Workpiece loading frame

Abstract

The utility model belongs to the technical field of vacuum treatment, and discloses a workpiece loading frame. The workpiece loading frame comprises a rotating frame and a plate assembly, wherein the rotating frame is used for loading workpieces; the plate assemblies are arranged on the periphery of the rotating frame, gaps exist between the plate assemblies and workpieces loaded on the rotating frame, and notches are formed in the plate assemblies. When the workpiece loading frame is arranged in the vacuum chamber, at least part of the notch is opposite to a vacuum processing source arranged in the vacuum chamber, the plate assembly divides the vacuum chamber into a first area and a second area, and the rotating frame rotates in the first area. By arranging the plate assembly, the vacuum chamber is divided into the first area to serve as the processing space, the vacuum processing source conducts vacuum processing on the workpiece in the first area from the notch, and the inner space of the first area is smaller than the space in the vacuum chamber; therefore, working substances such as process gas, plasma and sputtered particles can fully act on the workpiece, waste of the working substances is reduced, and the utilization rate of the working substances is increased.

Description

Technical Field

[0001] The utility model relates to the technical field of vacuum processing, in particular to a workpiece loading rack. Background Art

[0002] During vacuum processing, a workpiece rotating rack is often installed within the vacuum processing chamber. The workpiece is mounted on the outer side of the rotating rack. Vacuum processing sources such as the target and ion source, as well as other related functional components, are installed on the inner wall of the vacuum processing chamber, with a gap between them and the outer side of the rotating rack to achieve vacuum processing of the workpiece. Taking sputtering coating as an example, the plasma generated by the inert gas in the vacuum processing chamber bombards the surface of the target under the influence of electric and magnetic fields. The sputtered particles move to the surface of the workpiece, forming a thin film on the surface of the workpiece.

[0003] Working substances such as gases, plasma and sputtered particles in the vacuum processing chamber are distributed between the inner wall of the vacuum processing chamber and the peripheral side of the workpiece rotating rack. The internal space of the vacuum processing chamber is often significantly larger than the workpiece rotating rack. Some process gases, plasma and sputtered particles and other working substances will not act on the workpiece, but instead cause waste of working substances such as coating materials, which can easily lead to reduced utilization of working substances. Utility Model Content

[0004] The purpose of the present utility model is to provide a workpiece loading rack to solve the problem in the prior art that the internal space of the vacuum processing chamber is often significantly larger than the workpiece rotating rack, most of the working substances such as process gases, plasma and sputtered particles will not act on the workpiece, but instead cause waste of working substances such as coating materials, which easily leads to a reduction in the utilization rate of the working substances, thereby improving the utilization rate of the working substances.

[0005] To achieve this purpose, the present invention adopts the following technical solutions:

[0006] A workpiece loading rack is provided, comprising:

[0007] A rotating frame, wherein the rotating frame is used to load the workpiece;

[0008] A plate assembly, wherein the plate assembly is arranged around the rotating frame and has a gap between the plate assembly and the workpiece loaded on the rotating frame, and the plate assembly is provided with a notch;

[0009] When the workpiece loading frame is mounted in the vacuum chamber, at least part of the gap faces a vacuum processing source disposed in the vacuum chamber. The plate assembly divides the vacuum chamber into a first area and a second area, and the rotating frame rotates in the first area.

[0010] As an optional technical solution for a workpiece loading frame, the workpiece is arranged on the circumference of the rotating frame around the rotation axis, and the plate assembly includes a panel assembly, which is arranged on the circumferential side of the rotating frame along the horizontal direction, and the gap is arranged on the side of the workpiece away from the rotation axis, and the notch is arranged on the panel assembly.

[0011] As an optional technical solution for the workpiece loading frame, the enclosure assembly includes a first partition plate and a second partition plate. The first partition plate is arranged around the rotating frame along the horizontal direction and there is a gap between the first partition plate and the workpiece loaded on the rotating frame. The notch is arranged on the first partition plate. The second partition plate is arranged at the ends on both sides of the first partition plate close to the notch and extends in the direction close to the side wall of the vacuum chamber.

[0012] As an optional technical solution of the workpiece loading frame, the distance between any position of the first partition and the rotation axis of the rotating frame is equal.

[0013] As an optional technical solution for the workpiece loading frame, the plate assembly further includes a third partition plate. The third partition plates are divided into two groups and are respectively arranged at the top and bottom of the enclosure assembly. There is a gap between the third partition plates and the rotating frame.

[0014] As an optional technical solution for the workpiece loading rack, the vacuum processing sources are provided at least two places, and the number of the gaps corresponds to the number of the vacuum processing sources.

[0015] As an optional technical solution for the workpiece loading rack, the vacuum processing source includes a target material group and / or an ion source group.

[0016] As an optional technical solution for the workpiece loading frame, the workpiece loading frame also includes a fixed frame, the rotating frame is rotatably arranged in the fixed frame, the plate assembly is detachably arranged between the fixed frame and the rotating frame and is rotatably connected to the rotating frame, and the fixed frame can drive the rotating frame and the plate assembly to move into or out of the vacuum chamber together.

[0017] As an optional technical solution for the workpiece loading frame, the fixing frame is provided with an opening, and the plate assembly and the workpiece are moved into or out of the fixing frame through the opening.

[0018] As an optional technical solution for the workpiece loading frame, the workpiece loading frame also includes a shaft rod, which is arranged through the center of the rotating frame. The upper and lower sides of the fixed frame are both provided with shaft holes, and both ends of the shaft rod pass through the two shaft holes respectively and are gap-fitted with the shaft holes.

[0019] Beneficial effects of the utility model:

[0020] The present application discloses a workpiece loading rack, comprising a rotating rack and a plate assembly, wherein the rotating rack is used to load workpieces; the plate assembly is arranged around the rotating rack and there is a gap between the rotating rack and the workpiece loaded on the rotating rack, and the plate assembly is provided with a notch; when the workpiece loading rack is arranged in a vacuum chamber, at least part of the notch is opposite to a vacuum processing source arranged in the vacuum chamber, the plate assembly divides the vacuum chamber into a first area and a second area, and the rotating rack rotates in the first area. By arranging the plate assembly, the vacuum chamber is divided into a first area as a processing space, and the vacuum processing source vacuum-processes the workpiece in the first area through the notch. Since the internal space of the first area is smaller than the space in the vacuum chamber, most of the working substances such as process gas, plasma, and sputtered particles can effectively act on the workpiece, thereby reducing the waste of working substances and improving the utilization rate of working substances. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following is a brief introduction to the drawings required for use in the description of the embodiments of the present invention. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the contents of the embodiments of the present invention and these drawings without paying any creative work.

[0022] Figure 1 It is a schematic diagram of a partial structure of a sputtering coating device in the prior art;

[0023] Figure 2 This is a first schematic diagram of a workpiece loading rack provided by an embodiment of the present utility model being placed in a sputtering coating device;

[0024] Figure 3 This is a second schematic diagram of a workpiece loading rack provided by an embodiment of the present invention being placed in a sputtering coating device;

[0025] Figure 4 It is an axonometric schematic diagram of a workpiece loading rack provided by an embodiment of the present utility model.

[0026] In the picture:

[0027] 1. Workpiece;

[0028] 10. Workpiece loading frame; 11. Rotating frame; 12. Plate assembly; 121. First partition; 122. Second partition; 123. Third partition; 13. Fixed frame; 131. Reinforcement rod; 14. Shaft; 15. Bearing;

[0029] 20. Vacuum treatment source; 21. Target material assembly; 22. Ion source assembly;

[0030] 30. Vacuum chamber. DETAILED DESCRIPTION

[0031] The present invention will be further described in detail below with reference to the accompanying drawings and examples. It should be understood that the specific embodiments described herein are intended only to illustrate the present invention and are not intended to limit the present invention. It should also be noted that, for ease of description, the accompanying drawings only illustrate portions relevant to the present invention, not all of its components.

[0032] In the description of this utility model, unless otherwise specified or limited, the terms "connected," "connect," and "fixed" should be understood in a broad sense. For example, they can refer to fixed connection, detachable connection, or integration; mechanical connection or electrical connection; direct connection or indirect connection through an intermediate medium; internal communication between two components or interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in this utility model based on the specific circumstances.

[0033] In the present invention, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature may include the first and second features being in direct contact, or may include the first and second features being in contact not directly but through another feature between them. Moreover, a first feature being "above," "above," and "above" a second feature may include the first feature being directly above or obliquely above the second feature, or may simply mean that the first feature is higher in level than the second feature. A first feature being "below," "below," and "below" a second feature may include the first feature being directly below or obliquely below the second feature, or may simply mean that the first feature is lower in level than the second feature.

[0034] In the description of this embodiment, the terms "upper," "lower," "right," and other orientations or positional relationships are based on the orientations or positional relationships shown in the accompanying drawings and are intended solely for ease of description and simplified operation. They do not indicate or imply that the devices or components referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limitations on the present invention. Furthermore, the terms "first" and "second" are used solely for descriptive purposes and have no special meaning.

[0035] The following description of the embodiments takes a sputtering coating device as an example. In the following description, the sputtering coating chamber is generally referred to as a vacuum chamber.

[0036] In the prior art, see Figure 1 The process gas, plasma, sputtered particles and other working substances in the vacuum chamber 30 are distributed between the inner wall of the vacuum chamber 30 and the peripheral side of the rotating frame 11. The internal space of the vacuum chamber 30 is often significantly larger than the rotating frame 11. Some of the gas, plasma, sputtered particles and other microscopic substances will not act on the workpiece 1 ( Figure 1The airflow arrows in the middle are dispersed), which results in a waste of working materials and easily leads to a reduction in the utilization rate of working materials.

[0037] In order to solve the above problems, this embodiment provides a workpiece loading rack 10. Figure 2 and Figure 3 , including a rotating frame 11 and a plate assembly 12, the rotating frame 11 is used to load the workpiece 1; the plate assembly 12 is arranged around the rotating frame 11 and there is a gap between the plate assembly 12 and the workpiece 1 loaded on the rotating frame 11, and the plate assembly 12 is provided with a gap; when the workpiece loading frame 10 is arranged in the vacuum chamber 30, at least part of the gap is opposite to the vacuum processing source 20 placed in the vacuum chamber 30, the plate assembly 12 divides the vacuum chamber 30 into a first area and a second area, and the rotating frame 11 rotates in the first area. By setting up the plate assembly 12, the vacuum chamber 30 is divided into a first area as a processing space, and the vacuum processing source 20 performs vacuum processing on the workpiece 1 in the first area from the notch. Since the internal space of the first area is smaller than the space in the vacuum chamber 30, the working substances such as process gas, plasma and sputtered particles can fully act on the workpiece 1, reducing the waste of working substances, improving the utilization rate of working substances, and helping to improve the control ability of performance parameters such as film composition and film thickness such as coating uniformity; in addition, the setting of the plate assembly 12 makes the coating material and other working substances confined to the inside of the plate assembly 12 as much as possible, reducing the degree of contamination of the vacuum chamber 30 by the working substances, and providing convenience for the cleaning and maintenance work of vacuum coating production.

[0038] It is understood that, taking sputtering coating as an example, "the notch is opposite to the vacuum processing source 20 disposed in the vacuum chamber 30" means that the coating material emission area of ​​the sputtering target is opposite to the notch, so that the coating material enters the first area through the notch and reaches the surface to be coated on the workpiece 1. It is understood that the first area and the second area can be connected through the notch.

[0039] Furthermore, the workpiece 1 is arranged on the circumference of the rotating frame 11 around the rotation axis, and the plate assembly 12 includes a panel assembly, which is arranged on the circumferential side of the rotating frame 11 in the horizontal direction, and the gap is arranged on the side of the workpiece 1 away from the rotation axis, and the notch is arranged on the panel assembly. Specifically, the panel assembly includes a first partition 121 and a second partition 122, the first partition 121 is arranged on the circumferential side of the rotating frame 11 in the horizontal direction and there is a gap between it and the workpiece 1 loaded on the rotating frame 11, the notch is arranged on the first partition 121 (in this embodiment, the notch specifically refers to the range between the two ends of the first partition 121), and the second partition 122 is arranged at the ends on both sides of the first partition 121 close to the notch and extends in a direction close to the side wall of the vacuum chamber 30. In some embodiments, the rotating frame 11 is configured as a cylinder or a polygonal prism, the first partition 121 is configured as an arc-shaped plate, and the second partition 122 is configured as a straight plate. There is a gap between the second partition 122 and the inner wall of the vacuum chamber 30 to facilitate the disassembly of the plate assembly 12. It can be understood that the second partition plate 122 can further block the gap between the first partition plate 121 and the side wall of the vacuum chamber 30 , thereby further isolating the first area from the second area.

[0040] Furthermore, when the cross-section of the first baffle 121 is arc-shaped and centered at a point on the rotation axis of the rotating frame 11, the distance between any position of the first baffle 121 and the rotation axis of the rotating frame 11 is equal. The first region has no dead corners or other obstacles, ensuring the stability of the airflow within the first region and helping to improve the control over performance parameters such as film uniformity, film composition, and film thickness.

[0041] Further, see Figure 3 The plate assembly 12 also includes a third partition 123. The third partition 123 is divided into two groups and is respectively arranged at the top and bottom of the enclosure assembly. There is a gap between the third partition 123 and the rotating frame 11. Specifically, the third partition 123 is set to be circular or quasi-circular, and can partially or completely cover the two ends of the enclosure assembly. The provision of the third partition 123 can prevent the working material in the first area from diffusing to the second area in large quantities, and can also prevent the dust in the second area from entering the first area and contaminating the workpiece 1, thereby improving the utilization rate of the working material and the yield rate of the vacuum treatment of the workpiece 1. Specifically, the third partition 123 can be plugged in or screwed to the first partition 121. Furthermore, a vent is provided on the third partition 123 to achieve vacuum exhaust of the first area.

[0042] In some embodiments, the vacuum processing source 20 is provided with at least two notches, and the number of notches corresponds to the number of vacuum processing sources 20. Specifically, the vacuum processing source 20 includes a target assembly 21 and / or an ion source assembly 22. The target assembly 21 and the ion source assembly 22 are spaced apart around the central axis of the vacuum chamber 30. The two notches divide the first partition 121 into two curved plates. The second partition 122 is provided at the ends of the first partition 121 near the two notches. It should be noted that since coating the workpiece 1 with the target assembly 21 and the ion source assembly 22 is a well-established technique in the prior art, their structures and principles will not be described in detail here.

[0043] Further, see Figure 4 The workpiece loading frame 10 also includes a fixed frame 13, within which the rotating frame 11 is rotatably mounted. Specifically, the workpiece loading frame 10 also includes a shaft 14, which extends through the center of the rotating frame 11. The fixed frame 13 has axial holes on both its upper and lower sides. The ends of the shaft 14 extend through the two axial holes and are spaced apart to fit within the holes. To enhance the smoothness of the rotating frame 11's rotation, the workpiece loading frame 10 also includes a bearing 15, which is positioned between the shaft 14 and the axial holes.

[0044] Furthermore, one end of the top of the shaft 14 can be connected to a power source to drive the rotating frame 11 to rotate. The power source can be set on the top of the fixed frame 13 or on the top of the vacuum chamber 30. Specifically, the power source can be set as a rotary motor or the like.

[0045] The plate assembly 12 is detachably disposed between the fixed frame 13 and the rotating frame 11 and is rotatably connected to the rotating frame 11. The detachable configuration of the plate assembly 12 facilitates the removal, cleaning, or replacement of the first partition 121, the second partition 122, and the third partition 123, thereby improving cleaning and production efficiency. Maintaining the cleanliness of the plate assembly 12 also improves the cleanliness of the vacuum chamber 30. The configuration of the plate assembly 12 confines the coating material and other working substances to the interior of the plate assembly 12 as much as possible, reducing the degree of contamination of the vacuum chamber 30 by the working substances, facilitating the cleaning and maintenance of the vacuum coating, and improving the yield rate of the vacuum treatment of the workpiece 1. Specifically, the fixed frame 13 is provided with an opening, through which the plate assembly 12 and the workpiece 1 are moved into or out of the fixed frame 13.

[0046] Furthermore, the fixed frame 13 can drive the rotating frame 11 and the plate assembly 12 to move into or out of the vacuum chamber 30. Specifically, the fixed frame 13 can move into or out of the vacuum chamber 30 by means of guide rails, rollers, or screws, which are not listed here one by one.

[0047] It can be understood that in some embodiments, when the workpiece loading frame 10 is not provided with a fixed frame 13, the rotating frame 11 and the plate assembly 12 are provided as a detachable integrated structure, the rotating frame 11 is rotatably provided on the plate assembly 12, and the bottom of the plate assembly 12 is provided with a base that can cooperate with a guide rail, roller or screw rod and other moving methods. Under the action of the conveying mechanism, it can be moved into or out of the vacuum chamber 30 together with the rotating frame 11.

[0048] Specifically, the fixed frame 13 is configured as a square frame structure, with the rotating frame 11 and plate assembly 12 both positioned within the frame. Reinforcement rods 131 are provided on both the upper and lower sides of the frame to enhance the stability of the square frame. In this embodiment, the vacuum processing source 20 is provided in two locations, so the plate assembly 12 includes two notches. The side of the fixed frame 13 opposite the two notches is not provided with reinforcement rods 131, facilitating the removal of the rotating frame 11 and plate assembly 12 while also preventing interference with the airflow of the vacuum processing source 20. Reinforcement rods 131 are also provided on the other two sides of the fixed frame 13, dividing the square frame into multiple triangular frames and enhancing the stability of the square frame.

[0049] Obviously, the above-described embodiments of the present invention are merely examples for the purpose of clearly illustrating the present invention and are not intended to limit the manner in which the present invention is to be implemented. A person skilled in the art would be able to make various obvious changes, readjustments, and substitutions without departing from the scope of protection of the present invention. It is not necessary and impossible to enumerate all embodiments here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention shall be included within the scope of protection of the claims of the present invention.

Claims

1. A workpiece loading rack, characterized in that: include: A rotating frame (11), wherein the rotating frame (11) is used to load the workpiece (1); a plate assembly (12), the plate assembly (12) being arranged around the rotating frame (11) and having a gap with the workpiece (1) loaded on the rotating frame (11), and the plate assembly (12) being provided with a notch; When the workpiece loading frame is mounted in the vacuum chamber (30), at least part of the notch is opposite to the vacuum processing source (20) disposed in the vacuum chamber (30), the plate assembly (12) divides the vacuum chamber (30) into a first area and a second area, and the rotating frame (11) rotates in the first area.

2. The workpiece loading rack according to claim 1, wherein: The workpiece (1) is arranged on the circumference of the rotating frame (11) around the rotation axis, and the plate assembly (12) includes a panel assembly, which is arranged on the circumferential side of the rotating frame (11) in the horizontal direction, and the gap is arranged on the side of the workpiece (1) away from the rotation axis, and the notch is arranged on the panel assembly.

3. The workpiece loading rack according to claim 2, wherein: The enclosure assembly comprises a first partition (121) and a second partition (122), wherein the first partition (121) is arranged around the rotating frame (11) along the horizontal direction and a gap is formed between the first partition (121) and the workpiece (1) loaded on the rotating frame (11), the notch is arranged on the first partition (121), and the second partition (122) is arranged at the ends of both sides of the first partition (121) close to the notch and extends in a direction close to the side wall of the vacuum chamber (30).

4. The workpiece loading rack according to claim 3, characterized in that: The distance between any position of the first partition plate (121) and the rotation axis of the rotating frame (11) is equal.

5. The workpiece loading rack according to claim 3, characterized in that: The plate assembly (12) further comprises a third partition plate (123), wherein the third partition plates (123) are in two groups and are respectively arranged at the top and bottom of the enclosure assembly, and a gap exists between the third partition plates (123) and the rotating frame (11).

6. The workpiece loading stand according to claim 1, wherein: The vacuum processing sources (20) are provided at least two locations, and the number of the notches corresponds to the number of the vacuum processing sources (20).

7. The workpiece loading stand according to claim 6, wherein: The vacuum processing source (20) includes a target material group (21) and / or an ion source group (22).

8. The workpiece loading rack according to any one of claims 1 to 7, characterized in that: The workpiece loading frame further comprises a fixed frame (13), the rotating frame (11) is rotatably arranged in the fixed frame (13), the plate assembly (12) is detachably arranged between the fixed frame (13) and the rotating frame (11) and is rotatably connected to the rotating frame (11), and the fixed frame (13) can drive the rotating frame (11) and the plate assembly (12) to move into or out of the vacuum chamber (30) together.

9. The workpiece loading stand according to claim 8, characterized in that: The fixing frame (13) is provided with an opening, and the plate assembly (12) and the workpiece (1) are moved into or out of the fixing frame (13) through the opening.

10. The workpiece loading stand according to claim 8, wherein: The workpiece loading frame further comprises a shaft rod (14), the shaft rod (14) is arranged through the center of the rotating frame (11), the upper side and the lower side of the fixed frame (13) are both provided with shaft holes, and the two ends of the shaft rod (14) respectively pass through the two shaft holes and are clearance-matched with the shaft holes.

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