Gas recycling equipment and monocrystalline silicon production line
By designing gas recovery and reuse equipment, the problem of high cost of argon recovery device is solved, the stability and efficiency of the production device are improved, the quality of single crystal silicon is ensured, and the cost of argon is reduced.
Patent Information
- Application Number
- CN202422500522.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-16
- Publication Date
- 2025-08-12
- Estimated Expiration
- 2034-10-16
AI Technical Summary
The existing argon gas recovery device is costly and affects the stability of the single crystal furnace and the quality of the single crystal silicon during the extraction of the mixed gas, resulting in low production efficiency.
A gas recovery and reuse equipment is designed, including a production device, a recycling mechanism and a supplementary mechanism. By forming a gas recovery circuit, a pressure control mechanism is set up, and the supplementary mechanism is used to ensure the stability of the pressure in the production device, and the mixed gas is purified and reused.
It improves the stability and efficiency of the production equipment, reduces the cost of gas recovery, ensures product quality, and reduces the cost of using argon.
Smart Images
Figure CN223209231U_ABST
Abstract
Description
Technical Field
[0001] The present disclosure relates to the technical field of single crystal silicon production, and in particular to a gas recovery and reuse device. Furthermore, it also includes a single crystal silicon production line. Background Art
[0002] High-purity argon refers to argon with a purity greater than 99.999%. It is an essential purification gas and protective gas in the preparation process of single crystal silicon and polycrystalline silicon. Due to the high cost of the argon currently used and the large demand for argon by ordinary single crystal silicon manufacturers, the average usage of a single single crystal furnace is 8m3. 3 / h, resulting in high production costs. Therefore, in order to save costs, a single crystal furnace argon collection and purification device is introduced to recover the mixed gas containing argon discharged from the single crystal furnace after production, and purify the argon before reuse. However, the existing argon recovery device has high operating costs, and in the process of extracting the mixed gas containing argon, it inevitably takes away some argon in the single crystal furnace, resulting in unstable production operations in the single crystal furnace, affecting the quality of the produced single crystal silicon, and reducing production efficiency.
[0003] In view of this, it is necessary to design a new type of gas recovery and reuse equipment that can overcome the above technical difficulties and effectively solve or alleviate the above technical difficulties. Utility Model Content
[0004] A technical problem to be solved by the present disclosure is to provide a gas recovery and reuse device, which can improve the production stability of the production device, improve production efficiency, improve product quality, and reduce the cost of gas recovery by gas recovery and reuse.
[0005] In order to solve the above-mentioned technical problems, the first aspect of the present disclosure provides a gas recovery and reuse equipment, including a production device; used for producing single crystal silicon; a recovery mechanism, the air inlet channel of the recovery mechanism is connected to the air outlet end of the production device, and the air outlet channel of the recovery mechanism is connected to the air inlet end of the production device to form a gas recovery and utilization loop; and a replenishing mechanism, the replenishing mechanism is connected to the air inlet end of the production device to be able to transport gas to the production device.
[0006] In some embodiments, a pressure control mechanism is provided at the air inlet of the production device to control the internal air pressure of the production device.
[0007] In some embodiments, the pressure control mechanism includes a pressure regulating device and a pressure detecting device. The pressure regulating device is wirelessly connected to the pressure detecting device. The pressure detecting device is disposed in the production device to detect the internal pressure of the production device.
[0008] In some embodiments, the replenishment mechanism includes a storage tank and a gasification device arranged in sequence along the gas output direction. A first pressure regulating device is arranged between the gasification device and the production device. The first pressure regulating device is wirelessly connected to the pressure detection device.
[0009] In some embodiments, the recovery mechanism includes at least one set of a pre-cooling device, a purification component, and a pressurizing device arranged in sequence along the gas output direction of the production device, and a second pressure regulating device is arranged between the purification component and the pressurizing device.
[0010] In some embodiments, a vacuum device and a first buffer tank are sequentially arranged between the gas outlet of the production device and the gas inlet of the recovery mechanism along the gas output direction of the production device, and a second buffer tank is arranged between the gas outlet of the recovery mechanism and the gas inlet of the production device.
[0011] In some embodiments, the purification assembly includes an adsorption device and a purification device sequentially arranged along the gas output direction of the production device, and a heating device is provided on the outer surface of the adsorption device to reduce the substance in the adsorption device.
[0012] In some embodiments, a heat exchange mechanism is provided between the precooling device and the gasification device, and the heat exchange mechanism includes a first channel and a second channel. The coolant inlet of the first channel is connected to the precooling device, the coolant outlet of the first channel is connected to the gasification device, the coolant inlet of the second channel is connected to the gasification device, and the coolant outlet of the second channel is connected to the precooling device to form a coolant circulation loop.
[0013] In some embodiments, the gas outlet of the recovery mechanism is connected to the gas inlet of the production device through a gas pipeline, and a control component is provided on the gas pipeline.
[0014] The second aspect of the present invention further discloses a single crystal silicon production line, comprising the gas recovery and reuse equipment of any one of the above technical solutions.
[0015] Through the above technical solution, the gas recovery and reuse device provided by the present invention replenishes gas to the production device by setting up a replenishing mechanism, thereby ensuring the pressure stability in the production device, improving the production stability of the production device, and being able to extract and reuse the mixed gas in the production device, thereby reducing production costs, improving production efficiency, and ensuring product quality. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] In order to more clearly illustrate the embodiments of the present disclosure or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present disclosure. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.
[0017] Figure 1 It is a schematic diagram of the structure disclosed in the embodiment of the present disclosure.
[0018] Description of reference numerals:
[0019] 1. Production device; 2. Recovery mechanism; 21. Pre-cooling device; 22. Purification component; 221. Adsorption device; 222. Purification device; 23. Pressurization device; 24. Second pressure regulating device; 25. Vacuum device; 26. First buffer tank; 27. Second buffer tank; 3. Supplementation mechanism; 31. Storage tank; 32. Gasification device; 33. First pressure regulating device; 4. Pressure control mechanism; 41. Pressure regulating device; 42. Pressure detection device; 5. Heat exchange mechanism; 51. First channel; 52. Second channel. DETAILED DESCRIPTION
[0020] The following embodiments of the present disclosure are further described in detail with reference to the accompanying drawings and examples. The detailed description of the following examples and the accompanying drawings are intended to illustrate the principles of the present disclosure, but are not intended to limit the scope of the present disclosure. The present disclosure can be implemented in many different forms and is not limited to the specific embodiments disclosed herein, but rather includes all technical solutions within the scope of the claims.
[0021] The present disclosure provides these embodiments in order to make this disclosure thorough and complete, and to fully convey the scope of the present disclosure to those skilled in the art. It should be noted that: unless otherwise specifically stated, the relative arrangement of parts and steps, the composition of materials, numerical expressions and numerical values set forth in these embodiments should be interpreted as merely exemplary, and not as limiting.
[0022] It should be noted that, in the description of this disclosure, unless otherwise specified, "plurality" means greater than or equal to two; terms such as "upper," "lower," "left," "right," "inner," and "outer" indicating directions or positional relationships are intended solely to facilitate and simplify the description of this disclosure, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limitations on this disclosure. When the absolute position of the object being described changes, the relative positional relationship may also change accordingly.
[0023] In addition, the terms "first," "second," and similar terms used in this disclosure do not denote any order, quantity, or importance, but are merely used to distinguish different parts. "Perpendicular" does not mean perpendicular in the strict sense, but rather means within the tolerance range. "Parallel" does not mean parallel in the strict sense, but rather means within the tolerance range. "Include" or "comprising" and similar terms mean that the elements preceding the term include the elements listed after the term, and do not exclude the possibility of also including other elements.
[0024] It should also be noted that, in the description of this disclosure, unless otherwise expressly specified or limited, the terms "installed," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; they can refer to direct connections or indirect connections through an intermediary. Those skilled in the art will understand the specific meanings of the above terms in this disclosure depending on the specific circumstances. When a specific device is described as being located between a first device and a second device, there may or may not be an intervening device between the specific device and the first or second device.
[0025] All terms used in this disclosure have the same meaning as understood by one of ordinary skill in the art to which this disclosure belongs, unless otherwise specifically defined. It should also be understood that terms defined in, for example, common dictionaries should be interpreted as having a meaning consistent with their meaning in the context of the relevant art, and should not be interpreted in an idealized or highly formal sense, unless explicitly defined as such herein.
[0026] Technologies, methods, and equipment known to ordinary technicians in the relevant art may not be discussed in detail, but where appropriate, the technologies, methods, and equipment should be considered part of the specification.
[0027] See also Figure 1 As shown, the first aspect of the present disclosure provides a gas recovery and reuse equipment, including a production device 1, a recovery mechanism 2 and a supplementing mechanism 3, wherein the production device 1 can be a single crystal furnace for producing single crystal silicon, the air inlet channel of the recovery mechanism 2 is connected to the air outlet end of the production device 1, and the air outlet channel of the recovery mechanism 2 is connected to the air inlet end of the production device 1. The reacted mixed gas is discharged from the air outlet end of the production device 1 and enters the recovery mechanism 2 from the air inlet channel of the recovery mechanism 2. After passing through the recovery mechanism 2 and then being purified by the recovery mechanism 2, it enters the production device 1 through the air outlet channel of the recovery mechanism 2, so as to form a gas recovery and utilization loop, and recycle and reuse the mixed gas after the reaction of the production device 1, reduce the production cost of single crystal silicon, and improve the utilization rate of the gas in the production device 1. The supplementing mechanism 3 is connected to the air inlet end of the production device 1, and transports gas to the production device 1 to ensure the pressure stability in the production device 1 and the stability of the content of the special gas required to be used, thereby improving the production stability of the production device 1 and improving the utilization efficiency and product quality of the production device 1.
[0028] The gas recovery and reuse equipment provided by the present disclosure can, on the one hand, recover the mixed gas produced by the production device 1, and can further purify it after recovery to retain the special gas needed for use in the production device 1; on the other hand, it can also transport the extracted special gas back into the production device 1 for production and manufacturing, thereby reducing the cost of using the special gas, while ensuring the production quality of the product and reducing the production cost. In addition, a replenishment mechanism 3 is provided to further replenish the special gas into the production device 1, thereby ensuring the stable operation of the production device 1, improving production efficiency, and ensuring product quality.
[0029] The special gas mentioned in some of the above embodiments may be argon gas which is essential as a purification gas and a protective gas in the preparation process of single crystal silicon and polycrystalline silicon.
[0030] In addition, if Figure 1 As shown, the production device 1 can be used by multiple devices at the same time and connected to the recovery mechanism 2 through a gas delivery channel, so as to reduce the number of recovery mechanisms 2 used and reduce the cost of use.
[0031] In some embodiments, the air inlet of the production device 1 is provided with a pressure control mechanism 4 to control the internal air pressure of the production device 1, such as Figure 1 As shown, a pressure control mechanism 4 is provided on the air inlet end of the production device 1, which is used to control the amount of gas entering the production device 1 through the air inlet channel of the recovery mechanism 2 and the air inlet end of the replenishing mechanism 3, thereby controlling the amount of gas in the production device 1 and ensuring the pressure stability in the production device 1, thereby improving the stability of the operation of the production device 1 and improving product quality.
[0032] In some embodiments, the pressure control mechanism 4 includes a pressure regulating device 41 and a pressure detecting device 42. The pressure regulating device 41 is wirelessly connected to the pressure detecting device 42. The pressure detecting device 42 is disposed in the production device 1 to detect the internal air pressure of the production device 1. Figure 1 As shown, the pressure regulating device 41 can be a one-way valve arranged on the air outlet end of the replenishing mechanism 3, and the pressure detecting device 42 detects whether the pressure in the production device 1 reaches the predetermined working pressure. When the production device 1 does not reach the predetermined working pressure, the pressure detecting device 42 sends an electrical signal to the pressure control regulating device 41, and controls the pressure regulating device 41 to open, and replenish the gas in the replenishing mechanism 3 into the production device 1, so that the pressure in the production device 1 reaches the predetermined working pressure, thereby improving the stability of the operation of the production device 1, improving product quality, reducing manual operation, and being able to monitor the air pressure inside the production device 1 in real time, ensuring the stable operation of the production device 1 and improving production efficiency.
[0033] See also Figure 1 In some embodiments, the replenishing mechanism 3 includes a storage tank 31 and a gasification device 32 arranged in sequence along the gas output direction, and a first pressure regulating device 33 is provided between the gasification device 32 and the production device 1. Figure 1 As shown, the argon in the replenishing mechanism 3 is liquefied and stored in the storage tank 31. When the production device 1 does not reach the predetermined working pressure, the pressure detection device 42 controls the pressure regulating device 41 to open, and the liquid argon flows from the storage tank 31 into the gasification device 32. The gasification device 32 gasifies the liquid argon and then transports it into the production device 1 through the first pressure regulating device 33 to replenish the production device 1 with argon until the production device 1 reaches the predetermined working pressure. The first pressure regulating device 33 can prevent the pressure fluctuation of the argon after gasification from being too large to damage the pipeline and the production device 1. At the same time, the replenishing mechanism 3 can replenish the production device 1 with argon, so that the production device 1 reaches the predetermined working pressure, thereby improving the stability of the operation of the production device 1 and improving the product quality.
[0034] It is understood that the "gas output direction" in the above technical solution refers to Figure 1 The direction of the arrow on the supplementary mechanism 3 is as follows: Figure 1 As shown, the storage tank 31 and the gasification device 32 are Figure 1 The middle one is set from left to right.
[0035] It is also understandable that if Figure 1 As shown, as some embodiments of the present disclosure, the pipeline used by the replenishing mechanism 3 to transport argon to the production device 1 and the pipeline used by the recovery mechanism 2 to transport argon to the production device 1 can be the same or can be set separately. Using the same one can reduce the manufacturing cost of the device, and setting them separately as two pipelines can facilitate subsequent maintenance and repair. Specifically, it can be set according to the actual use environment.
[0036] In some embodiments, the recovery mechanism 2 includes at least one set of pre-cooling device 21, purification component 22 and boosting device 23 arranged in sequence along the gas output direction of the production device 1, and a second pressure regulating device 24 is provided between the purification component 22 and the boosting device 23. Figure 1As shown, as one of the embodiments, the recovery mechanism 2 can be two groups of pre-cooling devices 21, purification components 22 and boosting devices 23 arranged in sequence along the gas output direction of the production device 1, one group is used daily, and the other group is used for standby, so as to improve the safety of the use of the recovery mechanism 2. The pre-cooling device 21 cools the mixed gas recovered from the production device 1, for example, reduces the temperature of the mixed gas to below 40°C to avoid affecting the use of subsequent devices due to excessively high temperature of the mixed gas. The purification component 22 purifies the mixed gas recovered from the production device 1 to obtain the required gas, and then boosts the purified gas through the boosting device 23, wherein the boosting device can be a boosting pump to make the purified gas reach a pressure that can be normally used by the production device 1. The second pressure regulating device 24 is arranged between the purification component 22 and the boosting device 23 to prevent the air pressure change from damaging the equipment, thereby improving the stability of the operation of the production device 1 and improving the product quality.
[0037] It is understood that the "gas output direction" in the above technical solution refers to Figure 1 The direction of the arrow on the recovery mechanism 2 is as follows: Figure 1 As shown, the pre-cooling device 21, the purification component 22 and the boosting device 23 are Figure 1 The middle is arranged from left to right in sequence. The purified gas can be argon. The purification component 22 purifies the gas recovered from the production device 1 to obtain argon, and then the booster device 23 boosts the purified argon to 0.5-0.8Mpa to reach the argon pressure that can be used by the production device 1, replenishing the scarce argon in the production device 1, improving the utilization rate of the argon, and reducing the production cost of single crystal silicon.
[0038] In some embodiments, as Figure 1 As shown, an exhaust device 25 and a first buffer tank 26 are sequentially arranged between the gas outlet end of the production device 1 and the gas inlet end of the recovery mechanism 2 along the gas output direction of the production device 1, wherein the exhaust device 25 can be a vacuum pump, which introduces the mixed gas used in the production device 1 into the recovery mechanism 2 for purification, and the first buffer tank 26 is arranged between the exhaust device 25 and the recovery mechanism 2 to reduce the gas pressure fluctuation caused by the vacuum pump exhaust and improve the stability of the recovery mechanism 2. A second buffer tank 27 is arranged between the gas outlet end of the recovery mechanism 2 and the gas inlet end of the production device 1. The second buffer tank 27 can prevent the pressure fluctuation of the gas from being too high after the boosting device 23 boosts the pressure, thereby damaging the production device 1 that receives the purified gas, thereby improving the stability of the operation of the production device 1 and improving the product quality.
[0039] It is understandable that if Figure 1As shown, the "gas output direction" in the above technical solution is the direction of the arrow on the recovery mechanism 2. The purified gas can be argon. The second buffer tank 27 can prevent the argon pressure fluctuation from exceeding 10Kpa, so that the purified argon can be used normally by the production device 1, preventing the argon gas with too high pressure from damaging the production device 1, improving the stability of the operation of the production device 1, and improving the product quality.
[0040] In some embodiments, the purification component 22 includes an adsorption device 221 and a purification device 222 arranged in sequence along the gas output direction of the production device 1. The adsorption device 221 and the purification device 222 purify the gas discharged from the production device 1 in sequence and then introduce it into the production device 1, so that the gas can be recycled. A heating device is provided on the outer surface of the adsorption device 221, and the heating device heats and reduces the reducing substance in the adsorption device 221, so that the reducing substance in the adsorption device 221 can be recycled, thereby reducing the cost required to purify the gas discharged from the production device 1.
[0041] It is understandable that if Figure 1 As shown, the "gas output direction" in the above technical solution is the direction of the arrow on the recovery mechanism 2. The purified substance can be argon. Alumina plus activated carbon, zeolite and other adsorption materials can be used inside the adsorption device 221 to remove nitrogen, CO, H2O and other waste gases in the gas discharged from the production device 1. After the adsorption device 221 completes the adsorption, the purification device 222 can use carbon purification or hydrogen purification to further adsorb and purify O2 and H2O in the gas, so that argon with a purity of not less than 99.999% can be extracted, thereby improving the utilization rate of argon and reducing the production cost of single crystal silicon.
[0042] In some embodiments, a heat exchange mechanism 5 is provided between the precooling device 21 and the gasification device 32, and the heat exchange mechanism 5 includes a first channel 51 and a second channel 52, wherein the coolant inlet of the first channel 51 is connected to the precooling device 21, the coolant inlet of the second channel 52 is connected to the gasification device 32, and the coolant outlet of the second channel 52 is connected to the precooling device 21 to form a coolant circulation loop, which circulates heat between the precooling device and the gasification device 32, reduces the energy consumption of the precooling device and the gasification device 32, reduces the energy consumption of the gas recovery and reuse equipment, and thereby reduces the use of the gas recovery and reuse equipment.
[0043] It can be understood that after the pre-cooling device 21 cools the mixed gas discharged from the production device 1, the coolant in the first channel 51 absorbs the heat in the mixed gas, and the heated coolant in the first channel 51 heats the liquid argon in the gasification device 43 through circulation. The liquid argon absorbs the heat in the coolant and is converted into argon gas. Since the heat is absorbed by the coolant, the cooled coolant flows to the pre-cooling device 21 through the second channel 52 to cool the mixed gas. The above operations are repeated to realize the recycling of the coolant, which can not only achieve the cooling of the mixed gas and the gasification of the liquid argon, but also reduce the cost of using the coolant.
[0044] In some embodiments, the gas outlet end of the recovery mechanism 2 is connected to the gas inlet end of the production device 1 through a gas pipeline, and a control component is provided on the gas pipeline, wherein a filter such as a filter mesh can be provided in the control component. At the same time, the filter component can also be provided in the gas pipeline to filter the gas purified by the recovery mechanism 2 again, thereby improving the purity of the gas, improving the stability of the operation of the production device 1, and improving the product quality.
[0045] In addition, the second aspect of the present invention also provides a single crystal silicon production line, which includes the gas recovery and reuse equipment provided by the first aspect. The gas recovery and reuse equipment used in the single crystal silicon production line has the advantages of low cost and stable operation. By using the gas recovery and reuse equipment, the cost of single crystal silicon production can be reduced and the stability of single crystal silicon production and product quality can be improved.
[0046] In order to facilitate a deeper understanding of the technical concept and advantages of the gas recovery and reuse device disclosed in the present invention, the following Figure 1 The structural form of a relatively comprehensive gas recovery and reuse device is described in the present disclosure with some relatively preferred features.
[0047] The production device 1 can be a single crystal furnace for producing single crystal silicon. The air inlet channel of the production device 1 is connected to the air outlet end of the recovery mechanism 2, and the air outlet channel of the production device 1 is connected to the air inlet end of the recovery mechanism 2. The production device 1 can be a single crystal furnace, and the recovery mechanism 2 includes a plurality of channels along the production device 1. Figure 1 Two sets of pre-cooling devices 21, purification components 22 and boosting devices 23 are arranged in sequence in the direction of the middle arrow. The boosting device 23 can be a boosting pump. One set is used for daily use and the other set is used as a spare. The purification component 22 includes a Figure 1The adsorption device 221 and the purification device 222 are arranged in the direction of the arrow. The adsorption device 221 adopts adsorption materials such as alumina, activated carbon and zeolite to remove waste gases such as nitrogen, CO, H2O, etc. in the mixed gas discharged from the production device 1, and a heating device is arranged on the outer surface of the adsorption device 221. For example, a heating furnace is used to heat the adsorption device 221 to reduce and reuse the adsorbed substances in the adsorption device 221, thereby reducing the use cost of the gas recovery and reuse equipment. The purification device 222 mainly uses carbon purification or hydrogen purification to adsorb and purify O2 and H2O in the gas to ensure that argon with a purity of not less than 99.999% is obtained after passing through the purification device 6, and 0.5-0.8Mpa argon is obtained after passing through the booster pump. The gas outlet of the production device 1 and the gas inlet of the recovery mechanism 2 are along Figure 1 An exhaust device 25 and a first buffer tank 26 are sequentially provided in the direction of the arrows. The exhaust device 25 can use a vacuum pump to draw the gas after the reaction of the production device 1 into the first buffer tank 26, and then enter the recovery mechanism 2 to purify the argon. A second pressure regulating device is provided between the purification component 22 and the boosting device 23. A second buffer tank 27 is provided between the gas outlet end of the recovery mechanism 2 and the gas inlet end of the production device 1. The purified argon gas circulates into the production device 1 through the second buffer tank 27. The second buffer tank 27 can prevent the argon pressure after the boosting pump exceeds 10Kpa. The gas inlet end of the production device 1 is also connected to a replenishing mechanism 3 to replenish argon into the production device 1, wherein the replenishing mechanism 3 includes a Figure 1The arrows are arranged in sequence as a storage tank 31 and a gasification device 32. A first pressure regulating device 33 is arranged between the gasification device 32 and the production device 1. Liquid argon enters the gasification device 32 from the storage tank 31 and is gasified, and then enters the production device 1 through the first pressure regulating device 33. A heat exchange mechanism 5 is arranged between the gasification device 32 and the preheating device 32. The heat exchange mechanism 5 includes a first channel 51 and a second channel 52. The coolant inlet of the first channel 51 is connected to the precooling device, the coolant inlet of the second channel 52 is connected to the gasification device 32, and the coolant outlet of the second channel 52 is connected to the precooling device 21 to form a coolant circulation loop to perform heat exchange circulation between the precooling device and the gasification device 32. A pressure control mechanism 4 is arranged on the air inlet end of the production device 1. The pressure control mechanism 4 includes a pressure regulating device 41 and a pressure detection device 42. The pressure regulating The device 41 is wirelessly connected to the pressure detection device 42, the pressure detection device 42 is arranged in the production device 1, and the pressure regulating device 41 can be a valve arranged on the air outlet of the replenishing mechanism 3. The pressure detection device 42 detects whether the pressure in the production device 1 reaches the predetermined working pressure. When the production device 1 does not reach the predetermined working pressure, the pressure detection device 42 controls the pressure regulating device 41 to open, and replenishes the gas in the replenishing mechanism 3 into the production device 1, so that the pressure in the production device 1 reaches the predetermined working pressure, thereby improving the operation stability of the production device 1. The air outlet end of the recovery mechanism 2 is connected to the air inlet end of the production device 1 through a gas pipeline, and a control component is provided on the gas pipeline, wherein the control component can be a filter mesh, etc., which is arranged in the gas pipeline to filter the argon gas purified by the recovery mechanism 2 again to improve the purity of the argon gas.
[0048] It can be seen from the above description of the present disclosure that, first, the present disclosure provides a replenishing mechanism 3 to replenish gas to the production device 1, thereby ensuring the stability of the pressure in the production device 1, improving the production stability of the production device, improving production efficiency, and improving product quality;
[0049] Second, by providing a heat exchange mechanism 5 between the pre-cooling device 21 and the gasification device 32, heat is circulated between the pre-cooling device 21 and the gasification device 32, thereby reducing the energy required by the recovery mechanism 2 and lowering the cost of gas recovery;
[0050] Third, the mixed gas in the production device 1 can be collected, purified, and reused, thereby reducing the production cost of the production device 1.
[0051] Thus far, various embodiments of the present disclosure have been described in detail. To avoid obscuring the concept of the present disclosure, some details known in the art have not been described. Based on the above description, those skilled in the art can fully understand how to implement the technical solutions disclosed herein.
[0052] Although some specific embodiments of the present disclosure have been described in detail through examples, those skilled in the art will understand that the above examples are for illustrative purposes only and are not intended to limit the scope of the present disclosure. Those skilled in the art will understand that the above embodiments may be modified or some technical features may be replaced with equivalents without departing from the scope and spirit of the present disclosure. In particular, as long as there are no structural conflicts, the various technical features mentioned in the various embodiments may be combined in any manner.
Claims
1. A gas recovery and recycling device, characterized in that: include: Production device (1); for producing single crystal silicon; A recovery mechanism (2), wherein the air inlet channel of the recovery mechanism (2) is communicated with the air outlet end of the production device (1), and the air outlet channel of the recovery mechanism (2) is communicated with the air inlet end of the production device (1), so as to form a gas recovery and utilization loop; and A replenishing mechanism (3), wherein the replenishing mechanism (3) is connected to the gas inlet end of the production device (1) so as to be able to deliver the gas to the production device (1).
2. The gas recovery and reuse equipment according to claim 1, characterized in that: The air inlet end of the production device (1) is provided with a pressure control mechanism (4) so as to be able to control the air pressure inside the production device (1).
3. The gas recovery and reuse equipment according to claim 2, characterized in that: The pressure control mechanism (4) includes a pressure regulating device (41) and a pressure detecting device (42). The pressure regulating device (41) is wirelessly connected to the pressure detecting device (42). The pressure detecting device (42) is arranged in the production device (1) so as to be able to detect the internal pressure of the production device (1).
4. The gas recovery and reuse equipment according to claim 3, characterized in that: The replenishing mechanism (3) comprises a storage tank (31) and a gasification device (32) arranged in sequence along the gas output direction, and a first pressure regulating device (33) is provided between the gasification device (32) and the production device (1).
5. The gas recovery and reuse equipment according to claim 4, characterized in that: The recovery mechanism (2) comprises at least one set of a pre-cooling device (21), a purification component (22), and a pressurizing device (23) arranged in sequence along the gas output direction of the production device (1), and a second pressure regulating device (24) is provided between the purification component (22) and the pressurizing device (23).
6. The gas recovery and reuse equipment according to claim 5, characterized in that: A gas extraction device (25) and a first buffer tank (26) are sequentially arranged between the gas outlet end of the production device (1) and the gas inlet end of the recovery mechanism (2) along the gas output direction of the production device (1), and a second buffer tank (27) is arranged between the gas outlet end of the recovery mechanism (2) and the gas inlet end of the production device (1).
7. The gas recovery and reuse equipment according to claim 5, characterized in that: The purification component (22) includes an adsorption device (221) and a purification device (222) arranged in sequence along the gas output direction of the production device (1). A heating device is provided on the outer surface of the adsorption device (221) to reduce the substance in the adsorption device (221).
8. The gas recovery and reuse equipment according to claim 5, characterized in that: A heat exchange mechanism (5) is provided between the pre-cooling device (21) and the vaporization device (32), and the heat exchange mechanism (5) comprises a first channel (51) and a second channel (52), wherein the cooling liquid inlet of the first channel (51) is communicated with the pre-cooling device (21), the cooling liquid outlet of the first channel (51) is communicated with the vaporization device (32), the cooling liquid inlet of the second channel (52) is communicated with the vaporization device (32), and the cooling liquid outlet of the second channel (52) is communicated with the pre-cooling device (21), so as to form a cooling liquid circulation loop.
9. The gas recovery and reuse equipment according to claim 8, characterized in that: The gas outlet end of the recovery mechanism (2) is connected to the gas inlet end of the production device (1) via a gas pipeline, and a control component is provided on the gas pipeline.
10. A single crystal silicon production line, characterized in that: The invention comprises the gas recovery and reuse equipment according to any one of claims 1 to 9.