Efficient liquid preparation device of silicon wafer cleaning machine

Abstract

The utility model discloses an efficient liquid preparation device of a silicon wafer cleaning machine, which comprises a first tank body and a second tank body which are arranged in parallel, a liquid collecting barrel is arranged above the first tank body and the second tank body, the bottom of the liquid collecting barrel is respectively connected with liquid preparation pipes corresponding to the first tank body and the second tank body, and liquid preparation valves are arranged on the liquid preparation pipes. A first metering barrel and a second metering barrel are respectively arranged above the liquid collecting barrel, the bottom of the first metering barrel is connected with a liquid adding pipe communicated with the liquid collecting barrel, a liquid adding valve is arranged on the liquid adding pipe, a chemical adding pipe is arranged on the first metering barrel, and a chemical adding valve is arranged on the chemical adding pipe. According to the utility model, liquid is alternately added through the first metering barrel and the second metering barrel, so that the liquid adding continuity is ensured; according to the utility model, the liquid level in the metering barrel is monitored through the liquid level meter, and the liquid level in the tank body is judged according to the change of the liquid level in the metering barrel, so that not only can the use of large-metering liquid preparation be ensured, but also the accuracy of the prepared liquid can be ensured to be within the use range.

Description

Technical Field

[0001] The utility model belongs to the technical field of solar silicon crystal cell cleaning liquid configuration, in particular to a high-efficiency liquid configuration device for a silicon wafer cleaning machine. Background Art

[0002] The texturing and cleaning process is the first step in solar cell production. Chemicals such as sodium hydroxide, hydrogen peroxide, hydrofluoric acid, and hydrochloric acid are used to remove oxides and phosphides from the surface of the material. This process also enhances the surface microstructure, improving the contact efficiency and energy storage capacity of the cell. Therefore, the efficiency and accuracy of adding chemicals to the cell are crucial, impacting both the production capacity and yield of the cell.

[0003] The current method of adding chemicals is to determine the addition based on the liquid level sensor in the tank. The chemical tank is usually large, and the corresponding liquid volume is also large. Various liquids need to be added to the tank in a short time to reach a certain concentration. Under normal circumstances, the industry's texturing cleaning equipment line takes about two hours to add chemicals. This long addition time affects equipment operation time and production capacity.

[0004] Furthermore, the current industry dispensing method uses bucket-type hysteresis level meters or flowmeters with software-based cumulative counting. Flowmeter dispensing has been found to be inaccurate when dispensing small amounts of liquid, leading to dispensing failures. Bucket-type hysteresis level meters utilize a single bucket, with the dispensing liquid flowing into the tank via a pipeline valve. Under normal pressure, dispensing is slow due to the inherent pressure differential of the liquid, resulting in low drug addition efficiency and prolonged dispensing times due to pauses in the flow and outflow of liquid. Utility Model Content

[0005] The purpose of this utility model is to provide a high-efficiency liquid dispensing device for a silicon wafer cleaning machine to solve the problems raised in the above-mentioned background art. The utility model provides a high-efficiency liquid dispensing device for a silicon wafer cleaning machine, which has the characteristics of improving the efficiency of liquid dispensing in the chemical tank, achieving rapid and automatic liquid dispensing continuity, thereby shortening the liquid dispensing time and improving the utilization rate of the equipment.

[0006] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: an efficient liquid distribution device for a silicon wafer cleaning machine, comprising a first trough body and a second trough body arranged in parallel, a liquid collecting barrel is provided above the first trough body and the second trough body, the bottom of the liquid collecting barrel is respectively connected to liquid distribution pipes corresponding to the first trough body and the second trough body, a liquid distribution valve is installed on the liquid distribution pipe, a first metering barrel and a second metering barrel are respectively provided above the liquid collecting barrel, the bottom of the first metering barrel is connected to a liquid adding pipe connected to the liquid collecting barrel, a liquid adding valve is installed on the liquid adding pipe, a drug adding pipe is provided on the first metering barrel, a drug adding valve is installed on the drug adding pipe, and the structure of the second metering barrel is the same as that of the first metering barrel.

[0007] In order to ensure the use of large-scale liquid dispensing and ensure that the accuracy of the liquid dispensing is within the use range, a liquid level meter is further installed on the first metering barrel.

[0008] In order to dispense liquid into the tank, gas at a certain pressure is introduced into the metering barrel to increase the pressure inside the metering barrel, thereby achieving rapid liquid dispensing. Furthermore, the first metering barrel and the liquid collecting barrel are both sealed structures, and an air inlet pipe is also installed on the first metering barrel, and an air inlet valve is installed on the air inlet pipe.

[0009] In order to relieve the internal pressure of the metering barrel, increase the pressure in a sealed manner, or allow the chemical solution to overflow, an overflow pipe is further installed on the first metering barrel, and an overflow valve is installed on the overflow pipe.

[0010] In order to achieve accurate fluid replenishment, further, the bottom of the first metering barrel is connected to a fluid replenishment tube that is in communication with the first tank body, and a fluid replenishment valve is installed on the fluid replenishment tube.

[0011] Compared with the prior art, the beneficial effects of the present invention are:

[0012] 1. The utility model ensures the continuity of liquid addition by alternately adding liquid through the first and second metering barrels;

[0013] 2. The utility model monitors the liquid level in the metering barrel through a liquid level gauge, and judges the liquid level in the tank body by the change of the liquid level in the metering barrel, which can not only ensure the use of large-scale liquid dispensing, but also ensure that the accuracy of the liquid dispensing is within the use range;

[0014] 3. When dispensing liquid into the tank, the utility model introduces gas of a certain pressure into the metering barrel to increase the pressure in the metering barrel, thereby achieving rapid dispensing of liquid;

[0015] 4. When the utility model replenishes fluid into the tank, fluid can be replenished directly through the fluid replenishment tube to achieve accurate fluid replenishment. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a structural diagram of the utility model;

[0017] Figure 2 This is a schematic structural diagram of the first metering barrel of the utility model;

[0018] Figure 3 This is a schematic structural diagram of the liquid collecting barrel of the utility model;

[0019] In the figure: 1. First tank body; 2. Second tank body; 3. Liquid collecting barrel; 31. Liquid dispensing pipe; 32. Liquid dispensing valve; 4. First metering barrel; 41. Liquid level gauge; 42. Air inlet valve; 43. Air inlet pipe; 44. Dosing valve; 45. Dosing pipe; 46. Overflow valve; 47. Overflow pipe; 48. Liquid replenishing valve; 49. Liquid replenishing pipe; 410. Liquid adding pipe; 411. Liquid adding valve; 5. Second metering barrel. DETAILED DESCRIPTION

[0020] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0021] Example 1

[0022] See also Figure 1-3 The utility model provides the following technical solutions: an efficient liquid dispensing device for a silicon wafer cleaning machine, comprising a first trough body 1 and a second trough body 2 arranged in parallel, a liquid collecting barrel 3 is provided above the first trough body 1 and the second trough body 2, the bottom of the liquid collecting barrel 3 is respectively connected with a liquid dispensing pipe 31 corresponding to the first trough body 1 and the second trough body 2, a liquid dispensing valve 32 is installed on the liquid dispensing pipe 31, a first metering barrel 4 and a second metering barrel 5 are respectively provided above the liquid collecting barrel 3, the bottom of the first metering barrel 4 is connected with a liquid adding pipe 410 communicating with the liquid collecting barrel 3, a liquid adding valve 411 is installed on the liquid adding pipe 410, a dosing pipe 45 is provided on the first metering barrel 4 for adding chemical liquid (alkali solution NAOH, hydrofluoric acid HF, hydrogen peroxide H2O2 or hydrochloric acid HCL, etc.), a dosing valve 44 is installed on the dosing pipe 45, and the structure of the second metering barrel 5 is the same as that of the first metering barrel 4.

[0023] By adopting the above technical solution, the utility model alternately adds liquid through the first metering barrel 4 and the second metering barrel 5, thereby ensuring the continuity of liquid addition.

[0024] Specifically, a liquid level gauge 41 is also installed on the first metering barrel 4 .

[0025] By adopting the above technical solution, the liquid level in the metering barrel is monitored by the liquid level meter 41, and the liquid level in the tank body is judged by the change of the liquid level in the metering barrel, which can ensure the use of large-scale liquid dispensing and ensure that the accuracy of the liquid dispensing is within the use range.

[0026] Example 2

[0027] The difference between this embodiment and embodiment 1 is that: specifically, the first metering barrel 4 and the liquid collecting barrel 3 are both sealed structures, and an air inlet pipe 43 is also installed on the first metering barrel 4 for introducing dry and clean inert gas, such as nitrogen, into the metering barrel. An air inlet valve 42 is installed on the air inlet pipe 43.

[0028] By adopting the above technical solution, when dispensing liquid into the tank body, gas with a certain pressure is introduced into the metering barrel to increase the pressure in the metering barrel, thereby achieving rapid liquid dispensing.

[0029] Specifically, an overflow pipe 47 is installed on the first metering barrel 4 , and an overflow valve 46 is installed on the overflow pipe 47 .

[0030] By adopting the above technical solution, it can be used for pressure relief inside the metering barrel, airtight pressurization, or overflow of chemical solution.

[0031] Example 3

[0032] The difference between this embodiment and embodiment 2 is that: specifically, the bottom of the first metering barrel 4 is connected to a liquid infusion tube 49 connected to the first tank body 1, and a liquid infusion valve 48 is installed on the liquid infusion tube 49, and the liquid infusion tube 49 at the bottom of the second metering barrel 5 is connected to the second tank body 2.

[0033] By adopting the above technical solution, when replenishing the fluid into the tank body, the fluid can be replenished directly through the fluid replenishment tube 49, thereby achieving accurate fluid replenishment.

[0034] The valves used in the present invention are all solenoid valves, and the solenoid valves and the liquid level meter 41 are both connected to the PLC controller signal.

[0035] The working steps of this utility model are as follows:

[0036] 1. The initial liquid preparation process of the tank body includes the following steps (taking the first tank body 1 as an example):

[0037] (1) Cleaning the first tank body 1: Clean the first tank body 1 and empty the first tank body 1 to ensure that the first tank body 1 meets the process requirements;

[0038] (2) Liquid filling into the metering barrel: The liquid filling valve 411, the liquid replenishing valve 48, and the air inlet valve 42 of the first metering barrel 4 are in the closed state, the overflow valve 46 is opened, the dosing valve 44 is opened, and the liquid level of the first metering barrel 4 is monitored by the liquid level meter 41. When the liquid level reaches the set value, the dosing valve 44 and the overflow valve 46 are closed; similarly, the liquid filling into the second metering barrel 5 is completed;

[0039] (3) Liquid is dispensed into the first tank body 1: the liquid dispensing valve 32 corresponding to the second tank body 2 is closed, and the liquid dispensing valve 32 corresponding to the first tank body 1 is opened. The overflow valve 46, the liquid replenishing valve 48 and the dosing valve 44 of the first metering barrel 4 are in the closed state. The air inlet valve 42 and the liquid adding valve 411 of the first metering barrel 4 are opened, and liquid is introduced into the first tank body 1 through the liquid collecting barrel 3. According to the feedback of the liquid level height in the first metering barrel 4 by the liquid level gauge 41, when the liquid level in the first metering barrel 4 reaches below the low liquid level or reaches the set liquid addition volume, the liquid adding valve 411 is closed, and then the liquid addition action of the first metering barrel 4 is executed; if the liquid level in the first metering barrel 4 reaches below the low liquid level and does not reach the set liquid addition volume, liquid is dispensed into the first tank body 1 through the second metering barrel 5 in the same manner.

[0040] 2. The steps for replenishing the chemical solution to the tank are as follows (chemical solution is lost during production and needs to be replenished in a quantitative manner, taking the first tank 1 as an example):

[0041] When the refill signal is received, the refill valve 48 and the overflow valve 46 of the first metering barrel 4 are opened. At this time, the air inlet valve 42, the dosing valve 44 and the liquid adding valve 411 of the first metering barrel 4 remain in the closed state. The refill volume is calculated according to the liquid level height in the first metering barrel 4 fed back by the liquid level meter 41. When the low liquid level or the set volume is reached, the refill valve 48 is closed, and then the liquid filling action of the first metering barrel 4 is executed; if the liquid level of the first metering barrel 4 reaches the low liquid level and has not reached the set liquid filling volume, the liquid filling will continue after the liquid filling of the first metering barrel 4 is completed.

[0042] In summary, the utility model ensures the continuity of liquid addition by alternately adding liquid through the first metering barrel 4 and the second metering barrel 5; the utility model monitors the liquid level in the metering barrel through the liquid level meter 41, and judges the liquid level in the tank body by the change of the liquid level in the metering barrel, which can not only ensure the use of large-scale liquid dispensing, but also ensure that the accuracy of the liquid dispensing is within the use range; when the utility model dispenses liquid into the tank body, a certain pressure of gas is introduced into the metering barrel to increase the pressure in the metering barrel, thereby realizing rapid liquid dispensing; when the utility model replenishes liquid into the tank body, liquid can be directly replenished through the liquid replenishing tube 49 to achieve accurate liquid replenishment.

[0043] Although the embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations may be made to these embodiments without departing from the principles and spirit of the present invention, and the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. An efficient liquid dispensing device for a silicon wafer cleaning machine, characterized by: It includes a first trough body and a second trough body arranged in parallel, a liquid collecting barrel is provided above the first trough body and the second trough body, the bottom of the liquid collecting barrel is respectively connected to the liquid distribution pipes corresponding to the first trough body and the second trough body, and a liquid distribution valve is installed on the liquid distribution pipe, a first metering barrel and a second metering barrel are respectively provided above the liquid collecting barrel, the bottom of the first metering barrel is connected to the liquid adding pipe connected to the liquid collecting barrel, and the liquid adding valve is installed on the liquid adding pipe, the first metering barrel is provided with a dosing pipe, and the dosing valve is installed on the dosing pipe. The structure of the second metering barrel is the same as that of the first metering barrel.

2. The high-efficiency liquid dispensing device for a silicon wafer cleaning machine according to claim 1, characterized in that: The first metering barrel is also equipped with a liquid level gauge.

3. The high-efficiency liquid dispensing device for a silicon wafer cleaning machine according to claim 1, characterized in that: The first metering barrel and the liquid collecting barrel are both sealed structures.

4. The high-efficiency liquid dispensing device for a silicon wafer cleaning machine according to claim 3, characterized in that: An air intake pipe is also installed on the first metering barrel.

5. The high-efficiency liquid dispensing device for a silicon wafer cleaning machine according to claim 4, characterized in that: An air intake valve is installed on the air intake pipe.

6. The high-efficiency liquid dispensing device for a silicon wafer cleaning machine according to claim 4, characterized in that: An overflow pipe is also installed on the first metering barrel.

7. The high-efficiency liquid dispensing device for a silicon wafer cleaning machine according to claim 6, characterized in that: An overflow valve is installed on the overflow pipe.

8. The high-efficiency liquid dispensing device for a silicon wafer cleaning machine according to claim 7, characterized in that: The bottom of the first metering barrel is connected to a liquid infusion tube that is in communication with the first tank body.

9. The high-efficiency liquid dispensing device for a silicon wafer cleaning machine according to claim 8, characterized in that: A fluid infusion valve is installed on the fluid infusion tube.

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