Photoetching device for thin film transistor production

Abstract

The utility model belongs to the technical field of thin film transistor production, and particularly relates to a photoetching device for thin film transistor production, which comprises photoetching equipment, a water storage tank and a filter shell are respectively arranged on the front surface of the photoetching equipment, the back surface of the water storage tank is fixedly communicated with the output end of the photoetching equipment, and the front surface of the water storage tank is fixedly communicated with a communicating pipe; the back face of the filter shell is fixedly communicated with the end, away from the water storage tank, of the communicating pipe, the front face of the filter shell is fixedly communicated with a water pump, a flow meter is arranged above the filter shell, and the sensing end of the flow meter penetrates through the filter shell and extends into the filter shell. According to the device, waste water generated by the photoetching equipment can flow into the waste water collecting pipeline through the water storage tank, the communicating pipe and the filter shell, meanwhile, the waste water can be filtered by utilizing the filter plate in the filter shell, and the amount of water flowing in the filter shell can be sensed through the flow meter, so that whether the filter plate needs to be replaced or cleaned or not can be judged in time.

Description

Technical Field

[0001] The utility model belongs to the technical field of thin film transistor production, and particularly relates to a lithography device for thin film transistor production. Background Technique

[0002] A thin film transistor is a field effect transistor and has wide applications in modern electronic technologies. A thin film transistor mainly consists of a gate, an insulating layer, a semiconductor layer, a source electrode, and a drain electrode. By applying a voltage to the gate, the electric field in the semiconductor layer is changed, thereby controlling the current between the source electrode and the drain electrode.

[0003] The lithography device in thin film transistor production is a key device and plays a crucial role in the semiconductor manufacturing process. The lithography device projects the pattern on the mask onto the wafer coated with photoresist, and then uses a specific chemical solution to develop the photoresist, thereby forming the required circuit pattern on the wafer.

[0004] Currently, in the prior art, a large amount of wastewater is generated during the cleaning and developing processes of the lithography device. These wastewaters contain pollutants such as photoresist and metal ions. Usually, after the wastewater is used, during the wastewater collection process, some preliminary filtering devices, such as gratings or filter meshes, may be set up to remove larger solid particles and impurities in the wastewater to prevent them from clogging or damaging the subsequent treatment equipment. However, due to filtering a large amount of wastewater for a long time, the filter mesh may become congested. When the congestion of the filter mesh cannot be detected and processed in time, it may affect the operation of the lithography device during thin film transistor production.

[0005] To solve the above problems, a lithography device for thin film transistor production is proposed in this application. Content of the Utility Model

[0006] The purpose of the utility model is to provide a lithography device for thin film transistor production, which solves the problems raised in the above background technique.

[0007] To solve the above technical problems, the utility model is realized through the following technical solutions:

[0008] The utility model is a lithography device for thin film transistor production, including a lithography equipment. A water storage tank and a filter housing are respectively arranged on the front of the lithography equipment. The back of the water storage tank is fixedly communicated with the output end of the lithography equipment. A communicating pipe is fixedly communicated with the front of the water storage tank. The back of the filter housing is fixedly communicated with one end of the communicating pipe away from the water storage tank. A water pump is fixedly communicated with the front of the filter housing. A flow meter is arranged above the filter housing. The sensing end of the flow meter penetrates through the filter housing and extends into the interior of the filter housing. A chute frame is fixedly connected to the inner wall of the filter housing, and a filter plate is slidably connected to the interior of the chute frame.

[0009] Furthermore, a sealing ring is fixedly connected to the outer surface of the connecting pipe, and the back surface of the sealing ring is fixedly connected to the front surface of the water storage tank.

[0010] Furthermore, an observation plate is clamped on the left side surface of the water storage tank, and the observation plate needs to be made of transparent glass.

[0011] Furthermore, a sealing door is movably hinged to the upper surface of the filter housing, and a handle is fixedly connected to the upper surface of the sealing door.

[0012] Furthermore, a fixing ring is fixedly connected to the outer surface of the flowmeter, and the bottom surface of the fixing ring is fixedly connected to the upper surface of the filter housing.

[0013] Furthermore, a support plate is fixedly connected to the bottom surface of the water pump, and the back surface of the support plate is fixedly connected to the front surface of the filter housing.

[0014] Furthermore, a flange is fixedly connected to the outer surface of the output end of the water pump, and two reinforcing openings are formed in the front surface of the flange.

[0015] The utility model has the following beneficial effects:

[0016] By providing a water storage tank, the utility model can store the waste water, and by the operation of the water pump, the waste water in the water storage tank can be transferred to the water pump through the connecting pipe and the filter housing. At the same time, through the water pump, the waste water can be transferred to the treatment pipeline, so that the waste water generated by the lithography equipment for thin film transistor production can be collected.

[0017] By providing a filter plate, the utility model can filter the waste water in the filter housing. At the same time, by using the flowmeter, the flow data in the filter housing can be sensed and displayed. When the water passing through the filter plate becomes small, it can be judged whether the filter plate needs to be cleaned or replaced through the flowmeter. When the operation of the water pump stops, the waste water can stop flowing in the filter housing, and at the same time, the waste water can temporarily flow into the water storage tank for storage. Furthermore, the staff can conveniently take out the filter plate through the sliding groove frame outside the filter housing for replacement or cleaning, so that the filter plate can be replaced or cleaned without affecting the operation of the lithography equipment.

[0018] In summary, by stopping the pumping of the water pump, the waste water generated by the lithography equipment can temporarily stay in the water storage tank, and the staff can conveniently replace the filter plate in the filter housing. At the same time, through the sensing of the flowmeter, the staff can judge whether the filter plate needs to be replaced or cleaned, which can further reduce the impact of the waste water generated by the lithography equipment on the normal production of thin film transistors.

[0019] Of course, when implementing any product of the utility model, it is not necessarily required to achieve all the above advantages simultaneously. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the following will briefly introduce the drawings required for the description of the embodiments. Obviously, the drawings in the following description are only some embodiments of the present utility model. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0021] Figure 1 It is a schematic diagram of the overall external structure of the present utility model;

[0022] Figure 2 It is a schematic diagram of the structure of the water storage tank in the present utility model;

[0023] Figure 3 It is a schematic diagram of the structure of the filter housing in the present utility model;

[0024] Figure 4 It is a schematic diagram of the structure of the water pump in the utility model;

[0025] In the drawings, the list of components represented by each reference numeral is as follows:

[0026] In the figure: 1, lithography equipment; 2, water storage tank; 3, filter housing; 4, observation plate; 5, sealing ring; 6, water pump; 7, connecting pipe; 8, sealing door; 9, flow meter; 10, reinforcement port; 11, flange; 12, support plate; 13, fixing ring; 14, handle; 15, filter plate; 16, chute rack. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0027] The following will clearly and completely describe the technical solutions in the embodiments of the present utility model with reference to the drawings in the embodiments of the present utility model. Obviously, the described embodiments are only some, rather than all, of the embodiments of the present utility model. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present utility model without creative efforts fall within the protection scope of the present utility model.

[0028] In the description of the present utility model, it should be understood that the terms "opening", "upper", "lower", "thickness", "top", "middle", "length", "inner", "periphery", etc. indicating the orientation or positional relationship are only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the components or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as a limitation of the present utility model.

[0029] Please refer to Figures 1-4As shown in the figure, the utility model is a lithography device for thin film transistor production, including a lithography device 1. A water storage tank 2 and a filter housing 3 are respectively arranged on the front surface of the lithography device 1. The back surface of the water storage tank 2 is fixedly communicated with the output end of the lithography device 1. A communicating pipe 7 is fixedly communicated with the front surface of the water storage tank 2. The back surface of the filter housing 3 is fixedly communicated with one end of the communicating pipe 7 away from the water storage tank 2. A water pump 6 is fixedly communicated with the front surface of the filter housing 3. A flow meter 9 is arranged above the filter housing 3. The sensing end of the flow meter 9 penetrates the filter housing 3 and extends into the interior of the filter housing 3. A chute frame 16 is fixedly connected to the inner wall of the filter housing 3. A filter plate 15 is slidably connected inside the chute frame 16. In this embodiment, the filter plate 15 can slide within the chute frame 16, so that it is convenient to take out and install the filter plate 15 in the filter housing 3.

[0030] Among them, a sealing ring 5 is fixedly connected to the outer surface of the communicating pipe 7. The back surface of the sealing ring 5 is fixedly connected to the front surface of the water storage tank 2. In this embodiment, through the sealing ring 5, the connection between the communicating pipe 7 and the water storage tank 2 can be sealed, thereby improving the sealing performance between the devices.

[0031] Among them, an observation plate 4 is clamped on the left side surface of the water storage tank 2. The observation plate 4 needs to be made of transparent glass. In this embodiment, through the observation plate 4, the water volume in the water storage tank 2 can be understood at any time by using the perspective feature.

[0032] Among them, a sealing door 8 is movably hinged on the upper surface of the filter housing 3. A handle 14 is fixedly connected to the upper surface of the sealing door 8. In this embodiment, through the sealing door 8, the filter housing 3 can be opened or closed, and by using the handle 14, it is convenient to open or close the sealing door 8.

[0033] Among them, a fixing ring 13 is fixedly connected to the outer surface of the flow meter 9. The bottom surface of the fixing ring 13 is fixedly connected to the upper surface of the filter housing 3. In this embodiment, through the fixing ring 13, the flow meter 9 can be fixed on the filter housing 3. At the same time, the flow meter 9 is mainly composed of a measuring probe and a connecting cable. The measuring probe is usually in the shape of a slender rod and can be inserted into the pipeline for flow measurement.

[0034] Among them, a support plate 12 is fixedly connected to the bottom surface of the water pump 6. The back surface of the support plate 12 is fixedly connected to the front surface of the filter housing 3. In this embodiment, through the support plate 12, the water pump 6 can be fixed on the filter housing 3, enabling the water pump 6 to work stably.

[0035] Among them, a flange 11 is fixedly connected to the outer surface of the output end of the water pump 6. Two reinforcing openings 10 are provided on the front surface of the flange 11. In this embodiment, through the flange 11, the waste water pipeline can be communicated with the water pump 6, and by using the reinforcing openings 10, the connection can be fixed.

[0036] It can be understood that first, through the operation of the water pump 6, the wastewater generated by the lithography device 1 can flow into the wastewater collection pipeline through the water storage tank 2, the connecting pipe 7, and the filter housing 3. At the same time, by using the filter plate 15 in the filter housing 3, the wastewater can be filtered, and through the flow meter 9, the water flow volume in the filter housing 3 can be sensed, so as to timely judge whether the filter plate 15 needs to be replaced or cleaned. Then, by cooperating the filter housing 3 with the chute frame 16, the filter plate 15 can be conveniently taken out for cleaning or installed for filtration, thereby enabling the lithography device 1 to reduce the impact of wastewater on production during operation.

[0037] A specific application of this embodiment is as follows: When in use, first, connect the lithography device 1, the flow meter 9, and the water pump 6 to the power supply, and move the device to a suitable position for use. Then, connect the wastewater pipeline to the water pump 6 through the flange 11, and fix the connection through the reinforcement port 10. Turn on the lithography device 1, the flow meter 9, and the water pump 6. When the lithography device 1 produces thin film transistors, the generated wastewater flows into the water storage tank 2. At the same time, through the operation of the water pump 6, the wastewater in the water storage tank 2 is pumped into the connecting pipe 7, the filter housing 3, and the wastewater pipeline for further treatment. When the wastewater passes through the filter housing 3, the wastewater is filtered by the filter plate 15 in the filter housing 3, and the flow meter 9 detects and displays the flow rate of the wastewater passing through the filter housing 3 in real time. When the staff finds that the flow rate drops through the flow meter 9, turn off the water pump 6. At this time, the wastewater generated by the lithography device 1 is temporarily retained in the water storage tank 2. Then, the staff opens the sealing door 8 through the handle 14, and takes out the filter plate 15 in the filter housing 3 through the chute frame 16 for cleaning or replacement. After the filter plate 15 is replaced or cleaned, close the sealing door 8 again, and at the same time turn on the water pump 6, thereby reducing the impact of wastewater on the lithography device 1 when producing thin film transistors.

[0038] In the description of this specification, the description referring to terms such as "one embodiment", "example", "specific example", etc. means that the specific features, structures, materials, or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described can be combined in a suitable manner in any one or more embodiments or examples.

[0039] The preferred embodiments of the present utility model disclosed above are only used to help illustrate the present utility model. The preferred embodiments do not describe all the details in detail, nor do they limit the present utility model to the specific embodiments described. Obviously, according to the content of this specification, many modifications and changes can be made. These embodiments are selected and specifically described in this specification in order to better explain the principle and practical application of the present utility model, so that those skilled in the relevant technical field can well understand and utilize the present utility model. The present utility model is only limited by the claims and their full scope and equivalents.

Claims

1. A lithography apparatus for thin film transistor production, comprising a lithography device (1), characterized in that: On the front side of the lithography apparatus (1), a water storage tank (2) and a filter housing (3) are respectively provided. The back side of the water storage tank (2) is fixedly communicated with the output end of the lithography apparatus (1). A communicating pipe (7) is fixedly communicated with the front side of the water storage tank (2). The back side of the filter housing (3) is fixedly communicated with one end of the communicating pipe (7) away from the water storage tank (2). A water pump (6) is fixedly communicated with the front side of the filter housing (3). A flowmeter (9) is provided above the filter housing (3). The sensing end of the flowmeter (9) penetrates through the filter housing (3) and extends into the interior of the filter housing (3). An inner wall of the filter housing (3) is fixedly connected with a chute frame (16), and a filter plate (15) is slidably connected inside the chute frame (16).

2. The lithography apparatus for manufacturing a thin film transistor according to claim 1, wherein: A sealing ring (5) is fixedly connected to the outer surface of the communicating pipe (7), and the back side of the sealing ring (5) is fixedly connected to the front side of the water storage tank (2).

3. A lithography apparatus for manufacturing a thin film transistor according to claim 1, characterized in that: An observation plate (4) is snap-connected to the left side surface of the water storage tank (2), and the observation plate (4) needs to be made of transparent glass.

4. A lithography apparatus for manufacturing a thin film transistor according to claim 1, characterized in that: A sealing door (8) is movably hinged to the upper surface of the filter housing (3), and a handle (14) is fixedly connected to the upper surface of the sealing door (8).

5. A lithography apparatus for manufacturing a thin film transistor according to claim 1, characterized in that: A fixing ring (13) is fixedly connected to the outer surface of the flowmeter (9), and the bottom surface of the fixing ring (13) is fixedly connected to the upper surface of the filter housing (3).

6. A lithography apparatus for manufacturing a thin film transistor according to claim 1, characterized in that: A support plate (12) is fixedly connected to the bottom surface of the water pump (6), and the back side of the support plate (12) is fixedly connected to the front side of the filter housing (3).

7. A lithography apparatus for manufacturing a thin film transistor according to claim 1, characterized in that: A flange plate (11) is fixedly connected to the outer surface of the output end of the water pump (6), and two reinforcing openings (10) are formed in the front surface of the flange plate (11).

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