Polygonal honeycomb-shaped double-groove photoetching plate

Abstract

The utility model provides a polygonal honeycomb-shaped double-groove photolithography mask, relates to the technical field of photolithography masks, and solves the problems that the photolithography mask usually needs to be fixed for photolithography in the use process of the photolithography mask, but the photolithography mask is fixed by adopting a clamping mode when being fixed, so that the photolithography mask is subjected to a certain force, and the photolithography mask is damaged. And after the photolithography mask is used for a period of time, the photolithography mask possibly has certain deformation, so that the use precision of the photolithography mask is influenced. According to the polygonal honeycomb-shaped double-groove photolithography mask, the deformation of the photolithography mask can be reduced through the arrangement of the reinforcing side blocks, a stable fixed connection relation is formed between the connecting strips and the transparent substrate, and the reinforcing strips can uniformly and efficiently transfer and distribute the borne force between the reinforcing side blocks.

Description

Technical Field

[0001] The utility model belongs to the technical field of photolithography, and more specifically relates to a polygonal honeycomb double-groove photolithography. Background Art

[0002] Photomasks are key tools in the semiconductor manufacturing process, used to transfer specific patterns onto silicon wafers or other substrates. The pattern on the photomask is printed onto a layer of photosensitive material on the silicon wafer using photolithography, ultimately forming the microstructure of a circuit or device. During the use of the photomask, it is usually necessary to fix the photomask before performing the photolithography. However, the photomask is typically fixed using a clamping method, which subjects it to a certain amount of force. After a period of use, the photomask may deform, affecting its accuracy. Utility Model Content

[0003] The disclosed embodiment relates to a polygonal honeycomb double-groove photoresist plate, so as to solve the problem raised in the above-mentioned background technology that during the use of the photoresist plate, the photoresist plate usually needs to be fixed before photolithography is performed, but when the photoresist plate is fixed, it is fixed by a clamping method, which will cause the photoresist plate to be subjected to a certain force. After a period of use, the photoresist plate may undergo a certain deformation, affecting the accuracy of the use of the photoresist plate.

[0004] The purpose and effect of the polygonal honeycomb double-grooved photoresist of the present invention are achieved by the following specific technical means:

[0005] In a first aspect of the present disclosure, a polygonal honeycomb double-groove photomask is provided, comprising: a transparent substrate, wherein the four corners of the transparent substrate are symmetrically fixed with reinforcing side blocks, and the side length of the reinforcing side blocks is longer than the side length of the transparent substrate; the transparent substrate also comprises: a photolithography mask layer, and the photolithography mask layer covers the top surface of the transparent substrate.

[0006] As a preferred solution of the present invention, the transparent substrate further includes: a photolithography mask layer having a honeycomb pattern design, and six side lines of each photolithography mask layer are opaque lines, and the areas enclosed by the six side lines are all translucent areas.

[0007] As a preferred solution of the present invention, the transparent substrate also includes: a light-proof matching strip, which covers the top surface of the transparent substrate; and a gap is maintained between the first regular hexagonal pattern units of any two adjacent photolithography mask layers so that there is a light-transmitting line between the two parallel light-proof matching strips adjacent to the two first regular hexagonal pattern units.

[0008] As a preferred solution of the present invention, the transparent substrate further comprises: light-opaque matching strips and light-transmitting lines parallel to the photolithography mask layer etched into grooves.

[0009] As a preferred solution of the present invention, the reinforcing side blocks further include: a connecting bar, which is shaped like a long column structure and is integrally arranged between the reinforcing side blocks; and the connecting bar is fixedly connected to the transparent substrate.

[0010] As a preferred solution of the present invention, the reinforced side blocks further include: reinforcement strips, which are shaped like long column structures and are symmetrically fixedly arranged between the reinforced side blocks.

[0011] Compared with the prior art, the present invention has the following beneficial effects:

[0012] By setting up the reinforced side blocks, the deformation of the photomask can be reduced. Two components, a connecting bar and a reinforcing bar, are set between the reinforced side blocks. Among them, a stable fixed connection relationship is formed between the connecting bar and the transparent substrate, effectively maintaining the relative position of the transparent substrate and itself unchanged, thereby laying a solid foundation for the stable operation of the entire photomask.

[0013] When an external fixing mechanism applies a fixing force to the reinforcing side blocks, the reinforcing strips evenly and efficiently transfer and distribute the applied force between the reinforcing side blocks. This ensures that the force acting on the transparent substrate remains relatively stable. This ingenious design of coordinated coordination between the reinforcing side blocks, connecting strips, and reinforcing strips effectively prevents irregular force on the transparent substrate caused by external forces, thereby significantly reducing the possibility of deformation of the transparent substrate. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 It is a schematic diagram of the overall axial side three-dimensional structure of the utility model.

[0015] Figure 2 It is a schematic diagram of the photolithography mask layer structure of the utility model.

[0016] Figure 3 This utility model Figure 2 Schematic diagram of the locally enlarged structure at point A in the middle.

[0017] Figure 4 This utility model Figure 1 Schematic diagram of the locally enlarged structure at point B in the middle.

[0018] Figure 5 It is a schematic diagram of the reinforced side block structure of the present utility model.

[0019] In the figure, the corresponding relationship between the component names and the drawing numbers is as follows:

[0020] 1. Transparent substrate; 101. Photolithography mask layer; 102. Light-proof matching strip; 103. Groove; 2. Reinforced side block; 201. Connecting strip; 202. Reinforcement strip. DETAILED DESCRIPTION

[0021] The following is a further detailed description of the embodiments of the present invention in conjunction with the accompanying drawings and examples.

[0022] Example: As shown in the attached Figure 1 To the attached Figure 5 As shown:

[0023] The utility model provides a polygonal honeycomb double-groove photomask, comprising: a transparent substrate 1, wherein four corners of the transparent substrate 1 are symmetrically fixedly provided with reinforcing side blocks 2, and the side length of the reinforcing side blocks 2 is longer than the side length of the transparent substrate 1; the transparent substrate 1 further comprises: a photolithography mask layer 101, wherein the photolithography mask layer 101 covers the top surface of the transparent substrate 1; the photolithography mask layer 101 is designed in a honeycomb pattern, and six side lines of each photolithography mask layer 101 are opaque lines, and the areas enclosed by the six side lines are all translucent areas; opaque light-matching strips 102, wherein the opaque light-matching strips 102 cover the top surface of the transparent substrate 1; a spacing is maintained between the first regular hexagonal pattern units of any two adjacent photolithography mask layers 101, so that a translucent line is present between two parallel opaque light-matching strips 102 adjacent to the two first regular hexagonal pattern units; and the translucent lines of the opaque light-matching strips 102 parallel to the photolithography mask layer 101 are etched into grooves 103.

[0024] Among them, the reinforcing side block 2 also includes: a connecting bar 201, the connecting bar 201 is shaped like a long column structure, and the connecting bar 201 is integrally arranged between the reinforcing side blocks 2; the connecting bar 201 is fixedly connected to the transparent substrate 1; a reinforcing bar 202, the reinforcing bar 202 is shaped like a long column structure, and the reinforcing bar 202 is symmetrically fixed between the reinforcing side blocks 2.

[0025] The specific usage and function of this embodiment is as follows: by placing the photomask on the photolithography machine, transferring the recognizable mask layout file to the photolithography machine, and etching the photomask by reading the mask layout file through the photolithography machine.

[0026] When the photomask is fixedly clamped, it can be in contact with the reinforcing side block 2 through the fixing mechanism of the photolithography machine or other cleaning equipment. Connecting bars 201 and reinforcing bars 202 are provided between the reinforcing side blocks 2. The connecting bars 201 are fixedly connected to the transparent substrate 1, so that the connecting bars 201 can ensure the fixed stability between the transparent substrate 1, and the reinforcing bars 202 can improve the force transmission between the reinforcing side blocks 2. When the fixing force is applied to the reinforcing side blocks 2, it can ensure that the force on the transparent substrate 1 remains relatively stable, thereby reducing the occurrence of deformation of the transparent substrate 1.

Claims

1. A polygonal honeycomb double-groove photomask, characterized in that include: A transparent substrate (1) is provided with reinforcing side blocks (2) fixedly arranged at four corners in a symmetrical shape, and the side length of the reinforcing side blocks (2) is longer than the side length of the transparent substrate (1); the transparent substrate (1) further comprises: a photolithography mask layer (101), and the photolithography mask layer (101) covers the top surface of the transparent substrate (1).

2. The polygonal honeycomb double-groove photoresist according to claim 1, characterized in that: The transparent substrate (1) further comprises: a photolithography mask layer (101) having a honeycomb pattern design, and six side lines of each photolithography mask layer (101) are opaque lines, and the areas enclosed by the six side lines are all light-transmitting areas.

3. The polygonal honeycomb double-groove photoresist according to claim 2, characterized in that: The transparent substrate (1) further comprises: a light-proof matching strip (102), the light-proof matching strip (102) covering the top surface of the transparent substrate (1); and a spacing is maintained between the first regular hexagonal pattern units of any two adjacent photolithography mask layers (101), so that a light-transmitting line exists between two parallel light-proof matching strips (102) adjacent to the two first regular hexagonal pattern units.

4. The polygonal honeycomb double-groove photoresist according to claim 3, characterized in that: The transparent substrate (1) further comprises: light-opaque matching strips (102) and light-transmitting lines parallel to the photolithography mask layer (101) etched into grooves (103).

5. The polygonal honeycomb double-groove photoresist according to claim 1, characterized in that: The reinforcing side blocks (2) further comprise: a connecting bar (201), the connecting bar (201) being in the shape of a long column structure, and the connecting bar (201) being integrally arranged between the reinforcing side blocks (2); and the connecting bar (201) being fixedly connected to the transparent substrate (1).

6. The polygonal honeycomb double-groove photoresist according to claim 5, characterized in that: The reinforcing side blocks (2) further include: reinforcing strips (202), the reinforcing strips (202) are shaped like long strips of columnar structure, and the reinforcing strips (202) are symmetrically fixedly arranged between the reinforcing side blocks (2).

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