultrasonic rinsing tank; 4, water draining net box; 5, fixing frame; 6, spray assembly; 601, water tank; 602, water injection port; 603, water delivery pipe; 604, pipe connector; 605, support bracket; 606, spray pipe; 607, spray head; 608, fixing sleeve; 609, support rod; 610, water pump; 611, guide plate; 7, ultrasonic caustic washing tank; 8, electric sliding seat; 9, electric slider; 10, electric telescopic rod. Detailed implementation manners
[0022] In the following, only some exemplary embodiments are simply described. As those skilled in the art can recognize, the described embodiments can be modified in various different ways without departing from the spirit or scope of the present utility model. Therefore, the drawings and the description are considered to be exemplary in nature rather than restrictive.
[0023] The embodiments of the present utility model will be described in detail below with reference to the drawings.
[0024] Embodiment 1
[0025] As Figures 1-4 shown, the embodiment of the present utility model provides a single crystal silicon wafer surface cleaning device, including a base 1, a fixing frame 5 is welded on the top of the base 1, a spray assembly 6 is arranged in the middle of the top of the fixing frame 5, the spray assembly 6 includes a water tank 601, the water tank 601 is fixedly connected to the middle of the top of the fixing frame 5, a water pump 610 is arranged on the right side of the bottom of the inner cavity of the water tank 601, the output end of the water pump 610 is communicated with a water delivery pipe 603, one end of the water delivery pipe 603 is communicated with a pipe connector 604, both the front and rear sides of the pipe connector 604 are communicated with a spray pipe 606, and a plurality of spray heads 607 are communicated with the inner side of the spray pipe 606.
[0026] The water in the water tank 601 is sucked through the input end of the water pump 610, and the water is sprayed out through the output end of the water pump 610, the water delivery pipe 603, the pipe connector 604, the spray pipe 606 and the spray heads 607, and is sprayed into the water draining net box 4 to clean the single crystal silicon wafers that have been soaked once in the water draining net box 4, so as to remove the contaminated solution on the surface and avoid the transfer of the contaminated solution to the next cleaning tank, improving the cleaning and production quality.
[0027] Embodiment 2
[0028] In one embodiment, an electric slide is fixedly connected to the inner side of the fixing frame 5. An electric slider 9 is slidably connected to the surface of the electric slide 8. An electric telescopic rod 10 is fixedly connected to the bottom of the electric slider 9. A water drainage net box 4 is fixedly connected to the bottom of the electric telescopic rod 10. An ultrasonic rinsing tank 3 is arranged on the left side of the top of the base 1. An ultrasonic alkaline cleaning tank 7 is arranged on the right side of the top of the base 1. Drain pipes 2 are arranged on the front sides of the ultrasonic rinsing tank 3 and the ultrasonic alkaline cleaning tank 7, and a sealing cover is threadedly connected to the front side of the drain pipe 2. A support bracket 605 is arranged inside the water spray pipe 606, and the bottom of the support bracket 605 is fixedly connected to the top of the fixing frame 5. One end of the water spray pipe 606 away from the pipe connector 604 is fixedly connected to a fixing sleeve 608. A support rod 609 is fixedly connected to the bottom of the fixing sleeve 608, and the bottom of the support rod 609 is fixedly connected to the top of the base 1. A diversion plate 611 is arranged at the bottom left of the inner cavity of the water tank 601. A water injection port 602 is arranged at the top of the water tank 601.
[0029] Through the settings of the electric slide 8, the electric slider 9 and the electric telescopic rod 10, the water drainage net box 4 can be driven to perform cleaning in the ultrasonic rinsing tank 3 and the ultrasonic alkaline cleaning tank 7 in sequence, which improves the degree of automation and reduces the labor intensity of the staff. By setting the diversion plate 611, it can play a role in diversion and prevent water from accumulating at the bottom of the inner cavity of the water tank 601. By setting the support bracket 605, the fixing sleeve 608 and the support rod 609, the water spray pipe 606 can be limited and fixed to prevent it from tipping over and falling off.
[0030] When the present utility model is working: First, place the single crystal silicon wafers to be cleaned into the water drainage net box 4. Subsequently, drive the water drainage net box 4 to move downward through the extension of the electric telescopic rod 10 and move it into the ultrasonic rinsing tank 3 to perform ultrasonic rinsing on the single crystal silicon wafers in the water drainage net box 4. After the rinsing is completed, contaminated solution will adhere to the surface of the single crystal silicon wafers. At this time, drive the water drainage net box 4 to move upward through the contraction of the electric telescopic rod 10, and drive the water drainage net box 4 to move to the right through the action of the electric slide 8 and the electric slider 9. When the water drainage net box 4 moves to the inside of the nozzle 607, suck the water in the water tank 601 through the input end of the water pump 610, and spray the water through the output end of the water pump 610 through the water delivery pipe 603, the pipe connector 604, the water spray pipe 606 and the nozzle 607, and spray it into the water drainage net box 4 to clean the single crystal silicon wafers in the water drainage net box 4 that have been soaked once to remove the contaminated solution on the surface and prevent the contaminated solution from being transferred to the next cleaning tank, improving the cleaning and production quality. After the cleaning is completed, drive the water drainage net box 4 to move to the right through the action of the electric slide 8 and the electric slider 9. When it moves above the ultrasonic alkaline cleaning tank 7, drive the water drainage net box 4 to move downward through the extension of the electric telescopic rod 10 and move it into the ultrasonic alkaline cleaning tank 7 to perform ultrasonic alkaline cleaning on the single crystal silicon wafers in the water drainage net box 4, and finally complete the cleaning work.
[0031] As described above, it is only the specific implementation manner of the present utility model, but the protection scope of the present utility model is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present utility model can easily think of various changes or substitutions thereof, and these should all be covered within the protection scope of the present utility model. Therefore, the protection scope of the present utility model shall be subject to the protection scope of the claimed rights.
Claims
1. A single crystal silicon wafer surface cleaning device, comprising a base (1), characterized in that: A fixing frame (5) is welded to the top of the base (1); a spray assembly (6) is arranged at the middle end of the top of the fixing frame (5); the spray assembly (6) comprises a water tank (601); the water tank (601) is fixedly connected to the middle end of the top of the fixing frame (5); a water pump (610) is arranged on the right side of the bottom of the inner cavity of the water tank (601); the output end of the water pump (610) is connected to a water pipe (603); one end of the water pipe (603) is connected to a pipe connector (604); the front and rear sides of the pipe connector (604) are both connected to a water spray pipe (606); the inner side of the water spray pipe (606) is connected to a plurality of spray heads (607).
2. The single crystal silicon wafer surface cleaning device according to claim 1, characterized in that: The inner side of the fixed frame (5) is fixedly connected to an electric slide seat (8), the surface of the electric slide seat (8) is slidably connected to an electric slider (9), the bottom of the electric slider (9) is fixedly connected to an electric telescopic rod (10), and the bottom of the electric telescopic rod (10) is fixedly connected to a drainage net box (4).
3. The single crystal silicon wafer surface cleaning device according to claim 1, characterized in that: An ultrasonic rinsing tank (3) is arranged on the left side of the top of the base (1), and an ultrasonic alkaline cleaning tank (7) is arranged on the right side of the top of the base (1). A drainage pipe (2) is arranged on the front side of each of the ultrasonic rinsing tank (3) and the ultrasonic alkaline cleaning tank (7), and a sealing cover is threadedly connected to the front side of the drainage pipe (2).
4. The single crystal silicon wafer surface cleaning device according to claim 1, characterized in that: A support bracket (605) is provided on the inner side of the water spray pipe (606), and the bottom of the support bracket (605) is fixedly connected to the top of the fixing frame (5).
5. The single crystal silicon wafer surface cleaning device according to claim 1, characterized in that: One end of the water spray pipe (606) away from the pipe connector (604) is fixedly connected to a fixing sleeve (608), the bottom of the fixing sleeve (608) is fixedly connected to a support rod (609), and the bottom of the support rod (609) is fixedly connected to the top of the base (1).
6. The single crystal silicon wafer surface cleaning device according to claim 1, characterized in that: A guide plate (611) is provided on the left side of the bottom of the inner cavity of the water tank (601), and a water injection port (602) is provided on the top of the water tank (601).