Magnetron sputtering coating machine for vibrating diaphragm

By introducing structures such as slip rings and driven gears into the magnetron sputtering coating machine, multi-angle sputtering between the target and the substrate is realized, the film inhomogeneity problem is solved, and the target utilization rate and substrate stability are improved.

CN223189249UActive Publication Date: 2025-08-05XINGGUO HONGMING ELECTRONIC TECH CO LTD
View PDF 0 Cites 1 Cited by

Patent Information

Application Number
CN202521304926.X
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-06-25
Publication Date
2025-08-05
Estimated Expiration
2035-06-25

AI Technical Summary

Technical Problem

The position of the target material in the existing magnetron sputtering coating machine is fixed, resulting in the relative position and angle between the substrate and the target material unchanged, resulting in uneven film deposition in certain areas, affecting the consistency of coating and target material utilization.

Method used

The structures of slip ring, driven gear, driving gear, support block, placement frame, arc block, etc. are adopted. Through the combination of sliding grooves and springs, multi-angle sputtering between the target and the substrate is achieved, the film uniformity is optimized, and the stability and limiting effect of the substrate are improved through the slot and spring structure.

Benefits of technology

Multi-angle sputtering of the target material is realized, the uniformity of the film and the utilization rate of the target material are improved, and the stability and limiting effect of the substrate are enhanced.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN223189249U_ABST
    Figure CN223189249U_ABST
Patent Text Reader

Abstract

The utility model relates to the technical field of coating machines, in particular to a vibrating diaphragm magnetron sputtering coating machine which comprises a machine body, a base plate and a heating plate are mounted on the inner side of the machine body, a transom window and an exhaust port are formed in one side of the outer surface of the machine body, a vacuum pump is mounted on one side of the outer surface of the exhaust port, and a vibrating diaphragm is mounted on the vacuum pump. A motor and a fixing plate are installed at the two ends of the inner side of the machine body correspondingly, a supporting rod is installed at the output end of the motor, a movable frame is rotationally connected to the bottom end of the fixing plate, a top plate and a tray are fixedly installed on the outer surface of the supporting rod, and a sliding ring device is rotationally connected to the outer side of the tray. According to the multi-angle sputtering coating machine, the arc-shaped block is arranged on the coating machine, rapid limiting of a target material is facilitated, meanwhile, the rotating speed of the target material and the rotating speed of a base material are made to be different through the driven gear, multi-angle sputtering of the target material is achieved, and the utilization rate of the target material is increased.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The utility model relates to the technical field of coating machines, in particular to a diaphragm magnetron sputtering coating machine. Background Art

[0002] A diaphragm is a thin film structure used to vibrate and produce sound in speakers, headphones, or other audio devices. It is usually made of lightweight materials and plays the role of converting electrical signals into sound waves. When current passes through the speaker coil, the generated magnetic field causes the diaphragm to move back and forth, thereby driving the air to vibrate and produce sound. The diaphragm coating process requires the use of a magnetron sputtering coating machine. It is a device used in physical vapor deposition technology. Through the sputtering principle, atoms or molecules on the surface of the target material are bombarded and released, and then deposited on the surface of the target substrate to form a uniform thin film. However, the position of the target material in the existing magnetron sputtering coating machine is fixed, and the coating work is achieved by rotating the substrate. Since the relative position and angle between the substrate and the target material always remain unchanged, it is easy to cause too much or too little film deposition in certain areas, thereby affecting the consistency of the coating. In addition, due to the angle problem, some areas of the target surface cannot be fully impacted by ions, resulting in low sputtering efficiency and reduced target material utilization. Therefore, it is necessary to improve the magnetron sputtering coating machine. Utility Model Content

[0003] The purpose of this utility model is to solve the technical problems raised in the above background technology.

[0004] The utility model adopts the following technical solution: a diaphragm magnetron sputtering coating machine includes a body, a substrate and a heating plate are installed on the inner side of the body, and an air window and an exhaust port are opened on one side of the outer surface of the body, a vacuum pump is installed on one side of the outer surface of the exhaust port, a motor and a fixed plate are installed on both ends of the inner side of the body respectively, a support rod is installed on the output end of the motor, the bottom end of the fixed plate is rotatably connected to the movable frame, the outer surface of the support rod is fixedly installed with a top plate and a tray, the outer side of the tray is rotatably connected to a slip ring, the top end of the slip ring and the bottom end of the movable frame are both fixedly installed with a support block, a target material is provided on the inner side of the support block, the top end of the tray and the bottom end of the top plate are both fixedly installed with a placement rack, a fixed rod is fixedly installed on the inner side of the body, the outer surface of the fixed rod is rotatably connected to a driven gear, the outer surface of the driven gear is rotatably connected to a driving gear, a slide groove is opened on one side of the outer surface of the support block, an arc block is slidably connected to the inner side of the slide groove, and a pull rope is fixedly installed on one end of the outer surface of the arc block.

[0005] Preferably, the inner side of the slip ring and the outer side of the driving gear are meshed with the outer side of the driven gear, and the driving gear is fixedly mounted on the surface of the support rod. Here, the driving gear can be driven to rotate by the support rod.

[0006] Preferably, the support blocks and the placement racks are staggered and distributed on the surfaces of the slip ring, the movable rack, the tray and the top plate. Here, the support blocks and the placement racks facilitate the placement of the target and the substrate.

[0007] Preferably, a first spring is fixedly mounted on the other end of the outer surface of the arc block, and one end of the outer surface of the first spring is fixedly mounted on the inner end of the slide groove. Here, the arc block can be driven to move by the expansion and contraction of the first spring.

[0008] Preferably, a protrusion is fixedly mounted on one end of the outer surface of the arc block, and the protrusion is clamped to the other side of the outer surface of the support block. Here, the protrusion facilitates the arc block to be clamped on the support block.

[0009] Preferably, the placement rack has a slot on one side of its outer surface, a receiving slot on one side of its inner surface, a second spring fixedly mounted on one end of the inner surface of the receiving slot, and a block fixedly mounted on one end of the outer surface of the second spring, the block being slidably connected to the inner side of the slot. Here, the expansion and contraction of the second spring can drive the block to move.

[0010] Preferably, the placement rack and the outer surface of the clamping block are each provided with a slot, a threaded rod is rotatably connected to the inner side of the slot, a rotating block is fixedly mounted on one end of the outer surface of the threaded rod, a stop bar is slidably connected to the inner surface of the clamping block, and the threaded rod is rotatably connected to the outer surface of the stop bar. Here, the stop bar facilitates the positioning of the substrate.

[0011] Compared with the prior art, the advantages and positive effects of the present invention are:

[0012] 1. The utility model is provided with a slip ring, a fixed rod, a driven gear, a driving gear, a support block, a placement frame, a slide groove, an arc block, a pull rope and a first spring. The fixed rod can be used to support the position of the driven gear. The structural combination of the slip ring, the driven gear and the driving gear makes the rotation speeds of the slip ring and the tray inconsistent. The slide groove can realize the placement function of the arc block position. The arc block can realize the limiting function of the target material position. The pull rope and the first spring can realize the movement function of the arc block position. The device has a simple structure and provides convenience for rapid limitation of the target material through the arc block. At the same time, the driven gear makes the rotation speed of the target material and the substrate different, thereby realizing multi-angle sputtering of the target material, optimizing the uniformity of the thin film and improving the utilization rate of the target material.

[0013] 2. The utility model is provided with a card slot, a receiving slot, a second spring, a card block, a slot, a threaded rod, a rotating block and a stop bar. The receiving slot realizes the placement function of the second spring position, the expansion and contraction of the second spring realizes the movement function of the card block position, the rotating block realizes the movement function of the threaded rod position, and the stop bar realizes the limiting function of the substrate position. The structure has strong stability, and the resetting of the second spring ensures that the card block always has a lateral force, which further limits the threaded rod, provides convenience for substrate limitation and improves its stability. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 A schematic diagram of a diaphragm magnetron sputtering coating machine is provided for the utility model;

[0015] Figure 2 The utility model provides a side view of a diaphragm magnetron sputtering coating machine;

[0016] Figure 3 A cross-sectional view of a diaphragm magnetron sputtering coating machine is provided for the utility model;

[0017] Figure 4 The utility model provides a bottom view of the exploded structure of a diaphragm magnetron sputtering coating machine;

[0018] Figure 5 An exploded diagram of a diaphragm magnetron sputtering coating machine is proposed for the utility model;

[0019] Figure 6 This is an enlarged stereoscopic diagram of the exploded structure of a support block in a diaphragm magnetron sputtering coating machine proposed in the utility model;

[0020] Figure 7 This is an enlarged perspective view of the exploded structure of a placement rack in a diaphragm magnetron sputtering coating machine proposed in the utility model;

[0021] Figure 8 This utility model proposes a diaphragm magnetron sputtering coating machine Figure 7 Side view of the .

[0022] Legend:

[0023] 1. Machine body; 2. Base plate; 3. Heating plate; 4. Air window; 5. Vacuum pump; 6. Exhaust port; 7. Motor; 8. Support rod; 9. Fixed plate; 10. Movable frame; 11. Top plate; 12. Tray; 13. Slip ring; 14. Target; 15. Fixed rod; 16. Driven gear; 17. Driving gear; 18. Support block; 19. Placement rack; 20. Slide groove; 21. Arc block; 22. Pull rope; 23. First spring; 24. Slot; 25. Storage slot; 26. Second spring; 27. Block; 28. Slot; 29. Threaded rod; 30. Rotating block; 31. Stop bar. DETAILED DESCRIPTION

[0024] In order to more clearly understand the above-mentioned purpose, features and advantages of the present invention, the present invention is further described below with reference to the accompanying drawings and embodiments. It should be noted that the embodiments of the present application and the features therein can be combined with each other without conflict.

[0025] In the following description, many specific details are set forth to facilitate a full understanding of the present invention. However, the present invention may also be implemented in other ways than those described herein. Therefore, the present invention is not limited to the specific embodiments disclosed in the following specification.

[0026] Example 1

[0027] See also Figure 1-5 The utility model provides a technical solution: a diaphragm magnetron sputtering coating machine, comprising a body 1, a substrate 2 and a heating plate 3 are installed on the inner side of the body 1, and an air window 4 and an exhaust port 6 are opened on one side of the outer surface of the body 1, the air window 4 facilitates the addition of argon gas, and a vacuum pump 5 is installed on one side of the outer surface of the exhaust port 6, which facilitates the extraction of gas from the body 1. A motor 7 and a fixed plate 9 are respectively installed on both ends of the inner side of the body 1, a support rod 8 is installed on the output end of the motor 7, and the bottom end of the fixed plate 9 is rotatably connected to a movable frame 10, a top plate 11 and a tray 12 are fixedly installed on the outer surface of the support rod 8, and the outer side of the tray 12 is rotatably connected There is a slip ring 13, the top of the slip ring 13 and the bottom of the movable frame 10 are fixedly installed with a support block 18, the inner side of the support block 18 is provided with a target material 14, the top of the tray 12 and the bottom of the top plate 11 are fixedly installed with a placement rack 19, the inner side of the body 1 is fixedly installed with a fixed rod 15, the outer surface of the fixed rod 15 is rotatably connected to the driven gear 16, the outer surface of the driven gear 16 is rotatably connected to the driving gear 17, the inner side of the slip ring 13 and the outer side of the driving gear 17 are meshed with the outer side of the driven gear 16, and the driving gear 17 is fixedly installed on the surface of the support rod 8, and the driving gear 17 can be driven to rotate by the support rod 8.

[0028] See also Figure 5-6The support block 18 and the placement rack 19 are staggered and distributed on the surface of the slip ring 13, the movable rack 10, the tray 12 and the top plate 11. The support block 18 and the placement rack 19 facilitate the placement of the target material 14 and the substrate. A slide groove 20 is provided on one side of the outer surface of the support block 18. The inner side of the slide groove 20 is slidably connected with an arc block 21. A pull rope 22 is fixedly installed on one end of the outer surface of the arc block 21. A first spring 23 is fixedly installed on the other end of the outer surface of the arc block 21. One end of the outer surface of the first spring 23 is fixedly installed on the inner side of the slide groove 20. At one end of the side, the arc block 21 can be driven to move by the expansion and contraction of the first spring 23. A protrusion is fixedly installed on one end of the outer surface of the arc block 21, and the protrusion is clamped on the other side of the outer surface of the support block 18. The protrusion facilitates the arc block 21 to be clamped on the support block 18, and the arc block 21 provides convenience for the rapid limitation of the target material 14. At the same time, the driven gear 16 makes the rotation speed of the target material 14 and the substrate different, thereby realizing multi-angle sputtering of the target material 14, optimizing the uniformity of the thin film, and improving the utilization rate of the target material 14.

[0029] Example 2

[0030] See also Figure 5 、 Figure 7 and Figure 8 The outer surface of the placing frame 19 is provided with a slot 24, and the inner surface of the slot 24 is provided with a receiving slot 25. One end of the inner surface of the receiving slot 25 is fixedly installed with a second spring 26, and one end of the outer surface of the second spring 26 is fixedly installed with a block 27. The block 27 is slidably connected to the inner side of the slot 24 through the expansion and contraction of the second spring 26, which can drive the block 27 to move.

[0031] Working principle: When using the coating machine, you first need to open the box door, and then use the rotating block 30 to drive the threaded rod 29 to move, so that the threaded rod 29 drives the blocking bar 31 to move inside the block 27, then the threaded rod 29 rotates away from the slot 28 on the placement rack 19, and moves the blocking bar 31 to the card slot 24, then insert the substrate on the placement rack 19, and adjust the position of the card block 27 according to the size of the substrate, so that the second spring 26 is stretched with the movement of the card block 27, and then the threaded rod 29 is driven by the rotating block 30 to be inserted into the slot 28, Then, the threaded rod 29 drives the blocking bar 31 to be clamped on the inner side of the placement rack 19, so that the blocking bar 31 limits the substrate, and the reset of the second spring 26 makes the card block 27 always have a lateral force, which further limits the threaded rod 29, provides convenience for limiting the substrate and improves its stability. Then, the arc block 21 is moved by the pull rope 22, so that the arc block 21 drives the first spring 23 to be compressed, and then the support block 18 will leave a gap, and then the target material 14 is placed into the inner side of the support block 18 through the gap, and then the pull rope is released. 22, and the arc block 21 is moved by the reset of the first spring 23, so that the protrusion on the arc block 21 is inserted into the surface of the support block 18, which provides convenience for the rapid limitation of the target 14, and then the box door is closed, and the air in the body 1 is evacuated by the vacuum pump 5, and then argon gas is added into the body 1 through the air window 4, and then the support rod 8 is driven by the motor 7 to rotate, so that the support rod 8 drives the top plate 11, the tray 12 and the driving gear 17 to rotate, and then the driving gear 17 drives the driven gear 16 to rotate, so that the driven gear 16 drives the sliding The ring device 13 rotates, and the different numbers of teeth between the driving gear 17, the driven gear 16 and the slip ring device 13 make the rotation speed of the slip ring device 13 and the tray 12 different. Then, through the magnetic field generated by the substrate 2 and the argon gas in the body 1, the atoms or molecules on the surface of the target material 14 are bombarded and released, and deposited on the surface of the substrate to form a uniform thin film, thereby completing the coating work on the substrate. Since the rotation speed of the target material 14 is different from that of the substrate, the target material 14 can be sputtered at multiple angles, which optimizes the uniformity of the thin film and improves the utilization rate of the target material 14.

[0032] The above description is only a preferred embodiment of the present invention and does not limit the present invention in any other form. Any technician familiar with the profession may use the technical content disclosed above to change or modify it into an equivalent embodiment with equivalent changes for application in other fields. However, any simple modification, equivalent change and modification of the above embodiment made according to the technical essence of the present invention without departing from the content of the technical solution of the present invention shall still fall within the scope of protection of the technical solution of the present invention.

Claims

1. A diaphragm magnetron sputtering coating machine, comprising a machine body (1), characterized in that: A base plate (2) and a heating plate (3) are installed on the inner side of the body (1), and an air window (4) and an exhaust port (6) are opened on one side of the outer surface of the body (1), and a vacuum pump (5) is installed on one side of the outer surface of the exhaust port (6). A motor (7) and a fixed plate (9) are installed at both ends of the inner side of the body (1), and a support rod (8) is installed at the output end of the motor (7). The bottom end of the fixed plate (9) is rotatably connected to a movable frame (10). A top plate (11) and a tray (12) are fixedly installed on the outer surface of the support rod (8). The outer side of the tray (12) is rotatably connected to a slip ring (13). The top end of the slip ring (13) and the bottom end of the movable frame (10) are both fixedly installed with a support block (18). The support block (18) A target material (14) is provided on the inner side, a placement rack (19) is fixedly installed on the top end of the tray (12) and the bottom end of the top plate (11), a fixing rod (15) is fixedly installed on the inner side of the body (1), the outer surface of the fixing rod (15) is rotatably connected to a driven gear (16), the outer surface of the driven gear (16) is rotatably connected to a driving gear (17), a slide groove (20) is provided on one side of the outer surface of the support block (18), an arc block (21) is slidably connected to the inner side of the slide groove (20), and a pull rope (22) is fixedly installed on one end of the outer surface of the arc block (21).

2. The diaphragm magnetron sputtering coating machine according to claim 1, characterized in that: The inner side of the slip ring (13) and the outer side of the driving gear (17) are both meshed with the outer side of the driven gear (16), and the driving gear (17) is fixedly mounted on the surface of the support rod (8).

3. The diaphragm magnetron sputtering coating machine according to claim 1, characterized in that: The support blocks (18) and the placement racks (19) are staggeredly distributed on the surfaces of the slip ring (13), the movable rack (10), the tray (12) and the top plate (11).

4. The diaphragm magnetron sputtering coating machine according to claim 1, characterized in that: A first spring (23) is fixedly mounted on the other end of the outer surface of the arc-shaped block (21), and one end of the outer surface of the first spring (23) is fixedly mounted on the inner end of the slide groove (20).

5. The diaphragm magnetron sputtering coating machine according to claim 1, characterized in that: A protrusion is fixedly mounted on one end of the outer surface of the arc-shaped block (21), and the protrusion is clamped to the other side of the outer surface of the support block (18).

6. The diaphragm magnetron sputtering coating machine according to claim 1, characterized in that: A card slot (24) is provided on one side of the outer surface of the placement rack (19), a receiving slot (25) is provided on one side of the inner surface of the card slot (24), a second spring (26) is fixedly mounted on one end of the inner surface of the receiving slot (25), a card block (27) is fixedly mounted on one end of the outer surface of the second spring (26), and the card block (27) is slidably connected to the inner side of the card slot (24).

7. The diaphragm magnetron sputtering coating machine according to claim 6, characterized in that: A slot (28) is provided on one side of the outer surface of the placement frame (19) and the clamping block (27); a threaded rod (29) is rotatably connected to the inner side of the slot (28); a rotating block (30) is fixedly mounted on one end of the outer surface of the threaded rod (29); a stop bar (31) is slidably connected to the inner surface of the clamping block (27), and the threaded rod (29) is rotatably connected to the outer surface of the stop bar (31).

Citation Information

Cited By

  • Vacuumizing equipment for magnetron sputtering coating machine

    CN120818807A