High-precision photoetching machine with cleaning structure

Abstract

The utility model relates to the field of photoetching machines, in particular to a high-precision photoetching machine with a cleaning structure. The photoetching machine comprises a photoetching machine main body, a working table is arranged at the lower end of the photoetching machine main body, and an accommodating cavity is formed in the working table; the transfer component is detachably arranged at the upper end of the workbench, and supporting plates are symmetrically arranged at the bottom of the transfer component; the cleaning component is detachably arranged at the upper end of the transfer component, and the cleaning component is provided with a second support; and the collecting component is provided with a collecting hopper. According to the high-precision photoetching machine with the cleaning structure, the cleaning component is mounted at the upper end of the transfer component, after a third hydraulic cylinder is started, a second motor on one side of a mounting plate is driven to move up and down, and after the second motor is started, a brush disc is driven to rotate, so that the cleaning component can clean scraps at the upper end of the transfer component; and the chippings do not need to be cleaned manually.

Description

Technical Field

[0001] The utility model relates to the field of photolithography machines, in particular to a high-precision photolithography machine with a cleaning structure. Background Art

[0002] Lithography machines are core equipment in the photolithography process of chip manufacturing. The chip manufacturing process is extremely complex, and photolithography is the most critical step in the process. Lithography determines the critical dimensions of the chip and accounts for approximately 35% of the overall manufacturing cost. The photolithography process transfers the geometric patterns on the mask onto the photoresist on the wafer surface.

[0003] Application No. 201620887356.6 discloses a photolithography machine, including a work platform, a PLC control system, and an exposure device. The X-axis sliding platform and the Z-axis sliding platform are connected by a sliding groove. The X-axis sliding platform and the Z-axis sliding platform are respectively connected to motors to achieve translation. The exposure device is set at the rear position of the X-axis. The exposure device is connected to the motor to adjust the angle between the exposure device and the X-axis. The tray is connected to the motor. The curved product is placed on the tray and fixed with the angle set on the tray.

[0004] The lithography machine in the above-mentioned comparative documents lacks a cleaning component. During the use of the lithography machine, the debris generated cannot be cleaned. The accumulated debris will cause the lithography machine to be unable to be used normally, and the debris needs to be cleaned manually. In response to the above situation, we have launched a high-precision lithography machine with a cleaning structure. Utility Model Content

[0005] The purpose of the present utility model is to provide a high-precision lithography machine with a cleaning structure to solve the problem in the above-mentioned background technology that the lithography machine lacks a cleaning component, and the debris generated during the use of the lithography machine cannot be cleaned. The accumulated debris will cause the lithography machine to be unable to be used normally, and manual cleaning of the debris is required.

[0006] The technical solution of the utility model is: a high-precision photolithography machine with a cleaning structure, which includes

[0007] A photolithography machine body, wherein a workbench is provided at the lower end of the photolithography machine body, and an accommodating cavity is formed inside the workbench;

[0008] An adjusting member, the adjusting member being detachably arranged on the upper end of the workbench, and the adjusting member being provided with a first bracket;

[0009] A transfer member is detachably arranged on the upper end of the workbench, and a support plate is symmetrically provided on the bottom of the transfer member;

[0010] A cleaning member, the cleaning member being detachably arranged on the upper end of the transfer member, and the cleaning member being provided with a second bracket;

[0011] The collecting component is provided with a collecting bucket.

[0012] As a further solution of the present invention: a plurality of base plates are detachably arranged on the upper end of the workbench, a plurality of through holes are evenly arranged on the upper end surface of the base plates, and a support frame is provided on the upper end of the workbench.

[0013] As a further solution of the present invention: pads are symmetrically arranged on the bottom of the first bracket, a vertical plate is arranged on one side of the first bracket, and a first hydraulic cylinder is arranged on one side of the vertical plate.

[0014] As a further solution of the present invention: a horizontal plate is provided at the bottom output end of the first hydraulic cylinder, a connecting plate is arranged on one side of the horizontal plate, and a light source is detachably provided at one end of the connecting plate.

[0015] As a further solution of the present invention: a first motor is detachably provided on one side of the support plate, a conveyor belt is provided on the upper end of the support plate, a second hydraulic cylinder is provided on one side of the support plate, a push plate is provided on the output end of the second hydraulic cylinder, a sliding rod is fixedly connected to one side of the push plate, one end of the sliding rod passes through the support plate and is slidably connected to the support plate.

[0016] As a further solution of the present invention: a third hydraulic cylinder is detachably provided on the upper end of the second bracket, a support rod is symmetrically provided on the bottom of the second bracket, a mounting plate is provided at the bottom output end of the third hydraulic cylinder, both ends of the mounting plate are slidingly connected to the support rod, a bottom plate is fixedly connected to the bottom of the support rod, a second motor is provided on one side of the mounting plate, and a brush disc is provided at the bottom output end of the second motor.

[0017] As a further solution of the present invention: the collecting bucket is detachably arranged inside the workbench, the size of the collecting bucket is adapted to the size of the workbench, a connecting pipe is provided on one side of the bottom of the collecting bucket, a collecting box is provided on one side of the connecting pipe, and a handle is provided on the upper end of the collecting box.

[0018] The present invention provides a high-precision photolithography machine with a cleaning structure through improvement. Compared with the prior art, it has the following improvements and advantages:

[0019] First: The utility model installs the cleaning component on the upper end of the transfer component and the brush disc on the output end of the bottom of the second motor. Through the third hydraulic cylinder arranged on the upper end face of the second bracket, after the third hydraulic cylinder is started, the second motor on one side of the mounting plate is driven to move up and down, thereby adjusting the distance between the brush disc and the conveyor belt. After the second motor is started, the brush disc is driven to rotate, so that the cleaning component can clean the debris on the upper end of the transfer component, without the need for manual cleaning of the debris, thereby improving the working efficiency of the lithography machine.

[0020] Second: The utility model installs a collecting component in the cavity inside the main body of the lithography machine. The debris generated during the use of the lithography machine is cleaned by the cleaning component and falls into the bottom of the collecting bucket through multiple through holes on the upper end of the substrate. Then, it passes through the connecting pipe and enters the collection box. The debris can be collected quickly and conveniently through the set collecting component, and the collected debris can be transported quickly and conveniently through the set collection box, thereby reducing the impact of the collected debris on the use of the lithography machine. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The present invention will be further explained below in conjunction with the accompanying drawings and Examples:

[0022] Figure 1 It is a structural diagram of the main body of the utility model;

[0023] Figure 2 It is a structural diagram of the main body of the utility model from another angle;

[0024] Figure 3 It is a structural diagram of the regulating component of the utility model;

[0025] Figure 4 It is a structural schematic diagram of the transfer component of the utility model;

[0026] Figure 5 It is a structural diagram of the cleaning component of the utility model;

[0027] Figure 6 It is a structural schematic diagram of the collecting component of the utility model.

[0028] Explanation of the accompanying drawings: 1. Photolithography machine body; 11. Workbench; 12. Substrate; 13. Support frame; 2. Adjusting member; 21. First bracket; 22. Pad; 23. Vertical plate; 24. First hydraulic cylinder; 25. Horizontal plate; 26. Connecting plate; 27. Light source; 3. Transfer member; 31. Support plate; 32. First motor; 33. Conveyor belt; 34. Second hydraulic cylinder; 35. Push plate; 36. Slide rod; 4. Cleaning member; 41. Second bracket; 42. Third hydraulic cylinder; 43. Support rod; 44. Mounting plate; 45. Bottom plate; 46. Second motor; 47. Brush plate; 5. Collecting member; 51. Collecting bucket; 52. Connecting pipe; 53. Collecting box; 54. Handle. DETAILED DESCRIPTION

[0029] The following is a detailed description of the present invention, clearly and completely describing the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only a part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0030] Example 1

[0031] See also Figures 1-6 The utility model provides a technical solution: a high-precision lithography machine with a cleaning structure, which includes a lithography machine body 1, a workbench 11 is provided at the lower end of the lithography machine body 1, and the workbench 11 has a receiving cavity; an adjusting member 2, the adjusting member 2 is detachably arranged on the upper end of the workbench 11, and the adjusting member 2 is provided with a first bracket 21; a transfer member 3, the transfer member 3 is detachably arranged on the upper end of the workbench 11, and a support plate 31 is symmetrically provided at the bottom of the transfer member 3; a cleaning member 4, the cleaning member 4 is detachably arranged on the upper end of the transfer member 3, and the cleaning member 4 is provided with a second bracket 41; a collecting member 5, and the collecting member 5 is provided with a collecting bucket 51.

[0032] See also Figure 1-Figure 3 A plurality of substrates 12 are detachably arranged on the upper end of the workbench 11 , and a plurality of through holes are evenly arranged on the upper end surface of the substrate 12 . A supporting frame 13 is provided on the upper end of the workbench 11 .

[0033] A cushion block 22 is symmetrically provided at the bottom of the first bracket 21 . A vertical plate 23 is arranged on one side of the first bracket 21 . A first hydraulic cylinder 24 is provided on one side of the vertical plate 23 .

[0034] A horizontal plate 25 is provided at the output end of the bottom of the first hydraulic cylinder 24 , a connecting plate 26 is provided on one side of the horizontal plate 25 , and a light source 27 is detachably provided at one end of the connecting plate 26 .

[0035] During use, first install the cleaning component 4 on the upper end of the transfer component 3, and install the base plate 45 on the upper end surface of the support plate 31, then pass the support rod 43 through the two ends of the mounting plate 44, and install the second bracket 41 on the upper end surface of the base plate 45, then connect the mounting plate 44 to the output end at the bottom of the third hydraulic cylinder 42, install the second motor 46 on one side of the mounting plate 44, and install the brush plate 47 at the output end at the bottom of the second motor 46, through the third hydraulic cylinder 42 set on the upper end surface of the second bracket 41, after the third hydraulic cylinder 42 is started, it drives the second motor 46 on one side of the mounting plate 44 to move up and down, so that the distance between the brush plate 47 and the conveyor belt 33 can be adjusted, and after the second motor 46 is started, it drives the brush plate 47 to rotate, so that the cleaning component 4 can clean the debris on the upper end of the transfer component 3, without the need for manual cleaning of the debris, thereby improving the working efficiency of the lithography machine.

[0036] Example 2

[0037] See also Figures 1-6 The utility model provides a technical solution: a high-precision lithography machine with a cleaning structure, which includes a lithography machine body 1, a workbench 11 is provided at the lower end of the lithography machine body 1, and the workbench 11 has a receiving cavity; an adjusting member 2, the adjusting member 2 is detachably arranged on the upper end of the workbench 11, and the adjusting member 2 is provided with a first bracket 21; a transfer member 3, the transfer member 3 is detachably arranged on the upper end of the workbench 11, and a support plate 31 is symmetrically provided at the bottom of the transfer member 3; a cleaning member 4, the cleaning member 4 is detachably arranged on the upper end of the transfer member 3, and the cleaning member 4 is provided with a second bracket 41; a collecting member 5, and the collecting member 5 is provided with a collecting bucket 51.

[0038] See also Figure 4-Figure 6 A first motor 32 is detachably provided on one side of the support plate 31, a conveyor belt 33 is provided on the upper end of the support plate 31, a second hydraulic cylinder 34 is provided on one side of the support plate 31, and a push plate 35 is provided on the output end of the second hydraulic cylinder 34. A sliding rod 36 is fixedly connected to one side of the push plate 35, and one end of the sliding rod 36 passes through the support plate 31 and is slidably connected to the support plate 31.

[0039] A third hydraulic cylinder 42 is detachably provided at the upper end of the second bracket 41, and a support rod 43 is symmetrically provided at the bottom of the second bracket 41. A mounting plate 44 is provided at the bottom output end of the third hydraulic cylinder 42. Both ends of the mounting plate 44 are slidingly connected to the support rod 43. A bottom plate 45 is fixedly connected to the bottom of the support rod 43. A second motor 46 is provided on one side of the mounting plate 44, and a brush plate 47 is provided at the bottom output end of the second motor 46.

[0040] The collecting bucket 51 is detachably arranged inside the workbench 11. The size of the collecting bucket 51 is adapted to the size of the workbench 11. A connecting pipe 52 is provided on one side of the bottom of the collecting bucket 51. A collecting box 53 is provided on one side of the connecting pipe 52. A handle 54 is provided on the upper end of the collecting box 53.

[0041] During use, the collecting component 5 is installed in the cavity inside the main body 1 of the lithography machine, and multiple substrates 12 are installed on the upper end surface of the workbench 11, and then the connecting pipe 52 is installed on a side of the bottom of the collecting bucket 51, and the collecting box 53 is installed at one end of the connecting pipe 52. Through the collecting bucket 51 set inside the workbench 11, the debris generated during the use of the lithography machine is cleaned by the cleaning component 4, passes through the multiple through holes on the upper end of the substrate 12, and then falls into the bottom of the collecting bucket 51, and then passes through the connecting pipe 52 and finally enters the inside of the collecting box 53, thereby collecting the debris cleaned by the cleaning component 4. The debris can be collected quickly and conveniently through the setting of the collecting component 5, and the collected debris can be transported quickly and conveniently through the setting of the collecting box 53, thereby reducing the impact of the collected debris on the use of the lithography machine.

[0042] The above description of the disclosed embodiments will enable one skilled in the art to implement or use the present invention. Various modifications to these embodiments will be readily apparent to one skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention is not limited to the embodiments shown herein but is intended to conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A high-precision lithography machine with a cleaning structure, characterized in that: It includes A photolithography machine body (1), wherein a workbench (11) is provided at the lower end of the photolithography machine body (1), and an accommodating cavity is provided inside the workbench (11); An adjusting member (2), the adjusting member (2) being detachably arranged on the upper end of the workbench (11), and the adjusting member (2) being provided with a first bracket (21); A transfer member (3), the transfer member (3) being detachably arranged on the upper end of the workbench (11), and a support plate (31) being symmetrically arranged at the bottom of the transfer member (3); A cleaning member (4), the cleaning member (4) being detachably arranged on the upper end of the transfer member (3), and the cleaning member (4) being provided with a second bracket (41); The collecting component (5) is provided with a collecting bucket (51).

2. The high-precision lithography machine with a cleaning structure according to claim 1, characterized in that: A plurality of base plates (12) are detachably arranged on the upper end of the workbench (11), a plurality of through holes are evenly arranged on the upper end surface of the base plates (12), and a support frame (13) is arranged on the upper end of the workbench (11).

3. The high-precision lithography machine with a cleaning structure according to claim 1, characterized in that: A cushion block (22) is symmetrically arranged at the bottom of the first bracket (21), a vertical plate (23) is arranged on one side of the first bracket (21), and a first hydraulic cylinder (24) is arranged on one side of the vertical plate (23).

4. The high-precision lithography machine with a cleaning structure according to claim 3, characterized in that: A horizontal plate (25) is provided at the bottom output end of the first hydraulic cylinder (24), a connecting plate (26) is arranged on one side of the horizontal plate (25), and a light source (27) is detachably provided at one end of the connecting plate (26).

5. The high-precision lithography machine with a cleaning structure according to claim 1, characterized in that: A first motor (32) is detachably provided on one side of the support plate (31), a conveyor belt (33) is provided on the upper end of the support plate (31), a second hydraulic cylinder (34) is provided on one side of the support plate (31), a push plate (35) is provided on the output end of the second hydraulic cylinder (34), a slide rod (36) is fixedly connected to one side of the push plate (35), one end of the slide rod (36) passes through the support plate (31) and is slidably connected to the support plate (31).

6. The high-precision lithography machine with a cleaning structure according to claim 1, characterized in that: A third hydraulic cylinder (42) is detachably provided at the upper end of the second bracket (41), a support rod (43) is symmetrically provided at the bottom of the second bracket (41), a mounting plate (44) is provided at the output end of the bottom of the third hydraulic cylinder (42), both ends of the mounting plate (44) are slidably connected to the support rod (43), a bottom plate (45) is fixedly connected to the bottom of the support rod (43), a second motor (46) is provided on one side of the mounting plate (44), and a brush disc (47) is provided at the output end of the bottom of the second motor (46).

7. The high-precision lithography machine with a cleaning structure according to claim 1, characterized in that: The collecting bucket (51) is detachably arranged inside the workbench (11); the size of the collecting bucket (51) is adapted to the size of the workbench (11); a connecting pipe (52) is provided on one side of the bottom of the collecting bucket (51); a collecting box (53) is provided on one side of the connecting pipe (52); and a handle (54) is provided on the upper end of the collecting box (53).

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