Photomask purging system

Abstract

The embodiment of the utility model provides a photomask blowing system. The photomask blowing system comprises a bearing device, a blowing device and a control device, the first sliding rail is located above the bearing device and extends in the first direction; the second sliding rail is located above the bearing device and extends in the second direction, the second sliding rail is further in sliding fit with the first sliding rail in the first direction, and the first direction is different from the second direction; the purging piece is located on the second sliding rail and is in sliding fit with the second sliding rail in the second direction; and the control device is electrically connected with the second sliding rail and is used for adjusting the position information of the second sliding rail in the first direction, and is electrically connected with the purging piece and is used for adjusting the position information of the purging piece in the second direction. By adopting the technical scheme, the amount of pollutants on the surface of the photomask can be reduced, only the polluted area of the photomask but not the unpolluted area of the photomask can be swept, the damage of a protective film on the surface of the photomask caused by unnecessary sweeping is reduced, and the yield of a chip is further improved.

Description

Technical Field

[0001] An embodiment of the present utility model relates to the technical field of semiconductors, and particularly to a photomask purging system. Background Art

[0002] In the photolithography process stage of the semiconductor manufacturing process, the pattern on the photomask can be transferred to the photoresist; the surface of the photomask is easily contaminated by pollutants such as airborne particles and gas molecules, and these pollutants will adsorb on the surface of the photomask, resulting in defects in the pattern on the photoresist when the pattern on the photomask is transferred to the photoresist, resulting in defects in the pattern on the wafer and reducing the yield of the chip. Therefore, how to provide a technical solution to improve the yield of the chip has become an urgent technical problem to be solved. Content of the Utility Model

[0003] In view of this, an embodiment of the present utility model provides a photomask purging system, which can improve the yield of the chip.

[0004] An embodiment of the present utility model provides a photomask purging system, including:

[0005] A carrying device for carrying the photomask;

[0006] A first slide rail located above the carrying device and extending in a first direction;

[0007] A second slide rail located above the carrying device and extending in a second direction, and the second slide rail is also slidably engaged with the first slide rail in the first direction, wherein the first direction is different from the second direction;

[0008] A purging member located on the second slide rail, and the purging member is slidably engaged with the second slide rail in the second direction;

[0009] A control device electrically connected to the second slide rail to adjust the position information of the second slide rail in the first direction, and electrically connected to the purging member to adjust the position information of the purging member in the second direction.

[0010] Optionally, the photomask purging system further includes:

[0011] A detection device electrically connected to the control device to detect the position information of the surface pollutants of the photomask.

[0012] Optionally, the detection device includes:

[0013] A laser emitter located above the carrying device and emitting a detection signal to the photomask;

[0014] A laser receiver located above the carrying device and receiving the echo signal reflected by the photomask.

[0015] Optionally, the carrying device includes:

[0016] A base;

[0017] A first support portion and a second support portion, which are oppositely arranged and located on the base;

[0018] And a clamping assembly for clamping the photomask, and two ends of the clamping assembly are respectively connected to the first support portion and the second support portion.

[0019] Optionally, the carrying device further includes: a rotating assembly;

[0020] The clamping assembly is rotationally engaged with the first support portion and the second support portion about a first axis through the rotating assembly.

[0021] Optionally, a first rotation hole coaxial with the first axis is formed in the first support portion, and a second rotation hole coaxial with the first axis is formed in the second support portion;

[0022] The rotating assembly includes:

[0023] A driving motor fixed to the first support portion, the driving motor has a driving shaft about the first axis, and the driving motor is electrically connected to the control device;

[0024] A first rotating shaft, one end of the first rotating shaft is fixed to the clamping assembly, and the other end passes through the first rotation hole and is connected to the driving shaft;

[0025] A second rotating shaft, one end of the second rotating shaft is fixed to the clamping assembly, and the other end passes through the second rotation hole.

[0026] Optionally, the clamping assembly includes:

[0027] A stage;

[0028] A first clamping member located on the stage and rotationally engaged with the first support portion about the first axis;

[0029] A second clamping member located on the stage and rotationally engaged with the second support portion about the first axis;

[0030] The first clamping member and the second clamping member are oppositely arranged along the direction of the first axis;

[0031] The first clamping member and / or the second clamping member are electrically connected to the control device to controllably adjust the distance between the first clamping member and the second clamping member.

[0032] Optionally, the first support member and / or the second support member includes a hydraulic rod.

[0033] Optionally, the stage has purge holes for exposing the surface of the photomask in contact with the stage.

[0034] Optionally, the first direction is perpendicular to the second direction.

[0035] Compared with the prior art, the technical solution of the embodiment of the present invention has the following advantages:

[0036] In the photomask purging system provided by the embodiment of the present invention, the purging member is located on the second slide rail, and the second slide rail is slidably engaged with the first slide rail along the first direction. By adjusting the position information of the second slide rail in the first direction through the control device, the position information of the purging member in the first direction can be adjusted, so that the purging member can purge the photomask along the first direction; the purging member is slidably engaged with the second slide rail along the second direction, and through the control device, the position information of the purging member in the second direction can be adjusted, so that the purging member can purge the photomask along the second direction; since the first direction and the second direction are different, the purging member can perform fixed-point purging on the photomask, thereby reducing the amount of contaminants on the surface of the photomask while only purging the contaminated area of the photomask and not purging the uncontaminated area of the photomask, reducing the damage of the protective film on the surface of the photomask caused by unnecessary purging, and thus improving the yield of the chip. Description of the Drawings

[0037] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following will briefly introduce the drawings required for the description of the embodiments of the present invention or the prior art. Obviously, the following described drawings are only some embodiments of this specification. For those of ordinary skill in the art, without creative efforts, other drawings can be obtained based on these drawings.

[0038] Figure 1 Shows a schematic working scenario diagram of a photomask purging system.

[0039] Figure 2 Shows a schematic structural diagram of an embodiment of the photomask purging system in the present invention.

[0040] Figure 3 Shows Figure 2 a top view schematic diagram of

[0041] Figure 4 Shows a schematic structural diagram of an embodiment of the stage in the present invention. Detailed Embodiments

[0042] As described in the background art, during the semiconductor manufacturing process, the surface of the photomask is easily contaminated by pollutants such as airborne particles and gas molecules. These pollutants will adsorb on the surface of the photomask. Thus, when performing the lithography process to transfer the pattern on the photomask to the photoresist, the pattern on the photoresist will have defects, which will further lead to defects in the pattern on the wafer and reduce the yield of the chip.

[0043] Referring to Figure 1 , a schematic working scenario diagram of a photomask purging system is shown.

[0044] The photomask purging system includes: a gas guiding pipe M1 for providing purging gas; a clean room M2 having an air inlet channel m, and the air inlet channel m is used to communicate with the gas guiding pipe M1; a workbench M3 located in the clean room M2 for carrying the photomask N; a flow dividing plate M4 located between the air inlet channel m and the workbench M3 for dividing the purging gas.

[0045] In actual use, the purging gas sequentially passes through the gas guiding pipe M1, the air inlet channel m, and the flow dividing plate M4 to reach the surface of the photomask N, so as to purge the pollutants on the surface of the photomask N, which can reduce the amount of pollutants on the surface of the photomask N and thus improve the yield of the chip.

[0046] The surface of the photomask has a protective film, and the protective film is relatively fragile. The inventor found in actual work that although the above-mentioned photomask purging system can perform omnidirectional purging, it will increase the probability of damage to the protective film in the area of the photomask that is not covered by pollutants, which will lead to defects in the pattern on the photomask and further lead to defects in the pattern on the wafer, reducing the yield of the chip.

[0047] To solve the above technical problems, an embodiment of the present utility model provides a photomask purging system, including: a carrying device for carrying the photomask; a first slide rail located above the carrying device and extending along a first direction; a second slide rail located above the carrying device and extending along a second direction, and the second slide rail also slidably cooperates with the first slide rail along the first direction, wherein the first direction is different from the second direction; a purging member located on the second slide rail and slidably cooperating with the second slide rail along the second direction; a control device electrically connected to the second slide rail to adjust the position information of the second slide rail in the first direction, and electrically connected to the purging member to adjust the position information of the purging member in the second direction.

[0048] In the mask purging system provided by the embodiment of the present utility model, the purging member is located on the second slide rail. The second slide rail is slidably engaged with the first slide rail along the first direction. By adjusting the position information of the second slide rail in the first direction through the control device, the position information of the purging member in the first direction can be adjusted, so that the purging member can purge the mask along the first direction; the purging member is slidably engaged with the second slide rail along the second direction. Through the control device, the position information of the purging member in the second direction can be adjusted, so that the purging member can purge the mask along the second direction; since the first direction is different from the second direction, the purging member can perform fixed-point purging on the mask, thereby reducing the amount of contaminants on the surface of the mask while being able to purge only the contaminated area of the mask without purging the uncontaminated area of the mask, reducing the damage of the protective film on the surface of the mask caused by unnecessary purging, and thus improving the yield of the chip.

[0049] In order to make the above objects, features, and advantages of the embodiments of the present utility model more obvious and understandable, the following detailed description of the specific embodiments of the present utility model will be given in conjunction with the accompanying drawings.

[0050] Reference Figures 2 to 4 , in which, Figure 2 shows a schematic diagram of the working scenario of an embodiment of the mask purging system in the present utility model, Figure 3 shows Figure 2 a top view schematic diagram of Figure 4 shows a schematic structural diagram of a stage in an embodiment of the present utility model. The mask purging system may include:

[0051] a carrying device 1 for carrying the mask N;

[0052] a first slide rail 2 located above the carrying device 1 and extending along the first direction F1;

[0053] a second slide rail 3 located above the carrying device 1, extending along the second direction F2, and slidably engaged with the first slide rail 2 along the first direction F1, where the first direction F1 is different from the second direction F2;

[0054] a purging member 4 located on the second slide rail 3 and slidably engaged with the second slide rail 3 along the second direction F2;

[0055] a control device (not shown in the figure) that is electrically connected to the second slide rail 3 to adjust the position information of the second slide rail 3 in the first direction F1, and is electrically connected to the purging member 4 to adjust the position information of the purging member 4 in the second direction F2.

[0056] With the above technical solution, the purging member 4 is located on the second slide rail 3. The second slide rail 3 is slidably engaged with the first slide rail 2 along the first direction F1. By adjusting the position information of the second slide rail 3 in the first direction F1 through the control device, the position information of the purging member 4 in the first direction F1 can be adjusted; the purging member 4 is slidably engaged with the second slide rail 3 along the second direction F2. By the control device, the position information of the purging member 4 in the second direction F2 can be adjusted; the first direction F1 is different from the second direction F2, so that the purging member 4 can perform fixed-point purging on the photomask N. Thus, while reducing the amount of contaminants on the surface of the photomask N, it is also possible to purge only the contaminated area of the photomask without purging the uncontaminated area of the photomask, reducing the probability of damage to the protective film on the surface of the photomask N caused by unnecessary purging, thereby further improving the yield of the chip.

[0057] In this embodiment, the photomask N has a first surface n1 and a second surface n2 to be purged, and both the first surface n1 and the second surface n2 are parallel to the end face of the carrying device 1 for carrying the photomask N.

[0058] In this embodiment, the first direction F1 is parallel to the first surface n1, which can make the first slide rail 2 parallel to the photomask N; the second direction F2 is parallel to the first surface n1, which can make the second slide rail 3 parallel to the photomask N, thereby reducing the conversion amount of the position information of the purging member 4 in the first direction F1 and the second direction F2 and simplifying the motion control and positioning tasks of the control device.

[0059] In this embodiment, the first direction F1 can be perpendicular to the second direction F2, then the first slide rail 2 and the second slide rail 3 are perpendicular, which can reduce the conversion amount of the position information of the purging member 4 in the first direction F1 and the second direction F2 and simplify the motion control and positioning tasks of the control device. In other embodiments, the first direction and the second direction may not be perpendicular. For example, the included angle between the first direction and the second direction is 45 degrees.

[0060] In this embodiment, the purging member 4 is located on the second slide rail 3 and is slidably engaged with the second slide rail 3 along the second direction F2. By adjusting the position information of the purging member 4 in the second direction F2, the purging member 4 can purge the photomask N along the second direction F2.

[0061] In this embodiment, the purging member 4 is located on the second slide rail 3. The second slide rail 3 is slidably engaged with the first slide rail 2 along the first direction F1. By adjusting the position information of the second slide rail 3 in the first direction F1, the position information of the purging member 4 in the first direction F1 can be adjusted, so that the purging member 4 can purge the photomask N along the first direction F1.

[0062] It should be noted that the size of the angle β between the purging member 4 and the surface of the photomask N is related to the cleaning efficiency. The angle β should not be too large or too small. If the angle β is too large, such as 90 degrees, the probability of the purging gas damaging the protective film on the surface of the photomask will increase; if the angle β is too small, such as 15 degrees, the distance between the purging member 4 and the photomask N will be reduced, increasing the probability of the purging member 4 scratching the protective film on the surface of the photomask N. In this embodiment, the angle between the purging member 4 and the carrying device 1 is 45 degrees, so that the purging member 4 can clean the contaminants on the photomask N at a purging angle of 45 degrees with respect to the photomask.

[0063] It should be noted that the flow rate of the purging gas output by the purging member 4 is related to the cleaning efficiency. The flow rate of the purging gas should not be too large or too small. If the flow rate of the purging gas is too large, such as 10 L / min, the probability of the purging gas damaging the protective film on the surface of the photomask N will increase; if the flow rate of the purging gas is too small, such as 1 L / min, the contaminants on the surface of the photomask N cannot be effectively removed. In this embodiment, the flow rate of the purging gas output by the purging member 4 is 5 L / min.

[0064] It should be noted that the distance between the purging member 4 and the photomask N is related to the cleaning efficiency. The distance between the purging member 4 and the photomask N should not be too large or too small. If the distance is too large, such as 10 cm, the flow rate of the purging gas output by the purging member 4 needs to be increased; if the distance is too small, such as 0.5 cm, the probability of the purging member 4 scratching the protective film on the surface of the photomask N will increase. In this embodiment, the distance between the purging member 4 and the photomask N is 1 cm.

[0065] It should be noted that the purging time of the purging member 4 is related to the cleaning efficiency. The purging time of the purging member should not be too long or too short. If the purging time is too long, such as 1 min, the probability of the purging gas damaging the protective film on the surface of the photomask N will increase; if the purging time is too short, such as 0.5 s, the contaminants on the surface of the photomask N cannot be effectively removed. In this embodiment, the purging time of the purging member 4 is 3 s.

[0066] In this embodiment, the control device can be electrically connected to the purging member 4 to control the angle between the purging member 4 and the carrying device 1, the flow rate of the purging gas output by the purging member 4, the distance between the purging member 4 and the photomask N, and the purging time of the purging member 4.

[0067] In this embodiment, the mask purging system may further include a detection device (not shown in the figure) electrically connected to the control device. The detection device is used to detect the position information of contaminants on the surface of mask N. The control device determines the position information of contaminants on the surface of mask N according to the detection device, and adjusts the position information of the second slide rail 3 in the first direction F1 and the position information of the purging member 4 in the second direction F2 according to the position information of contaminants on the surface of mask N.

[0068] As an example, the detection device may include a laser emitter (not shown in the figure) located above the carrying device 1. The laser emitter is used to emit a detection signal to the surface of mask N. And a laser receiver (not shown in the figure) located above the carrying device 1. The laser receiver is used to receive the echo signal reflected from the surface of mask N. The control device determines the position information of contaminants on the surface of mask N according to the echo signal, and adjusts the position information of the second slide rail 3 in the first direction F1 and the position information of the purging member 4 in the second direction F2 to purge the contaminants on the surface of mask N.

[0069] In this embodiment, the carrying device 1 may include a base 11; a first support portion 12 and a second support portion 13 oppositely arranged on the base 11; and a clamping assembly 14 for clamping mask N. Two ends of the clamping assembly 14 are respectively connected to the first support portion 12 and the second support portion 13.

[0070] In actual use, the first support portion 12 and the second support portion 13 can respectively provide support for two ends of the clamping assembly 14, which can improve the support strength and stability of the carrying device 1 for the clamping assembly 14.

[0071] In this embodiment, the clamping assembly 14 is rotationally matched with the first support portion 12 and the second support portion 13 with the first axis L1 as the axis, and can flip mask N, so that the contaminants on the first surface n1 and the second surface n2 of mask N can be purged, further reducing the amount of contaminants on the surface of mask N and improving the yield of the chip.

[0072] In this embodiment, the carrying device 1 may further include a rotating assembly 15. The rotating assembly 15 is used to make the clamping assembly 14 rotationally matched with the first support portion 12 and the second support portion 13 with the first axis L1 as the axis.

[0073] As an example, a first rotation hole h1 coaxial with the first axis L1 is formed in the first support portion 12, and a second rotation hole coaxial with the first axis L1 is formed in the second support portion 13. The rotation assembly 15 includes: a driving motor 151 fixedly provided on the first support portion 12, the driving motor 151 having a driving shaft 152 with the first axis L1 as the axis; a first rotation shaft 153 having one end fixed to the clamping assembly 14 and the other end passing through the first rotation hole h1 and connected to the driving shaft 152; and a second rotation shaft having one end fixed to the clamping assembly 14 and the other end passing through the second rotation hole.

[0074] It can be understood that the above implementation manners are only for illustrative purposes, used to illustrate the possible manners in which the clamping assembly rotates and cooperates with the first support portion and the second support portion with the first axis as the axis, and cannot be understood as a limitation on the implementation manner in which the clamping assembly rotates and cooperates with the first support portion and the second support portion with the first axis as the axis in the present invention. Any known mechanism that enables the clamping assembly to rotate and cooperate with the first support portion and the second support portion with the first axis as the axis that can be recognized by those skilled in the art can be applied to the rotation assembly in the present invention.

[0075] As an example, the driving motor 151 may be located inside the first support portion 12, which is beneficial to reducing the exposure risk of the driving motor 151.

[0076] In this embodiment, a bearing (not shown in the figure) is provided between the first rotation hole h1 and the first rotation shaft 153, which is used to reduce the sliding friction between the first rotation hole h1 and the first rotation shaft 153, thereby reducing the wear between the first support portion 12 and the first rotation shaft 153.

[0077] In this embodiment, a bearing is provided between the second rotation hole and the second rotation shaft, which is used to reduce the sliding friction between the second rotation hole and the second rotation shaft, thereby reducing the wear between the second support portion and the second rotation shaft.

[0078] In this embodiment, the control device may be electrically connected to the driving motor 151, and the control device is used to control the switch and rotation speed of the driving motor 151, so as to control the rotation speed and rotation angle when the clamping assembly 14 rotates with the first axis L1 as the axis together with the photomask N.

[0079] In actual use, the control device can drive the motor 151 to be switched on and off at intervals according to the purging requirements, so as to control the clamping assembly 14 and the photomask to stop after rotating a target angle around the first axis L1. At this time, the first surface n1 of the photomask N faces the purging member 4, and both the first direction F1 and the second direction F2 are parallel to the first surface n1. The purging member 4 performs fixed-point purging on the first surface n1. After the purging of the first surface n1 is completed, continue to control the clamping assembly 14 and the photomask N to rotate 180 degrees around the first axis L1. At this time, the second surface n2 of the photomask N faces the purging member 4, and both the first direction F1 and the second direction F2 are parallel to the second surface n2. The purging member 4 performs fixed-point purging on the second surface n2.

[0080] In this embodiment, the clamping assembly 14 may include: a stage 141; a first clamping member 142 located on the stage 141 and rotatably engaged with the first support portion 12 around the first axis L1; a second clamping member 143 located on the stage 141 and rotatably engaged with the second support portion 13 around the first axis L1; the first clamping member 142 and the second clamping member 143 are arranged opposite to each other along the direction of the first axis L1, and the distance therebetween is adjustable.

[0081] In actual use, the photomask N is located between the first clamping member 142 and the second clamping member 143 and can be clamped and fixed by the first clamping member 142 and the second clamping member 143; the distance between the first clamping member 142 and the second clamping member 143 is adjustable, and the acting force between the photomask N and the first clamping member 142 and the second clamping member 143 can be adjusted, so as to reduce the probability of damage to the protective film on the surface of the photomask N.

[0082] In this embodiment, the stage 141 is used to carry the photomask N, and the first surface n1 or the second surface n2 of the photomask N abuts against the stage 141; the stage 141 has a purging hole 141a, and the purging hole 141a is used to expose the surface of the photomask N that abuts against the stage 141.

[0083] In this embodiment, both the first clamping member 142 and the second clamping member 143 are hydraulic rods, and the distance between the first clamping member 142 and the second clamping member 143 can be adjusted through the hydraulic rods. In other embodiments, the first clamping member may be a hydraulic rod, and the second clamping member may also be a limiting block, and the distance between the first clamping member and the second clamping member can be adjusted through the first clamping member.

[0084] It can be understood that the above implementation methods are only for illustrative purposes, used to illustrate possible implementation methods of the first clamping member or the second clamping member, and should not be construed as a limitation on the implementation methods of the first clamping member or the second clamping member in the present utility model. Any possible mechanism that can be recognized by those skilled in the art to adjust the distance between the first clamping member and the second clamping member can be applied to the first clamping member and the second clamping member in the present utility model.

[0085] In this embodiment, the first clamping member 142 and / or the second clamping member 143 are electrically connected to the control device to controllably adjust the distance between the first clamping member 142 and the second clamping member 143.

[0086] Specifically, at least one of the first clamping member or the second clamping member is electrically connected to the control device and adjusts the distance between the first clamping member and the second clamping member under the control of the control device.

[0087] It can be understood that the above embodiments provide multiple implementation schemes, and each implementation scheme can be combined and cross-referenced with each other without conflict, so as to extend multiple possible implementation schemes, all of which can be considered as the implementation schemes disclosed and made public in the embodiments of the present application.

[0088] It should be noted that the "examples" or "embodiments" referred to in this specification refer to specific features, structures or characteristics that can be included in at least one implementation manner of the embodiments of the present utility model. And in the description of this specification, terms such as "first" and "second" are only used for descriptive purposes and should not be construed as indicating or implying relative importance or implicitly indicating the quantity of the indicated technical features. Thus, features defined with terms such as "first" and "second" may explicitly or implicitly include one or more of such features. Moreover, terms such as "first" and "second" are used to distinguish similar objects and do not necessarily need to be used to describe a specific order or indicate importance. It can be understood that such terms can be interchanged under appropriate circumstances so that the embodiments of the present utility model described here can be implemented in an order other than those illustrated or described here.

[0089] Although the embodiments of the present utility model are disclosed as above, the present utility model is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present utility model. Therefore, the protection scope of this specification should be subject to the scope defined by the claims.

Claims

1. A mask purging system, characterized in that, Including: A carrying device for carrying a photomask; A first slide rail located above the carrying device and extending in a first direction; A second slide rail located above the carrying device and extending in a second direction, the second slide rail also being slidably engaged with the first slide rail in the first direction, wherein the first direction is different from the second direction; A purging member located on the second slide rail, the purging member being slidably engaged with the second slide rail in the second direction; A control device electrically connected to the second slide rail to adjust the position information of the second slide rail in the first direction, and electrically connected to the purging member to adjust the position information of the purging member in the second direction.

2. The system according to claim 1, wherein It further includes: A detection device electrically connected to the control device to detect the position information of surface contaminants on the photomask.

3. The system according to claim 2, wherein The detection device includes: A laser emitter located above the carrying device and emitting a detection signal to the photomask; A laser receiver located above the carrying device and receiving an echo signal reflected by the photomask.

4. The system according to claim 1, wherein The carrying device includes: A base; A first support portion and a second support portion oppositely arranged on the base; And a clamping assembly for clamping the photomask, both ends of the clamping assembly being respectively connected to the first support portion and the second support portion.

5. The system according to claim 4, wherein The carrying device further includes: a rotating assembly; The clamping assembly is rotatably engaged with the first support portion and the second support portion about a first axis through the rotating assembly.

6. The system according to claim 5, wherein A first rotating hole coaxial with the first axis is formed on the first support portion, and a second rotating hole coaxial with the first axis is formed on the second support portion; The rotating assembly includes: A driving motor fixed to the first support portion, the driving motor having a driving shaft with the first axis as the axis, and the driving motor is electrically connected to the control device; A first rotating shaft, one end of the first rotating shaft is fixed to the clamping assembly, and the other end passes through the first rotating hole and is connected to the driving shaft; A second rotating shaft, one end of the second rotating shaft is fixed to the clamping assembly, and the other end passes through the second rotating hole.

7. The system according to claim 5, characterized in that, The clamping assembly includes: A stage; A first clamping member located on the stage and rotatably engaged with the first support portion about the first axis; A second clamping member located on the stage and rotatably engaged with the second support portion about the first axis; The first clamping member and the second clamping member are oppositely arranged along the direction of the first axis; The first clamping member and / or the second clamping member is electrically connected to the control device to controllably adjust the distance between the first clamping member and the second clamping member.

8. The system according to claim 7, wherein The first clamping member and / or the second clamping member includes a hydraulic rod.

9. The system according to claim 7, wherein The stage has a purging hole for exposing the surface of the photomask in contact with the stage.

10. The system according to claim 1, wherein The first direction is perpendicular to the second direction.

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