Treatment device for controlling granularity of silicon nitride powder
Through the device design of vibration screening and uniform heating, the blockage and unevenness of silicon nitride powder during screening and heat treatment are solved, and efficient particle size control and separation effects are achieved.
Patent Information
- Application Number
- CN202422447010.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-10
- Publication Date
- 2025-08-26
- Estimated Expiration
- 2034-10-10
AI Technical Summary
Traditional devices are prone to clogging when screening silicon nitride powder, and the accumulation of powder during the heat treatment process leads to uneven heat treatment, which is difficult to effectively solve the problem in the prior art.
A vibration screening and uniform heating treatment device is adopted to combine rotating blade agitation and belt heater to achieve uniform heat treatment and particle size separation of silicon nitride powder.
The uniform heat treatment and particle size separation of silicon nitride powder are achieved, avoiding the problems of clogging and uneven heat treatment, and improving the treatment efficiency.
Smart Images
Figure CN223263835U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of silicon nitride powder, in particular to a processing device for controlling the particle size of silicon nitride powder. Background Art
[0002] Silicon nitride is an inorganic substance with the chemical formula Si3N4. It is an important structural ceramic material characterized by high hardness, inherent lubricity, and wear resistance, as an atomic crystal. It also resists oxidation at high temperatures. Because of these excellent properties, silicon nitride ceramics are often used to manufacture mechanical components such as bearings, turbine blades, mechanical seals, and permanent molds.
[0003] Traditional devices use screens to screen silicon nitride products, thereby saving manpower. However, during the use of the screen, blockage may occur when the screened products fall, so this situation needs to be avoided. In addition, in the processing of silicon nitride powder, heat treatment is often used. During the heat treatment process, it is necessary to avoid the silicon nitride powder from piling up, which leads to the problem of low heat treatment acceptance of the internal silicon nitride powder. Therefore, a processing device for controlling the particle size of silicon nitride powder is needed to solve the above problem. Utility Model Content
[0004] In view of the shortcomings of the existing technology, the utility model provides a processing device for controlling the particle size of silicon nitride powder, which has the advantages of vibration screening and uniform heating, and solves the problems raised by the above-mentioned background technology.
[0005] The utility model provides the following technical solution: a processing device for controlling the particle size of silicon nitride powder, comprising a processing tank, the bottom of the processing tank is fixedly connected to a supporting foot, a top cover is placed on the top of the processing tank, the outer wall of the top cover is connected to an extension wall, the inner wall of the extension wall is sleeved with a screw structure, the outer wall of the top cover is fixedly connected to a feeding port, the outer wall of the top cover is fixedly installed with a rotating motor, the power output shaft of the rotating motor is fixedly connected with a rotating shaft, the outer wall of the rotating shaft is fixedly connected with a rotating blade, a belt heater is installed on the outer wall of the processing tank, the bottom of the processing tank is fixedly connected with a discharge port, the inner wall of the discharge port is provided with a valve device, a screening frame is placed at the bottom of the discharge port, a screen device is provided on the top of the screening frame, a vibration device is fixedly installed on the inner wall of the screening frame, and a collection box is placed at the bottom of the screen device.
[0006] As a preferred technical solution of the present invention, the number of the extension walls is two, and the two extension walls are respectively arranged on the top cover and the outer wall of the processing tank.
[0007] As a preferred technical solution of the present invention, the screw structure passes through the top cover and two extension walls on the outer wall of the processing tank, and the screw structure is fixed on the other side by a nut.
[0008] As a preferred technical solution of the present invention, the rotating blade is located in the inner cavity of the processing tank, and the rotating blade is in a spiral shape that is wider at the bottom and narrower at the top.
[0009] As a preferred technical solution of the present invention, the belt heater is sleeved on the outer wall of the processing tank, and the belt heater corresponds to the position of the rotating blade.
[0010] As a preferred technical solution of the present invention, a vibration rod is fixedly connected to the power output shaft of the vibration device, and the vibration rod contacts the bottom of the screen.
[0011] Compared with the prior art, the present invention has the following beneficial effects:
[0012] 1. The processing device for controlling the particle size of silicon nitride powder cooperates with the belt heater, processing tank and rotating blades, rotating motor and rotating shaft on the device. When the rotating motor on the device outputs rotational power, the rotating blades are driven by the rotating shaft to rotate. The silicon nitride powder accumulated in the inner cavity of the processing tank is stirred and refurbished upward by the rotation shape of the rotating blades, which are wider at the bottom and narrower at the top. As a result, the silicon nitride powder can be continuously turned over when the belt heater outputs the heating effect, thereby uniformly heat-treating the silicon nitride powder in the inner cavity of the processing tank.
[0013] 2. The processing device for controlling the particle size of silicon nitride powder cooperates with the screen, vibration device and collection box on the device so that the aperture sizes of the screening on the left and right sides of the screen are different. When the silicon nitride powder falls on the inner wall of the screen, the vibration force of the vibration device is used to slowly move the silicon nitride powder in the inner cavity of the screen, so that the silicon nitride powder in the device is screened out of silicon nitride of different particle sizes when passing through the screen and enters the inner cavities of different collection boxes. BRIEF DESCRIPTION OF THE DRAWINGS
[0014] Figure 1 This is a schematic diagram of the three-dimensional structure of the utility model;
[0015] Figure 2 This is a schematic diagram of the three-dimensional cross-sectional structure of the utility model;
[0016] Figure 3 For this utility model Figure 2 A schematic diagram of the structure at center A;
[0017] Figure 4 This is a schematic diagram of the rotating blade structure of the utility model.
[0018] In the figure: 1. Processing tank; 2. Support legs; 3. Top cover; 4. Extension wall; 5. Screw structure; 6. Feeding port; 7. Rotating motor; 8. Rotating shaft; 9. Rotating blade; 10. Belt heater; 11. Feeding port; 12. Valve; 13. Screening frame; 14. Screen; 15. Vibrating device; 16. Collection box. DETAILED DESCRIPTION
[0019] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.
[0020] See also Figures 1-4 , a processing device for controlling the particle size of silicon nitride powder, comprising a processing tank 1, a supporting foot 2 is fixedly connected to the bottom of the processing tank 1, a top cover 3 is placed on the top of the processing tank 1, the outer wall of the top cover 3 is connected to an extension wall 4, the inner wall of the extension wall 4 is sleeved with a screw structure 5, the outer wall of the top cover 3 is fixedly connected to a feeding port 6, the outer wall of the top cover 3 is fixedly installed with a rotating motor 7, the power output shaft of the rotating motor 7 is fixedly connected to a rotating shaft 8, the outer wall of the rotating shaft 8 is fixedly connected to a rotating blade 9, a belt heater 10 is installed on the outer wall of the processing tank 1, a discharge port 11 is fixedly connected to the bottom of the processing tank 1, a valve device 12 is provided on the inner wall of the discharge port 11, and a valve 12 is placed at the bottom of the discharge port 11 There is a screening frame 13, a screen 14 is provided on the top of the screening frame 13, a vibration device 15 is fixedly installed on the inner wall of the screening frame 13, and a collection box 16 is placed at the bottom of the screen 14. The screen 14, the vibration device 15 and the collection box 16 on the device are used in conjunction with each other, so that the aperture sizes of the left and right sides of the screen 14 on the device are different, and when the silicon nitride powder falls on the inner wall of the screen 14, the vibration force of the vibration device 15 is used to make the silicon nitride powder move slowly in the inner cavity of the screen 14, so that the silicon nitride powder in the device is screened out of silicon nitride of different particle sizes when passing through the screen 14, and enters the inner cavity of different collection boxes 16.
[0021] In a preferred embodiment, there are two extension walls 4, and the two extension walls 4 are respectively arranged on the top cover 3 and the outer wall of the processing tank 1. Through the two extension walls 4 on the device, when the top cover 3 on the device is placed on the top of the processing tank 1, the extension wall 4 is overlapped with the extension wall 4 on the outer wall of the processing tank 1, so that when the top cover 3 on the device is placed on the top of the processing tank 1, the height is matched with the processing tank 1, and the sealing between the two is increased.
[0022] In a preferred embodiment, the screw structure 5 passes through the top cover 3 and the two extension walls 4 on the outer wall of the treatment tank 1, and the screw structure 5 is fixed on the other side by a nut. The screw structure 5 on the device passes through the top cover 3 and the two extension walls 4 on the outer wall of the treatment tank 1, so that the screw structure 5 on the device passes through the inner walls of the two extension walls 4 and is fixedly connected on the other side by a nut, so that the screw structure 5 on the device cooperates with the extension walls 4 to connect the top cover 3 and the treatment tank 1 together.
[0023] In a preferred embodiment, the rotating blade 9 is located in the inner cavity of the processing tank 1, and the rotating blade 9 is in a spiral shape that is wide at the bottom and narrow at the top. The rotating blade 9 on the device is located in the inner cavity of the processing tank 1, so that when the rotating motor 7 outputs rotational power, the rotating blade 9 on the device is driven by the rotating shaft 8 to rotate synchronously, so that the rotating blade 9 on the device rotates in the inner cavity of the processing tank 1, and then the shape of the rotating blade 9 that is wide at the bottom and narrow at the top is used to make the silicon nitride powder flip from bottom to top in the inner cavity of the processing tank 1.
[0024] In a preferred embodiment, the belt heater 10 is sleeved on the outer wall of the processing tank 1, and the belt heater 10 corresponds to the position of the rotating blade 9. The belt heater 10 on the device is sleeved on the outer wall of the processing tank 1, so that the belt heater 10 on the device is fixedly sleeved on the outer wall of the processing tank 1, and the belt heater 10 transfers heat inward through the outer wall of the processing tank 1 during heating, so that the belt heater 10 on the device performs heating work at the position corresponding to the rotating blade 9, thereby heating the inner cavity temperature of the processing tank 1 from bottom to top.
[0025] In a preferred embodiment, a vibration rod is fixedly connected to the power output shaft of the vibration device 15, and the vibration rod contacts the bottom of the screen 14. By fixing the vibration rod on the power output shaft of the vibration device 15 on the device, when the vibration device 15 on the device outputs vibration force, the vibration rod is used to transmit the vibration force to the bottom of the screen 14, so that the screen 14 on the device passively enters a vibration state.
[0026] Working principle: first, through the mutual cooperation of the belt heater 10, the processing tank 1 and the rotating blade 9, the rotating motor 7 and the rotating shaft 8, the rotating motor 7 on the device outputs the rotating power, and the rotating blade 9 is driven by the rotating shaft 8 to rotate, and the rotating blade 9 is rotated in a wide-down and narrow-up rotation shape to stir the silicon nitride powder accumulated in the inner cavity of the processing tank 1 to be refurbished upward, so that the silicon nitride powder can be continuously turned over when the belt heater 10 outputs the heating effect, thereby making the silicon nitride powder in the inner cavity of the processing tank 1 The silicon powder is uniformly heat-treated, and then the screen 14, the vibration device 15 and the collection box 16 on the device are used in conjunction with each other, so that the aperture sizes of the screening on the left and right sides of the screen 14 on the device are different, and when the silicon nitride powder falls on the inner wall of the screen 14, the vibration force of the vibration device 15 is used to make the silicon nitride powder move slowly in the inner cavity of the screen 14, so that the silicon nitride powder in the device is screened out of silicon nitride of different particle sizes when passing through the screen 14 and enters the inner cavity of different collection boxes 16.
[0027] Although the embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations may be made to these embodiments without departing from the principles and spirit of the present invention, and the scope of the present invention is defined by the appended claims and their equivalents.
Claims
1. A processing device for controlling the particle size of silicon nitride powder, comprising a processing tank (1), characterized in that: The bottom of the treatment tank (1) is fixedly connected to a support foot (2), a top cover (3) is placed on the top of the treatment tank (1), the outer wall of the top cover (3) is connected to an extension wall (4), the inner wall of the extension wall (4) is sleeved with a screw structure (5), the outer wall of the top cover (3) is fixedly connected to a feeding port (6), the outer wall of the top cover (3) is fixedly mounted with a rotating motor (7), the power output shaft of the rotating motor (7) is fixedly connected to a rotating shaft (8), and the outer wall of the rotating shaft (8) is fixedly connected to the A rotating blade (9) is connected, a belt heater (10) is installed on the outer wall of the treatment tank (1), a discharge port (11) is fixedly connected to the bottom of the treatment tank (1), a valve (12) is provided on the inner wall of the discharge port (11), a screening frame (13) is placed at the bottom of the discharge port (11), a screen device (14) is provided on the top of the screening frame (13), a vibration device (15) is fixedly installed on the inner wall of the screening frame (13), and a collecting box (16) is placed at the bottom of the screen device (14).
2. The device for controlling the particle size of silicon nitride powder according to claim 1, wherein: The number of the extension walls (4) is two, and the two extension walls (4) are respectively arranged on the top cover (3) and the outer wall of the processing tank (1).
3. The device for controlling the particle size of silicon nitride powder according to claim 1, wherein: The screw structure (5) passes through the top cover (3) and two extension walls (4) on the outer wall of the processing tank (1), and the screw structure (5) is fixed on the other side by a nut.
4. The device for controlling the particle size of silicon nitride powder according to claim 1, wherein: The rotating blade (9) is located in the inner cavity of the processing tank (1), and the rotating blade (9) is in a spiral shape that is wider at the bottom and narrower at the top.
5. The device for controlling the particle size of silicon nitride powder according to claim 1, wherein: The belt heater (10) is sleeved on the outer wall of the processing tank (1), and the belt heater (10) corresponds to the position of the rotating blade (9).
6. The device for controlling the particle size of silicon nitride powder according to claim 1, wherein: A vibration rod is fixedly connected to the power output shaft of the vibration device (15), and the vibration rod contacts the bottom of the screen (14).