Clean type vacuum magnetron sputtering equipment

Abstract

The utility model discloses cleaning type vacuum magnetron sputtering equipment, and relates to the technical field of vacuum magnetron sputtering. The cleaning device comprises a main frame mechanism, the main frame mechanism comprises a vacuum chamber, a cleaning assembly is arranged in the vacuum chamber, a clamping assembly is arranged in the cleaning assembly, the cleaning assembly comprises a baffle, the inner wall of the baffle is in contact with a second scraping plate, and the outer wall of the baffle is in contact with a first scraping plate. Supporting rods are fixedly connected to the left sides and the right sides of the tops of the first scraping plate and the second scraping plate correspondingly, a cover plate is arranged at the top of the vacuum chamber, and T-shaped sliding grooves are formed in the left sides and the right sides of the bottoms of the cover plate correspondingly. The cleaning assembly is arranged, specifically, the cover plate is opened to drive the T-shaped sliding block to move, the T-shaped sliding block drives the supporting rod to move upwards while moving, the first scraping plate and the second scraping plate move upwards along with movement of the supporting rod and scrape the surface of the baffle, and residues of target particles are greatly reduced; and the cleanliness of the equipment is greatly improved.

Description

Technical Field

[0001] The utility model belongs to the technical field of vacuum magnetron sputtering, in particular to a clean vacuum magnetron sputtering device. Background Art

[0002] During vacuum magnetron sputtering, the substrate and target are placed opposite each other in a vacuum sputtering chamber with a gap between them. Shielding plates are provided around the substrate and target to block the target particles sputtered from the target and prevent the target particles from sputtering to the inner wall of the vacuum sputtering chamber. However, after working for a long time, a large number of target particles will adhere to the surface of the shielding plate. If they are not cleaned in time, the coating effect of the equipment will be greatly affected, and the cleanliness of the equipment will be greatly reduced. Long-term accumulation will make the shielding plate difficult to clean, which greatly increases the workload of the staff. Therefore, a clean vacuum magnetron sputtering equipment is proposed. Utility Model Content

[0003] The purpose of the present utility model is to provide a clean vacuum magnetron sputtering equipment, specifically, the cover plate is opened to drive the T-shaped slider to move, and the movement of the T-shaped slider drives the support rod to move upward together, and the scraper 1 and the scraper 2 will move upward together through the movement of the support rod and scrape the surface of the baffle, which solves the problem that during vacuum magnetron sputtering, the substrate and the target material are placed opposite each other in the vacuum sputtering chamber, and a shielding plate is provided around the substrate and the target material. The shielding plate blocks the target material particles sputtered from the target material and prevents the target material particles from sputtering to the inner wall of the vacuum sputtering chamber. However, after working for a long time, a large number of target material particles will adhere to the surface of the shielding plate. If it is not cleaned in time, the coating effect of the equipment will be greatly affected, and the cleanliness of the equipment will be greatly reduced. In addition, the accumulation over a long period of time will make the shielding plate difficult to clean, which greatly increases the workload of the staff.

[0004] In order to solve the above technical problems, the present invention is achieved through the following technical solutions:

[0005] The utility model provides a cleaning type vacuum magnetron sputtering device, comprising a main frame mechanism, the main frame mechanism comprising a vacuum chamber, the vacuum chamber interior being provided with a cleaning assembly, the cleaning assembly interior being provided with a clamping assembly, the cleaning assembly comprising a baffle, the inner wall of the baffle being in contact with a scraper second, the outer wall of the baffle being in contact with a scraper first, the scraper first and the left and right sides of the top of the scraper second being fixedly connected to a support rod, the vacuum chamber top being provided with a cover plate, the left and right sides of the bottom of the cover plate being provided with a T-shaped slide groove, the two T-shaped slide grooves being slidably connected to a T-shaped slider, the bottoms of the two T-shaped sliders being rotatably connected to the support rod through a pin shaft, the bottom of the baffle being fixedly connected to the bottom wall of the vacuum chamber, and the cover plate being opened to drive the T-shaped slider to move, and the movement of the T-slide drives the support rod upward together, and the scraper first and the scraper second will move upward together through the movement of the support rod and scrape the baffle surface.

[0006] Furthermore, the clamping assembly includes a substrate fixing plate, the top of the substrate fixing plate is fixedly connected to the bottom of the cover plate, a slot is opened inside the substrate fixing plate, a bidirectional threaded rod is provided inside the slot, the bidirectional threaded rod passes through the substrate fixing plate and extends to the right side, and when the bidirectional threaded rod rotates, its two ends rotate inside the substrate fixing plate.

[0007] Furthermore, the left and right sides of the outer surface of the bidirectional threaded rod are rotatably connected to the left and right sides of the substrate fixing plate, and a knob is provided on the right side of the substrate fixing plate, and the left side of the knob is fixedly connected to the right side of the bidirectional threaded rod. The outer wall of the knob is polygonal, and the left and right sides of the slot are slidingly connected with moving blocks, and the interiors of the two moving blocks are threadedly connected to the left and right sides of the outer surface of the bidirectional threaded rod. Turning the knob clockwise drives the bidirectional threaded rod to rotate, and the two moving blocks will approach each other through the rotation of the bidirectional threaded rod. The action of the bidirectional threaded rod can greatly improve the synchronous movement of the two moving blocks, thereby greatly improving the supporting effect.

[0008] Furthermore, clamps are provided on the left and right sides of the bottom of the substrate fixing plate, and the tops of the two clamps are fixedly connected to the bottom of the moving block. The corresponding sides of the two clamps are arc-shaped, which makes the clamping effect more stable, and the outer side of the knob is polygonal, which greatly increases the friction and greatly reduces the slipping when rotating the knob.

[0009] Furthermore, a workbench is fixedly connected to the bottom of the vacuum chamber, and an observation window is fixedly connected to the front of the vacuum chamber, so that staff can observe the situation inside the vacuum chamber through the observation window.

[0010] The utility model has the following beneficial effects:

[0011] 1. The utility model sets a cleaning component, specifically, opens the cover to drive the T-shaped slider to move, and the movement of the T-shaped slider drives the support rod to move upward. The scraper 1 and the scraper 2 will move upward together through the movement of the support rod and scrape the surface of the baffle, which greatly reduces the residual target particles and greatly improves the cleanliness of the equipment.

[0012] 2. The utility model sets a clamping component, specifically, rotating the knob clockwise to drive the bidirectional threaded rod to rotate. The two moving blocks will approach each other through the rotation of the bidirectional threaded rod and drive the two clamps to approach each other and clamp and fix the sample. The corresponding sides of the two clamps are arc-shaped, which makes the clamping effect more stable, greatly improves the stability of the sample when being coated, and greatly improves the working effect of the coating.

[0013] Of course, any product implementing the present invention does not necessarily need to achieve all of the advantages described above at the same time. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following is a brief introduction to the drawings required for describing the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0015] Figure 1 This is a schematic diagram of the overall structure of the utility model;

[0016] Figure 2 This is a schematic diagram of the overall structure of the baffle of the utility model;

[0017] Figure 3 This is a schematic diagram of the overall structure of the substrate fixing plate of the utility model;

[0018] Figure 4 For this utility model Figure 3 Middle A is a schematic diagram of the enlarged structure;

[0019] Figure 5 This is a schematic diagram of the overall structure of the bidirectional threaded rod of the utility model.

[0020] In the accompanying drawings, the components represented by the reference numerals are as follows:

[0021] 1. Main frame mechanism; 111. Workbench; 112. Vacuum chamber; 113. Observation window; 114. Cover plate; 2. Cleaning assembly; 211. Support rod; 212. Baffle; 213. Scraper 1; 214. Scraper 2; 215. T-shaped slide; 216. T-shaped slider; 3. Clamping assembly; 311. Substrate fixing plate; 312. Notch; 313. Clamping plate; 314. Moving block; 315. Bidirectional threaded rod; 316. Knob. DETAILED DESCRIPTION

[0022] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0023] See also Figure 1-5As shown, the utility model is a clean vacuum magnetron sputtering device, including a main frame mechanism 1, the main frame mechanism 1 includes a vacuum chamber 112, a cleaning component 2 is arranged inside the vacuum chamber 112, a clamping component 3 is arranged inside the cleaning component 2, the cleaning component 2 includes a baffle 212, the inner wall of the baffle 212 contacts with a scraper 2 214, the outer wall of the baffle 212 contacts with a scraper 1 213, the left and right sides of the top of the scraper 1 213 and the scraper 2 214 are fixedly connected with a support rod 211, specifically, the cover 114 is opened to drive the T-shaped slider 216 to move, and the movement of the T-shaped slider 216 drives the support rod 211 to move upward together, and the scraper 1 213 and the scraper 2 214 will move upward together through the movement of the support rod 211 and scrape the surface of the baffle 212, which greatly reduces the residual target particles and greatly improves the cleanliness of the equipment.

[0024] A cover plate 114 is provided on the top of the vacuum chamber 112, and T-shaped grooves 215 are provided on the left and right sides of the bottom of the cover plate 114. T-shaped sliders 216 are slidably connected inside the two T-shaped grooves 215. The bottoms of the two T-shaped sliders 216 are rotatably connected to the inside of the support rod 211 through pins, and the bottom of the baffle 212 is fixedly connected to the bottom of the inner wall of the vacuum chamber 112.

[0025] The clamping assembly 3 includes a substrate fixing plate 311, the top of the substrate fixing plate 311 is fixedly connected to the bottom of the cover plate 114, a slot 312 is opened inside the substrate fixing plate 311, a bidirectional threaded rod 315 is arranged inside the slot 312, the bidirectional threaded rod 315 passes through the substrate fixing plate 311 and extends to the right side, specifically, the clockwise rotation of the knob 316 drives the bidirectional threaded rod 315 to rotate, and the two moving blocks 314 are moved closer to each other through the rotation of the bidirectional threaded rod 315 and drive the two clamping plates 313 to approach each other and clamp and fix the sample, and the corresponding side of the two clamping plates 313 is set in an arc shape, which makes the clamping effect more stable, greatly improves the stability of the sample when being coated, and greatly improves the working effect of the coating.

[0026] The left and right sides of the outer surface of the bidirectional threaded rod 315 are rotatably connected to the left and right sides inside the substrate fixing plate 311. A knob 316 is provided on the right side of the substrate fixing plate 311. The left side of the knob 316 is fixedly connected to the right side of the bidirectional threaded rod 315. The outer wall of the knob 316 is polygonal. The left and right sides of the slot 312 are slidably connected with moving blocks 314. The interiors of the two moving blocks 314 are threadedly connected to the left and right sides of the outer surface of the bidirectional threaded rod 315.

[0027] Clamping plates 313 are provided on the left and right sides of the bottom of the substrate fixing plate 311 . The tops of the two clamping plates 313 are fixedly connected to the bottom of the moving block 314 . The corresponding sides of the two clamping plates 313 are both arc-shaped.

[0028] A workbench 111 is fixedly connected to the bottom of the vacuum chamber 112 , and an observation window 113 is fixedly connected to the front of the vacuum chamber 112 .

[0029] A specific application of this embodiment is: when in use, the staff first opens the cover 114 and places the sample between the two clamping plates 313, and then the staff turns the knob 316 clockwise to drive the bidirectional threaded rod 315 to rotate. The two moving blocks 314 will approach each other through the rotation of the bidirectional threaded rod 315. The action of the bidirectional threaded rod 315 can greatly improve the synchronous movement of the two moving blocks 314, greatly improving the support effect. When the bidirectional threaded rod 315 rotates, its two ends rotate inside the substrate fixing plate 311. When the two moving blocks 314 approach each other, they will drive the two clamping plates 313 to approach each other and clamp the sample. The corresponding sides of the two clamping plates 313 are arc-shaped, which makes the clamping effect more stable, and the outer side of the knob 316 is polygonal, which greatly increases the friction and greatly reduces the slipping when rotating the knob 316. The situation greatly improves the stability of the sample when being coated, and greatly improves the working effect of the coating. After the coating is completed, the staff opens the cover 114 to drive the T-shaped slider 216 to move. The T-shaped slider 216 will slide inside the T-shaped slot 215 while moving. The cooperation between the T-shaped slot 215 and the T-shaped slider 216 can greatly increase a certain supporting force to avoid the support rod 211 from falling off. The movement of the T-shaped slider 216 drives the support rod 211 to move upward together. At the same time, the T-shaped slider 216 rotates inside the support rod 211, and the scraper 1 213 and the scraper 214 will move upward together through the movement of the support rod 211 and scrape the surface of the baffle 212, which greatly reduces the residue of target particles and greatly improves the cleanliness of the equipment. At the same time, the staff can observe the situation inside the vacuum chamber 112 through the observation window 113.

[0030] Throughout this specification, references to terms such as "one embodiment," "example," or "specific example" indicate that a specific feature, structure, material, or characteristic described in conjunction with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, schematic representations of these terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

[0031] The preferred embodiments of the present invention disclosed above are intended only to help illustrate the present invention. These preferred embodiments do not exhaustively describe all details, nor do they limit the present invention to the specific embodiments described. Obviously, many modifications and variations are possible based on the contents of this specification. These embodiments are selected and described in detail in this specification to better explain the principles and practical applications of the present invention, thereby enabling those skilled in the art to better understand and utilize the present invention. The present invention is limited only by the claims and their full scope and equivalents.

Claims

1. A clean vacuum magnetron sputtering device, comprising a main frame mechanism (1), wherein the main frame mechanism (1) comprises a vacuum chamber (112), a cleaning component (2) is provided inside the vacuum chamber (112), and a clamping component (3) is provided inside the cleaning component (2), characterized in that: The cleaning assembly (2) comprises a baffle (212), the inner wall of the baffle (212) contacts a second scraper (214), the outer wall of the baffle (212) contacts a first scraper (213), and the left and right sides of the tops of the first scraper (213) and the second scraper (214) are fixedly connected with support rods (211).

2. A clean vacuum magnetron sputtering device according to claim 1, characterized in that: A cover plate (114) is provided on the top of the vacuum chamber (112), and T-shaped grooves (215) are provided on the left and right sides of the bottom of the cover plate (114). T-shaped sliders (216) are slidably connected inside the two T-shaped grooves (215), and the bottoms of the two T-shaped sliders (216) are rotatably connected to the inside of the support rod (211) through pins. The bottom of the baffle (212) is fixedly connected to the bottom of the inner wall of the vacuum chamber (112).

3. The clean vacuum magnetron sputtering equipment according to claim 2, characterized in that: The clamping assembly (3) comprises a substrate fixing plate (311), the top of the substrate fixing plate (311) is fixedly connected to the bottom of the cover plate (114), a notch (312) is provided inside the substrate fixing plate (311), a bidirectional threaded rod (315) is provided inside the notch (312), and the bidirectional threaded rod (315) passes through the substrate fixing plate (311) and extends to the right side.

4. The clean vacuum magnetron sputtering equipment according to claim 3, characterized in that: The left and right sides of the outer surface of the bidirectional threaded rod (315) are rotatably connected to the left and right sides of the interior of the substrate fixing plate (311); a knob (316) is provided on the right side of the substrate fixing plate (311); the left side of the knob (316) is fixedly connected to the right side of the bidirectional threaded rod (315); and the outer wall of the knob (316) is polygonal.

5. The clean vacuum magnetron sputtering equipment according to claim 4, characterized in that: The left and right sides of the inside of the notch (312) are slidably connected with moving blocks (314), and the insides of the two moving blocks (314) are both threadedly connected to the left and right sides of the outer surface of the bidirectional threaded rod (315).

6. The clean vacuum magnetron sputtering equipment according to claim 5, characterized in that: Clamps (313) are provided on the left and right sides of the bottom of the substrate fixing plate (311), the tops of the two clamps (313) are fixedly connected to the bottom of the moving block (314), and the corresponding sides of the two clamps (313) are both arranged in an arc shape.

7. The clean vacuum magnetron sputtering equipment according to claim 6, characterized in that: The bottom of the vacuum chamber (112) is fixedly connected to a workbench (111), and the front of the vacuum chamber (112) is fixedly connected to an observation window (113).

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