Hydrofluoric acid blending and supplying system
The hydrofluoric acid mixing and supply system solves the problems of low efficiency, poor precision and insufficient safety of hydrofluoric acid mixing technology in semiconductor manufacturing, realizes efficient and accurate hydrofluoric acid supply, and meets the high precision and flexibility requirements of semiconductor manufacturing.
Patent Information
- Application Number
- CN202422165851.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-04
- Publication Date
- 2025-10-10
- Estimated Expiration
- 2034-09-04
AI Technical Summary
Existing hydrofluoric acid reagent mixing technology in semiconductor manufacturing has problems such as low efficiency, poor precision, insufficient safety and lack of flexibility, making it difficult to meet the needs of high precision and rapid adjustment.
A hydrofluoric acid mixing and supply system is used, including a hydrofluoric acid mixing and supply control cabinet and a mixing tank. By setting up an anhydrous hydrofluoric acid source interface, an ultrapure water source interface, a filter, a pump, a heat exchanger, a sampling box and other components, precise control and flexible adjustment of the mixing ratio and speed of hydrofluoric acid can be achieved.
It improves the supply efficiency of hydrofluoric acid, ensures the safety and production efficiency of the semiconductor manufacturing process, realizes modular hydrofluoric acid allocation and supply, avoids production interruptions, and meets the needs of high precision and flexibility.
Smart Images
Figure CN223417185U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to a kind of supply system technical field, especially a kind of hydrogen fluoride acid deployment supply system. BACKGROUND
[0002] In chemical experiments and industrial production, the accurate mixing and control of hydrofluoric acid reagent is of great significance. Hydrofluoric acid is a highly corrosive and toxic chemical substance, and its use and handling require special care. Traditional methods of mixing hydrofluoric acid reagent often rely on manual operation or simple mechanical stirring, which has many defects. Manual operation is not only inefficient, but also prone to human error, resulting in inaccurate mixing ratios and affecting experimental results or product quality. At the same time, direct human contact with hydrofluoric acid reagent also poses a significant safety risk. Although mechanical stirring improves mixing efficiency to some extent, it still cannot accurately control the mixing ratio, and for some high-demand experiments and production processes, the mixing effect often cannot meet the requirements.
[0003] In addition, existing mixing control systems lack flexibility and adaptability when dealing with complex process flows and variable production demands. For example, when the mixing ratio and speed need to be quickly adjusted according to different experimental conditions or production tasks, existing systems are difficult to respond quickly and make accurate adjustments. In some special application scenarios, such as the semiconductor manufacturing industry, which requires extremely high mixing precision, traditional mixing methods and control systems cannot meet the requirements. Since hydrofluoric acid reagent plays a key role in semiconductor manufacturing, any minor mixing error can lead to a decline in chip performance or even failure of the entire production process. In summary, existing hydrofluoric acid reagent mixing technology and control systems have low efficiency, poor precision, insufficient safety, and lack of flexibility, among other issues, necessitating an innovative, efficient, and precise pneumatic pipeline mixing control system to meet growing demands. SUMMARY
[0004] The utility model aims to solve the problems of low efficiency, poor precision, insufficient safety, and lack of flexibility in hydrofluoric acid mixing technology and control systems during semiconductor manufacturing.
[0005] To achieve the above-mentioned purpose, the utility model adopts the following technical solutions:
[0006] The utility model provides a hydrofluoric acid preparation and supply system, comprising a hydrofluoric acid preparation and supply control cabinet and a preparation tank; wherein the preparation tank is provided with an anhydrous hydrofluoric acid source interface and an ultrapure water source interface, the preparation tank is connected to a first end of a first hydrofluoric acid transport pipeline, the second end of the first hydrofluoric acid transport pipeline enters the hydrofluoric acid preparation and supply control cabinet body, is connected to an inlet end of a first filter, the outlet end of the first filter is connected to an inlet end of a second filter, and the outlet end of the second filter is connected to the hydrofluoric acid supply interface.
[0007] In a preferred embodiment, a pump is provided upstream of the first filter on the first hydrofluoric acid transport pipeline, for example, a magnetic pump. The pump may be one or at least two. When there are at least two pumps, the pumps are arranged in parallel.
[0008] In a preferred embodiment, in the hydrofluoric acid preparation and supply control cabinet, a second hydrofluoric acid transport pipe is connected to the pipe between the outlet end of the second filter and the hydrofluoric acid supply interface. After the second hydrofluoric acid transport pipe passes through the cabinet body of the hydrofluoric acid preparation and supply control cabinet, it is connected to the preparation tank.
[0009] In a preferred embodiment, in the hydrofluoric acid preparation and supply control cabinet, a third hydrofluoric acid transport pipeline is connected to the pipeline between the inlet end of the first filter and the pump. After the third hydrofluoric acid transport pipeline passes through the cabinet body of the hydrofluoric acid preparation and supply control cabinet, it is connected to the preparation tank.
[0010] In a preferred embodiment, a heat exchanger is further provided on the third hydrofluoric acid transport pipeline, and the inlet end of the heat exchanger is for the entry of temperature-controlled water; and the outlet end of the heat exchanger is for the discharge of the temperature-controlled water after heat exchange treatment.
[0011] In a preferred embodiment, the hydrofluoric acid preparation and supply control cabinet is further provided with a sampling box, and a fourth hydrofluoric acid transport pipeline is further connected to the pipeline between the first filter and the pump, and the fourth hydrofluoric acid transport pipeline is connected to the sampling box.
[0012] In a preferred embodiment, a fifth hydrofluoric acid transport pipeline is further connected to the pipeline between the second filter and the hydrofluoric acid supply interface, and the fifth hydrofluoric acid transport pipeline is connected to the sampling box.
[0013] In a preferred embodiment, the hydrofluoric acid preparation and supply control cabinet is further provided with a cleaning water source interface, and the cleaning water source interface is connected to the sampling box through a pipeline.
[0014] In a preferred embodiment, the cleaning water source interface is further connected to a cleaning water gun for cleaning the inner cavity of the hydrofluoric acid preparation and supply control cabinet.
[0015] In a preferred embodiment, the hydrofluoric acid preparation and supply control cabinet is also provided with a nitrogen source interface and a gas filter. The nitrogen source interface is connected to the gas filter through a pipeline, and then connected to the first end of the first nitrogen transport pipeline. The second end of the first nitrogen transport pipeline passes through the cabinet body of the hydrofluoric acid preparation and supply control cabinet and is connected to the preparation tank.
[0016] In a preferred embodiment, a liquid level gauge is further provided in the hydrofluoric acid preparation and supply control cabinet, and the first nitrogen transport pipeline is further connected to a second nitrogen transport pipeline before passing through the hydrofluoric acid preparation and supply control cabinet body, and the second nitrogen transport pipeline is connected to the liquid level gauge.
[0017] In a preferred embodiment, in the hydrofluoric acid preparation and supply control cabinet, the first nitrogen transport pipeline is also connected to a third nitrogen transport pipeline, and the third nitrogen transport pipeline is connected to a nitrogen gun for purging the inner cavity of the hydrofluoric acid preparation and supply control cabinet.
[0018] In a preferred embodiment, the hydrofluoric acid preparation and supply control cabinet is also provided with an exhaust pipe, and the liquid level meter is connected to the exhaust pipe.
[0019] In a preferred embodiment, the hydrofluoric acid preparation and supply control cabinet is also provided with a drain pipe, and any one or more of the liquid level meter, the exhaust pipe, the sampling box, the first filter, the second filter, and the pump can be connected to the drain pipe.
[0020] It should be understood that each pipeline for conveying hydrofluoric acid, pipeline for conveying nitrogen, and pipeline for conveying water in the present application can be individually provided with a valve.
[0021] Compared with the prior art, the technical solution of the utility model has the following beneficial effects:
[0022] The utility model provides a hydrofluoric acid dispensing and supply system. It addresses the problems of low efficiency, poor precision, insufficient safety, and lack of flexibility in hydrofluoric acid supply control during semiconductor manufacturing. It achieves a continuous supply of industrial hydrofluoric acid, improves its supply efficiency, and thereby increases the production efficiency of semiconductor manufacturing plants. It avoids temporary production or production reductions caused by interruptions in the supply of industrial hydrofluoric acid during semiconductor device production, and achieves modularization of the industrial hydrofluoric acid dispensing and supply system. BRIEF DESCRIPTION OF THE DRAWINGS
[0023] The accompanying drawings, which constitute part of this application, are intended to provide a further understanding of this application. The exemplary embodiments and descriptions of this application are intended to explain this application and do not constitute an improper limitation on this application. In the accompanying drawings:
[0024] Figure 1It is a kind of hydrofluoric acid deployment supply system process flow chart of preferred embodiment of the utility model.
[0025] Legend:
[0026] 1, hydrofluoric acid deployment supply control cabinet;2, deployment tank;3, anhydrous hydrofluoric acid source interface;4, ultrapure water source interface;5, hydrofluoric acid first transport pipeline;6, first filter;7, second filter;8, hydrofluoric acid supply interface;9, pump;10, hydrofluoric acid second transport pipeline;11, hydrofluoric acid third transport pipeline;12, heat exchanger;13, sampling box;14, hydrofluoric acid fourth transport pipeline;15, hydrofluoric acid fifth transport pipeline;16, cleaning water source interface;17, nitrogen source interface;18, gas filter;19, nitrogen first transport pipeline;20, liquid level meter;21, nitrogen second transport pipeline;22, nitrogen third transport pipeline;23, exhaust pipe;24, drain pipe. Specific embodiments
[0027] To make the purpose, technical scheme and effect of the utility model more clear, definite, the following refers to the drawings and examples are described in detail to the utility model.It should be understood that the specific embodiments described herein are only to explain the utility model, and not for limiting the utility model.
[0028] It should be noted that the description and claims of the utility model and the above-mentioned terms "first", "second" and the like in the drawings are used to distinguish similar objects, and do not have to be used to describe a specific order or sequence, it should be understood that such data can be exchanged under appropriate circumstances.This in addition, the terms "include" and "have" and any variation thereof, is intended to cover non-exclusive inclusion, for example, a system, product or device including a series of units does not have to be limited to those clearly listed, but can include other units not clearly listed or inherent to these products or devices.
[0029] Example 1:
[0030] As Figure 1 Described, a kind of hydrofluoric acid deployment supply system, including hydrofluoric acid deployment supply control cabinet 1 and deployment tank 2;Wherein, the deployment tank 2 is equipped with anhydrous hydrofluoric acid source interface 3 and ultrapure water source interface 4, the deployment tank 2 connects the first end of hydrofluoric acid first transport pipeline 5, the second end of the hydrofluoric acid first transport pipeline 5 enters the cabinet body of the hydrofluoric acid deployment supply control cabinet 1, connects the inlet end of first filter 6, the inlet end of second filter 7 is connected to the outlet end of first filter 6, the outlet end of second filter 7 is connected to hydrofluoric acid supply interface 8.
[0031] Wherein, on the first hydrofluoric acid transportation pipeline 5, the upstream of the first filter 6 is also provided with a pump 9, which is a magnetic pump in this embodiment. The pump 9 can be one or at least two, and when the pump 9 is at least two, the pumps 9 are connected in parallel. By setting a magnetic pump on the hydrofluoric acid transportation pipeline, the necessary thrust is provided for the fluid, helping the chemical to overcome the frictional resistance and other obstacles in the pipeline, ensuring the smooth flow of the fluid; at the same time, it can also improve the efficiency of transportation and shorten the transportation time. Wherein, in the hydrofluoric acid preparation and supply control cabinet 1, a second hydrofluoric acid transportation pipeline 10 is also connected to the pipeline between the outlet end of the second filter 7 and the hydrofluoric acid supply interface 8. The second hydrofluoric acid transportation pipeline 10 is connected to the preparation tank 2 after passing through the cabinet body of the hydrofluoric acid preparation and supply control cabinet 1.
[0032] Wherein, in the hydrofluoric acid preparation and supply control cabinet 1, a third hydrofluoric acid transportation pipeline 11 is also connected to the pipeline between the inlet end of the first filter 6 and the pump 9. The third hydrofluoric acid transportation pipeline 11 is connected to the preparation tank 2 after passing through the cabinet body of the hydrofluoric acid preparation and supply control cabinet 1.
[0033] Wherein, the third hydrofluoric acid transportation pipeline 11 is also provided with a heat exchanger 12. The inlet end a of the heat exchanger 12 is used for the inlet of temperature control water. The outlet end b of the heat exchanger 12 is used for the outlet of temperature control water after heat exchange treatment. The heat exchanger 12 can effectively control the temperature of the chemical flowing through the pipeline, which is particularly important for chemicals that require specific temperature conditions. For example, some chemicals need to be kept stable at low temperature, while others need to be heated to maintain fluidity. Through the heat exchanger 12, dangerous situations such as vapor explosion or solid deposition blocking the pipeline caused by excessive high or low temperature can be avoided. By controlling the temperature, material stress and corrosion caused by temperature fluctuations can be reduced, thereby prolonging the service life of the pipeline and related equipment. By effectively managing the temperature, failures and maintenance requirements caused by abnormal temperature can be reduced, thereby reducing the overall maintenance cost.
[0034] Wherein, the hydrofluoric acid preparation and supply control cabinet 1 is also provided with a sampling box 13. A fourth hydrofluoric acid transportation pipeline 14 is also connected to the pipeline between the first filter 6 and the pump 9. The fourth hydrofluoric acid transportation pipeline 14 is connected to the sampling box 13.
[0035] Wherein, a fifth hydrofluoric acid transportation pipeline 15 is also connected to the pipeline between the second filter 7 and the hydrofluoric acid supply interface 8. The fifth hydrofluoric acid transportation pipeline 15 is connected to the sampling box 13. When the hydrofluoric acid in the fifth hydrofluoric acid transportation pipeline 15 is qualified, the valve can be opened to allow the hydrofluoric acid to be input to the hydrofluoric acid supply interface.
[0036] The hydrofluoric acid preparation and supply control cabinet 1 is further provided with a cleaning water source interface 16 , and the cleaning water source interface 16 is connected to the sampling box 13 through a pipeline for cleaning the sampling box 13 after sampling.
[0037] The cleaning water source interface 16 is further connected to a cleaning water gun W1 for cleaning the inner cavity of the hydrofluoric acid mixing and supply control cabinet 1 .
[0038] Among them, the hydrofluoric acid preparation and supply control cabinet 1 is also provided with a nitrogen source interface 17 and a gas filter 18. The nitrogen source interface 17 is connected to the gas filter 18 through a pipeline, and then connected to the first end of the first nitrogen transport pipeline 19. The second end of the first nitrogen transport pipeline 19 passes through the cabinet body of the hydrofluoric acid preparation and supply control cabinet 1 and is connected to the preparation tank 2.
[0039] Among them, a liquid level gauge 20 is also provided in the hydrofluoric acid preparation and supply control cabinet 1, and the first nitrogen transport pipe 19 is also connected to a second nitrogen transport pipe 21 before passing through the cabinet body of the hydrofluoric acid preparation and supply control cabinet 1, and the second nitrogen transport pipe 19 is connected to the liquid level gauge 20.
[0040] Among them, in the hydrofluoric acid mixing and supply control cabinet 1, the first nitrogen transport pipeline 19 is also connected to the third nitrogen transport pipeline 22, and the third nitrogen transport pipeline 22 is connected to a nitrogen gun N1 for purging the inner cavity of the hydrofluoric acid mixing and supply control cabinet 1.
[0041] The hydrofluoric acid preparation and supply control cabinet 1 is further provided with an exhaust pipe 23 , and the liquid level meter 20 is connected to the exhaust pipe 23 .
[0042] The hydrofluoric acid preparation and supply control cabinet 1 is also provided with a drain pipe 24 , and any one or more of the liquid level meter 20 , the exhaust pipe 23 , the sampling box 13 , the first filter 6 , the second filter 7 , and the pump 9 can be connected to the drain pipe 24 .
[0043] It should be understood that each pipeline for conveying hydrofluoric acid, pipeline for conveying nitrogen, and pipeline for conveying water in the present application can be individually provided with a valve.
[0044] The above detailed description of the specific embodiments of the present invention serves only as examples, and the present invention is not limited to the specific embodiments described above. For those skilled in the art, any equivalent modifications and substitutions made to the above embodiments are also within the scope of the present invention. Therefore, any equivalent changes and modifications made without departing from the spirit and scope of the present invention are intended to be encompassed within the scope of the present invention.
Claims
1. A hydrofluoric acid preparation and supply system, characterized in that: It includes a hydrofluoric acid preparation and supply control cabinet and a preparation tank; wherein, the preparation tank is provided with an anhydrous hydrofluoric acid source interface and an ultrapure water source interface, the preparation tank is connected to the first end of the first hydrofluoric acid transport pipeline, the second end of the first hydrofluoric acid transport pipeline enters the hydrofluoric acid preparation and supply control cabinet cabinet, is connected to the inlet end of the first filter, the outlet end of the first filter is connected to the inlet end of the second filter, and the outlet end of the second filter is connected to the hydrofluoric acid supply interface.
2. A hydrofluoric acid preparation and supply system according to claim 1, characterized in that: In the hydrofluoric acid preparation and supply control cabinet, a second hydrofluoric acid transport pipe is connected to the pipe between the outlet end of the second filter and the hydrofluoric acid supply interface. After the second hydrofluoric acid transport pipe passes through the hydrofluoric acid preparation and supply control cabinet, it is connected to the preparation tank.
3. A hydrofluoric acid preparation and supply system according to claim 1, characterized in that: On the first hydrofluoric acid transport pipeline, a pump is further provided upstream of the first filter. The number of the pumps is one or at least two. When there are at least two pumps, the pumps are provided in parallel.
4. A hydrofluoric acid preparation and supply system according to claim 3, characterized in that: In the hydrofluoric acid preparation and supply control cabinet, a third hydrofluoric acid transport pipeline is connected to the pipeline between the inlet end of the first filter and the pump. After the third hydrofluoric acid transport pipeline passes through the hydrofluoric acid preparation and supply control cabinet, it is connected to the preparation tank.
5. A hydrofluoric acid preparation and supply system according to claim 4, characterized in that: The third hydrofluoric acid transport pipeline is further provided with a heat exchanger, the inlet end of the heat exchanger is for the entry of temperature-controlled water; the outlet end of the heat exchanger is for the discharge of the temperature-controlled water after heat exchange treatment.
6. A hydrofluoric acid preparation and supply system according to claim 3, characterized in that: The hydrofluoric acid preparation and supply control cabinet is also provided with a sampling box, and a fourth hydrofluoric acid transport pipeline is also connected to the pipeline between the first filter and the pump, and the fourth hydrofluoric acid transport pipeline is connected to the sampling box; Wherein, a fifth hydrofluoric acid transport pipeline is further connected to the pipeline between the second filter and the hydrofluoric acid supply interface, and the fifth hydrofluoric acid transport pipeline is connected to the sampling box; Among them, the hydrofluoric acid mixing and supply control cabinet is also provided with a cleaning water source interface, which is connected to the sampling box through a pipeline; the cleaning water source interface is also connected to a cleaning water gun for cleaning the inner cavity of the hydrofluoric acid mixing and supply control cabinet.
7. A hydrofluoric acid preparation and supply system according to claim 6, characterized in that: The hydrofluoric acid preparation and supply control cabinet is also provided with a nitrogen source interface and a gas filter. The nitrogen source interface is connected to the gas filter through a pipeline, and then connected to the first end of the first nitrogen transport pipeline. The second end of the first nitrogen transport pipeline passes through the cabinet body of the hydrofluoric acid preparation and supply control cabinet and is connected to the preparation tank.
8. A hydrofluoric acid preparation and supply system according to claim 7, characterized in that: A liquid level gauge is also provided in the hydrofluoric acid preparation and supply control cabinet. The first nitrogen transport pipeline is further connected to a second nitrogen transport pipeline before passing through the hydrofluoric acid preparation and supply control cabinet body. The second nitrogen transport pipeline is connected to the liquid level gauge. Among them, in the hydrofluoric acid mixing and supply control cabinet, the first nitrogen transport pipeline is also connected to the third nitrogen transport pipeline, and the third nitrogen transport pipeline is connected to a nitrogen gun for purging the inner cavity of the hydrofluoric acid mixing and supply control cabinet.
9. A hydrofluoric acid preparation and supply system according to claim 8, characterized in that: The hydrofluoric acid preparation and supply control cabinet is also provided with an exhaust pipe, and the liquid level meter is connected to the exhaust pipe.
10. A hydrofluoric acid preparation and supply system according to claim 9, characterized in that: The hydrofluoric acid preparation and supply control cabinet is also provided with a drain pipe, and any one or more of the liquid level meter, the exhaust pipe, the sampling box, the first filter, the second filter, and the pump are connected to the drain pipe.