Soaking tank

Abstract

The utility model relates to a soaking tank which comprises a soaking box, a hanging basket is arranged in the soaking box, a plurality of water filtering through grooves are formed in the bottom of the hanging basket, supporting plates in one-to-one correspondence with the water filtering through grooves are arranged at the bottom of the soaking box, a driving assembly is arranged in the soaking box, and the driving assembly drives the hanging basket to reciprocate in the depth direction of the soaking box. When the hanging basket moves to the maximum distance away from the bottom of the soaking box, gaps are reserved between the bottom of the hanging basket and the top ends of the supporting plates, and when the hanging basket moves to the maximum distance away from the bottom face of the soaking box, the multiple supporting plates penetrate through the water filtering through groove and support and jack up the wafer. And the driving assembly and the supporting plate are arranged, so that the bonding surfaces of the wafer, the hanging basket and the supporting plate can be intermittently exposed in the processing solution, and the contact area of the wafer and the processing solution is enlarged. The wafer soaking and cleaning device has the effect of improving the wafer soaking and cleaning effect of the soaking tank.

Description

Technical Field

[0001] The present application relates to the technical field of soaking tanks, and in particular to a soaking tank. Background Art

[0002] An immersion tank is a type of support facility used to immerse workpieces. It is widely used in the semiconductor industry. For example, during the wafer manufacturing process, various impurities such as particles, organic matter, and metal ions will be adsorbed on the wafer surface. Therefore, a specific processing solution is required to immerse and clean the wafer in the immersion tank. Through chemical reactions or physical dissolution between the processing solution and the impurities, these impurities can be effectively removed, providing a clean surface for subsequent processes such as photolithography, etching, and coating.

[0003] Traditional immersion tanks usually use hanging basket containers to load silicon wafers, and then place the entire hanging basket in the immersion tank for immersion cleaning. However, since the bottom surfaces of the hanging basket container and the wafer are in contact with each other, the contact surface between the wafer and the hanging basket will hinder the full contact between the wafer and the processing solution. Therefore, the immersion tank's immersion cleaning effect on the wafer is reduced, which is obviously insufficient. Utility Model Content

[0004] In order to improve the soaking and cleaning effect of the soaking tank on wafers, the present application provides a soaking tank.

[0005] The present application provides an immersion tank that adopts the following technical solution:

[0006] A immersion tank comprises a immersion box, wherein the immersion box carries a processing solution, and a hanging basket for carrying wafers is provided in the immersion box, wherein the hanging basket is hollow, and a plurality of water filtering grooves are opened at the bottom of the hanging basket, and a support plate corresponding to the plurality of water filtering grooves is provided at the bottom of the immersion box, wherein the support plate is vertically arranged and located directly below the water filtering grooves, and the width of the support plate is smaller than the opening size of the water filtering grooves, and a driving assembly is provided in the immersion box, which drives the hanging basket to reciprocate along the depth direction of the immersion box, and when the hanging basket moves to the maximum distance away from the bottom of the immersion box, a gap is left between the bottom of the hanging basket and the top of the support plate, and when the hanging basket moves to the maximum distance close to the bottom surface of the immersion box, the plurality of support plates pass through the water filtering grooves and support and lift up the wafers.

[0007] By adopting the above technical solution, during the immersion process, the driving component drives the hanging basket to move back and forth along the depth direction of the immersion box. In the process of the hanging basket moving toward the bottom of the immersion box, the top of the support plate gradually penetrates the water filter groove and lifts up the wafer support. At this time, the part where the wafer and the hanging basket are in contact is exposed, and the contact surface between the wafer and the hanging basket fully reacts with the processing solution. When the driving component drives the hanging basket to move toward the top of the immersion box, the bottom surface of the hanging basket gradually approaches the bottom surface of the wafer until it is in contact. The hanging basket drives the wafer to move upward until the bottom surface of the wafer is separated from the support plate. At this time, the contact part between the wafer and the support plate is exposed, and the contact surface between the wafer and the support plate fully reacts with the processing solution. The arrangement of the driving component and the support plate enables the contact surface between the wafer, the hanging basket and the support plate to be intermittently exposed to the processing solution, thereby realizing all-round contact between the wafer and the processing solution, expanding the contact area between the wafer and the processing solution, and improving the immersion cleaning effect of the immersion tank on the wafer.

[0008] Optionally, a driving groove and a guide groove are respectively provided on the opposite side walls of the immersion box, and the driving assembly includes a screw rod rotatably connected to the driving groove, a nut block is threadedly connected to the screw rod, a guide rod is provided in the guide groove, and a guide block is slidably connected to the guide rod, one end of the hanging basket is provided on the nut block, and the other end is provided on the guide block, and a motor is provided on the immersion box, and the output shaft of the motor is coaxially and fixedly connected to the screw rod.

[0009] By adopting the above technical solution, the motor drives the screw to rotate. Since the nut block is threadedly connected to the screw, the rotational motion of the screw is converted into linear motion of the nut block. The movement of the nut block drives the hanging basket to move along the depth direction of the immersion box. At the same time, the movement direction of the hanging basket can be changed by controlling the direction of the motor, so that the bonding surface between the wafer and the hanging basket and the support plate is intermittently exposed to the processing solution.

[0010] Optionally, connecting blocks are provided at both opposite ends of the hanging basket, and the two connecting blocks are detachably connected to the nut block and the guide block respectively through connecting components.

[0011] By adopting the above technical solution, the setting of the connecting component realizes the detachable connection between the hanging basket and the nut block and the guide block. When the hanging basket needs to be cleaned, repaired or replaced, the hanging basket can be quickly separated from the drive assembly, thereby improving the maintainability of the equipment. At the same time, when a hanging basket of different specifications needs to be replaced, the operator can also take the hanging basket out of the immersion tank for replacement separately without the need for large-scale disassembly of the entire immersion tank, thereby improving the convenience of workers' operation.

[0012] Optionally, the connecting assembly includes an insert block rotatably connected to the connecting block, the nut block and the guide block are provided with slots that slidably cooperate with the insert block, the insert block is provided with a slider, the inner side wall of the slot is provided with a slide groove that slidably cooperates with the slider, the inner bottom wall of the slot is provided with an arc groove connected to the slide groove, a spring is provided on the inner bottom wall of the slot, one end of the spring is provided with a clamping plate, one end of the clamping plate is inserted into the arc groove and slidably cooperates with the arc groove, and a clamping groove for inserting the slider is provided on the side wall of the arc groove, and when the spring is in a natural state, the slider is pressed against the clamping plate in the clamping groove.

[0013] When the cam is in contact with the guide rail, the worker presses the cam downwards, and the spring compresses the slider from the guide rail to the connection point of the guide rail, and the worker then pushes the cam downwards to release the slider from the connection point of the guide rail.

[0014] Optionally, a connecting ring is provided at one end of the insert block away from the slider, the connecting ring is sleeved on the outer peripheral side wall of the insert block, a ring groove for slidingly fitting with the connecting ring is opened on the connecting block, and a pull ring is provided on the end face of the insert block away from the slider.

[0015] By adopting the above technical solution, the setting of the sliding groove and the connecting ring realizes the rotational connection of the plug block on the connecting block. At the same time, under the restriction of the ring groove and the connecting ring, the plug block cannot separate from the connecting block during the downward and upward movement, thereby avoiding the plug block from separating from the connecting block and causing connection failure, and improving the stability of the hanging basket connection on the immersion tank.

[0016] Optionally, a circulation component is also included, which includes a circulation pump, a water inlet of the circulation pump is provided with a water inlet pipe, the water inlet pipe is connected to the interior of the immersion tank, the water outlet of the circulation pump is provided with a water outlet pipe, the outlet end of the water outlet pipe extends into the immersion tank and is provided with a main water pipe, at least two branch water pipes are provided on the main water pipe, at least one of the branch water pipes is provided with two groups of water outlet holes on the side wall, the axis of one group of water outlet holes is intersected with the axis of the other group of water outlet holes, at least another of the branch water pipes is provided with two groups of water outlet holes on the side wall, the axis of one group of water outlet holes is intersected with the axis of the other group of water outlet holes.

[0017] By adopting the above technical solution, while the wafer is soaking in the soaking tank, the circulation pump is started, and the circulation pump pumps the processing solution in the soaking tank along the water inlet pipe into the water outlet pipe. The processing solution in the soaking tank then enters the main water pipe and branch water pipe in turn, and is finally discharged from the water outlet hole. Since the axes of the two groups of water outlet holes on each branch water pipe are intersecting, the processing solution is injected into the soaking tank from different directions, thereby forming a complex flow pattern in the soaking tank. The fluids in different directions collide and intersect with each other, so that the solutes in the processing solution can diffuse and mix more quickly. As a result, the various chemical components in the processing solution can be more evenly distributed around the wafer, ensuring that all parts of the wafer react with the processing solution and are cleaned, and the cleaning effect of the soaking tank on the wafer is further improved.

[0018] Optionally, a water filter box is provided on the outer wall of the soaking box, and an overflow hole connected to the interior of the soaking box is opened on the water filter box. A filter screen is provided on the side wall of the water filter box, and the filter screen is located below the overflow port. The end of the water inlet pipe away from the circulation pump is connected to the water filter box.

[0019] By adopting the above technical solution, during the soaking of the wafer in the immersion box, the processing solution above the overflow port enters the water filter box through the overflow hole. Under the filtration of the filter net, the impurities in the processing solution are blocked in the filter box, thereby reducing the adverse effects of impurities on the wafer cleaning process.

[0020] Optionally, a drain pipe is provided at the bottom of the soaking box, the drain pipe is connected to the interior of the soaking box, and a drain valve is installed on the drain pipe.

[0021] By adopting the above technical solution, after repeated use of the treatment solution, the impurity content in the treatment solution gradually increases. At this time, the cleaning ability of the treatment solution is greatly reduced. The operator opens the drain valve to discharge the treatment solution with high impurity content from the immersion tank. After the discharge is completed, the drain valve is closed, and the operator adds new treatment solution to the immersion tank to ensure the cleaning ability of the treatment solution.

[0022] In summary, this application includes at least one of the following beneficial technical effects:

[0023] 1. This application provides a drive assembly and a support plate. The drive assembly and the support plate allow the contact surfaces of the wafer, the hanging basket, and the support plate to be intermittently exposed to the processing solution, thereby achieving all-round contact between the wafer and the processing solution, expanding the contact area between the wafer and the processing solution, and improving the immersion cleaning effect of the immersion tank on the wafer;

[0024] 2. The present application provides a connecting assembly, which realizes a detachable connection between the hanging basket and the nut block and guide block. When the hanging basket needs to be cleaned, repaired or replaced, the hanging basket can be quickly separated from the drive assembly, thereby improving the maintainability of the equipment. At the same time, when a hanging basket of a different specification needs to be replaced, the operator can also remove the hanging basket from the immersion tank for replacement without large-scale disassembly of the entire immersion tank, thereby improving the convenience of workers' operation.

[0025] 3. This application incorporates a circulation component that creates a complex flow pattern within the immersion tank. Fluids flowing in different directions collide and converge, allowing the solutes in the treatment solution to diffuse and mix more rapidly. This allows the various chemical components in the treatment solution to be more evenly distributed around the wafer, ensuring that all parts of the wafer react with the treatment solution and are cleaned, further enhancing the cleaning effect of the immersion tank on the wafer. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 It is a schematic diagram of the structure of this application.

[0027] Figure 2 It is a cross-sectional view of the soaking box in the embodiment of the present application.

[0028] Figure 3 yes Figure 2 Enlarged view of point A in the middle.

[0029] Figure 4 It is a cross-sectional view of the nut block and the connecting block in the embodiment of the present application.

[0030] Figure 5 It is a cross-sectional view of the water filter box in the embodiment of the present application.

[0031] Figure 6 yes Figure 5 Enlarged view of point B in the middle.

[0032] Explanation of the accompanying symbols: 1. Soaking box; 101. Drive groove; 102. Guide groove; 103. Overflow hole; 2. Hanging basket; 21. Water filter groove; 3. Support plate; 4. Drive assembly; 41. Screw; 42. Nut block; 43. Guide rod; 44. Guide block; 45. Motor; 5. Connecting block; 51. Ring groove; 6. Connecting assembly; 61. Insert block; 62. Connecting ring; 63. Slider; 64. Spring; 65. Clamping plate; 7. Slot; 71. Slide; 72. Arc groove; 73. Clamping groove; 8. Circulation assembly; 81. Circulation pump; 82. Water inlet pipe; 83. Water outlet pipe; 84. Main water pipe; 85. Branch water pipe; 851. Water outlet hole; 9. Water filter box; 10. Filter screen; 11. Drain pipe; 111. Drain valve. DETAILED DESCRIPTION

[0033] The following is combined with Figure 1-6 This application is described in further detail.

[0034] The embodiment of the present application discloses a soaking tank.

[0035] Reference Figure 1 and Figure 2 A soaking tank includes a soaking box 1, which carries a processing solution for soaking and cleaning wafers. A hanging basket 2 for carrying wafers is provided in the soaking box 1. The hanging basket 2 is hollow, and a plurality of water filtering grooves 21 are provided at the bottom of the hanging basket 2. The plurality of water filtering grooves 21 are evenly distributed along the length direction of the soaking box 1 at equal distances.

[0036] During soaking, the operator places the wafer inside the hanging basket 2. The hollow hanging basket 2 allows the wafer to fully contact with the processing solution during the soaking process. The processing solution can flow through the wafer from all directions, thereby achieving soaking and cleaning of the wafer.

[0037] Reference Figure 1 and Figure 2 The bottom of the immersion box 1 is fixedly connected to a support plate 3 corresponding to a plurality of water filtering grooves 21, and the support plate 3 slides with the water filtering grooves 21, and each support plate 3 is vertically arranged and located directly below the corresponding water filtering groove 21. The width of the support plate 3 is smaller than the opening size of the water filtering groove 21 so that the support plate 3 can smoothly pass through the water filtering groove 21, and the length of the support plate 3 is the same as the length of the water filtering groove 21. A driving assembly 4 is provided in the immersion box 1, and the driving assembly 4 drives the hanging basket 2 to reciprocate along the depth direction of the immersion box 1. When the hanging basket 2 moves to the maximum distance away from the bottom of the immersion box 1, a gap is left between the bottom of the hanging basket 2 and the top of the support plate 3. When the hanging basket 2 moves to the maximum distance close to the bottom surface of the immersion box 1, multiple support plates 3 pass through the water filtering groove 21 and support the wafer to lift it up.

[0038] Reference Figure 1 and Figure 2A driving groove 101 and a guide groove 102 are respectively provided on the opposite side walls of the immersion box 1. The length directions of the driving groove 101 and the guide groove 102 are parallel to the depth direction of the immersion box 1. The driving assembly 4 includes a screw 41 rotatably connected to the driving groove 101, a nut block 42 is threadedly connected to the screw 41, a guide rod 43 is fixedly connected to the guide groove 102, and a guide block 44 is slidably connected to the guide rod 43. The end of the hanging basket 2 close to the screw 41 is arranged on the nut block 42, and the end close to the guide block 44 is arranged on the guide block 44. A motor 45 is fixedly connected to the top of the immersion box 1, and the output shaft of the motor 45 is coaxially fixedly connected to the screw 41.

[0039] During the soaking process, the motor 45 controls the screw 41 to rotate forward. Since the nut block 42 is threadedly connected to the screw 41, and under the guidance of the guide block 44 and the guide rod 43, the screw 41 rotates to drive the nut block 42 to move along the length direction of the driving groove 101, and the nut block 42 drives the hanging basket 2 to move toward the bottom of the soaking box 1. At this time, the top of the support plate 3 gradually passes through the water filtering groove 21 and lifts up the wafer support. The part where the wafer and the hanging basket 2 are bonded is exposed, and the bonding surface of the wafer and the hanging basket 2 fully reacts with the processing solution. Then the motor 45 controls the screw 41 to rotate in the opposite direction. At this time, the nut block 42 drives the hanging basket 2 to move toward the top of the immersion box 1, and the bottom surface of the hanging basket 2 gradually approaches the bottom surface of the wafer until it is bonded. The hanging basket 2 drives the wafer to move upward until the bottom surface of the wafer is separated from the support plate 3. At this time, the bonding part of the wafer and the support plate 3 is exposed, and the bonding surface of the wafer and the support plate 3 fully reacts with the processing solution. The setting of the driving component 4 and the support plate 3 allows the bonding surface of the wafer and the hanging basket 2 and the support plate 3 to be intermittently exposed to the processing solution, thereby realizing all-round contact between the wafer and the processing solution, expanding the contact area between the wafer and the processing solution, and improving the immersion cleaning effect of the immersion tank on the wafer.

[0040] Reference Figure 2 、 Figure 3 and Figure 4 , the two opposite ends of the hanging basket 2 are fixedly connected with connecting blocks 5, and the two connecting blocks 5 are detachably connected to the nut block 42 and the guide block 44 through the connecting assembly 6. When the hanging basket 2 needs to be cleaned, repaired or replaced, the operator uses the connecting assembly 6 to quickly separate the hanging basket 2 from the driving assembly 4. At the same time, when a hanging basket 2 of a different specification needs to be replaced, the operator can also take the hanging basket 2 out of the immersion tank 1 for replacement separately without large-scale disassembly of the entire immersion tank 1, thereby improving the convenience of workers' operation.

[0041] Reference Figure 2 、 Figure 3 and Figure 4The connecting assembly 6 includes an insert block 61 rotatably connected to the connecting block 5. A connecting ring 62 is fixedly sleeved on the outer surface of the insert block 61. A ring groove 51 is provided on the connecting block 5 to rotate with the connecting ring 62. The thickness of the ring groove 51 is greater than the thickness of the connecting ring 62 to realize the up and down movement of the connecting ring 62. A slot 7 is provided on the nut block 42 and the guide block 44 to slide with the insert block 61. Two sliders 63 are fixedly connected to one end of the insert block 61 close to the slot 7. The two sliders 63 are relatively arranged on both sides of the insert block 61. A slide groove 71 for the two sliders 63 to slide is provided on the opposite inner side walls of the slot 7. The inner peripheral side wall of the slot 7 is provided with a groove corresponding to the two slide grooves 71. The arc groove 72 is connected, and a spring 64 is provided on the bottom wall of the slot 7. One end of the spring 64 is fixedly connected to the bottom wall of the slot 7, and the other end is fixedly connected to a clamping plate 65. The clamping plate 65 includes an integrally formed circular bottom plate and two arc-shaped plug-in plates. The arc-shaped plug-in plates are inserted into the corresponding arc grooves 72 and slide in the arc grooves 72. A snap-fitting groove 73 that is snap-fitted with the two sliders 63 is provided on the inner side walls of the two arc grooves 72. The center of the snap-fitting groove 73 is not in a straight line with the center of the slide groove 71. When the connecting ring 62 moves to the end of the ring groove 51 away from the slot 7, the spring 64 is in a natural state, and the two sliders 63 are pressed against the inside of the snap-fitting groove 73 by the clamping plate 65.

[0042] When the worker installs the hanging basket 2, he inserts the plug 61 on the hanging basket 2 into the slot 7 from top to bottom. The plug 61 drives the slider 63 to move along the slide groove 71. When the plug 61 abuts against the surface of the retaining plate 65, the worker presses the plug 61 downward, and the connecting block 5 moves to the side wall of the annular groove 51 close to the slot 7. At this time, the spring 64 is compressed, and the slider 63 is transferred from the slide groove 71 to the arc groove 72. The worker rotates the plug 61 by pulling the ring, so that the slider 63 slides from the arc groove 72 to the position where it communicates with the engaging groove 73. Then, the force on the plug 61 is cancelled, and the spring 64 resets and drives the retaining plate 65 to reset. The retaining plate 65 presses the slider 63 When the lock body 7 is in the unlocking state, the lock body 71 is locked and the lock body 72 is unlocked, and the lock body 72 is unlocked. When the lock body 7 is unlocked, the lock body 72 is unlocked, and the lock body 72 is unlocked. The lock body 72 is unlocked and the lock body 72 is unlocked.

[0043] Reference Figure 2 and Figure 5A circulation component 8 is provided on the soaking tank 1, and the circulation component 8 includes a circulation pump 81 fixedly mounted on the outer wall of the soaking tank 1. The water inlet of the circulation pump 81 is connected with a water inlet pipe 82, and the end of the water inlet pipe 82 away from the circulation pump 81 is connected with a water filter box 9, and the water filter box 9 is fixedly mounted on the outer wall of the soaking tank 1. An overflow hole 103 communicating with the interior of the water filter box 9 is provided on the soaking tank 1. A filter screen 10 is fixedly connected to the inside of the water filter box 9, and the filter screen 10 is located below the overflow port. The connection between the water inlet pipe 82 and the water filter box 9 is located below the water filter box 9. The water outlet hole 851 of the circulation pump 81 is connected with a water outlet pipe 83, and the end of the water outlet pipe 83 away from the circulation pump 81 is connected with the interior of the soaking tank 1.

[0044] Reference Figure 2 、 Figure 5 and Figure 6 The outlet pipe 83 extends into one end of the immersion box 1 and is connected to a main water pipe 84. The two main water pipes 84 are arranged opposite to each other. Each main water pipe 84 is provided with at least two branch water pipes 85. In this embodiment, there are two branch water pipes 85, and the two branch water pipes 85 are distributed up and down and are respectively located on the opposite inner walls of the immersion box 1. Two groups of water outlet holes 851 are provided on the branch water pipe 85 near the top of the immersion box 1, one group of water outlet holes 851 is arranged with its axis horizontally, and the other group of water outlet holes 851 opens toward the bottom of the immersion box 1. Two groups of water outlet holes 851 are provided on the branch water pipe 85 on one side of the bottom of the other immersion box 1, one group of water outlet holes 851 is arranged with its axis horizontally, and the other group of water outlet holes 851 opens toward the top of the immersion box 1.

[0045] During the soaking process of the wafer in the soaking tank 1, the processing solution above the overflow port enters the water filter box 9 through the overflow hole 103. Under the filtration of the filter screen 10, the impurities in the processing solution are blocked in the filter box, thereby reducing the adverse effects of impurities on the wafer cleaning process. Under the pumping action of the circulation pump 81, the filtered processing solution is pumped into the outlet pipe 83 along the water inlet pipe 82. The processing solution in the soaking tank 1 then enters the main water pipe 84 and the branch water pipe 85 in turn, and finally discharged from the outlet hole 851. Since the axes of the two groups of outlet holes 851 on each branch water pipe 85 intersect, the processing solution is injected into the soaking tank 1 from different directions, thereby forming a complex flow pattern in the soaking tank 1. The fluids in different directions collide and intersect with each other, allowing the solutes in the processing solution to diffuse and mix more quickly. As a result, the various chemical components in the processing solution can be more evenly distributed around the wafer, ensuring that all parts of the wafer react with the processing solution and are cleaned, and the cleaning effect of the soaking tank on the wafer is further improved.

[0046] Reference Figure 2 、 Figure 5 and Figure 6A drain pipe 11 is provided at the bottom of the soaking box 1 , the drain pipe 11 is communicated with the interior of the soaking box 1 , and a drain valve 111 is installed on the drain pipe 11 .

[0047] After repeated use of the treatment solution, the impurity content in the treatment solution gradually increases. At this time, the cleaning ability of the treatment solution is greatly reduced. The operator opens the drain valve 111 to discharge the treatment solution with high impurity content from the immersion tank 1. After the discharge is completed, the drain valve 111 is closed, and the operator adds new treatment solution to the immersion tank 1 to ensure the cleaning ability of the treatment solution.

[0048] The implementation principle of the immersion tank of the embodiment of the present application is as follows: during the immersion process of the wafer, the motor 45 controls the screw 41 to rotate forward. Since the nut block 42 is threadedly connected to the screw 41, and under the guidance of the guide block 44 and the guide rod 43, the screw 41 rotates to drive the nut block 42 to move along the length direction of the driving groove 101, and the nut block 42 drives the hanging basket 2 to move toward the bottom of the immersion box 1. At this time, the top of the support plate 3 gradually passes through the water filtering groove 21 and lifts up the wafer support. The part where the wafer and the hanging basket 2 are in contact is exposed, and the contact surface between the wafer and the hanging basket 2 fully reacts with the processing solution. Then the motor 45 controls the screw 41 to rotate forward. Rotate in the opposite direction. At this time, the nut block 42 drives the hanging basket 2 to move toward the top of the immersion box 1. The bottom surface of the hanging basket 2 gradually approaches the bottom surface of the wafer until it is bonded. The hanging basket 2 drives the wafer to move upward until the bottom surface of the wafer is separated from the support plate 3. At this time, the bonding part of the wafer and the support plate 3 is exposed, and the bonding surface of the wafer and the support plate 3 fully reacts with the processing solution. The setting of the drive component 4 and the support plate 3 allows the bonding surface of the wafer and the hanging basket 2 and the support plate 3 to be intermittently exposed to the processing solution, thereby realizing all-round contact between the wafer and the processing solution, expanding the contact area between the wafer and the processing solution, and improving the immersion cleaning effect of the immersion tank on the wafer.

[0049] The above are all preferred embodiments of the present application, and are not intended to limit the scope of protection of the present application. Therefore, any equivalent changes made based on the structure, shape, and principle of the present application should be included in the scope of protection of the present application.

Claims

1. A soaking tank, comprising a soaking box (1), wherein the soaking box (1) carries a processing solution, and wherein a hanging basket (2) for carrying wafers is provided in the soaking box (1), characterized in that: The hanging basket (2) is hollow, and a plurality of water filtering grooves (21) are provided at the bottom of the hanging basket (2). A support plate (3) corresponding to the plurality of water filtering grooves (21) is provided at the bottom of the immersion box (1). The support plate (3) is vertically arranged and located directly below the water filtering grooves (21). The width of the support plate (3) is smaller than the opening size of the water filtering grooves (21). A driving component (4) is provided in the immersion box (1). The driving component (4) drives the hanging basket (2) to reciprocate along the depth direction of the immersion box (1). When the hanging basket (2) moves to the maximum distance away from the bottom of the immersion box (1), a gap is left between the bottom of the hanging basket (2) and the top of the support plate (3). When the hanging basket (2) moves to the maximum distance close to the bottom surface of the immersion box (1), the plurality of support plates (3) pass through the water filtering grooves (21) and support and lift the wafers.

2. A soaking tank according to claim 1, characterized in that A driving groove (101) and a guide groove (102) are respectively provided on opposite side walls of the soaking box (1); the driving assembly (4) comprises a screw (41) rotatably connected to the driving groove (101); a nut block (42) is threadedly connected to the screw (41); a guide rod (43) is provided in the guide groove (102); a guide block (44) is slidably connected to the guide rod (43); one end of the hanging basket (2) is provided on the nut block (42), and the other end is provided on the guide block (44); a motor (45) is provided on the soaking box (1); an output shaft of the motor (45) is coaxially and fixedly connected to the screw (41).

3. A soaking tank according to claim 2, characterized in that: Connecting blocks (5) are provided at opposite ends of the hanging basket (2), and the two connecting blocks (5) are detachably connected to the nut block (42) and the guide block (44) respectively through connecting components (6).

4. A soaking tank according to claim 3, characterized in that: The connecting assembly (6) includes an insert block (61) rotatably connected to the connecting block (5); a slot (7) is provided on the nut block (42) and the guide block (44) and is slidably engaged with the insert block (61); a slider (63) is provided on the insert block (61); a slide groove (71) is provided on the inner side wall of the slot (7) and is slidably engaged with the slider (63); an arc groove (72) is provided on the inner bottom wall of the slot (7) and is connected to the slide groove (71); ), a spring (64) is provided on the inner bottom wall of the slot (7), one end of the spring (64) is provided with a clamping plate (65), one end of the clamping plate (65) is inserted into the arc groove (72) and slidably cooperates with the arc groove (72), and a clamping groove (73) for inserting the slider (63) is provided on the side wall of the arc groove (72), and when the spring (64) is in a natural state, the slider (63) is clamped in the clamping groove (73) by the clamping plate (65).

5. A soaking tank according to claim 4, characterized in that: A connecting ring (62) is provided at one end of the insert block (61) away from the slider (63), and the connecting ring (62) is sleeved on the outer peripheral side wall of the insert block (61). A ring groove (51) that slides with the connecting ring (62) is provided on the connecting block (5), and a pull ring is provided on the end surface of the insert block (61) away from the slider (63).

6. The soaking tank according to claim 1, characterized in that: The invention also includes a circulation component (8), wherein the circulation component (8) includes a circulation pump (81), a water inlet of the circulation pump (81) is provided with a water inlet pipe (82), the water inlet pipe (82) is connected to the interior of the soaking tank (1), a water outlet hole of the circulation pump (81) is provided with a water outlet pipe (83), the outlet end of the water outlet pipe (83) extends into the soaking tank (1) and is provided with a main water pipe (84), and the main water pipe (84) is provided with a At least two branch water pipes (85), at least one of the branch water pipes (85) is provided with two groups of water outlet holes (851) on its side wall, wherein the axis of one group of water outlet holes (851) intersects with the axis of the other group of water outlet holes (851), and at least another of the branch water pipes (85) is provided with two groups of water outlet holes (851) on its side wall, wherein the axis of one group of water outlet holes (851) intersects with the axis of the other group of water outlet holes (851).

7. A soaking tank according to claim 6, characterized in that: A water filter box (9) is provided on the outer wall of the soaking box (1), and an overflow hole (103) communicating with the interior of the soaking box (1) is provided on the water filter box (9). A filter screen (10) is provided on the side wall of the water filter box (9), and the filter screen (10) is located below the overflow hole. The end of the water inlet pipe (82) away from the circulation pump (81) is connected to the water filter box (9).

8. The soaking tank according to claim 1, characterized in that: A drain pipe (11) is provided at the bottom of the soaking box (1), the drain pipe (11) is communicated with the interior of the soaking box (1), and a drain valve (111) is installed on the drain pipe (11).

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