Roll-to-roll vacuum deposition equipment

Abstract

The utility model discloses roll-to-roll vacuum deposition equipment, and relates to the technical field of thin film deposition. The roll-to-roll vacuum deposition equipment comprises a winding and unwinding chamber, a deposition chamber, a control valve, a vacuumizing device, an unwinding mechanism and a winding mechanism, the winding and unwinding chamber is selectively communicated with the deposition chamber through a control valve, and the vacuumizing device is communicated with the deposition chamber; the unwinding mechanism and the winding mechanism are both contained in the winding and unwinding chamber, and the unwinding mechanism is used for unwinding the flexible substrate; the winding mechanism is used for winding the flexible substrate which passes through the deposition chamber after being unwound; the deposition chamber is used for conducting thin film deposition treatment on the flexible substrate penetrating through the deposition chamber. According to the roll-to-roll vacuum deposition equipment provided by the utility model, the production cost can be reduced, the control process can be simplified, and the pressure relationship between the winding and unwinding chamber and the deposition chamber can be accurately controlled.

Description

Technical Field

[0001] The utility model relates to the technical field of thin film deposition, and in particular, to a roll-to-roll vacuum deposition device. Background Art

[0002] There are some roll-to-roll vacuum deposition devices on the market, which are used for continuous surface thin film deposition on flexible substrates.

[0003] For such devices, the unwind and rewind chambers and the deposition chamber are respectively equipped with independent vacuum systems, and the vacuum degrees of the two are independently adjusted through their respective vacuum systems, resulting in too high production costs, and the control process is cumbersome and complex, making it difficult to accurately control the pressure relationship between the unwind and rewind chambers and the deposition chamber. Summary of the Utility Model

[0004] The purpose of the utility model is to provide a roll-to-roll vacuum deposition device, which can reduce production costs and simplify the control process, and can also accurately control the pressure relationship between the unwind and rewind chambers and the deposition chamber.

[0005] An embodiment of the utility model provides a technical solution:

[0006] A roll-to-roll vacuum deposition device includes an unwind and rewind chamber, a deposition chamber, a control valve, a vacuum pumping device, an unwind mechanism and a rewind mechanism; the unwind mechanism is accommodated in the unwind and rewind chamber and is used for unwinding a flexible substrate; the rewind mechanism is accommodated in the unwind and rewind chamber and is used for rewinding the flexible substrate that has passed through the deposition chamber after unwinding; the flexible substrate completes thin film deposition during the process of passing through the deposition chamber; the control valve is arranged between the unwind and rewind chamber and the deposition chamber and is used for connecting or disconnecting the unwind and rewind chamber and the deposition chamber; the vacuum pumping device is communicated with the deposition chamber.

[0007] In the prior art, in addition to pumping the deposition chamber to vacuum to meet the deposition reaction conditions, in order to prevent the flexible substrate from being contaminated by air molecules in the unwind and rewind chamber and to avoid the flexible substrate from jittering on the conveying path due to air resistance or turbulence, it is also necessary to pump the unwind and rewind chamber to a certain degree of vacuum.

[0008] In the roll-to-roll vacuum deposition equipment provided by the embodiment of the present utility model, in the state where the control valve is opened, the evacuation device evacuates the deposition chamber, and the simultaneous evacuation treatment of the unwinding / winding chamber and the deposition chamber can be achieved. After the control valve is switched to the closed state, during the process of depositing a thin film on the flexible substrate in the deposition chamber, the evacuation device continues to operate, which can ensure that the pressure in the unwinding / winding chamber is greater than the pressure in the deposition chamber, realizing simple and precise control of the pressure relationship between the unwinding / winding chamber and the deposition chamber, eliminating the complex control process, ensuring that the gas in the unwinding / winding chamber continuously flows into the deposition chamber through the conveying path of the flexible substrate, and achieving the effect of preventing dust from overflowing outside the deposition chamber. Therefore, the roll-to-roll vacuum deposition equipment provided by the embodiment of the present utility model can reduce production costs and simplify the control process, and can also precisely control the pressure relationship between the unwinding / winding chamber and the deposition chamber. BRIEF DESCRIPTION OF THE DRAWINGS

[0009] In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present utility model, and therefore should not be regarded as limiting the scope. For those of ordinary skill in the art, other related drawings can also be obtained based on these drawings without creative efforts.

[0010] Figure 1 It is a schematic structural diagram of the roll-to-roll vacuum deposition equipment provided by the embodiment of the present utility model;

[0011] Figure 2 It is a schematic structural diagram of the roll-to-roll vacuum deposition equipment provided by the embodiment of the present utility model in specific applications;

[0012] Figure 3 For Figure 2 It is a schematic structural diagram inside the deposition chamber in

[0013] Figure 4 It is a schematic structural diagram of the roll-to-roll vacuum deposition equipment provided by another embodiment of the present utility model in actual applications.

[0014] Icons: 10 - flexible substrate; 100 - roll-to-roll vacuum deposition equipment; 110 - unwind and rewind chamber; 120 - deposition chamber; 130 - control valve; 140 - evacuation device; 150 - unwind mechanism; 160 - rewind mechanism; 170 - slit module; 181 - first support roller; 182 - second support roller; 183 - third support roller; 190 - preheating module; 200 - ALD system; 210 - spray module; 211 - reaction gas spray part; 212 - isolation gas spray part; 213 - air extraction part; 220 - heating module; 230 - deposition channel; 300 - PECVD system; 310 - upper electrode spray part; 320 - lower electrode; 330 - top heating part; 340 - bottom heating part; 350 - RF power supply. Detailed implementation manners

[0015] To make the objectives, technical solutions and advantages of the embodiments of the present utility model clearer, the technical solutions in the embodiments of the present utility model will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are some but not all of the embodiments of the present utility model. The components of the embodiments of the present utility model usually described and illustrated in the accompanying drawings here can be arranged and designed in various different configurations.

[0016] Therefore, the following detailed description of the embodiments of the present utility model provided in the accompanying drawings is not intended to limit the scope of the present utility model claimed, but merely represents selected embodiments of the present utility model. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present utility model without creative efforts fall within the scope of protection of the present utility model.

[0017] It should be noted that: Similar reference numerals and letters denote similar items in the following drawings. Therefore, once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings.

[0018] In the description of the present utility model, it should be understood that the orientation or positional relationship indicated by the terms "upper", "lower", "inner", "outer", "left", "right", etc. is based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship when the product of the present utility model is normally placed, or the orientation or positional relationship commonly understood by those skilled in the art. It is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as a limitation of the present utility model.

[0019] In addition, the terms "first", "second", etc. are only used for distinguishing descriptions and cannot be understood as indicating or implying relative importance.

[0020] In the description of the present utility model, it should also be noted that, unless otherwise clearly specified and defined, terms such as "arrangement" and "connection" should be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, and it can be the communication inside two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

[0021] The following will combine with the attached drawings to elaborate in detail on the specific implementation manners of the present utility model.

[0022] Embodiment

[0023] Please refer to Figure 1 , Figure 1 The structure diagram of the roll-to-roll vacuum deposition device 100 provided in this embodiment is shown as follows.

[0024] The roll-to-roll vacuum deposition device 100 provided in this embodiment includes a rewinding and unwinding chamber 110, a deposition chamber 120, a control valve 130, a vacuum pumping device 140, an unwinding mechanism 150, and a winding mechanism 160. A control valve 130 is arranged between the rewinding and unwinding chamber 110 and the deposition chamber 120. By switching the working state, the control valve 130 connects or cuts off the communication between the rewinding and unwinding chamber 110 and the deposition chamber 120; the vacuum pumping device 140 is connected to the deposition chamber 120 and is used to pump vacuum for the deposition chamber 120; both the unwinding mechanism 150 and the winding mechanism 160 are placed in the rewinding and unwinding chamber 110. The unwinding mechanism 150 is used to unwind the flexible substrate 10, and the winding mechanism 160 is used to wind the unwound flexible substrate 10. During the movement from the unwinding mechanism 150 to the winding mechanism 160, the flexible substrate 10 passes through the deposition chamber 120, and thin film deposition is completed in the deposition chamber 120.

[0025] In practical applications, when the vacuum pumping device 140 is operated with the control valve 130 kept open, since the rewinding and unwinding chamber 110 and the deposition chamber 120 are in a connected state, synchronous vacuum pumping for the rewinding and unwinding chamber 110 and the deposition chamber 120 can be achieved. Moreover, when performing a roll change operation, it is necessary to release the vacuum in the rewinding and unwinding chamber 110 and the deposition chamber 120, and synchronous release of the rewinding and unwinding chamber 110 and the deposition chamber 120 can be achieved by opening the control valve 130. Compared with the prior art in which independent vacuum systems are respectively configured for the rewinding and unwinding chamber 110 and the deposition chamber 120 to operate independently, the device structure can be greatly simplified, the production cost can be reduced, and the control process of vacuum pumping can be simplified.

[0026] After the evacuation device 140 operates for a period of time, after the control valve 130 is switched from the open state to the closed state, the unwinding / winding chamber 110 and the deposition chamber 120 are in a substantially separated state, and they are only slightly connected through the conveying path of the flexible substrate 10. In this state, the evacuation device 140 continues to operate, the pressure in the deposition chamber 120 further decreases, and the gas in the unwinding / winding chamber 110 continuously flows into the deposition chamber 120 through the conveying path of the flexible substrate 10, achieving the effect of preventing dust from overflowing outside the deposition chamber.

[0027] It can be understood that during the deposition process, the evacuation device 140 continuously operates, and the pressure in the deposition chamber 120 is dynamically adjusted through the valve arranged on the connecting pipeline between the evacuation device 140 and the deposition chamber 120, so that during the continuous introduction of the reaction gas into the deposition chamber 120, the pressure in the deposition chamber 120 can be dynamically maintained near the set process pressure.

[0028] Moreover, in order to ensure that the pressure in the unwinding / winding chamber 110 is always slightly greater than the process pressure in the deposition chamber 120, so as to ensure that the gas in the unwinding / winding chamber 110 can continuously flow into the deposition chamber 120, the unwinding / winding chamber 110 can be continuously supplemented with gas in practical applications.

[0029] It can be seen that by controlling the control valve 130, the pressure relationship between the unwinding / winding chamber 110 and the deposition chamber 120 can be simply and accurately controlled, so that the pressure in the unwinding / winding chamber 110 is higher than the pressure in the deposition chamber 120, ensuring that during the subsequent process of depositing a thin film on the flexible substrate 10, the dust in the deposition chamber 120 will not overflow into the unwinding / winding chamber 110.

[0030] In addition, in the prior art where independent vacuum systems are respectively used for the evacuation control of the unwinding / winding chamber 110 and the deposition chamber 120, in practical applications, when the vacuum system configured for either the unwinding / winding chamber 110 or the deposition chamber 120 fails, the process will be interrupted, and the probability of process interruption is relatively high.

[0031] However, for the roll-to-roll vacuum deposition equipment 100 provided in this embodiment, only the deposition chamber 120 is configured with an evacuation device 140, and the indirect control of the vacuum degree of the unwinding / winding chamber 110 is realized by configuring a control valve 130 between the unwinding / winding chamber 110 and the deposition chamber 120. The unwinding / winding chamber 110 is not additionally configured with a vacuum system, and the failure probability is reduced. And if the control valve 130 fails, its replacement cost is much lower than that of the evacuation device 140, reducing the production cost.

[0032] In fact, in this embodiment, a pipeline is connected between the reel chamber 110 and the deposition chamber 120, and the control valve 130 is arranged on the pipeline to control the on and off of the pipeline. It can be understood that when the control valve 130 is opened, the pipeline is connected, that is, the reel chamber 110 is connected to the deposition chamber 120; when the control valve 130 is closed, the pipeline is disconnected, that is, the reel chamber 110 is isolated from the deposition chamber 120. In other embodiments, the configuration of the pipeline can be omitted, and the reel chamber 110 is directly connected to the deposition chamber 120 through the control valve 130.

[0033] The control valve 130 can be selected according to the actual application conditions, and can be either an electric control valve or a manual valve. In this embodiment, in order to realize the automatic control of the equipment, the control valve 130 is an electric control valve. The roll-to-roll vacuum deposition equipment 100 provided in this embodiment also has a controller, which is electrically connected to the control valve 130, the vacuum pumping device 140, the valve arranged on the pipeline connecting the vacuum pumping device 140 and the deposition chamber 120, the unwinding mechanism 150 and the winding mechanism 160, respectively. The controller uniformly controls the state switching of the control valve 130, the state of the vacuum pumping device 140, the opening of the valve arranged on the pipeline connecting the vacuum pumping device 140 and the deposition chamber 120, and the forward and reverse rotation of the unwinding mechanism 150 and the winding mechanism 160.

[0034] To ensure the integrity of the overall structure of the device, the deposition chamber 120 is at least partially contained in the reel chamber 110, and the flexible substrate 10 enters and exits the deposition chamber 120 from the portion of the deposition chamber 120 contained in the reel chamber 110. Preferably, in this embodiment, the deposition chamber 120 is completely contained in the reel chamber 110.

[0035] It can be understood that since the deposition chamber 120 is completely contained in the reel-up chamber 110, the flexible substrate 10 led out by the unwinding mechanism 150 can directly pass through the side wall of the deposition chamber 120 to enter or exit the deposition chamber 120, without the need to build an additional vacuum channel for conveying the flexible substrate 10 between the reel-up chamber 110 and the deposition chamber 120, thereby making the overall structure of the roll-to-roll vacuum deposition equipment 100 more compact and complete.

[0036] In order to ensure that the flexible substrate 10 can move normally between the winding and unwinding chamber 110 and the deposition chamber 120 while maintaining the relative independence of the winding and unwinding chamber 110 and the deposition chamber 120 as much as possible, in this embodiment, two slit modules 170 are provided on the deposition chamber 120, and the flexible substrate 10 enters the deposition chamber 120 through one of the two slit modules 170 and exits the deposition chamber 120 through the remaining one of the two slit modules 170.

[0037] Specifically, in this embodiment, the two slit modules 170 are respectively arranged on opposite sides of the deposition chamber 120, and the two slits corresponding to the two slit modules 170 are substantially on the same horizontal line, so that the flexible substrate 10 can pass through the deposition chamber 120 while maintaining a horizontal state, having better stability.

[0038] It can be understood that due to the arrangement of the slit module 170, when the control valve 130 is closed, the unwinding and rewinding chamber 110 and the deposition chamber 120 are basically separated, so that the process environment in the deposition chamber 120 can be basically maintained, ensuring the quality of thin film deposition. In this embodiment, the two slit modules 170 and the deposition chamber 120 are integrally formed. In other embodiments, connection methods such as welding and bonding can also be used to fix the slit module 170 on the deposition chamber 120.

[0039] In practical applications, since the pressure in the unwinding and rewinding chamber 110 is higher than that in the deposition chamber 120, the gas in the unwinding and rewinding chamber 110 can flow through the two slit modules 170 to the deposition chamber 120, thereby preventing the dust in the deposition chamber 120 from entering the unwinding and rewinding chamber 110 and contaminating the flexible substrate 10 before it enters the deposition chamber 120.

[0040] In this embodiment, to make the overall structure more compact, both the rewinding mechanism 160 and the unwinding mechanism 150 are arranged directly below the deposition chamber 120 vertically. The flexible substrate 10 led out by the unwinding mechanism 150 enters from one horizontal side of the deposition chamber 120 and exits from the other horizontal side of the deposition chamber 120. On this conveying path, the flexible substrate 10 will inevitably deflect between the vertical and horizontal directions. To solve this problem, support rollers are arranged at both horizontal ends of the deposition chamber 120 to support and guide the deflection of the flexible substrate 10 between the vertical and horizontal directions.

[0041] To obtain better thin film deposition effect, the roll-to-roll vacuum deposition equipment provided in this embodiment further includes a preheating module. The preheating module 190 is arranged in the unwinding and rewinding chamber 110 and is used to heat the flexible substrate 10 before it enters the deposition chamber 120, so that the flexible substrate 10 enters the deposition chamber 120 in a state with an initial temperature meeting the process requirements.

[0042] The preheating module can be an electric heater. By controlling the input power, the heating effect of the electric heater can be adjusted, thereby realizing the conditioning of the preheating temperature of the flexible substrate 10. To obtain a more ideal preheating effect, in this embodiment, the preheating module includes two heating units. The two heating units are of a split structure, and a heating channel is formed between them. The flexible substrate 10 passes through the heating channel between the two heating units and then enters the deposition chamber 120.

[0043] During the process of the flexible substrate 10 passing through the heating channel between the two heating units, the two heating units respectively heat the opposite two side surfaces in the thickness direction of the flexible substrate 10, so as to ensure the heating uniformity of the flexible substrate 10 and improve the film deposition effect when entering the deposition chamber 120 subsequently.

[0044] The roll-to-roll vacuum deposition apparatus 100 provided in this embodiment further includes a first support roller 181, a second support roller 182, and a third support roller 183. The first support roller 181, the second support roller 182, and the third support roller 183 are arranged in sequence between the unwinding mechanism 150 and the winding mechanism 160. The flexible substrate 10 led out by the unwinding mechanism 150 passes through the first support roller 181, the second support roller 182, and the third support roller 183 in sequence and then reaches the winding mechanism 160.

[0045] In this embodiment, the first support roller 181 and the second support roller 182 are arranged in the first direction, and the preheating module 190 is located between the first support roller 181 and the second support roller 182. The second support roller 182 and the third support roller 183 are arranged in the second direction, and the deposition chamber 120 is located between the second support roller 182 and the third support roller 183. In order to improve the space utilization rate in the unwinding and winding chamber 110 and thus improve the overall structural compactness of the roll-to-roll vacuum deposition apparatus 100, the first direction and the second direction form an angle.

[0046] Preferably, in this embodiment, the first direction is the vertical direction and the second direction is the horizontal direction. That is, a heating channel extending in the vertical direction is formed between the two heating units of the preheating module 190 in this embodiment. Please refer to Figure 2 and Figure 3 , Figure 2 which shows the structural schematic diagram of the roll-to-roll vacuum deposition apparatus 100 provided in this embodiment in specific application, Figure 3 shown as Figure 2 the structural schematic diagram inside the deposition chamber 120 in

[0047] For the roll-to-roll vacuum deposition apparatus 100 provided in this embodiment, its deposition chamber 120 can perform atomic layer deposition on the passing flexible substrate 10, that is, an ALD system 200 is provided inside the deposition chamber 120. The ALD system 200 includes a spray module 210 and a heating module 220 arranged at intervals, and a deposition channel 230 located between the spray module 210 and the heating module 220. The flexible substrate 10 passes through the deposition channel 230.

[0048] It can be understood that the spray module 210 is used to spray reaction gases in sub-regions along the deposition channel 230 during the process of the flexible substrate 10 passing through the deposition channel 230, so that the flexible substrate 10 passes through different reaction gas atmosphere fields in sequence, thereby completing film deposition on the surface.

[0049] During the process of the flexible substrate 10 passing through the deposition chamber 120, the heating module 220 continuously heats the flexible substrate 10 to maintain the process temperature. For the convenience of precise control of the heating temperature, the heating module 220 can also be an electric heater.

[0050] In this embodiment, the spraying module 210 has a plurality of deposition units, and the plurality of deposition units are arranged in sequence along the deposition channel 230. Each deposition unit includes a variety of reaction gas spraying members 211, and the variety of reaction gas spraying members 211 are arranged in sequence along the deposition channel 230 for spraying different reaction gases respectively. The deposition unit further includes an isolation gas spraying member 212 and an air extraction member 213, and the isolation gas spraying member 212 and the air extraction member 213 are arranged between any two adjacent reaction gas spraying members 211.

[0051] In the same deposition unit, the variety of reaction gas spraying members 211 spray different reaction gases respectively, so as to sequentially form a plurality of reaction gas atmosphere fields in the extending direction of the deposition channel 230. The isolation gas spraying member 212 is used to spray the isolation gas into the deposition channel 230, so as to form an isolation gas atmosphere field between any two adjacent reaction gas atmosphere fields, realizing the effective isolation of different reaction gas atmosphere fields.

[0052] The air extraction member 213 is used to extract the reaction gas and the isolation gas from the deposition channel 230 between two reaction gas atmosphere fields, realizing the reflux of the reaction gas and the isolation gas, avoiding gas residue, further preventing cross-contamination of different reaction gases, and ensuring the purity and uniformity of the deposited film.

[0053] Actually, in this embodiment, at both ends of the arrangement queue composed of a plurality of reaction gas spraying members 211 in the same deposition unit, the isolation gas spraying member 212 and the air extraction member 213 are also arranged respectively, aiming to isolate the two ends of the deposition channel 230 from the environment in the deposition chamber 120 and prevent other gases in the deposition chamber 120 from flowing into the deposition channel 230 and affecting the quality of the deposited film.

[0054] Preferably, in this embodiment, whether between two adjacent reaction gas spraying members 211 or at both ends of the arrangement queue composed of a plurality of reaction gas spraying members 211, one isolation gas spraying member 212 and two air extraction members 213 are arranged, and in the extending direction of the deposition channel 230, the isolation gas spraying member 212 is located between the two air extraction members 213.

[0055] Therefore, between any two adjacent reaction gas spray members 211 in the spray module 210, two air extraction members 213 and one isolation gas spray member 212 are arranged, and the isolation member spray member is located between the two air extraction members 213. In practical applications, one of the two air extraction members 213 can extract the reaction gas sprayed by an adjacent reaction gas spray member 211 and the isolation gas sprayed by the isolation gas spray member 212; the remaining one of the two air extraction members 213 can extract the reaction gas sprayed by the other adjacent reaction gas spray member 211 and the isolation gas sprayed by the isolation gas spray member 212. This avoids the isolation gas from entering the reaction gas atmosphere and also avoids the mixing of two adjacent reaction gases.

[0056] In this embodiment, the reaction gas spray members 211 that spray the same reaction gas in multiple deposition units are connected through a shunt pipe and are connected to an external specific reaction gas supply source through the same main pipeline. In other words, for any kind of reaction gas, its supply source is input into the shunt pipe in the deposition chamber 120 through the main pipeline, and then the reaction gas is shunted to multiple reaction gas spray members 211 through the shunt pipe, so that multiple reaction gas spray members 211 spray to form multiple reaction gas atmosphere fields with the same composition in the deposition channel 230.

[0057] In this embodiment, there are two types of reaction gases, namely an oxygen source reaction gas and a metal source reaction gas. That is, there are two corresponding types of reaction gas spray members 211. One is used to spray the oxygen source reaction gas, and the other is used to spray the metal source reaction gas. The multiple reaction gas spray members 211 for spraying the oxygen source reaction gas form an integral pipeline, and the multiple reaction gas spray members 211 for spraying the metal source reaction gas form another integral pipeline.

[0058] In this embodiment, multiple isolation gas spray members 212 spray the same kind of isolation gas. The multiple isolation gas spray members 212 are also connected through a shunt pipe and are connected to an external specific isolation gas supply source through the same main pipeline. In practical applications, the isolation gas supply source is input into the shunt pipe in the deposition chamber 120 through the main pipeline, and then the reaction gas is shunted to multiple isolation gas spray members 212 through the shunt pipe, so that multiple isolation gas spray members 212 spray to form multiple isolation gas atmosphere fields in the deposition channel 230. In this embodiment, the isolation gas is nitrogen. In other embodiments, other gases other than nitrogen can also be selected as the isolation gas according to actual application conditions.

[0059] All the air extraction members 213 in the spray module 210 form an independent air extraction pipeline. This air extraction pipeline extends out of the deposition chamber 120 through a main pipeline and is connected to an air extraction device. When the air extraction device outside the deposition chamber 120 operates, all the air extraction members 213 in the spray module 210 extract air simultaneously.

[0060] It is understandable that in this embodiment, one deposition unit in the spraying module 210 can complete one ALD reaction. During the process that the flexible substrate 10 sequentially passes through multiple deposition units, multiple ALD reactions can be completed on its surface.

[0061] Limited by the sizes of the deposition chamber 120 and the spraying module 210, if the required film thickness of the flexible substrate 10 is relatively large, the same area on the flexible substrate 10 can be reciprocated multiple times in the deposition channel 230 by controlling the synchronous forward and reverse rotation of the unwinding mechanism 150 and the winding mechanism 160, so as to achieve multiple film depositions, and finally obtain a film thickness that meets the requirements and then leave the deposition channel 230.

[0062] The roll-to-roll vacuum deposition device 100 provided in this embodiment is equipped with the function of performing atomic layer deposition on the flexible substrate 10 by arranging the ALD system 200 in the deposition chamber 120. In another embodiment, according to actual application conditions, the specific type of the deposition system arranged in the deposition chamber 120 can also be replaced.

[0063] For example, if plasma-enhanced chemical vapor deposition needs to be performed on the flexible substrate 10, the ALD system 200 can be replaced with the PECVD system 300; if physical vapor deposition needs to be performed on the flexible substrate 10, the ALD system 200 can be replaced with the PVD system; if evaporation needs to be performed on the flexible substrate 10, the ALD system 200 can be replaced with an evaporation system, and so on.

[0064] Please refer to Figure 4 , Figure 4 which shows a schematic structural diagram of the roll-to-roll vacuum deposition device 100 provided in another embodiment in actual application.

[0065] In this embodiment, the ALD system 200 in the deposition chamber 120 is replaced with the PECVD system 300, and the roll-to-roll vacuum deposition device 100 provided in this embodiment is equipped with the function of performing plasma-enhanced chemical vapor deposition on the flexible substrate 10.

[0066] In this embodiment, the PECVD system 300 includes an upper electrode spraying part 310, a lower electrode 320, a top heating part 330 and a bottom heating part 340. The upper electrode spraying part 310 and the lower electrode 320 are arranged at intervals. Actually, the PECVD system 300 further includes a radio frequency power supply 350 arranged outside the deposition chamber 120, and the upper electrode spraying part 310 and the lower electrode 320 are respectively electrically connected to the radio frequency power supply 350.

[0067] The flexible substrate 10 passes through between the upper electrode spraying member 310 and the lower electrode 320. Besides serving as a radio frequency electrode, the upper electrode spraying member 310 is also used to introduce external reaction gas into the deposition chamber 120 and perform spraying. The top heating member 330 is disposed on the side of the upper electrode spraying member 310 facing away from the lower electrode 320, and the bottom heating member 340 is disposed on the side of the lower electrode 320 facing away from the upper electrode spraying member 310.

[0068] In practical applications, the upper electrode spraying member 310 sprays the reaction gas between the upper electrode spraying member 310 and the lower electrode 320, that is, in the area where the flexible substrate 10 passes through. The radio frequency power supply 350 discharges through the upper electrode spraying member 310 to generate plasma. The high-energy particles in the plasma collide with the reaction gas molecules, decompose the reaction gas molecules into active species such as free radicals, atoms, ions, etc., and make them in an excited state. These active species react with the surface of the flexible substrate 10 to form a uniform film layer, that is, thin film deposition is achieved.

[0069] It can be seen that the roll-to-roll vacuum deposition equipment 100 provided in this embodiment can configure deposition systems with different functions in the deposition chamber 120 according to actual application conditions, so as to have deposition functions based on different principles and meet different process requirements.

[0070] The roll-to-roll vacuum deposition equipment 100 provided in this embodiment can realize synchronous vacuum pumping of the unwind and rewind chamber 110 and the deposition chamber 120 when the control valve 130 is kept open and the vacuum pumping device 140 is operated. Moreover, when performing a roll change operation, synchronous release of the unwind and rewind chamber 110 and the deposition chamber 120 can be achieved by opening the control valve 130.

[0071] In other words, the roll-to-roll vacuum deposition equipment 100 provided in this embodiment realizes synchronous vacuum processing of the unwind and rewind chamber 110 and the deposition chamber 120 by only configuring one vacuum pumping device 140. Compared with the prior art in which independent vacuum systems are respectively configured for the unwind and rewind chamber 110 and the deposition chamber 120, the equipment structure can be greatly simplified, the production cost can be reduced, and the control process of vacuum processing can be simplified. Moreover, by closing the control valve 130 and the vacuum pumping device 140 successively, the pressure relationship between the unwind and rewind chamber 110 and the deposition chamber 120 can be simply and accurately controlled.

[0072] It should be noted that in another embodiment, the number of the vacuum pumping devices 140 can be two or more, and all the vacuum pumping devices 140 are communicated with the deposition chamber 120.

[0073] In this set of embodiments, in the early stage of the process, multiple vacuum pumping devices 140 are controlled to operate together to achieve rapid vacuum pumping and quickly reach the deposition process conditions. During the deposition process, a part of the multiple vacuum pumping devices 140 is controlled to maintain operation, and the remaining vacuum pumping devices 140 are shut down as spares to prevent the process from being interrupted due to the failure of the operating vacuum pumping devices 140.

[0074] In summary, the roll-to-roll vacuum deposition equipment 100 provided in this embodiment can reduce production costs and simplify the control process, and can also accurately control the pressure relationship between the unwinding / winding chamber 110 and the deposition chamber 120.

[0075] The above are only the preferred embodiments of the present invention and are not intended to limit the present invention. For those skilled in the art, the present invention can have various changes and modifications. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims

1. A roll-to-roll vacuum deposition device, characterized in that, It includes a winding and unwinding chamber (110), a deposition chamber (120), a control valve (130), a vacuum pumping device (140), an unwinding mechanism (150) and a winding mechanism (160); The winding and unwinding chamber (110) is selectively communicated with the deposition chamber (120) through the control valve (130), and the vacuum pumping device (140) is communicated with the deposition chamber (120); Both the unwinding mechanism (150) and the winding mechanism (160) are accommodated in the winding and unwinding chamber (110). The unwinding mechanism (150) is used for unwinding the flexible substrate (10); the winding mechanism (160) is used for winding the flexible substrate (10) that passes through the deposition chamber (120) after unwinding; The deposition chamber (120) is used for performing thin film deposition treatment on the flexible substrate (10) passing through its interior.

2. The roll-to-roll vacuum deposition equipment according to claim 1, characterized in that, At least part of the deposition chamber (120) is accommodated in the winding and unwinding chamber (110), and the flexible substrate (10) enters and exits the deposition chamber (120) through the part of the deposition chamber (120) accommodated in the winding and unwinding chamber (110).

3. The roll-to-roll vacuum deposition equipment according to claim 1, characterized in that, Two slit modules (170) are provided in the deposition chamber (120), and the flexible substrate (10) enters the deposition chamber (120) through one of the two slit modules (170) and exits the deposition chamber (120) through the remaining one of the two.

4. The roll-to-roll vacuum deposition equipment according to claim 1, characterized in that, The roll-to-roll vacuum deposition equipment (100) further includes a preheating module (190), and the preheating module (190) is accommodated in the winding and unwinding chamber (110) and is used for heating the flexible substrate (10) before the flexible substrate (10) enters the deposition chamber (120).

5. The roll-to-roll vacuum deposition apparatus according to claim 4, characterized in that, The roll-to-roll vacuum deposition equipment (100) further includes a first support roller (181), a second support roller (182) and a third support roller (183) for supporting the flexible substrate (10). The first support roller (181), the second support roller (182) and the third support roller (183) are arranged in sequence between the unwinding mechanism (150) and the winding mechanism (160); The first support roller (181) and the second support roller (182) are arranged in a first direction, and the preheating module (190) is located between the first support roller (181) and the second support roller (182); the second support roller (182) and the third support roller (183) are arranged in a second direction, and the deposition chamber (120) is located between the second support roller (182) and the third support roller (183). The first direction and the second direction form an angle.

6. The roll-to-roll vacuum deposition equipment according to claim 1, wherein, An ALD system (200) is provided in the deposition chamber (120). The ALD system (200) includes a spraying module (210) and a heating module (220) arranged at intervals, and a deposition channel (230) located between the spraying module (210) and the heating module (220). The flexible substrate (10) passes through the deposition channel (230).

7. The roll-to-roll vacuum deposition apparatus according to claim 6, wherein, The spray module (210) has a plurality of deposition units arranged in sequence along the deposition channel (230). Each deposition unit includes a plurality of reaction gas spray members (211) arranged in sequence, and an isolation gas spray member (212) and an air extraction member (213) arranged between any two adjacent reaction gas spray members (211).

8. The roll-to-roll vacuum deposition apparatus according to claim 1, characterized in that, A PECVD system (300) is provided in the deposition chamber (120). The PECVD system (300) includes an upper electrode spray member (310), a lower electrode (320), a top heating member (330), and a bottom heating member (340). The upper electrode spray member (310) and the lower electrode (320) are arranged at intervals. The flexible substrate (10) passes between the upper electrode spray member (310) and the lower electrode (320). The top heating member (330) is provided on a side of the upper electrode spray member (310) facing away from the lower electrode (320), and the bottom heating member (340) is provided on a side of the lower electrode (320) facing away from the upper electrode spray member (310).

9. The roll-to-roll vacuum deposition equipment according to claim 8, wherein The PECVD system (300) further includes a radio frequency power supply (350). The radio frequency power supply (350) is provided outside the unwinding / rewinding chamber (110) and the deposition chamber (120), and is electrically connected to the upper electrode spray member (310) and the lower electrode (320).

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