Simple quartz bracket for laboratory
By designing a simple quartz bracket, the problems of limited area and difficult substrate fixation in hydrothermal deposition reactions were solved, the reaction efficiency and stability were improved, and the substrate fixation and support process was simplified.
Patent Information
- Application Number
- CN202421987715.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-15
- Publication Date
- 2025-09-23
- Estimated Expiration
- 2034-08-15
AI Technical Summary
The hydrothermal deposition reaction area is limited by the size of the bottom of the reactor, the reaction efficiency is not high, and the fixation and support of the reaction substrate are challenging in the hydrothermal reaction, affecting the effectiveness and efficiency of the reaction.
A simple quartz stand for laboratory use is designed, comprising a first side plate and a second side plate. Both side plates are provided with grooves and a limit assembly. A support plate is connected to the columnar quartz through the limit assembly. The position of the support plate is adjusted using a spring and a limit plate to increase the reaction area and stability.
The support structure is simplified, the material cost is reduced, the efficiency and stability of the hydrothermal deposition reaction are improved, the reaction area is increased, and the substrate fixing and supporting process is simplified.
Smart Images

Figure CN223366910U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of brackets, in particular to a simple quartz bracket for laboratories. Background Art
[0002] Hydrothermal deposition is a chemical reaction that uses hydrothermal conditions to deposit a solid product in a solution. This reaction is usually carried out under high temperature and high pressure, using water as the solvent. The morphology, size, and structure of the deposited product can be controlled by adjusting conditions such as temperature, pressure, solution composition, and reaction time. The hydrothermal deposition reaction is relatively simple to operate under hydrothermal conditions. Usually, it is only necessary to mix and dissolve the reactants in water and then react under high temperature and high pressure. Hydrothermal deposition reactions usually have high yields and are conducive to the large-scale preparation of various nanomaterials and nanostructures. By adjusting the reaction conditions, a variety of deposition products with different morphologies, sizes, and structures can be synthesized, such as nanoparticles, nanowires, nanosheets, etc. Hydrothermal deposition reactions can usually produce products with good uniformity, which helps to improve the performance and application effects of the materials. By precisely controlling the reaction conditions, the morphology, size, and structure of the deposited product can be precisely controlled to meet the needs of different applications.
[0003] However, the deposition reaction area is limited by the size of the reactor bottom, resulting in low reaction efficiency. Furthermore, securing and supporting the reaction substrate during hydrothermal reactions is often a challenge, impacting the effectiveness and efficiency of the reaction. Therefore, designing a simple, robust support is crucial for hydrothermal reactions. Utility Model Content
[0004] The purpose of this utility model is to provide a simple quartz holder for laboratory use to solve the following technical problems:
[0005] The deposition reaction area is limited by the size of the reactor bottom, resulting in low reaction efficiency. In addition, in hydrothermal reactions, the fixation and support of the reaction substrate is often a challenge, affecting the effectiveness and efficiency of the reaction.
[0006] The purpose of the utility model can be achieved through the following technical solutions:
[0007] A simple quartz stand for laboratory use comprises a first side plate, a columnar quartz is fixedly mounted on one side of the first side plate, a second side plate is fixedly mounted on an end of the columnar quartz away from the first side plate, a groove is provided on the first side plate and the second side plate on a side close to the columnar quartz, a support sheet is installed on one end of the first side plate and the second side plate, a limiting assembly is provided on both the first side plate and the second side plate, the limiting assembly comprises a mounting groove provided on the first side plate, a limiting groove is provided on one side of the mounting groove, a mounting plate is slidably mounted in the limiting groove, a spring is fixedly mounted on the side of the mounting plate close to the columnar quartz, a plurality of limiting plates and an extension plate are fixedly mounted on the side of the mounting plate away from the spring, and a limiting column is fixedly mounted on one end of the support sheet.
[0008] As a further solution of the present invention: the other end of the support piece is rotatably mounted on the inner wall of the mounting groove, and the limiting column is mounted in the limiting groove and between the two limiting plates.
[0009] As a further solution of the present invention: one end of the extension plate away from the mounting plate slides through the first side plate and is fixedly mounted with a button plate.
[0010] As a further solution of the present invention: one end of the spring away from the mounting plate is fixedly mounted on the inner wall of the limiting groove.
[0011] As a further solution of the present invention: the grooves on the first side panel and the second side panel are of two shapes with opposite opening directions, and the two grooves alternate with each other and are not connected.
[0012] As a further solution of the present invention: the groove has a certain horizontal inclination, and the horizontal projection positions of the grooves on the first side plate and the second side plate overlap.
[0013] As a further solution of the present invention: the number of the columnar quartz is four, and the first side plate and the second side plate are connected and fixed by a second side plate that is perpendicular to the first side plate and the second side plate and parallel to each other.
[0014] Beneficial effects of the utility model:
[0015] (1) The first side plate and the second side plate are matched with the groove to form a simple structure, with low material cost, simple preparation, and convenient use. When used for hydrothermal deposition reaction, they can not only fix the reaction substrate, but also multiply the effective hydrothermal deposition reaction area, thereby greatly improving the reaction efficiency;
[0016] (2) The limiting assembly facilitates limiting the position of the stabilizing limiting column, facilitates pulling the supporting plate out of the mounting groove, and facilitates increasing the contact area between the first side plate and the second side plate and the reactor, which is beneficial to improving the supporting stability of the device. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] The present invention will be further described below with reference to the accompanying drawings.
[0018] Figure 1 This is a schematic diagram of the overall structure of a simple quartz bracket for laboratory use in the utility model;
[0019] Figure 2 This is a schematic diagram of the structure of a simple quartz stand for laboratory use in the present utility model when viewed from above;
[0020] Figure 3 yes Figure 2 Schematic diagram of the enlarged structure at point A in the middle.
[0021] In the figure: 1. First side panel; 2. Second side panel; 3. Columnar quartz; 4. Groove; 5. Support plate; 6. Limiting assembly; 61. Mounting slot; 62. Limiting slot; 63. Spring; 64. Mounting plate; 65. Limiting plate; 66. Extension plate; 67. Button plate; 68. Limiting column. DETAILED DESCRIPTION
[0022] The following will be combined with the accompanying drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.
[0023] Example 1
[0024] See also Figure 1 - Figure 3As shown, the utility model is a simple quartz bracket for laboratory use, in particular, a bracket for fixing a reaction substrate during a hydrothermal reaction, comprising a first side plate 1, a columnar quartz 3 is fixedly installed on one side of the first side plate 1, a second side plate 2 is fixedly installed on one end of the columnar quartz 3 away from the first side plate 1, the first side plate 1 and the second side plate 2 are both rectangular plates, the number of the columnar quartz 3 is four, the first side plate 1 and the second side plate 2 are connected and fixed by a second side plate 2 which is perpendicular to the first side plate 1 and the second side plate 2 and parallel to each other, a groove 4 is provided on one side of the first side plate 1 and the second side plate 2 close to the columnar quartz 3, a support sheet 5 is installed on one end of the first side plate 1 and the second side plate 2, and the support sheet 5 has an elastic The support plate 5 is stainless steel coated with a layer of polytetrafluoroethylene on the outside. The grooves 4 on the first side plate 1 and the second side plate 2 are two shapes with opposite opening directions, and the two grooves 4 are alternated and not connected to each other. The grooves 4 have a certain horizontal inclination, and the grooves 4 on the first side plate 1 and the second side plate 2 coincide with each other in the horizontal projection position. A limiting component 6 is provided on each of the first side plate 1 and the second side plate 2. The limiting component 6 includes a mounting groove 61 provided on the first side plate 1, and a limiting groove 62 is provided on one side of the mounting groove 61. A mounting plate 64 is slidably installed in the limiting groove 62. A spring 63 is fixedly installed on the side of the mounting plate 64 close to the columnar quartz 3. The spring 63 is far away One end of the mounting plate 64 is fixedly mounted on the inner wall of the limiting groove 62, and the spring 63 is also made of stainless steel coated with a layer of polytetrafluoroethylene on the outside, which is elastic and corrosion-resistant. The spring 63 plays a role in driving the mounting plate 64 to elastically reset. A plurality of limiting plates 65 and an extension plate 66 are fixedly mounted on the side of the mounting plate 64 away from the spring 63. A limiting column 68 is fixedly mounted on one end of the support piece 5. The limiting column 68 facilitates bending the support piece 5 to facilitate adjusting the supporting area of the first side plate 1 and the second side plate 2. The other end of the support piece 5 is rotatably mounted on the inner wall of the mounting groove 61. The limiting column 68 is mounted in the limiting groove 62 and is installed between the two limiting plates 65 to provide a limiting stability. The function of the limiting column 68 is that the end of the extension plate 66 away from the mounting plate 64 slides through the first side plate 1 and is fixedly mounted with a button plate 67. The button plate 67 facilitates driving the extension plate 66 to slide and squeeze the mounting plate 64 within the first side plate 1, causing the mounting plate 64 to squeeze the spring 63, putting the spring 63 in a compressed state, facilitating the position adjustment of the support plate 5. The structure and installation position of the limiting assembly 6 on the second side plate 2 are the same as those of the first side plate 1, facilitating the increase of the contact area between the first and second side plates and the reactor, which is conducive to improving the support stability of the device. Except for the spring 63 and the support plate 5, all materials except the spring 63 and the support plate 5 are quartz. The device has a simple structure, low material cost, simple preparation, and easy use. Used in hydrothermal deposition reactions, it can not only fix the reaction substrate but also multiply the effective hydrothermal deposition reaction area, greatly improving the reaction efficiency.
[0025] In summary, when using the device, first press the button plate 67, so that the button plate 67 drives the extension plate 66 to slide on the limit groove 62, and at the same time, the extension plate 66 drives the mounting plate 64 to slide in the limit groove 62, and at the same time, the mounting plate 64 squeezes the spring 63, so that the spring 63 is in a compressed state, and at the same time, the mounting plate 64 drives the limit plate 65 away from the inner wall of the limit groove 62, and then pulls the support piece 5 to bend the support piece 5 away from the mounting groove 61, and at the same time, the support piece 5 drives the limit column 68 to move in the limit groove 62, and the adjustment After adjusting the position of the support plate 5, release the button plate 67, and at the same time, the elastic reset ability of the spring 63 drives the limit plate 65 to move to the inner wall of the limit groove 62 through the mounting plate 64. At the same time, the limit column 68 is installed between the two limit plates 65, and at the same time, the extension plate 66 drives the button plate 67 to reset. After adjusting the extension length of the support plate 5, insert the base material into the grooves 4 on the first side plate 1 and the second side plate 2 whose horizontal projections overlap with each other, and then place the bracket vertically in the reactor, close the reactor and react.
[0026] The working principle of the present invention is as follows: when using the device, first press the button plate 67, so that the button plate 67 drives the extension plate 66 to slide on the limit groove 62, and at the same time, the extension plate 66 drives the mounting plate 64 to slide in the limit groove 62, and at the same time, the mounting plate 64 squeezes the spring 63, so that the spring 63 is in a compressed state, and at the same time, the mounting plate 64 drives the limit plate 65 away from the inner wall of the limit groove 62, and then pulls the support piece 5 to bend the support piece 5 away from the mounting groove 61, and at the same time, the support piece 5 drives the limit column 68 to move in the limit groove 62. After adjusting the position of the support piece 5, release the button plate 67, and at the same time, the elastic reset ability of the spring 63 drives the limit plate 65 to move to the inner wall of the limit groove 62 through the mounting plate 64. At the same time, the limit column 68 is installed between the two limit plates 65, and at the same time, the extension plate 66 drives the button plate 67 to reset. After adjusting the extension length of the support piece 5, insert the base material into the grooves 4 on the first side plate 1 and the second side plate 2 whose horizontal projections overlap with each other, and then place the bracket vertically in the reactor, close the reactor and react.
[0027] The above describes an embodiment of the present invention in detail. However, the above content is only a preferred embodiment of the present invention and should not be considered to limit the scope of implementation of the present invention. All equivalent changes and improvements made within the scope of the present invention should still fall within the scope of the patent application of the present invention.
Claims
1. A simple quartz support for laboratory use, comprising a first side plate (1), characterized in that: A columnar quartz (3) is fixedly mounted on one side of the first side plate (1), and a second side plate (2) is fixedly mounted on one end of the columnar quartz (3) away from the first side plate (1). A groove (4) is provided on one side of the first side plate (1) and the second side plate (2) close to the columnar quartz (3). A supporting sheet (5) is mounted on one end of the first side plate (1) and the second side plate (2). A limiting assembly (6) is provided on both the first side plate (1) and the second side plate (2), and the limiting assembly (6) includes The invention comprises a mounting groove (61) provided on the first side plate (1), a limiting groove (62) provided on one side of the mounting groove (61), a mounting plate (64) slidably installed in the limiting groove (62), a spring (63) fixedly installed on the side of the mounting plate (64) close to the columnar quartz (3), a plurality of limiting plates (65) and an extension plate (66) fixedly installed on the side of the mounting plate (64) away from the spring (63), and a limiting column (68) fixedly installed on one end of the support plate (5).
2. A simple quartz holder for laboratory use according to claim 1, characterized in that: The other end of the support piece (5) is rotatably mounted on the inner wall of the mounting groove (61), and the limiting column (68) is mounted in the limiting groove (62) and between the two limiting plates (65).
3. A simple quartz holder for laboratory use according to claim 1, characterized in that: One end of the extension plate (66) away from the mounting plate (64) slides through the first side plate (1) and is fixedly mounted with a button plate (67).
4. A simple quartz holder for laboratory use according to claim 1, characterized in that: One end of the spring (63) away from the mounting plate (64) is fixedly mounted on the inner wall of the limiting groove (62).
5. The simple quartz holder for laboratory use according to claim 1, characterized in that: The grooves (4) on the first side plate (1) and the second side plate (2) are of two shapes with opposite opening directions, and the two grooves (4) alternate with each other and are not connected.
6. A simple quartz holder for laboratory use according to claim 5, characterized in that: The groove (4) has a certain horizontal inclination, and the grooves (4) on the first side plate (1) and the second side plate (2) overlap in horizontal projection positions.
7. The simple quartz holder for laboratory use according to claim 1, characterized in that: The number of the columnar quartz (3) is four, and the first side plate (1) and the second side plate (2) are connected and fixed by a second side plate (2) that is perpendicular to the first side plate (1) and the second side plate (2) and parallel to each other.