Soaking device for filter element of gluing machine

Abstract

The utility model discloses a gumming machine filter element soaking device which comprises an ultrasonic groove, an acetone circulating pump, a photoresist circulating pump, an acetone storage container and a photoresist storage container, a filter element is provided with a first port and a second port, the first port is communicated with the acetone storage container and the photoresist storage container through a first three-way valve, and the second port is communicated with a second three-way valve through a second three-way valve. The second port is respectively communicated with an acetone circulating pipeline and a photoresist circulating pipeline through a second three-way valve, the filter element is also respectively provided with switch valves on the outer sides of the first port and the second port, and the other end of the acetone circulating pipeline is communicated with an acetone storage container through an acetone circulating pump; the other end of the photoresist circulating pipeline is communicated with a photoresist storage container through a photoresist circulating pump, and the acetone storage container and the photoresist storage container are respectively used for storing acetone and photoresist. The gumming machine filter element soaking device can effectively solve the problem that bubbles are left after the filter element is soaked, and the time for replacing the filter element is shortened.

Description

Technical Field

[0001] The utility model relates to the technical field of filter element cleaning equipment, in particular to a filter element soaking device for a glue coater. Background Art

[0002] In the manufacturing and advanced packaging processes of semiconductor devices, the lithography process refers to the process of transferring the pattern designed on a photomask (MASK) to the film layer on the surface of a substrate, such as a semiconductor wafer, through processes such as photoresist coating, exposure, and development on the substrate. During the photoresist coating process, a photoresist film layer is formed by spraying a photoresist solution on the surface of the substrate, and then a specified pattern structure is formed in the photoresist layer on the surface of the substrate through the exposure and development processes. In the above-mentioned photoresist spraying process, generally, the wafer is placed in a special glue coater and the spin coating method is used to complete it.

[0003] The components of the photoresist generally include a photosensitive resin, a sensitizer, and a solvent. During spin coating, the photoresist is dispersed from the center of the wafer to the edge of the wafer due to the centrifugal force of rotation. During the spin coating process, the cleanliness of the wafer surface directly affects the quality of the photoresist film layer after coating, and a high-quality photoresist film layer is necessary for subsequent lithography and etching.

[0004] The photoresist is usually spin-coated on the surface of the wafer by a glue coater. Generally, a filter element is used to filter the photoresist between the photoresist barrel and the nozzle, mainly filtering particles and bubbles in the photoresist.

[0005] Currently, the filter element generally needs to be replaced once every about 30 days. Before the new filter element is put into use, it needs to be soaked in acetone to avoid air bubbles in the filter element. After soaking, it is replaced on the glue coater, and then the photoresist is passed through. However, the conventional method of directly soaking in acetone still has the problem that the filter element is not soaked thoroughly and there are still air bubbles left. Summary of the Utility Model

[0006] The embodiment of the present application provides a filter element soaking device for a glue coater, which can effectively solve the problem of air bubbles remaining in the filter element after soaking, reduce the probability of abnormal glue coating caused by the existence of air bubbles in the filter element, and at the same time, can also shorten the time for replacing the filter element.

[0007] An embodiment of the present application provides a filter element soaking device for a glue applicator, including an ultrasonic tank, an acetone circulation pump, a photoresist circulation pump, an acetone storage container, and a photoresist storage container. The ultrasonic tank is used for soaking the filter element. The filter element has a first port and a second port respectively. The filter element is connected to the acetone storage container and the photoresist storage container respectively through a first three-way valve at the first port. The filter element is connected to an acetone circulation pipeline and a photoresist circulation pipeline respectively through a second three-way valve at the second port. The filter element is also provided with on-off valves on the outer sides of the first port and the second port respectively. The other end of the acetone circulation pipeline is connected to the acetone storage container through the acetone circulation pump. The other end of the photoresist circulation pipeline is connected to the photoresist storage container through the photoresist circulation pump. The acetone storage container and the photoresist storage container are used for storing acetone and photoresist respectively.

[0008] In a possible implementation manner, water is contained in the ultrasonic tank, and the height of the water completely submerges the filter element.

[0009] In a possible implementation manner, a filter element fixing mechanism is arranged in the ultrasonic tank. The filter element fixing mechanism includes a fixing bracket and a matching first clamp and second clamp. The first clamp is fixedly installed on one side of the top plate of the fixing bracket. The second clamp is located outside the top plate and is hinged to the first clamp at one end and bolted to the first clamp at the other end.

[0010] In a possible implementation manner, relief structures are symmetrically arranged at the relative inner ends of the first clamp and the second clamp.

[0011] In a possible implementation manner, the relief structure is a relief cavity penetrating through both ends, or a plurality of relief grooves evenly distributed at the inner end.

[0012] Beneficial effects: Compared with the prior art, the filter element soaking device for a glue applicator provided by the present application soaks the filter element through an ultrasonic tank. The device fills the filter element with acetone completely through an acetone circulation pump to ensure no air bubbles. After the urgency ends, the filter element is filled with photoresist through a photoresist circulation pump. When the filter element of the glue applicator needs to be replaced, the filter element filled with photoresist can be directly disassembled and connected to the glue applicator, which can not only meet the requirement of no air bubbles in the filter element, but also realize the rapid replacement of the filter element.

[0013] These and other objects, features, and advantages of the present utility model are fully embodied through the following detailed description. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 The structural schematic diagram of the filter element soaking device for a glue applicator of the present application is shown.

[0015] Figure 2 Shows a schematic structural view of the filter element fixing mechanism in the present application.

[0016] Figure 3 Shows a partial schematic structural view of the filter element fixing mechanism in the present application.

[0017] Figure 4 Shows a partial schematic structural view of the filter element fixing mechanism in the present application. Detailed implementation manner

[0018] The following description is used to disclose the present utility model so that those skilled in the art can implement the present utility model. The preferred embodiments described below are only examples, and other obvious variations can be conceived by those skilled in the art. The basic principles defined in the following description can be applied to other implementation schemes, variant schemes, improvement schemes, equivalent schemes, and other technical schemes that do not depart from the spirit and scope of the present utility model.

[0019] Those skilled in the art should understand that in the disclosure of the specification, the orientation or positional relationships indicated by the terms "longitudinal", "lateral", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. are based on the orientation or positional relationships shown in the drawings. It is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, the above terms should not be construed as limitations on the present utility model.

[0020] It can be understood that the term "one" should be understood as "at least one" or "one or more". That is, in one embodiment, the number of an element can be one, while in other embodiments, the number of the element can be multiple. The term "one" should not be construed as a limitation on the number.

[0021] Refer to Figures 1 to 4, an embodiment of the present application provides a filter element soaking device for a glue applicator, which includes an ultrasonic tank, an acetone circulation pump 20, a photoresist circulation pump 30, an acetone storage container 40, and a photoresist storage container 50. The ultrasonic tank is used to soak the filter element 10. In addition, the filter element 10 has a first port and a second port respectively. The filter element 10 is connected to the acetone storage container 40 and the photoresist storage container 50 respectively through a first three-way valve 11 at the first port. At the same time, the filter element 10 is connected to an acetone circulation pipeline 13 and a photoresist circulation pipeline 14 respectively through a second three-way valve 12 at the second port. In addition, switching valves 15 are provided outside the first port and the second port of the filter element 10 respectively. The other end of the acetone circulation pipeline 13 is connected to the acetone storage container 40 through the acetone circulation pump 20, and the other end of the photoresist circulation pipeline 14 is connected to the photoresist storage container 50 through the photoresist circulation pump 30. The acetone storage container 40 and the photoresist storage container 50 are used to store acetone and photoresist respectively.

[0022] During the operation, first remove the caps at both ends of the filter element 10 to be soaked, and connect all the pipelines and components according to the above connection method;

[0023] Fill the ultrasonic tank with an ultrasonic conduction liquid, such as water, and then soak the filter element 10 in the ultrasonic tank. The height of the water completely submerges the filter element 10;

[0024] Open the switching valves 15 at both ends of the filter element 10, turn both the first three-way valve 11 and the second three-way valve 12 at both ends of the filter element 10 to the pipeline where the acetone storage container 40 is located, and open the acetone circulation pump 20 to make the acetone in the acetone storage container 40 flow into the filter element 10. Circulate for 10 minutes to completely fill the filter element 10 with acetone, ensure that there are no bubbles in the filter element 10, and let it stand;

[0025] After standing for 3 hours, open the acetone circulation pump 20 again to circulate the acetone to further remove the bubbles in the filter element 10 and avoid the possibility of having bubbles. After circulating for 10 minutes, turn off the acetone circulation pump 20;

[0026] Turn the first three-way valve 11 on the filter element 10 to the other path, that is, the pipeline connected to the photoresist storage container 50. The photoresist stored in the photoresist storage container 50 is the same as that on the glue applicator. Open the photoresist circulation pump 30 to make the photoresist enter the filter element 10, and at the same time discharge the acetone in the filter element 10 and the acetone circulation pipeline 13;

[0027] After the filter element 10 is completely filled with photoresist, turn off the photoresist circulation pump 30 and let it stand for 1 hour;

[0028] After standing still, turn the second three-way valve 12 towards the photoresist circulation pipeline 14, and turn on the photoresist circulation pump 30 again to circulate the photoresist in the filter element 10. After circulating for 15 minutes, turn off the photoresist circulation pump 30 and close the switch valves 15 at both ends. At this time, the filter element 10 is filled with photoresist and there are no bubbles;

[0029] When the filter element 10 needs to be replaced in the coating machine, the above-mentioned filter element 10 filled with photoresist can be directly replaced on the machine table, which is convenient to operate and there are no bubbles in the filter element.

[0030] In one embodiment, a filter element fixing mechanism 60 is arranged in the ultrasonic tank for fixing the filter element 10 in the ultrasonic tank. The filter element fixing mechanism 60 includes a fixing bracket 61 and a first clamp 62 and a second clamp 63 that cooperate with each other. The first clamp 62 is fixedly installed on one side of the top plate 611 of the fixing bracket 61, and the second clamp 63 is located outside the top plate 611 and is hinged to the first clamp 62 at one end and bolted to the first clamp 62 at the other end. In this way, the filter element 10 can be fixed by the first clamp 62 and the second clamp 63, and the first port and the second port at the top and bottom of the filter element 10 are exposed to facilitate the connection of the pipeline.

[0031] Further preferably, the first clamp 62 and the second clamp 63 are symmetrically provided with a weight reduction structure 601 at the relative inner ends to reduce the weights of the first clamp 62 and the second clamp 63 and facilitate the disassembly and installation of the filter element.

[0032] Further preferably, the weight reduction structure 601 is a weight reduction cavity penetrating through both ends (such as Figure 3 ), or a plurality of weight reduction grooves evenly distributed at the inner ends (such as Figure 4 ).

[0033] It should be noted that the terms "first, second" in this application are only for descriptive purposes, do not represent any order, and cannot be understood as indicating or implying relative importance. These terms can be interpreted as names.

[0034] Those skilled in the art should understand that the embodiments of the present invention described above and shown in the drawings are only examples and do not limit the present invention. The advantages of the present invention have been fully and effectively realized. The functions and structural principles of the present invention have been shown and described in the embodiments. Without departing from the above principles, the embodiments of the present invention can have any deformation or modification.

Claims

1. Glue applicator filter element soaking device, characterized in that, It includes an ultrasonic tank, an acetone circulation pump, a photoresist circulation pump, an acetone storage container and a photoresist storage container. The ultrasonic tank is used for soaking the filter element. The filter element has a first port and a second port respectively. The filter element is connected to the acetone storage container and the photoresist storage container respectively through a first three-way valve at the first port. The filter element is connected to an acetone circulation pipeline and a photoresist circulation pipeline respectively through a second three-way valve at the second port. The filter element is also provided with on-off valves on the outer sides of the first port and the second port respectively. The other end of the acetone circulation pipeline is connected to the acetone storage container through the acetone circulation pump. The other end of the photoresist circulation pipeline is connected to the photoresist storage container through the photoresist circulation pump. The acetone storage container and the photoresist storage container are used for storing acetone and photoresist respectively.

2. The glue applicator filter element soaking device according to claim 1, characterized in that Water is contained in the ultrasonic tank, and the height of the water completely submerges the filter element.

3. The glue applicator filter element soaking device according to claim 1, characterized in that, A filter element fixing mechanism is arranged in the ultrasonic tank. The filter element fixing mechanism includes a fixing bracket and a matching first clamp and second clamp. The first clamp is fixedly installed on one side of the top plate of the fixing bracket. The second clamp is located outside the top plate and is hinged to the first clamp at one end and bolted to the first clamp at the other end.

4. The glue applicator filter element soaking device according to claim 3, characterized in that, The first clamp and the second clamp are symmetrically provided with a relief structure at the opposite inner ends.

5. The glue applicator filter element soaking device according to claim 4, characterized in that, The relief structure is a relief cavity penetrating through both ends, or a plurality of relief grooves evenly distributed at the inner end.

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