Quick exhaust structure of electrostatic chuck
By setting up a vacuum generator, suction pipe, exhaust pipe, silencer cylinder and silence network, the problem of eliminating residual gas in the rapid exhaust structure of the electrostatic suction cup is solved, and the rapid adsorption and disengagement of the disc on the electrostatic suction cup is achieved, reducing exhaust noise, improving production efficiency and reducing costs.
Patent Information
- Application Number
- CN202422334491.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-25
- Publication Date
- 2025-08-19
- Estimated Expiration
- 2034-09-25
AI Technical Summary
The existing electrostatic suction cup rapid exhaust structure has problems such as long time to eliminate residual inert gas, high production costs and high exhaust noise.
By setting up a vacuum generator, suction pipe, exhaust pipe, silencer cylinder and silence network, the connection of the electrostatic suction cup gas is realized, and a silencer device is installed in the connecting pipe to reduce exhaust noise.
The rapid adsorption and disengagement of the disc on the electrostatic suction cup is achieved, which reduces exhaust noise, improves production efficiency and reduces costs.
Smart Images

Figure CN223241865U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of electrostatic chuck rapid exhaust, in particular to an electrostatic chuck rapid exhaust structure. Background Art
[0002] When an electrostatic chuck is brought close to another object without static electricity, due to electrostatic induction, the side of the object without static electricity close to the static object will accumulate charges of opposite polarity to the charges carried by the charged object. Since opposite charges attract each other, the "electrostatic adsorption" phenomenon will occur. The existing electrostatic chuck rapid exhaust structure needs to remove the inert gas in the connecting pipe to achieve pressure balance between the top and bottom sides of the wafer in the vacuum chamber. However, it takes a long time to remove the residual inert gas, resulting in increased time efficiency and production costs. During use, there is also the problem of excessive exhaust noise affecting the use environment. Utility Model Content
[0003] The purpose of the present utility model is to solve at least one of the technical problems existing in the prior art and provide a structure for rapid exhaust of an electrostatic chuck. By providing a vacuum generator, an air suction pipe, and an exhaust pipe, the gas of the electrostatic chuck is connected and the adsorption of the wafer on the electrostatic chuck is achieved. By providing a silencer and a silencer net in the connecting pipe, the noise generated by the exhaust is reduced.
[0004] The present invention also provides the above-mentioned electrostatic suction cup rapid exhaust structure, including: a reaction chamber, a cavity is provided inside the reaction chamber, an electrostatic suction cup is provided inside the cavity, an air suction hole is provided inside the electrostatic suction cup, an air suction pipe is provided inside the air suction hole, a vacuum generator is fixedly connected to the lower surface of the air suction pipe, an exhaust hole is provided inside the vacuum generator, an exhaust pipe is provided inside the exhaust hole, an end of the exhaust pipe away from the vacuum generator is fixedly connected to a connecting pipe, an exhaust device is fixedly connected to the upper surface of the connecting pipe, a silencer is fixedly connected to the lower surface of the exhaust device, a silencer is fixedly connected to the lower surface of the silencer, and a silencer is fixedly connected to the lower surface of the silencer. Through the above devices, the gas of the electrostatic suction cup is connected, the adsorption of the wafer on the electrostatic suction cup is achieved, and the noise generated by exhaust is reduced.
[0005] According to the electrostatic suction cup rapid exhaust structure described in the utility model, a sealing cover is fixedly connected to the upper surface of the reaction chamber, and a threaded sleeve is provided at the portion where the sealing cover is fixedly connected to the reaction chamber. Through the above device, a tight connection between the reaction chamber and the sealing cover is achieved, thereby realizing a sealed space inside the reaction chamber.
[0006] According to the electrostatic suction cup quick exhaust structure described in the utility model, an air inlet hole is provided inside the vacuum generator, and an air inlet pipe is provided inside the air inlet hole. Through the above devices, gas flow is achieved.
[0007] According to the electrostatic suction cup quick exhaust structure described in the utility model, a silencer hole is provided inside the silencer, and the silencer is inside the connecting pipe. Through the above device, the effect of silencing excessive noise caused by exhaust is achieved.
[0008] According to the electrostatic suction cup rapid exhaust structure described in the utility model, a vent hole is provided inside the reaction chamber, and a ventilation pipe is provided inside the vent hole. Through the above device, a ventilation effect inside the reaction chamber is achieved.
[0009] According to the electrostatic suction cup quick exhaust structure described in the utility model, the end of the air inlet pipe away from the vacuum generator is fixedly connected to a gas supply pump, and the lower surface of the ventilation pipe is fixedly connected to a vacuum pump. Through the above device, the vacuum pump can evacuate the inside of the reaction chamber through the ventilation pipe.
[0010] According to the electrostatic suction cup rapid exhaust structure described in the utility model, the vacuum generator, gas supply pump, exhaust pump, and vacuum exhauster are fixedly connected to the lower surface with a support plate, and the lower surface of the support plate is fixedly connected to a support column. Through the above devices, the support effect of the entire structure is achieved.
[0011] According to the electrostatic suction cup quick exhaust structure described in the utility model, the exhaust device is an exhaust pump, and the lower surface of the exhaust pump is fixedly connected to the silencer net. Through the above device, the exhaust pump can discharge the gas in the suction pipe.
[0012] Beneficial effects
[0013] 1. Compared with the existing technology, the electrostatic chuck rapid exhaust structure realizes the connection of the electrostatic chuck gas by setting a vacuum generator, an air suction pipe, and an exhaust pipe, thereby realizing the adsorption of the wafer on the electrostatic chuck. By setting a silencer and a silencer net in the connecting pipe, the noise generated by the exhaust is reduced. BRIEF DESCRIPTION OF THE DRAWINGS
[0014] The present invention will be further described below with reference to the accompanying drawings and embodiments;
[0015] Figure 1 This is the main structure diagram of the electrostatic chuck quick exhaust structure of the utility model;
[0016] Figure 2 This is a bottom view of the structure of the electrostatic chuck quick exhaust structure of the utility model;
[0017] Figure 3 This is a right side structural diagram of the electrostatic chuck quick exhaust structure of the utility model;
[0018] Figure 4 This is a right-side cross-sectional structural diagram of the electrostatic chuck quick exhaust structure of the utility model;
[0019] Figure 5 The utility model is an electrostatic chuck quick exhaust structure Figure 4 Enlarged structural diagram at point B.
[0020] Legend:
[0021] 1. Support plate; 2. Reaction chamber; 3. Cavity; 4. Sealing cover; 5. Threaded sleeve; 6. Electrostatic suction cup; 7. Suction hole; 8. Suction pipe; 9. Vacuum generator; 10. Air inlet; 11. Air inlet pipe; 12. Gas supply pump; 13. Exhaust hole; 14. Exhaust pipe; 15. Connecting pipe; 16. Silencer; 17. Silencer hole; 18. Silencer net; 19. Exhaust pump; 20. Vent pipe; 21. Vacuum pump; 22. Vent hole; 23. Support column. DETAILED DESCRIPTION
[0022] This section will describe in detail the specific embodiments of the present invention. The preferred embodiments of the present invention are shown in the accompanying drawings. The purpose of the accompanying drawings is to supplement the description of the text part of the specification with graphics, so that people can intuitively and vividly understand each technical feature and overall technical solution of the present invention, but it cannot be understood as a limitation on the scope of protection of the present invention.
[0023] Reference Figure 1-5 The embodiment of the utility model is an electrostatic chuck rapid exhaust structure, which includes: a reaction chamber 2, the interior of the reaction chamber 2 is set to be vacuum, a cavity 3 is provided inside the reaction chamber 2, an electrostatic chuck 6 is provided inside the cavity 3, the electrostatic chuck 6 uses static electricity to adsorb and fix the adsorbed object, an air suction hole 7 is provided inside the electrostatic chuck 6, an air suction pipe 8 is provided inside the air suction hole 7, gas flows through the air suction pipe 8 to make the electrostatic chuck 6 adsorb the wafer, a vacuum generator 9 is fixedly connected to the lower surface of the air suction pipe 8, the vacuum generator 9 compresses the gas so that the gas can flow in the air suction pipe 8, and an exhaust hole 1 is provided inside the vacuum generator 9. 3. An exhaust pipe 14 is provided inside the exhaust hole 13. The exhaust pipe 14 discharges gas to release the electrostatic chuck 6 from the wafer being held and fixed. The end of the exhaust pipe 14 away from the vacuum generator 9 is fixedly connected to a connecting pipe 15. The connecting pipe 15 connects the exhaust pipe 14 and the exhaust device. The upper surface of the connecting pipe 15 is fixedly connected to the exhaust device. The exhaust device discharges the gas in the suction pipe 8. The lower surface of the exhaust device is fixedly connected to a silencer net 18. The silencer net 18 can effectively absorb the noise generated by the exhaust. The lower surface of the silencer net 18 is fixedly connected to a muffler 16. The muffler 16 effectively reduces the sound generated by the exhaust.
[0024] A sealing cover 4 is fixedly connected to the upper surface of the reaction chamber 2. The sealing cover 4 forms a sealed environment inside the reaction chamber 2. The portion where the sealing cover 4 is fixedly connected to the reaction chamber 2 has a threaded sleeve 5. The threaded sleeve 5 realizes a tight connection between the sealing cover 4 and the reaction chamber 2. An air inlet 10 is provided inside the vacuum generator 9. An air inlet pipe 11 is provided inside the air inlet 10. Gas circulates in the air inlet pipe 11 and enters from the air inlet pipe 11. A silencer hole 17 is provided inside the muffler 16. The muffler 16 is inside the connecting pipe 15. The silencer hole 17 reduces the sound generated by exhaust gas inside the connecting pipe 15. An air vent 22 is provided inside the reaction chamber 2. A air vent 20 is provided inside the air vent 22. The air vent 20 is connected to the interior of the reaction chamber 2. The end of the air inlet pipe 11 away from the vacuum generator 9 is fixedly connected to a gas supply pump 12. The gas supply pump 12 supplies gas, allowing the gas to enter through the air inlet pipe 11. The lower surface of the vent pipe 20 is fixedly connected to a vacuum pump 21. The vacuum pump 21 is connected to the vent pipe 20 to evacuate the gas inside the reaction chamber 2 to form a vacuum environment. The vacuum generator 9, gas supply pump 12, exhaust pump 19, and vacuum pump 21 are fixedly connected to the lower surface of the support plate 1. The lower surface of the support plate 1 is fixedly connected to the support column 23. The support plate 1 and support column 23 together provide a support effect for the entire structure. The exhaust device is an exhaust pump 19. The lower surface of the exhaust pump 19 is fixedly connected to the silencer net 18. The exhaust pump 19 quickly exhausts gas, loosening the disc adsorbed on the electrostatic suction cup 6.
[0025] Working principle: When in use, first use the vacuum pump 21 to evacuate the gas inside the reaction chamber 2 through the ventilation pipe 20 to make the cavity 3 a vacuum cavity. The gas supply pump 12 supplies gas, and the gas flows into the vacuum generator 9 through the intake pipe 11. Under the action of the vacuum generator 9, the gas is compressed and enters the suction pipe 8, so that the electrostatic suction cup 6 can adsorb and clamp the fixed wafer. The exhaust pump 19 is started through the exhaust pipe 14. Under the action of the vacuum generator 9, the gas in the suction pipe 8 is quickly discharged, and the wafer on the electrostatic suction cup 6 can be removed. The silencer net 18 inside the connecting pipe 15 connected to the exhaust pipe 14 and the silencer hole 17 on the silencer 16 can jointly achieve the effect of reducing the sound generated during exhaust.
[0026] The embodiments of the present invention are described in detail above with reference to the accompanying drawings. However, the present invention is not limited to the above embodiments. Various changes can be made within the scope of knowledge possessed by ordinary technicians in the relevant technical field without departing from the purpose of the present invention.
Claims
1. An electrostatic chuck rapid exhaust structure, characterized in that: include: A reaction chamber (2), wherein a cavity (3) is provided inside the reaction chamber (2), an electrostatic suction cup (6) is provided inside the cavity (3), an air suction hole (7) is provided inside the electrostatic suction cup (6), an air suction pipe (8) is provided inside the air suction hole (7), a vacuum generator (9) is fixedly connected to the lower surface of the air suction pipe (8), an exhaust hole (13) is provided inside the vacuum generator (9), an exhaust pipe (14) is provided inside the exhaust hole (13), an end of the exhaust pipe (14) away from the vacuum generator (9) is fixedly connected to a connecting pipe (15), an exhaust device is fixedly connected to the upper surface of the connecting pipe (15), a silencer net (18) is fixedly connected to the lower surface of the exhaust device, and a silencer cylinder (16) is fixedly connected to the lower surface of the silencer net (18).
2. The electrostatic chuck rapid exhaust structure according to claim 1, characterized in that: A sealing cover (4) is fixedly connected to the upper surface of the reaction chamber (2), and a threaded sleeve (5) is provided at the portion where the sealing cover (4) is fixedly connected to the reaction chamber (2).
3. The electrostatic chuck rapid exhaust structure according to claim 1, characterized in that: An air inlet hole (10) is provided inside the vacuum generator (9), and an air inlet pipe (11) is provided inside the air inlet hole (10).
4. The electrostatic chuck rapid exhaust structure according to claim 1, characterized in that: A silencer hole (17) is provided inside the silencer tube (16), and the silencer tube (16) is inside the connecting pipe (15).
5. The electrostatic chuck rapid exhaust structure according to claim 3, characterized in that: A vent hole (22) is provided inside the reaction chamber (2), and a vent pipe (20) is provided inside the vent hole (22).
6. The electrostatic chuck rapid exhaust structure according to claim 5, characterized in that: The end of the air inlet pipe (11) away from the vacuum generator (9) is fixedly connected to a gas supply pump (12), and the lower surface of the vent pipe (20) is fixedly connected to a vacuum pump (21).
7. The electrostatic chuck rapid exhaust structure according to claim 1, characterized in that: The lower surfaces of the vacuum generator (9), the gas supply pump (12), the exhaust pump (19), and the vacuum pump (21) are fixedly connected to a support plate (1), and the lower surface of the support plate (1) is fixedly connected to a support column (23).
8. The electrostatic chuck rapid exhaust structure according to claim 1, characterized in that: The exhaust device is an exhaust pump (19), and the lower surface of the exhaust pump (19) is fixedly connected to the silencer net (18).