Vacuum chamber
By setting air inlet plates and air guide devices on both sides of the vacuum chamber, the pressure difference problem when the silicon wafer is restored to atmospheric pressure from vacuum is solved, uniform pressure distribution of the workpiece is achieved, deformation or breakage of the silicon wafer is avoided, and production quality is improved.
Patent Information
- Application Number
- CN202422205905.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-09
- Publication Date
- 2025-09-19
- Estimated Expiration
- 2034-09-09
AI Technical Summary
When existing coating equipment returns to atmospheric pressure from a vacuum state, the difference in airflow between the upper and lower surfaces of the silicon wafer causes a large pressure difference, which can easily cause the silicon wafer to deform or break, affecting production quality.
A vacuum chamber is designed. A left air inlet plate and a right air inlet plate are arranged on both sides of the chamber. A gas guide device is used to guide the gas to the upper distribution air duct and the lower distribution air duct, so that the gas enters the chamber evenly and avoids pressure difference on the workpiece surface.
The surface pressure of the workpiece is uniformed, deformation or breakage of the silicon wafer is avoided, and production quality is improved.
Smart Images

Figure CN223357739U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of vacuum coating, in particular to a vacuum chamber. Background Art
[0002] In existing coating equipment, the coating chamber provides a vacuum environment for coating silicon wafers and glass. After coating is complete, the chamber breaks the vacuum and transforms into a standard atmospheric environment. Finished silicon wafers are transported out of the chamber, and new wafers awaiting coating are transported into the chamber to achieve continuous production. During the vacuum break, silicon wafers are very sensitive to airflow under high vacuum conditions. Related technologies use methods that directly deliver gas to the top or bottom of the wafer, resulting in large flow and pressure differences between the upper and lower surfaces. This creates a significant pressure differential between the upper and lower surfaces, easily causing the wafer to deform or even break, impacting production quality. Therefore, a new vacuum chamber is needed to prevent damage to workpieces within the chamber when the chamber returns from a vacuum state to atmospheric pressure. Utility Model Content
[0003] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, the present invention provides a vacuum chamber that can prevent workpieces in the chamber from being damaged when the chamber returns from a vacuum state to an atmospheric pressure state.
[0004] The vacuum chamber according to the embodiment of the first aspect of the present invention includes: a shell, a sealed cavity is provided on the shell; a gas conveying device, the gas conveying device is used to convey gas into the sealed cavity or discharge the gas in the sealed cavity; an upper air distribution plate and a lower air distribution plate, the upper air distribution plate and the lower air distribution plate are both provided with through holes, the upper air distribution plate and the top surface of the sealed cavity limit the upper air distribution flow channel, the lower air distribution plate and the bottom surface of the sealed cavity limit the lower air distribution flow channel, and the upper air distribution plate and the lower air distribution plate are used to place a workpiece; a left air inlet plate and a right air inlet plate, the left air inlet plate is provided in the sealed cavity On the first side, the right air intake plate is arranged on the second side of the sealed cavity, the first side and the second side are arranged opposite to each other, and air intake holes are provided on the left air intake plate and the right air intake plate, and the gas delivery device is connected to the sealed cavity through the air intake holes; an air guide device, the air guide device includes a left air guide part and a right air guide part, the left air guide part is arranged on the side of the left air intake plate facing away from the first side, and the right air guide part is arranged on the side of the right air intake plate facing away from the second side, and the air guide device guides the gas entering the sealed cavity through the air intake hole to the upper distribution air duct and the lower distribution air duct.
[0005] The vacuum chamber according to the embodiment of the first aspect of the present invention has at least the following beneficial effects: after the gas is delivered into the cavity by the gas delivery device, the gas enters from two sides of the chamber and is guided by the gas guide device, so that the gas enters the upper and lower air distribution ducts at the same time, and enters the cavity through the through holes on the upper and lower air distribution plates at the same time, thereby avoiding a pressure difference on the downward surface of the workpiece between the upper and lower air distribution plates, thereby avoiding damage to the workpiece in the cavity.
[0006] According to some embodiments of the present invention, the left air guide portion includes an upper air guide plate and a lower air guide plate. A portion of the gas entering the sealed cavity through the air inlet hole enters the upper air distribution flow duct through the guidance of the upper air guide plate, and a portion of the gas entering the sealed cavity through the air inlet hole enters the lower air distribution flow duct through the guidance of the lower air guide plate.
[0007] According to some embodiments of the present invention, there is a gap between the upper air guide plate and the lower air guide plate.
[0008] According to some embodiments of the present invention, the first side surface and the left air intake plate jointly define a left air intake cavity, the second side surface and the right air intake plate jointly define a right air intake cavity, and the gas delivery device is connected to the left air intake cavity and the right air intake cavity.
[0009] According to some embodiments of the present invention, several conveying devices are also included, one end of the conveying device is arranged on the first side surface, and the other end of the conveying device is arranged on the second side surface, the conveying device passes through the left air intake plate, the right air intake plate, the left air guide portion and the right air guide portion, a left sleeve is arranged between the first side surface and the left air intake plate, and the left sleeve is sleeved on the conveying device; a right sleeve is arranged between the second side surface and the right air intake plate, and the right sleeve is sleeved on the conveying device.
[0010] According to some embodiments of the present invention, the left air inlet cavity and the right air inlet cavity are spaced apart from the fourth side surface in the sealed cavity, a door is provided on the fourth side surface, and an air inlet hole is provided at one end of the left air inlet cavity and the right air inlet cavity close to the fourth side surface.
[0011] According to some embodiments of the present invention, the gas delivery device includes at least one flow channel and a gas delivery mechanism, the first flow channel connects the left air inlet cavity and the right air inlet cavity, the second flow channel connects the left air inlet cavity and the right air inlet cavity, and the gas delivery mechanism delivers gas to the first flow channel and the second flow channel.
[0012] According to some embodiments of the present invention, the left gas supply mechanism includes: the diameter of the first pipeline is smaller than the diameter of the second pipeline; the right gas supply mechanism includes a third pipeline and a fourth pipeline; the diameter of the third pipeline is smaller than the diameter of the fourth pipeline; and right valves are provided on the first pipeline, the second pipeline, the third pipeline and the fourth pipeline.
[0013] According to some embodiments of the present utility model, the gas transmission mechanism also includes a gas storage tank and a pressure reducing valve, the gas storage tank is used to store gas, the input end of the pressure reducing valve is connected to the gas storage tank, the output end of the pressure reducing valve is connected to the first pipeline, the second pipeline, the third pipeline and the fourth pipeline, and the pressure reducing valve is used to reduce the pressure of the gas passing through.
[0014] According to some embodiments of the present invention, the gas delivery device further includes an exhaust mechanism, which is used to exhaust the gas in the sealed cavity.
[0015] Additional aspects and advantages of the present invention will be given in part in the following description and will become apparent from the following description or learned through practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] Figure 1 This is a schematic diagram of the overall structure of the vacuum chamber of the present invention;
[0017] Figure 2 This is a schematic structural diagram of a gas delivery device for a vacuum chamber of the present invention;
[0018] Figure 3 This is a schematic diagram of the explosion structure of the vacuum chamber of the present utility model;
[0019] Figure 4 for Figure 3 A partial enlarged schematic diagram;
[0020] Figure 5 This is a schematic structural diagram of the right air inlet cavity of the vacuum chamber of the present invention;
[0021] Figure 6 This is a schematic cross-sectional view of the shell of the vacuum chamber of the present invention;
[0022] Figure 7 for Figure 6 A partial enlarged schematic diagram.
[0023] Figure Number:
[0024] 1. Shell; 11. Sealed cavity; 12. First side; 13. Second side; 14. Third side; 15. Fourth side; 2. Gas delivery device; 21. First flow channel; 22. Second flow channel; 23. Gas delivery mechanism; 231. First pipeline; 232. Second pipeline; 233. Third pipeline; 234. Fourth pipeline; 235. Gas storage tank; 236. Pressure reducing valve; 237. Gas valve ;24. Exhaust mechanism;25. Butterfly valve;3. Air guide device;31. Left air guide part;32. Right air guide part;33. Upper air guide plate;34. Lower air guide plate;41. Left air intake plate;42. Right air intake plate;43. Air intake hole;44. Left air intake cavity;45. Right air intake cavity;51. Upper air distribution plate;52. Lower air distribution plate;53. Through hole;54. Upper air distribution flow duct;55. Lower air distribution flow duct;6. Right sleeve. DETAILED DESCRIPTION
[0025] The following describes embodiments of the present invention in detail. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended only to explain the present invention and are not to be construed as limiting the present invention.
[0026] In the description of the present invention, it should be understood that descriptions involving orientation, such as the orientation or positional relationship indicated by up, down, etc., are based on the orientation or positional relationship shown in the accompanying drawings, which is only for the convenience of describing the present invention and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.
[0027] In the description of this utility model, "a plurality" means more than two. The use of "first" or "second" is solely for the purpose of distinguishing technical features and should not be construed as indicating or implying relative importance, or implicitly indicating the number of technical features indicated, or implicitly indicating the order of the technical features indicated.
[0028] In the description of the present invention, unless otherwise clearly defined, terms such as setting, installing, and connecting should be understood in a broad sense, and technicians in the relevant technical field can reasonably determine the specific meanings of the above terms in the present invention based on the specific content of the technical solution.
[0029] Reference Figure 1 、 Figure 2 and Figure 3The vacuum chamber in the first embodiment of the present invention includes: a shell 1, a gas delivery device 2, a gas guide device 3, a left air inlet plate 41, a right air inlet plate 42, an upper air distribution plate 51 and a lower air distribution plate 52. A sealed cavity 11 is provided on the shell 1; the gas delivery device 2 is used to deliver gas into the sealed cavity 11 or to discharge the gas in the sealed cavity 11. After the workpiece is placed in the sealed cavity 11 and before the workpiece is coated, the gas in the sealed cavity 11 needs to be discharged, that is, a vacuum environment is formed in the sealed cavity 11. After the workpiece is processed, the vacuum environment in the sealed cavity 11 needs to be restored to the standard atmospheric environment before the workpiece is taken out, that is, gas is delivered into the sealed cavity 11.
[0030] Both the upper and lower air distribution plates 51 and 52 are provided with through-holes 53. The upper air distribution plate 51 and the top surface of the sealed chamber 11 define an upper air distribution duct 54, while the lower air distribution plate 52 and the bottom surface of the sealed chamber 11 define a lower air distribution duct 55. The space between the upper and lower air distribution plates 51 and 52 is used to position the workpiece. After processing the workpiece, when the vacuum environment within the sealed chamber 11 is restored to standard atmospheric conditions, uneven gas flow within the sealed chamber 11 can easily lead to a large pressure differential across the workpiece. Some workpiece materials, such as silicon wafers and glass, are relatively fragile. Such pressure differentials can cause the workpiece to deform or even break, thus affecting production quality. Therefore, the upper and lower air distribution plates 51 and 52 are configured so that gas flows through the upper and lower air distribution ducts 54 and 55 simultaneously, entering the space between the upper and lower air distribution plates 51 and 52 through the through-holes 53. This ensures consistent pressure across the workpiece, preventing problems such as workpiece displacement, deformation, or breakage.
[0031] The left air intake plate 41 is arranged on the first side surface 12 in the sealed cavity 11, and the right air intake plate 42 is arranged on the second side surface 13 in the sealed cavity 11. The first side surface 12 and the second side surface 13 are arranged opposite to each other. Air intake holes 43 are provided on the left air intake plate 41 and the right air intake plate 42, and the gas conveying device 2 is connected to the sealed cavity through the air intake holes 43; the air guide device 3 includes a left air guide portion 31 and a right air guide portion 32. The left air guide portion 31 is arranged on the side of the left air intake plate 41 facing away from the first side surface 12, and the right air guide portion 32 is arranged on the side of the right air intake plate 42 facing away from the second side surface 13. The air guide device 3 guides the gas entering the sealed cavity 11 through the air intake hole 43 to the upper distribution air duct 54 and the lower distribution air duct 55. In order to allow the gas to enter the sealed cavity 11 more evenly, air is simultaneously introduced into the sealed cavity 11 through the air inlet holes 43 provided on the left air inlet plate 41 and the right air inlet plate 42 on both sides of the sealed cavity 11. After passing through the left air inlet plate 41 and the right air inlet plate 42, the gas is guided by the air guide device 3 into the upper air distribution duct 54 and the lower air distribution duct 55. Specifically, the gas passing through the air inlet holes 43 on the left air inlet plate 41 is guided by the left air guide portion 31 into the upper air distribution duct and the lower air distribution duct respectively, and is filled into the sealed cavity 11 through the through holes 53. The right air guide portion 32 is arranged in the same manner. The through holes 53 are evenly distributed on the upper air distribution plate 51 and the lower air distribution plate 52, so that the air pressure changes in the sealed cavity 11 are more uniform. There are various ways for gas to pass through the air inlet holes 43. Taking the left air inlet plate 41 as an example, the left air inlet plate 41 and the first side surface 12 within the sealed cavity 11 jointly define a sealed cavity. Gas is injected into the cavity, thereby allowing the gas to enter the sealed cavity 11 through the air inlet holes 43. Alternatively, an air inlet pipe can be connected to each air inlet hole to deliver gas to the air inlet holes 43 through the air inlet pipe.
[0032] According to some embodiments of the present invention, the left air guide portion 31 includes an upper air guide plate 33 and a lower air guide plate 34. A portion of the gas entering the sealed cavity 11 through the air inlet hole 43 is guided by the upper air guide plate 33 into the upper distribution air duct 54, while a portion of the gas entering the sealed cavity 11 through the air inlet hole 43 is guided by the lower air guide plate 34 into the lower distribution air duct 55. By configuring the left air guide portion 31 with the upper air guide plate 33 and the lower air guide plate 34, a portion of the gas passing through the air inlet hole 43 of the left air inlet plate 41 is blocked by the upper air guide plate 33 and guided into the upper distribution air duct 54. The gas then passes through the through-holes 53 of the upper air distribution plate 51 and enters the space between the upper and lower air distribution plates 51 and 52. Meanwhile, a portion of the gas passing through the air inlet hole 43 of the left air inlet plate 41 is blocked by the lower air guide plate 34 and guided into the lower distribution air duct 55. The gas then passes through the through-holes 53 of the lower air distribution plate 52 and enters the space between the upper and lower air distribution plates 51 and 52. Thereby, the upper and lower pressures of the workpiece rise synchronously to avoid damage to the workpiece due to pressure difference. Furthermore, there is a gap between the upper air guide plate 33 and the lower air guide plate 34. A portion of the gas passing through the air inlet hole 43 on the left air inlet plate 41 enters the sealed cavity 11 through the gap between the upper air guide plate 33 and the lower air guide plate 34, so that the pressure in the sealed cavity 11 rises synchronously. Furthermore, a balancing through hole 53 is opened on the upper side of the left air inlet plate 41 to prevent the gas from impacting the upper part of the left air inlet plate 41 and the cover plate of the sealed cavity 11. When setting the left air guide part 31, the left air guide part 31 can be set as an integral air guide plate, but in order to facilitate maintenance and disassembly of the equipment, the left air guide part 31 is set into an upper air guide plate 33 and a lower air guide plate 34.
[0033] When arranging the air inlet holes 43 on the left air inlet plate 41, they are arranged in six rows, two of which are located at the top of the left air inlet plate 41 and two at the bottom. This allows air to better enter the upper and lower distribution air ducts 54 and 55. Two of the rows are located in the center of the left air inlet plate 41. These two rows of air inlet holes 43 in the center of the left air inlet plate 41 are staggered with the gap between the upper and lower air guide plates 33 and 34, preventing air passing through the two rows of air inlet holes 43 from being directly blown into the gap between the upper and lower air guide plates 33 and 34. This means that air in one of the two rows of air inlet holes 43 in the center of the left air inlet plate 41 will be blocked and guided by the upper air guide plate 33, while air in the other row of air inlet holes 43 will be blocked and guided by the lower air guide plate 34. When placing the workpiece into the sealed cavity 11, the workpiece will be placed in the tray first, and the side of the tray can block the airflow from moving directly forward, similar to a windshield. The windshield will block the gas blown out from the gap between the upper air guide plate 33 and the lower air guide plate 34, so the gas blown out from here will not blow to the workpiece, and will not cause damage to the workpiece.
[0034] According to some embodiments of the present invention, the first side surface 12 and the left air inlet plate 41 jointly define a left air inlet cavity 44, the second side surface 13 and the right air inlet plate 42 jointly define a right air inlet cavity 45, and the gas delivery device 2 is connected to the left air inlet cavity 44 and the right air inlet cavity 45. Taking the left air inlet plate 41 as an example, after the left air inlet cavity 44 is formed by the left air inlet plate 41 and the first side surface 12, gas can more evenly enter the sealed cavity 11 through the air inlet holes 43 on the left air inlet plate 41.
[0035] According to some embodiments of the present invention, a plurality of conveying devices are further included, one end of the conveying device is arranged on the first side surface 12, and the other end of the conveying device is arranged on the second side surface 13. The conveying device passes through the left air intake plate 41, the right air intake plate 42, the left air guide portion 31, and the right air guide portion 32. A left sleeve is arranged between the first side surface 12 and the left air intake plate 41, and the left sleeve is mounted on the conveying device; a right sleeve 6 is arranged between the second side surface 13 and the right air intake plate 42, and the right sleeve 6 is mounted on the conveying device. In order to facilitate the placement of the workpiece in the sealed cavity 11, the workpiece can be transported to the interior of the sealed cavity 11 by the conveying device. Specifically, the conveying device can be set as a plurality of conveying rollers, and the workpiece is conveyed by the rotation of the conveying rollers.
[0036] According to some embodiments of the present invention, the left air inlet cavity 44 and the right air inlet cavity 45 are each spaced apart from the fourth side surface 15 in the sealed cavity 11. A door is provided on the fourth side surface 15, and air inlet holes 43 are provided at one end of the left air inlet cavity 44 and the right air inlet cavity 45 near the fourth side surface 15. On the side of the left air inlet cavity 44 and the right air inlet cavity 45 near the door, since a valve device is provided near the door, which occupies more space, air inlet holes 43 are also provided at the end of the left air inlet cavity 44 and the right air inlet cavity 45 near the door. Providing more air inlet holes 43 here allows for faster delivery of gas into the sealed cavity 11, thereby shortening the time it takes to break through the air.
[0037] According to some embodiments of the present invention, the gas delivery device 2 includes at least one flow channel and a gas delivery mechanism 23. Specifically, in order to make the airflow more dispersed and uniform, and to avoid excessive concentration of the airflow and damage to the silicon wafer, two flow channels are provided, namely a first flow channel 21 and a second flow channel 22. The first flow channel 21 connects the left air inlet cavity 44 and the right air inlet cavity 45, and the second flow channel 22 connects the left air inlet cavity 44 and the right air inlet cavity 45. The gas delivery mechanism 23 delivers gas to the first flow channel 21 and the second flow channel 22. By providing the first flow channel 21 and the second flow channel 22, the pressure changes in the left air inlet cavity 44 and the right air inlet cavity 45 are more consistent, avoiding a pressure difference between the left air inlet cavity 44 and the right air inlet cavity 45. In application, more flow channels can also be provided to disperse the airflow according to actual conditions.
[0038] According to some embodiments of the present invention, the left gas supply mechanism 23 includes a first pipeline 231 having a smaller diameter than the second pipeline 232. The right gas supply mechanism 23 includes a third pipeline 233 and a fourth pipeline 234, wherein the third pipeline 233 has a smaller diameter than the fourth pipeline 234. Right valves are provided on each of the first pipeline 231, the second pipeline 232, the third pipeline 233, and the fourth pipeline 234. Taking the left gas supply mechanism 23 as an example, during the air venting process, which is the process of restoring the vacuum environment within the sealed chamber 11 to a standard atmospheric environment, gas needs to be introduced into the sealed chamber 11 at a relatively slow rate to avoid significant pressure shock to the workpiece. The second pipeline 232 is opened to continue introducing gas only after the pressure within the sealed chamber 11 reaches a certain level. This allows for a buffering period for the pressure within the chamber, further reducing the impact of pressure fluctuations within the sealed chamber 11 on the workpiece.
[0039] According to some embodiments of the present invention, the gas delivery mechanism 23 further includes a gas tank 235 and a pressure reducing valve 236. The gas tank 235 is used to store gas. The input end of the pressure reducing valve 236 is connected to the gas tank 235, and the output end of the pressure reducing valve 236 is connected to the first pipeline 231, the second pipeline 232, the third pipeline 233, and the fourth pipeline 234. The pressure reducing valve 236 is used to reduce the pressure of the gas passing through. When delivering gas to the sealed cavity 11, the gas can be directly obtained from the atmosphere or from the gas tank 235 and then delivered to the sealed cavity 11. To improve the processing quality of the workpiece and prevent impurities in the gas, the gas tank 235 is used to store purer gas. Furthermore, to reduce the pressure of the gas entering the sealed cavity 11, the pressure reducing valve 236 is provided, so that the gas pressure decreases when passing through the pressure reducing valve 236.
[0040] According to some embodiments of the present invention, the gas delivery device 2 further includes an exhaust mechanism 24, which is used to exhaust the gas in the sealed cavity 11. When it is necessary to restore the sealed cavity 11 to a vacuum state, the gas in the sealed cavity 11 is exhausted through the exhaust mechanism 24. The specific exhaust mechanism 24 includes an exhaust pump, a compression pipe and a butterfly valve 25, wherein the compression pipe connects the sealed cavity 11 and the external environment, and the butterfly valve 25 is provided on the compression pipe. When the sealed cavity 11 is restored to a vacuum state, the butterfly valve 25 on the compression pipe is opened, and the exhaust pump extracts the gas in the sealed cavity 11 through the compression pipe, and the butterfly valve 25 is closed after completion.
[0041] The embodiments of the present invention are described in detail above with reference to the accompanying drawings. However, the present invention is not limited to the above embodiments. Various changes can be made within the scope of knowledge possessed by ordinary technicians in the relevant technical field without departing from the purpose of the present invention.
Claims
1. A vacuum chamber, characterized in that: include: a housing, wherein a sealed cavity is provided on the housing; a gas delivery device, the gas delivery device being used to deliver gas into the sealed cavity or to discharge gas from the sealed cavity; An upper air distribution plate and a lower air distribution plate, each of which is provided with a through hole, wherein the upper air distribution plate and the top surface of the sealed cavity define an upper air distribution flow channel, and the lower air distribution plate and the bottom surface of the sealed cavity define a lower air distribution flow channel, and a workpiece is placed between the upper air distribution plate and the lower air distribution plate; a left air intake plate and a right air intake plate, wherein the left air intake plate is arranged on a first side surface within the sealed cavity, and the right air intake plate is arranged on a second side surface within the sealed cavity, the first side surface and the second side surface are arranged opposite to each other, and air intake holes are formed on both the left air intake plate and the right air intake plate, and the gas delivery device is connected to the sealed cavity through the air intake holes; An air guide device, the air guide device includes a left air guide portion and a right air guide portion, the left air guide portion is arranged on the side of the left air intake plate facing away from the first side surface, and the right air guide portion is arranged on the side of the right air intake plate facing away from the second side surface, and the air guide device guides the gas entering the sealed cavity through the air intake hole into the upper distribution air duct and the lower distribution air duct.
2. The vacuum chamber according to claim 1, wherein: The left air guide part includes an upper air guide plate and a lower air guide plate. A portion of the gas entering the sealed cavity through the air inlet hole enters the upper air distribution flow duct through the guidance of the upper air guide plate, and a portion of the gas entering the sealed cavity through the air inlet hole enters the lower air distribution flow duct through the guidance of the lower air guide plate.
3. The vacuum chamber according to claim 2, wherein: There is a gap between the upper air guide plate and the lower air guide plate.
4. The vacuum chamber according to claim 1, wherein: The first side surface and the left air intake plate jointly define a left air intake cavity, the second side surface and the right air intake plate jointly define a right air intake cavity, and the gas delivery device is connected to the left air intake cavity and the right air intake cavity.
5. The vacuum chamber according to claim 4, wherein: It also includes several conveying devices, one end of the conveying device is arranged on the first side surface, and the other end of the conveying device is arranged on the second side surface. The conveying device passes through the left air intake plate, the right air intake plate, the left air guide part and the right air guide part. A left sleeve is arranged between the first side surface and the left air intake plate, and the left sleeve is sleeved on the conveying device; a right sleeve is arranged between the second side surface and the right air intake plate, and the right sleeve is sleeved on the conveying device.
6. The vacuum chamber according to claim 4, wherein: The left air inlet cavity and the right air inlet cavity are both spaced apart from the fourth side surface in the sealed cavity. A door is provided on the fourth side surface. An air inlet hole is provided at one end of the left air inlet cavity and the right air inlet cavity close to the fourth side surface.
7. The vacuum chamber according to claim 4, wherein: The gas delivery device includes at least one flow channel and a gas delivery mechanism, the flow channel is connected to the left air inlet cavity and the right air inlet cavity, and the gas delivery mechanism delivers gas to the flow channel.
8. The vacuum chamber according to claim 7, wherein: The gas transmission mechanism includes a first pipeline, a second pipeline, a third pipeline and a fourth pipeline. The diameter of the first pipeline is smaller than that of the second pipeline, the diameter of the third pipeline is smaller than that of the fourth pipeline, and valves are provided on the first pipeline, the second pipeline, the third pipeline and the fourth pipeline.
9. The vacuum chamber according to claim 8, wherein: The gas transmission mechanism also includes a gas storage tank and a pressure reducing valve. The gas storage tank is used to store gas. The input end of the pressure reducing valve is connected to the gas storage tank. The output end of the pressure reducing valve is connected to the first pipeline, the second pipeline, the third pipeline and the fourth pipeline. The pressure reducing valve is used to reduce the pressure of the gas passing through.
10. The vacuum chamber according to claim 1, wherein: The gas delivery device further comprises an exhaust mechanism, which is used to exhaust the gas in the sealed cavity.