High-precision and high-efficiency double-station magnetorheological polishing machine

Abstract

The utility model discloses a high-precision and high-efficiency double-station magneto-rheological polishing machine, which particularly relates to the technical field of magneto-rheological polishing and comprises a base station, a rack is arranged at the top of the base station, and two X-axis, Y-axis and Z-axis movement systems used for controlling the movement track of a polishing head and adjusting the polishing gap between the polishing head and a product are arranged in the rack. A plane polishing head system used for machining plane type products and a curved surface polishing head system used for machining curved surface type products are installed on the two X-axis, Y-axis and Z-axis movement systems correspondingly, and product clamping movement systems used for fixing and rotating the products are arranged at the positions, located at the bottoms of the plane polishing head system and the curved surface polishing head system, in the rack correspondingly. Compared with the prior art, the polishing device can polish different types of products, the use range is widened, the products can be quickly adsorbed and polished conveniently, meanwhile, the gap between the polishing head and the products can be monitored in real time, and the final machining quality of the products is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of magnetorheological polishing machines, and more specifically, to a high-precision and high-efficiency double-station magnetorheological polishing machine. Background Art

[0002] As modern manufacturing continues to increase its requirements for part surface accuracy and quality, traditional polishing methods have become difficult to meet production needs, especially in the fields of aerospace, optical instruments, semiconductor manufacturing, etc., which require extremely high surface finish and geometric accuracy of parts. Therefore, it is particularly important to develop a new polishing technology that can achieve high-precision and high-efficiency polishing.

[0003] As an emerging precision polishing method, magnetorheological polishing technology has attracted widespread attention for its unique advantages. This technology utilizes the rapid change of magnetorheological fluid in a magnetic field to form a micro-grinding head to polish the workpiece. It can achieve nano-scale material removal without causing stress damage, making it suitable for ultra-precision machining of hard and brittle materials.

[0004] However, the existing magnetorheological polishing equipment still has the following defects:

[0005] 1. Most of them are single-station designs and have deficiencies in polishing efficiency, precision control, and process adaptability. They cannot meet the efficient processing needs of large quantities of diversified parts. For parts of different shapes, such as flat and curved surfaces, existing polishing equipment often requires the replacement of different polishing heads or adjustment of complex mechanical structures, which greatly reduces the versatility and production efficiency of the equipment.

[0006] 2. Magnetorheological polishing is an ultra-precision processing technology, which has extremely strict requirements on the control of the position accuracy of the polishing head and the product during the polishing process. The current magnetorheological polishing machine is not equipped with a polishing head position accuracy control system, which has a great impact on improving the processing quality of the product.

[0007] In view of the above situation, the utility model proposes a high-precision and high-efficiency double-station magnetorheological polishing machine. Utility Model Content

[0008] In order to overcome the above-mentioned defects of the prior art, the utility model provides a high-precision and high-efficiency double-station magnetorheological polishing machine to solve the problems raised in the above-mentioned background technology.

[0009] To achieve the above-mentioned objectives, the present invention provides the following technical solutions: a high-precision and high-efficiency double-station magnetorheological polishing machine, comprising a base, a frame is provided on the top of the base, and two XYZ-axis motion systems are provided inside the frame for controlling the motion trajectory of the polishing head and adjusting the polishing gap between the polishing head and the product. The two XYZ-axis motion systems are respectively installed with a flat polishing head system for processing flat products and a curved polishing head system for processing curved products. The bottom of the flat polishing head system and the curved polishing head system are both provided with a product clamping motion system for fixing and rotating the product inside the frame. A polishing head position accuracy control system for monitoring and feedback of the position of the polishing head and the product is also installed on the XYZ-axis motion system. A magnetorheological fluid supply system for supplying fluid to the polishing head position of the magnetorheological polishing machine is installed inside the base.

[0010] In order to realize XYZ-axis movement of the polishing head and improve the polishing quality, preferably, the XYZ-axis motion system includes an X-axis moving device, a Y-axis moving device and a Z-axis moving device, wherein the X-axis moving device is arranged at the bottom of the Y-axis moving device, and the Z-axis moving device is arranged on one side of the Y-axis moving device.

[0011] In order to polish flat products, preferably, the flat polishing head system includes a mounting frame, a polishing disc and a central shaft, wherein the mounting frame is mounted on a Z-axis moving device belonging to one of the XYZ-axis motion systems, the polishing disc is mounted on the mounting frame, and the central shaft is mounted on the polishing disc, and a through hole is opened on the central shaft for the flow of magnetorheological fluid.

[0012] In order to polish curved products, preferably, the curved surface polishing head system includes a rotating platform, a ball polishing head and a side liquid supply pipe, wherein the rotating platform is installed on a Z-axis moving device belonging to another XYZ-axis motion system, the ball polishing head is installed on the rotating platform, and the side liquid supply pipe is connected to the ball polishing head.

[0013] In order to be able to vacuum adsorb the product, preferably, the product clamping motion system includes a vacuum suction cup and a product rotation drive device, the product rotation drive device is installed inside the frame and is located at the bottom of the flat polishing head system and the curved polishing head system, and the vacuum suction cup is installed on the top of the product rotation drive device.

[0014] In order to monitor the gap between the polishing head and the product, preferably, the polishing head position accuracy control system includes a grating ruler, and the grating ruler is installed on the Z-axis moving device of the XYZ-axis motion system.

[0015] In order to be able to transport the magnetorheological fluid, preferably, the magnetorheological fluid supply system includes a peristaltic pump, which is installed inside the base, and the output end of the peristaltic pump is connected to the central axis on the polishing disk and the side liquid supply pipe on the ball polishing head.

[0016] In order to realize the movement and maintenance inspection operations of the device, preferably, a plurality of brake wheels are provided at the bottom of the base, and a plurality of visual inspection windows are installed on the surface of the frame.

[0017] The technical effects and advantages of this utility model are:

[0018] 1. The dual-station setting enables the device to adapt to the processing of various surface shapes, such as plane, convex spherical, cylindrical, and concave spherical products, with a wide range of applications and high processing efficiency;

[0019] 2. By using vacuum suction cups to absorb products, the traditional magnetorheological polishing machine's mechanical fixing method is abandoned, further improving the automation level and processing efficiency of the whole machine;

[0020] 3. By installing a grating ruler at the polishing head position, the grating ruler constantly detects the position accuracy of the polishing head and the product, and feeds back to the Z-axis drive motor, so that the Z-axis drive motor constantly controls and adjusts the position accuracy of the polishing head, thereby improving the processing quality of the product. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a schematic diagram of the overall structure of the utility model.

[0022] Figure 2 This is a schematic diagram of the internal structure of the frame of the present utility model.

[0023] Figure 3 This is a structural diagram of the utility model when the frame is removed.

[0024] Figure 4 This is a schematic diagram of the structure of the plane polishing head system of the utility model Figure 1 .

[0025] Figure 5 This is a schematic diagram of the structure of the plane polishing head system of the utility model Figure 2 .

[0026] Figure 6 This is a schematic diagram of the structure of the curved surface polishing head system of the present utility model.

[0027] Figure 7 This is a structural diagram of the product clamping motion system of the utility model.

[0028] Figure 8 This is a schematic diagram of the vacuum suction cup structure of the present utility model.

[0029] Figure 9 The structure diagram of the XYZ axis motion system of the utility model is shown as follows: Figure 1 .

[0030] Figure 10 The structure diagram of the XYZ axis motion system of the utility model is shown as follows: Figure 2 .

[0031] Figure 11 This is a schematic diagram of the grating ruler installation structure of the utility model.

[0032] The accompanying drawings are marked as follows: 1. Base; 2. Frame; 3. XYZ-axis motion system; 4. Flat polishing head system; 5. Curved polishing head system; 6. Product clamping motion system; 7. Polishing head position accuracy control system; 300. X-axis moving device; 301. Y-axis moving device; 302. Z-axis moving device; 400. Mounting frame; 401. Polishing disc; 402. Center axis; 500. Rotating platform; 501. Ball head polishing head; 502. Side liquid supply pipe; 600. Vacuum suction cup; 601. Product rotation drive device; 700. Grating scale; 8. Brake wheel; 9. Visual inspection window. DETAILED DESCRIPTION

[0033] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0034] As attached Figure 1-11 The shown embodiment shows a high-precision and high-efficiency double-station magnetorheological polishing machine, comprising a base 1, a frame 2 being provided on the top of the base 1, two XYZ-axis motion systems 3 being provided inside the frame 2 for controlling the motion trajectory of the polishing head and adjusting the polishing gap between the polishing head and the product, a flat polishing head system 4 for processing flat products and a curved polishing head system 5 for processing curved products being installed on the two XYZ-axis motion systems 3 respectively, a product clamping motion system 6 for fixing and rotating the product being provided at the bottom of the flat polishing head system 4 and the curved polishing head system 5 inside the frame 2, a polishing head position accuracy control system 7 for monitoring and feedback of the position of the polishing head and the product being also provided on the XYZ-axis motion system 3, and a magnetorheological fluid supply system for supplying fluid to the polishing head position of the magnetorheological polishing machine being installed inside the base 1.

[0035] Specifically, in the above structure, the magnetorheological polishing machine is provided with two workstations. The flat polishing head system 4 installed on one of the XYZ axis motion systems 3 is used for processing flat products, while the curved polishing head system 5 installed on the other XYZ axis motion system 3 is used for processing curved products. At the same time, the two product clamping motion systems 6 can be used to fix, adsorb and move flat products and curved products. In specific use;

[0036] First, the flat products and curved products are respectively installed on the product clamping motion systems 6 corresponding to the bottom of the flat polishing head system 4 and the curved polishing head system 5, and the two product clamping motion systems 6 are used to perform vacuum adsorption operations on the flat products and the curved products respectively. At this time, the magnetorheological fluid supply system inside the base 1 transports the magnetorheological fluid to the flat polishing head system 4 and the curved polishing head system 5 respectively. The XYZ-axis motion system 3 can drive the flat polishing head system 4 and the curved polishing head system 5 to move in the X-axis, Y-axis and Z-axis respectively, thereby improving the processing efficiency and processing quality of the products. At the same time, the polishing head position accuracy control system 7 can monitor and feedback the position of the polishing head and the product, so that the flat polishing head system 4 and the curved polishing head system 5 can be raised and lowered on the Z-axis to adjust the polishing gap.

[0037] The following is a full description of the above system:

[0038] In the above embodiment, as shown in the attached Figure 9 、 10 As shown, the XYZ axis motion system 3 includes an X axis moving device 300 , a Y axis moving device 301 and a Z axis moving device 302 , wherein the X axis moving device 300 is arranged at the bottom of the Y axis moving device 301 , and the Z axis moving device 302 is arranged on one side of the Y axis moving device 301 .

[0039] Specifically, it can be understood that in the above structure, the XYZ-axis motion system 3 is mainly driven by a servo motor to realize the movement of the three axes of X, Y, and Z. Among them, the X-axis moving device 300 and the Y-axis moving device 301 are mainly used to control the XY-axis motion trajectory of the polishing head, and the Z-axis moving device 302 is used to control the Z-axis motion trajectory and adjust the polishing gap between the polishing head and the product. The use of the XYZ-axis motion system 3 can effectively improve the processing efficiency and quality of the product, and ensure that the polishing head realizes the three-axis movement of XYZ when polishing the product.

[0040] In the above embodiment, as shown in the attached Figure 4 、 5As shown, the planar polishing head system 4 includes a mounting frame 400, a polishing plate 401 and a central shaft 402, wherein the mounting frame 400 is mounted on a Z-axis moving device 302 belonging to one of the XYZ-axis motion systems 3, the polishing plate 401 is mounted on the mounting frame 400, and the central shaft 402 is mounted on the polishing plate 401, and a through hole is opened on the central shaft 402 for the flow of magnetorheological fluid.

[0041] Specifically, in the above structure, the planar polishing head system 4 is used to polish planar products, and the mounting frame 400 is installed on the Z-axis moving device 302 belonging to the XYZ-axis motion system 3, so that the mounting frame 400 can drive the polishing disc 401 to move in the Z-axis, and the gap between the polishing disc 401 and the product can be adjusted. The central shaft 402 adopts a central liquid supply method, so that the magnetorheological fluid passes through the through hole of the central shaft 402 to reach between the polishing disc 401 and the product, so that the magnetorheological fluid is adsorbed by the magnet inside the polishing disc 401 to form a micro-grinding head to start polishing the product.

[0042] In the above embodiment, as shown in the attached Figure 6 As shown, the curved surface polishing head system 5 includes a rotating platform 500, a ball polishing head 501 and a side liquid supply pipe 502, wherein the rotating platform 500 is installed on the Z-axis moving device 302 belonging to another XYZ-axis motion system 3, the ball polishing head 501 is installed on the rotating platform 500, and the side liquid supply pipe 502 is connected to one end of the ball polishing head 501 to supply liquid to the ball polishing head 501.

[0043] Specifically, in the above structure, the curved polishing head system 5 is used to polish the curved products. The rotating platform 500 uses the Z-axis moving device 302 to adjust the gap between the ball head polishing head 501 and the product, and the rotating platform 500 is used to control the position of the polishing head, which effectively avoids the curvature interference problem of the curved product. The side liquid supply pipe 502 uses a side liquid supply method to direct the magnetorheological fluid between the ball head polishing head 501 and the product, so that the magnetorheological fluid is adsorbed by the magnet inside the ball head polishing head 501 to form a micro-grinding head to start polishing the product.

[0044] In the above embodiment, as shown in the attached Figure 7 、 8 As shown, the product clamping motion system 6 includes a vacuum suction cup 600 and a product rotation drive device 601. The product rotation drive device 601 is installed inside the frame 2 and is located at the bottom of the flat polishing head system 4 and the curved polishing head system 5. The vacuum suction cup 600 is installed on the top of the product rotation drive device 601.

[0045] Specifically, in the above structure, the vacuum suction cup 600 can be used to perform vacuum adsorption and fixation processing on the product, abandoning the mechanical fixing method of the traditional magnetorheological polishing machine, further improving the automation level and processing efficiency of the whole machine, and the product rotation drive device 601 uses a motor to drive the product adsorbed by the vacuum suction cup 600, thereby improving the automation level and processing efficiency of the whole machine. In addition, product rotation can effectively increase the processing efficiency of the product.

[0046] In the above embodiment, as shown in the attached Figure 11 As shown, the polishing head position accuracy control system 7 includes a grating ruler 700 , which is installed on the Z-axis moving device 302 of the XYZ-axis motion system 3 .

[0047] Specifically, in the above structure, when the Z-axis moving device 302 belonging to the XYZ-axis motion system 3 drives the polishing disk 401 and the ball polishing head 501 to adjust the gap with the product, the grating ruler 700 can monitor and feedback the position of the polishing head and the product. Specifically, the grating ruler 700 is installed on the pad of the Z-axis moving device 302, and the signal end is connected to the machine tool control system. Before polishing, the polishing gap between the polishing head and the product is set. During polishing, the grating ruler 700 monitors the gap at all times. When the gap becomes smaller or larger, the signal end of the grating ruler 700 is fed back to the control system, and the control system sends a signal to the drive motor of the Z-axis moving device 302, thereby controlling the lifting and lowering of the polishing head on the Z axis, thereby adjusting the polishing gap.

[0048] In the above embodiment, as shown in the attached Figure 1 As shown, the magnetorheological fluid supply system includes a peristaltic pump, which is installed inside the base 1 , and the output end of the peristaltic pump is connected to the central axis 402 on the polishing plate 401 and the side liquid supply pipe 502 on the ball polishing head 501 .

[0049] Specifically, in the above structure, the magnetorheological fluid supply system is mainly used to supply fluid to the polishing head of the magnetorheological polishing machine, and the pre-configured magnetorheological fluid is pumped between the polishing head and the product by a peristaltic pump.

[0050] In the above embodiment, as shown in the attached Figure 1 、 2 As shown in Figures 3 and 4, a plurality of brake wheels 8 are provided at the bottom of the base 1, and a plurality of visual inspection windows 9 are installed on the surface of the frame 2.

[0051] Specifically, in the above structure, the multiple brake wheels 8 at the bottom of the base 1 can be used to move the entire base 1, and the visual inspection window facilitates the inspection of various systems inside the frame 2, and at the same time, it is convenient to check the product processing status inside the frame 2.

[0052] Working principle of this utility model:

[0053] When the above structure is used in practice,

[0054] The dual-station magnetorheological polishing machine is controlled by six systems, namely the XYZ axis motion system 3, the flat polishing head system 4, the curved polishing head system 5, the product clamping motion system 6, the polishing head position accuracy control system 7 and the magnetorheological fluid supply system;

[0055] Among them, the XYZ axis motion system 3 is mainly used to control the motion trajectory of the polishing head and adjust the polishing gap between the polishing head and the product. The use of the XYZ axis motion system 3 can effectively improve the processing efficiency and quality of the product;

[0056] Plane polishing head system 4: This system is primarily used for processing planar parts. It uses a polishing disc 401 as a polishing head, effectively improving the processing efficiency of planar parts. A central fluid supply method is used, allowing magnetorheological fluid to flow through the through-hole of the central axis 402 and reach the area between the polishing disc 401 and the product. The magnets inside the polishing disc 401 then absorb the magnetorheological fluid, forming a micro-grinding head to polish the product.

[0057] Curved surface polishing head system 5: This system is primarily designed for processing curved surface products. It uses a hemispherical arc-shaped polishing head and a rotating platform 500 to control the polishing head's position, effectively avoiding the curvature interference problem of curved surface products. A side-feed method is used to direct the magnetorheological fluid between the polishing head and the product. The magnet inside the polishing head then absorbs the magnetorheological fluid, forming a micro-abrasive head to begin polishing the product.

[0058] Product gripping motion system 6: Mainly used for fixing and rotating the product, using a vacuum suction cup 600 to absorb the product; a product rotation drive device 601 drives a motor to drive the product absorbed by the vacuum suction cup 600, thereby improving the automation level and processing efficiency of the entire machine. In addition, product rotation can effectively increase product processing efficiency;

[0059] Polishing head position accuracy control system 7: mainly used to monitor and feedback the position of the polishing head and the product. Specifically, the grating ruler 700 is installed on the Z-axis pad and the signal end is connected to the machine tool control system. Before polishing, the polishing gap between the polishing head and the product is set; during polishing, the grating ruler 700 constantly monitors the gap. When the gap becomes smaller or larger, the signal end of the grating ruler 700 is fed back to the control system, and the control system sends a signal to the Z-axis drive motor to control the lifting and lowering of the polishing head on the Z-axis, thereby adjusting the polishing gap;

[0060] Magnetorheological fluid supply system: mainly used to supply fluid to the polishing head of the magnetorheological polishing machine. The peristaltic pump pumps the pre-configured magnetorheological fluid between the polishing head and the product.

[0061] During specific use, flat products and curved products are first placed on the corresponding product clamping motion system 6 for adsorption and fixation, so that flat products are at the bottom of the flat polishing head system 4, and curved products are at the bottom of the curved polishing head system 5. The magnetorheological fluid supply system delivers magnetorheological fluid to the corresponding polishing head. The XYZ axis motion system 3 controls the XYZ motion trajectory of the polishing head, where the Y axis controls the gap between the polishing head and the product. The gap between the polishing head and the product is monitored and fed back through the polishing head position accuracy control system 7 to ensure precise processing of the product.

[0062] It is worth mentioning that the principle of magnetorheological polishing is:

[0063] In the absence of a magnetic field, magnetic particles and abrasive grains are randomly suspended between the polishing head and the workpiece. When a magnetic field is applied, the magnetic particles rapidly form a thick magnetic chain along the magnetic lines of force, firmly binding the abrasive to form a micro-grinding head. Subsequently, the abrasive is moved to the interface between the magnetorheological fluid and the workpiece by the magnetic buoyancy of the magnetic particles, where it participates in polishing. The magnetic field forces the magnetic particles into the workpiece surface, while simultaneously, the micro-grinding head, driven by the polishing head, moves relative to the workpiece. This synergistic effect removes material from the workpiece surface.

[0064] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A high-precision and high-efficiency double-station magnetorheological polishing machine, comprising a base (1), characterized in that: A frame (2) is provided on the top of the base (1), and two XYZ axis motion systems (3) for controlling the motion trajectory of the polishing head and adjusting the polishing gap between the polishing head and the product are provided inside the frame (2). A plane polishing head system (4) for processing plane products and a curved surface polishing head system (5) for processing curved surface products are respectively installed on the two XYZ axis motion systems (3). A product clamping motion system (6) for fixing and rotating the product is provided at the bottom of the plane polishing head system (4) and the curved surface polishing head system (5) inside the frame (2). A polishing head position accuracy control system (7) for monitoring and feeding back the position of the polishing head and the product is also installed on the XYZ axis motion system (3). A magnetorheological fluid supply system for supplying fluid to the polishing head position of the magnetorheological polishing machine is installed inside the base (1).

2. The high-precision and high-efficiency double-station magnetorheological polishing machine according to claim 1 is characterized in that: The XYZ axis motion system (3) comprises an X axis moving device (300), a Y axis moving device (301) and a Z axis moving device (302), wherein the X axis moving device (300) is arranged at the bottom of the Y axis moving device (301), and the Z axis moving device (302) is arranged on one side of the Y axis moving device (301).

3. The high-precision and high-efficiency double-station magnetorheological polishing machine according to claim 1 is characterized in that: The planar polishing head system (4) comprises a mounting frame (400), a polishing disc (401) and a central shaft (402), wherein the mounting frame (400) is mounted on a Z-axis moving device (302) belonging to one of the XYZ-axis motion systems (3), the polishing disc (401) is mounted on the mounting frame (400), and the central shaft (402) is mounted on the polishing disc (401), and a through hole is opened on the central shaft (402) for the flow of magnetorheological fluid.

4. The high-precision and high-efficiency double-station magnetorheological polishing machine according to claim 1 is characterized in that: The curved surface polishing head system (5) comprises a rotating platform (500), a ball polishing head (501) and a side liquid supply pipe (502), wherein the rotating platform (500) is mounted on a Z-axis moving device (302) belonging to another XYZ-axis motion system (3), the ball polishing head (501) is mounted on the rotating platform (500), and the side liquid supply pipe (502) is connected to the ball polishing head (501) and is used to supply liquid to the ball polishing head (501).

5. The high-precision and high-efficiency double-station magnetorheological polishing machine according to claim 1 is characterized in that: The product clamping motion system (6) comprises a vacuum suction cup (600) and a product rotation drive device (601). The product rotation drive device (601) is installed inside the frame (2) and is located at the bottom of the flat surface polishing head system (4) and the curved surface polishing head system (5). The suction cup (600) is installed on the top of the product rotation drive device (601).

6. The high-precision and high-efficiency double-station magnetorheological polishing machine according to claim 1 is characterized in that: The polishing head position accuracy control system (7) comprises a grating ruler (700), and the grating ruler (700) is installed on a Z-axis moving device (302) belonging to the XYZ-axis motion system (3).

7. The high-precision and high-efficiency double-station magnetorheological polishing machine according to claim 1 is characterized in that: The magnetorheological fluid supply system comprises a peristaltic pump, which is installed inside the base (1), and the output end of the peristaltic pump is connected to the central axis (402) on the polishing plate (401) and the side liquid supply pipe (502) on the ball polishing head (501).

8. The high-precision and high-efficiency double-station magnetorheological polishing machine according to claim 1 is characterized in that: A plurality of brake wheels (8) are provided at the bottom of the base (1), and a plurality of visual inspection windows (9) are installed on the surface of the frame (2).

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