Electroplating bath structure and electroplating equipment
By introducing an ultrasonic wave generator into the electroplating tank structure, the problem of poor plating uniformity is solved, a higher quality plating effect is achieved, and the occurrence of electroplating defects is reduced.
Patent Information
- Application Number
- CN202422603797.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-28
- Publication Date
- 2025-08-26
- Estimated Expiration
- 2034-10-28
AI Technical Summary
The gate lines formed by existing vertical plating equipment on the battery cells have poor plating uniformity, resulting in defects such as leakage plating, false breaking or gate breaking, affecting the production quality of the battery cells.
在电镀槽结构中设置超声波发生装置,通过超声波震动波赶出或振破附着在待电镀产品表面的气泡,确保电镀液与待镀表面完全接触,提升电镀均匀性。
The plating quality is improved, the risk of defects such as leakage plating, improper or gate breaking is reduced, and the adhesion and uniformity of the plating layer are improved.
Smart Images

Figure CN223268801U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the field of electroplating of solar cell sheets, in particular to an electroplating tank structure and electroplating equipment. Background Art
[0002] When preparing solar cells (cells for short), grid lines need to be deposited on the surface of the cells. In the existing technology, the grid lines formed by electroplating have good electrical conductivity, which can not only significantly reduce the cost of the solar cell production process, but also reduce the internal resistance of the cell, thereby improving the photoelectric conversion efficiency of the cell.
[0003] Electroplating processes can be categorized as horizontal or vertical, depending on the orientation of the cell during plating. In the existing vertical plating process, grid lines are formed on the cell surface as electrolyte is sprayed onto the cell in the plating tank. However, the grid lines formed on the cell using existing electroplating equipment suffer from poor plating uniformity, which can lead to defects such as missed plating, false breaks, or broken grids, thus affecting cell production quality.
[0004] In view of the above problems, it is necessary to develop an electroplating tank structure and electroplating equipment to solve the problem of poor electroplating uniformity when using existing vertical electroplating equipment. Utility Model Content
[0005] One purpose of the utility model is to provide an electroplating tank structure that can solve the problem of poor electroplating uniformity.
[0006] To achieve this purpose, the present invention adopts the following technical solutions:
[0007] Electroplating tank structure, including:
[0008] A tank body, the tank body having an electroplating cavity, the electroplating cavity being used to contain an electroplating solution;
[0009] a liquid supply device, the liquid supply device being disposed in the electroplating chamber and being used to supply electroplating liquid to the surface to be plated of the product to be electroplated;
[0010] An ultrasonic generating device is arranged in the electroplating chamber and is used to send ultrasonic waves to the surface to be plated of the product to be electroplated.
[0011] Preferably, the ultrasonic generating device is fixed to the bottom of the electroplating chamber.
[0012] Preferably, the ultrasonic generating device includes a first ultrasonic generating component and a second ultrasonic generating component arranged in parallel along a second preset horizontal direction, the second ultrasonic generating component is arranged in the middle area of the bottom of the groove, and the first ultrasonic generating component is arranged on both sides of the second ultrasonic generating component; the ultrasonic generating frequency of the first ultrasonic generating component and the ultrasonic generating frequency of the second ultrasonic generating component are different.
[0013] Preferably, overflow ports are provided on both sides of the electroplating chamber along the second preset horizontal direction, and the ultrasonic generation frequency of the second ultrasonic generation component is lower than the ultrasonic generation frequency of the first ultrasonic generation component;
[0014] Alternatively, an overflow port is provided in the middle of the electroplating chamber along the second preset horizontal direction, and the ultrasonic generation frequency of the second ultrasonic generating component is greater than the ultrasonic generation frequency of the first ultrasonic generating component.
[0015] Preferably, the ultrasonic generating device includes a first ultrasonic generating assembly, which includes a first vibration plate, a first vibrator and a first ultrasonic generator, wherein the first vibration plate is fixed to the bottom of the electroplating chamber, the first vibrator is installed in the first vibration plate, the first ultrasonic generator is fixed to the tank body and connected to the first vibration plate and the first vibrator, and is used to control the vibration of the first vibrator;
[0016] The ultrasonic generating device further includes a second ultrasonic generating assembly, which includes a second vibration plate, a second vibrator, and a second ultrasonic generator. The second vibration plate is fixed to the bottom of the electroplating chamber, and the second vibrator is installed in the second vibration plate. The second ultrasonic generator is fixed to the tank body and connected to the second vibration plate and the second vibrator, and is used to control the vibration of the second vibrator.
[0017] A plurality of the first vibrators are installed in the first vibrator plate, and the plurality of the first vibrators are staggered along a second preset horizontal direction; and / or a plurality of the second vibrators are installed in the second vibrator plate, and the plurality of the second vibrators are staggered along the second preset horizontal direction;
[0018] The first preset horizontal direction is set as the moving direction of the product to be electroplated, and the second preset horizontal direction is set as the arrangement direction of the first ultrasonic generating component and the second ultrasonic generating component. The first preset horizontal direction and the second preset horizontal direction are perpendicular to each other.
[0019] Preferably, a plurality of the electroplating chambers are provided along the first preset horizontal direction, and the ultrasonic generating device in each of the electroplating chambers has a different ultrasonic generating frequency, so that the ultrasonic generating device can match the corresponding bubble processing capacity in different electroplating stages;
[0020] The first preset horizontal direction is set as the moving direction of the product to be electroplated.
[0021] The electroplating tank structure also includes a metal reflector arranged on one side of the ultrasonic generating device. The metal reflector is fixed in the electroplating chamber and is used to reflect ultrasonic waves that tend to escape from the electroplating chamber back into the electroplating chamber.
[0022] Preferably, the metal reflective plates are provided at the bottom of the ultrasonic generating device and at least two opposite sides of the ultrasonic generating device.
[0023] Another object of the present invention is to provide an electroplating device that can effectively improve the electroplating quality by using the above-mentioned electroplating tank structure.
[0024] To achieve this purpose, the present invention adopts the following technical solutions:
[0025] An electroplating apparatus comprising a conveying device and the aforementioned electroplating tank structure, wherein the conveying device is capable of driving the product to be electroplated to move within the electroplating tank structure along a first predetermined horizontal direction, and the liquid supply device of the electroplating tank structure is used to supply electroplating liquid to the surface to be plated of the product to be electroplated;
[0026] The first preset horizontal direction is set as the moving direction of the product to be electroplated.
[0027] Preferably, the electroplating tank structure includes a first electroplating tank and several second electroplating tanks. Along the first preset horizontal direction, the first electroplating tank is located upstream of the several second electroplating tanks. The first electroplating tank and the second electroplating tank are both provided with a tank body and a liquid supply device of the electroplating tank structure. The tank body of the first electroplating tank is provided with an ultrasonic generating device of the electroplating tank structure.
[0028] Beneficial effects of the utility model:
[0029] This embodiment provides an electroplating tank structure, including an ultrasonic generator arranged in an electroplating chamber. The ultrasonic generator can send ultrasonic waves to the surface to be plated of the product to be electroplated. The vibration waves of the ultrasonic waves can drive out or break the bubbles attached to the surface to be plated of the product to be electroplated, making the surface to be plated flat and smooth. The electroplating liquid can completely contact the surface to be plated, thereby improving the electroplating uniformity of the product to be electroplated, reducing the risk of defects such as missed plating, virtual disconnection or broken grid, and improving the plating quality of the product to be electroplated.
[0030] This embodiment also provides an electroplating device, in which the above-mentioned electroplating tank structure is provided. Since the electroplating tank structure can eliminate or break bubbles attached to the surface to be plated of the product to be electroplated through the action of the ultrasonic generator, the electroplating liquid can be in complete contact with the surface to be plated, thereby effectively improving the electroplating quality of the electroplating equipment. BRIEF DESCRIPTION OF THE DRAWINGS
[0031] Figure 1 This is a front view of a portion of the internal structure of the electroplating equipment provided by an embodiment of the present utility model;
[0032] Figure 2 It is a top view of part of the internal structure of the electroplating equipment provided by an embodiment of the present utility model;
[0033] Figure 3 It is a structural diagram of the first ultrasonic generating assembly provided by an embodiment of the present utility model;
[0034] Figure 4 It is a structural diagram of the second ultrasonic generating assembly provided by an embodiment of the present utility model;
[0035] Figure 5 This is a side view of a portion of the internal structure of the electroplating equipment provided by an embodiment of the present utility model;
[0036] Figure 6 This is a schematic diagram of the transmission of ultrasonic waves generated by the first ultrasonic generating assembly provided in an embodiment of the present utility model;
[0037] Figure 7 This is a schematic structural diagram of an ultrasonic generating device provided by an embodiment of the present utility model;
[0038] Figure 8 It is a structural schematic diagram of a metal reflector located at the bottom of an ultrasonic generating device provided in an embodiment of the present utility model.
[0039] In the picture:
[0040] 100. Products to be electroplated;
[0041] 200. Electroplating tank structure; 201. First electroplating tank; 202. Second electroplating tank; 210. Tank body; 2101. Electroplating chamber; 220. Liquid supply device; 230. Ultrasonic wave generating device; 231. First ultrasonic wave generating component; 2311. First vibration plate; 2312. First vibrator; 232. Second ultrasonic wave generating component; 2321. Second vibration plate; 2322. Second vibrator; 240. Metal reflector; 241. Liquid inlet. DETAILED DESCRIPTION
[0042] The present invention will be further described in detail below with reference to the accompanying drawings and examples. It should be understood that the specific embodiments described herein are intended only to illustrate the present invention and are not intended to limit the present invention. It should also be noted that, for ease of description, the accompanying drawings only illustrate portions relevant to the present invention, not all of its components.
[0043] In the description of this utility model, unless otherwise specified or limited, the terms "connected," "connect," and "fixed" should be understood in a broad sense. For example, they can refer to fixed connection, detachable connection, or integration; mechanical connection or electrical connection; direct connection or indirect connection through an intermediate medium; internal communication between two components or interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in this utility model based on the specific circumstances.
[0044] In the present invention, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature may include the first and second features being in direct contact, or may include the first and second features being in contact not directly but through another feature between them. Moreover, a first feature being "above," "above," and "above" a second feature may include the first feature being directly above or obliquely above the second feature, or may simply mean that the first feature is higher in level than the second feature. A first feature being "below," "below," and "below" a second feature may include the first feature being directly below or obliquely below the second feature, or may simply mean that the first feature is lower in level than the second feature.
[0045] In the description of this embodiment, terms such as "upper," "lower," "right," and "left" are used to refer to positions or locations based on the positions or locations shown in the accompanying drawings. These terms are intended solely to facilitate description and simplify operation, and are not intended to indicate or imply that the devices or components referred to must have, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limitations on this invention. Furthermore, the terms "first" and "second" are used solely for descriptive purposes and have no special meaning.
[0046] It should be noted in advance that in the drawings of this application, a one-way arrow marked X represents a first predetermined horizontal direction, and a two-way arrow marked Y represents a second predetermined horizontal direction. In this embodiment, the first predetermined horizontal direction is parallel to the direction of movement of the product to be electroplated 100, and the first predetermined horizontal direction and the second predetermined horizontal direction are perpendicular to each other.
[0047] Example 1
[0048] This embodiment provides a plating tank structure 200, such as Figures 1 to 2As shown, the electroplating tank structure 200 includes a tank body 210 , a liquid supply device 220 , an ultrasonic generating device 230 and a metal reflective plate 240 .
[0049] The trough body 210 has a plating chamber 2101 therein, and the plating chamber 2101 has an inlet and an outlet at both ends along a first preset horizontal direction, respectively. The product 100 to be electroplated can pass through the inlet and outlet along the first preset horizontal direction through the plating chamber 2101 to complete the electroplating process in the plating chamber 2101. The liquid supply device 220 is disposed in the plating chamber 2101 and can provide plating liquid to the surface to be plated of the product 100 to be electroplated. In this embodiment, the product 100 to be electroplated is a solar cell (hereinafter referred to as a cell), and the plating liquid contains metal ions to be deposited on the cell, such as silver ions, tin ions, copper ions, or a mixture of multiple metal ions. During the electroplating process, the metal ions in the plating liquid are reduced and deposited on the surface to be plated of the cell under the action of electric current, and form conductive grid lines on the surface to be plated of the cell.
[0050] It is understandable that in other embodiments, the product to be electroplated 100 may also be other electronic components such as a PCB board, a wafer, an HDI circuit board, etc., so the present invention does not limit the specific type of the product to be electroplated 100.
[0051] The ultrasonic generator 230 is disposed within the electroplating chamber 2101 and is capable of transmitting ultrasonic waves to the surface of the cell to be plated. The ultrasonic vibration waves can dislodge or break bubbles attached to the surface of the cell to be plated, making the surface to be plated smooth and flat. The electroplating solution can fully contact the surface to be plated, completing the electroplating reaction. Through the above-mentioned electroplating while vibrating reaction process, the metal ions in the electroplating solution can be well deposited on the surface of the cell to be plated, effectively improving the adhesion and uniformity of the electroplating layer, reducing defects such as plating skipping, false disconnection or broken grid caused by poor electroplating uniformity, and improving the plating quality of the cell.
[0052] Accordingly, the ultrasonic generating device 230 is fixedly arranged at the bottom of the electroplating chamber 2101, so that the generated ultrasonic waves can be transmitted simultaneously and evenly to the two surfaces to be plated of the battery cell that are relatively arranged along the second preset horizontal direction, ensuring that the bubbles on the two surfaces to be plated can be effectively removed at the same time, thereby improving the uniformity and effect of electroplating.
[0053] Specifically, in this embodiment, Figure 3As shown, the ultrasonic generating device 230 includes a first ultrasonic generating assembly 231, which includes a first vibration plate 2311, a first vibrator 2312, and a first ultrasonic generator. The first vibration plate 2311 is fixedly mounted at the bottom of the electroplating chamber 2101, the first vibrator 2312 is mounted within the first vibration plate 2311, and the first ultrasonic generator is fixedly mounted on the tank body 210 and connected to the first vibration plate 2311 and the first vibrator 2312, and is used to control the vibration of the first vibrator 2312.
[0054] Through the above-mentioned first ultrasonic generating component, when the battery cell enters the electroplating chamber 2101, the first ultrasonic generator is started and controls the first vibrator 2312 to vibrate mechanically at a fixed frequency in the first vibration plate 2311. At the same time, the liquid supply device 220 is turned on, and the plating liquid is sprayed into the electroplating chamber 2101. The mechanical vibration energy of the first vibrator 2312 in the first vibration plate 2311 is transmitted to the electroplating liquid in the electroplating chamber 2101, and sound waves are formed in the electroplating liquid, generating pressure fluctuations. The pressure fluctuations will further exert pressure on the bubbles attached to the surface to be plated, drive the bubbles out of the surface to be plated or even break the bubbles, thereby achieving the purpose of eliminating bubbles on the surface to be plated.
[0055] More specifically, in this embodiment, referring to Figure 4 As shown, the ultrasonic generating device 230 further includes a second ultrasonic generating assembly 232, which includes a second vibration plate 2321, a second vibrator 2322, and a second ultrasonic generator. The second vibration plate 2321 is fixedly mounted on the bottom of the electroplating chamber 2101, the second vibrator 2322 is mounted within the second vibration plate 2321, and the second ultrasonic generator is fixedly mounted on the tank body 210 and connected to the second vibration plate 2321 and the second vibrator 2322, and is used to control the vibration of the second vibrator 2322. The operating principle of the second ultrasonic generating assembly 232 is the same as that of the first ultrasonic generating assembly 231, and therefore will not be further described in this embodiment.
[0056] It should be noted that the second ultrasonic generating component 232 and the first ultrasonic generating component 231 are arranged along the second preset horizontal direction, so that the ultrasonic generating device 230 can simultaneously send ultrasonic waves to multiple battery cells arranged along the second preset horizontal direction, thereby electroplating multiple battery cells at the same time, effectively improving the electroplating efficiency.
[0057] Furthermore, in this embodiment, when the battery cell is electroplated, the surface to be plated of the battery cell is oriented toward a second preset horizontal direction, and the orientation direction of the surface to be plated is perpendicular to the moving direction of the battery cell, thereby reducing the projection area of the battery cell along the first horizontal preset direction on the horizontal plane, thereby reducing the area occupied by the battery cell in the electroplating chamber 2101, thereby meeting the purpose of the electroplating tank structure 200 to electroplating the same row of battery cells at the same time.
[0058] Furthermore, the ultrasonic generation frequency of the first ultrasonic generating component 231 is different from the ultrasonic generation frequency of the second ultrasonic generating component 232, so that ultrasonic waves of multiple frequencies can be combined to produce a higher frequency sound field, thereby making the first vibration plate 2311 and the second vibration plate 2321 produce stronger vibrations, and forming stronger sound waves and pressure fluctuations in the electroplating solution, thereby significantly enhancing the effect of dispersing or breaking bubbles, resulting in better electroplating effects.
[0059] For example, in this embodiment, referring to Figure 5 As shown, there are 4 first ultrasonic generating components 231 and 6 second ultrasonic generating components 232 in the electroplating chamber 2101. Each first ultrasonic generating component 231 or second ultrasonic generating component 232 corresponds to at least one battery cell to be electroplated, so that the ultrasonic generating device 230 can process at least 10 battery cells at the same time.
[0060] Preferably, in this embodiment, overflow ports are provided on both sides of the electroplating chamber 2101 along the second preset horizontal direction. Considering the characteristic that the fluid flows gradually faster from the middle to both sides along the second preset horizontal direction, the six second ultrasonic generating assemblies 232 are provided in the middle position of the electroplating chamber 2101 ( Figure 5 Only one of the second ultrasonic generating components 232 is indicated in the figure. The four second ultrasonic generating components 232 are arranged in pairs at the side positions of the electroplating chamber 2101, and the ultrasonic generating frequency of the second ultrasonic generating component 232 is lower than the ultrasonic generating frequency of the first ultrasonic generating component 231. For example, in this embodiment, the ultrasonic generating frequency of the second ultrasonic generating component 232 is 28kHz, and the ultrasonic generating frequency of the first ultrasonic generating component 231 is 40kHz. In this way, the processing capacity of the second ultrasonic generating component 232 located in the middle of the electroplating chamber 2101 for the battery cells can be improved, thereby balancing the bubble removal effect on multiple battery cells in the same row in the electroplating chamber 2101.
[0061] In other parallel embodiments, an overflow port can also be set in the middle of the electroplating chamber 2101 along the second preset horizontal direction, so that the ultrasonic generation frequency of the second ultrasonic generating component 232 is correspondingly greater than the ultrasonic generation frequency of the first ultrasonic generating component 231. This can also achieve a balanced effect of removing bubbles on the battery cells in the same row in the electroplating chamber 2101.
[0062] Furthermore, combined Figure 3 and Figure 4 As shown, a plurality of first vibrators 2312 are installed in the first vibration plate 2311, and the plurality of first vibrators 2312 are arranged in a staggered manner along a first preset horizontal direction. A plurality of second vibrators 2322 are installed in the second vibration plate 2321, and the plurality of second vibrators 2322 are arranged in a staggered manner along a second preset horizontal direction. The number of first vibrators 2312 and second vibrators 2322 is not limited in this embodiment, and those skilled in the art may select according to actual circumstances. For example, in this embodiment, 28 first vibrators 2312 are installed in the first vibration plate 2311, and 28 second vibrators 2322 are installed in the second vibration plate 2321.
[0063] With the above settings, refer to Figure 6 As shown, the first vibration plate 2311 can simultaneously send ultrasonic waves to two parallel battery cells through the staggered first vibrators 2312 ( Figure 6 The dashed line in FIG is a schematic diagram illustrating the transmission of ultrasonic waves generated by the first vibrator 2312. Similarly, the second vibrator plate 2321 can simultaneously transmit ultrasonic waves to two parallel battery cells through the staggered second vibrators 2322. In this way, the electroplating tank structure 200 can simultaneously electroplating 20 battery cells, further improving processing efficiency.
[0064] In this embodiment, the above-mentioned metal reflector 240 is fixedly arranged in the electroplating chamber 2101, and through the action of the metal reflector 240, the ultrasonic wave that tends to escape from the electroplating chamber 2101 is reflected back into the electroplating chamber 2101, thereby increasing the propagation area of the ultrasonic wave in the electroplating solution, expanding the effective area of the ultrasonic wave in the electroplating solution, and at the same time reducing the energy loss of the ultrasonic wave, allowing more energy to re-enter the electroplating solution, thereby enhancing the overall efficiency of the ultrasonic wave and improving the ultrasonic wave capability.
[0065] For example, in this embodiment, referring to Figure 7As shown, a metal reflector 240 is provided at the bottom of each first ultrasonic generating assembly 231 and on two opposite sides along the second preset horizontal direction. This ensures that the ultrasonic waves cover the entire treatment area, helps to enhance the focusing effect of the ultrasonic waves generated by the first ultrasonic generating assembly 231, and thus improves the ability to treat bubbles on the surface to be plated. It is understood that in this embodiment, a metal reflector 240 is also provided at the bottom of each second ultrasonic generating assembly 232 and on two opposite sides along the second preset horizontal direction to ensure the treatment effect of the second ultrasonic generating assembly 232 on the battery cell.
[0066] Optionally, in this embodiment, if Figure 2 As shown, along the first horizontal preset direction, the tank body 210 includes three electroplating chambers 2101. The structural layout of each electroplating chamber 2101 is the same. By increasing the number of electroplating chambers 2101, the electroplating process of the electroplating tank structure 200 on the cell is increased, ensuring that the resulting cell has a higher grid line manufacturing quality. Preferably, the ultrasonic wave generating device 230 in each electroplating chamber 2101 has a different ultrasonic wave generating frequency, so that the ultrasonic wave generating device 230 can match the corresponding bubble processing capacity at different electroplating stages, thereby improving the coating quality and electroplating effect.
[0067] Example 2
[0068] Combine Figures 1 to 2 As shown, the purpose of this embodiment is to provide an electroplating device, which includes a conveying device and the above-mentioned electroplating tank structure 200. Among them, along the first preset horizontal direction, the conveying device can drive the product to be electroplated 100 to move in the electroplating tank structure 200, and the liquid supply device 220 of the electroplating tank structure 200 is used to provide electroplating liquid to the surface to be plated with the electroplated product. Optionally, in this embodiment, the liquid supply device 220 is installed at the bottom of the electroplating chamber 2101 of the electroplating tank structure 200, and can be moved from the bottom to the top (refer to Figure 5 The electroplating solution is sprayed toward the cell in the direction indicated by the dotted arrow in the middle) so that the electroplating solution can pass through the surface to be plated. Therefore, the metal ions in the electroplating solution can be more evenly covered on the surface to be plated, avoiding the situation of uneven coating thickness.
[0069] Accordingly, refer to Figure 8 As shown, a plurality of liquid inlet holes 241 are provided through the metal reflective plate 240 located at the bottom of the ultrasonic generating device 230. The provision of the liquid inlet holes 241 allows the electroplating liquid to be evenly and smoothly injected from bottom to top onto the battery cell, which not only ensures that the electroplating liquid is stable so that the ultrasonic capacity can be best exerted, but also allows the fresh electroplating liquid injected from the liquid inlet holes 241 to act on the battery cell in time, thereby effectively improving the electroplating capacity.
[0070] It should be noted that in this embodiment, the electroplating equipment is a vertical electroplating equipment, which provides electroplating treatment for cells requiring vertical electroplating. Of course, in other embodiments, a horizontal electroplating equipment with a horizontal electroplating process can be selected depending on the orientation of the cell during electroplating, and the present invention is not limited to this.
[0071] Since the above-mentioned electroplating equipment is provided with the above-mentioned electroplating tank structure 200, the electroplating tank structure 200 can eliminate or break the bubbles attached to the surface to be plated of the battery cell through the action of the ultrasonic generator 230, so that the electroplating liquid can completely contact the surface to be plated, thereby effectively improving the electroplating quality of the electroplating equipment.
[0072] Specifically, in this embodiment, combined with Figure 1 、 Figure 2 As shown, the electroplating tank structure 200 includes a first electroplating tank 201 and several second electroplating tanks 202. Along the first preset horizontal direction, the first electroplating tank 201 is located upstream of the second electroplating tank 202. The first electroplating tank 201 and the second electroplating tank 202 both include a tank body 210 of the electroplating tank structure 200 and a liquid supply device 220, so that the first electroplating tank 201 and the second electroplating tank 202 can electroplating the battery cells in sequence. Those skilled in the art can adjust the number of second electroplating tanks 202 according to actual needs, or adjust the number of tank bodies 210 in the second electroplating tank 202 to achieve different degrees of plating thickness effects on the battery cells. For example, in this embodiment, the electroplating tank structure 200 includes a second electroplating tank 202, and the second electroplating tank 202 includes at least three tank bodies 210 connected in sequence.
[0073] In addition, it is also worth noting that the electroplating equipment only has an ultrasonic generator 230 in the tank body 210 of the first electroplating tank 201, and no ultrasonic generator 230 is set in the second electroplating tank 202, thereby ensuring that the battery cell can reach the best electroplating state before entering the subsequent electroplating process under the condition of controlling costs.
[0074] Throughout this specification, references to terms such as "some embodiments" and "other embodiments" indicate that the specific features, structures, materials, or characteristics described in conjunction with that embodiment or example are included in at least one embodiment or example of the present invention. In this specification, schematic representations of these terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
[0075] Obviously, the above-described embodiments of the present invention are merely examples for the purpose of clearly illustrating the present invention and are not intended to limit the manner in which the present invention is to be implemented. A person skilled in the art would be able to make various obvious changes, readjustments, and substitutions without departing from the scope of protection of the present invention. It is not necessary and impossible to enumerate all embodiments here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention shall be included within the scope of protection of the claims of the present invention.
Claims
1. Electroplating tank structure, characterized in that, include: A tank body (210), the tank body (210) having an electroplating cavity (2101), the electroplating cavity (2101) being used to contain an electroplating solution; a liquid supply device (220), the liquid supply device (220) being arranged in the electroplating chamber (2101) and being used to supply electroplating liquid to the surface to be plated of the product to be electroplated (100); An ultrasonic wave generating device (230) is arranged in the electroplating chamber (2101) and is used to send ultrasonic waves to the surface to be plated of the product to be electroplated (100).
2. The electroplating tank structure according to claim 1, characterized in that: The ultrasonic generating device (230) is fixedly mounted on the bottom of the electroplating chamber (2101).
3. The electroplating tank structure according to claim 2, characterized in that: The ultrasonic generating device (230) includes a first ultrasonic generating component (231) and a second ultrasonic generating component (232) arranged in parallel along a second preset horizontal direction, the second ultrasonic generating component (232) is arranged in the middle area of the bottom of the groove, and the first ultrasonic generating component (231) is arranged on both sides of the second ultrasonic generating component (232); the ultrasonic generating frequency of the first ultrasonic generating component (231) and the ultrasonic generating frequency of the second ultrasonic generating component (232) are different.
4. The electroplating tank structure according to claim 3, characterized in that: Overflow ports are provided on both sides of the electroplating chamber (2101) along the second preset horizontal direction, and the ultrasonic generation frequency of the second ultrasonic generation component (232) is lower than the ultrasonic generation frequency of the first ultrasonic generation component (231); Alternatively, an overflow port is provided in the middle of the electroplating chamber (2101) along the second preset horizontal direction, and the ultrasonic generation frequency of the second ultrasonic generating component (232) is greater than the ultrasonic generation frequency of the first ultrasonic generating component (231).
5. The electroplating tank structure according to claim 1, characterized in that: The ultrasonic generating device (230) comprises a first ultrasonic generating assembly (231), the first ultrasonic generating assembly (231) comprising a first vibration plate (2311), a first vibrator (2312) and a first ultrasonic generator, the first vibration plate (2311) being fixedly arranged on the bottom of the electroplating chamber (2101), the first vibrator (2312) being installed in the first vibration plate (2311), the first ultrasonic generator being fixedly arranged on the tank body (210) and connected to the first vibration plate (2311) and the first vibrator (2312), and being used to control the vibration of the first vibrator (2312); The ultrasonic generating device (230) further comprises a second ultrasonic generating assembly (232), the second ultrasonic generating assembly (232) comprising a second vibration plate (2321), a second vibrator (2322) and a second ultrasonic generator, the second vibration plate (2321) being fixedly mounted on the bottom of the electroplating chamber (2101), the second vibrator (2322) being installed in the second vibration plate (2321), the second ultrasonic generator being fixedly mounted on the tank body (210) and connected to the second vibration plate (2321) and the second vibrator (2322), and being used to control the vibration of the second vibrator (2322); A plurality of the first vibrators (2312) are installed in the first vibrating plate (2311), and the plurality of the first vibrators (2312) are arranged in a staggered manner along a second preset horizontal direction; and / or a plurality of the second vibrators (2322) are installed in the second vibrating plate (2321), and the plurality of the second vibrators (2322) are arranged in a staggered manner along the second preset horizontal direction; The first preset horizontal direction is set as the moving direction of the product to be electroplated (100), the second preset horizontal direction is set as the arrangement direction of the first ultrasonic generating component (231) and the second ultrasonic generating component (232), and the first preset horizontal direction and the second preset horizontal direction are perpendicular to each other.
6. The electroplating tank structure according to claim 1, characterized in that: The electroplating chamber (2101) is provided with a plurality of ultrasonic wave generating devices (230) along a first preset horizontal direction, and the ultrasonic wave generating frequency of each of the electroplating chambers (2101) is different, so that the ultrasonic wave generating device (230) can match the corresponding bubble processing capacity in different electroplating stages; The first preset horizontal direction is set as the moving direction of the product (100) to be electroplated.
7. The electroplating tank structure according to any one of claims 1 to 6, characterized in that: The electroplating tank structure (200) further comprises a metal reflector (240) arranged on one side of the ultrasonic generating device (230); the metal reflector (240) is fixed in the electroplating chamber (2101) and is used to reflect ultrasonic waves that tend to escape from the electroplating chamber (2101) back into the electroplating chamber (2101).
8. The electroplating tank structure according to claim 7, characterized in that: The metal reflection plate (240) is provided at the bottom of the ultrasonic generating device (230) and at least two opposite sides of the ultrasonic generating device (230).
9. Electroplating equipment, characterized in that, A plating tank structure (200) comprising a conveying device and any one of claims 1 to 8; The conveying device can drive the product to be electroplated (100) to move in the electroplating tank structure (200) along a first preset horizontal direction, and the liquid supply device (220) of the electroplating tank structure (200) is used to provide electroplating liquid to the surface to be plated of the product to be electroplated (100); The first preset horizontal direction is set as the moving direction of the product (100) to be electroplated.
10. The electroplating equipment according to claim 9, characterized in that: The electroplating tank structure (200) comprises a first electroplating tank (201) and a plurality of second electroplating tanks (202); along the first preset horizontal direction, the first electroplating tank (201) is located upstream of the plurality of second electroplating tanks (202); the first electroplating tank (201) and the second electroplating tank (202) are both provided with a tank body (210) and a liquid supply device (220) of the electroplating tank structure (200); and the tank body (210) of the first electroplating tank (201) is provided with an ultrasonic generating device (230) of the electroplating tank structure (200).