Low-radiation high-transmittance single-silver coated glass
By optimizing the coating layer structure of single silver coated glass, including the bonding layer, dielectric layer and protective layer, the problem of balancing the transmittance and emissivity of single silver low-emissivity glass is solved, and the effects of high transmittance and low emissivity are achieved.
Patent Information
- Application Number
- CN202422792357.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-15
- Publication Date
- 2025-09-23
- Estimated Expiration
- 2034-11-15
Smart Images
Figure CN223372989U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of single silver coated glass, in particular to a low-radiation and high-transmittance single silver coated glass. Background Art
[0002] Low-emissivity coated glass is currently widely used in architectural glass, with single-silver low-emissivity coated glass being the most widely used. This is due to its reduced number of film layers and low production costs, making it suitable for large-scale adoption. Furthermore, there is a strong market demand for high-transmittance coated glass with even lower emissivity, particularly in cold regions.
[0003] Common single-silver low-emissivity glass on the market has an emissivity higher than 0.06 and a transmittance of less than 86%. While this maximizes visible light penetration, its high emissivity prevents heat from entering the room. Conventional single-silver low-emissivity glass incorporates a silver film layer, which is increased in thickness to reduce emissivity. However, excessively thick silver film reduces the overall transmittance of the coated glass, rendering it incapable of achieving both high transmittance and low emissivity. This requires improvement. Utility Model Content
[0004] The purpose of the utility model is to provide a low-emissivity and high-transmittance single silver-coated glass, which takes into account both high transmittance and low emissivity, allows visible light to enter the room to the greatest extent, and reduces the outward radiation of heat energy.
[0005] The technical solution adopted by the utility model is: a low-radiation, high-transmittance single silver-coated glass, comprising a glass substrate and a coating layer; the coating layer comprises a bonding layer, a first high-refractive-index medium layer, a front protective base layer, a silver film layer, a ceramic target low-power sputtering protective layer, a second high-refractive-index medium layer and a wear-resistant top layer, which are sequentially stacked from the surface of the glass substrate outward;
[0006] Wherein: the refractive index of the first high refractive index medium layer is n≥2.3, and the thickness is 5nm-30nm.
[0007] As a preferred solution, the second high refractive index medium layer has a film refractive index n≥2.3 and a thickness of 5 nm to 30 nm.
[0008] As a preferred solution, the thickness of the front protective base layer is greater than the ceramic target low-power sputtering protective layer.
[0009] As a preferred solution, the thickness of the front protective base layer is 5nm to 15nm, and the thickness of the ceramic target low-power sputtering protective layer is 1nm to 5nm.
[0010] As a preferred solution, the film crystal phase of the silver film layer grows in a certain direction.
[0011] As a preferred solution, the thickness of the silver film layer is 9nm to 15nm.
[0012] As a preferred solution, the thickness of the bonding layer and the wear-resistant top layer are both 5nm to 40nm.
[0013] As a preferred solution, the thickness of the bonding layer is 5nm~10nm, the thickness of the first high refractive index medium layer is 20nm~21nm, the thickness of the front protective base layer is 5nm~8nm, the thickness of the silver film layer is 10nm~13nm, the thickness of the ceramic target low-power sputtering protective layer is 3nm~4nm, the thickness of the second high refractive index medium layer is 10nm~12nm, and the thickness of the wear-resistant top layer is 5nm~22nm.
[0014] As a preferred solution, the glass substrate is a float glass sheet.
[0015] As a preferred solution, the front protective base layer is ZnAlOx or AZO.
[0016] Compared with the prior art, the beneficial effects of the present invention are:
[0017] 1. The first high refractive index medium layer and the second high refractive index medium layer play the role of anti-reflection and anti-transmission.
[0018] 2. The first high-refractive-index dielectric layer formed first can reduce the surface roughness of the pre-protective base layer formed later, which is beneficial for the silver film layer to grow in a certain direction during deposition. That is, the silver film layer forms a continuous and flat thin film during the initial deposition. The continuous functional layer has a certain effect on reducing the emissivity.
[0019] 3. The front protective base layer and the ceramic target low-power sputtering protective layer protect the silver film layer;
[0020] The ceramic target low-power sputtering protective layer adopts ceramic target to sputter at low power in pure argon atmosphere, which is beneficial to protect the previously formed silver film functional layer from being oxidized, and at the same time avoid the influence of high-energy particles on the silver film functional layer during the deposition of the second high refractive index medium layer formed later.
[0021] 3. This low-emissivity, high-transmittance single silver coated glass takes into account both high transmittance and low emissivity, making the emissivity of the coated glass lower than 0.06 and the transmittance higher than 86%, allowing visible light to enter the room to the greatest extent and reducing the outward radiation of heat energy. BRIEF DESCRIPTION OF THE DRAWINGS
[0022] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.
[0023] Figure 1 This is a schematic diagram of the layer structure of the utility model.
[0024] Figure numerals: 1. glass substrate, 2. bonding layer, 3. first high refractive index dielectric layer, 4. front protective base layer, 5. silver film layer, 6. ceramic target low-power sputtering protective layer, 7. second high refractive index dielectric layer, 8. wear-resistant top layer. DETAILED DESCRIPTION
[0025] The present invention is described in detail below by way of exemplary embodiments. However, it should be understood that, without further description, elements, structures, and features in one embodiment may also be beneficially combined in other embodiments.
[0026] It should be noted that: unless otherwise defined, the technical or scientific terms used herein shall have the usual meanings understood by persons of ordinary skill in the field to which the present invention belongs. The words "one", "an" or "the" and the like used in the specification and claims of the present utility model patent application do not express quantity restrictions, but rather indicate the presence of at least one; the words "first", "second" and "third" used herein shall not be regarded as restrictions on the order of components, but merely serve to distinguish different components; words such as "include" or "comprise" indicate that the elements or objects appearing before "include" or "comprise" include the elements or objects listed after "include" or "comprise" and their equivalents, but do not exclude other elements or objects with the same function.
[0027] In order to more clearly describe the specific structure of the low-emissivity high-transmittance single silver coated glass, Figure 1 Describe:
[0028] like Figure 1 As shown, a low-emissivity, high-transmittance single-silver-coated glass comprises a glass substrate 1 and a coating layer. The coating layer comprises a bonding layer 2, a first high-refractive-index dielectric layer 3, a pre-protective base layer 4, a silver film layer 5, a ceramic target low-power sputtering protective layer 6, a second high-refractive-index dielectric layer 7, and a wear-resistant top layer 8, stacked sequentially from the surface of the glass substrate 1. The first high-refractive-index dielectric layer 3 has a refractive index n ≥ 2.3 and a thickness of 5 nm to 30 nm. The first high-refractive-index dielectric layer 3, formed first, reduces the surface roughness of the pre-protective base layer 4, which is formed later. This facilitates the directional growth of the silver film layer 5 during deposition. This results in a continuous, flat film formed during initial deposition. This continuous functional layer contributes to a reduction in emissivity.
[0029] The glass substrate 1 is specifically a float glass original sheet.
[0030] The bonding layer 2 is formed on the surface of the glass substrate 1 and serves to connect the coating layer and the glass substrate 1. The bonding layer 2 can be a metal oxide or a metal nitride, preferably Si3N4, SiZrNx, SiZrOx, ZnSnOx, etc. The thickness of the bonding layer 2 is 5nm to 40nm.
[0031] The first high refractive index medium layer 3 and the second high refractive index medium layer 7 play the role of anti-reflection and anti-transmission, and can be specifically made of high refractive index materials such as Nb2O5 and TiO2. Therefore, the film refractive index n of the second high refractive index medium layer 7 is ≥2.3, and the thickness is 5nm~30nm.
[0032] The pre-protective base layer 4 can specifically be ZnAlOx, AZO, etc., which is used to adhere and form the silver film layer 5, which is conducive to the growth of the film layer crystal phase in a certain direction when the silver film layer 5 is deposited thereon, and provides protection for the silver film layer 5 in the future. The thickness of the pre-protective base layer 4 is 5nm~15nm.
[0033] The silver film layer 5 is a functional layer of Ag or Ag alloy, and its crystal phase grows in a certain direction, which can reduce the emissivity of the functional layer. The thickness of the silver film layer 5 is 9nm to 15nm.
[0034] The ceramic target low-power sputtering protective layer 6 adopts ceramic target TiO2 or AZO to be low-power sputtered in a pure argon atmosphere, which is beneficial to protect the previously formed silver film functional layer from being oxidized, and at the same time avoid the influence of high-energy particles on the silver film functional layer during the deposition of the second high refractive index medium layer 7 formed later; in addition to protecting the functional layer, the front protective base layer 4 also serves as a sputtering carrier for the functional layer, so the thickness needs to be sufficient. After the ceramic target low-power sputtering protective layer 6 is formed and the functional layer is formed, excessive sputtering may affect the silver film layer. Therefore, during design, the thickness of the ceramic target low-power sputtering protective layer 6 can be made smaller than the thickness of the front protective base layer 4. The specific thickness of the ceramic target low-power sputtering protective layer 6 can be 1nm~5nm.
[0035] After the wear-resistant top layer 8 is formed, it becomes the new surface layer of the single silver coated glass, so it needs to ensure a certain wear resistance. Si3N4, SiZrNx, SiZrOx, ZrOx, etc. are preferred. The thickness of the wear-resistant top layer 8 is 5nm to 40nm.
[0036] The thickness of the glass substrate 1 is 6nm, the thickness of the bonding layer 2 is 5nm~10nm, the thickness of the first high refractive index medium layer 3 is 20nm~21nm, the thickness of the front protective base layer 4 is 5nm~8nm, the thickness of the silver film layer 5 is 10nm~13nm, the thickness of the ceramic target low-power sputtering protection layer 6 is 3nm~4nm, the thickness of the second high refractive index medium layer 7 is 10nm~12nm, and the thickness of the wear-resistant top layer 8 is 5nm~22nm.
[0037] The following is a comparison of the specific configurations and processes of the comparative example, implementation example 1, and implementation example 2 to process single silver-coated glass (the serial numbers in the table correspond to the reference numerals):
[0038] Comparative Examples
[0039] The specific parameters are as follows
[0040] Serial number Cathode type Target type process gases Process air pressure (mbar) Film thickness First dielectric layer Double rotation SiAl (90:10) <![CDATA[Ar:N2=50:50]]> 5.6E-3 30nm Second dielectric layer Double rotation ZnAl (98:2) <![CDATA[Ar:O2=30:70]]> 3.8E-3 8nm Functional layer Single plane Ag Ar 3.2E-3 13nm The third dielectric layer Single plane NiCrOx <![CDATA[Ar:O2=98:2]]> 3.0E-3 2.7nm Fourth dielectric layer Double rotation ZnSnOx (50:50) <![CDATA[Ar:O2=35:65]]> 5.9E-3 11.5nm Fifth dielectric layer Double rotation SiAl (90:10) <![CDATA[Ar:N2=50:50]]> 5.5E-3 30nm
[0041] 1) Glass substrate 1 uses 6mm high-quality float glass: transmittance 89.7%;
[0042] 2) After coating, the transmittance of the glass is 83.5%, and the emissivity is 0.068.
[0043] Implementation Example 1
[0044] The specific parameters are as follows
[0045] Serial number Cathode type Target type process gases Process air pressure (mbar) Film thickness 2 Double rotation SiAl (90:10) <![CDATA[Ar:N2=50:50]]> 5.6E-3 6nm 3 Double rotation NbOx <![CDATA[Ar:O2=93:7]]> 4.2E-3 21nm 4 Double rotation ZnAl (98:2) <![CDATA[Ar:O2=30:70]]> 3.8E-3 6nm 5 Single plane Ag Ar 3.2E-3 13nm 6 Double rotation TiOx Ar 3.0E-3 2.7nm 7 Double rotation NbOx <![CDATA[Ar:O2=93:7]]> 4.3E-3 11.5nm 8 Double rotation SiAl (90:10) <![CDATA[Ar:N2=50:50]]> 5.5E-3 22nm
[0046] 1) Glass substrate 1 uses 6mm high-quality float glass: transmittance 89.7%;
[0047] 2) The transmittance of the coated glass is 86.5%, and the emissivity is 0.058.
[0048] Implementation Example 2
[0049] The specific parameters are as follows
[0050] Serial number Cathode type Target type process gases Process air pressure (mbar) Film thickness 2 Double rotation ZnSnOx (50:50) <![CDATA[Ar:O2=35:65]]> 5.9E-3 8nm 3 Double rotation <![CDATA[TiO2]]> <![CDATA[Ar:O2=93:7]]> 4.3E-3 20nm 4 Double rotation AZO (98:2) <![CDATA[Ar:O2=92:8]]> 3.7E-3 6nm 5 Single plane Ag Ar 3.3E-3 13nm 6 Double rotation TiOx Ar 3.2E-3 2.7nm 7 Double rotation <![CDATA[TiO2]]> <![CDATA[Ar:O2=93:7]]> 4.5E-3 10nm 8 Double rotation SiAl (90:10) <![CDATA[Ar:N2=50:50]]> 5.5E-3 22nm
[0051] 1) Glass substrate 1 uses 6mm high-quality float glass: transmittance 89.7%;
[0052] 2) The transmittance of the coated glass is 86.3%, and the emissivity is 0.054.
[0053] By comparison, it can be seen that the transmittance of Example 1 is increased by 3.59% and the emissivity is reduced by 14.70% compared with the conventional single silver-coated glass of the comparative example; the transmittance of Example 2 is increased by 3.35% and the emissivity is reduced by 20.58% compared with the conventional single silver-coated glass of the comparative example. The low-emissivity and high-transmittance single silver-coated glass proposed in the present invention has a certain improvement in transmittance compared with the conventional single silver-coated glass, and the emissivity is significantly reduced.
[0054] Parts not described in detail in the above embodiments are prior art.
[0055] It should be noted that although the present invention has been described through the above embodiments, the present invention may also have other various embodiments. Without departing from the spirit and scope of the present invention, it is obvious that those skilled in the art may make various corresponding changes and modifications to the present invention, and such changes and modifications shall fall within the scope of protection of the appended claims and their equivalents.
Claims
1. A low-emissivity, high-transmittance single silver-coated glass, characterized by: It comprises a glass substrate (1) and a coating layer; The coating layer comprises a bonding layer (2), a first high refractive index medium layer (3), a front protective base layer (4), a silver film layer (5), a ceramic target low-power sputtering protective layer (6), a second high refractive index medium layer (7) and a wear-resistant top layer (8) stacked in sequence from the surface of the glass substrate (1) outward; Wherein: the film refractive index n of the first high refractive index medium layer (3) is ≥2.3, and the thickness is 5nm to 30nm.
2. The low-emissivity, high-transmittance single silver-coated glass according to claim 1, characterized in that: The second high refractive index medium layer (7) has a film refractive index n≥2.3 and a thickness of 5nm to 30nm.
3. The low-emissivity, high-transmittance single silver-coated glass according to claim 1, characterized in that: The thickness of the front protective base layer (4) is greater than the ceramic target low-power sputtering protective layer (6).
4. The low-emissivity, high-transmittance single silver-coated glass according to claim 3, characterized in that: The thickness of the front protective base layer (4) is 5nm to 15nm, and the thickness of the ceramic target low-power sputtering protective layer (6) is 1nm to 5nm.
5. The low-emissivity, high-transmittance single silver-coated glass according to claim 1, characterized in that: The film crystal phase of the silver film layer (5) grows in a certain direction.
6. The low-emissivity, high-transmittance single silver-coated glass according to claim 1, characterized in that: The thickness of the silver film layer (5) is 9 nm to 15 nm.
7. The low-emissivity, high-transmittance single silver-coated glass according to claim 1, characterized in that: The thickness of the bonding layer (2) and the wear-resistant top layer (8) are both 5nm to 40nm.
8. The low-emissivity, high-transmittance single silver-coated glass according to claim 1, characterized in that: The thickness of the bonding layer (2) is 5nm to 10nm, the thickness of the first high refractive index medium layer (3) is 20nm to 21nm, the thickness of the front protective base layer (4) is 5nm to 8nm, the thickness of the silver film layer (5) is 10nm to 13nm, the thickness of the ceramic target low-power sputtering protective layer (6) is 3nm to 4nm, the thickness of the second high refractive index medium layer (7) is 10nm to 12nm, and the thickness of the wear-resistant top layer (8) is 5nm to 22nm.
9. The low-emissivity, high-transmittance single silver-coated glass according to claim 1, characterized in that: The glass substrate is float glass.
10. The low-emissivity, high-transmittance single silver-coated glass according to claim 1, characterized in that: The front protective base layer (4) is ZnAlOx or AZO.