CVD (Chemical Vapor Deposition) furnace device

Abstract

The utility model discloses a CVD (Chemical Vapor Deposition) furnace device, which relates to the technical field of steel cylinder inner surface coatings and comprises a reaction chamber and a soaking component, a radio frequency power supply is arranged at the lower end of the reaction chamber, and the soaking component used for uniformly heating a steel cylinder to facilitate deposition is arranged in the reaction chamber. And the soaking assembly comprises a rotating disc, limiting frames, mounting grooves, heating wires, a supporting frame and an electric push rod, the limiting frames are arranged on the two sides of the upper portion of the rotating disc, and the mounting grooves are formed in the surfaces of the limiting frames. According to the CVD deposition furnace device, the rotating disc is used for supporting the bottom of a steel cylinder, meanwhile, the steel cylinder is driven by the motor to transport and rotate, heating wires on the inner surface of the steel cylinder are evenly heated under heating, follow-up deposition treatment is facilitated, the limiting frame plays a role in auxiliary limiting on the side edge of a cylinder body of the steel cylinder, the steel cylinder is prevented from toppling over, and the service life of the steel cylinder is prolonged. The mounting groove provides a mounting space for the heating wire, and the heating wire heats the steel cylinder, so that the inner wall of the steel cylinder is subjected to deposition reaction better to form a film.

Description

Technical Field

[0001] The utility model relates to the technical field of steel cylinder inner surface coating, in particular to a CVD deposition furnace device. Background Art

[0002] Chemical vapor deposition (CVD) is a technology widely used in materials science, semiconductor manufacturing and microelectronics industries. This technology deposits a thin film on a solid substrate through the chemical reaction of gaseous substances, thereby modifying, functionalizing or protecting the material.

[0003] However, when the existing CVD deposition furnace device processes the interior of the cylinder, it is inconvenient to uniformly heat the inner wall of the cylinder to enable it to react and form a film better, resulting in poor film formation effect and affecting the subsequent use of the cylinder.

[0004] Therefore, in view of this, research and improvement are conducted on the existing structure and defects, and a CVD deposition furnace device is provided. Utility Model Content

[0005] The purpose of the present invention is to provide a CVD deposition furnace device to solve the problems raised in the above background technology.

[0006] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a CVD deposition furnace device, comprising a reaction chamber and a heat spreader assembly, wherein a radio frequency power supply is provided at the lower end of the reaction chamber, and the heat spreader assembly for uniformly heating the cylinder for deposition is arranged inside the reaction chamber, and the heat spreader assembly comprises a rotating disk, a limit frame, an installation groove, a heating wire, a support frame and an electric push rod, limit frames are provided on both sides above the rotating disk, and an installation groove is provided on the surface of the limit frame, a heating wire is provided inside the installation groove, a support frame is provided on the outside of the limit frame, and an electric push rod is installed on the side of the support frame.

[0007] Furthermore, the limiting frames and the electric push rods are symmetrically arranged in two groups about the vertical center axis of the reaction chamber, and the limiting frames are arc-shaped.

[0008] Furthermore, the limiting frame and the mounting groove are an integrated structure, and the dimensions of the mounting groove and the heating wire are consistent.

[0009] Furthermore, a box cover is provided on the top of the reaction chamber, and an air inlet is opened on the surface of the box cover.

[0010] Furthermore, an air intake pipe is connected to the rear side of the air intake port, and a gas generator is connected to the end of the air intake pipe.

[0011] Furthermore, the lower surface of the reaction chamber is connected to an exhaust pipe, and the end of the exhaust pipe is provided with an auxiliary component for exhaust gas treatment.

[0012] Furthermore, the auxiliary component includes an auxiliary box, a filter plate and a mesh filter plate, and the filter plate is provided inside the auxiliary box, and the mesh filter plate is installed on the end side of the auxiliary box.

[0013] Furthermore, the auxiliary box is communicated with the interior of the exhaust pipe, and the filter plate is snap-connected with the auxiliary box.

[0014] The utility model provides a CVD deposition furnace device, which has the following beneficial effects:

[0015] 1. The utility model uses a rotating disk to support the bottom of the steel cylinder and drives the steel cylinder to rotate when transported by a motor, so that the inner surface of the steel cylinder is evenly heated by the heating wire for subsequent deposition processing. The limit frame plays an auxiliary limiting role on the side of the steel cylinder body to prevent the steel cylinder from tipping over. The installation groove provides an installation space for the heating wire. The heating wire heats the steel cylinder, so that the inner wall of the steel cylinder can better undergo deposition reaction and film formation.

[0016] 2. The utility model is used to take out the cylinder by rotating the box cover. The air inlet pipe and the exhaust pipe form a flowing gas inside the reaction chamber. The waste gas after the reaction is discharged through the exhaust pipe. The filter plate and the mesh filter plate made of activated carbon are installed inside the auxiliary box to treat the waste gas and prevent the waste gas from being directly discharged into the air. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 This is a schematic diagram of the overall front structure of a CVD deposition furnace device of the present invention;

[0018] Figure 2 This is a schematic diagram of the structure of a soaking assembly of a CVD deposition furnace device of the present invention;

[0019] Figure 3 This is a schematic diagram of the overall rear view structure of a CVD deposition furnace device of the present invention.

[0020] In the figure: 1. Reaction chamber; 2. RF power supply; 3. Heat soaking assembly; 301. Rotating disk; 302. Limiting frame; 303. Mounting slot; 304. Heating wire; 305. Support frame; 306. Electric push rod; 4. Box cover; 5. Air inlet; 6. Air inlet pipe; 7. Exhaust pipe; 8. Gas generator; 9. Auxiliary assembly; 901. Auxiliary box; 902. Filter plate; 903. Mesh filter plate. DETAILED DESCRIPTION

[0021] The following embodiments of the present invention are described in further detail with reference to the accompanying drawings and examples. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0022] like Figure 1As shown, a CVD deposition furnace device includes a reaction chamber 1 and a heat soaking assembly 3. A radio frequency power supply 2 is provided at the lower end of the reaction chamber 1, and a box cover 4 is provided on the top of the reaction chamber 1. The box cover 4 is rotated to open and close for taking out a cylinder, and an air inlet 5 is provided on the surface of the box cover 4. The rear side of the air inlet 5 is connected to an air inlet pipe 6. The air inlet pipe 6 and the exhaust pipe 7 form a flowing gas inside the reaction chamber 1, and the waste gas after the reaction is discharged through the exhaust pipe 7. The end of the air inlet pipe 6 is connected to a gas generator 8.

[0023] like Figure 2 As shown, a heat-saturating assembly 3 for uniformly heating the cylinder for deposition is arranged inside the reaction chamber 1, and the heat-saturating assembly 3 includes a rotating disk 301, a limiting frame 302, a mounting groove 303, a heating wire 304, a support frame 305 and an electric push rod 306. Limiting frames 302 are arranged on both sides above the rotating disk 301. The rotating disk 301 is used to support the bottom of the cylinder and drives the cylinder to be transported and rotated under the drive of the motor, so that the inner surface of the cylinder is heated evenly under the heating of the heating wire 304 for subsequent deposition processing. The limiting frames 302 and the electric push rod 306 are symmetrically arranged in two groups about the vertical central axis of the reaction chamber 1, and the limiting frames 302 are arc-shaped. The limiting frames 302 are provided on the side of the cylinder body. To assist in limiting the position, the mounting groove 303 provides an installation space for the heating wire 304 to prevent the cylinder from tipping over, and the mounting groove 303 is provided on the surface of the limiting frame 302. The limiting frame 302 and the mounting groove 303 are an integrated structure, and the mounting groove 303 and the heating wire 304 are consistent in size. The interior of the mounting groove 303 is provided with a heating wire 304, which heats the cylinder so that the inner wall thereof can better undergo a deposition reaction and form a film. A support frame 305 is provided on the outer side of the limiting frame 302, and an electric push rod 306 is installed on the side of the support frame 305. The electric push rod 306 controls the movement and adjustment of the limiting frame 302 by telescoping, so that the limiting frame 302 can limit cylinders of different sizes.

[0024] like Figure 3 As shown, the lower surface of the reaction chamber 1 is connected to the exhaust pipe 7, and the end of the exhaust pipe 7 is provided with an auxiliary component 9 for exhaust gas treatment, the auxiliary component 9 includes an auxiliary box 901, a filter plate 902 and a mesh filter plate 903, and the interior of the auxiliary box 901 is provided with a filter plate 902, and the auxiliary box 901 is installed with an activated carbon filter plate 902 and a mesh filter plate 903 to treat the exhaust gas to prevent the exhaust gas from being directly discharged into the air. The end side of the auxiliary box 901 is installed with a mesh filter plate 903, the auxiliary box 901 and the interior of the exhaust pipe 7 are communicated, and the filter plate 902 and the auxiliary box 901 are snap-connected.

[0025] In summary, the CVD deposition furnace device is first based on Figure 1-Figure 3, the structure shown in , the cylinder with a clean inner wall is placed on the rotating disk 301 inside the reaction chamber 1 and the bolts are used to make the cylinder and the rotating disk 301 rotate together, and then the electric push rod 306 is controlled to extend and retract to drive the limit frame 302 to move to the side of the cylinder, so that the surface of the limit frame 302 contacts the surface of the cylinder but does not squeeze it to prevent it from tipping over, and then the box cover 4 is closed, and the heating wire 304 is turned on to heat it to heat the cylinder, and at the same time, the rotating disk 301 is used to support the bottom of the cylinder and drives the cylinder to be transported and rotated under the drive of the motor, so that the inner surface of the cylinder is heated evenly under the heating of the heating wire 304 for subsequent deposition treatment, and then the gas generator 8 is turned on to make the air inlet pipe 6 and the exhaust pipe 7 so that a flowing reaction gas is formed inside the reaction chamber 1, and the RF power supply 2 is turned on at the same time. Under the conditions of heating and ventilation, the reactants undergo a chemical reaction on the inner surface of the cylinder, gradually deposited into a film, and the deposition reaction is completed. When the interior of the reaction chamber 1 cools down, the cylinder is taken out.

[0026] The embodiments of the present invention are provided for purposes of illustration and description and are not intended to be exhaustive or to limit the present invention to the disclosed forms. Many modifications and variations will be apparent to those skilled in the art. The embodiments are selected and described to better illustrate the principles and practical applications of the present invention and to enable those skilled in the art to understand the present invention and design various embodiments with various modifications suitable for specific applications.

Claims

1. A CVD deposition furnace device, comprising a reaction chamber (1) and a heat soaking assembly (3), characterized in that: A radio frequency power supply (2) is provided at the lower end of the reaction chamber (1); a heat-saturating assembly (3) for uniformly heating the cylinder for deposition is provided inside the reaction chamber (1); and the heat-saturating assembly (3) comprises a rotating disk (301), a limiting frame (302), an installation groove (303), a heating wire (304), a support frame (305) and an electric push rod (306); limiting frames (302) are provided on both sides above the rotating disk (301); an installation groove (303) is provided on the surface of the limiting frame (302); a heating wire (304) is provided inside the installation groove (303); a support frame (305) is provided on the outside of the limiting frame (302); and an electric push rod (306) is installed on the side of the support frame (305).

2. The CVD deposition furnace device according to claim 1, characterized in that: The limiting frames (302) and the electric push rods (306) are symmetrically arranged in two groups about the vertical center axis of the reaction chamber (1), and the limiting frames (302) are arc-shaped.

3. The CVD deposition furnace device according to claim 1, characterized in that: The limiting frame (302) and the installation groove (303) are an integrated structure, and the sizes of the installation groove (303) and the heating wire (304) are consistent.

4. The CVD deposition furnace device according to claim 1, characterized in that: A box cover (4) is provided on the top of the reaction chamber (1), and an air inlet (5) is provided on the surface of the box cover (4).

5. The CVD deposition furnace device according to claim 4, characterized in that: The rear side of the air inlet (5) is connected to an air inlet pipe (6), and the end of the air inlet pipe (6) is connected to a gas generator (8).

6. The CVD deposition furnace device according to claim 1, characterized in that: The lower surface of the reaction chamber (1) is connected to an exhaust pipe (7), and an auxiliary component (9) for exhaust gas treatment is provided at the end of the exhaust pipe (7).

7. The CVD deposition furnace device according to claim 6, characterized in that: The auxiliary assembly (9) comprises an auxiliary box (901), a filter plate (902) and a mesh filter plate (903), wherein the filter plate (902) is provided inside the auxiliary box (901), and the mesh filter plate (903) is installed on the end side of the auxiliary box (901).

8. The CVD deposition furnace device according to claim 7, characterized in that: The auxiliary box (901) and the exhaust pipe (7) are internally communicated, and the filter plate (902) and the auxiliary box (901) are snap-fitted and connected.

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