Etching tank with liquid baffle adjusting function

Abstract

The utility model relates to the technical field of wet process chain type equipment, in particular to an etching tank with a liquid baffle plate adjusting function, which comprises a tank body, a roller mechanism, a liquid baffle plate mechanism, a power mechanism and an adjusting mechanism, the liquid baffle mechanism comprises at least one group of liquid baffle components, each group of liquid baffle components is divided into two parts which are arranged in the tank body, the bottom ends of the liquid baffle components are vertically connected with the bottom wall of the tank body, and the top ends of the liquid baffle components are connected with a roller mechanism arranged in the tank body; the two parts of the liquid baffle assembly can relatively move along the parallel direction of the bottom wall of the tank body; the bottom of the tank body is connected with a power mechanism used for pumping liquid into the tank body, and the adjusting mechanism is arranged on the liquid baffle assembly and used for adjusting the relative position between the two parts of the liquid baffle assembly. According to the utility model, the potential safety hazard that chemicals are sputtered on the body during adjustment can be reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of wet chain equipment, in particular to an etching tank with a liquid baffle adjustment function. Background Art

[0002] The purpose of removing BSG (phosphate glass) / PSG (boron phosphate glass) is to remove the BSG / PSG on the edge and back of the silicon wafer while retaining the BSG / PSG on the front (back) side of the silicon wafer to prepare for alkali polishing.

[0003] During the front and back etching processes, the height at which the chemical solution contacts the rollers determines the amount of liquid carried by the rollers and the rate at which it reacts with the wafer. Currently, adjusting the height of the liquid retaining plate in the BSG and PSG removal etch tanks on production lines requires personnel to reach deep inside the machine to adjust the limit screws, posing a safety hazard. Utility Model Content

[0004] (1) The present invention provides an etching tank with a liquid baffle adjustment function, which alleviates the technical problem in the prior art that the height adjustment of the liquid baffle of the etching tank requires personnel to go deep into the interior of the machine to adjust the limit screws, which poses a safety hazard.

[0005] (2) Technical solution

[0006] In order to solve the above technical problems, the embodiment of the present utility model provides an etching tank with a liquid baffle adjustment function, comprising a tank body, a roller mechanism, a liquid baffle mechanism, a power mechanism and an adjustment mechanism;

[0007] The liquid baffle mechanism includes a liquid baffle assembly, and the liquid baffle assembly is provided with at least one group. Each group of the liquid baffle assemblies is divided into two parts that are staggered and connected. Both are installed inside the tank body. The bottom end of the liquid baffle assembly is vertically connected to the bottom wall of the tank body, and the top end is connected to the roller mechanism provided in the tank body. The two parts of the liquid baffle assembly can be relatively positioned along a direction parallel to the bottom wall of the tank body.

[0008] The bottom of the tank body is connected to a power mechanism for pumping liquid into the tank body. The adjustment mechanism is provided on the liquid baffle assembly for adjusting the relative height between the two parts of the liquid baffle assembly.

[0009] Furthermore, the liquid baffle assembly includes a first liquid baffle and a second liquid baffle, the first liquid baffle and the second liquid baffle are seamlessly fitted together, and the adjustment mechanism is arranged on the side surface of the first liquid baffle and the second liquid baffle on the same side, and can drive the first liquid baffle and the second liquid baffle to move relative to each other parallel to the bottom wall of the trough body to adjust the relative position between the first liquid baffle (3011) and the second liquid baffle.

[0010] The top of the first liquid baffle is provided with a plurality of first protrusions at intervals, and the top of the second liquid baffle is provided with a plurality of second protrusions at intervals. A groove is formed between two adjacent first protrusions or second protrusions, and the first protrusions and second protrusions on the top of the first liquid baffle and the second liquid baffle are alternately provided with the grooves. Furthermore, both the first liquid baffle and the second liquid baffle are provided with through holes, and the through holes cooperate with the adjustment mechanism to adjust the relative position of the first liquid baffle and the second liquid baffle.

[0011] Furthermore, the adjustment mechanism includes an adjustment component, a limit component and a fixed carrier plate;

[0012] The fixed carrier is disposed on the outer side of the tank body where the ends of the liquid baffle assembly meet. The adjustment assembly and the limit assembly pass through the fixed carrier and the sidewalls of the tank body, and are respectively connected to the first and second liquid baffles to adjust the relative position between the first and second liquid baffles. Furthermore, the adjustment assembly includes an adjustment member, which passes through the fixed carrier and the sidewalls of the tank body and is inserted through the through hole of the first liquid baffle.

[0013] Furthermore, the limiting assembly includes at least two limiting members, and the at least two limiting members sequentially pass through the fixed carrier plate and the side wall of the trough body and are respectively inserted into the through holes of the second liquid baffle plate.

[0014] Furthermore, the liquid baffle assembly is provided with two groups, which are correspondingly arranged on both sides of the inside of the tank body, and each group of the liquid baffles is provided with a corresponding group of adjustment mechanisms, and a return liquid port is provided between each group of liquid baffles and the inner wall of the tank body, and each of the return liquid ports is connected to the liquid supply tank provided at the bottom of the tank body through a return liquid pipe.

[0015] Furthermore, a liquid inlet is provided on the bottom wall of the tank body between the two groups of the liquid baffle plate assemblies, and the liquid inlet is connected to the liquid supply tank through a liquid inlet pipe.

[0016] Furthermore, the power mechanism includes a water pump, and the water pump is arranged on the liquid inlet pipe.

[0017] The beneficial effects of the utility model are as follows: the utility model provides an etching tank with a liquid baffle adjustment function, at least one group of liquid baffle plates are installed inside the tank body, the bottom end of the liquid baffle plates is perpendicular to the bottom wall of the tank body, and the top end is connected to a roller mechanism arranged in the tank body, and the liquid baffle plate assembly is divided into two parts, the two parts can move relative to each other in a parallel direction along the bottom wall of the tank body, and the chemical liquid is pumped into the tank body by a power mechanism connected to the bottom of the tank body. At the same time, the operator always adjusts the relative height between the two parts of the liquid baffle plate according to the liquid height inside the tank body, thereby changing the relative position of the two parts, and the operator manually adjusts the adjustment mechanism arranged on the side of the liquid baffle plate assembly to adjust the relative position between the two parts of the liquid baffle plate assembly, thereby lowering or raising the height of the chemical liquid inside the tank body to ensure the height at which the roller mechanism contacts the liquid, thereby adjusting the reaction rate of the silicon wafer, that is, the operator does not need to enter the tank body for adjustment, thereby reducing the safety hazard of chemicals splashing onto the body. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the specific implementation methods of the utility model or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0019] Figure 1 A schematic diagram of the overall structure of an etching tank with a liquid baffle adjustment function provided by an embodiment of the utility model;

[0020] Figure 2 A schematic diagram of the connection structure between an adjustment mechanism and a liquid baffle assembly of an etching tank with a liquid baffle adjustment function provided by an embodiment of the utility model;

[0021] Figure 3 A schematic structural diagram of an adjustment mechanism and a liquid baffle assembly of an etching tank with a liquid baffle adjustment function provided by an embodiment of the utility model.

[0022] Icons: 100-tank body; 101-liquid supply tank; 200-roller mechanism; 300-liquid baffle mechanism; 301-liquid baffle assembly; 3011-first liquid baffle; 3012-second liquid baffle; 3013-first protrusion; 3014-second protrusion; 3015-through hole; 400-power mechanism; 401-water pump; 500-adjustment mechanism; 501-fixed carrier plate; 502-adjustment member; 503-first rotating handle; 504-limiting member; 505-second rotating handle; 600-liquid return port; 601-liquid return pipe; 700-liquid inlet; 701-liquid inlet pipe. DETAILED DESCRIPTION

[0023] The following will clearly and completely describe the technical solutions of the present invention in conjunction with the embodiments. Obviously, the embodiments described are only a part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0024] In the description of this utility model, it should be noted that the terms "upper" and "lower" and other terms indicating orientations or positional relationships are based on the orientations or positional relationships shown in the accompanying drawings and are intended solely to facilitate the description of this utility model and simplify the description. They do not indicate or imply that the devices or components referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limitations on this utility model. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0025] In the description of the present invention, it should be noted that, unless otherwise expressly specified or limited, the terms "installation", "connection", and "connection" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, an indirect connection through an intermediate medium, or a connection between two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to the specific circumstances. In addition, in the description of the present invention, unless otherwise specified, "plurality" means two or more.

[0026] like Figures 1 to 3 As shown, the utility model provides an etching tank with a liquid baffle adjustment function, including a tank body 100, a roller mechanism 200, a liquid baffle mechanism 300, a power mechanism 400 and an adjustment mechanism 500; the liquid baffle mechanism 300 includes a liquid baffle assembly 301, and the liquid baffle assembly 301 is provided with at least one group, each group of liquid baffle assemblies 301 is divided into two parts that are staggered and connected, both of which are installed inside the tank body 100, and the bottom end of the liquid baffle assembly 301 is vertically connected to the bottom wall of the tank body 100, and the top end is connected to the roller mechanism 200 provided in the tank body 100, and the two parts of the liquid baffle assembly 301 can move relative to each other in a parallel direction to the bottom wall of the tank body 100; the bottom of the tank body 100 is connected to the power mechanism 400 for pumping liquid into the tank body 100, and the adjustment mechanism 500 is provided on the liquid baffle assembly 301 for adjusting the relative position between the two parts of the liquid baffle assembly 301.

[0027] In this embodiment, at least one set of liquid baffle assembly 301 is installed inside the tank body 100, the bottom end of the liquid baffle is perpendicular to the bottom wall of the tank body 100, the bottom end is connected to the roller mechanism 200 provided in the tank body 100, and the liquid baffle assembly 301 is divided into two parts that are staggered and connected, and the two parts can move relative to each other in the parallel direction of the bottom wall of the tank body 100, and the chemical liquid is pumped into the tank body 100 by the power mechanism 400 connected to the bottom of the tank body 100. At the same time, the operator always adjusts the liquid level according to the liquid level inside the tank body 100. The relative height between the two parts of the liquid baffle plate is adjusted, thereby changing the relative position of the two parts. The operator manually adjusts the adjustment mechanism 500 provided on the side of the liquid baffle plate assembly 301 to adjust the relative position between the two parts of the liquid baffle plate assembly 301, thereby lowering or raising the height of the chemical liquid inside the tank body 100 to ensure the height at which the roller mechanism 200 contacts the liquid, thereby adjusting the reaction rate of the silicon wafer. That is, the operator does not need to enter the tank body 100 to make adjustments, thereby reducing the safety hazard of chemicals splashing onto the body.

[0028] Optionally, the roller mechanism 200 is composed of a plurality of rollers, which are arranged in a straight line in the tank body 100 after being fitted together, and the two outermost rollers are respectively fitted with the inner wall of the tank body 100 .

[0029] According to an embodiment provided by the present utility model, Figure 1 、 Figure 2 and Figure 3 As shown, the liquid baffle assembly 301 includes a first liquid baffle 3011 and a second liquid baffle 3012, and the first liquid baffle 3011 and the second liquid baffle 3012 are seamlessly fitted together. The adjustment mechanism 500 is arranged on the side of the first liquid baffle 3011 and the second liquid baffle 3012 on the same side, and can drive the first liquid baffle 3011 and the second liquid baffle 3012 to move relative to each other parallel to the bottom wall of the trough body 100 to adjust the relative position between the first liquid baffle 3011 and the second liquid baffle 3012.

[0030] In this embodiment, the liquid baffle assembly 301 includes a first liquid baffle 3011 and a second liquid baffle 3012, wherein preferably, the first liquid baffle 3011 and the second liquid baffle 3012 are of the same size and shape, and are seamlessly fitted together. In the initial stage, the upper top surface of the first liquid baffle 3011 and the second liquid baffle 3012 after fitting together is flush with the upper height of the roller mechanism 200, and the power mechanism 400 provided at the bottom of the tank body 100 is used to pump the required liquid medicine into the tank body 100. When the liquid height reaches a certain condition, the operator The operator adjusts the adjustment mechanism 500 provided on the side of the liquid baffle plate assembly 301 to adjust the relative position between the first liquid baffle plate 3011 and the second liquid baffle plate 3012, thereby changing the staggered gap between the first liquid baffle plate 3011 and the second liquid baffle plate 3012, so that the liquid passes over the liquid baffle plate assembly 301 and maintains a stable liquid level. When the height of the liquid in the tank body 100 needs to be increased, only reverse adjustment is required, and the first liquid baffle plate 3011 and the second liquid baffle plate 3012 are reset and the gap is restored. The overall adjustment process is very flexible.

[0031] Furthermore, a plurality of first protrusions 3013 are arranged at intervals on the top of the first liquid baffle plate 3011, and a plurality of second protrusions 3014 are arranged at intervals on the top of the second liquid baffle plate 3012. Grooves are formed between two adjacent first protrusions 3013 or second protrusions 3014, and the first protrusions 3013 and the second protrusions 3014 on the top of the first liquid baffle plate 3011 and the second liquid baffle plate 3012 are alternately arranged with the grooves.

[0032] In this embodiment, a plurality of first protrusions 3013 and second protrusions 3014 are evenly spaced on the tops of the first liquid baffle plate 3011 and the second liquid baffle plate 3012, and grooves are formed between two adjacent first protrusions 3013 or second protrusions 3014. Since the first liquid baffle plate 3011 and the second liquid baffle plate 3012 are seamlessly fitted in the initial position, and the first protrusions 3013 and the second protrusions 3014 on the first liquid baffle plate 3011 and the second liquid baffle plate 3012 are alternately arranged with the grooves, and the places where the first liquid baffle plate 3011 is connected to the side walls of the tank body 100 are respectively set as grooves, that is, the places where the second liquid baffle plate 3012 is connected to the tank body 100 are set as second protrusions 3014. Further, the side walls of the first liquid baffle plate 3011 and the second liquid baffle plate 3012 There are through holes 3015 on both sides, and the through holes 3015 cooperate with the adjustment mechanism 500 to adjust the relative positions of the first liquid baffle plate 3011 and the second liquid baffle plate 3012, that is, a through hole 3015 is provided at the junction of the tank body 100 and the first liquid baffle plate 3011. The shape of the through hole 3015 is the same as the cross-sectional shape of the junction of the first liquid baffle plate 3011 and the tank body 100. Therefore, the operator controls the adjustment mechanism outside the tank body 100 to control the first liquid baffle plate 3011 to move relative to the second liquid baffle plate 3012. The end of the liquid baffle plate protrudes from the adjustment hole and the tank body 100, so that the first protrusion 3013, the second protrusion 3014 and the groove above the first liquid baffle plate 3011 and the second liquid baffle plate 3012 intersect to form a gap for liquid to flow through, thereby achieving the effect of lowering the liquid level.

[0033] According to an embodiment provided by the present utility model, Figure 2 and Figure 3 As shown, the adjustment mechanism 500 includes an adjustment component, a limit component and a fixed carrier plate 501; the fixed carrier plate 501 is arranged on the outside of the tank body 100 where the end of the liquid baffle plate assembly 301 is connected, and the adjustment component and the limit component pass through the side walls of the fixed carrier plate 501 and the tank body 100 and are respectively connected to the first liquid baffle plate 3011 and the second liquid baffle plate 3012 to adjust the relative position between the first liquid baffle plate 3011 and the second liquid baffle plate 3012.

[0034] In this embodiment, the adjustment mechanism 500 includes an adjustment component, a limit component and a fixed carrier 501. The fixed carrier 501 is arranged on the outside of the tank body 100 where the end of the liquid baffle plate assembly 301 is connected, that is, the fixed carrier 501 and the liquid baffle plate assembly 301 are respectively arranged on both sides of the tank body 100. The operator only needs to manually adjust the adjustment mechanism provided on the side of the liquid baffle plate assembly on the outside of the tank body 100 to adjust the relative position between the two parts of the liquid baffle plate assembly, thereby lowering or raising the height of the chemical liquid inside the tank body to ensure the height of the contact between the roller mechanism and the liquid, thereby adjusting the reaction rate of the silicon wafer. The operator does not need to enter the tank body 100 to make adjustments, which reduces the safety hazard of chemicals splashing onto the body. The adjustment component passes through the fixed carrier 501 and the side wall of the tank body 100. Then it is connected to the first liquid baffle plate 3011. Correspondingly, the limiting component passes through the fixed carrier plate 501 and the side wall of the tank body 100 and is connected to the second liquid baffle plate 3012. Preferably, the side walls of the first liquid baffle plate 3011 and the second liquid baffle plate 3012 are respectively provided with through holes 3015 corresponding to the adjustment component and the limiting component. The adjustment component can move in the through holes 3015, thereby adjusting the relative position between the first liquid baffle plate 3011 and the second liquid baffle plate 3012, and changing the positional relationship between the two, so that a gap is staggered between the protrusion 3013 and the groove, and the space is allowed to accelerate the downward flow of the liquid level to ensure that the liquid level is lowered. Similarly, the reverse adjustment is performed, and the first liquid baffle plate 3011 is reset, so that the liquid height in the tank body 100 can continue to rise.

[0035] According to an embodiment provided by the present utility model, Figure 2 and Figure 3 As shown, the adjustment assembly includes an adjustment member 502 , which passes through the fixed carrier plate 501 and the side wall of the tank body 100 and is inserted into the through hole 3015 of the first liquid baffle 3011 .

[0036] Furthermore, a first rotating handle 503 is provided at the end of the adjusting member 502 away from the liquid baffle assembly 301 .

[0037] In this embodiment, the adjustment component includes an adjustment member 502, which passes through the fixed carrier 501 and the side wall of the trough body 100 and is inserted into the through hole 3015 at the top of the first liquid baffle plate 3011. The adjustment member 502 can move in the through hole 3015 to change the length inserted into the adjustment hole, thereby driving the first liquid baffle plate 3011 to move relative to the second liquid baffle plate 3012, thereby changing the relative position relationship between the two.

[0038] Preferably, the adjusting member 502 is selected as an adjusting screw, and a first rotating handle 503 is provided at the end away from the liquid baffle assembly 301 and rotated on the adjusting screw by welding, so as to facilitate the operator to perform the rotation adjustment operation.

[0039] According to an embodiment provided by the present utility model, Figure 2 and Figure 3 As shown, the limiting assembly includes at least two limiting members 504 which sequentially pass through the fixed carrier plate 501 and the side wall of the tank body 100 and are respectively inserted into the through holes 3015 of the second liquid baffle plate 3012 .

[0040] Furthermore, a second rotating handle 505 is provided at the end of the limiting member 504 away from the liquid baffle assembly 301 .

[0041] In this embodiment, the limiting assembly includes at least two limiting members 504, and at least two limiting members 504 are distributed on both sides of the adjusting member 502. Each limiting member 504 passes through the fixed carrier 501 and the side wall of the trough body 100 and is inserted from the through hole 3015 at the top of the second liquid baffle plate, and can move within the through hole 3015 to fix the second liquid baffle plate 3012.

[0042] Preferably, the limiting member 504 is selected as a limiting screw, and two limiting screws are provided, which are respectively arranged on both sides of the parallel line of the adjustment screw, and a second rotating handle 505 is provided at the end away from the liquid baffle assembly 301, which is rotated on the limiting screw by welding to facilitate the operator to perform rotation adjustment operations.

[0043] The adjustment process of the height difference between the first adjustment plate and the second adjustment plate is as follows: when the first liquid baffle plate 3011 moves away from the first rotating handle 503, the adjusting screw can be rotated counterclockwise and the limit screw can be adjusted clockwise to fix the second liquid baffle plate 3012, so as to realize the movement of the first liquid baffle plate 3011 in the direction away from the first rotating handle 503. On the contrary, when the limit screw is loosened counterclockwise, it is disengaged from the second liquid baffle plate 3012, and the adjusting screw is tightened clockwise at the same time to realize the movement of the first liquid baffle plate 3011 in the direction of the first rotating handle 503, so as to complete the height reset of the first liquid baffle plate 3011.

[0044] According to an embodiment provided by the present utility model, Figure 1 、 Figure 2 and Figure 3 As shown, there are two groups of liquid baffle plate assemblies 301, which are correspondingly arranged on both sides of the interior of the tank body 100, and each group of liquid baffle plates is correspondingly provided with a group of adjustment mechanisms 500, and a return liquid port 600 is provided between each group of liquid baffle plates and the inner wall of the tank body 100, and each return liquid port 600 is connected to the liquid supply tank 101 provided at the bottom of the tank body 100 through a return liquid pipe 601.

[0045] In this embodiment, there are two groups of liquid baffle plate assemblies 301, which are correspondingly arranged on both sides of the interior of the tank body 100, and each group of liquid baffle plates is correspondingly provided with a group of adjustment mechanisms 500, so as to ensure that the operator can manually adjust the adjustment mechanism 500 provided above the liquid baffle plate assembly 301 to adjust the relative height between the two parts of the liquid baffle plate assembly 301, thereby lowering or raising the height of the chemical liquid inside the tank body 100 to ensure the height at which the roller mechanism 200 contacts the liquid, thereby adjusting the reaction rate of the silicon wafer, that is, the operator does not need to enter the interior of the tank body 100 for adjustment, reducing the safety hazard of chemicals splashing onto the body. Optionally, a return liquid port 600 is provided between each group of liquid baffle plates and the inner wall of the tank body 100, and each return liquid port 600 is connected to the liquid supply tank 101 provided at the bottom of the tank body 100 through a return liquid pipe 601, so that the chemical liquid that crosses the liquid baffle plate flows back to the liquid supply tank 101 for collection and reuse, saving resources and reducing costs.

[0046] Preferably, a liquid inlet 700 is provided on the bottom wall of the tank body 100 located between the two groups of liquid baffle plate assemblies 301 , and the liquid inlet 700 is connected to the liquid supply tank 101 through a liquid inlet pipe 701 .

[0047] In this embodiment, a liquid inlet 700 is provided on the bottom wall of the tank body 100 located between the two sets of liquid baffle plate assemblies 301. The liquid inlet 700 is connected to the liquid supply tank 101 through a liquid inlet pipe 701, so that the chemical liquid can enter the interior of the tank body 100 through the liquid inlet pipe 701.

[0048] According to an embodiment provided by the present utility model, Figure 1 As shown, the power mechanism 400 includes a water pump 401 , which is disposed on a liquid inlet pipe 701 .

[0049] In this embodiment, the power mechanism 400 includes a water pump 401, which is arranged on the liquid inlet pipe 701. The power of the water pump 401 allows the liquid to be pumped into the tank body 100 and can pass over the liquid baffle assembly 301 to maintain a stable liquid level inside the tank body 100.

[0050] The above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. An etching tank with a liquid baffle adjustment function, characterized in that: It comprises a tank body (100), a roller mechanism (200), a liquid baffle mechanism (300), a power mechanism (400) and an adjustment mechanism (500); The liquid baffle mechanism (300) comprises a liquid baffle assembly (301), wherein the liquid baffle assembly (301) is provided with at least one group, and each group of the liquid baffle assembly (301) is divided into two parts that are staggered and connected, and both are installed inside the tank body (100), the bottom end of the liquid baffle assembly (301) is vertically connected to the bottom wall of the tank body (100), and the top end is connected to the roller mechanism (200) provided in the tank body (100), and the two parts of the liquid baffle assembly (301) can move relative to each other along the parallel direction of the bottom wall of the tank body (100); The bottom of the tank body (100) is connected to a power mechanism (400) for pumping liquid into the tank body (100); the adjustment mechanism (500) is provided on the liquid baffle assembly (301) for adjusting the relative position between the two parts of the liquid baffle assembly (301).

2. The etching tank with liquid baffle adjustment function according to claim 1, characterized in that: The liquid baffle assembly (301) comprises a first liquid baffle (3011) and a second liquid baffle (3012), wherein the first liquid baffle (3011) and the second liquid baffle (3012) are seamlessly fitted together, and the adjustment mechanism (500) is arranged on the side surface of the first liquid baffle (3011) and the second liquid baffle (3012) on the same side, and is capable of driving the first liquid baffle (3011) and the second liquid baffle (3012) to move relative to each other parallel to the bottom wall of the tank body (100) so as to adjust the relative position between the first liquid baffle (3011) and the second liquid baffle (3012).

3. The etching tank with liquid baffle adjustment function according to claim 2, characterized in that: A plurality of first protrusions (3013) are arranged at intervals on the top of the first liquid baffle plate (3011), and a plurality of second protrusions (3014) are arranged at intervals on the top of the second liquid baffle plate (3012). A groove is formed between two adjacent first protrusions (3013) or second protrusions (3014). The first protrusions (3013) and the second protrusions (3014) on the tops of the first liquid baffle plate (3011) and the second liquid baffle plate (3012) are alternately arranged with the grooves.

4. The etching tank with liquid baffle adjustment function according to claim 3, characterized in that: The first liquid baffle plate (3011) and the second liquid baffle plate (3012) are both provided with through holes (3015), and the through holes (3015) cooperate with the adjustment mechanism (500) to adjust the relative positions of the first liquid baffle plate (3011) and the second liquid baffle plate (3012).

5. The etching tank with liquid baffle adjustment function according to claim 4, characterized in that: The adjustment mechanism (500) comprises an adjustment component, a position limiting component and a fixed carrier plate (501); The fixed carrier (501) is arranged on the outside of the tank body (100) connected to the end of the liquid baffle plate assembly (301); the adjustment assembly and the limit assembly pass through the side walls of the fixed carrier (501) and the tank body (100) and are respectively connected to the first liquid baffle plate (3011) and the second liquid baffle plate (3012) to adjust the relative position between the first liquid baffle plate (3011) and the second liquid baffle plate (3012).

6. The etching tank with liquid baffle adjustment function according to claim 5, characterized in that: The adjusting assembly comprises an adjusting member (502), and the adjusting member (502) passes through the fixed carrier plate (501) and the side wall of the tank body (100) and is inserted from the through hole (3015) of the first liquid baffle plate (3011).

7. The etching tank with liquid baffle adjustment function according to claim 5, characterized in that: The limiting assembly comprises at least two limiting members (504), and the at least two limiting members (504) sequentially pass through the fixed carrier plate (501) and the side wall of the tank body (100) and are respectively inserted from the through holes (3015) of the second liquid baffle plate (3012).

8. The etching tank with liquid baffle adjustment function according to claim 2, characterized in that: The liquid baffle plate assembly (301) is provided with two groups, which are correspondingly arranged on both sides of the interior of the tank body (100), and each group of the liquid baffle plates is provided with a corresponding group of adjustment mechanisms (500). A liquid return port (600) is provided between each group of the liquid baffle plates and the inner wall of the tank body (100), and each of the liquid return ports (600) is connected to a liquid supply tank (101) provided at the bottom of the tank body (100) through a liquid return pipe (601).

9. The etching tank with liquid baffle adjustment function according to claim 8, characterized in that: A liquid inlet (700) is provided on the bottom wall of the tank body (100) located between the two groups of liquid baffle plate assemblies (301), and the liquid inlet (700) is connected to the liquid supply tank (101) through a liquid inlet pipe (701).

10. The etching tank with liquid baffle adjustment function according to claim 9, characterized in that: The power mechanism (400) includes a water pump (401), and the water pump (401) is arranged on the liquid inlet pipe (701).

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