Fastening structure, upper grounding ring assembly and plasma processing equipment

Abstract

The utility model discloses a fastening structure, an upper grounding ring assembly and plasma processing equipment. The upper grounding ring assembly comprises a first upper grounding ring and a second upper grounding ring. The first upper grounding ring comprises a side wall surrounding the second upper grounding ring and a bottom plate used for covering the bottom of the second upper grounding ring; the first upper grounding ring and the second upper grounding ring are fastened and connected through the fastening structure provided by the utility model. According to the upper grounding ring assembly provided by the utility model, an integrated upper grounding ring in the prior art is designed into the upper grounding ring assembly comprising the first upper grounding ring and the second upper grounding ring in a split manner, and the fastening structure provided by the utility model is used for fastening and connecting, so that compared with the prior art that a gas homogenizing structure and a gas spray head need to be disassembled firstly, the upper grounding ring assembly has the advantages that the disassembly is convenient; according to the utility model, only the first upper grounding ring needs to be disassembled for replacement, so that the working hours required for part replacement are reduced, meanwhile, the damage of the gas spray header caused by frequent disassembly of the gas spray header is avoided, and the maintenance cost is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor equipment, in particular to a fastening structure, an upper grounding ring component and plasma processing equipment. Background Art

[0002] In plasma processing equipment, some components, such as the upper grounding ring, are consumables due to long-term plasma erosion and wear. They need to be frequently disassembled and replaced. In the existing upper grounding ring disassembly process, the installation engineer needs to use a wrench to remove the gas uniformity structure and the gas shower head before removing the grounding ring. The disassembly process is time-consuming, and the gas shower head is relatively expensive. Frequent disassembly can easily cause damage to the gas shower head, increasing equipment maintenance costs.

[0003] Therefore, it is necessary to propose a new fastening structure, upper grounding ring assembly, and plasma processing equipment to facilitate the removal of the upper grounding ring, reduce the time required for component replacement, avoid damage to the gas showerhead, and reduce maintenance costs. At the same time, being in a plasma environment also poses challenges to the fastening structure. Utility Model Content

[0004] The purpose of the utility model is to provide a fastening structure, an upper grounding ring assembly and a plasma processing device, so as to facilitate the removal of the upper grounding ring, reduce the working hours required for parts replacement, avoid frequent removal of the gas shower head causing damage to the gas shower head, and reduce maintenance costs.

[0005] In order to achieve the above object, the present invention is implemented through the following technical solutions:

[0006] A fastening structure for fastening and connecting a first part and a second part, the fastening structure comprising:

[0007] A first fastener, comprising a screw, a non-metallic sleeve and an isolation cap, wherein the non-metallic sleeve comprises a first sleeve section for accommodating the head of the screw and a second sleeve section for accommodating the threaded section of the screw, and the isolation cap is arranged at the end of the first sleeve section to seal the head of the screw in the first sleeve section.

[0008] The second fastener includes a nut and a non-metallic protective cover, wherein the non-metallic protective cover covers the surface of the nut that contacts the second part.

[0009] The second sleeve section passes through the through hole on the first part, and the threaded section of the screw passes through the second sleeve section and is threadedly connected to the nut to fasten the first part and the second part.

[0010] Optionally, the second fastener further includes a limiting member, the nut extends outward in its own radial direction to form a clamping portion of a preset shape, a countersunk hole is provided on the second part, the countersunk hole has an entrance of the preset shape, the non-metallic protective cover and the nut enter the countersunk hole through the entrance, and are clamped with the countersunk hole after being deflected by a certain angle, and the limiting member is inserted into the countersunk hole through the remaining gap of the entrance to limit the deflection of the nut.

[0011] Optionally, the nut is a T-shaped nut, the preset shape is a waist shape, and the T-shaped nut and the non-metallic protective shell enter the countersunk hole through the entrance and are deflected 90° and then engaged with the countersunk hole.

[0012] Optionally, the preset shape includes a waist shape, a rectangle, a triangle or a square.

[0013] Optionally, the second sleeve section is provided with an internal thread matching the external thread of the screw.

[0014] On the other hand, the present invention provides an upper grounding ring assembly, comprising a first upper grounding ring and a second upper grounding ring.

[0015] The first upper grounding ring includes a side wall surrounding the second upper grounding ring and a bottom plate for covering the bottom of the second upper grounding ring.

[0016] In which, the first upper grounding ring and the second upper grounding ring are fastened together by the fastening structure as described above, the first upper grounding ring is a first part, the second upper grounding ring is a second part, and the first fastener passes through the side wall of the first upper grounding ring and is fastened together with the second fastener provided on the second upper grounding ring.

[0017] Optionally, a stepped through hole matching the shape of the non-metallic sleeve is provided on the side wall of the first upper grounding ring, the side of the stepped through hole with a relatively larger aperture is arranged away from the second upper grounding ring, and the first sleeve section is arranged on the side of the stepped through hole with a relatively larger aperture.

[0018] Optionally, the first upper grounding ring and the second upper grounding ring are fastened together by at least three groups of the fastening structures.

[0019] Optionally, the bottom plate of the first upper grounding ring includes a first annular structure formed by inwardly extending the bottom of the side wall, and the first annular structure covers the bottom of the second upper grounding ring.

[0020] On the other hand, the utility model provides a plasma processing device, comprising: a reaction chamber, the top of the reaction chamber having an opening; a mounting base, the mounting base being located on the opening; a gas shower head, the gas shower head being disposed below the mounting base;

[0021] As described above, the upper grounding ring assembly is disposed below the mounting base and surrounds the gas showerhead.

[0022] Optionally, the top of the second upper grounding ring extends inwardly to form a second annular structure, and the second annular structure is fastened to the mounting base via threaded fasteners.

[0023] Compared with the prior art, the present invention has at least the following beneficial effects:

[0024] The upper grounding ring assembly provided by the present invention splits the integrated upper grounding ring in the prior art into an upper grounding ring assembly including a first upper grounding ring and a second upper grounding ring, and adopts the fastening structure provided by the present invention for fastening connection, wherein the first upper grounding ring surrounds the side wall of the second upper grounding ring, and the bottom plate of the first upper grounding ring covers the bottom of the second upper grounding ring, so that the second upper grounding ring is not exposed to the plasma environment and there is almost no loss, while the first upper grounding ring will suffer loss when exposed to the plasma environment. When it is consumed and needs to be replaced, only the first upper grounding ring needs to be replaced. Compared with the prior art which requires disassembling the gas uniforming structure and the gas shower head first, the working hours required for component replacement are reduced, and at the same time, damage to the gas shower head caused by frequent disassembly is avoided, thereby reducing maintenance costs.

[0025] The fastening structure provided by the present invention isolates the screw from the plasma environment by providing a non-metallic sleeve and an isolation cap, thereby preventing the metal screw from being exposed to the plasma environment. A non-metallic protective cover is provided to cover the surface of the nut in contact with the second part. After the screw and the nut are threaded together, the nut is sealed to the inner side of the second part, similarly isolating the metal nut from the plasma environment. The fastening structure provided by the present invention is suitable for situations where it is difficult to form a threaded hole on the first part or the second part to be fastened (such as an upper grounding ring of quartz material), or where the metal screw or nut cannot be exposed (such as the fastening connection of parts in plasma processing equipment), thereby avoiding the contamination of the cavity and wafer by byproducts after the plasma environment corrodes the screw or nut. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 It is a structural schematic diagram of plasma processing equipment in the prior art.

[0027] Figure 2A structural schematic diagram of a fastening structure provided by an embodiment of the present utility model;

[0028] Figure 3 It is a schematic diagram of the three-dimensional structure of the upper grounding ring in the prior art;

[0029] Figure 4 A schematic diagram of the exploded structure of an upper grounding ring assembly provided in one embodiment of the present utility model;

[0030] Figure 5 This is a partial cross-sectional diagram of the fastened connection between the first upper grounding ring and the second upper grounding ring according to an embodiment of the present invention;

[0031] Figure 6 This is a structural schematic diagram of a plasma processing device provided in one embodiment of the present invention.

[0032] Description of reference numerals:

[0033] 10-reaction chamber; 20-mounting base; 30-gas uniform structure; 40-gas shower head; 50-upper grounding ring;

[0034] 100 - first part; 200 - second part; 300 - first fastener; 310 - non-metallic sleeve; 320 - screw; 330 - isolation cap; 400 - second fastener; 410 - nut; 420 - non-metallic protective cover; 430 - limiter;

[0035] 51 - first upper grounding ring; 52 - second upper grounding ring; 51A - side wall; 51B - bottom plate; 53 - stepped through hole; 54 - countersunk hole. DETAILED DESCRIPTION

[0036] The following is a further detailed description of a fastening structure, an upper grounding ring assembly and a plasma processing device proposed in the present invention in conjunction with the accompanying drawings and specific embodiments. According to the following description, the advantages and features of the present invention will become clearer. It should be noted that the drawings are in a very simplified form and use non-precise proportions, which are only used to conveniently and clearly assist in explaining the purpose of the implementation of the present invention. In order to make the purpose, features and advantages of the present invention more obvious and easy to understand, please refer to the drawings. It should be noted that the structures, proportions, sizes, etc. illustrated in the drawings of this specification are only used to match the contents disclosed in the specification for people familiar with this technology to understand and read, and are not used to limit the conditions for the implementation of the present invention, so they have no technical substantive significance. Any structural modification, change in proportional relationship or adjustment of size should still fall within the scope of the technical content disclosed in the present invention without affecting the efficacy and purpose that can be achieved by the present invention.

[0037] See also Figure 1 , Figure 1 The present invention is a schematic structural diagram of a plasma processing device in the prior art, which includes: a reaction chamber 10 having an opening at the top; a mounting base 20, the mounting base 20 being located on the opening; a gas uniformity structure 30, the gas uniformity structure 30 being disposed in a cavity formed by a downward depression of the mounting base 20; a gas shower head 40, the gas shower head 40 being disposed below the mounting base 20; and an upper grounding ring 50, the upper grounding ring 50 being disposed below the mounting base 20 and surrounding the gas shower head 40. The upper grounding ring 50 is exposed to a plasma environment and is subject to wear. When the wear reaches a point where it needs to be replaced, the gas uniformity structure 30 must be disassembled first, and then the gas shower head 40 can be disassembled. Only after the gas shower head 40 is disassembled can the upper grounding ring 50 be disassembled. It can be seen that in the plasma processing equipment of the prior art, the disassembly process of the upper grounding ring 50 consumes a long time, and the gas shower head 40 is relatively expensive. Frequent disassembly may easily cause damage to the gas shower head 40, thereby increasing equipment maintenance costs.

[0038] See also Figure 2 , Figure 2 Schematic diagram of a fastening structure provided by an embodiment of the present invention. The fastening structure provided by this embodiment is used to fasten and connect a first part 100 and a second part 200. The fastening structure includes: a first fastener 300, the first fastener 300 including a screw 320, a non-metallic sleeve 310 and an isolation cap 330. The non-metallic sleeve 310 includes a first sleeve section for accommodating the head of the screw 320 and a second sleeve section for accommodating the threaded section of the screw 320. The isolation cap 330 is provided on the first sleeve section. The end portion is used to seal the head of the screw 320 in the first sleeve section; the second fastener 400, the second fastener 400 includes a nut 410 and a non-metallic protective cover 420, and the non-metallic protective cover 420 covers the surface of the nut 410 that contacts the second part 200; wherein, the second sleeve section passes through the through hole on the first part 100, and the threaded section of the screw 320 passes through the second sleeve section and is threadedly connected to the nut 410 to fasten the first part 100 and the second part 200.

[0039] The fastening structure provided in this embodiment includes a first fastener 300 comprising a non-metallic sleeve 310, a screw 320 and an isolation cap 330. The non-metallic sleeve 310 and the isolation cap 330 isolate the metal screw 320 from the plasma to prevent the metal screw 320 from being exposed to the plasma. The second fastener 400 includes a nut 410 and a non-metallic protective cover 420. The non-metallic protective cover 420 covers the surface of the nut 410 that contacts the second part 200. After the first fastener 300 and the second fastener 400 are fastened together, the metal nut 410 is 10 is sealed on the inner side of the second part 200 and isolated from the plasma environment. The fastening structure provided in this embodiment is suitable for situations where it is difficult to form threaded holes on the first part 100 and the second part 200 that need to be fastened (for example, the upper grounding ring 50 made of quartz material has high hardness and is easy to break, making it difficult to process threads), or situations where the screw 320 and the nut 410 made of metal material cannot be exposed (for example, the fastening connection of parts in plasma processing equipment), so as to avoid the plasma environment corroding the screw 320 or the nut 410 to produce by-products that contaminate the chamber environment and the wafer.

[0040] In some embodiments, the second fastener 400 further includes a limiting member, the nut 410 extends outward along its own radial direction to form a clamping portion of a preset shape, a countersunk hole is provided on the second part 200, and the countersunk hole has an entrance of the preset shape. The nut 410 and the non-metallic protective cover 420 enter the countersunk hole through the entrance, and are clamped with the countersunk hole after being deflected by a certain angle, and the limiting member is inserted into the countersunk hole through the remaining gap of the entrance to limit the deflection of the nut.

[0041] In the above embodiment, the nut 410 and the non-metallic protective cover 420 are embedded in the countersunk hole, and the stopper is provided to prevent the nut 410 from deflecting. The metallic nut 410 is sealed in the countersunk hole, isolating it from the plasma environment and preventing the plasma environment from corroding the nut 410. This prevents byproducts such as particulate matter generated by the corrosion of the metal nut and screw from contaminating the chamber environment and the wafer.

[0042] Specifically, in some embodiments, the nut 410 is a T-nut, and the preset shape is waist-shaped. The non-metallic protective cover 420 and the T-nut enter the countersunk hole through the entrance and are deflected 90° and then engaged with the countersunk hole.

[0043] In some other embodiments, the preset shape includes a triangle, a rectangle or a square. If the preset shape is a triangle, the nut 410 enters the countersunk hole through the entrance and can be deflected 60° to achieve locking.

[0044] In some other embodiments, the second sleeve section is provided with an internal thread that matches the external thread of the screw 320. By providing the internal thread in the second sleeve section, the tightness of the connection between the fastening structure and the first part 100 and the second part 200 is improved.

[0045] The utility model also provides an upper grounding ring assembly, see Figures 3 to 5 , Figure 3 Schematic diagram of the three-dimensional structure of the upper grounding ring 50 in the prior art. Figure 4 This is a schematic diagram of the exploded structure of the upper grounding ring assembly provided in one embodiment of the present utility model. Figure 5 This is a partial cross-sectional diagram of a first upper grounding ring and a second upper grounding ring fastened together according to an embodiment of the present invention. The upper grounding ring assembly includes a first upper grounding ring 51 and a second upper grounding ring 52. The first upper grounding ring 51 includes a side wall 51A surrounding the second upper grounding ring 52 and a bottom plate 51B for covering the bottom of the second upper grounding ring 52.

[0046] In which, the first upper grounding ring 51 and the second upper grounding ring 52 are fastened together by the fastening structure provided in the above embodiment, the first upper grounding ring 51 is a first part 100, the second upper grounding ring 52 is a second part 200, and the first fastener 300 passes through the side wall 51A of the first upper grounding ring 51 and is fastened together with the second fastener 400 provided on the second upper grounding ring 52.

[0047] The upper grounding ring assembly provided in this embodiment is a split design of the integrated upper grounding ring 50 in the prior art into an upper grounding ring assembly including a first upper grounding ring 51 and a second upper grounding ring 52, and is fastened and connected using the fastening structure provided by the present invention, wherein the first upper grounding ring 51 has a side wall 51A surrounding the second upper grounding ring 52, and the bottom plate 51B of the first upper grounding ring 51 covers the bottom of the second upper grounding ring 52, so that the second upper grounding ring 52 is not exposed to the plasma environment and there is almost no loss, while the first upper grounding ring 51 is exposed to the plasma environment and there will be loss. When it is consumed and needs to be replaced, only the first upper grounding ring 51 needs to be replaced. Compared with the prior art that requires disassembling the gas uniforming structure 30 and the gas shower head 40 first, the working hours required for component replacement are reduced, and at the same time, frequent disassembly of the gas shower head 40 to cause damage to the gas shower head 40 is avoided, thereby reducing maintenance costs.

[0048] See also Figure 4 and Figure 5In this embodiment, the fastening structure is used to fasten the first upper grounding ring 51 and the second upper grounding ring 52, and the fastening structure includes: a first fastener 300, the first fastener 300 includes a screw 320, a non-metallic sleeve 310 and an isolation cap 330, the non-metallic sleeve 310 includes a first sleeve section for accommodating the head of the screw 320 and a second sleeve section for accommodating the threaded section of the screw 310, the isolation cap 330 is arranged at the end of the first sleeve section to seal the head of the screw 320 in the first sleeve section; a second fastener 400, the second fastener 400 includes a nut 410, a non-metallic protective cover 420 and a limiter 430, the nut 410 extends outward along its own radial direction to form a preset shape of card The second upper grounding ring 52 is provided with a countersunk hole 54, and the countersunk hole 54 has an entrance of the preset shape. The nut 410 and the non-metallic protective cover 420 enter the countersunk hole 54 through the entrance together, and are engaged with the countersunk hole 54 after being deflected at a certain angle. The limiter 430 is inserted into the countersunk hole 54 through the remaining gap of the entrance to limit the deflection of the nut 410; the non-metallic protective cover 420 covers the surface of the nut 410 in contact with the second upper grounding ring 52; wherein, the second sleeve section passes through the through hole of the side wall 51A of the first upper grounding ring 51, and the threaded section of the screw 320 passes through the second sleeve section and is threadedly connected to the nut 410 to fasten the first upper grounding ring 51 and the second upper grounding ring 52.

[0049] See also Figure 5 In some embodiments, a stepped through hole 53 matching the shape of the non-metallic sleeve 310 is provided on the side wall 51A of the first upper grounding ring 51, and the side with a relatively larger aperture in the stepped through hole 53 is arranged away from the second upper grounding ring 52, and the first sleeve section is arranged on the side with a relatively larger aperture in the stepped through hole 53.

[0050] In the above embodiment, a stepped through hole 53 matching the shape of the non-metallic sleeve 310 is provided on the side wall 51A of the first upper grounding ring 51, and the first sleeve section is provided on the side with a larger aperture of the stepped through hole 53, so that the head of the screw 320 is accommodated in the side with a larger aperture of the stepped through hole 53, thereby preventing it from protruding from the surface of the side wall 51A of the first grounding ring 51.

[0051] In some embodiments, the first upper grounding ring 51 and the second upper grounding ring 52 are fastened together by at least three groups of the fastening structures to improve the strength of the fastening connection between the first grounding ring 51 and the second grounding ring 52 .

[0052] In some embodiments, the bottom plate 51B of the first upper grounding ring 51 includes a first annular structure extending inward from the bottom of the sidewall 51A, and the first annular structure covers the bottom of the second upper grounding ring 52 .

[0053] The utility model also provides a plasma processing device, see Figure 6 , Figure 6 A plasma processing apparatus according to an embodiment of the present invention includes a reaction chamber 10 having an opening at the top, a mounting base 20 positioned above the opening, and a gas showerhead 40 disposed below the mounting base 20.

[0054] The upper grounding ring assembly provided in the above embodiment is disposed below the mounting base 20 and surrounds the gas shower head 40 .

[0055] The plasma processing equipment provided in this embodiment adopts the upper grounding ring assembly described in the above embodiment, and the integrated upper grounding ring 50 in the prior art is split into an upper grounding ring assembly including a first upper grounding ring 51 and a second upper grounding ring 52, and the fastening structure provided by the utility model is adopted for fastening connection, wherein the first upper grounding ring 51 has a side wall 51A surrounding the second upper grounding ring 52, and the bottom plate 51B of the first upper grounding ring 51 covers the bottom of the second upper grounding ring 52, so that the second upper grounding ring 52 is not exposed to the plasma environment and there is almost no loss, while the first upper grounding ring 51 is exposed to the plasma environment and will suffer loss. When it is consumed and needs to be replaced, only the first upper grounding ring 51 needs to be replaced. Compared with the prior art that requires disassembling the gas uniforming structure 30 and the gas shower head 40 first, the working hours required for component replacement are reduced, and at the same time, frequent disassembly of the gas shower head 40 to cause damage to the gas shower head 40 is avoided, thereby reducing maintenance costs.

[0056] In some embodiments, the top of the second grounding ring 52 extends inward to form a second ring structure, which is fastened to the mounting base 20 via threaded fasteners. In this embodiment, the upper grounding ring assembly is mounted below the mounting base 20 via threaded fasteners.

[0057] It should be noted that, in this document, relational terms such as first and second, etc., are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply the existence of any such actual relationship or order between these entities or operations. Moreover, the terms "comprises," "comprising," or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article, or device comprising a series of elements includes not only those elements, but also other elements not explicitly listed, or elements inherent to such process, method, article, or device. In the absence of further limitations, an element defined by the phrase "comprising a ..." does not exclude the presence of other identical elements in the process, method, article, or device comprising the element.

[0058] In the description of the present invention, it should be understood that the terms "center," "height," "thickness," "up," "down," "vertical," "horizontal," "top," "bottom," "inside," "outside," "axial," "radial," "circumferential," and the like, indicating positions or location relationships, are based on the positions or location relationships shown in the accompanying drawings and are intended solely to facilitate the description of the present invention and simplify the description. They do not indicate or imply that the devices or components referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limitations on the present invention. In the description of the present invention, unless otherwise specified, "plurality" means two or more.

[0059] In the description of this utility model, unless otherwise expressly specified or limited, the terms "installed," "connected," "connected," and "fixed" should be understood in a broad sense. For example, they can refer to fixed connection, detachable connection, or integration; mechanical connection or electrical connection; direct connection or indirect connection through an intermediate medium; internal communication between two components or interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in this utility model based on the specific circumstances.

[0060] In the present invention, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature may include the first and second features being in direct contact, or may include the first and second features being in contact not directly but through another feature between them. Moreover, a first feature being "above," "above," and "above" a second feature may include the first feature being directly above or obliquely above the second feature, or may simply mean that the first feature is higher in level than the second feature. A first feature being "below," "below," and "below" a second feature may include the first feature being directly below or obliquely below the second feature, or may simply mean that the first feature is lower in level than the second feature.

[0061] Although the present invention has been described in detail through the above preferred embodiments, it should be understood that the above description should not be considered as limiting the present invention. After reading the above description, various modifications and alternatives to the present invention will be readily apparent to those skilled in the art. Therefore, the scope of protection of the present invention shall be defined by the appended claims.

Claims

1. A fastening structure, characterized in that: Used for fastening and connecting a first part and a second part, the fastening structure comprises: a first fastener comprising a screw, a non-metallic sleeve, and an isolation cap, wherein the non-metallic sleeve comprises a first sleeve section for accommodating a head of the screw and a second sleeve section for accommodating a threaded section of the screw, and the isolation cap is disposed at an end of the first sleeve section to seal the head of the screw in the first sleeve section; a second fastener, the second fastener comprising a nut and a non-metallic protective cover, the non-metallic protective cover covering a surface of the nut in contact with the second part; The second sleeve section passes through the through hole on the first part, and the threaded section of the screw passes through the second sleeve section and is threadedly connected to the nut to fasten the first part and the second part.

2. The fastening structure according to claim 1, wherein: The second fastener also includes a limiting piece, the nut extends outward along its own radial direction to form a clamping portion of a preset shape, a countersunk hole is provided on the second part, and the countersunk hole has an entrance of the preset shape. The non-metallic protective cover and the nut enter the countersunk hole through the entrance, and are clamped with the countersunk hole after being deflected by a certain angle. The limiting piece is inserted into the countersunk hole through the remaining gap of the entrance to limit the deflection of the nut.

3. The fastening structure according to claim 2, wherein: The nut is a T-shaped nut, and the preset shape is a waist shape. The T-shaped nut and the non-metallic protective shell enter the countersunk hole through the entrance and are deflected 90 degrees and then engaged with the countersunk hole.

4. The fastening structure according to claim 2, wherein: The preset shapes include waist, rectangle, triangle or square.

5. The fastening structure according to claim 1, wherein: The second sleeve section is provided with an internal thread matching the external thread of the screw.

6. An upper grounding ring assembly, characterized in that: including a first upper grounding ring and a second upper grounding ring; The first upper grounding ring includes a side wall surrounding the second upper grounding ring, and a bottom plate for covering the bottom of the second upper grounding ring; The first upper grounding ring and the second upper grounding ring are fastened together by a fastening structure according to any one of claims 1 to 5, the first upper grounding ring is a first part, the second upper grounding ring is a second part, and the first fastener passes through the side wall of the first upper grounding ring and is fastened together with a second fastener provided on the second upper grounding ring.

7. The upper grounding ring assembly according to claim 6, wherein: A stepped through hole matching the shape of the non-metallic sleeve is provided on the side wall of the first upper grounding ring. The side of the stepped through hole with a relatively larger aperture is arranged away from the second upper grounding ring, and the first sleeve section is arranged on the side of the stepped through hole with a relatively larger aperture.

8. The upper grounding ring assembly according to claim 6, wherein: The first upper grounding ring and the second upper grounding ring are fastened together by at least three groups of the fastening structures.

9. The upper grounding ring assembly according to claim 6, wherein: The bottom plate of the first upper grounding ring includes a first annular structure extending inwardly from the bottom of the side wall, and the first annular structure covers the bottom of the second upper grounding ring.

10. A plasma processing device, characterized in that: include: A reaction chamber, wherein the top of the reaction chamber has an opening; a mounting base, the mounting base being seated on the opening; A gas shower head, the gas shower head is arranged below the mounting base; The upper grounding ring assembly according to any one of claims 6 to 9, wherein the upper grounding ring assembly is disposed below the mounting base and surrounds the gas shower head.

11. The plasma processing apparatus according to claim 10, wherein: The top of the second upper grounding ring extends inward to form a second annular structure, and the second annular structure is fastened to the mounting base via threaded fasteners.

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