Semiconductor liquid mixing system

Abstract

The utility model provides a semiconductor liquid mixing system. The semiconductor liquid mixing system comprises a liquid storage tank, a liquid outlet pipeline and at least two liquid inlet pipelines, wherein the liquid outlet pipeline and the liquid inlet pipelines are respectively communicated with the liquid storage tank; each liquid inlet pipeline comprises a stock solution inlet port, a flow control unit, a liquid outlet pneumatic valve and a stock solution outlet port communicated with the liquid storage tank; all the liquid outlet pneumatic valves are connected to the first electromagnetic valve through air pipes. The chemical liquid enters the liquid storage tank through the liquid inlet pipeline and is fully mixed to prepare the cleaning liquid, the chemical liquid pipelines do not need to be pressurized, and the size and the cost of the semiconductor liquid mixing system are reduced. On the other hand, the semiconductor liquid mixing system controls all liquid outlet pneumatic valves to be opened and closed at the same time through a first electromagnetic valve, the flow of each chemical liquid is accurately controlled through a flow control unit, and then the proportion of each chemical liquid entering a liquid storage tank is accurately controlled, so that the prepared cleaning liquid has extremely high precision; therefore, a better cleaning effect is achieved.

Description

TECHNICAL FIELD

[0001] The present application belongs to the technical field of semiconductor manufacturing, and relates to a semiconductor cleaning technology, in particular to a semiconductor mixed solution system. BACKGROUND

[0002] With the development of the chip manufacturing industry, the cleanliness of the wafer surface is becoming more and more stringent, and the cleaning technology is complex and indispensable. Among them, the wet cleaning uses liquid chemicals and deionized water to clean the silicon surface pollutants, organic debris and metal ion pollution through oxidation, corrosion and dissolution. The accuracy of the cleaning solution ratio is crucial to the cleaning effect of the wafer.

[0003] In the prior art, the chemical liquid is generally input into the pipeline for mixing and forming a cleaning solution. However, since the pressure of each chemical liquid pipeline may be different, the chemical liquid pipeline with smaller pressure is difficult to enter a specific mixing pipeline, and even backflow may occur, thereby causing insufficient mixing of the cleaning solution and poor accuracy of the ratio. At present, a booster pump or air pressure is generally added to the chemical liquid pipeline to ensure that the chemical liquid enters the specific pipeline for mixing. However, this method has a high cost and undoubtedly increases the volume of the semiconductor cleaning equipment.

[0004] Therefore, how to realize low-cost and high-precision cleaning solution configuration is an urgent problem to be solved by those skilled in the art. SUMMARY

[0005] The present application aims to provide a semiconductor mixed solution system to solve the problem in the prior art that due to the uneven pressure of each chemical liquid pipeline during the cleaning solution configuration process, the chemical liquid with low pressure is difficult to enter the mixed solution pipeline, resulting in insufficient mixing of the final cleaning solution and low accuracy of the ratio, and the pressurization of the pipeline increases the cost of the cleaning solution configuration.

[0006] In a first aspect, the present application provides a semiconductor mixed solution system, comprising a liquid storage tank and a liquid outlet pipeline and at least two liquid inlet pipelines respectively communicating with the liquid storage tank:

[0007] Each of the liquid inlet pipelines comprises a raw liquid inlet port, a flow control unit, a liquid outlet pneumatic valve and a raw liquid outlet port connected in sequence through a pipeline and communicating with the liquid storage tank;

[0008] The liquid outlet pipeline comprises a mixed solution inlet port, a liquid outlet valve and a mixed solution outlet port connected in sequence through a pipeline, and the mixed solution inlet port communicates with the liquid storage tank;

[0009] All the liquid outlet pneumatic valves are connected to a first electromagnetic valve through an air pipe.

[0010] In the semiconductor liquid mixing system of the present application, the chemical liquid enters the liquid storage tank through a pipeline for mixing. Since there is no excessive pressure inside the liquid storage tank, the chemical liquid can enter the liquid storage tank without pressurization, reducing the volume and cost of the semiconductor liquid mixing system. At the same time, since the liquid storage tank has sufficient space, it can temporarily store the chemical liquid and fully mix it, improving the quality of the cleaning liquid, thereby helping to improve the quality of semiconductor products. On the other hand, the semiconductor liquid mixing system of the present application also includes a first solenoid valve, which controls the air circuit connection through the first solenoid valve, so that all liquid outlet pneumatic valves are opened and closed at the same time, and the flow rate of each chemical liquid is accurately controlled by the flow control unit, thereby accurately controlling the proportion of each chemical liquid entering the liquid storage tank, so that the configured cleaning liquid has extremely high precision, thereby achieving a better cleaning effect.

[0011] In one embodiment of the present invention, the flow control unit includes a pressure-stabilizing valve and a flowmeter connected by a pipeline. The pressure-stabilizing valve is used to stabilize and regulate the flow rate, and the flowmeter is used to display the flow rate. Together, the two can precisely control the flow rate of the chemical liquid within the two liquid inlet pipes.

[0012] In one embodiment of the present invention, the semiconductor liquid mixing system further comprises at least two liquid discharge pipes, wherein the liquid discharge pipes are in a one-to-one correspondence with the liquid inlet pipes;

[0013] Each of the drainage pipes comprises a drainage inlet port, a drainage pneumatic valve and a drainage outlet port which are sequentially connected through a pipeline;

[0014] Each of the liquid discharge and inlet ports is communicated with a pipeline between the flow control unit and the liquid outlet pneumatic valve of one of the liquid inlet pipelines.

[0015] Since the flow of chemical liquid is unstable in the initial stage of entering the liquid inlet pipeline and may be accompanied by bubbles, the discharge pipeline is used to discharge the chemical liquid with unstable flow in the initial stage of conveying liquid in the liquid inlet pipeline to avoid affecting the configuration accuracy of the cleaning liquid.

[0016] In one embodiment of the present invention, all the pneumatic drain valves are connected to the second solenoid valve via an air pipe, and the second solenoid valve synchronously controls all the pneumatic drain valves to simplify operation.

[0017] In one embodiment of the present invention, the semiconductor liquid mixing system further includes a waste liquid pipeline connected to all the liquid discharge ports to transport the discharged chemical liquid to a waste liquid treatment device.

[0018] In one embodiment of the present invention, the semiconductor liquid mixing system further comprises a liquid storage and discharge pipe connected to the liquid storage tank;

[0019] The liquid storage and discharge pipeline includes a liquid storage inlet port, a liquid storage and discharge valve, and a liquid storage and discharge port connected in sequence through pipelines;

[0020] The liquid storage inlet port is communicated with the liquid storage tank; the liquid storage outlet port is communicated with the waste liquid pipeline.

[0021] The liquid storage and drainage pipeline is used to discharge the cleaning liquid that has deteriorated, become invalid or is no longer needed in the liquid storage tank and discharge it into the waste liquid channel.

[0022] In one embodiment of the present invention, at least one of the liquid inlet lines further includes a needle valve located between the flowmeter and the liquid outlet pneumatic valve. Because some chemical liquids comprise a very small portion of the prepared cleaning fluid, the flow rate of the chemical liquid requires extremely high precision adjustment. The needle valve allows for more precise control of the chemical liquid flow rate, further improving the accuracy of the cleaning fluid ratio.

[0023] In one embodiment of the present invention, the liquid storage tank includes a liquid level sensor for detecting the volume of the cleaning liquid in the liquid storage tank and making corresponding prompts, which is conducive to realizing intelligent control of the semiconductor mixing system.

[0024] In one embodiment of the present invention, each of the liquid inlet pipelines further includes a liquid inlet pneumatic valve located on the pipeline between the raw liquid inlet port and the flow control unit, and the liquid inlet pneumatic valve is used to control the chemical liquid from entering the liquid inlet pipeline.

[0025] In one embodiment of the present invention, each of the liquid inlet pipelines further includes a liquid inlet manual valve located on the pipeline between the raw liquid inlet port and the liquid inlet pneumatic valve. The liquid inlet manual valve serves as a safety switch valve for manually controlling the opening and closing of the liquid inlet pipeline.

[0026] As described above, the present application provides a semiconductor liquid mixing system, which configures the cleaning liquid by mixing chemical liquids in a liquid storage tank, without adding a booster pump or ventilation pressurization to the pipeline, thereby reducing the cost and volume of the semiconductor liquid mixing system. At the same time, the chemical liquid is fully mixed in the liquid storage tank, which is beneficial to improving the quality of the cleaning liquid. Furthermore, the electromagnetic valve is used to control the simultaneous opening and closing of each liquid inlet pipeline, and the flow rate of the chemical liquid is accurately controlled, thereby achieving high-precision cleaning liquid configuration, further improving the quality of the cleaning liquid, and achieving better semiconductor cleaning effects. At the same time, controlling each valve by the electromagnetic valve is conducive to the automation of the semiconductor liquid mixing system, which is easy and accurate to operate and can greatly reduce labor costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 Shown is a schematic structural diagram of a semiconductor liquid mixing system described in an embodiment of the present application.

[0028] Figure 2A schematic view of a solenoid valve module structure is shown in the embodiments of the present application.

[0029] Element number explanation

[0030] 100 semiconductor mixing system

[0031] 110 first liquid inlet pipeline

[0032] 111 first liquid inlet port

[0033] 112 first liquid inlet manual valve

[0034] 113 first liquid inlet pneumatic valve

[0035] 114 first pressure stabilizing valve

[0036] 115 first flow meter

[0037] 116 first liquid outlet pneumatic valve

[0038] 117 first liquid outlet port

[0039] 120 second liquid inlet pipeline

[0040] 121 second liquid inlet port

[0041] 122 second liquid inlet manual valve

[0042] 123 second liquid inlet pneumatic valve

[0043] 124 second pressure stabilizing valve

[0044] 125 second flow meter

[0045] 126 second liquid outlet pneumatic valve

[0046] 127 second liquid outlet port

[0047] 128 needle valve

[0048] 130 first liquid outlet pipeline

[0049] 131 first liquid outlet liquid inlet port

[0050] 132 first liquid outlet pneumatic valve

[0051] 133 first liquid outlet liquid outlet port

[0052] 140 second liquid outlet pipeline

[0053] 141 second liquid outlet liquid inlet port

[0054] 142 second liquid outlet pneumatic valve

[0055] 143 second liquid outlet port

[0056] 150 liquid storage tank

[0057] 151 liquid level sensor

[0058] 160 liquid outlet conduit

[0059] 161 mixed liquid inlet port

[0060] 162 mixed liquid delivery pump

[0061] 163 mixed liquid outlet valve

[0062] 164 mixed liquid outlet port

[0063] 170 liquid storage outlet conduit

[0064] 171 liquid storage inlet port

[0065] 172 liquid storage outlet valve

[0066] 173 liquid storage outlet port

[0067] 180 waste liquid conduit

[0068] 181 waste liquid outlet port

[0069] 190 solenoid valve module

[0070] 191 first solenoid valve

[0071] 192 second solenoid valve DETAILED DESCRIPTION

[0072] The present application is herein described, by way of example only, with reference to certain embodiments thereof. It is to be understood that variations and modifications of the embodiments can be made based on the description set forth herein, without departing from the scope and spirit of the application. Further, it is to be understood that not necessarily all objects or advantages described can be achieved in accordance with any particular embodiment. Thus, for example, those skilled in the art will recognize that the embodiments can be practiced with various modifications or combinations of the embodiments, or with other structures and methodologies, all without departing from the spirit and scope of the application. Wherever possible, specific terminology used herein is to be construed in the context it is used given the overall context of the application.

[0073] It is also to be understood that the following description is only illustrative of the application and should not be used to limit the present application. Suitable variations and modifications are possible depending upon the specific application of the application and it is therefore intended that the present application not be limited to the specific embodiments provided herein.

[0074] The following embodiments of the present application provide a semiconductor liquid mixing system for mixing the cleaning liquid required for the semiconductor cleaning process. By mixing the liquid in the liquid storage tank, the problem of insufficient mixing of the cleaning liquid and low ratio accuracy caused by the different pressures of the various liquid inlet pipes is solved. At the same time, the semiconductor liquid mixing system of the present application has a simple structure. Compared with the prior art method of adding a booster pump or ventilation pressurization to the liquid inlet pipe, it has lower costs, occupies less space, is simpler to operate, and the mixing of chemical liquids is more sufficient, and it can be configured with cleaning liquids with higher requirements. It should be noted that the chemical liquid mentioned in this application refers to raw materials that have not been configured into cleaning liquids, specifically, chemical reagents such as water and ammonia water.

[0075] The principle and implementation of a semiconductor liquid mixing system of this embodiment will be described in detail below with reference to the accompanying drawings, so that those skilled in the art can understand the electroplating test device for electroplated parts of this embodiment without creative work.

[0076] like Figure 1 As shown, the embodiment of the present application provides a semiconductor liquid mixing system, including a liquid storage tank 150 and a liquid outlet pipe 160 and at least two liquid inlet pipes respectively connected to the liquid storage tank 150. Among them, the liquid inlet pipe is used to transport the chemical liquid to be mixed. It should be noted that each liquid inlet pipe transports the chemical liquids corresponding to the raw materials required for configuring the cleaning liquid. For example, Figure 1 As shown, this embodiment includes two liquid inlet pipes, namely a first liquid inlet pipe 110 and a second liquid inlet pipe 120. The liquid storage tank 150 is used to mix chemical liquids to obtain cleaning liquid and temporarily store the cleaning liquid. The liquid outlet pipe 160 is used to transport the configured cleaning liquid to a cleaning device for cleaning semiconductors. Specifically, the liquid outlet pipe 160 includes a mixed liquid inlet port 161, a mixed liquid outlet valve 163 and a mixed liquid outlet port 164 connected in sequence by pipelines, wherein the mixed liquid inlet port 161 is connected to the liquid storage tank 150. Preferably, the liquid outlet pipe 160 also includes a mixed liquid delivery pump 162 located on the pipeline between the mixed liquid inlet port 161 and the mixed liquid outlet valve 163, for providing power to deliver the cleaning liquid to the cleaning device. It should be noted that the liquid storage tank 150 can be connected to multiple liquid outlet pipes 160 for delivering cleaning liquid to different cleaning devices. For example, Figure 1 As shown, this embodiment includes a liquid outlet pipe 160.

[0077] It should be noted that the first liquid inlet pipeline 110 includes a first liquid inlet port 111, a first flow control unit, a first liquid outlet pneumatic valve 116, and a first liquid outlet port 117, which are sequentially connected by a pipeline. The first flow control unit is used to stabilize and accurately adjust the flow rate of the delivered chemical liquid. Since the flow rate of the chemical liquid fluctuates greatly and may be accompanied by bubbles during the initial stage of liquid inlet, the quality of the chemical liquid cannot be accurately controlled when the liquid is delivered into the liquid storage tank, which in turn affects the liquid mixing accuracy. Based on this, the present embodiment uses the first flow control unit to stabilize the flow rate of the chemical liquid and accurately adjust the flow rate, which is conducive to improving the mixing accuracy of the cleaning liquid.

[0078] For example, Figure 1 As shown, the first flow control unit includes a first pressure-stabilizing valve 114 and a first flow meter 115 connected by a pipeline. The first pressure-stabilizing valve 114 is used to stabilize and regulate the flow rate of the delivered chemical liquid, and the first flow meter 115 is used to display the liquid flow rate. The two work together to accurately determine the size and stability of the liquid flow in the pipeline and can adjust it, thereby controlling the chemical liquid flow in the first liquid inlet pipeline 110 and improving the ratio accuracy of the cleaning liquid.

[0079] Similarly, the second liquid inlet conduit 120 includes a second liquid inlet port 121, a second flow control unit, a second liquid outlet pneumatic valve 126, and a second liquid outlet port 127, all connected in sequence via a pipeline. The second flow control unit improves the accuracy of the cleaning liquid ratio. For example, the second flow control unit includes a second pressure-stabilizing valve 124 and a second flowmeter 125, connected via a pipeline. The specific principles and implementation methods are described above and will not be repeated here.

[0080] When the flow rates of the chemical liquid in the first liquid inlet pipe 110 and the second liquid inlet pipe 120 tend to be stable, the first liquid outlet pneumatic valve 116 and the second liquid outlet pneumatic valve 126 are opened, allowing the chemical liquid to be mixed to enter the liquid storage tank 150 for mixing. It should be noted that since there is no excessive pressure inside the liquid storage tank 150, the process of the chemical liquid entering the liquid storage tank 150 can be achieved without pressurization, avoiding the high cost and large volume caused by adding a booster pump or ventilation pressurization. In addition, the liquid storage tank 150 has sufficient space to temporarily store the liquid. After the chemical liquid enters the liquid storage tank 150, it can be fully mixed inside before being output. Compared with the existing technology of mixing liquid in the pipeline, the existing technology has a small internal volume of the pipeline and needs to transport the liquid forward in time, which will cause insufficient mixing of the chemical liquid. This embodiment uses the liquid storage tank 150 for liquid mixing, which can provide sufficient space and time for the chemical liquid to be fully mixed, thereby improving the quality of the cleaning liquid.

[0081] Further, the first liquid outlet pneumatic valve 116 and the second liquid outlet pneumatic valve 126 are opened and closed simultaneously, so that the chemical liquid in the two liquid inlet pipes enters the liquid storage tank 150 and stops simultaneously. Since the first pressure stabilizing valve 114 and the first flow meter 115 and the second pressure stabilizing valve 124 and the second flow meter 125 are used in cooperation, the flow of the chemical liquid in the two liquid inlet pipes can be accurately controlled, and when the two kinds of chemical liquid enter the liquid storage tank 150 and stop simultaneously, the mass ratio of the chemical liquid in the liquid storage tank 150 can be accurately controlled by the ratio of the flow of the two kinds of chemical liquid, thereby realizing accurate proportioning of the cleaning liquid. Specifically, as shown in Figure 2 The first liquid outlet pneumatic valve 116 and the second liquid outlet pneumatic valve 126 are connected to the first electromagnetic valve 191 through the air pipe, the air path is connected through the first electromagnetic valve 191, and the opening and closing of the pneumatic valve are controlled, so as to realize the simultaneous opening and closing of the first liquid outlet pneumatic valve 116 and the second liquid outlet pneumatic valve 126.

[0082] Preferably, the semiconductor mixed liquid system 100 provided by the embodiment further comprises at least two liquid discharge pipes for discharging the chemical liquid with unstable flow in the initial stage of the liquid inlet pipe conveying liquid to avoid entering the liquid storage tank 150. Based on this, the liquid discharge pipe and the liquid inlet pipe are in one-to-one corresponding arrangement. Exemplarily, as shown in Figure 1 The first liquid outlet pneumatic valve 116 and the second liquid outlet pneumatic valve 126 are connected to the first electromagnetic valve 191 through the air pipe, the air path is connected through the first electromagnetic valve 191, and the opening and closing of the pneumatic valve are controlled, so as to realize the simultaneous opening and closing of the first liquid outlet pneumatic valve 116 and the second liquid outlet pneumatic valve 126.

[0083] Specifically, as shown in Figure 1As shown, the first liquid discharge pipeline 130 includes a first liquid discharge inlet port 131, a first liquid discharge pneumatic valve 132, and a first liquid discharge outlet port 133, which are sequentially connected by pipelines. The first liquid discharge inlet port 131 is connected to the pipeline between the first flow control unit and the first liquid discharge pneumatic valve 116, and further connected to the pipeline between the first flowmeter 115 and the first liquid discharge pneumatic valve 116. After entering the first liquid discharge inlet pipeline 110, the chemical liquid can enter the first liquid discharge pipeline 130 through the first liquid discharge inlet port 131. Specifically, the chemical liquid initially enters the first liquid inlet pipe 110 at an unstable flow rate. At this time, the first liquid outlet pneumatic valve 116 is closed, and the first liquid discharge pneumatic valve 132 is opened. The chemical liquid enters the first liquid discharge pipe 130 through the first liquid discharge inlet port 131, but cannot enter the liquid reservoir 150. The first pressure regulating valve 114 is adjusted and the chemical liquid flow rate is determined by the first flowmeter 115. After the chemical liquid flow rate stabilizes at a set value, the first liquid discharge pneumatic valve 132 is closed and the first liquid outlet pneumatic valve 116 is opened. The chemical liquid enters the liquid reservoir 150 at a stable flow rate at the set value for the preparation of the cleaning liquid. This prevents the unstable chemical liquid from entering the liquid reservoir 150 in the initial stage, thereby improving the mixing accuracy of the cleaning liquid. It should be noted that the chemical liquid flow rate is stable at a set value, which means that in order to accurately prepare the cleaning liquid, the flow rate of each chemical liquid is set to a specific value to accurately control the ratio of each chemical liquid in the cleaning liquid. For example, if the ratio of water to ammonia in the prepared cleaning liquid is 50, the ammonia flow rate is set to 1 and the water flow rate is set to 50.

[0084] Similarly, second liquid discharge conduit 140 includes a second liquid discharge inlet port 141, a second liquid discharge pneumatic valve 142, and a second liquid discharge outlet port 143, which are sequentially connected by pipelines. Second liquid discharge inlet port 141 is connected to the pipeline between second flowmeter 125 and second liquid discharge pneumatic valve 126. Chemical liquid with an initially unstable flow rate is discharged through second liquid discharge conduit 140 to further improve the mixing accuracy of the cleaning liquid. The specific principles and implementation methods are described above and will not be repeated here.

[0085] Preferably, if Figure 2 As shown, both first and second pneumatic drain valves 132, 142 are connected to a second solenoid valve 192 via air pipes, enabling simultaneous control of both valves, simplifying operation. Second solenoid valve 192 works in conjunction with first solenoid valve 191 to synchronize the operation of the chemical fluids. Therefore, the chemical fluid ratio is solely dependent on the flow rate, enabling highly precise cleaning fluid configuration based on the set flow rate.

[0086] Furthermore, the second liquid inlet pipeline 120 further includes a needle valve 128 located on the pipeline between the second flow control unit and the second liquid outlet pneumatic valve 126, for more accurately controlling the flow of the chemical liquid. Figure 1As shown, needle valve 128 is located in the pipeline between second flowmeter 125 and second liquid outlet pneumatic valve 126. It should be noted that in this embodiment, the chemical liquid transported by second liquid inlet pipe 120 accounts for a very small proportion of the cleaning agent. That is, the chemical liquid flow rate of second liquid inlet pipe 120 is much smaller than that of first liquid inlet pipe 110. Since the chemical liquid flow rate that first liquid inlet pipe 110 can carry is limited, based on actual needs, the set value of the chemical liquid flow rate of second liquid inlet pipe 120 requires more precise control. Flow control using needle valve 128 can achieve higher precision, further improving the accuracy of the cleaning liquid ratio.

[0087] Preferably, needle valve 128 is located near the second flowmeter 125, and second discharge inlet port 141 is located near the second discharge pneumatic valve 126. After the chemical liquid passes through the flow control of needle valve 128, it enters the second discharge pipe 140. When the second flowmeter 125 detects that the chemical liquid flow rate has stabilized at a set value, the second discharge pneumatic valve 142 is closed and the second discharge pneumatic valve 126 is opened to dispense the cleaning liquid. Alternatively, needle valve 128 is located near the second discharge pneumatic valve 126, and second discharge inlet port 141 is located near the second flowmeter 125. Chemical liquid initially enters the second discharge pipe 140, and the second pressure-stabilizing valve 124 is adjusted. When the second flowmeter 125 detects that the chemical liquid flow rate has stabilized and meets the required level, the second discharge pneumatic valve 142 is closed and the needle valve 128 is adjusted to more precisely control the chemical liquid flow rate. Then, the second discharge pneumatic valve 126 is opened to dispense the cleaning liquid.

[0088] Furthermore, the first liquid inlet pipeline 110 further includes a first liquid inlet pneumatic valve 113 located on the pipeline between the first liquid inlet port 111 and the first flow control unit, and the second liquid inlet pipeline 120 further includes a second liquid inlet pneumatic valve 123 located on the pipeline between the second liquid inlet port 121 and the second flow control unit. Figure 1 As shown, the first liquid inlet pneumatic valve 113 is located on the pipeline between the first liquid inlet port 111 and the first pressure-stabilizing valve 114 , and the second liquid inlet pneumatic valve 123 is located on the pipeline between the second liquid inlet port 121 and the second pressure-stabilizing valve 124 .

[0089] First and second liquid inlet pneumatic valves 113, 123 are used to control the entry of chemical liquid into the liquid inlet pipeline. Optionally, first and second liquid inlet pneumatic valves 113, 123 are controlled by solenoid valves. Specifically, the same solenoid valve can be used to control the simultaneous opening and closing of first and second liquid inlet pneumatic valves 113, 123, or different solenoid valves can be used to control the opening and closing of first and second liquid inlet pneumatic valves 113, 123. Controlling each liquid inlet pneumatic valve through solenoid valves facilitates automated control and simplifies operation.

[0090] Furthermore, the first liquid inlet pipeline 110 also includes a first liquid inlet manual valve 112 located on the pipeline between the first liquid inlet port 111 and the first liquid inlet pneumatic valve 113, and the second liquid inlet pipeline 120 also includes a second liquid inlet manual valve 122 located on the pipeline between the second liquid inlet port 121 and the second liquid inlet pneumatic valve 123. The first liquid inlet manual valve 112 and the second liquid inlet manual valve 122 serve as safety switch valves for manually controlling the opening and closing of the liquid inlet pipelines.

[0091] Preferably, the semiconductor liquid mixing system 100 provided in this embodiment further includes a waste liquid pipeline 180 connected to all liquid discharge ports. Figure 1 As shown, the waste liquid pipe 180 is a pipe connected to the first liquid discharge port 133 and the second liquid discharge port 143, and is used to transport the chemical liquid discharged from the first liquid discharge pipe 130 and the second liquid discharge pipe 140 to the waste liquid treatment device through the waste liquid outlet port 181.

[0092] Alternatively, the first drainage pipe 130 transports the discharged chemical liquid to a first chemical liquid treatment device (not shown in the figure), and the second drainage pipe 140 transports the discharged chemical liquid to a second chemical liquid treatment device (not shown in the figure), which purifies and filters the chemical liquid and uses it again for cleaning liquid configuration.

[0093] Furthermore, the semiconductor liquid mixing system 100 provided in this embodiment also includes a liquid storage and drainage pipeline 170 connected to the liquid storage tank 150. The liquid storage and drainage pipeline 170 includes a liquid storage inlet port 171, a liquid storage and drainage valve 172, and a liquid storage and drainage port 173, which are sequentially connected by pipelines, wherein the liquid storage inlet port 171 is connected to the liquid storage tank 150, and the liquid storage and drainage port 173 is connected to the waste liquid pipeline 180. Since the prepared cleaning liquid is left for a long time, the substances therein will evaporate or react with the air, causing it to become ineffective and deteriorate. Therefore, the cleaning liquid in the liquid storage tank 150 cannot be used for semiconductor cleaning after the storage period exceeds the storage period. At this time, the liquid storage and drainage valve 172 is opened to discharge the liquid in the liquid storage tank 150 into the waste liquid pipeline 180.

[0094] Preferably, the liquid reservoir 150 includes a liquid level sensor 151 having at least a minimum liquid level LL and a maximum liquid level HH, which is used to indicate the liquid level of the cleaning fluid in the liquid reservoir 150 and whether the cleaning fluid needs to be replenished. Specifically, when the liquid level sensor 151 detects that the cleaning fluid level is below the minimum liquid level LL, the liquid reservoir 150 needs to be replenished with cleaning fluid; when the liquid level sensor 151 detects that the cleaning fluid level reaches the maximum liquid level HH, replenishment of the cleaning fluid is stopped.

[0095] Furthermore, the liquid level sensor 151 can be configured with more detection levels, such as: a low level L, indicating that the cleaning fluid in the liquid reservoir 150 is insufficient; a high level H, indicating that the cleaning fluid in the liquid reservoir 150 is excessive; and an overflow level OV, indicating that the cleaning fluid in the liquid reservoir 150 is excessive and that refilling needs to be stopped immediately. By configuring more detection levels on the liquid level sensor 151, the liquid level in the liquid reservoir 150 can be more accurately determined, allowing for timely refilling or stopping to prevent overflow.

[0096] Preferably, if Figures 1-2 As shown, the semiconductor liquid mixing system 100 provided in this embodiment also includes a control module (not shown) connected to a liquid level sensor 151 and a solenoid valve module 190 connected to the control module, so as to realize the automation of the semiconductor liquid mixing system 100, which is simple to operate, automated, and has high efficiency. When the liquid level sensor 151 detects that the liquid level is lower than the minimum liquid level, it sends a liquid replenishment signal to the control module. The control module opens the first liquid discharge pneumatic valve 132 and the second liquid discharge pneumatic valve 142 through the second solenoid valve 192 of the solenoid valve module 190. After the flow rate of the chemical liquid stabilizes, the first liquid outlet pneumatic valve 116 and the second liquid outlet pneumatic valve 126 are opened through the first solenoid valve 191, and the chemical liquid enters the liquid storage tank 150 for mixing. Furthermore, the solenoid valve module 190 also includes a solenoid valve (not shown in the figure) that controls the first liquid inlet pneumatic valve 113 and the second liquid inlet pneumatic valve 123. The control module controls the opening and closing of the first liquid inlet pneumatic valve 113 and the second liquid inlet pneumatic valve 123 through the solenoid valve module, thereby controlling whether the chemical liquid enters the semiconductor mixed liquid system 100.

[0097] In the semiconductor liquid mixing system 100 provided in this embodiment, the chemical liquid to be mixed enters the liquid storage tank 150 for mixing and configuration. Since there is no excessive pressure inside the liquid storage tank 150, the process of the chemical liquid entering the liquid storage tank 150 can be achieved without pressurization, avoiding the high cost and large volume caused by adding a booster pump or ventilation pressurization. In addition, the liquid storage tank 150 has sufficient space to temporarily store the liquid. After the chemical liquid enters the liquid storage tank 150, it can be fully mixed inside before being output, thereby improving the quality of the cleaning liquid. At the same time, the semiconductor liquid mixing system 100 provided in this embodiment uses the first solenoid valve 191 to achieve the simultaneous opening and closing of the first liquid outlet pneumatic valve 116 and the second liquid outlet pneumatic valve 126, so that the chemical liquids in the two liquid inlet pipes enter the liquid storage tank 150 at the same time and stop at the same time. Therefore, the mass ratio of the chemical liquids in the liquid storage tank 150 can be accurately controlled by the ratio of the flow rates of the two chemical liquids, thereby achieving a precise ratio of the cleaning liquid.

[0098] It should be noted that the semiconductor mixed liquid system 100 suitable for two kinds of chemical liquid configuration cleaning liquid is exemplarily given in the embodiment, but is not limited thereto, and by increasing the liquid inlet pipeline and the corresponding liquid outlet pipeline, the increase of the type of chemical liquid for configuring the cleaning liquid can be realized, which is not specifically limited in the embodiment.

[0099] In the following, the embodiment will illustrate the specific method of the semiconductor mixed liquid system 100 configuring the cleaning liquid by mixing two kinds of chemical liquid.

[0100] The liquid storage tank 150 includes a minimum liquid level LL and a maximum liquid level HH liquid level sensor 151, when it is detected that the liquid level of the cleaning liquid in the liquid storage tank 150 is lower than the minimum liquid level LL, the liquid level sensor 151 sends a liquid supplement reminder. Specifically, the liquid supplement reminder can be a sound reminder or a system signal reminder, which can be sent to the user for subsequent liquid supplement operation, or can be sent to the control module for automatic liquid supplement operation by the control module.

[0101] The liquid supplement operation includes transporting the chemical liquid to be mixed to the liquid storage tank 150 for sufficient mixing. Specifically, the user or the control module opens the first liquid inlet pneumatic valve 113 and the second liquid inlet pneumatic valve 123, and the two chemical liquids to be mixed enter the first liquid inlet pipeline 110 and the second liquid inlet pipeline 120 respectively. Wherein, the first liquid inlet pneumatic valve 113 and the second liquid inlet pneumatic valve 123 are controlled to open by the same electromagnetic valve; or, controlled to open by different electromagnetic valves; or, when the user performs the liquid supplement operation, the first liquid inlet pneumatic valve 113 and the second liquid inlet pneumatic valve 123 are manually opened.

[0102] It should be noted that when the configuration ratio of the two kinds of chemical liquid is very different, for example, the ratio of water to ammonia water in the configured cleaning liquid is 50:1, at this time, the ammonia water enters the liquid inlet pipeline including the needle valve 128, so as to facilitate the subsequent flow regulation, such as Figure 1 As shown, the ammonia water enters the second liquid inlet pipeline including the needle valve 128.

[0103] The first liquid outlet pneumatic valve 132 and the second liquid outlet pneumatic valve 142 are synchronously opened by the second electromagnetic valve 192, and the chemical liquid enters the liquid outlet pipeline. By adjusting the first pressure stabilizing valve 114 and the second pressure stabilizing valve 124, the flow detected by the first flow meter 115 and the second flow meter 125 is stabilized at the set value. It should be noted that the flow set value of each liquid inlet pipeline is determined by the specific ratio of each chemical liquid in the configured cleaning liquid, for example, the ratio of water to ammonia water in the configured cleaning liquid is 50:1, at this time, the flow set value of water is 50, and the flow set value of ammonia water is 1.

[0104] Further, as shown in Figure 2The needle valve 128 is used to precisely control the second liquid inlet pipe 120 with very small flow. Specifically, the needle valve 128 is located between the second flow meter 125 and the second liquid outlet liquid inlet port 141, and by adjusting the needle valve 128, the flow detected by the second flow meter 125 is stabilized at a set small flow value; or the needle valve 128 is located between the second liquid outlet liquid inlet port 141 and the second liquid outlet pneumatic valve 126, and by adjusting the second pressure stabilizing valve 124, when the flow detected by the second flow meter 125 is stabilized and reaches the requirement, the second liquid outlet pneumatic valve 142 is closed, and by adjusting the needle valve 128, the chemical liquid flow reaches the set small flow value.

[0105] The first liquid outlet pneumatic valve 116 and the second liquid outlet pneumatic valve 126 are opened by the first electromagnetic valve 191, and the two chemical liquids enter the liquid storage tank 150 at a stable and constant flow rate at the same time, and are fully mixed in the liquid storage tank 150. The flow rate ratio of the chemical liquids in the two liquid inlet pipes is the ratio of the chemical liquids in the configured cleaning liquid and remains unchanged, and since the first liquid outlet pneumatic valve 116 and the second liquid outlet pneumatic valve 126 are opened at the same time, the two chemical liquids will not affect the cleaning liquid accuracy due to the order of entering the liquid storage tank 150, and the operation of configuring the cleaning liquid is simple and has high accuracy.

[0106] The liquid level sensor 151 detects the liquid level of the cleaning liquid in the liquid storage tank 150, and when the liquid level reaches the highest liquid level HH, the liquid level sensor 151 sends a full liquid reminder, and the liquid supplementing operation is completed. Specifically, the full liquid reminder can be a sound reminder or a system signal reminder, which can be sent to the user, and the user can stop the liquid supplementing operation by simultaneously closing the first liquid outlet pneumatic valve 116 and the second liquid outlet pneumatic valve 126 through the first electromagnetic valve 191, and closing the first liquid inlet pneumatic valve 113 and the second liquid inlet pneumatic valve 123; or can be sent to the control module, and the control module can stop the liquid supplementing operation by simultaneously closing the first liquid outlet pneumatic valve 116 and the second liquid outlet pneumatic valve 126 through the first electromagnetic valve 191, and closing the first liquid inlet pneumatic valve 113 and the second liquid inlet pneumatic valve 123, to realize automatic liquid supplementing operation. It should be noted that the first liquid outlet pneumatic valve 116 and the second liquid outlet pneumatic valve 126 are closed at the same time to avoid the time difference of the two chemical liquids stopping entering the liquid storage tank 150 affecting the accuracy of the cleaning liquid.

[0107] Further, the liquid level sensor 151 also includes a low liquid level L, a high liquid level H, and an overflow liquid level OV, which are used to prompt different cleaning liquid states of the liquid storage tank 150 and make reminders to assist the user or the control module to more accurately judge the liquid situation in the liquid storage tank 150 and supplement or stop supplementing in time to prevent overflow.

[0108] Further, the cleaning liquid in the liquid storage tank 150 is placed for too long, for example, more than 3 days, the liquid storage drain valve 172 is opened, and the long-placed cleaning liquid in the liquid storage tank 150 is drained into the waste liquid pipeline, so as to avoid the influence of the deteriorated or ineffective cleaning liquid on the cleaning effect of the semiconductor.

[0109] The embodiment configures the cleaning liquid through the semiconductor liquid mixing system 100, which is simple and convenient, and has high configuration efficiency. Since the first liquid outlet pneumatic valve 116 and the second liquid outlet pneumatic valve 126 are opened and closed at the same time, the proportion of each chemical liquid in the cleaning liquid can be accurately controlled by controlling the flow ratio of the chemical liquids, which is beneficial to the configuration of the cleaning liquid with high precision. At the same time, the chemical liquids are mixed in the liquid storage tank 150, without the need to additionally increase a booster pump or air pressure, so that the cost of the cleaning liquid configuration is significantly reduced, and the miniaturization of the semiconductor cleaning equipment is facilitated.

[0110] In summary, the semiconductor liquid mixing system 100 provided by the application realizes the sufficient mixing of the chemical liquids through the liquid storage tank 150, and since there is no high pressure inside the liquid storage tank 150, the process of the chemical liquids entering the liquid storage tank 150 can be realized without pressure, avoiding the high cost and large volume caused by the increase of the booster pump or air pressure, and facilitating the cost saving of the semiconductor cleaning process and the miniaturization of the semiconductor cleaning equipment. At the same time, the first liquid outlet pneumatic valve 116 and the second liquid outlet pneumatic valve 126 are opened and closed at the same time through the first electromagnetic valve 191, so that the chemical liquids in the two liquid inlet pipelines enter the liquid storage tank 150 at the same time and stop at the same time, and the proportion of the chemical liquids in the liquid storage tank 150 is controlled by accurately controlling the proportion of the flow of each chemical liquid, thereby realizing the high-precision configuration of the cleaning liquid, achieving better semiconductor cleaning effect, and facilitating the improvement of the production yield and production quality of the semiconductor products.

[0111] The description of the flow or structure corresponding to each of the above-mentioned figures has its own emphasis, and the parts not described in detail in a certain flow or structure can be referred to the related description of other flows or structures.

[0112] The above-mentioned embodiments only exemplarily illustrate the principles and effects of the application, and are not used to limit the application. Any person skilled in the art can modify or change the above-mentioned embodiments without departing from the spirit and scope of the application. Therefore, all equivalent modifications or changes completed by those skilled in the art without departing from the spirit and technical thought of the application should be covered by the claims of the application.

Claims

1. A semiconductor liquid mixing system, characterized in that: It includes a liquid storage tank, a liquid outlet pipe and at least two liquid inlet pipes respectively connected to the liquid storage tank: Each of the liquid inlet pipelines comprises a raw liquid inlet port, a flow control unit, a liquid outlet pneumatic valve, and a raw liquid outlet port communicated with the liquid storage tank, which are sequentially connected through pipelines; The liquid outlet pipeline includes a mixed liquid inlet port, a liquid outlet valve and a mixed liquid outlet port connected in sequence by pipelines, and the mixed liquid inlet port is communicated with the liquid storage tank; All of the liquid outlet pneumatic valves are connected to the first solenoid valve via air pipes.

2. The semiconductor liquid mixing system according to claim 1, wherein: The flow control unit includes a pressure stabilizing valve and a flow meter which are connected through a pipeline.

3. The semiconductor liquid mixing system according to claim 1, wherein: It also includes at least two liquid discharge pipes, and the liquid discharge pipes are in a one-to-one correspondence with the liquid inlet pipes; Each of the drainage pipes comprises a drainage inlet port, a drainage pneumatic valve and a drainage outlet port which are sequentially connected through a pipeline; Each of the liquid discharge and inlet ports is communicated with a pipeline between the flow control unit and the liquid outlet pneumatic valve of one of the liquid inlet pipelines.

4. The semiconductor liquid mixing system according to claim 3, characterized in that: All of the liquid discharge pneumatic valves are connected to the second solenoid valve via air pipes.

5. The semiconductor liquid mixing system according to claim 3, wherein: It also includes a waste liquid pipeline connected to all the drainage and liquid outlet ports.

6. The semiconductor liquid mixing system according to claim 5, characterized in that: Also included is a liquid storage and discharge pipeline in communication with the liquid storage tank; The liquid storage and discharge pipeline includes a liquid storage inlet port, a liquid storage and discharge valve, and a liquid storage and discharge port connected in sequence through pipelines; The liquid storage inlet port is communicated with the liquid storage tank; the liquid storage outlet port is communicated with the waste liquid pipeline.

7. The semiconductor liquid mixing system according to claim 1, wherein: At least one of the liquid inlet pipelines further includes a needle valve located on the pipeline between the flow control unit and the liquid outlet pneumatic valve.

8. The semiconductor liquid mixing system according to claim 1, wherein: The liquid reservoir includes a liquid level sensor.

9. The semiconductor liquid mixing system according to claim 1, wherein: Each of the liquid inlet pipelines further includes a liquid inlet pneumatic valve located on the pipeline between the raw liquid inlet port and the flow control unit.

10. The semiconductor liquid mixing system according to claim 1, wherein: Each of the liquid inlet pipelines further comprises a liquid inlet manual valve located on the pipeline between the raw liquid inlet port and the liquid inlet pneumatic valve.

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