Polishing and washing mechanism for ultrasonic cleaning machine

By designing a throwing and washing mechanism in an ultrasonic cleaning machine, using components such as rotating rods and bevel gears to achieve uniform movement of the silicon wafer, the problem of unsatisfactory cleaning results caused by single cleaning in the prior art is solved, and the cleaning efficiency and uniformity are improved.

CN223011338UActive Publication Date: 2025-06-24ZHANGJIAGANG HUATAI ULTRASOUND TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202421558192.3
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-07-03
Publication Date
2025-06-24
Estimated Expiration
2034-07-03

AI Technical Summary

Technical Problem

Existing ultrasonic cleaning machines are single when cleaning silicon wafers, resulting in poor cleaning results, which may lead to local over-cleaning and damage the silicon wafers, reducing the overall cleaning efficiency.

Method used

A throwing and washing mechanism for ultrasonic cleaning machines is designed. Through the cooperation of components such as rotating rod, active bevel gear, eccentric wheel, driven bevel gear, etc., the up and down reciprocating movement of the silicon wafer is realized, ensuring that ultrasonic energy covers every corner of the silicon wafer.

Benefits of technology

Through this design, the cleaning uniformity of the silicon wafer is ensured, the local cleaning is not thorough, the overall cleaning efficiency is improved, and the integrity of the silicon wafer surface is protected.

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Abstract

The utility model relates to the technical field of ultrasonic cleaning machines, and discloses a polishing and washing mechanism for an ultrasonic cleaning machine, which comprises an object carrying block and a polishing and washing box, a driving component is fixedly connected inside the top end of the object carrying block, and driving bevel gears are fixedly connected to the front side and the rear side of the driving component. A plurality of first limiting blocks are fixedly connected to the bottom end of the polishing and washing box, two second rotating rods are rotatably connected to the interiors of the first limiting blocks, two eccentric wheels are fixedly connected to the exteriors of the second rotating rods, a driven bevel gear is fixedly connected to the left end of each second rotating rod, and a plurality of containing holes are formed in the top end of the polishing and washing box. A carrying frame is slidably connected into the polishing and washing box, a plurality of silicon wafers are slidably connected to the top end of the carrying frame, and a plurality of connecting blocks are fixedly connected to the top end of the carrying frame. According to the silicon wafer cleaning device, the uniformity of cleaning of the silicon wafer can be ensured, and the condition that local cleaning is not thorough is avoided, so that the overall cleaning efficiency is improved.
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Description

Technical Field

[0001] The utility model relates to the technical field of ultrasonic cleaning machines, in particular to a throwing and washing mechanism for an ultrasonic cleaning machine. Background Art

[0002] A silicon wafer is a cornerstone of microelectronics technology, used in the manufacture of integrated circuits containing up to tens of millions of transistors, mainly for chip production. During the production process, the surface of the silicon wafer may be contaminated with various minute impurities and pollutants, which will seriously affect the performance and stability of the circuit. The ultrasonic cleaning machine uses the tiny bubbles generated by high-frequency vibration to impact the surface of the silicon wafer, removing the attachments through physical action, avoiding the corrosion and discoloration problems that may be brought about by traditional chemical cleaning, thereby ensuring the surface quality and integrity of the silicon wafer.

[0003] In the prior art, some cleaning machines usually use the tiny bubbles generated by high-frequency vibration to impact and peel on the surface of an object, thereby achieving efficient cleaning of the surface of the silicon wafer. However, the cleaning motion is single, resulting in an unsatisfactory cleaning effect. This will not only cause some areas to not be cleaned sufficiently, but may also damage the sensitive surface of the silicon wafer due to excessive local cleaning, reducing the overall cleaning efficiency. Therefore, in view of the above deficiencies, a throwing and washing mechanism for an ultrasonic cleaning machine is proposed. Summary of the Utility Model

[0004] In order to make up for the above deficiencies, the utility model provides a throwing and washing mechanism for an ultrasonic cleaning machine, aiming to improve the problems in the prior art that the cleaning motion is single, resulting in an unsatisfactory cleaning effect and reducing the overall cleaning efficiency.

[0005] In order to achieve the above purpose, the utility model adopts the following technical scheme:

[0006] A throwing and washing mechanism for an ultrasonic cleaning machine includes a load block and a throwing and washing box. A driving component is fixedly connected to the inner part of the top end of the load block. Active bevel gears are fixedly connected to both the front and rear sides of the driving component. A plurality of limiting blocks I are fixedly connected to the bottom end of the throwing and washing box. Two rotating rods II are rotatably connected to the inside of the plurality of limiting blocks I. Two eccentric wheels are fixedly connected to the outside of the rotating rods II. A driven bevel gear is fixedly connected to the left end of the rotating rod II. A plurality of accommodating holes are opened in the inner part of the top end of the throwing and washing box. A load rack is slidably connected to the inside of the throwing and washing box. A plurality of silicon wafers are slidably connected to the top end of the load rack. A plurality of connecting blocks are fixedly connected to the top end of the load rack. Two connecting long blocks are fixedly connected to the opposite sides of the plurality of connecting blocks. Two connecting rods are fixedly connected to the bottom end of the connecting long block. A connecting block is fixedly connected to the bottom end of the connecting rod. A disc is fixedly connected to the inside of the connecting block. A buffer component is fixedly connected to the inside of the accommodating hole;

[0007] As a further description of the above technical solution:

[0008] The driving component includes a motor, the outside of the motor is fixedly connected inside the load block, the driving end of the motor is fixedly connected with a speed regulation block, a rotating rod I is fixedly connected inside the speed regulation block, and the front and rear sides of the rotating rod I are fixedly connected to the adjacent sides of the two driving bevel gears;

[0009] As a further description of the above technical solution:

[0010] The driving bevel gear is meshed with the driven bevel gear, and the right side of the driven bevel gear is rotatably connected inside the left limiting block I;

[0011] As a further description of the above technical solution:

[0012] Both the left and right sides of the washing box are fixedly connected with two limiting columns, and the outside of the connecting rod is slidably connected inside the limiting columns;

[0013] As a further description of the above technical solution:

[0014] Two limiting blocks II are fixedly connected to the left bottom end of the washing box, one side of the driving bevel gear is rotatably connected inside the limiting blocks II, and the bottom end of the connecting long block is in contact with the top end of the limiting column;

[0015] As a further description of the above technical solution:

[0016] One side of the connecting long block is slidably connected to one side of the washing box, and the outside of the connecting block is slidably connected inside the accommodating hole;

[0017] As a further description of the above technical solution:

[0018] The buffering component includes a telescopic rod, a strong spring is sleeved outside the telescopic rod, one end of the strong spring is fixedly connected to one side of the connecting block, and the other end of the strong spring is fixedly connected to one side inside the accommodating hole;

[0019] As a further description of the above technical solution:

[0020] The top end of the telescopic rod is fixedly connected to the bottom end of the connecting block.

[0021] The utility model has the following beneficial effects:

[0022] 1. In the present utility model, through the cooperation among the first rotating rod, the driving bevel gear, the second rotating rod, the eccentric wheel, the driven bevel gear, the carrier, the connecting long block, the connecting rod, the connecting block, the disc, the limiting column, and the connecting block, the cleaning uniformity of the silicon wafer can be ensured. Since the silicon wafer may be contaminated to varying degrees during the processing, the reciprocating motion up and down ensures that the ultrasonic wave can cover every corner of the silicon wafer, thus avoiding the situation of incomplete local cleaning, thereby improving the overall cleaning efficiency, which is crucial for maintaining the chip yield, because even a tiny impurity may affect the performance of the chip. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 FIG. is a three-dimensional schematic diagram of a polishing mechanism for an ultrasonic cleaning machine proposed by the present utility model;

[0024] Figure 2 FIG. is a structural schematic diagram of the second rotating rod of a polishing mechanism for an ultrasonic cleaning machine proposed by the present utility model;

[0025] Figure 3 FIG. is a structural schematic diagram of the carrier of a polishing mechanism for an ultrasonic cleaning machine proposed by the present utility model;

[0026] Figure 4 is Figure 1 the enlarged view at A in

[0027] Figure 5 FIG. is a structural schematic diagram of a strong spring of a polishing mechanism for an ultrasonic cleaning machine proposed by the present utility model.

[0028] LEGEND DESCRIPTION:

[0029] 1. Carrier block; 2. Motor; 3. Speed regulating block; 4. First rotating rod; 5. Driving bevel gear; 6. First limiting block; 7. Second rotating rod; 8. Eccentric wheel; 9. Driven bevel gear; 10. Polishing box; 11. Accommodating hole; 12. Carrier; 13. Silicon wafer; 14. Connecting block; 15. Connecting long block; 16. Connecting rod; 17. Connecting block; 18. Disc; 19. Limiting column; 20. Second limiting block; 21. Telescopic rod; 22. Strong spring. DETAILED IMPLEMENTATION MANNER

[0030] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0031] Refer to Figure 1 、Figure 2 and Figure 4 , an embodiment provided by the present utility model: a throwing and washing mechanism for an ultrasonic cleaning machine, including a carrier block 1 and a throwing and washing box 10. A driving component is fixedly connected inside the top end of the carrier block 1. The driving component includes a motor 2 as a power source. The outside of the motor 2 is fixedly connected inside the carrier block 1. The driving end of the motor 2 is fixedly connected with a speed regulating block 3. A rotating rod 4 is fixedly connected inside the speed regulating block 3. The front and rear sides of the rotating rod 4 are fixedly connected to the adjacent sides of two driving bevel gears 5. The front and rear sides of the driving component are both fixedly connected with driving bevel gears 5. This design is to transmit the rotational power of the motor 2 to the driving bevel gears 5. A plurality of limiting blocks 6 are fixedly connected to the bottom end of the throwing and washing box 10 to provide support and guidance. Two rotating rods 7 are rotatably connected inside the plurality of limiting blocks 6. Two eccentric wheels 8 are fixedly connected to the outside of the rotating rods 7. This is to drive the power to the eccentric wheels 8, and then make the eccentric wheels 8 move. The left end of the rotating rod 7 is fixedly connected with a driven bevel gear 9. The driving bevel gear 5 and the driven bevel gear 9 are meshed. This is used to transmit the force of the driving bevel gear 5 to the driven bevel gear 9. The right side of the driven bevel gear 9 is rotatably connected inside the left limiting block 6 to provide additional support. A plurality of receiving holes 11 are opened inside the top end of the throwing and washing box 10 for providing a receiving function.

[0032] Referring to Figure 2 、 Figure 3 and Figure 4 , a carrier rack 12 is slidably connected inside the throwing and washing box 10. A plurality of silicon wafers 13 are slidably connected to the top end of the carrier rack 12 to carry the silicon wafers 13 and ensure that the silicon wafers 13 can move smoothly. A plurality of connecting blocks 14 are fixedly connected to the top end of the carrier rack 12 for providing a connecting function. The outside of the connecting blocks 14 is slidably connected inside the receiving holes 11. Two connecting long blocks 15 are fixedly connected to the opposite sides of the plurality of connecting blocks 14. One side of the connecting long block 15 is slidably connected to one side of the throwing and washing box 10. Two connecting rods 16 are fixedly connected to the bottom end of the connecting long block 15 to play a role in transmitting force and support. A connecting block 17 is fixedly connected to the bottom end of the connecting rod 16. A disc 18 is fixedly connected inside the connecting block 17. The disc 18 is in contact with the eccentric wheel 8 to make the disc 18 move. Two limiting columns 19 are fixedly connected to the left and right sides of the described throwing and washing box 10. The outside of the connecting rod 16 is slidably connected inside the limiting columns 19. Two limiting blocks 20 are fixedly connected to the left bottom end of the throwing and washing box 10. One side of the driving bevel gear 5 is rotatably connected inside the limiting block 20. The bottom end of the connecting long block 15 is in contact with the top end of the limiting column 19.

[0033] Referring to Figure 4, a buffer assembly is fixedly connected inside the accommodation hole 11. The buffer assembly includes a telescopic rod 21. A strong spring 22 is sleeved outside the telescopic rod 21. The telescopic rod 21 can perform telescopic movement in the axial direction, playing a role in guiding and supporting the strong spring 22. One end of the strong spring 22 is fixedly connected to one side of the connecting block 14, and the other end of the strong spring 22 is fixedly connected to one side inside the accommodation hole 11. The strong spring 22 is used to provide elastic force to absorb impacts and vibrations during the cleaning process, preventing the silicon wafer 13 from being damaged or falling off due to excessive vibration. The top end of the telescopic rod 21 is fixedly connected to the bottom end of the connecting block 14. The connecting block 14 serves as an intermediary for transmitting power and buffering.

[0034] Working principle: First, start the motor 2. Under the movement of the motor 2, the rotational force is transmitted to the speed regulating block 3. Then, the speed regulating block 3 drives the first rotating rod 4 to rotate stably inside the second limiting block 20. Then, under the movement of the first rotating rod 4, the driving bevel gear 5 is driven to rotate. Then, under the meshing of the driving bevel gear 5 and the driven bevel gear 9, the driven bevel gear 9 is driven to move. Then, under the movement of the driven bevel gear 9, the second rotating rod 7 is driven to rotate inside the first limiting block 6. Then, under the rotation of the second rotating rod 7, the eccentric wheel 8 is driven to rotate. When the eccentric wheel 8 rotates 180 degrees, the disc 18 will be lifted. Then, the connecting block 17 drives the connecting rod 16 to slide inside the limiting post 19, and then the connecting long block 15 is driven to move. Then, under the movement of the connecting long block 15, the connecting block 14 is driven to move, driving the strong spring 22 to be stretched. Then, under the movement of the connecting block 14, the carrier 12 is also driven to move, and accordingly, the silicon wafer 13 above also moves. Then, when the eccentric wheel 8 rotates 180 degrees again, the tensile force on the strong spring 22 disappears, and then a resilience force is generated to buffer the connecting block 14, and then buffer the silicon wafer 13 on the carrier 12.

[0035] Finally, it should be noted that the above are only the preferred embodiments of the present invention and are not used to limit the present invention. Although the present invention has been described in detail with reference to the foregoing embodiments, for those skilled in the art, they can still modify the technical solutions recorded in the foregoing embodiments, or perform equivalent replacements for some of the technical features. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A cleaning mechanism for an ultrasonic cleaning machine, comprising a carrier block (1) and a cleaning box (10), characterized in that: A driving assembly is fixedly connected inside the top of the object-carrying block (1), and a driving bevel gear (5) is fixedly connected to the front and rear sides of the driving assembly. A plurality of limit blocks (6) are fixedly connected to the bottom of the washing box (10), and two rotating rods (7) are rotatably connected inside the plurality of limit blocks (6). Two eccentric wheels (8) are fixedly connected outside the rotating rods (7), and a driven bevel gear (9) is fixedly connected to the left end of the rotating rods (7). A plurality of accommodating holes (11) are provided inside the top of the washing box (10), and the inside of the washing box (10) is provided with a plurality of accommodating holes (11). A carrier (12) is slidably connected, a plurality of silicon wafers (13) are slidably connected to the top of the carrier (12), a plurality of connecting blocks (14) are fixedly connected to the top of the carrier (12), two connecting long blocks (15) are fixedly connected to the far sides of the connecting blocks (14), two connecting rods (16) are fixedly connected to the bottom ends of the connecting long blocks (15), a connecting block (17) is fixedly connected to the bottom ends of the connecting rods (16), a disc (18) is fixedly connected to the inside of the connecting block (17), and a buffer component is fixedly connected to the inside of the accommodating hole (11).

2. The ultrasonic cleaning machine cleaning mechanism according to claim 1, characterized in that: The driving assembly comprises a motor (2), the outside of the motor (2) is fixedly connected to the inside of the object carrier (1), the driving end of the motor (2) is fixedly connected to a speed regulating block (3), the inside of the speed regulating block (3) is fixedly connected to a rotating rod (4), and the front and rear sides of the rotating rod (4) are fixedly connected to the adjacent sides of the two active bevel gears (5).

3. The cleaning mechanism for ultrasonic cleaning machine according to claim 1, characterized in that: The driving bevel gear (5) is meshingly connected with the driven bevel gear (9), and the right side of the driven bevel gear (9) is rotationally connected to the inside of the left side limit block 1 (6).

4. The cleaning mechanism for ultrasonic cleaning machine according to claim 1, characterized in that: Two limit columns (19) are fixedly connected to the left and right sides of the washing box (10), and the outside of the connecting rod (16) is slidably connected to the inside of the limit columns (19).

5. The cleaning mechanism for ultrasonic cleaning machine according to claim 4, characterized in that: The left bottom end of the washing box (10) is fixedly connected to two limit blocks (20), one side of the active bevel gear (5) is rotatably connected to the inside of the limit block (20), and the bottom end of the connecting long block (15) is in contact with the top end of the limit column (19).

6. The polishing mechanism for ultrasonic cleaning machine according to claim 1, characterized in that: One side of the connecting long block (15) is slidably connected to one side of the washing box (10), and the outside of the connecting block (14) is slidably connected to the inside of the accommodating hole (11).

7. The cleaning mechanism for ultrasonic cleaning machine according to claim 1, characterized in that: The buffer assembly comprises a telescopic rod (21), the outer portion of the telescopic rod (21) is provided with a strong spring (22), one end of the strong spring (22) is fixedly connected to one side of the connecting block (14), and the other end of the strong spring (22) is fixedly connected to one side of the interior of the accommodating hole (11).

8. The cleaning mechanism for ultrasonic cleaning machine according to claim 7, characterized in that: The top end of the telescopic rod (21) is fixedly connected to the bottom end of the connecting block (14).

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