ESC suction testing device under vacuum

Abstract

The utility model relates to the technical field of ESC suction testing, and discloses an ESC suction testing device under vacuum, which comprises a vacuum cavity, a top cover is arranged at the top of the vacuum cavity, ESC equipment is arranged in the vacuum cavity, a silicon wafer is adsorbed at the top of the ESC equipment, the right side of the silicon wafer extends out of the ESC equipment, and the right side of the silicon wafer extends out of the ESC equipment. A support is fixedly installed in the bottom of the vacuum cavity, a guide rail is fixedly installed at the top of the support, a thrust meter is fixedly installed at the movable end of the guide rail, the pushing end of the thrust meter makes contact with the outer wall of a silicon wafer, the silicon wafer placed at the top of the ESC device is sucked through the ESC device, then the thrust meter is pushed by an electric telescopic rod to move leftwards, and the silicon wafer is pushed to move leftwards. According to the method, the silicon wafer is pushed to move leftwards, the maximum thrust in the pushing process is displayed through the thrust meter, then the suction force of the ESC equipment is measured, the vacuum cavity is vacuumized through the vacuum pump, and then the suction force of the ESC equipment in the vacuum environment is measured.

Description

Technical Field

[0001] The utility model relates to the technical field of ESC suction testing, in particular to a vacuum ESC suction testing device. Background Art

[0002] Electrostatic chucking technology (ESC) is a method of using the principle of static electricity to adsorb and fix workpieces. In the production of silicon wafers, ESC equipment is often used to grasp silicon wafers. Therefore, before the ESC equipment is put into use, it is necessary to test the suction of the ESC equipment. The existing common testing equipment is large in volume, high in cost, and cannot meet the vacuum environment testing. Summary of the Utility Model

[0003] The purpose of the utility model is to provide a vacuum ESC suction testing device to solve the problems raised in the above background art.

[0004] To achieve the above purpose, the utility model provides the following technical solution: A vacuum ESC suction testing device includes a vacuum chamber. A top cover is provided at the top of the vacuum chamber. An ESC device is arranged inside the vacuum chamber. A silicon wafer is adsorbed on the top of the ESC device. The right side of the silicon wafer extends out from the ESC device. A bracket is fixedly installed inside the bottom of the vacuum chamber. A guide rail is fixedly installed at the top of the bracket. A thrust gauge is fixedly installed at the movable end of the guide rail. The pushing end of the thrust gauge contacts the outer wall of the silicon wafer. An electric telescopic rod is fixedly installed at the top of the bracket. The extending end of the electric telescopic rod is fixedly connected to the right end of the thrust gauge. An ESC power supply is arranged on the front of the vacuum chamber. The ESC power supply is electrically connected to the ESC device through an electric wire. A vacuum pump is arranged on the right side of the vacuum chamber. The air extraction end of the vacuum pump is communicated with the inside of the vacuum chamber through a pipeline.

[0005] Further, the top cover is a transparent acrylic board. A support frame is fixedly installed on the inner wall of the vacuum chamber. A sealing gasket is fixedly installed at the top of the support frame. The bottom of the top cover presses on the sealing gasket.

[0006] Further, a vacuum gauge is fixedly installed on the left side of the vacuum chamber. An air inlet and outlet pipe is communicatedly arranged on the left side of the vacuum chamber. A valve is arranged at the end of the air inlet and outlet pipe.

[0007] Further, a helium gas inlet is arranged on the ESC device. The bottom end of the helium gas inlet is communicatedly provided with a gas exchange pipe. The gas exchange pipe extends out of the vacuum chamber. A flowmeter is arranged on the gas exchange pipe.

[0008] Further, a controller is fixedly installed on the right side of the vacuum chamber. The controller is electrically connected to the electric telescopic rod through an electric wire.

[0009] Furthermore, the pushing end of the thrust gauge is arc-shaped.

[0010] Compared with the prior art, the beneficial effects of the present utility model are as follows:

[0011] 1. The ESC device sucks the silicon wafer placed on its top, and then the electric telescopic rod pushes the thrust gauge to move leftward, thereby pushing the silicon wafer to move leftward. The maximum thrust during the pushing process is displayed by the thrust gauge, and thus the suction force of the ESC device is measured. The vacuum chamber is evacuated by the vacuum pump, and thus the suction force of the ESC device in a vacuum environment is measured.

[0012] 2. After the ESC device adsorbs the silicon wafer, helium is introduced to detect before and after adsorption, and the change in helium flow rate is compared. Whether the sealing requirement is met is judged by the change in helium flow rate after adsorption. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 is a schematic structural diagram of the present utility model;

[0014] Figure 2 is of the present utility model Figure 1 is a schematic structural diagram of the rear view;

[0015] Figure 3 is a schematic structural diagram of the front cross-sectional view of the vacuum chamber and the top cover of the present utility model;

[0016] Figure 4 is a schematic structural diagram of the exploded view of the top cover, the support frame and the sealing gasket of the present utility model.

[0017] In the figure: 1. Vacuum chamber; 2. Top cover; 3. Vacuum pump; 4. ESC device; 5. Silicon wafer; 6. Bracket; 7. Guide rail; 8. Thrust gauge; 9. Electric telescopic rod; 10. Controller; 11. Vacuum gauge; 12. Air inlet and outlet pipe; 13. Helium inlet; 14. Air exchange pipe; 15. Flowmeter; 16. ESC power supply; 17. Support frame; 18. Sealing gasket. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0018] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments.

[0019] Please refer to Figures 1 - 4, the present utility model provides a technical solution: a vacuum ESC suction force testing device, including a vacuum chamber 1, a top cover 2 is arranged at the top of the vacuum chamber 1, an ESC device 4 is arranged inside the vacuum chamber 1, a silicon wafer 5 is adsorbed on the top of the ESC device 4, the right side of the silicon wafer 5 extends out from the ESC device 4, a bracket 6 is fixedly installed inside the bottom of the vacuum chamber 1, a guide rail 7 is fixedly installed at the top of the bracket 6, a thrust gauge 8 is fixedly installed at the movable end of the guide rail 7, the pushing end of the thrust gauge 8 contacts the outer wall of the silicon wafer 5, an electric telescopic rod 9 is fixedly installed at the top of the bracket 6, and the extending end of the electric telescopic rod 9 is fixedly connected to the right end of the thrust gauge 8. An ESC power supply 16 is arranged on the front of the vacuum chamber 1, and the ESC power supply 16 is electrically connected to the ESC device 4 through an electric wire. A vacuum pump 3 is arranged on the right side of the vacuum chamber 1, and the air extraction end of the vacuum pump 3 is communicated with the inside of the vacuum chamber 1 through a pipeline. The silicon wafer 5 placed on its top is sucked by the ESC device 4, and then the electric telescopic rod 9 is used to push the thrust gauge 8 to move leftward, thereby pushing the silicon wafer 5 to move leftward. The maximum thrust during the pushing process is displayed by the thrust gauge 8, and thus the suction force of the ESC device 4 is measured. The vacuum pump 3 is used to evacuate the inside of the vacuum chamber 1, and thus the suction force of the ESC device 4 in a vacuum environment is measured;

[0020] The top cover 2 is a transparent acrylic plate, which is convenient for directly reading the value displayed on the thrust gauge 8 from the outside of the vacuum chamber 1. A support frame 17 is fixedly installed on the inner wall of the vacuum chamber 1, a sealing gasket 18 is fixedly installed at the top of the support frame 17, and the bottom of the top cover 2 is pressed on the sealing gasket 18. When the inside of the vacuum chamber 1 is evacuated, the external air pressure is greater than the air pressure inside the vacuum chamber 1. At this time, the top cover 2 is tightly pressed on the vacuum chamber 1, and the bottom end of the top cover 2 is also tightly pressed on the sealing gasket 18 to ensure the seal between the vacuum chamber 1 and the top cover 2;

[0021] A vacuum gauge 11 is fixedly installed on the left side of the vacuum chamber 1, which is used to monitor whether the set vacuum degree is reached inside the vacuum chamber 1. An air inlet and outlet pipe 12 is communicatedly arranged on the left side of the vacuum chamber 1, and a valve is arranged at the end of the air inlet and outlet pipe 12. After the test of the ESC device 4 is completed, the valve on the air inlet and outlet pipe 12 is opened to allow external air to enter the vacuum chamber 1, so that the inside of the vacuum chamber 1 quickly returns to normal pressure;

[0022] A helium gas inlet 13 is arranged on the ESC device 4, a gas exchange pipe 14 is communicatedly arranged at the bottom end of the helium gas inlet 13, the gas exchange pipe 14 extends out from the inside of the vacuum chamber 1, and a flowmeter 15 is arranged on the gas exchange pipe 14. After the ESC device 4 adsorbs the silicon wafer 5, helium gas is introduced to detect before and after adsorption, and the change in helium gas flow is compared. Whether the sealing requirement is met is judged by the change in the helium gas flow after adsorption;

[0023] A controller 10 is fixedly installed on the right side of the vacuum chamber 1. The controller 10 is electrically connected to the electric telescopic rod 9 through an electric wire, and the elongation and retraction of the electric telescopic rod 9 are controlled by the controller 10;

[0024] The pushing end of the thrust gauge 8 is arc-shaped, so that the pushing end of the thrust gauge 8 can fit the outer wall of the silicon wafer 5, thereby ensuring that the thrust gauge 8 can smoothly push the silicon wafer 5.

[0025] Working principle: During use, after opening the top cover 2, the ESC device 4 is fixedly installed in the vacuum chamber 1, and then the silicon wafer 5 is placed on the top of the ESC device 4, allowing a small part of the edge of the silicon wafer 5 to be exposed on the ESC device 4, and then closing the top cover 2. The ESC device 4 is turned on to adsorb the silicon wafer 5, and the vacuum pump 3 is turned on to evacuate the inside of the vacuum chamber 1. The vacuum gauge 11 shows the vacuum degree inside the vacuum chamber 1. After reaching the set value, the electric telescopic rod 9 is turned on to push the thrust gauge 8 to move leftward, thereby pushing the silicon wafer 5 to move leftward. The maximum thrust during the pushing process is displayed by the thrust gauge 8, and thus the suction force of the ESC device 4 is measured.

[0026] Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the scope of protection of the present invention.

Claims

1. A vacuum ESC suction force testing device, comprising a vacuum chamber (1), characterized in that: A top cover (2) is provided at the top of the vacuum chamber (1). An ESC device (4) is arranged inside the vacuum chamber (1). A silicon wafer (5) is adsorbed on the top of the ESC device (4). The right side of the silicon wafer (5) extends out from the ESC device (4). A bracket (6) is fixedly installed inside the bottom of the vacuum chamber (1). A guide rail (7) is fixedly installed at the top of the bracket (6). A thrust gauge (8) is fixedly installed at the movable end of the guide rail (7). The pushing end of the thrust gauge (8) is in contact with the outer wall of the silicon wafer (5). An electric telescopic rod (9) is fixedly installed at the top of the bracket (6). The extending end of the electric telescopic rod (9) is fixedly connected to the right end of the thrust gauge (8). An ESC power supply (16) is arranged on the front surface of the vacuum chamber (1). The ESC power supply (16) is electrically connected to the ESC device (4) through an electric wire. A vacuum pump (3) is arranged on the right side of the vacuum chamber (1). The air extraction end of the vacuum pump (3) is communicated with the inside of the vacuum chamber (1) through a pipeline.

2. The vacuum ESC suction force testing device according to claim 1, wherein: The top cover (2) is a transparent acrylic board. A support frame (17) is fixedly installed on the inner wall of the vacuum chamber (1). A sealing gasket (18) is fixedly installed at the top of the support frame (17). The bottom of the top cover (2) presses on the sealing gasket (18).

3. The vacuum ESC suction force testing device according to claim 1, characterized in that: A vacuum gauge (11) is fixedly installed on the left side of the vacuum chamber (1). An air inlet and outlet pipe (12) is communicated and arranged on the left side of the vacuum chamber (1). A valve is arranged at the end of the air inlet and outlet pipe (12).

4. The vacuum ESC suction force testing device according to claim 1, wherein: A helium gas inlet (13) is arranged on the ESC device (4). A gas exchange pipe (14) is communicated and arranged at the bottom end of the helium gas inlet (13). The gas exchange pipe (14) extends out from inside the vacuum chamber (1). A flowmeter (15) is arranged on the gas exchange pipe (14).

5. The vacuum ESC suction force testing device according to claim 1, characterized in that: A controller (10) is fixedly installed on the right side of the vacuum chamber (1). The controller (10) is electrically connected to the electric telescopic rod (9) through an electric wire.

6. The vacuum ESC suction force testing device according to claim 1, wherein: The pushing end of the thrust gauge (8) is arc-shaped.

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