Exposure machine capable of adjusting exposure light intensity at high precision

Abstract

The utility model discloses an exposure machine capable of adjusting exposure light intensity with high precision, which comprises an exposure table, an exposure assembly and a sliding assembly, the exposure assembly comprises a light source, a lens assembly and an optical filter, and the lens assembly comprises a first concave mirror, a first plane mirror, a second plane mirror and a second concave mirror. The light source is arranged at the bottom of the first concave mirror, and light emitted by the light source sequentially passes through the first concave mirror, the first plane mirror, the optical filter, the second plane mirror and the second concave mirror to reach a panel in the exposure table for exposure; the second concave mirror slides and ascends and descends in the vertical direction through the sliding assembly so as to adjust the height of the second concave mirror. Compared with the adjustment of four bolts in the prior art, the sliding adjustment of the second concave mirror by the sliding assembly improves the precision of adjusting the height of the second concave mirror, ensures the uniformity of the light intensity on the substrate, reduces the difficulty of adjusting the height of the second concave mirror, and improves the working efficiency.

Description

Technical Field

[0001] The utility model relates to the field of exposure machines, and particularly to an exposure machine for precisely adjusting exposure light intensity. Background Technique

[0002] In the display screen industry, the production of patterns on TP / TFT substrates requires processes such as cleaning, coating, exposure, and development. In the exposure process, ultraviolet light passes through the MASK and irradiates the substrate coated with photoresist, and then through the development process, so as to transfer the pattern on the MASK to the substrate. The uniformity of the pattern lines after development is closely related to the uniformity of the light intensity of the ultraviolet light irradiated on the substrate in the exposure machine.

[0003] In the prior art, a concave mirror is fixed to the frame by bolts, and the height of the concave mirror for the reflection effect of light can be adjusted by the bolts below it. In the past, when adjusting the reflected light of the concave mirror, the staff needed to climb to the top of the exposure machine to manually adjust the height of 4 bolts to adjust the height of the concave mirror, and then adjust the uniformity of the light intensity on the exposure table. However, due to the large thread pitch of the bolts, and after each adjustment, the staff needed to measure the light intensity at 9 points on the exposure table and calculate its light intensity uniformity, and so on until the light intensity uniformity reached the requirement. Therefore, it is difficult to adjust the reflection angle of the concave mirror 2 and the efficiency is low. Content of the Utility Model

[0004] The purpose of the utility model is to overcome the deficiencies in the prior art and provide an exposure machine for precisely adjusting exposure light intensity.

[0005] The purpose of the utility model is achieved by the following technical solutions:

[0006] An exposure machine for precisely adjusting exposure light intensity, comprising:

[0007] An exposure table for placing a panel;

[0008] An exposure assembly, the exposure assembly includes a light source, a lens assembly, and a filter. The lens assembly includes a first concave mirror, a first plane mirror, a second plane mirror, and a second concave mirror. The second concave mirror is arranged above the exposure table. The light source is arranged at the bottom of the first concave mirror. The light emitted by the light source sequentially passes through the first concave mirror, the first plane mirror, the filter, the second plane mirror, and the second concave mirror, and reaches the panel in the exposure table for exposure;

[0009] A sliding assembly, the second concave mirror slides up and down in the vertical direction through the sliding assembly to adjust the height of the second concave mirror.

[0010] In one embodiment, a through hole is formed in the first concave mirror. The light source includes a wire and a wick. The wick is disposed at the bottom of the reflecting surface of the first concave mirror. One end of the wire passes through the through hole and is electrically connected to the wick.

[0011] In one embodiment, the exposure table includes a workbench and a plurality of light intensity detectors. The emission directions of the light intensity detectors face different monitoring points on the workbench. The light intensity detectors are used to monitor the light intensity on the workbench.

[0012] In one embodiment, the light intensity detector is a light intensity sensor.

[0013] In one embodiment, the number of the light intensity sensors is nine. The workbench includes an upper part, a middle part and a lower part. Three of the light intensity sensors form a group. The three groups of light intensity sensors respectively monitor the upper part, the middle part and the lower part.

[0014] In one embodiment, the light intensity sensors are arranged at equal intervals on the workbench.

[0015] In one embodiment, hemispherical concave surfaces are respectively provided on the first concave mirror and the second concave mirror. The light rays of the light source are converged and reflected by the hemispherical concave surfaces.

[0016] In one embodiment, the exposure assembly further includes an exposure shutter and a frame. One end of the sliding assembly is disposed on the frame, and the other end is slidably connected to the second concave mirror. The exposure table and the exposure assembly are disposed in the frame. The exposure shutter is disposed on the frame.

[0017] In one embodiment, the sliding assembly includes a first sliding block and a second sliding block. The top of the first sliding block is connected to the second concave mirror. The bottom of the second sliding block is connected to the frame. The first sliding block and the second sliding block are slidably connected.

[0018] In one embodiment, the filter is an IR filter.

[0019] Compared with the prior art, the present utility model has at least the following advantages:

[0020] The exposure machine for precisely adjusting the exposure light intensity of the present utility model is provided with an exposure table, an exposure assembly, and a sliding assembly. The exposure assembly includes a light source, a lens assembly, and a filter. The lens assembly includes a first concave mirror, a first plane mirror, a second plane mirror, and a second concave mirror. The second concave mirror slides up and down in the vertical direction through the sliding assembly to adjust the height of the second concave mirror. Compared with the adjustment of 4 bolts in the prior art, the sliding adjustment of the sliding assembly for the second concave mirror improves the precision of adjusting the height of the second concave mirror, ensures the uniformity of the light intensity on the substrate, reduces the difficulty of adjusting the height of the second concave mirror, and thus improves the working efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the drawings required for use in the embodiments will be briefly introduced below.

[0022] Figure 1 It is a schematic structural diagram of an exposure machine for precisely adjusting the exposure light intensity in an embodiment of the present utility model;

[0023] Figure 2 For Figure 1 the enlarged structural diagram of A in

[0024] REFERENCE SIGNS:

[0025] Exposure table 10, workbench 11, light intensity detector 12, filter 20, light source 21, wire 22, wick 23, first concave mirror 24, first plane mirror 25, second plane mirror 26, second concave mirror 27, sliding assembly 30, first sliding block 31, second sliding block 32, exposure shutter 33, frame 34, light ray 40. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0026] To facilitate the understanding of the present utility model, the present utility model will be described more comprehensively below with reference to the relevant drawings.

[0027] The present application provides an exposure machine for precisely adjusting the exposure light intensity. Please refer to Figure 1 and Figure 2 , which includes: an exposure table 10, an exposure assembly, and a sliding assembly 30. The exposure table 10 is used to place the panel; the exposure assembly is used to expose the panel in the exposure table 10. The exposure assembly includes a light source 21, a lens assembly, and a filter 20. The light source 21 is a high-pressure mercury lamp, and the light source 21 is used to emit ultraviolet rays. The lens assembly is used to reflect the ultraviolet rays, and the filter 20 filters out light rays 40 of a certain wavelength.

[0028] Among them, the lens assembly includes a first concave mirror 24, a first plane mirror 25, a second plane mirror 26, and a second concave mirror 27. The first concave mirror 24 is above the first plane mirror 25, and the second concave mirror 27 is arranged above the exposure table 10. The light source 21 is arranged at the bottom of the first concave mirror 24.

[0029] Specifically, the sliding assembly 30 includes a first sliding block 31 and a second sliding block 32. One side of the first sliding block 31 is slidably clamped on one side of the second sliding block 32. The top of the first sliding block 31 is connected to the second concave mirror 27, and the bottom of the second sliding block 32 is connected to the frame 34. The second concave mirror 27 slides up and down in the vertical direction through the sliding assembly 30 to adjust the height of the second concave mirror 27. Compared with the adjustment of 4 bolts in the prior art for the sliding adjustment of the second concave mirror 27 by the sliding assembly 30, the sliding assembly 30 can adjust the second concave mirror 27 at any height. Since the thread pitch of the bolt is large and the adjustment accuracy is low, the sliding assembly 30 improves the accuracy of adjusting the height of the second concave mirror 27, ensures the uniformity of the light intensity on the substrate, reduces the difficulty of adjusting the height of the second concave mirror 27, and thus improves the working efficiency.

[0030] It should be noted that after the light source 21 emits the light ray 40, the optical path of the light ray 40 propagation is as follows: the first concave mirror 24 converges the parallel light rays onto the first plane mirror 25; the first plane mirror 25 reflects the parallel light rays through the filter 20 to filter the light ray 40; the filtered light ray 40 is reflected by the second plane mirror 26 onto the second concave mirror 27; the second concave mirror 27 converges and reflects the parallel light rays onto the panel in the exposure table 10 for exposure.

[0031] Preferably, the filter 20 is an IR filter 20.

[0032] In an embodiment, a through hole is formed in the first concave mirror 24. The light source 21 includes a wire 22 and a wick 23. The wick 23 is arranged at the bottom of the reflecting surface of the first concave mirror 24. One end of the wire 22 passes through the through hole and is electrically connected to the wick 23, and the other end is electrically connected to the power supply module to supply electrical energy to the wick 23. The wire 22 is arranged in the through hole to prevent the wire 22 from affecting the reflection effect of the light ray 40 in the reflecting surface of the first concave mirror 24. At the same time, under the high-intensity irradiation of the wick 23, heat will be generated inside the first concave mirror 24, and the wire 22 is prevented from aging due to heat acceleration.

[0033] In an exposure machine, after the light source 21 is lit, the emitted ultraviolet light is reflected by the lens assembly and finally irradiates the substrate on the exposure table 10, thereby forming its corresponding optical system. After passing through several reflectors, the light finally passes through the second concave mirror 27 and is reflected to form parallel light, which is perpendicularly irradiated on the exposure table 10. If the light 40 formed after the reflection of the second concave mirror 27 is not perpendicularly irradiated on the exposure table 10, the light intensity of 9 points on the upper, middle and lower parts of the table board will be different, which will lead to poor line width uniformity of the pattern after development.

[0034] In an embodiment, the exposure table 10 includes a workbench 11 and a plurality of light intensity detectors 12. The light intensity detectors 12 monitor the light intensity on the workbench 11 in real time, convert the light signal into an electrical signal, and feedback it to the display screen of the exposure machine in real time. The emission direction of the light intensity detectors 12 faces different monitoring points on the workbench 11, eliminating the need for staff to test the light intensity on the workbench 11 at fixed points each time.

[0035] Further, the light intensity detector 12 is a light intensity sensor.

[0036] Still further, the number of light intensity sensors is 9. The workbench 11 includes an upper part, a middle part and a lower part. Three light intensity sensors form a group, and the three groups of light intensity sensors respectively monitor the upper part, the middle part and the lower part, so that the accuracy of the light intensity sensors in monitoring the light intensity uniformity on the workbench 11 is higher.

[0037] In addition, the light intensity sensors are arranged at equal intervals on the workbench 11, further improving the accuracy of the light intensity sensors in monitoring the light intensity uniformity on the workbench 11.

[0038] In an embodiment, hemispherical concave surfaces are respectively provided on the first concave mirror 24 and the second concave mirror 27, and the hemispherical concave surfaces are used for converging and reflecting parallel light.

[0039] Please refer to again Figure 1 and Figure 2 The exposure assembly further includes an exposure shutter 33 and a frame 34. The exposure shutter 33 is arranged on the frame 34. The exposure shutter 33 is a start button. After the staff presses the exposure shutter 33, the exposure machine immediately exposes the substrate in the exposure table 10. Specifically, one end of the sliding assembly 30 is arranged on the frame 34, and the other end is slidably connected to the second concave mirror 27. When adjusting the sliding assembly 30, the top of the first sliding block 31 abuts against one side of the second concave mirror 27, and the first sliding block 31 is supported on the frame 34 through the second sliding block 32. The exposure table 10 and the exposure assembly are arranged in the frame 34.

[0040] The above-described embodiments merely represent several implementation manners of the present utility model. The description is relatively specific and detailed, but it should not be construed as a limitation on the scope of the utility model patent. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present utility model, several modifications and improvements can still be made, and these all fall within the protection scope of the present utility model. Therefore, the protection scope of the present utility model patent shall be subject to the appended claims.

Claims

1. An exposure machine for precisely adjusting the exposure light intensity, characterized in that, Comprising: An exposure table for placing a panel. An exposure assembly, the exposure assembly including a light source, a lens assembly, and a filter. The lens assembly includes a first concave mirror, a first plane mirror, a second plane mirror, and a second concave mirror. The second concave mirror is disposed above the exposure table. The light source is disposed at the bottom of the first concave mirror. The light emitted by the light source sequentially passes through the first concave mirror, the first plane mirror, the filter, the second plane mirror, and the second concave mirror and reaches the panel in the exposure table for exposure. A sliding assembly, the second concave mirror sliding up and down in the vertical direction through the sliding assembly to adjust the height of the second concave mirror.

2. The exposure machine for precisely adjusting the exposure light intensity according to claim 1, wherein A through hole is formed in the first concave mirror. The light source includes a wire and a lamp wick. The lamp wick is disposed at the bottom of the reflecting surface of the first concave mirror. One end of the wire passes through the through hole and is electrically connected to the lamp wick.

3. The exposure machine for precisely adjusting the exposure light intensity according to claim 1, wherein, The exposure table includes a workbench and a plurality of light intensity detectors. The emission directions of the light intensity detectors face different monitoring points on the workbench. The light intensity detectors are used to monitor the light intensity on the workbench.

4. The exposure machine for precisely adjusting the exposure light intensity according to claim 3, wherein, The light intensity detector is a light intensity sensor.

5. The exposure machine for precisely adjusting exposure light intensity according to claim 4, wherein The number of the light intensity sensors is 9. The workbench includes an upper part, a middle part, and a lower part. Three of the light intensity sensors are in a group. The three groups of light intensity sensors respectively monitor the upper part, the middle part, and the lower part.

6. The exposure machine for precisely adjusting the exposure light intensity according to claim 5, wherein The light intensity sensors are arranged at equal intervals on the workbench.

7. The exposure machine for precisely adjusting the exposure light intensity according to claim 1, wherein, Hemispherical concave surfaces are respectively provided on the first concave mirror and the second concave mirror, and the light of the light source is converged and reflected by the hemispherical concave surfaces.

8. The exposure machine for precisely adjusting the exposure light intensity according to claim 1, wherein The exposure assembly further includes an exposure shutter and a frame. One end of the sliding assembly is disposed on the frame, and the other end is slidably connected to the second concave mirror. The exposure table and the exposure assembly are disposed within the frame. The exposure shutter is disposed on the frame.

9. The exposure machine for precisely adjusting the exposure light intensity according to claim 8, wherein The sliding assembly includes a first sliding block and a second sliding block. The top of the first sliding block is connected to the second concave mirror, and the bottom of the second sliding block is connected to the frame. The first sliding block and the first sliding block are slidably connected.

10. The exposure machine for precisely adjusting the exposure light intensity according to claim 1, wherein The filter is an IR filter.

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