Uniform flow structure for vapor deposition and coating equipment

Abstract

The utility model relates to a flow uniformizing structure and coating equipment for vapor deposition, which comprises a gas inlet joint and a gas inlet pipeline, the gas inlet pipeline is connected with the gas inlet joint, the gas inlet joint comprises a top cover, a first flow uniformizing plate and a second flow uniformizing plate, the first flow uniformizing plate is arranged between the top cover and the second flow uniformizing plate, and the second flow uniformizing plate is arranged between the top cover and the second flow uniformizing plate. The inner wall of the top cover is provided with a flow guide cavity in a radial diverging shape, and the air inlet pipeline is communicated with the flow guide cavity; the flow guide cavity communicates with the diffusion layer through the first air hole set, and the diffusion layer outputs gas through the second air hole set. The flow guide cavity and the first air hole group form the flow guide path capable of performing radial diffusion, so that gas can be diffused outwards from the center position along the flow guide cavity, and the gas input by the gas inlet pipeline can increase the radius of the diffusion ring layer; and gas introduced into the gas inlet connector through the gas inlet pipeline can be uniformly diffused more sufficiently, so that the uniform gas input requirement of large-size coating equipment is met.

Description

Technical Field

[0001] The utility model relates to the field of film coating equipment, in particular to a uniform flow structure and film coating equipment for vapor deposition. Background Art

[0002] MOCVD The working principle of the (Metal Organic Chemical Vapor Deposition) equipment mainly involves organometallic compounds The process of forming a thin film on the surface of a substrate by vapor deposition. This technology is widely used in semiconductor , Optical devices , Gas sensor In the preparation of various materials such as silicon nitride, it can precisely control the thickness, composition, doping and heterojunction interface of the epitaxial layer to achieve the growth of high-quality thin films at the nanoscale.

[0003] The gas phase deposition coating equipment in the existing technology has air intake at the top. When the gas enters the coating chamber, a flow plate is set to block the direct flow of the gas. Under the resistance of the flow plate, the gas can diffuse toward the gap of the flow path, and the gas is evenly distributed through the flow plate.

[0004] However, as the chamber area of the coating equipment increases, the flow plate used in the prior art cannot guide the gas to the edge of the flow plate, resulting in poor flow uniformity and uneven formation of the vapor deposited film. Utility Model Content

[0005] The purpose of this utility model is to solve the technical problem that the flow plate of the prior art cannot achieve uniform diffusion over a large area. It provides a flow plate for vapor deposition. It can achieve a large-area gas uniform flow effect by setting a two-layer flow uniform structure and first dividing the gas from the inside to the outside on the first-level flow uniform plate. The main concept is:

[0006] A uniform flow structure for vapor deposition includes an air intake joint and an air intake pipe, wherein the air intake pipe is connected to the air intake joint, and the air intake joint includes a top cover, a first uniform flow plate and a second uniform flow plate, the first uniform flow plate is arranged between the top cover and the second uniform flow plate, the inner wall of the top cover is provided with a radially divergent guide cavity, and the air intake pipe is connected to the guide cavity; the first uniform flow plate is provided with a first radially divergent pore group, a diffusion layer is constructed between the first uniform flow plate and the second uniform flow plate, the guide cavity is connected to the diffusion layer through the first pore group, the second uniform flow plate is provided with a second pore group, and the diffusion layer outputs gas through the second pore group. The top cover and the first flow equalizer plate of the present invention respectively form a flow guide path capable of radial diffusion through the flow guide cavity and the first pore group. The gas can diffuse outward from the center position along the flow guide cavity, so that the gas inputted by the air intake pipe can increase the radius of the diffusion circle layer, and the gas will continuously enter the diffusion layer below through the first pore group during the diffusion process in the flow guide cavity, and then continue to evenly input the gas downward into the coating chamber through the second pore group opened by the second flow equalizer plate below the diffusion layer. The gas entering the air intake joint through the air intake pipe can be more fully and evenly diffused, meeting the gas uniformity input requirements of large-volume coating equipment.

[0007] Preferably, the guide cavity includes an air inlet, a radial path, and a circumferential path, wherein the radial path is a linear path and the circumferential path is an annular path. The air inlet is located at the center of the top cover, and at least one circumferential path is provided in the radial direction of the air inlet. The air inlet and the circumferential path are connected via the radial path; and / or, multiple circumferential paths are connected via the radial path. When the air inlet pipe is inserted into the position of the air inlet, the gas at the air outlet of the air inlet pipe flows from the air inlet along the radial path, and the gas then flows from the radial path to the circumferential path.

[0008] Preferably, the first pore group includes a plurality of first pores, and the plurality of first pores are arranged below the guide cavity of the top cover, and the first pore group is connected to the guide cavity. The top cover abuts against the first flow equalizer plate, and the top cover is arranged above the first flow equalizer plate. Since the flow equalizer plate is provided on the side where the top cover abuts against the first flow equalizer plate, the plurality of first pores are evenly distributed below the flow equalizer plate, so that the shape of the distribution of the first pore group is consistent with the shape of the flow equalizer plate, and the flow equalizer plate can be connected to the diffusion layer arranged below the first flow equalizer plate through the first pore group.

[0009] The second aspect of the present invention aims to solve the technical problem that the existing air intake connector includes two flow equalizers, which leads to poor structural integrity. Furthermore, the top cover includes a positioning groove and a mounting portion, the positioning groove is used to install the first flow equalizer, and the mounting portion is used to install the second flow equalizer, and the thickness of the first flow equalizer is less than the depth of the positioning groove. The second flow equalizer is tightly connected to the top cover by bolts, which can avoid side leakage of gas in the diffusion layer. The top cover is provided with a positioning groove to accommodate the first flow equalizer, and the thickness of the first flow equalizer is less than the depth of the positioning groove. On the one hand, the first flow equalizer will not interfere with the installation of the second flow equalizer, and the end face of the second flow equalizer is directly tightly connected to the mounting portion; on the other hand, the height difference between the first flow equalizer and the second flow equalizer reserves the height of the diffusion layer, so that the gas output by the first flow equalizer can diffuse in the diffusion layer, so that the structure of the air intake connector is more compact, and the integrity of the air intake connector is improved.

[0010] Preferably, the second pore group includes a plurality of second pores, and the plurality of second pores are evenly distributed on the second flow equalizer plate, with equal spacing between adjacent second pores. The equal spacing between the second pores ensures that the second pores of the second pore group are evenly distributed on the second flow equalizer plate. After the gas is evenly diffused in the diffusion layer, it can be input into the coating chamber through the evenly distributed second pores. The even distribution of gas in the coating chamber ensures the uniformity of the substrate coating layer, thereby improving the coating quality.

[0011] Preferably, a coating device includes a uniform flow structure.

[0012] Preferably, a coating apparatus further includes a chamber door and a chamber body, the chamber door and the chamber body being connected by a hinge, the chamber door being equipped with a uniform flow structure, a side wall of the chamber body being provided with an exhaust port, a sample stage for placing a substrate being provided inside the chamber, and a heating assembly for heating the substrate being provided at the bottom of the sample stage. The substrate is placed on the sample stage, and the heating assembly uniformly heats the substrate to a process temperature through the sample stage. When the substrate temperature stabilizes, gas is uniformly introduced into the coating chamber through the uniform flow structure of the coating apparatus, and the vapor deposition process is initiated to coat the substrate.

[0013] Preferably, the interior of the cavity is further provided with an exhaust flow plate, which is arranged on one side of the exhaust interface, and a gas converging layer for gas circulation is provided between the exhaust flow plate and the side wall of the cavity. An exhaust flow plate is provided at the exhaust interface, and is used to receive gas from the outlet pipe during exhaust, so that when the coating chamber of the coating equipment is exhausted, the side of the gas converging layer under the action of pressure will evenly exhaust the coating chamber in the transverse direction through the multiple air holes provided on the exhaust flow plate, thereby avoiding the formation of exhaust dead corners on both sides away from the exhaust interface, which causes slow gas extraction.

[0014] Preferably, the lower end surface of the chamber door is provided with a threaded hole for mounting the air inlet connector, the middle portion of the chamber door is provided with a through hole for inserting the air inlet pipe, a sealing assembly is provided at the through hole, and the top cover of the air inlet connector and the first flow equalizer plate are provided with coaxially arranged positioning holes. The flow equalizer structure is mounted on the chamber door by tightening bolts, and the top cover and the second flow equalizer plate are tightly fitted by tightening the bolts, thereby preventing gas in the diffusion layer above the second flow equalizer plate from escaping from the connection between the second flow equalizer plate and the mounting portion. The sealing assembly is provided at the position of the through hole for inserting the air inlet pipe to ensure the overall sealing performance of the coating chamber.

[0015] The beneficial effects of the present invention are:

[0016] The top cover and the first flow equalizer plate form a guide path capable of radial diffusion through the guide cavity and the first air hole group respectively. The gas can diffuse outward from the center position along the guide cavity, so that the gas input by the air intake pipe can increase the radius of the diffusion circle layer, and the gas will continuously enter the diffusion layer below through the first air hole group during the diffusion process in the guide cavity, and then continue to evenly input the gas downward into the coating chamber through the second air hole group opened by the second flow equalizer plate below the diffusion layer. The gas entering the air intake joint through the air intake pipe can be more fully and evenly diffused, meeting the gas uniformity input requirements of large-volume coating equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 This is a structural diagram of the uniform flow structure of the utility model.

[0018] Figure 2 It is a partially enlarged view of the structural cross section of the uniform flow structure of the utility model.

[0019] Figure 3 This is an exploded diagram of the uniform flow structure of the utility model.

[0020] Figure 4 This is a schematic diagram of the structure of the coating equipment of this utility model Figure 1 .

[0021] Figure 5 This is a schematic diagram of the structure of the coating equipment of this utility model Figure 2 .

[0022] The reference numerals include: 1. air intake duct; 2. top cover; 21. positioning groove; 22. mounting portion; 3. first flow equalizer; 31. first air hole group; 4. second flow equalizer; 41. second air hole group; 5. diffusion layer; 6. flow guide cavity; 61. air inlet; 62. radial path; 63. circular path; 7. cavity door; 72. through hole; 73. sealing assembly; 8. cavity; 81. sample table; 82. exhaust interface; 83. exhaust flow equalizer; 9. fastening bolts. DETAILED DESCRIPTION

[0023] To make the objectives, technical solutions, and advantages of the embodiments more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. When the following description refers to the drawings, unless otherwise indicated, identical numbers in different drawings represent identical or similar elements. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with the present disclosure. Instead, they are merely examples of devices and methods consistent with certain aspects of the present disclosure, as detailed in the appended claims.

[0024] In this disclosure, unless otherwise specified, directional terms such as "inner" and "outer" are defined based on the contours of the corresponding components. Terms such as "first" and "second" are used in this disclosure to distinguish one element from another and do not convey order or importance.

[0025] Example 1:

[0026] like Figures 1 to 3 As shown, this embodiment provides a uniform flow structure for vapor deposition, including an air intake connector and an air intake pipe 1, the air intake pipe 1 is connected to the air intake connector, the air intake connector includes a top cover 2, a first uniform flow plate 3 and a second uniform flow plate 4, the first uniform flow plate 3 is arranged between the top cover 2 and the second uniform flow plate 4, the inner wall of the top cover 2 is provided with a radially divergent guide cavity 6, and the air intake pipe 1 is connected to the guide cavity 6; the first uniform flow plate 3 is provided with a radially divergent first pore group 31, and a diffusion layer 5 is constructed between the first uniform flow plate 3 and the second uniform flow plate 4, the guide cavity 6 is connected to the diffusion layer 5 through the first pore group 31, the second uniform flow plate 4 is provided with a second pore group 41, and the diffusion layer 5 outputs gas through the second pore group 41.

[0027] The top cover 2 and the first flow equalizer plate 3 of this embodiment respectively form a flow guide path capable of radial diffusion through the flow guide cavity 6 and the first pore group 31. The gas can diffuse outward from the center position along the flow guide cavity 6, so that the gas input by the air intake pipe 1 can increase the radius of the diffusion circle, and the gas will continuously enter the diffusion layer 5 below through the first pore group 31 during the diffusion process in the flow guide cavity 6, and then continue to evenly input the gas downward into the coating chamber through the second pore group 41 opened by the second flow equalizer plate 4 below the diffusion layer 5. The gas entering the air intake joint through the air intake pipe 1 can be more fully and evenly diffused, meeting the gas uniformity input requirements of large-volume coating equipment.

[0028] like Figure 3As shown, the guide cavity 6 of this embodiment includes an air inlet 61, a radial path 62, and a circumferential path 63. The radial path 62 is a linear path, and the circumferential path 63 is an annular path. The air inlet 61 is located at the center of the top cover 2. At least one circumferential path 63 is provided in the radial direction of the air inlet 61. The air inlet 61 and the circumferential path 63 are connected via the radial path 62; and / or multiple circumferential paths 63 are connected via the radial path 62. When the air inlet pipe 1 is inserted into the position of the air inlet 61, the gas at the outlet of the air inlet pipe 1 flows from the air inlet 61 along the radial path 62, and the gas then flows from the radial path 62 to the circumferential path 63.

[0029] Since the size of the air inlet connector is determined by the volume of the coating chamber, the number of radial paths 62 and circumferential paths 63 within the flow-guiding cavity 6 is determined by the size of the air inlet connector. The larger the area of the air inlet connector, the greater the number of circumferential paths 63 employed. This embodiment employs two sets of circumferential paths 63, resulting in two sets of radial paths 62 between adjacent chains of circumferential paths 63 and between the circumferential paths 63 and the air inlet 61. Furthermore, each radial path 62 in this embodiment is comprised of ten linear guide grooves. Adjacent sets of radial paths 62 are staggered, ensuring that the flow-guiding cavities 6 are adequately distributed within the air inlet connector.

[0030] The first pore group 31 includes a plurality of first pores, and the plurality of first pores are arranged below the guide cavity 6 of the top cover 2, and the first pore group 31 is connected to the guide cavity 6. The top cover 2 and the first flow equalizer plate 3 are in contact with each other, and the top cover 2 is arranged above the first flow equalizer plate 3. Since the flow equalizer 6 is provided on the side where the top cover 2 and the first flow equalizer plate 3 are in contact with each other, the plurality of first pores are evenly distributed below the flow equalizer 6, so that the distribution shape of the first pore group 31 is consistent with the shape of the flow equalizer 6. The first pore group 31 can connect the flow equalizer 6 with the diffusion layer 5 arranged below the first flow equalizer plate 3.

[0031] Example 2:

[0032] like Figure 2-Figure 3 As shown, the top cover 2 of this embodiment includes a positioning groove 21 and a mounting portion 22. The positioning groove 21 is used to install the first flow equalizer 3, and the mounting portion 22 is used to install the second flow equalizer 4. The thickness of the first flow equalizer 3 is less than the depth of the positioning groove 21.

[0033] The second flow equalizer plate 4 is tightly connected to the top cover 2 by bolts, which can avoid side leakage of gas in the diffusion layer 5. The top cover 2 is provided with a positioning groove 21 to accommodate the first flow equalizer plate 3. The thickness of the first flow equalizer plate 3 is less than the depth of the positioning groove 21. On the one hand, the first flow equalizer portion 3 will not interfere with the installation of the second flow equalizer plate 4. The end face of the second flow equalizer plate 4 is directly and tightly connected to the mounting portion 22; on the other hand, the height difference between the first flow equalizer plate 3 and the second flow equalizer plate 4 reserves the height of the diffusion layer 5, so that the gas output by the first flow equalizer plate 3 can diffuse in the diffusion layer 5, so that the structure of the air intake joint is more compact, and the integrity of the air intake joint is improved.

[0034] The second pore group 41 includes a plurality of second pores evenly distributed on the second flow equalizer plate 4, with equal spacing between adjacent second pores. The equal spacing between the second pores ensures that the second pores of the second pore group 41 are evenly distributed on the second flow equalizer plate 4. After the gas is evenly diffused within the diffusion layer 5, it can be input into the coating chamber through the evenly distributed second pores. The uniform distribution of gas within the coating chamber ensures uniformity of the substrate coating layer, thereby improving the coating quality.

[0035] In order to ensure a tight fixation between the first flow equalizer plate 3 and the top cover 2 , in this embodiment, the area of the top cover 2 where the guide cavity 6 is not provided and the area of the first flow equalizer plate 3 where the first air hole is provided are connected by bolts.

[0036] Example 3:

[0037] like Figure 4-Figure 5 As shown, a coating apparatus according to this embodiment includes a uniform flow structure, a chamber door 7, and a chamber body 8. The chamber door 7 and the chamber body 8 are connected by a hinge. The chamber door 7 is equipped with a uniform flow structure. The side wall of the chamber body 8 is provided with an exhaust port 81. The interior of the chamber body 8 is provided with a sample stage 82 for placing a substrate. The bottom of the sample stage 82 is provided with a heating component for heating the substrate. A substrate is placed on the sample stage 82, and the heating component uniformly heats the substrate to the process temperature through the sample stage 82. When the substrate temperature stabilizes, gas is uniformly introduced into the coating chamber through the uniform flow structure of the coating apparatus, and the vapor deposition process begins to coat the substrate.

[0038] The interior of the cavity 8 is also provided with an exhaust flow plate 83, which is arranged on one side of the exhaust interface 81. A gas converging layer for gas circulation is provided between the exhaust flow plate 83 and the side wall of the cavity 8. The exhaust flow plate 83 is provided at the exhaust interface 81. The exhaust flow plate 83 is used to receive the gas from the outlet pipe 23 during exhaust. When the coating chamber of the coating equipment is exhausted, under the action of pressure, the side of the gas converging layer is used to evenly exhaust the coating chamber in the lateral direction through the multiple air holes provided on the exhaust flow plate 83, thereby avoiding the formation of exhaust dead corners on both sides away from the exhaust interface 81, which causes slow gas extraction.

[0039] The lower end surface of the chamber door 7 is provided with a threaded hole for installing the air intake connector. A through hole 72 for inserting the air intake pipe 1 is provided in the middle of the chamber door 7. A sealing assembly 73 is provided at the through hole 72. The top cover 2 and the first flow equalizer plate 3 of the air intake connector are provided with coaxial positioning holes. The flow equalizer structure is installed on the chamber door 7 by tightening bolts 9. By tightening the tightening bolts 9, the top cover 2 and the second flow equalizer plate 4 can be tightly fitted together to prevent the gas in the diffusion layer 5 above the second flow equalizer plate 4 from overflowing from the connection between the second flow equalizer plate 4 and the mounting portion 22. The sealing assembly 73 is provided at the position where the through hole 72 for inserting the air intake pipe 1 can ensure the overall sealing performance of the coating chamber.

[0040] In order to avoid affecting the sealing performance of the coating equipment, the threaded hole in this embodiment is a threaded countersunk hole, and the threaded countersunk hole does not penetrate the upper end surface of the chamber door 7.

[0041] The above is only an embodiment of the present invention, and the commonly known specific structures and characteristics of the scheme are not described in detail here. It should be pointed out that for those skilled in the art, several modifications and improvements can be made without departing from the structure of the present invention, and these should also be regarded as the scope of protection of the present invention. These will not affect the effect of the implementation of the present invention and the practicality of the patent. The scope of protection claimed by this application shall be based on the content of its claims, and the specific implementation methods and other records in the specification can be used to interpret the content of the claims.

Claims

1. A uniform flow structure for vapor deposition, characterized in that: The invention comprises an air intake joint and an air intake pipe (1), wherein the air intake pipe (1) is connected to the air intake joint, and the air intake joint comprises a top cover (2), a first flow equalizer plate (3) and a second flow equalizer plate (4), wherein the first flow equalizer plate (3) is arranged between the top cover (2) and the second flow equalizer plate (4), and a radially divergent flow guide cavity (6) is arranged on the inner wall of the top cover (2), and the air intake pipe (1) is connected to the flow guide cavity (6); the first flow equalizer plate (3) is provided with a radially divergent first pore group (31), a diffusion layer (5) is constructed between the first flow equalizer plate (3) and the second flow equalizer plate (4), the flow guide cavity (6) is connected to the diffusion layer (5) through the first pore group (31), the second flow equalizer plate (4) is provided with a second pore group (41), and the diffusion layer (5) outputs gas through the second pore group (41).

2. A uniform flow structure for vapor deposition according to claim 1, characterized in that: The guide cavity (6) includes an air inlet (61), a radial path (62) and a circumferential path (63), wherein the radial path (62) is a linear path and the circumferential path (63) is a circular path. The air inlet (61) is opened at the center of the top cover (2), and at least one circumferential path (63) is opened in the radial direction of the air inlet (61). The air inlet (61) and the circumferential path (63) are connected through the radial path (62); and / or, multiple circumferential paths (63) are connected through the radial path (62).

3. The uniform flow structure for vapor deposition according to claim 1, characterized in that: The first air hole group (31) comprises a plurality of first air holes, and the plurality of first air holes are arranged below the guide cavity (6) of the top cover (2), and the first air hole group (31) is in communication with the guide cavity (6).

4. The uniform flow structure for vapor deposition according to claim 1, characterized in that: The top cover (2) comprises a positioning groove (21) and a mounting portion (22), the positioning groove (21) being used for mounting the first flow equalizer plate (3), and the mounting portion (22) being used for mounting the second flow equalizer plate (4), the thickness of the first flow equalizer plate (3) being less than the depth of the positioning groove (21).

5. The uniform flow structure for vapor deposition according to claim 1, characterized in that: The second air hole group (41) includes a plurality of second air holes, and the plurality of second air holes are evenly distributed on the second flow equalizing plate (4), and the intervals between adjacent second air holes are equal.

6. A coating device, characterized in that: The invention comprises the flow uniforming structure according to any one of claims 1 to 5.

7. The coating device according to claim 6, characterized in that: The invention also includes a cavity door (7) and a cavity (8), wherein the cavity door (7) and the cavity (8) are connected via a hinge, the cavity door (7) is provided with a uniform flow structure, a side wall of the cavity (8) is provided with an exhaust interface (81), the interior of the cavity (8) is provided with a sample stage (82) for placing a substrate, and a heating component for heating the substrate is provided at the bottom of the sample stage (82).

8. The coating device according to claim 7, characterized in that: The cavity (8) is further provided with an exhaust flow plate (83), which is arranged on one side of the exhaust interface (81), and a gas converging layer for gas circulation is provided between the exhaust flow plate (83) and the side wall of the cavity (8).

9. The coating device according to claim 7, characterized in that: The lower end surface of the cavity door (7) is provided with a threaded hole for installing the air intake connector, the middle position of the cavity door (7) is provided with a through hole (72) for inserting the air intake pipe (1), a sealing component (73) is provided at the through hole (72), and the top cover (2) and the first flow equalizer (3) of the air intake connector are provided with coaxially arranged positioning holes.

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