High vacuum system for measuring surface emissivity of high-activity 63Ni electroplating source

Abstract

The utility model discloses a high vacuum system for measuring the surface emissivity of a high-activity 63Ni electroplating source, and relates to the technical field of radioactive source surface emissivity measurement. Comprising a vacuum pipeline in which an electroplating source surface emissivity measuring device is installed, a vacuum extraction system, a molecular pump and a mechanical pump, the molecular pump is connected to the bottom of the vacuum pipeline, an outlet of the molecular pump is connected with an extraction opening of the mechanical pump, and a vacuum measurement system comprises a resistance gauge, a cold gauge and a composite vacuum gauge which are connected with each other. The resistance gauge is installed on a pipeline connecting the molecular pump and the mechanical pump, the cold gauge is installed on the side face of the vacuum pipeline, and the resistance gauge and the cold gauge are both connected with the composite vacuum gauge. According to the utility model, a stable vacuum environment is provided for the measurement of the high-activity 63Ni electroplating source, the influence of air on a measurement result is effectively reduced, the accurate, stable and rapid measurement of measurement equipment is ensured, and the device is convenient to use and good in stability.

Description

Technical Field

[0001] The utility model relates to the technical field of measuring the surface emissivity of radioactive sources, and particularly relates to a high-vacuum system for measuring the surface emissivity of a high-activity 63 Ni electroplated source. Background Technique

[0002] Radioisotope batteries have the advantages of small volume, high energy density, stable operation, long service life, and independence from external supply, and have gradually become an ideal choice for the power supply of microelectromechanical systems. High-activity 63 Ni, as a pure β radioactive source, has the advantages of long half-life, high radioactivity, and appropriate ray energy, and has become the first choice for the radioactive source of β-radiation volt effect nuclear batteries.

[0003] High-activity 63 The decay particle energy emitted by the Ni electroplated source is generally low, and the maximum decay energy of its decay particles is 65.87 keV, and the average energy is 17.13 keV. Therefore, the decay particles interact with the Faraday cylinder mainly through the Coulomb force with the collecting electrode material, mainly involving four interaction modes: inelastic collision of β particles with extranuclear electrons in the atom, inelastic collision of β particles with the atomic nucleus, elastic collision of β particles with the atomic nucleus, and elastic collision of β particles with extranuclear electrons. During the measurement of the electroplated source, there will be a certain distance between its outer surface and the collecting electrode of the measuring device. To improve the accuracy of surface emissivity measurement, it is necessary to reduce the influence of air on electrons, that is, it is necessary to measure in a vacuum environment. Therefore, a high-vacuum system for measuring the surface emissivity of a high-activity 63 Ni electroplated source is provided. Content of the Utility Model

[0004] The utility model is to solve the technical problem that the surface emissivity measuring device of the electroplated source is easily affected by air during measurement, and the purpose is to provide a high-vacuum system for measuring the surface emissivity of a high-activity 63 Ni electroplated source, which provides a stable vacuum environment for the measurement of the high-activity 63 Ni electroplated source, effectively reduces the influence of air on the measurement result, ensures the accurate, stable and rapid measurement of the measuring device, and is convenient to use and has good stability.

[0005] The utility model is realized by the following technical solutions:

[0006] The utility model provides a high-vacuum system for measuring the surface emissivity of a high-activity 63 Ni electroplated source, including:

[0007] A vacuum pipeline, which is used for installing a device for measuring the surface emissivity of the electroplated source inside;

[0008] Vacuum extraction system, including a molecular pump and a mechanical pump, the molecular pump is connected to the bottom of the vacuum pipeline, and the outlet of the molecular pump is connected to the air intake of the mechanical pump;

[0009] Vacuum measurement system, including a resistance gauge, a cold gauge and a compound vacuum gauge connected thereto, the resistance gauge is installed on the pipeline connecting the molecular pump and the mechanical pump, the cold gauge is installed on the side of the vacuum pipeline, and both the resistance gauge and the cold gauge are connected to the compound vacuum gauge.

[0010] Furthermore, a first interface and a third interface are provided on the side of the vacuum pipeline, an inner welded flange one and an inner welded flange three are respectively installed on the first interface and the third interface, and the inner welded flange one and the inner welded flange three are respectively fixedly connected to the vacuum through-wall piece and the cold gauge.

[0011] Furthermore, the vacuum through-wall piece is an electrode flange of a BNC connector.

[0012] Furthermore, a second interface is also provided on the side of the vacuum pipeline, an inner welded flange two is installed on the second interface, and the inner welded flange two is fixedly connected to the blind flange.

[0013] Furthermore, a switch door is hingedly provided at the top of the vacuum pipeline.

[0014] Furthermore, the vacuum degree inside the pipeline should reach at least 1×10 -2 Pa.

[0015] Furthermore, the material of the vacuum pipeline is 304 stainless steel.

[0016] Furthermore, a differential pressure valve is provided at the air intake of the mechanical pump.

[0017] Furthermore, the pumping speed of the mechanical pump is 8L / s, and the pumping speed of the molecular pump is 650L / s.

[0018] Furthermore, the vacuum range measured by the resistance gauge is 1.0×10 5 ~1×10 -1 Pa, and the vacuum range measured by the cold gauge is 1.0×10 -1 Pa~1×10 -6 Pa.

[0019] Compared with the prior art, the present utility model has the following advantages and beneficial effects:

[0020] The high-vacuum system of the present utility model provides a stable vacuum environment for the measurement of high-activity 63 Ni electroplating source, effectively reduces the influence of air on the measurement results, effectively reduces the background noise, has strong operability, short vacuum extraction time, low ultimate vacuum, large chamber volume, and large capacity, and can complete high-activity of different sizes63 The measurement of the Ni electroplating source ensures the accurate, stable, and rapid measurement of the measuring equipment, which is convenient to use and has good stability. Description of the Drawings

[0021] The drawings described herein are used to provide a further understanding of the embodiments of the present utility model, form a part of this application, and do not constitute a limitation on the embodiments of the present utility model. In the drawings:

[0022] Figure 1 is a structural schematic diagram of the present utility model;

[0023] Figure 2 is a three-dimensional structure diagram of the vacuum pipeline;

[0024] Figure 3 is a side view of the vacuum pipeline.

[0025] Marks in the drawings and corresponding names of parts:

[0026] 1 - Vacuum pipeline, 101 - First interface, 102 - Second interface, 103 - Third interface, 2 - Inner welded flange one, 3 - Inner welded flange two, 4 - Inner welded flange three, 5 - Vacuum wall-penetrating piece, 6 - Blind flange, 7 - Switching door, 8 - Molecular pump, 9 - Mechanical pump, 10 - Differential pressure valve, 11 - Cold gauge, 12 - Resistance gauge, 13 - Compound vacuum gauge. Detailed Embodiments

[0027] To make the objectives, technical solutions, and advantages of the present utility model clearer and more understandable, the present utility model will be further described in detail below in conjunction with the embodiments and the drawings. The illustrative embodiments and descriptions of the present utility model are only used to explain the present utility model and do not constitute a limitation on the present utility model.

[0028] In the following description, a large number of specific details are set forth in order to provide a thorough understanding of the present utility model. However, it is obvious to those of ordinary skill in the art that: It is not necessary to employ these specific details to implement the present utility model. In other embodiments, well-known structures, circuits, materials, or methods are not specifically described in order to avoid obscuring the present utility model.

[0029] Throughout the specification, references to "an embodiment", "embodiments", "an example" or "examples" mean that a particular feature, structure, or characteristic described in connection with the embodiment or example is included in at least one embodiment of the present utility model. Thus, the phrases "an embodiment", "embodiments", "an example" or "examples" appearing throughout the specification do not necessarily all refer to the same embodiment or example. In addition, the particular features, structures, or characteristics may be combined in any suitable combination and / or sub-combination in one or more embodiments or examples. Furthermore, those of ordinary skill in the art should understand that the drawings provided herein are for illustrative purposes only and are not necessarily drawn to scale. The term "and / or" used herein includes any and all combinations of one or more of the related listed items.

[0030] In the description of the present utility model, the orientation or positional relationship indicated by the terms "front", "rear", "left", "right", "upper", "lower", "vertical", "horizontal", "high", "low", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as limiting the protection scope of the present utility model.

[0031] Embodiment 1

[0032] This Embodiment 1 provides a high-vacuum system for measuring the surface emissivity of a high-activity 63 Ni electroplating source, as Figures 1 - 3 shown, comprising:

[0033] A vacuum pipeline 1, which is internally used to install a device for measuring the surface emissivity of the electroplating source. The vacuum chamber can provide a stable vacuum environment for the device for measuring the surface emissivity of the high-activity 63 Ni electroplating source, reduce external interference, and at the same time facilitate the access to the device and the radiation source;

[0034] A vacuum extraction system, comprising a molecular pump 8 and a mechanical pump 9. The molecular pump 8 is connected to the bottom of the vacuum pipeline 1, and the outlet of the molecular pump 8 is connected to the suction port of the mechanical pump 9;

[0035] A vacuum measurement system, comprising a resistance gauge 12, a cold gauge 11 and a compound vacuum gauge 13 connected thereto. The resistance gauge 12 is installed on the pipeline connecting the molecular pump 8 and the mechanical pump 9, the cold gauge 11 is installed on the side of the vacuum pipeline 1, and both the resistance gauge 12 and the cold gauge 11 are connected to the compound vacuum gauge 13.

[0036] The high-vacuum system of the present utility model can make the vacuum degree of the internal chamber of the vacuum pipeline 1 ≤ 10 within 10 minutes - 2Pa, and its ultimate vacuum ≤ 10 -4 Pa.

[0037] The working mode of the high-vacuum system of the present utility model is as follows:

[0038] After placing the electroplating source to be measured and the measuring equipment in the inner chamber of the vacuum pipeline 1, close the switch door 7 at the top of the vacuum chamber, seal it with a rubber ring, and fix the switch door 7 with a caliper; turn on the power supply of the mechanical pump 9, start the mechanical pump 9, and at the same time turn on the power supply of the compound vacuum gauge 13 and start the resistance gauge 12 to measure the primary vacuum; when the vacuum indication of the resistance gauge 12 unit of the vacuum gauge reaches 1 Pa, turn on the power supply of the molecular pump 8. At this time, pay attention that the rotation speed, working voltage, current and load of the molecular pump 8 cannot exceed the limit values of the operation of the molecular pump 8; after the output frequency of the molecular pump 8 reaches the maximum value and remains stable, turn on the cold gauge 11. Note that when the vacuum is 10 -1 Pa, the cold gauge 11 cannot be turned on.

[0039] In one or more examples of the present utility model, refer to Figures 1 - 3 , a first interface 101, a second interface 102 and a third interface 103 are arranged on the side of the vacuum pipeline 1. Inner-welded flange one 2, inner-welded flange two 3 and inner-welded flange three 4 are respectively installed on the first interface 101 and the third interface 103. The inner-welded flange one 2, the inner-welded flange two 3 and the inner-welded flange three 4 are respectively fixedly connected to the vacuum through-wall piece 5, the blind flange 6 and the cold gauge 11. The inner-welded flange one 2, the inner-welded flange two 3 and the inner-welded flange three 4 adopt CF35 inner-welded flanges and are fixed to the corresponding interfaces on the side of the vacuum pipeline 1 by welding. The vacuum through-wall piece 5, the blind flange 6 and the cold gauge 11 are hermetically fixed to the CF35 inner-welded flanges through copper gaskets and screw nuts. Among them, the second interface 102 where the inner-welded flange two 3 is located is used as a spare interface and is installed with a blind plate seal.

[0040] Among them, the vacuum through-wall piece 5 is an electrode flange of a BNC connector.

[0041] A switch door 7 is hingedly arranged at the top of the vacuum pipeline 1. An ISO200 inner-welded caliper flange is welded at the top of the vacuum pipeline 1 and is connected to an ISO200 blind caliper flange through a hinge to form the switch door 7, which is convenient for the installation of measuring equipment and the replacement of samples to be measured. A rubber ring is used for sealing between the ISO200 blind flange 6 and the ISO200 inner-welded flange, and a caliper is used for fixing.

[0042] The vacuum degree inside the pipeline should reach at least 1×10 -2 Pa. The materials of the vacuum pipeline 1 are all made of 304 stainless steel. The vacuum pipeline 1 is 420 mm high, 213 mm in inner diameter and 219 mm in outer diameter. The bottom of the vacuum pipeline 1 is welded to the CF200 inner-welded flange and is fixed to the CF200 to CF150 flange at the same time.

[0043] In one or more examples of the present utility model, refer to Figures 1 - 3 , the molecular pump 8 is connected to the vacuum pipeline 1 through a CF200 to CF150 flange at the bottom of the vacuum pipeline 1. The mechanical pump 9 is assembled with the molecular pump 8 through a three-way joint using a bellows. A differential pressure valve 10 is assembled at the air extraction port of the mechanical pump 9. The pumping speed of the mechanical pump 9 is 8 L / s, and the pumping speed of the molecular pump 8 is 650 L / s.

[0044] In one or more examples of the present utility model, refer to Figures 1 - 3 , the resistance gauge 12 is installed between the molecular pump 8 and the mechanical pump 9 for measuring the primary vacuum. The cold gauge 11 is installed at the CF35 flange of the third interface 103 of the vacuum pipeline 1. The vacuum range measured by the resistance gauge 12 is 1.0×10 5 ~1×10 -1 Pa, and the vacuum range measured by the cold gauge 11 is 1.0×10 -1 Pa~1×10 -6 Pa.

[0045] The specific embodiments described above further elaborate on the purpose, technical solutions, and beneficial effects of the present utility model. It should be understood that the above are only specific embodiments of the present utility model and are not used to limit the protection scope of the present utility model. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present utility model shall be included within the protection scope of the present utility model.

Claims

1. A high-vacuum system for measuring the surface emissivity of a high-activity 63 Ni electroplating source, characterized in that Comprising: A vacuum pipeline (1) for installing a surface emissivity measuring device of an electroplating source inside; A vacuum extraction system including a molecular pump (8) and a mechanical pump (9), where the molecular pump (8) is connected to the bottom of the vacuum pipeline (1), and the outlet of the molecular pump (8) is connected to the air suction port of the mechanical pump (9); A vacuum measurement system including a connected resistance gauge (12), a cold gauge (11) and a compound vacuum gauge (13), where the resistance gauge (12) is installed on the pipeline connecting the molecular pump (8) and the mechanical pump (9), the cold gauge (11) is installed on the side of the vacuum pipeline (1), and both the resistance gauge (12) and the cold gauge (11) are connected to the compound vacuum gauge (13).

2. A high-vacuum system for measuring the surface emissivity of a high-activity 63 Ni electroplating source, characterized in that A first interface (101) and a third interface (103) are provided on the side of the vacuum pipeline (1), and an inner-welded flange one (2) and an inner-welded flange three (4) are respectively installed on the first interface (101) and the third interface (103), and the inner-welded flange one (2) and the inner-welded flange three (4) are respectively fixedly connected to a vacuum through-wall part (5) and the cold gauge (11).

3. A high-vacuum system for measuring the surface emissivity of a high-activity 63 Ni electroplating source, characterized in that The vacuum through-wall part (5) is an electrode flange of a BNC connector.

4. A high-vacuum system for measuring the surface emissivity of a highly active 63 Ni electroplating source, characterized in that A second interface (102) is further provided on the side of the vacuum pipeline (1), and an inner-welded flange two (3) is installed on the second interface (102), and the inner-welded flange two (3) is fixedly connected to a blind flange (6).

5. A high-vacuum system for measuring the surface emissivity of a highly active 63 Ni electroplating source, characterized in that A switch door (7) is hingedly provided at the top of the vacuum pipeline (1).

6. A high-vacuum system for measuring the surface emissivity of a Ni electroplating source with high activity as claimed in claim 1, characterized in that, 63 the system is used for measuring the surface emissivity of a Ni electroplating source with high activity, The vacuum degree inside the pipeline should reach at least 1×10 -2 Pa.

7. A high-vacuum system for measuring the surface emissivity of a high-activity 63 Ni electroplating source, characterized in that The material of the vacuum pipeline (1) is 304 stainless steel.

8. A high-vacuum system for measuring the surface emissivity of a Ni electroplating source with high activity according to claim 1, characterized in that, 63 A differential pressure valve (10) is provided at the air suction port of the mechanical pump (9).

9. A high-vacuum system for measuring the surface emissivity of a Ni electroplating source with high activity as claimed in claim 1, characterized in that, 63 The pumping speed of the mechanical pump (9) is 8 L / s, and the pumping speed of the molecular pump (8) is 650 L / s.

10. A high-vacuum system for measuring the surface emissivity of a high-activity 63 Ni electroplating source, characterized in that The resistance gauge (12) measures a vacuum range of 1.0×10 5 to 1×10 -1 Pa, and the cold cathode gauge (11) measures a vacuum range of 1.0×10 -1 Pa to 1×10 -6 Pa.

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