Plasma etching machine temperature control system

Abstract

The utility model relates to a temperature control system of a plasma etching machine, which comprises a vacuum chamber, an electrode assembly is arranged in the vacuum chamber, the electrode assembly comprises a plurality of electrode plates, the vacuum chamber is also provided with a plurality of electromagnetic valves electrically connected with a central controller, and the electromagnetic valves control the flow velocity of cooling water in the electrode plates in a one-to-one correspondence manner; a temperature sensor electrically connected with the central controller is arranged on each electrode plate; during use, the temperature sensor can correspondingly monitor the temperature of each electrode plate and send signals back to the central controller, and after the central controller analyzes the signals, the flow rate of cooling water in each electrode plate is controlled through the electromagnetic valve of each electrode plate, so that the temperature of each electrode plate is accurately controlled, and it is ensured that the temperature of each electrode plate in the reaction process is reduced. Therefore, the etching requirement of a product with a high etching uniformity requirement is met.

Description

Technical Field

[0001] The utility model relates to the field of plasma etching machines, in particular to a temperature control system of a plasma etching machine. Background Art

[0002] A plasma etcher is a key device in semiconductor manufacturing and microelectronics processing. It uses plasma to precisely etch or clean materials. For example, after drilling a hole in a circuit board, a plasma etcher is needed to remove the residual glue in the hole.

[0003] The electrode assembly is the most important component in a plasma etcher, consisting of several parallel electrode plates. During the etching process, etching uniformity is a very important indicator, which indicates whether the etching rate of each area of ​​the electrode assembly is consistent. Temperature control of the electrode plates is an important prerequisite for ensuring etching uniformity. Currently, plasma etchers on the market use a main switch to control the flow of cooling water through the electrode plates to achieve an overall cooling effect. A temperature sensor is set in the vacuum chamber to characterize the overall temperature of the plasma etcher, and the temperature of the electrode assembly is controlled within the optimal range through the main switch. However, during the reaction process, the temperature of each electrode plate will be different. Only using a temperature sensor to detect the temperature of the entire vacuum chamber cannot accurately detect the temperature difference between each electrode plate. Only using the main switch to control the overall temperature of the electrode assembly cannot accurately and dynamically control the temperature of each electrode plate. Some products with very high requirements for etching uniformity are not suitable for current plasma etchers. Utility Model Content

[0004] In order to overcome the above problems, the present invention provides a temperature control system for a plasma etching machine. The technical solutions adopted by the present invention to solve the technical problems are as follows:

[0005] A temperature control system for a plasma etching machine includes a vacuum chamber, in which an electrode assembly is arranged. The electrode assembly includes a plurality of electrode plates. The vacuum chamber is also provided with a plurality of solenoid valves electrically connected to a central controller. The solenoid valves control the flow rate of cooling water in the electrode plates in a one-to-one correspondence; each electrode plate is provided with a temperature sensor electrically connected to the central controller.

[0006] Furthermore, the rear end of the electrode assembly is fixed in the vacuum chamber through a connecting strip, and a number of fixing blocks are provided on the connecting strip. The fixing blocks are arranged one by one behind the electrode plate. The rear end of the electrode plate is provided with an insulating pressure block, and a fixing groove is provided on the surface where the insulating pressure block contacts the rear end of the electrode plate. The temperature sensor is inserted into the fixing groove, and an extrusion screw is provided on the fixing block. The extrusion screw presses the insulating pressure block to fix the temperature sensor to the rear end surface of the electrode plate.

[0007] Furthermore, the insulating pressing block has a positioning groove, the rear end of the electrode plate is inserted into the positioning groove, and the fixing groove is arranged on the center line of the bottom surface of the positioning groove.

[0008] Furthermore, a screw hole is provided on the fixing block, and a crimping hole is provided at the rear end of the insulating pressure block, and the screw hole and the crimping hole are located on the same straight line; the extrusion screw is provided on the fixing block through the screw hole, and the extrusion screw is inserted into the crimping hole to crimp the insulating pressure block.

[0009] Furthermore, a lead vacuum sealing mechanism is provided on the top of the vacuum chamber; the lead of the temperature sensor extends along the rear end of the electrode plate to the top and passes through the vacuum chamber through the lead vacuum sealing mechanism, and an insulating sleeve is provided on the lead.

[0010] Furthermore, the lead vacuum sealing mechanism includes a vacuum cap connected to the vacuum chamber, and the top plane of the vacuum cap is provided with a plurality of first sealing grooves and a plurality of locking screw holes, and the first sealing grooves are provided with first lead holes penetrating into the vacuum cap, and the first sealing ring is provided in the first sealing grooves, and the inner circle of the first sealing ring coincides with the first lead hole, and the first sealing ring protrudes from the top plane of the vacuum cap; the top plane of the vacuum cap is covered with a first pressure plate, and the first pressure plate is provided with a plurality of second lead holes and a plurality of first alignment holes, and the locking screws pass through the first alignment holes and are screwed into the locking screw holes to lock the first pressure plate.

[0011] Furthermore, both the first lead hole and the second lead hole are provided with parity marks.

[0012] Furthermore, a feed port is provided at the front end of the vacuum chamber, which is sealed by a vacuum door; and an inspection port is provided at the rear end of the vacuum chamber, which is sealed by the inspection door.

[0013] The beneficial effects of the utility model are:

[0014] The temperature control system of the plasma etcher includes a vacuum chamber, in which an electrode assembly is arranged. The electrode assembly includes several electrode plates. The vacuum chamber is also provided with several solenoid valves electrically connected to the central controller. The solenoid valves control the flow rate of cooling water in the electrode plates one by one. Each electrode plate is provided with a temperature sensor electrically connected to the central controller. When in use, the temperature sensor will monitor the temperature of each electrode plate accordingly and transmit the signal back to the central controller. After analysis, the central controller controls the flow rate of cooling water in each electrode plate through the solenoid valve of each electrode plate, thereby accurately controlling the temperature of each electrode plate to ensure that each electrode plate is always in the optimal working temperature range during the reaction process, meeting the etching requirements of products with high etching uniformity requirements. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] The present invention will be further described below with reference to the accompanying drawings and specific embodiments, wherein:

[0016] Figure 1 It is a stereoscopic view of the temperature control system of the plasma etching machine Figure 1 ;

[0017] Figure 2 It is a stereoscopic view of the temperature control system of the plasma etching machine Figure 2 and a partial enlarged view;

[0018] Figure 3 This is an exploded view of the structure where the temperature sensor is set at the rear end of the electrode plate;

[0019] Figure 4 This is an exploded view of the lead vacuum seal structure.

[0020] Figure number mark:

[0021] 100. Vacuum chamber; 101. Electrode plate; 102. Solenoid valve; 103. Temperature sensor; 104. Connecting strip; 105. Fixing block; 106. Insulating pressure block; 107. Fixing groove; 108. Positioning slot; 109. Screw hole; 110. Crimping hole; 111. Feed port; 112. Inspection port;

[0022] 200. Lead wire vacuum sealing mechanism; 201. Vacuum cap; 202. First sealing groove; 203. Locking screw hole; 204. First lead wire hole; 205. First sealing rubber ring; 206. First pressure plate; 207. Second lead wire hole; 208. First alignment hole; 209. Parity mark; 210. Locking screw. DETAILED DESCRIPTION

[0023] In order to better understand the purpose, structure and function of the present invention, the following is a further detailed description of a specific embodiment of the present invention "a temperature control system for a plasma etching machine" in conjunction with the accompanying drawings.

[0024] See also Figure 1 and Figure 2In this embodiment, the temperature control system of the plasma etching machine includes a vacuum chamber 100, in which an electrode assembly is provided. The electrode assembly includes a plurality of vertical and equally spaced electrode plates 101. The vacuum chamber 100 is also provided with a plurality of solenoid valves 102 electrically connected to the central controller. The solenoid valves 102 control the flow rate of cooling water in the electrode plates 101 in a one-to-one correspondence; each electrode plate 101 is provided with a temperature sensor 103 electrically connected to the central controller. When in use, an optimal working temperature range is first preset in the central controller. After the plasma etcher is working, the temperature of each electrode plate 101 will be high or low. When the temperature of one of the electrode plates 101 rises to exceed the set temperature range, the temperature sensor 103 on the corresponding electrode plate 101 will send a signal to the central controller. The central controller controls the corresponding solenoid valve 102 to increase the flow rate of cooling water and reduce the temperature of the corresponding electrode plate 101 so that its temperature remains in the optimal working temperature range. This system can dynamically and accurately detect and adjust the temperature of each electrode plate 101 so that all electrode plates 101 remain in the required temperature range during the working stage of the plasma etcher, ensuring the temperature balance between each electrode plate 101, thereby greatly improving the overall etching uniformity of the plasma etcher and meeting the etching needs of products with very high requirements for etching uniformity.

[0025] See further Figure 2 and Figure 3 In this embodiment, the rear end of the electrode assembly is fixed in the vacuum chamber 100 by a connecting bar 104. A number of fixing blocks 105 are provided on the connecting bar 104. The fixing blocks 105 are arranged one by one behind the electrode plate 101. The rear end of the electrode plate 101 is provided with an insulating pressure block 106. Preferably, the insulating pressure block 106 is made of Teflon material and has excellent insulation performance and high temperature and corrosion resistance. A vertical fixing groove 107 is provided on the surface of the insulating pressure block 106 that contacts the rear end of the electrode plate 101. The temperature sensor 103 is vertically inserted into the fixing groove 107 and fits with the rear end surface of the electrode plate 101. An extrusion screw is provided on the fixing block 105. The extrusion screw is tightened, and one end of the extrusion screw is crimped to the insulating pressure block 106 to make the temperature sensor 103 fit tightly with the rear end surface of the electrode plate 101 and remain fixed. It should be noted that the selected temperature sensor is in the shape of a slender rod. In this way, by installing this temperature sensor 103 at the rear end of each electrode plate 101, it can detect the temperature changes of each electrode plate 101 during operation without affecting the size of the space inside the vacuum chamber 100 of the plasma etcher, and will not cause any impact on the normal etching / cleaning operations of the plasma etcher.

[0026] See further Figure 3In this embodiment, the insulating pressure block 106 has a positioning groove 108, the width of the positioning groove 108 matches the width of the electrode plate 101, the rear end of the electrode plate 101 is inserted into the positioning groove 108, and the fixing groove 107 is set on the center line of the bottom surface of the positioning groove 108; this ensures that the insulating pressure block 106 and the electrode plate 101 are tightly fitted and will not shake or deviate. The insulating pressure block 106 can stably press the temperature sensor 103 against the rear end surface of the electrode plate 101, and the temperature sensor 103 is positioned in the middle position of the rear end surface of the electrode plate 101. The detected temperature more accurately represents the current temperature of the electrode plate 101.

[0027] More specifically, in this embodiment, a screw hole 109 is provided on the fixing block 105, and a crimping hole 110 is provided at the rear end of the insulating pressing block 106. The screw hole 109 and the crimping hole 110 are located on the same straight line, and a compression screw is installed on the fixing block 105 through the screw hole 109. When fixing the insulating pressing block 106, the compression screw is tightened, and the compression screw passes through the crimping hole 110 to crimp the insulating pressing block 106, ensuring that the insulating pressing block 106 stably presses the temperature sensor 103 to the rear end surface of the electrode plate 101, and preventing the compression screw from slipping when squeezing the insulating pressing block 106. When repairing or replacing the temperature sensor 103, the compression screw is loosened, and the compression screw passes through the crimping hole 110, and the insulating pressing block 106 and the temperature sensor 103 can be removed.

[0028] See further Figure 2 In this embodiment, a lead vacuum sealing mechanism 200 is provided at the top of the vacuum chamber 100, and the lead vacuum sealing mechanism 200 is provided at the rear of the vacuum chamber 100, directly above the rear end of the electrode assembly; the lead of the temperature sensor 103 extends to the top along the rear end of the electrode plate 101, and passes through the vacuum chamber 100 through the lead vacuum sealing mechanism 200, so as to ensure that the temperature sensor 103 and the lead are both provided at the rear end of the vacuum chamber 100, without affecting the space of the vacuum chamber 100; and, in this embodiment, an insulating sleeve is sleeved on the lead, and the insulating sleeve is preferably made of Teflon material, which has excellent insulation, high temperature resistance and corrosion resistance, and provides support for the lead, ensuring that the lead can extend vertically along the rear end surface of the electrode plate 101 to the top of the vacuum chamber 100, and then pass through the lead vacuum sealing mechanism 200, so that the lead is convenient to set up and manage, and will not be entangled and affect the space in the vacuum chamber 100.

[0029] See further Figure 4In this embodiment, the lead vacuum sealing mechanism 200 includes a vacuum cap 201 connected to the vacuum chamber 100, and the top plane of the vacuum cap 201 is provided with a plurality of first sealing grooves 202 and a plurality of locking screw holes 203. The first sealing grooves 202 are each provided with a first lead hole 204 that penetrates the vacuum cap 201, and the first sealing rubber ring 205 is each provided in the first sealing groove 202. The inner circle of the first sealing rubber ring 205 coincides with the first lead hole 204, and the first sealing rubber ring 205 protrudes from the top plane of the vacuum cap 201; the top plane of the vacuum cap 201 is covered with a first pressing plate 206, and the first pressing plate 206 is provided with a plurality of second lead holes 207 and a plurality of first alignment holes 208. The locking screws 210 pass through the first alignment holes 208 and are screwed into the locking screw holes 203 to lock the first pressing plate 206. During assembly, the lead of the temperature sensor 103 is led from the inside of the vacuum equipment through the first lead hole 204, the inner ring of the first sealing rubber ring 205 and the second lead hole 207 to the outside. The locking screw 210 passes through the first alignment hole 208 and is screwed into the locking screw hole 203 to lock the first pressure plate 206. The bottom plane of the first pressure plate 206 is pressed against the first sealing rubber ring 205. The first sealing rubber ring 205 is deformed during extrusion, and the inner ring is squeezed inward to vacuum seal the lead.

[0030] It should be noted that the traditional lead sealing mechanism can only seal one lead, which means that as many openings as there are leads must be opened on the vacuum chamber 100 to set up the traditional lead sealing mechanism. Opening so many openings on the vacuum chamber 100 will damage the overall structural strength of the vacuum chamber 100 and affect the ability of the vacuum chamber 100 to evacuate the vacuum chamber. However, the lead vacuum sealing mechanism 200 in this embodiment can seal multiple leads at the same time. Only 1-2 openings need to be set on the vacuum chamber 100 for installing the lead vacuum sealing mechanism 200. This will not affect the overall structural strength of the vacuum chamber 100 and can meet the requirements of the multi-lead setting of the present invention.

[0031] For more details, see Figure 4 In this embodiment, both the first lead hole 204 and the second lead hole 207 are provided with a parity mark 209, so that it is possible to mark which lead wire passes through which lead hole, thereby conveniently marking the corresponding temperature sensor 103 for subsequent maintenance and replacement.

[0032] See further Figure 1 and Figure 2In this embodiment, a feed port 111 is provided at the front end of the vacuum chamber 100, which is convenient for putting in / out products from the front end, and the feed port 111 is vacuum-sealed by a vacuum door of the existing technology; an inspection port 112 is provided at the rear end of the vacuum chamber 100, which is convenient for opening from the rear end, and the temperature control system of the plasma etching machine can be inspected and maintained from the rear end, which is convenient for operation, and an inspection door is provided by the existing vacuum door technology to vacuum-seal the inspection port 112.

[0033] It is understood that the present invention is described by way of certain embodiments, and those skilled in the art will appreciate that various changes or equivalent substitutions may be made to these features and embodiments without departing from the spirit and scope of the present invention. Furthermore, under the guidance of the present invention, these features and embodiments may be modified to suit specific circumstances and materials without departing from the spirit and scope of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed herein, and all embodiments falling within the scope of the claims of this application are intended to be protected by the present invention.

[0034] In the description of the present invention, it should be noted that the terms "center", "up", "down", "left", "right", "vertical", "horizontal", "inside", "outside" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In the description of this application, "multiple" and "several" are understood to be "at least two". "And / or" describes the association relationship of associated objects, indicating that three relationships may exist. For example, A and / or B can mean: A exists alone, A and B exist at the same time, and B exists alone. A is connected to B, which can mean: A is directly connected to B and A is connected to B through C. In addition, the terms "first", "second" and "third" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance.

Claims

1. A temperature control system for a plasma etching machine, characterized in that: The invention comprises a vacuum chamber (100), wherein an electrode assembly is provided in the vacuum chamber (100), wherein the electrode assembly comprises a plurality of electrode plates (101), and the vacuum chamber (100) is further provided with a plurality of solenoid valves (102) electrically connected to a central controller, wherein the solenoid valves (102) control the flow rate of cooling water in the electrode plates (101) in a one-to-one correspondence; each of the electrode plates (101) is provided with a temperature sensor (103) electrically connected to the central controller, wherein the temperature sensors (103) are provided on the rear end surface of the electrode plate (101) through an insulating pressing block (106); a lead vacuum sealing mechanism (200) is provided on the top of the vacuum chamber (100); the lead of the temperature sensor (103) extends along the rear end edge of the electrode plate (101) to the top, and passes through the vacuum chamber (100) through the lead vacuum sealing mechanism (200), and the lead is sleeved with an insulating sleeve.

2. A plasma etching machine temperature control system according to claim 1, characterized in that: The rear end of the electrode assembly is fixedly arranged in the vacuum chamber (100) via a connecting bar (104), and a plurality of fixing blocks (105) are provided on the connecting bar (104). The fixing blocks (105) are arranged one by one at the rear of the electrode plate (101). The rear end of each electrode plate (101) is provided with the insulating pressing block (106), and a fixing groove (107) is provided on the surface of the insulating pressing block (106) in contact with the rear end of the electrode plate (101). The temperature sensor (103) is inserted into the fixing groove (107). The fixing block (105) is provided with an extrusion screw, and the extrusion screw presses the insulating pressing block (106) so that the temperature sensor (103) is fixedly fitted to the rear end surface of the electrode plate (101).

3. A temperature control system for a plasma etching machine according to claim 2, characterized in that: The insulating pressing block (106) has a positioning groove (108), the rear end of the electrode plate (101) is inserted into the positioning groove (108), and the fixing groove (107) is arranged on the center line of the bottom surface of the positioning groove (108).

4. A temperature control system for a plasma etching machine according to claim 3, characterized in that: The fixing block (105) is provided with a screw hole (109), and the rear end of the insulating pressing block (106) is provided with a crimping hole (110), wherein the screw hole (109) and the crimping hole (110) are located on the same straight line; the extrusion screw is provided on the fixing block (105) through the screw hole (109), and the extrusion screw is inserted into the crimping hole (110) to crimp the insulating pressing block (106).

5. A temperature control system for a plasma etching machine according to claim 4, characterized in that: The lead wire vacuum sealing mechanism (200) comprises a vacuum cap (201) in communication with the vacuum chamber (100), a top plane of the vacuum cap (201) is provided with a plurality of first sealing grooves (202) and a plurality of locking screw holes (203), the first sealing grooves (202) are each provided with a first lead wire hole (204) penetrating into the vacuum cap (201), the first sealing grooves (202) are each provided with a first sealing rubber ring (205), the inner ring of the first sealing rubber ring (205) is The vacuum cap (201) and the vacuum cap (201) overlap with the first lead hole (204), and the first sealing rubber ring (205) protrudes from the top plane of the vacuum cap (201); the top plane of the vacuum cap (201) is covered with a first pressing plate (206), and the first pressing plate (206) is provided with a plurality of second lead holes (207) and a plurality of first alignment holes (208); a locking screw (210) passes through the first alignment hole (208) and is screwed into the locking screw hole (203) to lock the first pressing plate (206).

6. A temperature control system for a plasma etching machine according to claim 5, characterized in that: Both the first lead hole (204) and the second lead hole (207) are provided with a parity mark (209).

7. A temperature control system for a plasma etching machine according to any one of claims 1 to 6, characterized in that: A feed port (111) is provided at the front end of the vacuum chamber (100), and the feed port (111) is sealed by a vacuum door. A maintenance port (112) is provided at the rear end of the vacuum chamber (100), and the maintenance port (112) is sealed by the maintenance door.

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