Photomask frictioning jig

Abstract

The utility model provides a photomask frictioning jig which comprises a bottom plate, a photomask carrying table and a blocking assembly, the photomask carrying table is fixed on the bottom plate, a sliding piece is arranged on the bottom plate, and the blocking assembly is arranged above the photomask carrying table; the blocking assembly comprises a connecting rod, a blocking block and a protective cover; the connecting rod is connected with the sliding piece on the bottom plate, the stopping block is fixed to the front side of the connecting rod, and the protective cover is fixed to the rear side of the connecting rod. During use, the photomask is fixed on the photomask carrying table, the blocking assembly is moved, the blocking block and the protective cover shield the clean area of the photomask, and the polluted area of the photomask is exposed in front of the blocking block, so that the polluted area can be independently exposed, independent manual wiping is facilitated, the pollution risk of a pattern layer of the photomask is reduced, and the working efficiency of the photomask is improved. And the photomask repair success rate is increased.

Description

Technical Field

[0001] The utility model relates to the field of photomask cleaning, and particularly relates to a photomask glue wiping fixture suitable for manual scrubbing. Background Art

[0002] A photomask is a commonly used mold in the integrated circuit manufacturing process. A pattern area is formed on the photomask, and through the exposure process, the pattern in the pattern area of the photomask can be transferred to the wafer. During the use of the photomask, due to various reasons, the photomask protective film needs to be repaired. During the repair process of the photomask protective film, the residual glue remaining on the photomask surface needs to be removed. The existing manual cleaning method for the photomask is to wipe the residual glue part on the photomask surface with a dust-free cloth soaked with chemical substances such as alcohol and acetone. There is a risk of touching the pattern area of the photomask during the wiping process. Therefore, a fixture that can protect the photomask pattern from being contaminated during the cleaning process is needed to improve the success rate of photomask repair. Summary of the Utility Model

[0003] To solve the above problems, the utility model provides a photomask glue wiping fixture.

[0004] To achieve the above object, the technical solution provided by the utility model is as follows:

[0005] A photomask glue wiping fixture includes a bottom plate, a photomask stage and a blocking assembly. The photomask stage is fixed on the bottom plate. A sliding member is arranged on the bottom plate, and the blocking assembly is arranged above the photomask stage; the blocking assembly includes a connecting rod, a blocking block and a protective cover; the connecting rod is connected to the sliding member on the bottom plate, the blocking block is fixed on the front side of the connecting rod, and the protective cover is fixed on the rear side of the connecting rod.

[0006] Further, the blocking block is a transparent blocking block.

[0007] Further, the blocking block is a transparent blocking block made of quartz material.

[0008] Further, the blocking block is detachably fixed on the front side of the connecting rod.

[0009] Further, a fixing member is fixed on the front side of the connecting rod. The fixing member is provided with a card slot, and the blocking block is inserted into the card slot for fixing.

[0010] Further, an inclined guiding surface inclined downward is formed at the front end of the blocking block.

[0011] Further, the photomask stage includes a stage plate and a plurality of positioning blocks and a plurality of photomask fixing buckles fixed on the surface of the stage plate; the plurality of positioning blocks together form a photomask fixing groove; the plurality of photomask fixing buckles are arranged on the periphery of the photomask fixing groove.

[0012] Further, the length dimensions of both the blocking block and the protective cover are greater than the size of the photomask fixing groove on the photomask stage.

[0013] Further, the protective cover is a transparent protective cover.

[0014] Further, the photomask stage is arranged at the middle position of the bottom plate. Slide rails extending in the front-rear direction are respectively arranged on the left and right sides of the bottom plate. Sliders are slidably assembled on the slide rails. The slider is the sliding member, and a fastening bolt is arranged on the slider; the left and right ends of the connecting rod are respectively fixed on the sliders on the left and right sides.

[0015] Through the technical solution provided by the present utility model, the following beneficial effects are achieved:

[0016] When the photomask rubber wiping jig provided in this embodiment is in use, the photomask is fixed on the photomask stage, and the blocking assembly is moved so that the blocking block and the protective cover cover the clean area of the photomask, while the contaminated area of the photomask is exposed in front of the blocking block. In this way, the contaminated area can be separately exposed, which is convenient for manual wiping alone, reduces the risk of the graphic area of the photomask being contaminated, and increases the success rate of photomask repair. Description of the Drawings

[0017] Figure 1 Shown is a perspective schematic diagram of the photomask rubber wiping jig in the embodiment;

[0018] Figure 2 Shown is a side view of the photomask rubber wiping jig in the embodiment;

[0019] Figure 3 Shown is a top view of the photomask rubber wiping jig in the embodiment;

[0020] Figure 4 Shown is a front view of the photomask rubber wiping jig in the embodiment. Detailed Embodiments

[0021] To further illustrate each embodiment, the present utility model provides drawings. These drawings are a part of the disclosure of the present utility model, and are mainly used to illustrate the embodiments and can explain the operation principle of the embodiments in conjunction with the relevant descriptions in the specification. With reference to these contents, those of ordinary skill in the art should be able to understand other possible implementation manners and the advantages of the present utility model. The components in the drawings are not drawn to scale, and similar component symbols are usually used to represent similar components.

[0022] In the description of the present invention, the orientation or positional relationships such as "upper", "lower", "left", "right", "front", "rear", etc. are based on the orientation or positional relationships shown in the drawings. They are only for the convenience of description and simplifying the operation, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation to the present invention.

[0023] The present utility model will be further described in conjunction with the drawings and specific embodiments.

[0024] Refer to Figures 1 to 4 As shown, a photomask scrubbing fixture provided in this embodiment includes a bottom plate 10, a photomask carrier stage, and a blocking assembly 30. The photomask carrier stage is fixed on the bottom plate 10. A sliding member 12 is provided on the bottom plate 10, and the blocking assembly 30 is disposed above the photomask carrier stage. The blocking assembly 30 includes a connecting rod 31, a blocking block 32, and a protective cover 33. The connecting rod 31 is connected to the sliding member 12 on the bottom plate 10. The blocking block 32 is fixed to the front side of the connecting rod 31, and the protective cover 33 is fixed to the rear side of the connecting rod 31.

[0025] When using this photomask scrubbing fixture, the photomask 100 is fixed on the photomask carrier stage, and the blocking assembly 30 is moved so that the blocking block 32 and the protective cover 33 cover the clean area of the photomask 100, while the contaminated area of the photomask 100 is exposed in front of the blocking block 32. In this way, the contaminated area can be separately exposed, facilitating separate manual wiping, reducing the risk of contamination of the graphic area of the photomask 100, and increasing the success rate of photomask 100 repair.

[0026] Specifically, in this embodiment, the photomask carrier stage is disposed at the middle position of the bottom plate 10. Slide rails 11 extending in the front-rear direction are respectively provided on the left and right sides of the bottom plate 10. A slider 121 is slidably assembled on the slide rails 11. Specifically, this sliding member 12 is the slider 121. A fastening bolt 13 is provided on the slider 121. The left and right ends of the connecting rod 31 are respectively fixed to the sliders 121 on the left and right sides. In this way, the blocking assembly can be stably translated in the front-rear direction to reach the area to be wiped. And with the setting of the fastening bolt 13, when the predetermined position is reached, the slider 121 can be locked in the position on the slide rail 11 through the fastening bolt 13 to prevent the blocking assembly from sliding and shifting during the wiping process.

[0027] Furthermore, the photomask carrier includes a carrier plate 20 and a plurality of positioning blocks 21 and a plurality of photomask fixing buckles 22 fixed on the surface of the carrier plate 20; specifically, the number of the positioning blocks 21 is four, and the four positioning blocks 21 together constitute a photomask fixing groove; that is, the four positioning blocks 21 respectively form the four end corners of the photomask fixing groove. A plurality of photomask fixing buckles 22 are arranged on the periphery of the photomask fixing groove. Specifically, the number of the photomask fixing buckles 22 is two, and the two photomask fixing buckles 22 are distributed on the left and right sides of the photomask fixing groove; the photomask fixing buckles 22 can be rotatably arranged, and when the photomask 100 needs to be placed, the photomask fixing buckles 22 are rotated to a yield position, and when the photomask 100 is placed, the photomask fixing buckles 22 are rotated to a fixed position so that it is pressed against the edge surface of the photomask 100 to achieve fixation. Of course, in other embodiments, the structure of the photomask carrier is not limited to this.

[0028] The length dimensions of the blocking block 32 and the protective cover 33 (the dimensions in the left-right extending direction in this embodiment) are both larger than the dimensions of the mask fixing groove of the mask carrier; thus, the mask 100 can be well covered.

[0029] Preferably, the blocking block 32 is a transparent blocking block, through which the condition of the area blocked by the blocking block 32 can be observed in real time, and abnormal conditions such as the intrusion of cleaning fluid can be discovered in time. Further preferably, the blocking block 32 is a transparent blocking block made of quartz. The existing cleaning fluid generally uses organic cleaning fluids such as acetone. The transparent blocking block made of quartz has good hardness and stable structure, and will not be deformed by being dissolved by the organic cleaning fluid. Of course, in other embodiments, the blocking block 32 may also be a transparent blocking block made of other materials, or may also be an opaque material.

[0030] The blocking block 32 is detachably fixed to the front side of the connecting rod 31, so that the blocking block 32 can be replaced. Specifically, a fixing member 34 is fixed to the front side of the connecting rod 31, and the fixing member 34 is provided with a slot, and the blocking block 32 is inserted into the slot for fixing; the fixing structure is simple and easy to operate.

[0031] The front end of the blocking block 32 forms an inclined guide surface 321 which is inclined downward, so as to provide good guidance during wiping and avoid blocking the wiping position.

[0032] Similarly, the protective cover 33 is also set as a transparent protective cover, so that the condition of the photomask 100 in the protective cover 33 can be visually confirmed. Furthermore, the protective cover 33 is far away from the wiping position and will not contact the cleaning liquid. Therefore, the protective cover 33 can be made of transparent materials such as resin and plastic; of course, in other embodiments, opaque materials can also be used as long as they can cover the lower photomask 100 to play a protective role.

[0033] Further, handle 14 is provided on opposite sides (front and back sides in this embodiment) of the bottom plate 10, facilitating manual lifting and carrying.

[0034] Although the present utility model has been specifically shown and described in conjunction with the preferred embodiments, those skilled in the art should understand that various changes can be made to the present utility model in terms of form and details without departing from the spirit and scope of the present utility model defined by the appended claims, and all such changes are within the protection scope of the present utility model.

Claims

1. A mask eraser jig, characterized in that: It includes a base plate, a mask carrier and a blocking component, wherein the mask carrier is fixed on the base plate, a sliding member is arranged on the base plate, and the blocking component is arranged above the mask carrier; the blocking component includes a connecting rod, a blocking block and a protective cover; the connecting rod is connected to the sliding member on the base plate, the blocking block is fixed on the front side of the connecting rod, and the protective cover is fixed on the rear side of the connecting rod.

2. The photomask eraser jig according to claim 1, characterized in that: The blocking block is a transparent blocking block.

3. The photomask eraser jig according to claim 2, characterized in that: The blocking block is a transparent blocking block made of quartz material.

4. The photomask eraser jig according to claim 1, characterized in that: The blocking block is detachably fixed on the front side of the connecting rod.

5. The photomask eraser jig according to claim 4, characterized in that: A fixing piece is fixed on the front side of the connecting rod. The fixing piece is provided with a slot, and the blocking block is inserted into the slot and fixed.

6. The photomask eraser jig according to claim 1, characterized in that: The front end of the blocking block forms an inclined guide surface inclined downward.

7. The photomask eraser jig according to claim 1, characterized in that: The photomask carrier comprises a carrier plate, a plurality of positioning blocks and a plurality of photomask fixing buckles fixed on the surface of the carrier plate; the plurality of positioning blocks together constitute a photomask fixing groove; and the plurality of photomask fixing buckles are arranged on the periphery of the photomask fixing groove.

8. The photomask eraser jig according to claim 7, characterized in that: The length dimensions of the blocking block and the protective cover are both greater than the dimensions of the mask fixing groove of the mask carrier.

9. The photomask eraser jig according to claim 1, characterized in that: The protective cover is a transparent protective cover.

10. The photomask eraser jig according to claim 1, characterized in that: The mask carrier is arranged in the middle position of the base plate, and the left and right sides of the base plate are respectively provided with slide rails extending along the front-back direction, and the slide rails are slidably equipped with sliders, which are the sliding parts, and the sliders are provided with fastening bolts; the left and right ends of the connecting rod are respectively fixed on the sliders on the left and right sides.

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