Liquid abrasive flow system

Abstract

The utility model provides a liquid abrasive particle flow system which comprises a working solution box and a circulating pump, a liquid inlet end flange of the circulating pump is communicated with the side wall of the working solution box through a first pipe body, and a liquid outlet flange of the circulating pump is communicated to the bottom wall of the working solution box through a second pipe body. A fluid medium mixed with an abrasive medium in the working liquid tank is sucked into the circulating pump through the first pipe body and then returns to the working liquid tank through the second pipe body; the working liquid box is connected with the main pipeline, the main pipeline is connected with the fluid pump, the bottom end and the top end of the main pipeline are communicated with the working liquid box and the polishing chamber respectively, and fluid media mixed with abrasive media in the working liquid box enter the main pipeline and then are sucked into the polishing chamber through the fluid pump. The problem that in the prior art, the distribution density of an abrasive medium in a fluid medium is difficult to maintain, and consequently the grinding and polishing effect on a workpiece is affected is solved.

Description

Technical Field

[0001] The utility model relates to the field of abrasive flow equipment, and more specifically to a liquid abrasive flow system. Background Art

[0002] Liquid Abrasive Flow (LAF) is a process that uses a liquid abrasive medium to polish workpieces. It is widely used for polishing various workpieces, such as injectors, turbine housings and blades, splines, gears, and more. The abrasive medium used in LAF is typically composed of a mixture of water or other liquids and abrasive particles, exhibiting excellent fluidity and grinding performance. Under pressure, the liquid abrasive flows evenly across the workpiece surface, polishing and deburring the surface.

[0003] Since the liquid abrasive flow is formed by the mixture of abrasive medium and water or other fluids, and the abrasive medium is difficult to maintain a uniform distribution in the fluid medium and precipitation occurs, resulting in less distribution of abrasive medium in the upper fluid medium, making it difficult to achieve the purpose of grinding the workpiece, and the accumulation of abrasive in the lower fluid medium leads to poor fluidity, which may cause blockage of the pipeline. In existing solutions, manual timed stirring is usually adopted to avoid the problem of abrasive medium precipitation in the fluid medium. However, the anti-precipitation effect obtained by the manual timed stirring method is limited, and it is difficult to keep the distribution density of the abrasive medium in the fluid medium at an appropriate state, thereby affecting the grinding and polishing effect of the workpiece.

[0004] In view of this, it is necessary to improve the liquid abrasive flow system in the prior art to solve the above problems. Utility Model Content

[0005] The purpose of the utility model is to disclose a liquid abrasive flow system to solve the problem in the prior art that it is difficult to maintain the distribution density of the abrasive medium in the fluid medium, thereby affecting the grinding and polishing effect of the workpiece.

[0006] To achieve the above-mentioned object, the utility model provides a liquid abrasive flow system, comprising: a working liquid tank and a circulation pump, wherein the liquid inlet flange of the circulation pump is connected to the side wall of the working liquid tank through a first pipe body, and the liquid outlet flange of the circulation pump is connected to the bottom wall of the working liquid tank through a second pipe body, and the fluid medium mixed with the abrasive medium in the working liquid tank is sucked into the circulation pump through the first pipe body and then returned to the working liquid tank through the second pipe body;

[0007] The working fluid tank is connected to the main line, the main line is connected to the fluid pump, the bottom end and the top end of the main line are respectively connected to the working fluid tank and the polishing chamber, and the fluid medium mixed with the abrasive medium in the working fluid tank enters the main line and is sucked into the polishing chamber by the fluid pump.

[0008] As a further improvement of the present invention, the circulating pump is optionally configured as a sewage pump, and the first pipe body includes a suction pipe, a connecting pipe, and a first flange pipe. The suction pipe is arranged in the working liquid tank and a liquid inlet is formed at the top. One end of the connecting pipe is connected to the suction pipe, and the other end passes through the side wall of the working liquid tank and is integrally formed with a first flange. The two ends of the first flange pipe are integrally formed with a second flange and a third flange, the second flange is docked with the first flange, and the third flange is docked with the liquid inlet end flange of the sewage pump.

[0009] As a further improvement of the present invention, the second tube body includes a liquid outlet pipe and a second flange tube, the top end of the liquid outlet pipe is located in the working liquid tank and forms a liquid outlet, the bottom end of the liquid outlet pipe passes through the bottom wall of the working liquid tank and forms a fourth flange, the second flange tube has an integrally formed fifth flange and sixth flange, the fifth flange is docked with the fourth flange, and the sixth flange is docked with the liquid outlet end flange of the sewage pump.

[0010] As a further improvement of the present invention, the fluid pump is optionally a diaphragm pump, and the main line includes a first connecting pipe and a second connecting pipe. The bottom end of the first connecting pipe is connected to the side wall of the working liquid tank near the bottom wall, and the top end of the first connecting pipe is connected to the liquid inlet flange of the diaphragm pump. The liquid outlet flange of the diaphragm pump is located directly above the liquid inlet flange and is connected to the pulse damper. One end of the second connecting pipe is connected to the pulse damper, and the other end extends into the polishing chamber.

[0011] As a further improvement of the present invention, the second connecting pipe extends into the polishing chamber and is connected to a pressure transmitter at one end. The second connecting pipe has a first branch, which is connected to a safety valve. The safety valve is connected to the top wall of the working fluid tank through a connecting pipe.

[0012] As a further improvement of the present invention, a first observation window and a second observation window are provided on the side wall of the working fluid tank, a line connecting the centers of the first observation window and the second observation window is parallel to the axial direction of the working fluid tank, and a flushing port is provided between the first observation window and the second observation window.

[0013] As a further improvement of the present invention, the side wall of the working liquid tank is connected to a liquid level transmitter.

[0014] As a further improvement of the present invention, a liquid inlet pipe is provided through the side wall of the working liquid tank, and one end of the liquid inlet pipe located inside the working liquid tank extends downward in a direction parallel to the height of the working liquid tank and forms an opening, and a first control valve is provided at one end of the liquid inlet pipe located outside the working liquid tank.

[0015] As a further improvement of the present invention, the bottom wall of the working fluid tank is connected to a drain pipe, the drain pipe is provided with a second control valve, a discharge port is provided at the top of the working fluid tank, and a cover plate is provided at the discharge port.

[0016] As a further improvement of the present invention, it further includes: a bracket, which includes a base plate and multiple pillars, the bottom ends of the pillars are vertically fixed to the upper surface of the base plate, and the multiple pillars are respectively attached to and fixed to the outer wall of the working fluid tank.

[0017] Compared with the prior art, the beneficial effects of the present invention are: first, the circulating pump is connected to the working liquid tank, and the circulating pump sucks out the liquid medium of the mixed abrasive medium in the working liquid tank through the first tube body, and then the liquid medium of the mixed abrasive medium is returned to the working liquid tank by the second tube body. The above process circulates continuously so that the liquid medium of the mixed abrasive medium in the working liquid tank is always in a circulating state, thereby achieving a continuous stirring effect on the fluid medium of the mixed abrasive medium to avoid precipitation of the abrasive medium in the fluid medium, and maintaining the uniformity of distribution of the abrasive medium in the fluid medium. Then, the fluid medium of the mixed abrasive medium in the working liquid tank is sucked into the polishing chamber from the main line through the fluid pump to polish the workpiece clamped in the polishing chamber. Since the distribution of the abrasive medium in the fluid medium is in a relatively uniform state, a better polishing effect on the workpiece can be achieved.

[0018] Secondly, the circulation pump is configured as a sewage pump to effectively extract the mixture of the abrasive medium and the fluid medium. Furthermore, the first tube is connected to the side wall of the working fluid tank, and the second tube is connected to the bottom wall of the working fluid tank. The mixture of the abrasive medium and the fluid medium is sucked out from the higher liquid level in the working fluid tank and then returned through the bottom wall of the working fluid tank. This ensures a more uniform mixing of the fluid and abrasive media throughout the circulation process, thereby achieving better stirring.

[0019] Finally, a first observation window and a second observation window are provided on the side wall of the working fluid tank to observe the state of the mixture in the working fluid tank. Furthermore, a flushing port provided between the first and second observation windows facilitates flushing of the working fluid tank when no stirring is required. The waste liquid generated after flushing is discharged from the working fluid tank through the drain pipe by opening the second control valve. When the working fluid tank is in operation, abrasive media is introduced into the working fluid tank through the discharge port provided at the top of the working fluid tank. The first control valve is opened to allow the fluid media to flow into the working fluid tank through the inlet pipe, and the aforementioned circulation pump is then used to mix the fluid media and the abrasive media. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 This is a schematic diagram of the overall structure of the present invention;

[0021] Figure 2 This is a schematic diagram of the distribution structure of components such as a circulation pump used in this utility model;

[0022] Figure 3 for Figure 1 Enlarged view of part A in the middle;

[0023] Figure 4 This is a structural diagram for reflecting the main line and fluid pump in the present utility model. DETAILED DESCRIPTION

[0024] The present invention is described in detail below with reference to the various embodiments shown in the accompanying drawings. However, it should be noted that these embodiments are not limitations of the present invention, and any equivalent transformations or substitutions in functions, methods, or structures made by ordinary technicians in this field based on these embodiments are all within the scope of protection of the present invention.

[0025] It should be understood that, in the present application, the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "axial", "radial", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the present technical solution and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present technical solution.

[0026] Please refer to Figures 1 to 4 As shown, a liquid abrasive flow system disclosed in the present invention is shown. Compared with the prior art, in the present invention, the working fluid tank 1 is connected to the circulation pump 2. The circulation pump 2 sucks out the liquid medium of the mixed abrasive medium in the working fluid tank 1 through the first tube 23, and then returns the liquid medium of the mixed abrasive medium to the working fluid tank 1 through the second tube 24. The above process is continuously circulated so that the liquid medium of the mixed abrasive medium in the working fluid tank 1 is always in a circulating state, thereby achieving a continuous stirring effect on the fluid medium of the mixed abrasive medium to avoid precipitation of the abrasive medium in the fluid medium and maintaining the uniformity of the distribution of the abrasive medium in the fluid medium. Then, the fluid medium of the mixed abrasive medium in the working fluid tank 1 is sucked into the polishing chamber 5 through the main line 3 by the fluid pump 31 to polish the workpiece (not shown) clamped in the polishing chamber 5. Since the distribution of the abrasive medium in the fluid medium is in a relatively uniform state, a better polishing effect can be achieved on the workpiece, thereby solving the problem in the prior art that it is difficult to maintain the distribution density of the abrasive medium in the fluid medium, thereby affecting the polishing effect of the workpiece.

[0027] Ginseng Figures 1 to 4As shown, a liquid abrasive flow system provided in this embodiment includes a working liquid tank 1 and a circulating pump 2. The liquid inlet end flange 21 of the circulating pump 2 is connected to the side wall of the working liquid tank 1 through the first tube body 23, and the liquid outlet end flange 22 of the circulating pump 2 is connected to the bottom wall of the working liquid tank 1 through the second tube body 24. The fluid medium of the mixed abrasive medium in the working liquid tank 1 is sucked into the circulating pump 2 by the first tube body 23 and then returned to the working liquid tank 1 through the second tube body 24; the working liquid tank 1 is connected to the main line 3, and the main line 3 is connected to the fluid pump 31. The bottom end and the top end of the main line 31 are respectively connected to the working liquid tank 1 and the polishing chamber 5. After the fluid medium of the mixed abrasive medium in the working liquid tank 1 enters the main line 3, it is sucked into the polishing chamber 5 by the fluid pump 31.

[0028] Ginseng Figures 1 to 4 As shown, the circulation pump 2 is optionally configured as a sewage pump, and the first tube body 23 includes a suction pipe 231, a connecting pipe 232 and a first flange pipe 233. The suction pipe 231 is arranged in the working liquid tank 1 and a liquid inlet (not marked) is formed at the top. One end of the connecting pipe 232 is connected to the suction pipe 231, and the other end passes through the side wall of the working liquid tank 1 and is integrally formed with a first flange 2321. The two ends of the first flange pipe 233 are integrally formed with a second flange 2331 and a third flange 2332. The second flange 2331 is docked with the first flange 2321, and the third flange 2332 is docked with the liquid inlet end flange 21 of the sewage pump (i.e., the aforementioned circulation pump 2). The second tube body 24 includes a liquid outlet pipe 241 and a second flange pipe 242. The top end of the liquid outlet pipe 241 is located in the working liquid tank 1 and forms a liquid outlet (not marked). The bottom end of the liquid outlet pipe 241 passes through the bottom wall of the working liquid tank 1 and forms a fourth flange 2411. The second flange pipe 242 has an integrally formed fifth flange 2421 and a sixth flange 2422. The fifth flange 2421 is connected to the fourth flange 2411, and the sixth flange 2422 is connected to the liquid outlet end flange 22 of the sewage pump 21.

[0029] In this embodiment, the purpose of effectively extracting the mixture of the abrasive medium and the fluid medium is achieved by configuring the circulation pump 2 as a sewage pump. The sewage pump is a pump body used for sewage discharge, that is, it is suitable for sewage containing a large amount of impurities. The abrasive medium and the fluid medium can be roughly regarded as liquids containing a large amount of impurities. Therefore, the sewage pump used for sewage discharge can be used as the circulation pump 2 in this embodiment. While achieving the purpose of circulating and stirring the mixture of the abrasive medium and the fluid medium, it is also not easily blocked by the abrasive medium, ensuring the smooth circulation and stirring of the mixture of the abrasive medium and the fluid medium. In addition, the suction pipe 231 is distributed vertically within the working liquid tank 1. The connecting pipe 232 connected to the bottom end of the suction pipe 231 passes through the side wall of the working liquid tank 1, and its integrally formed first flange 2321 is connected to the second flange 2331 of the first flange pipe 233. The third flange 2332 of the other end of the first flange pipe 233 is connected to the liquid inlet flange 21 of the sewage pump. The liquid outlet flange 22 of the sewage pump is connected to the sixth flange 2422 of the second flange pipe 242, and the fifth flange 2421 of the second flange pipe 242 is connected to the fourth flange 2411 of the liquid outlet pipe 241. The other end of the liquid outlet pipe 241 passes through the bottom wall of the working liquid tank 1. The mixture of the abrasive medium and the fluid medium is sucked out from the higher liquid level in the working liquid tank 1 and then returned by the bottom wall of the working liquid tank 1, so that the mixing of the fluid medium and the abrasive medium (hereinafter referred to as the fluid mixture) in the entire circulation process is more uniform, thereby achieving a better stirring effect.

[0030] Ginseng Figure 1 、 Figure 3 and Figure 4 As shown, the fluid pump 31 is optionally a diaphragm pump, and the main line 3 includes a first connecting pipe 32 and a second connecting pipe 33. The bottom end of the first connecting pipe 32 is connected to the side wall of the working fluid tank 1 near the bottom wall. The top end of the first connecting pipe 32 is connected to the liquid inlet flange 311 of the diaphragm pump (i.e., the aforementioned fluid pump 31). The liquid outlet flange 312 of the diaphragm pump is located directly above the liquid inlet flange 311 and is connected to the pulse dampener 34. One end of the second connecting pipe 33 is connected to the pulse dampener 34, and the other end extends into the polishing chamber 4 and is connected to the pressure transmitter 35. The second connecting pipe 33 has a first branch 36, which is connected to the safety valve 361. The safety valve 36 is connected to the top wall of the working fluid tank 1 through a connecting pipe. The side wall of the working fluid tank 1 is connected to the liquid level transmitter 14.

[0031] While the abrasive medium and fluid medium mixture in the working fluid tank 1 is stirred by the circulating pump 2 configured as a sewage pump, the fluid pump 31 configured as a diaphragm pump is started to pump the fluid medium and abrasive medium mixture in the working fluid tank 1 into the polishing chamber 5. The fluid medium and abrasive medium mixture is pumped into the polishing chamber 4 from bottom to top through the first connecting pipe 32, the pulse damper 34, and the second connecting pipe 33. The pressure transmitter 35 connected to the second connecting pipe 33 is used to indicate the pressure of the fluid mixture in the second connecting pipe 33 and is used to buffer the vibration generated by the diaphragm pump through the pulse damper 34. When the liquid level transmitter 14 measures that the liquid level in the working fluid tank 1 is higher than the limit liquid level, the safety valve 361 opens, and the fluid mixture flows through the connecting pipe 362 and the first branch 36 into the second connecting pipe 33 and ultimately into the polishing chamber 5.

[0032] Ginseng Figure 1 and Figure 2 As shown, the liquid abrasive flow system further includes a support 4, which includes a base plate 41 and multiple supports 42. The bottom ends of the supports 42 are perpendicularly fixed to the upper surface of the base plate 41. The multiple supports 42 are respectively attached to and fixed to the outer wall of the working fluid tank 1. The side wall of the working fluid tank 1 defines a first observation window 11 and a second observation window 12. The line connecting the centers of the first observation window 11 and the second observation window 12 is parallel to the axis of the working fluid tank 1. A flushing port 13 is defined between the first observation window 11 and the second observation window 12. A liquid inlet pipe 15 is provided through the side wall of the working fluid tank 1. The end of the liquid inlet pipe 15 located within the working fluid tank 1 extends downwardly parallel to the height of the working fluid tank 1 and forms an opening (not labeled). A first control valve 151 is provided at the end of the liquid inlet pipe 15 located outside the working fluid tank 1. The bottom wall of the working fluid tank 1 is connected to a drain pipe 16, which is equipped with a second control valve 161. A discharge port 17 is defined at the top of the working fluid tank 1, and a cover plate 18 is provided at the discharge port 17.

[0033] The side wall of the working liquid tank 1 is provided with a first observation window 11 and a second observation window 12 so as to observe the state of the fluid mixture in the working liquid tank 1, and a flushing port 13 provided between the first observation window 11 and the second observation window 12 is provided to facilitate flushing of the working liquid tank 1 when there is no stirring task. The waste liquid generated after flushing is discharged from the working liquid tank 1 through the drain pipe 16 by opening the second control valve 161. When the working liquid tank 1 is in operation, the abrasive medium is fed into the working liquid tank 1 through the discharge port 17 provided at the top of the working liquid tank 1, and then the cover plate 18 is snapped onto the discharge port 17 again, and the first control valve 151 is opened to allow the fluid medium to pass into the working liquid tank 1 through the liquid inlet pipe 16, and then the fluid medium and the abrasive medium are mixed by the aforementioned circulation pump 2.

[0034] The series of detailed descriptions listed above are only specific descriptions of feasible implementation methods of the present invention. They are not intended to limit the scope of protection of the present invention. Any equivalent implementation methods or changes that do not deviate from the technical spirit of the present invention should be included in the scope of protection of the present invention.

[0035] In addition, it should be understood that although this specification is described in terms of implementation methods, not every implementation method contains only one independent technical solution. This narrative method of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment can also be appropriately combined to form other implementation methods that can be understood by those skilled in the art.

Claims

1. A liquid abrasive flow system, characterized in that: include: A working liquid tank and a circulating pump, wherein the liquid inlet flange of the circulating pump is connected to the side wall of the working liquid tank through a first pipe body, and the liquid outlet flange of the circulating pump is connected to the bottom wall of the working liquid tank through a second pipe body. The fluid medium mixed with the abrasive medium in the working liquid tank is sucked into the circulating pump through the first pipe body and then returned to the working liquid tank through the second pipe body. The working fluid tank is connected to the main line, the main line is connected to the fluid pump, the bottom end and the top end of the main line are respectively connected to the working fluid tank and the polishing chamber, and the fluid medium mixed with the abrasive medium in the working fluid tank enters the main line and is sucked into the polishing chamber by the fluid pump.

2. The liquid abrasive flow system according to claim 1, characterized in that: The circulating pump is optionally a sewage pump, and the first pipe body includes a suction pipe, a connecting pipe and a first flange pipe. The suction pipe is arranged in the working liquid tank and a liquid inlet is formed at the top. One end of the connecting pipe is connected to the suction pipe, and the other end passes through the side wall of the working liquid tank and is integrally formed with a first flange. The two ends of the first flange pipe are integrally formed with a second flange and a third flange. The second flange is connected to the first flange, and the third flange is connected to the liquid inlet end flange of the sewage pump.

3. The liquid abrasive flow system according to claim 2, characterized in that: The second tube body includes a liquid outlet pipe and a second flange pipe. The top end of the liquid outlet pipe is located in the working liquid tank and forms a liquid outlet. The bottom end of the liquid outlet pipe passes through the bottom wall of the working liquid tank and forms a fourth flange. The second flange pipe has an integrally formed fifth flange and sixth flange. The fifth flange is connected to the fourth flange, and the sixth flange is connected to the liquid outlet end flange of the sewage pump.

4. The liquid abrasive flow system according to claim 1, characterized in that: The fluid pump is optionally a diaphragm pump, and the main line includes a first connecting pipe and a second connecting pipe. The bottom end of the first connecting pipe is connected to the side wall of the working liquid tank near the bottom wall, and the top end of the first connecting pipe is connected to the liquid inlet flange of the diaphragm pump. The liquid outlet flange of the diaphragm pump is located directly above the liquid inlet flange and is connected to the pulse damper. One end of the second connecting pipe is connected to the pulse damper, and the other end extends into the polishing chamber.

5. The liquid abrasive flow system according to claim 4, characterized in that: The second connecting pipe extends into the polishing chamber and is connected to a pressure transmitter at one end. The second connecting pipe has a first branch connected to a safety valve. The safety valve is connected to the top wall of the working fluid tank through a connecting pipe.

6. The liquid abrasive flow system according to claim 5, characterized in that: The side wall of the working fluid tank is provided with a first observation window and a second observation window, a line connecting the centers of the first observation window and the second observation window is parallel to the axial direction of the working fluid tank, and a flushing port is provided between the first observation window and the second observation window.

7. The liquid abrasive flow system according to claim 1, characterized in that: The side wall of the working liquid tank is connected to the liquid level transmitter.

8. The liquid abrasive flow system according to claim 7, characterized in that: A liquid inlet pipe is provided through the side wall of the working liquid tank. One end of the liquid inlet pipe located inside the working liquid tank extends downward in a direction parallel to the height of the working liquid tank and forms an opening. A first control valve is provided at one end of the liquid inlet pipe located outside the working liquid tank.

9. The liquid abrasive flow system according to claim 8, characterized in that: The bottom wall of the working fluid tank is connected to a drain pipe, the drain pipe is provided with a second control valve, the top of the working fluid tank is provided with a discharge port, and a cover plate is provided at the discharge port.

10. The liquid abrasive flow system according to claim 1, wherein: Also includes: The bracket includes a base plate and a plurality of pillars, the bottom ends of the pillars are vertically fixed to the upper surface of the base plate, and the plurality of pillars are respectively attached to and fixed to the outer wall of the working fluid tank.

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