Magnetron sputtering gas distribution plate and magnetron sputtering device

Abstract

The utility model discloses a magnetron sputtering gas distribution plate and a magnetron sputtering device, the gas distribution plate comprises a bottom plate and a cover plate, and the cover plate is used for covering the bottom plate; an air inlet is formed in the bottom plate, air outlets are uniformly formed in the cover plate, a main channel and a plurality of branch channels are arranged on the end face, close to the cover plate, of the bottom plate, the main channel is connected with a plurality of main air distribution groups, the branch channels are at least connected with one air distribution group, and the air distribution groups correspond to the main air distribution groups; the gas distribution plate is used for enabling gas to enter from the gas inlet holes, and the gas is distributed out from the gas outlet holes after passing through the main channel and the main gas distribution group as well as the branch channels and the gas distribution groups respectively. Wherein the main gas distribution group and the gas distribution groups can buffer the gas, so that the gas reaching the gas outlet holes is more uniform, and in addition, the gas distribution groups of the plurality of sub-channels can be matched with the main gas distribution group to distribute the gas, so that the gas distribution is further uniform.

Description

Technical Field

[0001] The utility model relates to the technical field of magnetron sputtering, in particular to a magnetron sputtering gas distribution plate and a magnetron sputtering device. Background Art

[0002] During magnetron sputtering, high-energy ions bombard the target surface, generating a large amount of heat and gas. These heat and gas can damage the target surface, thus affecting the quality and performance of the film. Therefore, argon gas is typically introduced during the magnetron sputtering process. Argon gas can form a protective film on the target surface, preventing damage from heat and gas, thereby ensuring the quality and performance of the film. However, the uniformity of the introduced argon gas can affect the uniformity of the film thickness, which in turn affects the quality and performance of the film. In prior art, the gas supply system used in magnetron sputtering coating production typically uses a single-channel gas distribution method, which cannot achieve uniform gas distribution, affecting the quality and performance of the film. Utility Model Content

[0003] The main technical problem solved by the utility model is to provide a magnetron sputtering gas distribution plate to solve the problem of uneven gas distribution.

[0004] In order to solve the above technical problems, a technical solution adopted by the present invention is to provide a magnetron sputtering gas distribution plate, including a base plate and a cover plate, the cover plate is used to cover the base plate; the base plate is provided with air inlet holes, and the cover plate is evenly provided with air outlet holes. A main channel and multiple branch channels are provided on the end face of the base plate adjacent to the cover plate. The main channel is connected to multiple main gas distribution groups, and the branch channel is connected to at least one distribution gas group, and the distribution gas group is arranged corresponding to the main gas distribution group; the magnetron sputtering gas distribution plate is used to allow gas to enter from the air inlet holes, and the gas is distributed from the air outlet holes after passing through the main channel and the main gas distribution group, as well as the branch channel and the distribution gas group.

[0005] In some embodiments, the main channel and the branch channel each have an independent air inlet corresponding to them.

[0006] In some embodiments, the distribution gas group adjacent to one end of the air inlet is connected to a branch channel, the distribution gas group away from the air inlet is connected to a branch channel, and the other distribution gas groups between the two ends are connected to at least one branch channel.

[0007] In some embodiments, the main air distribution group and the distribution air group both include a first-level branch, a second-level branch, and a third-level branch. The first-level branch is arranged at the edge of the base plate, and the two ends of the first-level branch extend toward the middle of the base plate and are respectively connected to two second-level branches. The two ends of the two second-level branches further extend toward the middle of the base plate and are respectively connected to four third-level branches.

[0008] In some embodiments, the position of the air outlet corresponds to the position of the third-level branch.

[0009] In some embodiments, air inlet interface pipes are provided at the air inlet holes of the main channel and the branch channel, and the air inlet interface pipes are used to connect to external air supply pipes.

[0010] In some embodiments, a plurality of air outlet pipes are provided on the cover plate, and air outlet holes are provided on the air outlet pipes. One end of the air outlet pipe is provided on the upper side of the third-level branch, and the other end extends out of the cover plate.

[0011] In some embodiments, a protective cover is fixed above the cover plate. The protective cover is adapted to the size of the cover plate and is used to protect the cover plate. The protective cover is provided with air perforations for letting out gas.

[0012] In some embodiments, the protective cover includes an arched portion and a fixed portion. The arched portion covers the top of the exhaust pipe. The upper side, left side and right side of the arched portion are provided with air perforations. The arched portion is used to evenly transmit gas. The fixed portion is provided on both sides of the arched portion. The fixed portion is used to fix the protective cover on the cover plate.

[0013] Based on the same concept, the present invention also provides a magnetron sputtering device, including the above-mentioned magnetron sputtering gas distribution plate.

[0014] The beneficial effects of the present invention are as follows: the present invention provides a magnetron sputtering gas distribution plate, comprising a base plate and a cover plate, the cover plate being used to cover the base plate; an air inlet is provided on the base plate, and air outlets are evenly provided on the cover plate; a main channel and a plurality of branch channels are provided on the end surface of the base plate adjacent to the cover plate, the main channel is connected to a plurality of main air distribution groups, the branch channel is connected to at least one distribution air group, and the distribution air group is provided corresponding to the main air distribution group; the air distribution plate is used to allow gas to enter from the air inlet, and the gas is distributed from the air outlet after passing through the main channel and the main air distribution group, and the branch channel and the distribution air group. The main air distribution group and the distribution air group can buffer the gas, so that the gas reaching the air outlet is more uniform, and the distribution air groups of the plurality of branch channels can cooperate with the main air distribution group to distribute the gas, thereby further making the gas distribution uniform. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 This is a schematic structural diagram of an embodiment of the present utility model;

[0016] Figure 2 This is a structural diagram of a bottom plate according to an embodiment of the present invention;

[0017] Figure 3 yes Figure 2 A schematic diagram of the partially enlarged structure at point A in the middle;

[0018] Figure 4 yes Figure 2 A schematic diagram of the partially enlarged structure at point B in the middle;

[0019] Figure 5 yes Figure 2 A schematic diagram of the partially enlarged structure at C in the middle;

[0020] Figure 6 It is a schematic structural diagram of a protective cover according to an embodiment of the present invention. DETAILED DESCRIPTION

[0021] To facilitate understanding of the present invention, the present invention is described in more detail below with reference to the accompanying drawings and specific embodiments. The accompanying drawings illustrate preferred embodiments of the present invention. However, the present invention can be implemented in many different forms and is not limited to the embodiments described in this specification. Rather, these embodiments are provided to provide a more thorough and comprehensive understanding of the disclosure of the present invention.

[0022] It should be noted that, unless otherwise defined, all technical and scientific terms used in this specification have the same meanings as those commonly understood by those skilled in the art in the technical field of this utility model. The terms used in this specification are only for the purpose of describing specific embodiments and are not intended to limit the utility model. The term "and / or" as used in this specification includes any and all combinations of one or more of the relevant listed items.

[0023] For the description of the present invention, the non-limiting Figure 1 The marks "front", "rear", "up", "down", "left" and "right" shown in the figure are used to facilitate understanding of the embodiment and are not intended to limit the present invention. Among them, the front-to-back direction represents the longitudinal direction, the left-to-right direction represents the transverse direction, and the up-down direction represents the vertical direction.

[0024] Figures 1-6 An embodiment of a magnetron sputtering gas distribution plate of the present invention is shown, comprising a base plate 1 and a cover plate 2, the cover plate 2 being used to cover the base plate 1; an air inlet 11 is provided on the base plate 1, and an air outlet 22 is evenly provided on the cover plate 2; a main channel 12 and a plurality of branch channels 13 are provided on the end surface of the base plate 1 adjacent to the cover plate 2, the main channel 12 is connected to a plurality of main gas distribution groups 121, the branch channel 13 is connected to at least one distribution gas group 131, and the distribution gas group 131 is provided corresponding to the main gas distribution group 121.

[0025] The magnetron sputtering gas distribution plate is used to allow gas to enter through the gas inlet 11, pass through the main channel 12 and the main gas distribution group 121, and then through the branch channel 13 and the distribution group 131, before being distributed through the gas outlet 22. The main gas distribution group 121 and the distribution group 131 can buffer the gas, ensuring that the gas reaching the gas outlet 22 is uniform. In addition, the distribution groups 131 of the multiple branch channels 13 can cooperate with the main gas distribution group 121 to distribute gas, further improving the gas distribution effect and making it more uniform.

[0026] In some embodiments, the main channel 12 has an independent air inlet 11, and each branch channel 13 also has an independent air inlet 11. If the air distributed by the main air distribution group 121 in a certain area is weak, the air in that area can be replenished through the air inlet 11 of the branch channel 13 of the corresponding air distribution group 131. This ensures uniform air distribution and enhances the flexibility and controllability of air distribution adjustment.

[0027] like Figure 2 、 Figure 3 、 Figure 4 and Figure 5 As shown, in some embodiments, the air distribution group 131 at one end adjacent to the air inlet 11 is connected to a sub-channel 13, the air distribution group 131 at one end away from the air inlet 11 is connected to a sub-channel 13, and the other air distribution groups 131 between the air distribution groups 131 at both ends are connected to at least one sub-channel 13. In this embodiment, the main channel 12 is connected to four main air distribution groups 121; correspondingly, four air distribution groups 131 and three sub-channels 13 are provided, and the three sub-channels 13 are respectively a first sub-channel 1301, a second sub-channel 1302, and a third sub-channel 1303. One air distribution group 131 at one end is connected to the first sub-channel 1301, and one air distribution group 131 at the other end is connected to the third sub-channel 1303. The two air distribution groups 131 in the middle are also connected to the second sub-channel 1302. In actual use, since the four main air distribution groups 121 are connected to the same main channel 12, the main air distribution group 121 at the end adjacent to the air inlet 11 and the main air distribution group 121 at the end away from the air inlet 11 cannot ventilate quickly, which will cause uneven air distribution at both ends. Correspondingly, the distribution air groups 131 at both ends are respectively connected to the first sub-channel 1301 and the third sub-channel 1303, and air is directly and quickly ventilated through the air inlet 11, which cooperates to offset the uneven air distribution problem at both ends caused by the main air distribution group 121, thereby ensuring the uniformity of air distribution at both ends.

[0028] Of course, in actual use, according to other factors such as the on-site air intake speed, gas concentration, target material size, etc., the main channel 12 can be connected to more or fewer main gas distribution groups 121, and the corresponding branch channel 13 connected to the middle distribution gas group 131 can also be adjusted, which is not limited here.

[0029] like Figure 3As shown, in some embodiments, the main gas distribution group 121 and the distribution gas group 131 both include a first-level branch 1211, a second-level branch 1212 and a third-level branch 1213. The first-level branch 1211 is arranged at the edge of the base plate 1 and is connected to the main channel 12 or the branch channel 13 located at the outermost edge. The two ends of the first-level branch 1211 extend toward the middle direction of the base plate 1 and are respectively connected to the two second-level branches 1212. The two ends of the two second-level branches 1212 further extend toward the middle direction of the base plate 1 and are respectively connected to the four third-level branches 1213. The third-level branch 1213 is located in the middle area of ​​the base plate 1. After being buffered by the first-level branch 1211, the second-level branch 1212 and the third-level branch 1213, the gas will be more uniform and stable.

[0030] Of course, in actual use, depending on the on-site air intake speed, gas concentration, target material size and other factors, the main air distribution group 121 and the distribution air group 131 may include more or fewer levels of branches, which is not limited here.

[0031] In some embodiments, the position of the air outlet 22 corresponds to the position of the third-level branch 1213, ensuring that the gas is first buffered by the first-level branch 1211, the second-level branch 1212, and the third-level branch 1213, and then distributed through the air outlet 22, ensuring that the distributed gas is uniform gas after buffering.

[0032] In some embodiments, an air intake interface tube 4 is provided at the air intake hole 11 of the main channel 12 and the branch channel 13. The air intake interface tube 4 is used to connect to an external air supply pipe. In this embodiment, the air intake interface tube 4 is "L"-shaped, one end is fixed at the air intake hole 11, and the other end is used to connect to an external air supply pipe. The air intake interface tube 4 is designed to be "L"-shaped to facilitate the installation of an external air supply pipe.

[0033] In some embodiments, a plurality of air outlet pipes 21 are provided on the cover plate 2, and air outlet holes 22 are provided on the air outlet pipes 21. One end of the air outlet pipe 21 is provided on the upper side of the third-level branch 1213, and the other end extends out of the cover plate 2. The air outlet pipe 21 can guide the gas, so that the gas discharged through the air outlet pipe 21 is directly guided to a position outside the cover plate 2 close to the target material, thereby avoiding premature dispersion of the gas and affecting the coating efficiency.

[0034] In some embodiments, a protective cover 3 is fixed above the cover plate 2 for protecting the cover plate 2. The protective cover 3 is adapted to the size of the cover plate 2. In this embodiment, the protective cover 3 is divided into three sections for easy production line production. The protective cover 3 is provided with air perforations 31 for letting out gas, ensuring that the protective cover 3 can let out gas while protecting the cover plate 2.

[0035] like Figure 6As shown, in some embodiments, the protective cover 3 includes an arched portion 32 and a fixed portion 33. The arched portion 32 covers the top of the outlet pipe 21 and is at a certain distance from the outlet pipe 21 to ensure that it does not affect the air outlet of the outlet pipe 21. The upper side, left side and right side of the arched portion 32 are provided with air perforations 31, which can achieve uniform gas leakage; the fixed portion 33 is provided on both sides of the arched portion 32, and the fixed portion 33 is used to fix the protective cover 3 on the cover plate 2. The fixed portion 33 is flat, which is convenient for fitting tightly on the upper surface of the cover plate 2, and then the fixed portion 33 can be fixed to the cover plate 2 by screws.

[0036] Based on the same concept, the present invention also provides a magnetron sputtering device, including the above-mentioned magnetron sputtering gas distribution plate.

[0037] It can be seen that the utility model discloses a magnetron sputtering gas distribution plate, which buffers the gas through the main gas distribution group and the distribution gas group. The distribution gas groups of multiple channels cooperate with the main gas distribution group to distribute gas, ensuring the uniformity of gas distribution. In addition, multiple distribution gas groups can perform local supplementary gas distribution separately, enhancing the flexibility and controllability of gas distribution adjustment, and further making the gas distribution effect more uniform.

[0038] The above are merely embodiments of the present invention and are not intended to limit the patent scope of the present invention. Any equivalent structural transformations made using the contents of the present invention specification and drawings, or directly or indirectly applied in other related technical fields, are also included in the patent protection scope of the present invention.

Claims

1. A magnetron sputtering gas distribution plate, characterized in that: It includes a base plate and a cover plate, the cover plate is used to cover the base plate; the base plate is provided with air inlet holes, the cover plate is evenly provided with air outlet holes, the end surface of the base plate adjacent to the cover plate is provided with a main channel and multiple branch channels, the main channel is connected to multiple main gas distribution groups, the branch channel is connected to at least one distribution gas group, and the distribution gas group is arranged corresponding to the main gas distribution group; the magnetron sputtering gas distribution plate is used to allow gas to enter from the air inlet holes, and the gas is distributed from the air outlet holes after passing through the main channel and the main gas distribution group, as well as the branch channel and the distribution gas group.

2. The magnetron sputtering gas distribution plate according to claim 1, characterized in that: The main channel and the branch channel respectively correspond to independent air inlet holes.

3. The magnetron sputtering gas distribution plate according to claim 1, characterized in that: The gas distribution group adjacent to one end of the air inlet is connected to one branch channel, the gas distribution group away from one end of the air inlet is connected to one branch channel, and the other gas distribution groups between the two ends are connected to at least one branch channel.

4. The magnetron sputtering gas distribution plate according to claim 1, characterized in that: The main air distribution group and the distribution air group both include a first-level branch, a second-level branch and a third-level branch. The first-level branch is arranged at the edge of the base plate. The two ends of the first-level branch extend toward the middle of the base plate and are respectively connected to two second-level branches. The two ends of the two second-level branches further extend toward the middle of the base plate and are respectively connected to four third-level branches.

5. The magnetron sputtering gas distribution plate according to claim 4, characterized in that: The position of the air outlet corresponds to the position of the third-level branch.

6. The magnetron sputtering gas distribution plate according to claim 4, characterized in that: An air intake interface pipe is provided at the air intake holes of the main channel and the branch channel, and the air intake interface pipe is used to connect to an external air supply pipe.

7. The magnetron sputtering gas distribution plate according to claim 4, characterized in that: The cover plate is provided with a plurality of air outlet pipes, each of which is provided with the air outlet holes. One end of the air outlet pipe is provided on the upper side of the third-level branch, and the other end extends out of the cover plate.

8. The magnetron sputtering gas distribution plate according to claim 7, characterized in that: A protective cover is fixed above the cover plate. The protective cover is adapted to the size of the cover plate and is used to protect the cover plate. The protective cover is provided with ventilation holes, and the ventilation holes are used to let out the gas.

9. The magnetron sputtering gas distribution plate according to claim 8, characterized in that: The protective cover includes an arched portion and a fixed portion. The arched portion covers the top of the air outlet pipe. The upper side, left side and right side of the arched portion are provided with air perforations. The arched portion is used to evenly release the gas. The fixed portion is provided on both sides of the arched portion. The fixed portion is used to fix the protective cover on the cover plate.

10. A magnetron sputtering device, characterized in that: The invention comprises the magnetron sputtering gas distribution plate as described in any one of claims 1 to 9.

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