Wafer manipulator for semiconductor processing

Abstract

The utility model relates to the technical field of semiconductor processing, and discloses a wafer manipulator for semiconductor processing, which comprises a main body mechanism and a manipulator adjusting mechanism, the manipulator adjusting mechanism is positioned above the main body mechanism, and the main body mechanism comprises an adjusting mounting seat, a mounting groove and an adjusting assembly. The mounting groove is fixedly formed in the rear end of the upper end of the adjusting mounting base, and the adjusting assembly is located above the adjusting mounting base. And the adjusting assembly comprises a transmission motor and a rotating shaft, and the transmission motor is fixedly mounted at the left end of the inner end of the mounting groove. According to the wafer manipulator for semiconductor processing, the main body mechanism is installed, so that the adjusting capacity of the wafer manipulator is improved, in the actual use process, the installation and use position of the manipulator body can be conveniently adjusted according to use requirements, and wafers can be conveniently conveyed; and the use convenience of the wafer manipulator for semiconductor processing is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor processing, and particularly relates to a wafer manipulator for semiconductor processing. Background Technique

[0002] A wafer is one of the important components in semiconductor chip manufacturing. During the wafer processing, a wafer manipulator for semiconductor processing is required to convey the position of the wafer for convenient processing operations.

[0003] The prior art patent document with the publication number CN117373965B discloses a wafer transport manipulator capable of tracking semiconductor wafer production defects. The utility model includes a manipulator mechanism, on which a wafer tray and a high-definition camera are installed. A data analysis module is also loaded on the manipulator mechanism. The data analysis module obtains the historical training data set of the semiconductor wafer body, and trains a yield prediction learning model of the semiconductor wafer body based on the historical training data set. After the manipulator mechanism obtains the semiconductor wafer body through the wafer tray, the data analysis module obtains the image data and station labels of the semiconductor wafer body in real time. The data analysis module extracts the gray-level co-occurrence matrix based on the image data, and calculates the angular second distance data according to the gray-level co-occurrence matrix, improving the maintenance effect and efficiency of the semiconductor wafer body processing equipment and ensuring the yield of the semiconductor wafer body.

[0004] However, due to the poor adjustment ability of the prior art patent technology with the publication number CN117373965B during use, in the actual use process, it is not convenient to adjust the installation and use position of the manipulator. Since the manipulator is fixedly installed on the equipment, it is not convenient to adjust the installation and use position of the manipulator according to the processing needs, affecting the use convenience. Summary of the Utility Model

[0005] (1) Technical Problems to be Solved

[0006] The purpose of the utility model is to provide a wafer manipulator for semiconductor processing to solve the problem that the prior art is not convenient to adjust the installation and use position of the manipulator mentioned in the above background technique.

[0007] (2) Technical Solutions

[0008] To achieve the above purpose, the utility model provides the following technical solutions: A wafer manipulator for semiconductor processing includes a main body mechanism and a manipulator adjustment mechanism. The manipulator adjustment mechanism is located above the main body mechanism. The main body mechanism includes an adjustment mounting base, a mounting groove, and an adjustment component. The mounting groove is fixedly arranged at the rear end of the upper end of the adjustment mounting base, and the adjustment component is located above the adjustment mounting base.

[0009] The adjusting assembly includes a driving motor and a rotating shaft. The driving motor is fixedly installed at the left end of the inner end of the installation groove, and the rotating shaft is fixedly installed at the driving end of the right end of the driving motor.

[0010] Preferably, the adjusting assembly further includes a protective block, a threaded rod, a support block, a limit nut, a chute, a slide rod, a slider, and a support rod. The protective block is fixedly installed at the right end of the rotating shaft.

[0011] Preferably, the threaded rod is fixedly installed at the right end of the protective block, the support block is fixedly installed at the right end of the inner end of the installation groove, the right end of the threaded rod is rotatably connected to the support block, and the limit nut is threadedly connected to the outer end of the threaded rod.

[0012] Preferably, the chute is fixedly arranged at the front end of the upper end of the adjusting mounting seat, the slide rod is fixedly installed at the inner end of the chute, the slider is movably installed at the outer end of the slide rod, and the support rod is fixedly installed at the upper ends of the limit nut and the slider.

[0013] Preferably, the manipulator adjusting mechanism includes a connecting seat, a manipulator body, a hydraulic cylinder, a hydraulic push rod, an electric push rod, a push rod, an anti-slip crystal disc, and a mounting plate. The connecting seat is fixedly installed at the upper end of the support rod.

[0014] Preferably, the manipulator body is fixedly installed at the upper end of the connecting seat, the hydraulic cylinder is fixedly installed at the front end of the manipulator body, and the hydraulic push rod is fixedly installed at the driving end of the front end of the hydraulic cylinder.

[0015] Preferably, the electric push rod is fixedly installed at the lower end of the hydraulic push rod, the push rod is fixedly installed at the driving end of the lower end of the electric push rod, the anti-slip crystal disc is fixedly installed at the lower end of the push rod, and the mounting plate is fixedly installed at the lower end of the adjusting mounting seat.

[0016] Compared with the prior art, the beneficial effects of the present utility model are as follows:

[0017] 1. For the wafer manipulator for semiconductor processing, through the installation of the main body mechanism, the adjusting ability of the present utility model is improved. During actual use, the installation and use position of the manipulator body can be conveniently adjusted according to the use needs, and it is convenient to convey the wafer, improving the use convenience of the wafer manipulator for semiconductor processing;

[0018] 2. For the wafer manipulator for semiconductor processing, through the installation of the manipulator adjusting mechanism, the adjusting and conveying ability of the present utility model is improved. During actual use, the use position and height of the anti-slip crystal disc can be conveniently adjusted, facilitating the conveying operation of the wafer. Description of the Drawings

[0019] Figure 1Schematic three-dimensional structure diagram of the present utility model;

[0020] Figure 2 Schematic structure diagram of the adjustment assembly of the present utility model;

[0021] Figure 3 Schematic enlarged partial structure diagram of the adjustment assembly of the present utility model;

[0022] Figure 4 Schematic structure diagram of the manipulator adjustment mechanism of the present utility model.

[0023] In the figure: 1. Main body mechanism; 101. Adjustment mounting seat; 102. Installation groove; 103. Adjustment assembly; 1031. Driving motor; 1032. Rotating shaft; 1033. Protective block; 1034. Threaded rod; 1035. Support block; 1036. Limit nut; 1037. Chute; 1038. Slide bar; 1039. Slide block; 10310. Support rod; 2. Manipulator adjustment mechanism; 201. Connecting seat; 202. Manipulator body; 203. Hydraulic cylinder; 204. Hydraulic push rod; 205. Electric push rod; 206. Push rod; 207. Anti-slip crystal disc; 208. Installation plate. Specific implementation manners

[0024] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0025] Please refer to Figures 1-4 , the present utility model provides a technical solution: a wafer manipulator for semiconductor processing, including a main body mechanism 1 and a manipulator adjustment mechanism 2. The manipulator adjustment mechanism 2 is located above the main body mechanism 1. The main body mechanism 1 includes an adjustment mounting seat 101, an installation groove 102, and an adjustment assembly 103. The installation groove 102 is fixedly arranged at the rear end of the upper end of the adjustment mounting seat 101, and the adjustment assembly 103 is located above the adjustment mounting seat 101;

[0026] The adjustment assembly 103 includes a driving motor 1031 and a rotating shaft 1032. The driving motor 1031 is fixedly installed at the left end of the inner end of the installation groove 102, and the rotating shaft 1032 is fixedly installed at the driving end of the right end of the driving motor 1031. The adjustment assembly 103 further includes a protective block 1033, a threaded rod 1034, a support block 1035, a limit nut 1036, a chute 1037, a slide rod 1038, a slider 1039, and a support rod 10310. The protective block 1033 is fixedly installed at the right end of the rotating shaft 1032, the threaded rod 1034 is fixedly installed at the right end of the protective block 1033, the support block 1035 is fixedly installed at the right end of the inner end of the installation groove 102, the right end of the threaded rod 1034 is rotatably connected to the support block 1035, the limit nut 1036 is threadedly connected to the outer end of the threaded rod 1034, the chute 1037 is fixedly arranged at the front end of the upper end of the adjustment mounting base 101, the slide rod 1038 is fixedly installed at the inner end of the chute 1037, the slider 1039 is movably installed at the outer end of the slide rod 1038, the support rod 10310 is fixedly installed at the upper ends of the limit nut 1036 and the slider 1039. Start the driving motor 1031 to rotate the rotating shaft 1032, so that the rotating shaft 1032 drives the threaded rod 1034 to rotate, and the limit nut 1036 moves left and right on the threaded rod 1034, driving the connecting seat 201 to move.

[0027] The manipulator adjustment mechanism 2 includes a connecting seat 201, a manipulator body 202, a hydraulic cylinder 203, a hydraulic push rod 204, an electric push rod 205, a push rod 206, an anti-slip crystal disc 207, and a mounting plate 208. The connecting seat 201 is fixedly installed at the upper end of the support rod 10310, the manipulator body 202 is fixedly installed at the upper end of the connecting seat 201, the hydraulic cylinder 203 is fixedly installed at the front end of the manipulator body 202, the hydraulic push rod 204 is fixedly installed at the driving end of the front end of the hydraulic cylinder 203, the electric push rod 205 is fixedly installed at the lower end of the hydraulic push rod 204, the push rod 206 is fixedly installed at the driving end of the lower end of the electric push rod 205, the anti-slip crystal disc 207 is fixedly installed at the lower end of the push rod 206, and the mounting plate 208 is fixedly installed at the lower end of the adjustment mounting base 101. Start the hydraulic cylinder 203 to adjust the length of the hydraulic push rod 204, and at the same time start the electric push rod 205 to adjust the height of the push rod 206.

[0028] Working principle: When in need of use, first, the wafer manipulator for semiconductor processing is stably installed on the device through the screw holes at the upper end of the mounting plate 208. Start the drive motor 1031 to rotate the rotating shaft 1032, so that the rotating shaft 1032 drives the threaded rod 1034 to rotate, making the limit nut 1036 move left and right on the threaded rod 1034 to adjust the use position of the connecting seat 201. At the same time, drive the slider 1039 to move on the slide rod 1038, which is convenient for adjusting the use position of the manipulator body 202 and facilitating the left and right conveying of the wafer. Place the wafer on the anti-slip crystal disc 207, start the hydraulic cylinder 203 to adjust the length of the hydraulic push rod 204, and at the same time start the electric push rod 205 to adjust the height of the push rod 206, so as to push the anti-slip crystal disc 207 to move and convey the wafer to different positions and different heights.

[0029] Finally, it should be noted that the above content is only used to illustrate the technical solution of the present invention, rather than a limitation on the protection scope of the present invention. Any simple modification or equivalent replacement made by those of ordinary skill in the art to the technical solution of the present invention shall not depart from the essence and scope of the technical solution of the present invention.

Claims

1. A wafer manipulator for semiconductor processing, comprising a main body mechanism (1) and a manipulator adjustment mechanism (2), characterized in that: The manipulator adjusting mechanism (2) is located above the main body mechanism (1). The main body mechanism (1) includes an adjusting mounting base (101), a mounting groove (102), and an adjusting component (103). The mounting groove (102) is fixedly arranged at the rear end of the upper end of the adjusting mounting base (101), and the adjusting component (103) is located above the adjusting mounting base (101). The adjusting component (103) includes a driving motor (1031) and a rotating shaft (1032). The driving motor (1031) is fixedly installed at the left end of the inner end of the mounting groove (102), and the rotating shaft (1032) is fixedly installed at the driving end of the right end of the driving motor (1031).

2. A wafer manipulator for semiconductor processing according to claim 1, characterized in that: The adjusting component (103) further includes a protective block (1033), a threaded rod (1034), a support block (1035), a limit nut (1036), a chute (1037), a slide rod (1038), a slider (1039), and a support rod (10310). The protective block (1033) is fixedly installed at the right end of the rotating shaft (1032).

3. A wafer manipulator for semiconductor processing according to claim 2, characterized in that: The threaded rod (1034) is fixedly installed at the right end of the protective block (1033). The support block (1035) is fixedly installed at the right end of the inner end of the mounting groove (102). The right end of the threaded rod (1034) is rotatably connected to the support block (1035), and the limit nut (1036) is threadedly connected to the outer end of the threaded rod (1034).

4. A wafer manipulator for semiconductor processing according to claim 3, characterized in that: The chute (1037) is fixedly arranged at the front end of the upper end of the adjusting mounting base (101). The slide rod (1038) is fixedly installed at the inner end of the chute (1037). The slider (1039) is movably installed at the outer end of the slide rod (1038). The support rod (10310) is fixedly installed at the upper ends of the limit nut (1036) and the slider (1039).

5. The wafer manipulator for semiconductor processing according to claim 4, wherein: The manipulator adjusting mechanism (2) includes a connecting seat (201), a manipulator body (202), a hydraulic cylinder (203), a hydraulic push rod (204), an electric push rod (205), a push rod (206), an anti-slip crystal disc (207), and a mounting plate (208). The connecting seat (201) is fixedly installed at the upper end of the support rod (10310).

6. The wafer manipulator for semiconductor processing according to claim 5, wherein: The manipulator body (202) is fixedly installed at the upper end of the connecting seat (201). The hydraulic cylinder (203) is fixedly installed at the front end of the manipulator body (202), and the hydraulic push rod (204) is fixedly installed at the driving end of the front end of the hydraulic cylinder (203).

7. A wafer manipulator for semiconductor processing according to claim 6, characterized in that: The electric push rod (205) is fixedly installed at the lower end of the hydraulic push rod (204). The push rod (206) is fixedly installed at the driving end of the lower end of the electric push rod (205). The anti-slip crystal disc (207) is fixedly installed at the lower end of the push rod (206). The mounting plate (208) is fixedly installed at the lower end of the adjusting mounting base (101).

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