Chemical vapor deposition tail gas dilution equipment and treatment system

Abstract

The utility model relates to the field of waste gas treatment, in particular to chemical vapor deposition tail gas dilution equipment and a treatment system.The equipment is characterized in that multiple sets of tail gas receiving pipelines are connected into a gas storage device, the gas storage device serves as a temporary storage device of mixed gas, and multiple sets of different tail gas are mixed; the process tail gas with relatively high hydrogen concentration can be reduced, and the hydrogen concentration can be preliminarily reduced, so that the use amount of diluent gas is reduced; meanwhile, diluent gas is introduced into the gas storage device, the mixed gas and the diluent gas are temporarily stored, and the hydrogen content of the mixed gas can be monitored in real time through the gas concentration detection device in the gas storage cavity, so that the diluent gas can be correspondingly added, the dosage of the diluent gas can be conveniently controlled, the diluent gas can be saved, and the working efficiency is improved. And waste is avoided.

Description

Technical Field

[0001] The present application relates to the field of waste gas treatment, and relates to a chemical vapor deposition tail gas dilution device and a treatment system. Background Art

[0002] Chemical vapor deposition (CVD) refers to a method in which chemical gases or vapors react on the surface of a substrate to synthesize a coating or nanomaterial. It is the most widely used technology in the semiconductor industry for depositing a variety of materials, including a wide range of insulating materials, most metal materials, and metal alloy materials. Many chemical vapor deposition processes use hydrogen gas (H2) as a reducing agent, and the explosion limit of hydrogen is 4.0% - 75.6% (volume concentration). If the volume concentration of hydrogen in the air is within this range and encounters a fire source, an explosion will occur.

[0003] In practice, if the tail gas contains hydrogen, the concentration of hydrogen needs to be diluted to less than the explosion limit concentration first and then processed. As Figure 1 shown, after passing through the process chamber, the tail gas is discharged to the tail gas treatment device through a suction pump, and nitrogen gas is introduced into the pipeline between the suction pump and the tail gas treatment device. In order to dilute the concentration of hydrogen to less than the explosion limit concentration, it is necessary to ensure that the amount of nitrogen gas used is sufficient.

[0004] In the prior art, the amount of nitrogen gas is pre-calculated according to the amount of hydrogen gas used. Then, usually, by increasing the opening degree of the pressure regulating valve and observing the reading of the flow meter until the reading of the flow meter is slightly larger than the calculated value to control the amount of nitrogen gas. The disadvantage of this way of adding nitrogen gas is that in order to ensure that the final concentration of hydrogen in the tail gas is less than the explosion limit, the amount of dilution nitrogen gas in the tail gas must be limited according to the highest possible amount of hydrogen gas used. Therefore, the actual amount of nitrogen gas used must exceed the calculated value. Moreover, as Figure 1 shown, nitrogen gas and the tail gas are directly mixed in the pipeline, which is not conducive to accurately controlling the amount of nitrogen gas used, resulting in waste of nitrogen gas and not conforming to the concept of energy conservation and environmental protection. Utility Model Content

[0005] In order to solve or at least partially solve the above technical problems, the present application provides a chemical vapor deposition tail gas dilution device, including:

[0006] At least two groups of tail gas receiving pipelines;

[0007] A gas storage device with a gas storage cavity inside. The air inlet of the gas storage cavity is connected to the at least two groups of tail gas receiving pipelines, and the gas storage cavity is used to mix different process tail gases introduced;

[0008] A dilution device connected to the gas storage cavity to provide dilution gas to the gas storage cavity;

[0009] The first exhaust pipe is arranged at the gas outlet of the gas storage device;

[0010] A gas concentration detection device and a pressure detection device are arranged in the gas storage cavity;

[0011] The dilution device provides dilution gas to the gas storage cavity in response to the concentration value detected by the gas concentration detection device, and the first exhaust pipe discharges the mixed gas in response to the pressure value detected by the pressure detection device.

[0012] Optionally, the gas storage cavity includes a first cavity and a second cavity, and the first cavity communicates with the second cavity;

[0013] The air inlet of the first cavity is connected to the at least two groups of tail gas receiving pipes, the second cavity is connected to the first exhaust pipe, and the dilution device communicates with the first cavity and / or the second cavity respectively.

[0014] Optionally, the dilution device includes a first dilution pipe and a second dilution pipe, the first dilution pipe communicates with the first cavity, and the second dilution pipe communicates with the second cavity;

[0015] The gas concentration detection device includes a first concentration detection unit arranged in the first cavity and a second concentration detection unit arranged in the second cavity. The first dilution pipe provides dilution gas to the first cavity in response to the concentration value detected by the first concentration detection unit, and the second dilution pipe provides dilution gas to the second cavity in response to the concentration value detected by the second concentration detection unit.

[0016] Optionally, the tail gas receiving pipe is connected to the bottom of the first cavity, and the first dilution pipe is connected to the top of the first cavity.

[0017] Optionally, the outlet end of the second dilution pipe includes a plurality of nozzles, and the nozzles are uniformly arranged inside the second cavity.

[0018] Optionally, a mixing tank is arranged inside the gas storage device, the first cavity is formed inside the mixing tank, the second cavity is a circulating chamber surrounding the mixing tank, and an exhaust valve is arranged on the surface of the mixing tank, and the exhaust valve is used to communicate the first cavity and the second cavity.

[0019] Optionally, the pressure detection device includes a first pressure detection unit disposed in the first cavity and a second pressure detection unit disposed in the second cavity. The exhaust valve discharges the mixed gas into the second cavity in response to the pressure value detected by the first pressure detection unit, and the first exhaust pipeline discharges the mixed gas in the second cavity in response to the pressure value detected by the second pressure detection unit.

[0020] Optionally, a plurality of negative pressure devices are provided on the inner peripheral wall of the second cavity, and the negative pressure devices are arranged in the direction of the channel of the circulation chamber to drive the mixed gas to circulate in the circulation chamber.

[0021] Optionally, a second exhaust pipeline is connected between the first cavity and the first exhaust pipeline, and the second exhaust pipeline discharges the mixed gas into the first exhaust pipeline in response to the pressure value detected by the first pressure detection unit and the concentration value detected by the first concentration detection unit.

[0022] The present application also provides a chemical vapor deposition tail gas treatment system, including:

[0023] Multiple groups of process cavities for analyzing process tail gas;

[0024] The chemical vapor deposition tail gas dilution device as described above, and each tail gas receiving pipeline of the chemical vapor deposition tail gas dilution device is correspondingly connected to the process cavity;

[0025] A tail gas treatment device connected to the first exhaust pipeline of the chemical vapor deposition tail gas dilution device for treating the mixed gas discharged from the first exhaust pipeline.

[0026] The chemical vapor deposition tail gas dilution device provided by the present application, by connecting multiple groups of tail gas receiving pipelines to a gas storage device, and the gas storage device serves as a temporary storage device for the mixed gas, mixing multiple groups of different tail gases, can reduce the process tail gas with a relatively high hydrogen concentration, can initially reduce the hydrogen concentration, and further reduce the usage amount of the dilution gas; at the same time, the gas storage device accesses the dilution gas and temporarily stores the mixed gas and the dilution gas, and the hydrogen content of the mixed gas can be monitored in real time through the gas concentration detection device in the gas storage cavity, and then the dilution gas can be added correspondingly to facilitate the control of the usage amount of the dilution gas, which is beneficial to saving the dilution gas and avoiding waste.

[0027] The chemical vapor deposition tail gas treatment system provided by the present application, due to having the above-mentioned chemical vapor deposition tail gas dilution device, therefore also has all the above-mentioned advantages. Description of the Drawings

[0028] To more clearly illustrate the implementation manners of the present application, the relevant drawings will be briefly introduced below. It can be understood that the drawings in the following description are only used to illustrate some implementation manners of the present application, and those of ordinary skill in the art can also obtain many other technical features and connection relationships not mentioned herein based on these drawings.

[0029] Figure 1 It is a schematic process flow diagram of hydrogen dilution in the prior art;

[0030] Figure 2 It is a schematic process flow diagram of the exhaust gas dilution device for chemical vapor deposition of the present application;

[0031] Figure 3 It is a schematic structural diagram of the exhaust gas dilution device for chemical vapor deposition of the present application.

[0032] Explanation of reference numerals:

[0033] 10. Exhaust gas receiving pipeline; 101. Exhaust gas control valve; 102. Stop valve; 103. Air extraction pump;

[0034] 20. Dilution device; 201. Pressure regulating valve; 202. Nitrogen flowmeter; 21. First dilution pipeline; 22. Second dilution pipeline; 221. Nozzle;

[0035] 30. Gas storage device; 301. First cavity; 302. Second cavity; 31. Mixing tank; 311. Exhaust valve; 32. Negative pressure device;

[0036] 40. Exhaust gas treatment device;

[0037] 50. Gas concentration detection device; 51. First concentration detection unit; 52. Second concentration detection unit;

[0038] 60. Pressure detection device; 61. First pressure detection unit; 62. Second pressure detection unit;

[0039] 71. First exhaust pipeline; 72. Second exhaust pipeline;

[0040] 80. Process cavity; 81. Exhaust gas flowmeter. Specific implementation manners

[0041] To make the objectives, technical solutions, and advantages of the embodiments of the present utility model clearer, the technical solutions in the embodiments of the present utility model will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present utility model. Apparently, the described embodiments are some but not all of the embodiments of the present utility model. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present utility model without creative efforts shall fall within the protection scope of the present utility model.

[0042] The technical solutions in the embodiments of the present application will be described in detail below with reference to the accompanying drawings in the embodiments of the present application.

[0043] Embodiment 1

[0044] As Figure 2 shown, this embodiment provides a chemical vapor deposition tail gas dilution device, which has at least two groups of tail gas receiving pipelines 10, and each tail gas receiving pipeline 10 is used to receive different process tail gases. The tail gas receiving pipeline 10 includes a tail gas control valve 101, a stop valve 102, and an air extraction pump 103 connected in sequence through a tail gas pipe. The downstream section of the air extraction pump 103 is connected to a gas storage device 30. The interior of the gas storage device 30 has a gas storage chamber, and the air inlet of the gas storage chamber is communicated with at least two groups of tail gas receiving pipelines 10, so as to mix the different process tail gases introduced.

[0045] The device of this embodiment also has a dilution device 20, and the dilution device 20 is communicated with the gas storage chamber to provide dilution gas to the gas storage chamber. In this embodiment, in order to reduce the concentration of hydrogen in the process tail gas, the dilution gas can be nitrogen. The dilution device 20 includes a nitrogen providing device and corresponding connecting pipelines. A pressure regulating valve 201 and a nitrogen flowmeter 202 as Figure 1 described are arranged on the pipeline to facilitate the control of the nitrogen flow rate.

[0046] A first exhaust pipeline 71 is also provided at the outlet of the gas storage device 30 of this embodiment. After the gas storage device 30 mixes different process tail gases and dilutes them through the dilution device 20, they are discharged through the first exhaust pipeline 71. Corresponding valves are provided on the first exhaust pipeline 71 to realize the closing and opening of the gas storage chamber.

[0047] As Figure 2As shown in the figure, a gas concentration detection device 50 and a pressure detection device 60 are provided in the gas storage cavity, which are respectively used to detect the hydrogen concentration value and the air pressure of the mixed gas in the gas storage cavity. The dilution device 20 can be associated with the gas concentration detection device 50. The pressure regulating valve 201 of the dilution device 20 controls the nitrogen supplement amount according to the hydrogen concentration value of the mixed gas detected by the gas concentration detection device 50 in the gas storage cavity. The first exhaust gas pipeline 71 is associated with the pressure detection device 60, and the valve of the first exhaust gas pipeline 71 discharges the mixed gas according to the pressure value detected by the pressure detection device 60.

[0048] Specifically, a hydrogen concentration set value X can be defined (this set value X is generally slightly less than the hydrogen explosion limit). The valve of the dilution device 20 is opened, and the dilution nitrogen enters the gas storage cavity. When the gas concentration detection device 50 detects that the hydrogen concentration is less than the set value X (in practice, generally 50%-95% of the set value X), the valve of the dilution device 20 is closed, and the dilution step is completed. The valve of the dilution device 20 can be selectively opened or closed or opened with different opening degrees according to the detection data size of the gas concentration detection device 50 to realize the real-time adjustment of the hydrogen concentration.

[0049] Similarly, a pressure set value Y can be defined (the set value Y is generally slightly less than the local atmospheric pressure). When the pressure value detected by the pressure detection device 60 is greater than the set value Y, the valve of the first exhaust gas pipeline 71 is opened to discharge the tail gas for treatment. When the pressure in the gas storage cavity is less than the set value Y (in practice, generally 50%-95% of the set value Y), the valve of the first exhaust gas pipeline 71 is closed, and the gas storage device 30 continues to store the process tail gas.

[0050] In this embodiment, the valve of the dilution device 20 and the valve of the first exhaust gas pipeline 71 can be independently controlled.

[0051] The chemical vapor deposition tail gas dilution equipment provided in this embodiment connects multiple groups of tail gas receiving pipelines 10 to a gas storage device 30. The gas storage device 30 serves as a temporary storage device for the mixed gas. By mixing multiple groups of different tail gases, the process tail gas with a relatively high hydrogen concentration can be reduced, and the hydrogen concentration can be initially reduced, which is conducive to reducing the use amount of dilution nitrogen in subsequent steps.

[0052] Furthermore, the gas storage device 30 centrally dilutes and processes the tail gases of multiple tail gas receiving pipelines 10. When the hydrogen concentration in the process gas of one or several process chambers is below the explosion limit, these tail gases can dilute the tail gases with the hydrogen concentration above the explosion limit in the process gas of other process chambers, and no additional nitrogen dilution is required, which can greatly save the nitrogen usage amount.

[0053] In this embodiment, the gas storage device 30 accesses diluting nitrogen, temporarily stores the mixed gas and the diluting nitrogen, and can monitor the hydrogen content of the mixed gas in real time through the gas concentration detection device 50 in the gas storage cavity. Then, the diluting nitrogen can be added correspondingly to facilitate the control of the amount of diluting nitrogen used, which is beneficial to saving nitrogen and avoiding waste.

[0054] In this embodiment, the gas concentration detection device 50 in the gas storage device 30 detects the hydrogen concentration, and can accurately determine the nitrogen flow rate to be introduced, which is beneficial to saving nitrogen, energy conservation and environmental protection.

[0055] The combined use of the first exhaust gas pipeline 71 and the pressure detection device 60 can ensure that the internal air pressure of the gas storage device 30 is less than the external air pressure, thereby reducing the risk of tail gas leakage of the gas storage device 30.

[0056] In the above embodiment, the dilution device 20 provides nitrogen as the diluting gas, while in the embodiment of the present application, the diluting gas of the dilution device 20 can be not only nitrogen, but also other inert gases, such as helium, argon and carbon dioxide, etc. Therefore, the diluting gas in this embodiment is not uniquely limited.

[0057] Embodiment 2

[0058] This embodiment provides a chemical vapor deposition tail gas dilution device, which further improves the gas storage device 30 on the basis of the above embodiment.

[0059] As Figure 3 shown, in this embodiment, the gas storage device 30 has a first cavity 301 and a second cavity 302, and the first cavity 301 communicates with the second cavity 302. The air inlet of the first cavity 301 is connected to at least two groups of tail gas receiving pipelines 10, and the second cavity 302 is connected to the first exhaust gas pipeline 71. Through this setting, multiple groups of process tail gases first enter the first cavity 301 for mixing, and then enter the second cavity 302 and are discharged from the first exhaust gas pipeline 71.

[0060] The first cavity 301 plays a role in mixing multiple groups of process tail gases, achieving the effect of diluting the mixed gas with a high hydrogen concentration by the mixed gas with a low hydrogen concentration mentioned in the above Embodiment 1, thereby saving the nitrogen usage amount.

[0061] In one embodiment, the dilution device 20 can be only connected to the first cavity 301. In this way, the first cavity 301 plays a role in mixing multiple groups of process tail gases and diluting hydrogen, and the second cavity 302 is used as a transition to temporarily store and discharge the diluted gas.

[0062] In one embodiment, the dilution device 20 can be connected only to the second cavity 302. In this way, the first cavity 301 serves to mix multiple groups of process exhaust gases. As the first stage of the hydrogen dilution step, while the second cavity 302 serves as the second stage of diluting by providing nitrogen through the dilution device 20. This step-by-step dilution method is more conducive to controlling the usage amount of nitrogen and achieving the purpose of saving nitrogen.

[0063] Further, in one embodiment, as Figure 3 shown, the dilution device 20 can be connected to the first cavity 301 and the second cavity 302 respectively. The first cavity 301 serves as a mixing chamber for multiple groups of process exhaust gases, and nitrogen is introduced simultaneously for dilution to achieve rapid dilution of the mixed gas with a relatively high hydrogen concentration. The second cavity 302 introduces nitrogen to perform secondary dilution on the preliminarily diluted mixed gas to ensure the dilution effect, accurately control the hydrogen concentration value, and thus is conducive to saving nitrogen.

[0064] As Figure 3 shown, specifically, the dilution device 20 includes a first dilution pipeline 21 and a second dilution pipeline 22. The first dilution pipeline 21 is connected to the first cavity 301, and the second dilution pipeline 22 is connected to the second cavity 302; a pressure regulating valve 201 and a nitrogen flowmeter 202 (not shown in the figure, reference can be made to Figure 1 ) are respectively arranged on the first dilution pipeline 21 and the second dilution pipeline 22 for controlling the flow rate of nitrogen.

[0065] The gas concentration detection device 50 includes a first concentration detection unit 51 and a second concentration detection unit 52. The first concentration detection unit 51 is installed in the first cavity 301 to detect the hydrogen concentration value in the first cavity 301, and the second concentration detection unit 52 is installed in the second cavity 302 to detect the hydrogen concentration value in the second cavity 302. The valve of the first dilution pipeline 21 is associated with the first concentration detection unit 51. When the first concentration detection unit 51 detects that the hydrogen concentration value in the first cavity 301 reaches the preset value, the valve of the first dilution pipeline 21 is activated to supply nitrogen into the first cavity 301. Similarly, the valve of the second dilution pipeline 22 is associated with the second concentration detection unit 52. When the second concentration detection unit 52 detects that the hydrogen concentration value in the second cavity 302 reaches the preset value, the valve of the second dilution pipeline 22 is activated to supply nitrogen into the second cavity 302.

[0066] Considering that hydrogen is lighter than the process exhaust gas, the hydrogen in the process exhaust gas will float in the first cavity 301, resulting in a relatively high hydrogen concentration value at the top end inside the first cavity 301, and even the hydrogen concentration in the top space reaching the explosion limit. Therefore, in one embodiment, as Figure 3As shown, it is necessary to connect multiple groups of tail gas receiving pipelines 10 to the bottom of the first cavity 301, and connect the first dilution pipeline 21 to the top of the first cavity 301. In this way, nitrogen enters from the top, fully diluting the hydrogen at the inner top of the first cavity 301, ensuring that the hydrogen concentration inside the first cavity 301 tends to be uniform.

[0067] Preferably, the outlet end of the second dilution pipeline 22 is provided with multiple nozzles 221, and the nozzles 221 are evenly arranged inside the second cavity 302. In this way, using multiple nozzles 221 for secondary dilution, nitrogen is supplemented into the mixed gas in the form of spraying, which can evenly dilute the mixed gas in the second cavity 302 and avoid the situation where the local hydrogen concentration in the second cavity 302 exceeds the standard. Further, nitrogen is supplemented in the form of spraying, which can more accurately control the usage amount of nitrogen and better save nitrogen.

[0068] As Figure 3 shown, in this embodiment, a mixing tank 31 is provided inside the gas storage device 30. A first cavity 301 is formed inside the mixing tank 31, and the second cavity 302 is a circulating chamber surrounding the mixing tank 31. The gas storage device 30 and the mixing tank 31 are in the form of a large tank enclosing a small tank. An exhaust valve 311 is provided on the surface of the mixing tank 31. The exhaust valve 311 is used to connect the first cavity 301 and the second cavity 302, and the mixed gas in the first cavity 301 enters the second cavity 302 through this exhaust valve 311.

[0069] In one embodiment, the exhaust valve 311 is a control valve, and the first cavity 301 and the second cavity 302 are connected by conditionally controlling the opening and closing of the exhaust valve 311.

[0070] In one embodiment, the exhaust valve 311 can be replaced by a channel, directly connecting the first cavity 301 and the second cavity 302 without obstruction.

[0071] As Figure 3 shown, in this embodiment, the pressure detection device 60 includes a first pressure detection unit 61 and a second pressure detection unit 62. The first pressure detection unit 61 is arranged inside the first cavity 301 to detect the internal pressure of the first cavity 301, and the second pressure detection unit 62 is arranged inside the second cavity 302 to detect the internal pressure of the second cavity 302.

[0072] The exhaust valve 311 is connected to the first pressure detection unit 61. When the air pressure in the first cavity 301 increases, the exhaust valve 311 will open when the first pressure detection unit 61 detects that the set pressure value is reached, and discharge the mixed gas into the second cavity 302. Similarly, the first exhaust pipe 71 is connected to the second pressure detection unit 62. When the mixed gas stored in the second cavity 302 is excessive and reaches the preset pressure value, the first exhaust pipe 71 opens to discharge the mixed gas in the second cavity 302.

[0073] As Figure 3 shown, in one embodiment, the second cavity 302 serves as a secondary dilution and gas storage circulation chamber. A plurality of negative pressure devices 32 are provided on the inner peripheral wall of the second cavity 302. The negative pressure devices 32 are arranged in the direction of the channel of the circulation chamber to drive the mixed gas to circulate in the circulation chamber, so that the mixed gas in the second cavity 302 can be continuously kept flowing, so that hydrogen is not easily locally aggregated, which is beneficial to the dilution of hydrogen.

[0074] The negative pressure device 32 can be a device such as a fan.

[0075] As Figure 3 shown, in one embodiment, a second exhaust pipe 72 is connected between the first cavity 301 and the first exhaust pipe 71. The second exhaust pipe 72 is simultaneously associated with the first concentration detection unit 51 and the first pressure detection unit 61. If the first concentration detection unit 51 detects that the hydrogen concentration value in the first cavity 301 has reached the concentration value condition that does not require secondary dilution and the pressure value reaches the discharge condition, it can be directly discharged through the second exhaust pipe 72. At this time, the mixed gas does not need to enter the second cavity 302 for secondary dilution, reducing the nitrogen usage.

[0076] Or, after the first concentration detection unit 51 detects that multiple groups of process tail gases in the first cavity 301 are mixed and the hydrogen concentration value has reached the preset value, nitrogen does not need to be introduced, so that the first dilution pipe 21 can also be closed, and the entire dilution device does not require nitrogen supplementation.

[0077] Embodiment 3

[0078] This embodiment also provides a chemical vapor deposition tail gas treatment system. As Figure 2 shown, the treatment system includes multiple groups of process cavities 80. The process cavities 80 internally have a hot stage device for analyzing or heat-treating the process tail gas. A tail gas flow meter 81 is provided on the pipeline of the process cavity 80 to calculate the tail gas flow of each group of process cavities 80.

[0079] The processing system is equipped with the chemical vapor deposition tail gas dilution device mentioned in the above embodiments. Among them, each group of tail gas receiving pipelines 10 of the chemical vapor deposition tail gas dilution device is connected to the discharge port of the process chamber 80 in a one-to-one correspondence; the chemical vapor deposition tail gas dilution device is used to mix and dilute the process tail gases of multiple groups of tail gas analysis devices. The specific content and effects are as mentioned in the above embodiments, and will not be elaborated here.

[0080] The processing system also has a tail gas treatment device 40. The tail gas treatment device 40 is connected to the first exhaust pipeline 71 of the chemical vapor deposition tail gas dilution device and is used to treat the mixed gas discharged from the first exhaust pipeline 71.

[0081] The tail gas treatment device 40 may include a hydrogen treatment device, such as a combustion chamber, etc., to burn and treat the diluted hydrogen. The tail gas treatment device 40 may also include a nitrogen recovery device. Since a certain amount of nitrogen is added to the dilution device, the nitrogen recovery device effectively recovers and utilizes the nitrogen. Of course, the tail gas treatment device 40 may also be a recovery device for other dilution gases.

[0082] The chemical vapor deposition tail gas treatment system of this embodiment, while possessing all the advantages of the above-mentioned dilution device, can simultaneously treat multiple groups of process tail gases. Hydrogen and dilution gases are effectively treated, which conforms to the concept of energy conservation and emission reduction. The system control logic is simple, easy to operate, and can also be automated, having a good application prospect.

[0083] In the embodiments of the present utility model, unless otherwise clearly specified and limited, the first feature being "on" or "under" the second feature may be that the first and second features are in direct contact, or the first and second features are indirectly in contact through an intermediate medium. Moreover, the first feature being "above", "over" and "on top of" the second feature may be that the first feature is directly above or obliquely above the second feature, or merely indicates that the first feature is at a higher horizontal height than the second feature. The first feature being "under", "beneath" and "underneath" the second feature may be that the first feature is directly below or obliquely below the second feature, or merely indicates that the first feature is at a lower horizontal height than the second feature.

[0084] In the description of this specification, the description referring to terms such as "one embodiment", "some embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials, or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the embodiments of the present utility model. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described can be combined in a suitable manner in any one or more embodiments or examples. In addition, without contradiction, those skilled in the art can combine and combine the different embodiments or examples described in this specification and the features of different embodiments or examples.

[0085] In the description of the embodiments of the present utility model, it should be noted that the orientation or positional relationship indicated by terms such as "center", "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the embodiments of the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation to the embodiments of the present utility model. In addition, the terms "first", "second", "third" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance.

[0086] In the description of the embodiments of the present utility model, it should be noted that unless otherwise clearly specified and defined, the terms "connected" and "connection" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium. For those of ordinary skill in the art, the specific meanings of the above terms in the embodiments of the present utility model can be understood according to specific situations.

[0087] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present utility model and are not intended to limit them; although the present utility model has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that they can still modify the technical solutions recorded in the foregoing embodiments, or perform equivalent replacements on some of the technical features; and these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present utility model.

Claims

1. A chemical vapor deposition tail gas dilution device, characterized in that, Comprising: At least two groups of tail gas receiving pipelines (10); A gas storage device (30) with a gas storage cavity inside. The air inlet of the gas storage cavity is connected to the at least two groups of tail gas receiving pipelines (10), and the gas storage cavity is used for mixing different process tail gases accessed; A dilution device (20) connected to the gas storage cavity to supply dilution gas to the gas storage cavity; A first exhaust pipeline (71) arranged at the air outlet of the gas storage device (30); A gas concentration detection device (50) and a pressure detection device (60) are arranged inside the gas storage cavity; The dilution device (20) supplies dilution gas to the gas storage cavity in response to the concentration value detected by the gas concentration detection device (50), and the first exhaust pipeline (71) discharges the mixed gas in response to the pressure value detected by the pressure detection device (60).

2. The chemical vapor deposition tail gas dilution device according to claim 1, wherein The gas storage cavity includes a first cavity (301) and a second cavity (302), and the first cavity (301) is connected to the second cavity (302); The air inlet of the first cavity (301) is connected to the at least two groups of tail gas receiving pipelines (10), the second cavity (302) is connected to the first exhaust pipeline (71), and the dilution device (20) is respectively connected to the first cavity (301) and / or the second cavity (302).

3. The chemical vapor deposition tail gas dilution device according to claim 2, characterized in that, The dilution device (20) includes a first dilution pipeline (21) and a second dilution pipeline (22). The first dilution pipeline (21) is connected to the first cavity (301), and the second dilution pipeline (22) is connected to the second cavity (302); The gas concentration detection device (50) includes a first concentration detection unit (51) arranged inside the first cavity (301) and a second concentration detection unit (52) arranged inside the second cavity (302). The first dilution pipeline (21) supplies dilution gas to the first cavity (301) in response to the concentration value detected by the first concentration detection unit (51), and the second dilution pipeline (22) supplies dilution gas to the second cavity (302) in response to the concentration value detected by the second concentration detection unit (52).

4. The chemical vapor deposition tail gas dilution device according to claim 3, characterized in that, The tail gas receiving pipeline (10) is connected to the bottom of the first cavity (301), and the first dilution pipeline (21) is connected to the top of the first cavity (301).

5. The chemical vapor deposition tail gas dilution device according to claim 3, characterized in that, The outlet end of the second dilution pipeline (22) includes a plurality of nozzles (221), and the nozzles (221) are evenly arranged inside the second cavity (302).

6. The chemical vapor deposition tail gas dilution device according to claim 3, characterized in that, A mixing tank (31) is arranged inside the gas storage device (30). The inside of the mixing tank (31) forms the first cavity (301), and the second cavity (302) is a circulating chamber surrounding the mixing tank (31). An exhaust valve (311) is arranged on the surface of the mixing tank (31), and the exhaust valve (311) is used to connect the first cavity (301) and the second cavity (302).

7. The chemical vapor deposition tail gas dilution device according to claim 6, characterized in that, The pressure detection device (60) includes a first pressure detection unit (61) disposed in the first cavity (301) and a second pressure detection unit (62) disposed in the second cavity (302). The exhaust valve (311) discharges the mixed gas into the second cavity (302) in response to the pressure value detected by the first pressure detection unit (61). The first exhaust pipeline (71) discharges the mixed gas in the second cavity (302) in response to the pressure value detected by the second pressure detection unit (62).

8. The chemical vapor deposition tail gas dilution device according to claim 6, characterized in that, A plurality of negative pressure devices (32) are provided on the inner peripheral wall of the second cavity (302). The negative pressure devices (32) are arranged in the direction of the channel of the circulation chamber to drive the mixed gas to circulate in the circulation chamber.

9. The chemical vapor deposition tail gas dilution device according to claim 7, wherein A second exhaust pipeline (72) is connected between the first cavity (301) and the first exhaust pipeline (71). The second exhaust pipeline (72) discharges the mixed gas into the first exhaust pipeline (71) in response to the pressure value detected by the first pressure detection unit (61) and the concentration value detected by the first concentration detection unit (51).

10. A chemical vapor deposition tail gas treatment system, characterized in that, Comprising: Multiple groups of process cavities (80) for analyzing process exhaust gas; The chemical vapor deposition exhaust gas dilution device according to any one of claims 1-9, wherein each exhaust gas receiving pipeline (10) of the chemical vapor deposition exhaust gas dilution device is connected to the process cavity (80) in a one-to-one correspondence; An exhaust gas treatment device (40) is connected to the first exhaust pipeline (71) of the chemical vapor deposition exhaust gas dilution device for treating the mixed gas discharged from the first exhaust pipeline (71).

Images