Conveying device

By arranging a buffer part and an elastic part at the bottom of the support rod of the mask conveying device to absorb external force, the problem of particle contamination caused by vibration during the mask transportation process is solved, and the quality and yield of the mask are improved.

CN223390030UActive Publication Date: 2025-09-26SEMICON MFG INT (SHANGHAI) CORP
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Patent Information

Application Number
CN202422700442.9
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-11-05
Publication Date
2025-09-26
Estimated Expiration
2034-11-05

AI Technical Summary

Technical Problem

During the mask transfer process, the mechanical standard interface device may cause the support rod to slip due to vibration and rub against the mask to produce particle contamination, affecting the quality of the mask.

Method used

A transmission device is designed, and a buffer part and an elastic part are set at the bottom of the support rod to absorb external force, prevent the external force from being transmitted to the mask, and reduce slippage and friction.

Benefits of technology

It effectively reduces the risk of particle contamination of the mask during transportation and improves the quality and yield of the mask.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model provides a conveying device which is used for transferring a photomask and comprises a base, a plurality of supporting rods are arranged on the top face of the base, and the supporting rods are used for bearing the photomask; the cover body is arranged on the top surface of the base, and a closed cavity is formed by the cover body and the top surface of the base; the supporting rod is arranged on the base, the buffering part is arranged between the supporting rod and the base, the first end face of the buffering part is fixedly connected with the supporting rod, the second end face of the buffering part is fixedly connected with the base, and the buffering part is used for absorbing external force transmitted to the photomask through the conveying device in the transferring process. The conveying device has the damping function, and the probability and risk that particles fall on the photomask in the photomask transferring process can be reduced.
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Description

Technical Field

[0001] The present application relates to the field of semiconductor manufacturing technology, and in particular to a conveying device. Background Art

[0002] Precision patterns on wafers rely on optical lithography to replicate the pattern on the photomask onto the wafer itself through exposure. Therefore, the quality of the pattern on the photomask directly determines the quality of the pattern exposed on the wafer. Particles are a major factor in severely degrading photomask pattern quality and even reducing mask yield. Effectively controlling the probability of particles landing on the photomask will directly and effectively improve mask quality.

[0003] Photomasks primarily rely on Standard Mechanical Interface (SMIF) devices for transport between machines or across different areas. However, during transport, the SMIF device can be affected by external forces and vibrate, causing the photomask to slip against the support rods. Friction with the rods generates particles, which can adhere to the surface of the mask and contaminate it.

[0004] Therefore, it is necessary to develop a conveying device with a shock-absorbing function to reduce the probability and risk of particles falling on the mask during the mask transportation process. Utility Model Content

[0005] The purpose of the present application is to provide a conveying device with a shock-absorbing function to reduce the probability and risk of particles falling on the mask during the mask transportation process.

[0006] An embodiment of the present application provides a conveying device for transporting photomasks, comprising: a base, the top surface of the base being provided with a plurality of support rods, the support rods being used to support the photomask; a cover body, the cover body being provided on the top surface of the base and forming a closed chamber with the top surface of the base; and a buffer portion, the buffer portion being provided between the support rods and the base, the first end surface of the buffer portion being fixedly connected to the support rods, and the second end surface of the buffer portion being fixedly connected to the base, the buffer portion being used to absorb external forces transmitted to the photomask through the conveying device during transport.

[0007] In some embodiments, the material of the buffer portion includes at least one of polycarbonate, polyethylene terephthalate, acrylonitrile butadiene styrene, polyethylene, polyvinyl chloride, vinyl, glass fiber, and carbon fiber.

[0008] In some embodiments, the first end surface of the buffer portion is further provided with a groove, an elastic member is provided in the groove, a first end of the elastic member contacts the bottom of the groove, and a second end of the elastic member contacts the bottom surface of the support rod.

[0009] In some embodiments, the ratio of the depth of the groove to the length of the buffer portion along the axial direction of the support rod is (0.2-0.4):1.

[0010] In some embodiments, a ratio of a cross-sectional area of ​​the groove along a direction perpendicular to the axial direction of the support rod to a cross-sectional area of ​​the buffer portion along a direction perpendicular to the axial direction of the support rod is (0.7-0.8):1.

[0011] In some embodiments, the elastic member comprises a spring.

[0012] In some embodiments, the spring is an alloy spring steel spring or a non-metallic spring; and the allowable torsional stress of the spring is 450Mpa to 500Mpa, the allowable bending stress is 700Mpa to 900Mpa, and the elastic modulus is 197GPa to 250GPa.

[0013] In some embodiments, a ratio of a length of the buffer portion along the axial direction of the support rod to a length of the support rod is (0.2-0.4):1.

[0014] In some embodiments, a ratio of a cross-sectional area of ​​the buffer portion along a direction perpendicular to the axial direction of the support rod to a cross-sectional area of ​​the support rod along a direction perpendicular to the axial direction of the support rod is (0.7-0.8):1.

[0015] In some embodiments, the surface of the limiting portion facing the light shield is an inclined surface, and the angle between the inclined surface and the end surface of the support rod is 120-135°; the height of the inclined surface along the axial direction of the support rod is 4 mm.

[0016] In some embodiments, a pair of handles are connected to the outer peripheral surface of the cover.

[0017] The beneficial effects of the delivery device provided by this application include but are not limited to the following:

[0018] The conveying device provided in the present application is provided with a buffer portion at the bottom of the support rod used to support the photomask. When the conveying device is bumped or vibrated, the external force is absorbed by the buffer portion provided at the bottom of the support rod when it is transmitted to the support rod through the base, thereby preventing the external force from being transmitted to the photomask through the support rod, causing the photomask to slip relative to the support rod, and rubbing against the support rod to produce tiny particles, thereby contaminating the photomask.

[0019] In addition, a groove is provided on the side of the buffer portion facing the support rod, and an elastic part is provided inside the groove. When external force is transmitted to the buffer portion and then transmitted to the elastic part by the buffer portion, the elastic part can further reduce the external force transmitted to the support rod by deformation, thereby preventing the external force from being transmitted from the support rod to the light shield. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] The following figures describe in detail exemplary embodiments disclosed in this application. Like reference numerals denote similar structures throughout the several views of the drawings. Those skilled in the art will appreciate that these embodiments are non-limiting, exemplary embodiments, and that the drawings are provided for illustration and description purposes only and are not intended to limit the scope of this application. Other embodiments may also achieve the inventive intent of this application. It should be understood that the drawings are not drawn to scale.

[0021] in:

[0022] Figure 1 is a schematic structural diagram of a conveying device according to some embodiments of the present application;

[0023] Figure 2 is a top view of a base according to some embodiments of the present application;

[0024] Figure 3 is a schematic structural diagram of a first end surface of a buffer portion according to some embodiments of the present application;

[0025] Figure 4 is a cross-sectional view of a buffer portion according to some embodiments of the present application; and

[0026] Figure 5 Schematic diagram of the structure of the support rod according to some embodiments of the present application. DETAILED DESCRIPTION

[0027] The following description provides specific application scenarios and requirements of the present application, with the purpose of enabling those skilled in the art to make and use the content of this application. Various local modifications to the disclosed embodiments will be apparent to those skilled in the art, and the general principles defined herein may be applied to other embodiments and applications without departing from the spirit and scope of this application. Therefore, this application is not limited to the embodiments shown, but is intended to be of the widest scope consistent with the claims.

[0028] The present application provides a conveying device, which is used to transfer photomasks. The transferred photomasks include: a base, a top surface of the base is provided with a plurality of support rods, and the support rods are used to support the photomasks; a cover body, the cover body is provided on the top surface of the base and forms a closed chamber with the top surface of the base; and a buffer part, the buffer part is provided between the support rods and the base, the first end surface of the buffer part is fixedly connected to the support rods, and the second end surface of the buffer part is fixedly connected to the base, and the buffer part is used to absorb external forces transmitted to the photomasks through the conveying device during transportation.

[0029] During the transport of the photomask, if the photomask slips between the support rods, the photomask will rub against the support rods to produce tiny particles, which may adhere to the surface of the photomask and contaminate it. The conveying device provided in this application provides a buffer portion at the bottom of the support rods used to carry the photomask. When the conveying device is bumped or vibrated, the external force is transmitted to the support rods through the base and absorbed by the buffer portion provided at the bottom of the support rods, thereby preventing the external force from being transmitted to the photomask through the support rods, causing the photomask to slip relative to the support rods and rubbing against the support rods to produce tiny particles, which would contaminate the photomask.

[0030] The transmission device provided in this application will be described in detail below with reference to the accompanying drawings and embodiments.

[0031] refer to Figure 1 An embodiment of the present application provides a conveying device, including a base 100 and a cover 200 , wherein the cover 200 is disposed on the top surface of the base 100 and forms a closed chamber with the top surface of the base 100 to accommodate the mask 11 .

[0032] In some embodiments, reference Figure 2 The top surface of the base 100 is provided with a card slot 102 that matches the cover 200, and a sealing ring is provided in the card slot 102 to prevent external impurities from entering the chamber during the transportation of the mask 11.

[0033] In some embodiments, a plurality of support rods 101 are provided on the top surface of the base 100, and one end of the support rod 101 close to the base 100 (referred to as the "bottom end") is fixedly connected to the top surface of the base 100, and the end of the support rod 101 away from the base 100 (referred to as the "top end") is used to support the light mask 11.

[0034] In some embodiments, the number of the support rods 101 is four, each of which is engaged with the four sides of the light mask 11. In some embodiments, the cross-section of the support rods 101 (i.e., the cross-section of the support rods 101 perpendicular to the axis of the support rods 101) is rectangular, circular, or other centrally symmetrical shapes. Optionally, the cross-section of the support rods 101 is rectangular.

[0035] In some embodiments, reference Figure 1A buffer portion 300 is provided at the bottom end of the support rod 101, a first end face of the buffer portion 300 is fixedly connected to the support rod 101, and a second end face of the buffer portion 300 is fixedly connected to the base 100. The buffer portion 300 is used to absorb the external force transmitted to the light mask 11 through the conveying device during transportation. Specifically, when the conveying device is bumpy or vibrating, the external force is absorbed by the buffer portion 300 provided at the bottom end of the support rod 101 when it is transmitted to the support rod 101 through the base 100, thereby preventing the external force from being further transmitted to the light mask 11, causing the light mask 11 to slip relative to the support rod 101.

[0036] In some embodiments, the energy absorption density of the material of the buffer portion 300 is (30-50) g / cm 3 , for example, 30g / cm 3 、35g / cm 3 , 40g / cm 3 , 45g / cm 3 or 50g / cm 3 .

[0037] In some embodiments, the material of the buffer portion includes at least one of polycarbonate (PC), polyethylene terephthalate (PET), acrylonitrile butadiene styrene (ABS), polyethylene (PE), polyvinyl chloride (PVC), vinyl nitrile (VN), glass fiber, and carbon fiber.

[0038] In some embodiments, the cross-section of the buffer portion 300 (i.e., the cross-section of the buffer portion 300 perpendicular to the axis of the support rod 101) is rectangular, circular, or other centrally symmetrical. Optionally, the cross-section of the support rod 101 is rectangular. In some embodiments, the central axis of the buffer portion 300 is aligned with the central axis of the support rod 101.

[0039] In some embodiments, the ratio of the cross-sectional area of ​​the buffer portion along the axis perpendicular to the support rod to the cross-sectional area of ​​the support rod along the axis perpendicular to the support rod is (0.7-0.8):1, for example, 0.7:1, 0.75:1, or 0.8:1. In other embodiments, the cross-sectional area of ​​the buffer portion 300 may also be larger than the cross-sectional area of ​​the support rod 101.

[0040] In some embodiments, a ratio of a length of the buffer portion 300 along the axial direction of the support rod 101 to a length of the support rod 101 is (0.2-0.4):1, for example, 0.2:1, 0.3:1, or 0.4:1.

[0041] In some embodiments, the buffer portion 300 is fixedly connected to the support rod 101 and the base 100 via an adhesive.

[0042] In some embodiments, reference Figure 3 and 4 The first end surface of the buffer portion 300 is further provided with a groove 301, within which an elastic member 302 is disposed. The first end of the elastic member 302 contacts the bottom of the groove 301, and the second end of the elastic member 302 contacts the bottom surface of the support rod 101. When the conveyor device experiences a bumpy ride, transmitting external force through the base 100 to the buffer portion 300, the buffer portion 300 transfers some of the external force to the elastic member 302. The elastic member 302 absorbs some of the external force by deforming, further reducing the transmission of the external force to the support rod 101.

[0043] In some embodiments, the elastic member 302 also contacts the side wall of the groove 301. When the elastic member 302 recovers its deformation, it can transfer force to the buffer portion 300 by impacting the side wall of the groove 301, so as to reduce the force transmitted to the support rod 101 by the elastic member 302 when recovering its deformation.

[0044] In some embodiments, the elastic member 302 includes a spring.

[0045] In some embodiments, the spring is an alloy spring steel spring or a non-metallic spring, and the allowable torsional stress t T 450Mpa~500Mpa, allowable bending stress σ b The elastic modulus is 700Mpa~900Mpa and the elastic modulus is 197GPa~250GPa.

[0046] In some embodiments, the material of the spring includes at least one of ultra-clean spring steel, chrome alloy, titanium alloy spring steel resin.

[0047] In some embodiments, the ratio of the depth of the groove 301 to the axial length of the buffer portion 300 along the support rod 101 is (0.2-0.4):1, for example, 0.2:1, 0.3:1 or 0.4:1.

[0048] In some embodiments, the cross section of the groove 301 (ie, the cross section of the groove 301 perpendicular to the axial direction of the groove 301 ) is circular, square, or other regular polygonal; optionally, the cross section of the groove 301 is circular.

[0049] In some embodiments, the ratio of the cross-sectional area of ​​the groove 301 to the cross-sectional area of ​​the buffer portion 300 along the axis perpendicular to the support rod 101 is (0.7-0.8):1, for example, 0.7:1, 0.75:1 or 0.8:1.

[0050] In some embodiments, reference Figure 5 A limiting portion 101 a is provided at the top end of the support rod 101 . The limiting portion 101 a is integrally connected to the support rod 101 and is used to clamp the light shield 11 to limit the circumferential displacement of the light shield 11 .

[0051] In some embodiments, the ratio of the area of ​​the bottom surface of the limiting portion 101a to the area of ​​the first end surface of the support rod 101 is (0.5-0.8):1, for example, 0.5:1, 0.6:1, or 0.8:1. The first surface of the light mask 11 contacts the first end surface of the support rod 101, and the side of the light mask 11 contacts the limiting portion 101a.

[0052] In some embodiments, the surface of the position-limiting portion 101a facing the light shield 11 is an inclined surface. When the light shield 11 is of standard size, the bottom surface of the light shield 11 contacts the end surface of the top end of the support rod 101, and the side of the light shield 11 contacts the bottom edge of the position-limiting portion 101a. When the light shield 11 is larger than the standard size, the side of the light shield 11 can also be snapped onto the inclined surface to prevent excessive circumferential displacement of the light shield 11.

[0053] In some embodiments, the angle α between the inclined surface and the end surface of the first end of the support rod 101 is 120° to 135°, for example, 120°, 130°, or 135°. Preferably, the angle α between the inclined surface and the end surface of the first end of the support rod 101 is 135°. In some embodiments, the height of the inclined surface along the axial direction of the support rod 101 is 4 mm to match most photomasks available on the market.

[0054] In some embodiments, the projection of the vertical surface of the limiting portion 101a along the axis perpendicular to the support rod 101 coincides with the projection of the circumferential surface of the support rod 101 along the axis perpendicular to the support rod 101, so as to improve the stability of the connection between the limiting portion 101a and the support rod 101.

[0055] In some embodiments, reference Figure 1 The cover 200 is made of a transparent material so that the operator can observe whether the light mask 11 moves during the transportation of the light mask.

[0056] In some embodiments, the cover 200 is made of polyetheretherketone (PEEK).

[0057] In some embodiments, a pair of handles 400 are connected to the outer circumference of the cover 200 to facilitate operators to take the cover 200. In some embodiments, the pair of handles 400 are fixedly connected to the cover 200.

[0058] The conveying device provided by the present application is provided with a buffer portion at the bottom of the support rod for carrying the mask, and the energy absorption density of the material of the buffer portion is 30 to 50 g / cm 3 When the conveying device is bumpy or vibrates, the external force is transmitted to the support rod through the base and absorbed by the buffer part at the bottom of the support rod, preventing the external force from being transmitted to the photomask through the support rod, causing the photomask to slip relative to the support rod, and rubbing with the support rod to produce tiny particles, which contaminate the photomask.

[0059] In addition, a groove is provided on the side of the buffer portion facing the support rod, and an elastic part is provided inside the groove. When external force is transmitted to the buffer portion and then transmitted to the elastic part by the buffer portion, the elastic part can further reduce the external force transmitted to the support rod by deformation, thereby preventing the external force from being transmitted from the support rod to the light shield.

[0060] It should be noted that different embodiments may produce different beneficial effects. In different embodiments, the beneficial effects that may be produced may be any one or a combination of the above, or any other possible beneficial effects.

[0061] The basic concepts have been described above. It will be apparent to those skilled in the art that the detailed disclosure above is merely illustrative and does not limit this specification. Although not explicitly stated herein, those skilled in the art may make various modifications, improvements, and revisions to this application. Such modifications, improvements, and revisions are suggested in this specification and remain within the spirit and scope of the exemplary embodiments of this application.

[0062] It should be noted that, in the description of this application, unless otherwise expressly specified or limited, the terms "installed," "connected," "connected," and "fixed" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integration; mechanical connections, electrical connections; rotational connections, or sliding connections; direct connections, or indirect connections through an intermediate medium; and can refer to internal communication between two components or the interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in this application in light of specific circumstances.

[0063] In addition, when terms such as "first", "second", and "third" are used in the specification of this application to describe various features, these terms are only used to distinguish these features and cannot be understood as indicating or implying the relationship between the features, the relative importance, or implicitly indicating the number of features indicated.

[0064] In addition, this specification describes exemplary embodiments by reference to idealized exemplary cross-sectional views and / or plan views and / or perspective views. Therefore, differences from the illustrated shapes due to, for example, manufacturing techniques and / or tolerances are foreseeable. Therefore, the exemplary embodiments should not be interpreted as limited to the shapes of the regions shown herein, but should include deviations in shapes due to, for example, manufacturing. Therefore, the regions shown in the figures are schematic in nature, and their shapes are not intended to illustrate the actual shapes of the regions of the device nor to limit the scope of the exemplary embodiments.

[0065] At the same time, this application uses specific terms to describe the embodiments of this specification. For example, "one embodiment," "an embodiment," and / or "some embodiments" refer to a certain feature, structure, or characteristic related to at least one embodiment of the present application. Therefore, it should be emphasized and noted that "one embodiment," "an embodiment," or "an alternative embodiment" mentioned twice or multiple times in different locations in this application does not necessarily refer to the same embodiment. In addition, certain features, structures, or characteristics in one or more embodiments of the present application may be appropriately combined.

[0066] Similarly, it should be noted that, in order to simplify the presentation of this application and thus facilitate understanding of one or more embodiments of the invention, the foregoing descriptions of the embodiments of this application sometimes combine multiple features into a single embodiment, figure, or description thereof. However, this disclosure method does not mean that the subject matter of this application requires more features than those recited in the claims. In fact, an embodiment may have fewer features than all of the features of a single embodiment disclosed above.

[0067] Finally, it should be understood that the embodiments described in this application are merely illustrative of the principles of the embodiments of this application. Other variations may also fall within the scope of this application. Therefore, by way of example and not limitation, alternative configurations of the embodiments of this application may be considered consistent with the teachings of this application. Accordingly, the embodiments of this application are not limited to the embodiments explicitly introduced and described in this application.

Claims

1. A conveying device for transporting a photomask, characterized in that: include: A base, wherein a top surface of the base is provided with a plurality of support rods, and the support rods are used to support the light mask; a cover body, the cover body being arranged on the top surface of the base and forming a closed chamber with the top surface of the base; as well as A buffer portion is provided between the support rod and the base, a first end face of the buffer portion is fixedly connected to the support rod, a second end face of the buffer portion is fixedly connected to the base, and the buffer portion is used to absorb external force transmitted to the photomask through the conveying device during transportation.

2. The conveying device according to claim 1, characterized in that The material of the buffer portion includes at least one of polycarbonate, polyethylene terephthalate, acrylonitrile butadiene styrene, polyethylene, polyvinyl chloride, vinyl, glass fiber, and carbon fiber.

3. The conveying device according to claim 1, characterized in that The first end surface of the buffer portion is further provided with a groove, an elastic member is provided in the groove, a first end of the elastic member contacts the bottom of the groove, and a second end of the elastic member contacts the bottom surface of the support rod.

4. The conveying device according to claim 3, characterized in that The ratio of the depth of the groove to the length of the buffer portion along the axial direction of the support rod is (0.2-0.4):

1.

5. The conveying device according to claim 3, characterized in that The ratio of the cross-sectional area of ​​the groove along the direction perpendicular to the axial direction of the support rod to the cross-sectional area of ​​the buffer portion along the direction perpendicular to the axial direction of the support rod is (0.7-0.8):

1.

6. The conveying device according to claim 3, characterized in that The elastic member includes a spring.

7. The conveying device according to claim 6, characterized in that The spring is an alloy spring steel spring or a non-metallic spring; and the allowable torsional stress of the spring is 450Mpa to 500Mpa, the allowable bending stress is 700Mpa to 900Mpa, and the elastic modulus is 197GPa to 250GPa.

8. The conveying device according to claim 1, characterized in that The ratio of the length of the buffer portion along the axial direction of the support rod to the length of the support rod is (0.2-0.4):

1.

9. The conveying device according to claim 1, characterized in that The ratio of the cross-sectional area of ​​the buffer portion along the direction perpendicular to the axial direction of the support rod to the cross-sectional area of ​​the support rod along the direction perpendicular to the axial direction of the support rod is (0.7-0.8):

1.

10. The conveying device according to claim 1, characterized in that A limiting portion is provided at one end of the support rod away from the base, and the limiting portion is integrally connected to the support rod and is used for clamping the light shield.

11. The conveying device according to claim 10, characterized in that The surface of the limiting portion facing the light shield is an inclined surface, and the angle between the inclined surface and the end surface of the support rod is 120-135 degrees; the height of the inclined surface along the axial direction of the support rod is 4 mm.