Monitoring device

By designing a monitoring device that includes a mobile structure and a control structure, the problem that the isolation door in the dry-type demolifier cannot be monitored in real time is solved, and the precise control of the isolation door operation and real-time detection of the pressure difference between the vacuum reaction chamber and the buffer chamber are achieved, which avoids wafer contamination and improves production efficiency and product quality.

CN223053266UActive Publication Date: 2025-07-01SUZHOU ZISHAN SEMICON TECH CO LTD
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Patent Information

Application Number
CN202422103855.9
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-08-29
Publication Date
2025-07-01
Estimated Expiration
2034-08-29

AI Technical Summary

Technical Problem

In the dry-type degluing machine, the isolation door cannot be monitored in real time during the automated production process, resulting in misoperation of plasma RF power output and pressure balance, causing particles in the buffer cavity to contaminate the wafer.

Method used

A monitoring device is designed, including a mobile structure and a control structure, and the precise control of the isolation door is achieved through the isolation door control switch, hydraulic push rod, cylinder, guide rod, slide chute and pulley; at the same time, through the ADC acquisition, signal adapter plate and control panel, the pressure difference between the vacuum reaction chamber and the buffer chamber is detected and controlled in real time to ensure the correct switching action of the isolation door.

Benefits of technology

It effectively avoids wafer contamination caused by misoperation of the isolation door, ensures automation and reliability of the production process, and improves product quality and production efficiency.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to the technical field of isolation doors of dry-type degumming machines, and provides a monitoring device which comprises a box body and a vacuum reaction chamber. According to the utility model, through the arrangement of the control structure, after the signal adapter plate transfers a signal from the PIB signal plate to the control plate, the MCU in the control plate performs ADC sampling, when the pressure values in the vacuum reaction chamber and the buffer chamber are within an allowable range, an isolation door control switch signal is transferred out, so that the movable isolation door is opened immediately, and otherwise, the control structure is opened. Therefore, the situation that the wafer is polluted due to the fact that the movable isolation door is opened by mistake when the pressure difference of the two cavities is large is avoided, meanwhile, when the movable isolation door is closed, a radio frequency power switch signal is transmitted out, plasma radio frequency starts to be output, and on the contrary, it is ensured that the plasma radio frequency can be output when the movable isolation door is closed. And the plasma radio frequency output is prevented from polluting the wafer when the movable isolation door is opened, and the parameter information such as the opening and closing state of the movable isolation door and the pressure difference threshold value can be displayed in real time by arranging the display screen.
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Description

Technical Field

[0001] The utility model relates to the technical field of dry-type glue removal machine isolation doors, in particular to a monitoring device. Background Art

[0002] There is an isolation door between the vacuum reaction chamber and the buffer chamber inside the dry degumming machine to isolate the two chambers. When the wafer is transferred from the buffer chamber to the vacuum reaction chamber, the isolation door is closed, and then the degumming process begins. The plasma RF power supply in the vacuum reaction chamber is output, the plasma is ignited, and reacts with the photoresist. After the photoresist is ashed, the plasma RF power supply stops outputting, and the degumming process is completed. Then the vacuum reaction chamber is filled with gas to make the cavity pressure of the vacuum reaction chamber and the cavity pressure of the buffer chamber tend to be consistent. After the pressures on both sides are consistent, the isolation door is opened, and the vacuum robot in the buffer chamber reaches into the vacuum reaction chamber to take out the wafer and move it to the basket;

[0003] In recent years, a large number of dry degumming machines in China have had systemic problems, mainly manifested as follows: during automated production, 1. After the wafer is sent to the vacuum reaction chamber, the isolation door has not been closed yet, the plasma RF power supply starts to output, and the degumming process begins; 2. After the degumming process is completed and the pressure of the two chambers is balanced, the pressure on both sides has not reached the same level, and the isolation door is opened. Both of these problems will cause particles in the buffer chamber to enter the vacuum reaction chamber and contaminate the wafer, making the wafer product scrapped. Both of these problems occur occasionally. Because of unmanned automated production, they cannot be discovered on the spot, and the problems cannot be reproduced. This means that engineers currently have no way to identify the cause and further solve the problem. Therefore, it is necessary to provide an isolation door monitoring device to check the machine signal to control the isolation door closing action and the plasma RF power output action to prevent the occurrence of the above two problems and avoid wafer product contamination. Utility Model Content

[0004] The utility model aims to provide a monitoring device to solve the defect that the existing isolation door is not convenient for realizing real-time monitoring.

[0005] In order to solve the above technical problems, the utility model provides the following technical solutions: a monitoring device, including and a vacuum reaction chamber;

[0006] The box body includes a vacuum reaction chamber, a buffer chamber, a partition plate, a through port, a moving structure, a sealing door and a control structure. The vacuum reaction chamber is arranged on one side of the box body, and a buffer chamber is arranged on one side of the vacuum reaction chamber inside the box body.

[0007] A partition plate is fixed at the middle position of the box body, a through opening is arranged on one side of the partition plate, and a movable structure is installed on one side of the partition plate;

[0008] A sealing door is installed on one side of the box body, and a control structure is arranged inside the box body.

[0009] Preferably, a placement table is fixed at the bottom end inside the vacuum reaction chamber, a plasma radio frequency is installed at the top end inside the vacuum reaction chamber, a vacuum manipulator is installed on one side inside the buffer chamber, a storage box is installed at the bottom end inside the buffer chamber, and the vacuum reaction chamber and the buffer chamber are symmetrically distributed on both sides of the partition board inside the box body.

[0010] Preferably, the moving structure includes a cylinder, a hydraulic push rod, a moving isolation door, guide rods, sliding grooves and pulleys. The cylinder is fixed at the middle position on one side of the box body, a hydraulic push rod is installed at the middle position inside the box body, the output end of the hydraulic push rod is fixed with the moving isolation door, guide rods are installed on both sides inside the moving isolation door, a sliding groove is arranged on one side of the partition board, and a pulley is installed on one side of the moving isolation door.

[0011] Preferably, one end of the hydraulic push rod penetrates through one side of the box body and extends to the outside of the box body and is fixedly connected with the output end of the cylinder. One side of the moving isolation door abuts against one side of the partition board, and the width of the moving isolation door is greater than the width of the through opening.

[0012] Preferably, there are two groups of guide rods, and the guide rods are symmetrically distributed on both sides of the hydraulic push rod inside the box body. The moving isolation door is slidably connected with the guide rods.

[0013] Preferably, there are two groups of sliding grooves, and the sliding grooves are symmetrically distributed on one side of the partition board. There are several groups of pulleys, and the pulleys are equidistantly distributed on one side of the moving isolation door inside the sliding grooves.

[0014] Preferably, the control structure includes an ADC acquisition, an isolation door control switch, a radio frequency power supply switch, a control board, a signal transfer board, a PIB signal board and a display screen. The ADC acquisition is fixed on one side inside the buffer chamber, an isolation door control switch is installed on one side of the box body, a radio frequency power supply switch is installed on one side of the top of the box body, a control board is installed on one side of the sealing door, a signal transfer board is installed on one side of the control board, a PIB signal board is installed on one side of the signal transfer board, and a display screen is installed on the other side of the sealing door.

[0015] Preferably, the input end of the signal transfer board is electrically connected to the output end of the control board, and the output end of the signal transfer board is electrically connected to the input end of the PIB signal board.

[0016] Preferably, the output end of the isolation door control switch is electrically connected to the input end of the cylinder, the output end of the ADC acquisition is electrically connected to the input end of the isolation door control switch, and the output end of the radio frequency power supply switch is electrically connected to the input end of the plasma radio frequency.

[0017] The monitoring device provided by the utility model has the following advantages:

[0018] By providing a moving structure, the opening signal is transmitted to the cylinder through the isolation door control switch, so that the cylinder is started to drive the hydraulic push rod to extend and retract, and then drive the moving isolation door to slide outside the guide rod. At the same time, the moving isolation door drives the pulley to slide inside the chute, and then moves the moving isolation door to one side of the through port, so that the isolation door opens the vacuum reaction chamber, and then the vacuum manipulator in the buffer chamber extends into the vacuum reaction chamber to take out the wafer and transfer it to the storage box. And by transmitting the closing signal to the cylinder through the isolation door control switch, the cylinder is started to drive the hydraulic push rod to move the moving isolation door to one side of the through port, so that the isolation door closes the vacuum reaction chamber;

[0019] By providing a control structure, through the setting of the signal transfer board and the control board, all signals are summarized on the PIB signal board. The signal input end of the signal transfer board is transferred from the PIB signal board through the Signal In 1 connector. The signal to be processed is transferred out to the control board through the Signal In 2 connector. After sampling, identification and processing, the signal will be transferred out to the signal transfer board through the Signal Out 2 connector, and then transferred out to the PIB signal board through the Bypass circuit through the Signal Out 1. And the signal for controlling the opening of the moving isolation door through the isolation door control switch, the power switch of the plasma radio frequency can be controlled through the radio frequency power supply switch. The ADC acquisition is used to detect the pressure values inside the vacuum reaction chamber and the buffer chamber. When the signal transfer board transfers the signal from the PIB signal board to the control board, the MCU in the control board will perform ADC sampling and wait for the switch signals of the isolation door control switch and the radio frequency power supply switch to be triggered. When the pressure values inside the vacuum reaction chamber and the buffer chamber are within the allowable range, the isolation door control switch signal is transferred out, that is, the moving isolation door opens immediately. Vice versa. Thus, it avoids the mis-opening of the moving isolation door when the pressure difference between the two chambers is large and pollutes the wafer. At the same time, when the moving isolation door is closed, the radio frequency power supply switch signal is transferred out, and then the plasma radio frequency starts to output immediately. Vice versa. Thus, it ensures that when the moving isolation door is closed, the plasma radio frequency can output, preventing the plasma radio frequency from outputting when the moving isolation door is opened and polluting the wafer. And by providing a display screen, it can real-time display the opening and closing states of the moving isolation door, the size of the pressure difference threshold and other parameter information. Description of the Drawings

[0020] Figure 1 3D structural schematic diagram of the present utility model;

[0021] Figure 2 Front view sectional structural schematic diagram of the present utility model;

[0022] Figure 3 Side view sectional structural schematic diagram of the present utility model;

[0023] Figure 4 First system framework structural schematic diagram of the present utility model;

[0024] Figure 5 Second system framework structural schematic diagram of the present utility model.

[0025] Explanation of reference numerals in the figure: 1, box body; 101, vacuum reaction chamber; 102, buffer chamber; 103, partition board; 104, through port; 105, moving structure; 1051, cylinder; 1052, hydraulic push rod; 1053, moving isolation door; 1054, guide rod; 1055, sliding groove; 1056, pulley; 106, sealing door; 107, control structure; 1071, ADC acquisition; 1072, isolation door control switch; 1073, radio frequency power supply switch; 1074, control board; 1075, signal transfer board; 1076, PIB signal board; 1077, display screen. Specific implementation manner

[0026] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0027] Please refer to Figures 1-5 , a monitoring device provided by the present utility model includes a box body 1 and a vacuum reaction chamber 101.

[0028] Refer to Figure 2 and Figure 3As shown, the box body 1 includes a vacuum reaction chamber 101, a buffer chamber 102, a partition plate 103, a through port 104, a moving structure 105, a sealing door 106, and a control structure 107. The vacuum reaction chamber 101 is arranged on one side inside the box body 1. A buffer chamber 102 is arranged on one side of the vacuum reaction chamber 101 inside the box body 1. A placement table is fixed at the bottom end inside the vacuum reaction chamber 101, and a plasma radio frequency is installed at the top end inside the vacuum reaction chamber 101. A vacuum manipulator is installed on one side inside the buffer chamber 102, and a storage box is installed at the bottom end inside the buffer chamber 102. A partition plate 103 is fixed at the middle position inside the box body 1. The vacuum reaction chamber 101 and the buffer chamber 102 are symmetrically distributed on both sides of the partition plate 103 inside the box body 1. A through port 104 is arranged on one side inside the partition plate 103, and a moving structure 105 is installed on one side of the partition plate 103. The moving structure 105 includes a cylinder 1051, a hydraulic push rod 1052, a moving isolation door 1053, a guide rod 1054, a sliding groove 1055, and a pulley 1056. The cylinder 1051 is fixed at the middle position on one side of the box body 1. A hydraulic push rod 1052 is installed at the middle position inside the box body 1. The output end of the hydraulic push rod 1052 is fixed with a moving isolation door 1053. Guide rods 1054 are installed on both sides inside the moving isolation door 1053. A sliding groove 1055 is arranged on one side of the partition plate 103. A pulley 1056 is installed on one side of the moving isolation door 1053. One end of the hydraulic push rod 1052 penetrates through one side of the box body 1 and extends to the outside of the box body 1 and is fixedly connected to the output end of the cylinder 1051. One side of the moving isolation door 1053 abuts against one side of the partition plate 103. The width of the moving isolation door 1053 is greater than the width of the through port 104. There are two groups of guide rods 1054, and the guide rods 1054 are symmetrically distributed on both sides of the hydraulic push rod 1052 inside the box body 1. The moving isolation door 1053 is slidably connected to the guide rods 1054. There are two groups of sliding grooves 1055, and the sliding grooves 1055 are symmetrically distributed on one side of the partition plate 103. There are several groups of pulleys 1056, and the pulleys 1056 are evenly distributed on one side of the moving isolation door 1053 inside the sliding grooves 1055.

[0029] The opening signal is transmitted to the cylinder 1051 through the isolation door control switch 1072, so that the cylinder 1051 is activated to drive the hydraulic push rod 1052 to extend and retract, and then drive the movable isolation door 1053 to slide outside the guide rod 1054. At the same time, the movable isolation door 1053 drives the pulley 1056 to slide inside the chute 1055, and then moves the movable isolation door 1053 to one side of the through port 104, so that the movable isolation door 1053 opens the vacuum reaction chamber 101. Then, the vacuum manipulator in the buffer chamber 102 extends into the vacuum reaction chamber 101 to take out the wafer and transfer it to the storage box. And the closing signal is transmitted to the cylinder 1051 through the isolation door control switch 1072, so that the cylinder 1051 is activated to drive the hydraulic push rod 1052, and then drive the movable isolation door 1053 to move to one side of the through port 104, so that the isolation door closes the vacuum reaction chamber 101.

[0030] Refer to Figures 1-5 As shown, a sealing door 106 is installed on one side of the box body 1, and a control structure 107 is arranged inside the box body 1. The control structure 107 includes an ADC acquisition 1071, an isolation door control switch 1072, a radio frequency power supply switch 1073, a control board 1074, a signal transfer board 1075, a PIB signal board 1076 and a display screen 1077. The ADC acquisition 1071 is fixed on one side inside the buffer chamber 102, an isolation door control switch 1072 is installed on one side of the box body 1, a radio frequency power supply switch 1073 is installed on one side of the top of the box body 1, a control board 1074 is installed on one side of the sealing door 106, a signal transfer board 1075 is installed on one side of the control board 1074, a PIB signal board 1076 is installed on one side of the signal transfer board 1075, and a display screen 1077 is installed on the other side of the sealing door 106. The input end of the signal transfer board 1075 is electrically connected to the output end of the control board 1074, the output end of the signal transfer board 1075 is electrically connected to the input end of the PIB signal board 1076, the output end of the isolation door control switch 1072 is electrically connected to the input end of the cylinder 1051, the output end of the ADC acquisition 1071 is electrically connected to the input end of the isolation door control switch 1072, and the output end of the radio frequency power supply switch 1073 is electrically connected to the input end of the plasma radio frequency.

[0031] By setting up the signal transfer board 1075 and the control board 1074, all signals are aggregated onto the PIB signal board 1076. The signal input terminal of the signal transfer board 1075 is transferred from the PIB signal board 1076 through the Signal In 1 connector. The signals to be processed are transferred out to the control board 1074 through the Signal In 2 connector. After being sampled, identified, and processed, the signals are transferred out to the signal transfer board 1075 through the SignalOut 2 connector, and then transferred out to the PIB signal board 1076 through the Bypass circuit via the Signal Out 1. Also, the signal for controlling the opening of the movable isolation door 1053 is controlled by the isolation door control switch 1072. The power switch of the plasma radio frequency can be controlled through the radio frequency power switch 1073. The ADC acquisition 1071 is used to detect the pressure values inside the vacuum reaction chamber 101 and the buffer chamber 102. When the signal transfer board 1075 transfers the signal from the PIB signal board 1076 to the control board 1074, the MCU in the control board 1074 will perform ADC sampling and wait for the trigger of the switch signals of the isolation door control switch 1072 and the radio frequency power switch 1073. When the pressure values inside the vacuum reaction chamber 101 and the buffer chamber 102 are within the allowable range, the isolation door control switch signal 1072 is transferred out, causing the movable isolation door 1053 to open immediately. Vice versa, this avoids the incorrect opening of the movable isolation door 1053 when the pressure difference between the two chambers is large and contaminating the wafer. At the same time, when the movable isolation door 1053 is closed, the radio frequency power switch 1073 signal is transferred out, causing the plasma radio frequency to start output immediately. Vice versa, this ensures that the plasma radio frequency can be output when the movable isolation door 1053 is closed and prevents the plasma radio frequency from being output when the movable isolation door 1053 is open and contaminating the wafer. Also, by setting up the display screen 1077, the opening and closing states of the movable isolation door 1053, the magnitude of the pressure difference threshold, and other parameter information can be displayed in real time.

[0032] Although the present invention has been described in detail with reference to the foregoing embodiments, for those skilled in the art, they can still modify the technical solutions described in the foregoing embodiments or perform equivalent replacements for some of the technical features. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims

1. A monitoring device, comprising a housing (1) and a vacuum reaction chamber (101); Features: The box (1) comprises a vacuum reaction chamber (101), a buffer chamber (102), a partition plate (103), a through port (104), a movable structure (105), a sealing door (106) and a control structure (107); the vacuum reaction chamber (101) is arranged on one side inside the box (1); and the buffer chamber (102) is arranged on one side of the vacuum reaction chamber (101) inside the box (1); A partition plate (103) is fixed at a middle position inside the box body (1), a through opening (104) is provided on one side inside the partition plate (103), and a movable structure (105) is installed on one side of the partition plate (103); A sealing door (106) is installed on one side of the box body (1), and a control structure (107) is arranged inside the box body (1).

2. A monitoring device according to claim 1, characterized in that: A placement table is fixed at the bottom end of the vacuum reaction chamber (101), a plasma radio frequency is installed at the top end of the vacuum reaction chamber (101), a vacuum manipulator is installed at one side of the buffer chamber (102), a storage box is installed at the bottom end of the buffer chamber (102), and the vacuum reaction chamber (101) and the buffer chamber (102) are symmetrically distributed on both sides of a partition plate (103) inside the box body (1).

3. A monitoring device according to claim 1, characterized in that: The movable structure (105) comprises a cylinder (1051), a hydraulic push rod (1052), a movable isolation door (1053), a guide rod (1054), a slide groove (1055) and a pulley (1056); the cylinder (1051) is fixed at the middle position of one side of the box body (1); a hydraulic push rod (1052) is installed at the middle position inside the box body (1); the movable isolation door (1053) is fixed at the output end of the hydraulic push rod (1052); guide rods (1054) are installed on both sides of the movable isolation door (1053); a slide groove (1055) is provided on one side of the partition plate (103); and a pulley (1056) is installed on one side of the movable isolation door (1053).

4. A monitoring device according to claim 3, characterized in that: One end of the hydraulic push rod (1052) passes through one side of the box body (1) and extends to the outside of the box body (1) and is fixedly connected to the output end of the cylinder (1051); one side of the movable isolating door (1053) abuts against one side of the partition plate (103); and the width of the movable isolating door (1053) is greater than the width of the opening (104).

5. A monitoring device according to claim 3, characterized in that: The guide rods (1054) are provided in two groups. The guide rods (1054) are symmetrically distributed on both sides of the hydraulic push rod (1052) inside the box body (1). The movable isolation door (1053) is slidably connected to the guide rods (1054).

6. A monitoring device according to claim 3, characterized in that: The slide grooves (1055) are provided in two groups, and the slide grooves (1055) are symmetrically distributed on one side of the partition plate (103). The pulleys (1056) are provided in a plurality of groups, and the pulleys (1056) are respectively distributed at equal intervals on one side of the movable isolation door (1053) inside the slide grooves (1055).

7. A monitoring device according to claim 1, characterized in that: The control structure (107) comprises an ADC acquisition (1071), an isolation door control switch (1072), a radio frequency power switch (1073), a control board (1074), a signal transfer board (1075), a PIB signal board (1076) and a display screen (1077); the ADC acquisition (1071) is fixed to one side of the buffer chamber (102); the isolation door control switch (1072) is installed on one side of the box body (1); the radio frequency power switch (1073) is installed on one side of the top of the box body (1); the control board (1074) is installed on one side of the sealed door (106); the signal transfer board (1075) is installed on one side of the control board (1074); the PIB signal board (1076) is installed on one side of the signal transfer board (1075); and the display screen (1077) is installed on the other side of the sealed door (106).

8. A monitoring device according to claim 7, characterized in that: The input end of the signal adapter board (1075) is electrically connected to the output end of the control board (1074), and the output end of the signal adapter board (1075) is electrically connected to the input end of the PIB signal board (1076).

9. A monitoring device according to claim 7, characterized in that: The output end of the isolation door control switch (1072) is electrically connected to the input end of the cylinder (1051), the output end of the ADC acquisition (1071) is electrically connected to the input end of the isolation door control switch (1072), and the output end of the radio frequency power switch (1073) is electrically connected to the input end of the plasma radio frequency.