Polishing liquid supply system and liquid supply assembly

Abstract

The utility model discloses a polishing solution supply system and a solution supply assembly, comprising: a stock solution barrel, the lower part of the side wall of which is provided with a first solution outlet; a second liquid outlet and a first liquid inlet are formed in the pure water bucket; a third liquid outlet and a second liquid inlet are respectively formed in two ends of the filter; the pump body is provided with a fourth liquid outlet and a third liquid inlet, the third liquid inlet is communicated with the first liquid outlet through a first pipeline, the first pipeline is provided with a first valve body, the second liquid outlet is connected between the first valve body and the pump body through a second pipeline, and the second pipeline is provided with a second valve body; the fourth liquid outlet is communicated with the second liquid inlet through a third pipeline, a fourth pipeline is connected to the third liquid outlet, the first liquid inlet is connected to the fourth pipeline through a fifth pipeline, and a third valve body is arranged on the fifth pipeline. According to the scheme, the pure water bucket and the corresponding pipeline are additionally arranged, the filtering pipeline in the polishing solution supply system is washed, and therefore polishing powder is prevented from being deposited and agglomerated in the filtering pipeline.

Description

TECHNICAL FIELD

[0001] The utility model relates to the field of semiconductor processing especially relates to a polishing liquid supply system and supply assembly. BACKGROUND

[0002] Silicon wafers are used as substrates for semiconductor devices and optical elements as the cornerstone of integrated circuits, and the silicon wafers for manufacturing integrated circuits require extremely small surface roughness, extremely high surface flatness and integrity. Chemical mechanical polishing CMP belongs to one of the five core processes in wafer manufacturing process, which is a global planarization ultra-precision surface processing technology. The whole process is through the chemical and mechanical action of polishing pad, polishing liquid and other materials, and finally completes the polishing of wafer surface, so as to obtain ultra-smooth and surface damage-free silicon wafer.

[0003] In the existing polishing liquid supply system, the polishing powder and water are stirred and mixed in the original liquid barrel to obtain coarse polishing liquid. After filtering the coarse polishing liquid, fine polishing liquid is obtained. However, in the existing polishing liquid supply system, the polishing powder in the coarse polishing liquid is easy to deposit and agglomerate in the filter pipeline, so the filter pipeline in the polishing liquid supply system has a high frequency of disassembly and washing. After cleaning the filter pipeline, it needs to be installed again, which is not conducive to the use of the polishing liquid supply system. CONTENT OF THE UTILITY MODEL

[0004] In order to solve the above technical problems, the purpose of the utility model is to provide a polishing liquid supply system and supply assembly. By increasing the pure water barrel and the corresponding pipeline on the supply assembly, the filter pipeline in the polishing liquid supply system is flushed, so as to prevent the polishing powder from depositing and agglomerating in the filter pipeline.

[0005] In order to achieve the above purpose, the utility model adopts the following technical scheme:

[0006] A polishing liquid supply assembly, comprising:

[0007] The original liquid barrel is provided with a first liquid outlet at the lower part of the side wall;

[0008] The pure water barrel is provided with a second liquid outlet and a first liquid inlet;

[0009] The filter is provided with a third liquid outlet and a second liquid inlet at both ends respectively;

[0010] The pump body is provided with a fourth liquid outlet and a third liquid inlet, the third liquid inlet is communicated with the first liquid outlet through a first pipeline, the first pipeline is provided with a first valve body, the second liquid outlet is connected between the first valve body and the pump body through a second pipeline, the second pipeline is provided with a second valve body, the fourth liquid outlet is communicated with the second liquid inlet through a third pipeline, the third liquid outlet is connected with a fourth pipeline, the first liquid inlet is connected on the fourth pipeline through a fifth pipeline, and the fifth pipeline is provided with a third valve body.

[0011] Preferably, the first valve body, the second valve body and the third valve body are air control valves, and the third valve body can be used to control the flow.

[0012] Preferably, the bottom of the raw liquid barrel is provided with a first liquid outlet, the first liquid outlet is connected with a sixth pipeline, and the sixth pipeline is connected with a fourth valve body; the upper part of the side wall of the raw liquid barrel is provided with a first overflow port, and the first overflow port is connected on the sixth pipeline through a seventh pipeline.

[0013] Preferably, the bottom of the pure water barrel is provided with a second liquid outlet, the second liquid outlet is connected with an eighth pipeline, and the eighth pipeline is connected with a fifth valve body; the upper part of the side wall of the pure water barrel is provided with a second overflow port, and the second overflow port is connected on the eighth pipeline through a ninth pipeline.

[0014] Preferably, the second liquid outlet is arranged in the middle of the side wall of the pure water barrel.

[0015] Preferably, the raw liquid barrel is further provided with a pure water inlet for feeding pure water, the pure water inlet is connected with a tenth pipeline, and the tenth pipeline is provided with a sixth valve body.

[0016] Preferably, the tenth pipeline is further provided with a water gun branch pipeline, the water gun branch pipeline is located on the side of the sixth valve body away from the pure water inlet, and the water gun branch pipeline is connected with a water gun.

[0017] Preferably, the side walls of the raw liquid barrel and the pure water barrel are respectively provided with scale marks; a stirring device, a pH sensor and a thermometer are installed in the raw liquid barrel, and a plurality of low liquid level sensors and a plurality of high liquid level sensors are installed on the side wall of the raw liquid barrel.

[0018] A polishing liquid supply system comprises a mounting frame, a plurality of polishing liquid supply assemblies and an electric control cabinet, the upper surface and the four side surfaces of the mounting frame are all closed, the upper surface of the mounting frame is provided with a sliding door assembly, at least one of the four side surfaces of the mounting frame is provided with at least one door opening assembly; the plurality of polishing liquid supply assemblies are installed in the mounting frame, the upper part of the filter is exposed outside the frame, and the electric control cabinet is installed on the mounting frame and used to control the operation of the plurality of polishing liquid supply assemblies.

[0019] Preferably, it further comprises a liquid receiving tray and a signal light, the mounting frame is placed on the liquid receiving tray, a liquid leakage detection device is provided on the liquid receiving tray, the signal light is mounted on the mounting frame, and the signal light is electrically connected to the electric control cabinet.

[0020] Due to the adoption of the above technical scheme, the present invention has the following beneficial effects: in the present invention, a pure water barrel is provided, and the second liquid outlet on the pure water barrel is connected to the first pipeline for connecting the raw liquid barrel and the pump body through the second pipeline, the first liquid inlet on the pure water barrel is connected to the fourth pipeline for liquid discharge on the pump body through the fifth pipeline, and a first valve body is provided on the first pipeline, a second valve body is provided on the second pipeline, and a third valve body is provided on the fifth pipeline. Therefore, when it is necessary to flush the filter pipeline, the first valve body is closed, and the second valve body and the third valve body are opened. The pure water in the pure water barrel flushes the first pipeline and the third pipeline to prevent the coarse throwing liquid from accumulating and agglomerating in the first pipeline and the third pipeline. After the pure water is filtered by the filter, part of the pure water returns to the pure water barrel through the fifth pipeline, and part of the pure water is flushed out through the fourth pipeline. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 This is one of the structural diagrams of the polishing liquid supply component;

[0022] Figure 2 This is the second structural diagram of the polishing liquid supply component;

[0023] Figure 3 This is the third structural diagram of the polishing liquid supply component;

[0024] Figure 4 It is a structural diagram of the polishing liquid supply system;

[0025] Figure 5 This is a structural diagram of the polishing liquid supply system from another angle.

[0026] Reference numerals:

[0027] 1. Liquid barrel; 11. First liquid outlet; 12. First liquid discharge outlet; 13. First overflow outlet; 14. Pure water outlet; 15. Stirring device; 16. pH sensor; 17. Temperature sensor; 18. Low liquid level sensor; 19. High liquid level sensor;

[0028] 2. Pure water tank; 21. Second liquid outlet; 22. First liquid inlet; 23. Second liquid discharge outlet; 24. Second overflow outlet;

[0029] 3. Filter; 31. Third liquid outlet; 32. Second liquid inlet;

[0030] 4. Pump body; 41. Fourth liquid outlet; 42. Third liquid inlet;

[0031] 5. a water gun;

[0032] 6. a mounting frame;

[0033] 7. an electric control cabinet;

[0034] 8. a liquid receiving tray;

[0035] 9. a signal lamp;

[0036] 101. a first pipeline; 1011. a first valve body; 102. a second pipeline; 1021. a second valve body; 103. a third pipeline; 104. a fourth pipeline; 105. a fifth pipeline; 1051. a third valve body; 106. a sixth pipeline; 1061. a fourth valve body; 107. a seventh pipeline; 108. an eighth pipeline; 1081. a fifth valve body; 109. a ninth pipeline; 1010. a tenth pipeline; 10101. a sixth valve body; 10102. a water gun branch pipeline. DETAILED DESCRIPTION

[0037] The embodiments of the present application will be described in detail below with reference to the drawings, wherein the same or similar components are denoted by the same or similar reference numerals throughout the drawings. The embodiments described below with reference to the drawings are exemplary and are intended to explain the present application, and should not be understood as limiting the present application.

[0038] In the description of the present application, it should be understood that the orientation or positional relationship indicated by the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "clockwise", "counterclockwise" and the like are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the devices or elements indicated must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application.

[0039] In addition, the terms "first" and "second" are only for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined with "first" and "second" can explicitly or implicitly include one or more of the features. In the description of the present application, unless otherwise specified, the meaning of "a plurality of" is two or more, unless otherwise explicitly limited.

[0040] In this utility model, unless otherwise specified or limited, the terms "installed," "connected," "connect," "fixed," etc. should be understood in a broad sense. For example, they can refer to fixed connection, detachable connection, or integral connection; mechanical connection or electrical connection; direct connection or indirect connection through an intermediate medium; and internal communication between two components. Those skilled in the art will understand the specific meanings of the above terms in this utility model based on specific circumstances.

[0041] In the present invention, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature may include the first and second features being in direct contact, or may include the first and second features being in contact not directly but through another feature between them. Moreover, a first feature being "above," "above," and "above" a second feature may include the first feature being directly above or obliquely above the second feature, or may simply mean that the first feature is higher in level than the second feature. A first feature being "below," "below," and "below" a second feature may include the first feature being directly below or obliquely below the second feature, or may simply mean that the first feature is lower in level than the second feature.

[0042] like Figures 1 to 3 The polishing liquid supply assembly comprises:

[0043] The raw liquid barrel 1 is used to hold the coarse polishing liquid, and a first liquid outlet 11 is provided at the lower part of its side wall;

[0044] Pure water barrel 2, used for holding pure water, provided with a second liquid outlet 21 and a first liquid inlet 22;

[0045] The filter 3 has a third liquid outlet 31 and a second liquid inlet 32 ​​at both ends thereof;

[0046] The pump body 4 is provided with a fourth liquid outlet 41 and a third liquid inlet 42. The third liquid inlet 42 is connected to the first liquid outlet 11 through a first pipeline 101. The first pipeline 101 is provided with a first valve body 1011, and the first valve body 1011 is an air-controlled valve; the second liquid outlet 21 is connected between the first valve body 1011 and the pump body 4 through a second pipeline 102. The second pipeline 102 is provided with a second valve body 1021, and the second valve body 1021 is an air-controlled valve; the fourth liquid outlet 41 is connected to the second liquid inlet 32 ​​through a third pipeline 103. The third liquid outlet 31 is connected to a fourth pipeline 104. The first liquid inlet 22 is connected to the fourth pipeline 104 through a fifth pipeline 105. The fifth pipeline 105 is provided with a third valve body 1051, and the third valve body 1051 is an air-controlled valve.

[0047] In the process of filtering the coarse polishing liquid into the fine polishing liquid, the first valve body 1011 is opened, and the second valve body 1021 and the third valve body 1051 are closed. In this way, the coarse polishing liquid flows from the first liquid outlet 11 on the raw liquid barrel 1 to the first pipeline 101, and is pumped to the third pipeline 103 by the pump body 4. The coarse polishing liquid enters the filter 3 from the second liquid inlet 32 ​​of the filter 3, and becomes the fine polishing liquid, which flows into the fourth pipeline 104 from the third liquid outlet 31 of the filter 3, and the fine polishing liquid is output through the fourth pipeline 104.

[0048] When it is necessary to flush the filter pipeline, close the first valve body 1011, open the second valve body 1021 and the third valve body 1051, and the pure water in the pure water barrel 2 flows from the second liquid outlet 21 of the pure water barrel 2 to the second pipeline 102. The second pipeline 102 is connected to the first pipeline 101. After the pump body 4 pumps the pure water to the third pipeline 103, the pure water enters the filter 3 from the second liquid inlet 32 ​​of the filter 3, and the pure water flows out from the third liquid outlet 31 of the filter 3. Part of the pure water returns to the pure water barrel 2 through the fifth pipeline 105, and part of the pure water is output through the fourth pipeline 104. In this way, the pure water in the pure water barrel 2 is used to flush the first pipeline 101, the third pipeline 103 and the fourth pipeline 104 through which the coarse throwing liquid flows, to prevent the coarse throwing liquid from accumulating and agglomerating in the first pipeline 101, the third pipeline 103 and the fourth pipeline 104.

[0049] Since the first pipeline 101 between the first liquid outlet 11 and the first valve body 1011 cannot be flushed when the first valve body 1011 is closed, the first pipeline 101 between the first liquid outlet 11 and the first valve body 1011 can be installed with a flexible joint to facilitate the disassembly and assembly of the first pipeline 101 between the first liquid outlet 11 and the first valve body 1011, thereby performing manual flushing and cleaning.

[0050] In the present invention, the third valve body 1051 can adjust the ratio of pure water entering the fourth pipeline 104 and the fifth pipeline 105 .

[0051] Since the pure water flowing out of the filter 3 will carry polishing liquid during the process of flushing the pipeline, when part of the pure water returns to the pure water barrel 2 through the fifth pipeline 105, it will cause the pure water barrel 2 to also contain polishing liquid. Since the polishing liquid powder will sink and accumulate in the pure water barrel 2, in order to reduce the content of polishing liquid powder in the pure water flowing out of the pure water barrel 2 as much as possible, the second liquid outlet 21 is opened in the middle of the side wall of the pure water barrel 2.

[0052] The bottom of the stock liquid barrel 1 is provided with a first drain port 12, connected to a sixth pipeline 106, which is connected to a fourth valve body 1061. The fourth valve body 1061 is an air-operated valve. A first overflow port 13 is provided at the upper portion of the side wall of the stock liquid barrel 1. The first overflow port 13 is connected to the sixth pipeline 106 via a seventh pipeline 107. The connection between the seventh pipeline 107 and the sixth pipeline 106 is located on the side of the fourth valve body 1061 away from the first drain port 12. When the coarse casting liquid in the stock liquid barrel 1 needs to be emptied, the fourth valve body 1061 is opened, and the coarse casting liquid flows from the first drain port 12 of the stock liquid barrel 1 to the sixth pipeline 106 and is discharged through the sixth pipeline 106. Under normal circumstances, the fourth valve body 1061 is closed, and the coarse casting liquid is stored in the raw liquid barrel 1. When the liquid level in the raw liquid barrel 1 is too high, the coarse casting liquid flows from the first overflow port 13 to the seventh pipeline 107, and then flows into the sixth pipeline 106 for discharge.

[0053] The bottom of the pure water barrel 2 is provided with a second drain port 23, connected to an eighth pipeline 108, which is connected to a fifth valve body 1081, a pneumatically controlled valve. A second overflow port 24 is provided on the upper side of the pure water barrel 2, connected to the eighth pipeline 108 via a ninth pipeline 109. The junction between the ninth pipeline 109 and the eighth pipeline 108 is located on the side of the fifth valve body 1081 away from the second drain port 23. To drain the pure water from the pure water barrel 2, the fifth valve body 1081 is opened, and the pure water flows from the second drain port 23 of the pure water barrel 2 to the eighth pipeline 108 and is discharged through the eighth pipeline 108. Under normal circumstances, the fifth valve body 1081 is closed and pure water is stored in the pure water barrel 2. When the liquid level in the pure water barrel 2 is too high, the pure water flows from the second overflow port 24 to the ninth pipeline 109, and then flows into the eighth pipeline 108 for discharge.

[0054] In order to facilitate the introduction of pure water into the raw liquid barrel 1 to prepare the coarse polishing liquid, the raw liquid barrel 1 is also provided with a pure water inlet 14 for introducing pure water. The pure water inlet 14 is arranged on the upper surface of the raw liquid barrel 1, and the pure water inlet 14 is connected to the tenth pipeline 1010. The tenth pipeline 1010 is provided with a sixth valve body 10101, and the sixth valve body 10101 is an air-controlled valve. When the sixth valve body 10101 is opened, pure water can enter the raw liquid barrel 1 through the tenth pipeline 1010.

[0055] A liquid barrel cover is movably mounted on the upper surface of the liquid barrel 1 . By opening the liquid barrel cover, polishing liquid powder can be poured into the liquid barrel 1 or the interior of the liquid barrel 1 can be flushed.

[0056] To regulate the amount of liquid in the stock liquid barrel 1, scale markings are provided on the sidewall of the stock liquid barrel 1. A low level sensor 18 and a high level sensor 19 are also mounted on the sidewalls of the stock liquid barrel 1. When the liquid level in the stock liquid barrel 1 falls below the low level sensor 18, the low level sensor 18 sends a signal, prompting the operator to open the stock liquid barrel lid, pour in polishing liquid powder, and open the sixth valve body 10101. Pure water enters the stock liquid barrel 1 through the tenth pipeline 1010, re-dispensing the rough polishing liquid. When the liquid level in the stock liquid barrel 1 rises above the high level sensor 19, the sixth valve body 10101 closes.

[0057] Generally speaking, the height of the high level sensor 19 is lower than the height of the first overflow port 13. A stirring device 15, a pH sensor 16 and a thermometer 17 are installed in the raw liquid barrel 1.

[0058] A pure water bucket lid is movably mounted on the upper surface of the pure water bucket 2. By opening the pure water bucket lid, the pure water bucket 2 can be flushed or filled with pure water. Of course, in other embodiments, a filling port can be provided on the pure water bucket 2. The filling port is provided on the upper surface of the pure water bucket 2. The filling port is connected to an eleventh pipeline. The eleventh pipeline is provided with a seventh valve body. The seventh valve body is an air-controlled valve. When the seventh valve body is opened, pure water can enter the pure water bucket 2 through the eleventh pipeline. In order to control the amount of liquid in the pure water bucket 2, scale marks are provided on the side wall of the pure water bucket 2.

[0059] In order to facilitate the flushing of the raw liquid barrel 1 and the pure water barrel 2, a water gun branch pipe 10102 is also provided on the tenth pipeline 1010. The water gun branch pipe 10102 is located on the side of the sixth valve body 10101 away from the pure water port 14. A ball valve switch is provided on the side of the water gun branch pipe 10102 away from the sixth valve body 10101. The water gun branch pipe 10102 is connected to a water gun 5. When flushing is required, just open the ball valve switch.

[0060] like Figure 4 and Figure 5As shown, the present invention also discloses a polishing liquid supply system, including a mounting frame 6, several polishing liquid supply assemblies as described above, and an electric control cabinet 7. The upper surface and four side surfaces of the mounting frame 6 are all closed. A sliding door assembly 61 is provided on the upper surface of the mounting frame 6. By moving the sliding door in the sliding door assembly 61, the raw liquid barrel 1 and the pure water barrel 2 can be exposed. At least one of the four side surfaces of the mounting frame 6 is provided with at least one opening door assembly 62. By opening the door leaf in the opening door assembly 62, the components in the polishing liquid supply assembly can be inspected, disassembled and replaced, and the valve body can be opened or closed. The lower part and bottom of the mounting frame 6 are hollowed out to observe the accumulated water. The bottom of the mounting frame 6 can also be equipped with a caster assembly, etc. Several polishing liquid supply assemblies are installed in the mounting frame 6, and the upper part of the filter 3 is exposed outside the frame 6. Specifically, the filter 3 is inverted, which makes it convenient to replace the filter element in the filter 3, avoid polishing liquid deposition, and increase the life of the filter element. The electric control cabinet 7 is installed on the mounting frame 6, and the electric control cabinet 7 is used to control the operation of several polishing liquid supply components.

[0061] Among the four side surfaces of the mounting frame 6 , the side surface close to the pump body 4 is provided with heat dissipation holes for dissipating heat from the pump body 4 .

[0062] The polishing liquid supply system also includes a liquid receiving pan 8 and a signal light 9. The mounting frame 6 is placed on the liquid receiving pan 8. The liquid receiving pan 8 is equipped with a leakage detection device. The leakage detection device changes color when exposed to water and does not change color again. Therefore, when the operator sees the leakage detection device on the liquid receiving pan change color, they will know that there is a water leak in the pipeline and the pipeline needs to be repaired. Eyebolts are provided at the four corners of the liquid receiving pan 8. The signal light 9 is mounted on the mounting frame 6 and is electrically connected to the electrical control cabinet 7.

[0063] All features described in the description, the appended claims and the drawings are important features of the present invention, whether alone or in any combination.

[0064] In the description of this specification, the descriptions with reference to the terms "one embodiment", "some embodiments", "an implementation", "specific implementation", "other implementations", "example", "specific example", or "some examples" mean that the specific features, structures, materials or characteristics described in combination with the embodiment or example are included in at least one embodiment, implementation or example of the utility model. In this specification, the schematic expressions of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described above may also be combined in a suitable manner in any one or more embodiments, implementations or examples. The technical solutions recorded in this utility model also include technical solutions formed by any one or more specific features, structures, materials or characteristics described above, either alone or in combination.

[0065] Although the embodiments of the present invention have been shown and described above, it can be understood that the above embodiments are illustrative and cannot be understood as limiting the present invention. Ordinary technicians in this field can change, modify, replace, modify, delete some features, add features or re-combine features to form a technical solution in the above embodiments without departing from the principles and purpose of the present invention. Any simple modifications, equivalent changes and modifications made to the above embodiments based on the innovative principles of the present invention are still within the scope of the technical solution of the present invention.

Claims

1. A polishing liquid supply assembly, characterized in that: include: A raw liquid barrel (1) is provided with a first liquid outlet (11) at the lower portion of its side wall; A pure water bucket (2) is provided with a second liquid outlet (21) and a first liquid inlet (22); A filter (3) having a third liquid outlet (31) and a second liquid inlet (32) respectively provided at both ends thereof; A pump body (4) is provided with a fourth liquid outlet (41) and a third liquid inlet (42); the third liquid inlet (42) is connected to the first liquid outlet (11) via a first pipeline (101); a first valve body (1011) is provided on the first pipeline (101); the second liquid outlet (21) is connected between the first valve body (1011) and the pump body (4) via a second pipeline (102); a second valve body (1021) is provided on the second pipeline (102); the fourth liquid outlet (41) is connected to the second liquid inlet (32) via a third pipeline (103); the third liquid outlet (31) is connected to a fourth pipeline (104); the first liquid inlet (22) is connected to the fourth pipeline (104) via a fifth pipeline (105); and the fifth pipeline (105) is provided with a third valve body (1051).

2. A polishing liquid supply assembly according to claim 1, characterized in that: The first valve body (1011), the second valve body (1021) and the third valve body (1051) are air-controlled valves.

3. The polishing liquid supply assembly according to claim 1, characterized in that: A first liquid discharge port (12) is provided at the bottom of the raw liquid barrel (1), the first liquid discharge port (12) is connected to a sixth pipeline (106), and the sixth pipeline (106) is connected to a fourth valve body (1061); a first overflow port (13) is provided at the upper portion of the side wall of the raw liquid barrel (1), and the first overflow port (13) is connected to the sixth pipeline (106) via a seventh pipeline (107).

4. The polishing liquid supply assembly according to claim 1, characterized in that: A second liquid discharge port (23) is provided at the bottom of the pure water barrel (2), the second liquid discharge port (23) is connected to an eighth pipeline (108), and the eighth pipeline (108) is connected to a fifth valve body (1081); a second overflow port (24) is provided at the upper portion of the side wall of the pure water barrel (2), and the second overflow port (24) is connected to the eighth pipeline (108) through a ninth pipeline (109).

5. The polishing liquid supply assembly according to claim 1, characterized in that: The second liquid outlet (21) is provided in the middle of the side wall of the pure water barrel (2).

6. The polishing liquid supply assembly according to claim 1, characterized in that: The raw liquid barrel (1) is also provided with a pure water inlet (14) for inletting pure water, the pure water inlet (14) is connected to a tenth pipeline (1010), and the tenth pipeline (1010) is provided with a sixth valve body (10101).

7. A polishing liquid supply assembly according to claim 6, characterized in that: A water gun branch pipe (10102) is also provided on the tenth pipeline (1010). The water gun branch pipe (10102) is located on the side of the sixth valve body (10101) away from the pure water inlet (14). The water gun branch pipe (10102) is connected to a water gun (5).

8. The polishing liquid supply assembly according to claim 1, characterized in that: The side walls of the raw liquid barrel (1) and the pure water barrel (2) are respectively provided with scale marks; a stirring device (15), a pH sensor (16) and a thermometer (17) are installed in the raw liquid barrel (1); and a plurality of low-level liquid sensors (18) and a plurality of high-level liquid sensors (19) are installed on the side walls of the raw liquid barrel (1).

9. A polishing liquid supply system, characterized in that: The invention comprises a mounting frame (6), a plurality of polishing liquid supply assemblies as described in any one of 1 to 8, and an electric control cabinet (7); the upper surface and four side surfaces of the mounting frame (6) are all closed; a sliding door assembly (61) is provided on the upper surface of the mounting frame (6); and at least one door opening assembly (62) is provided on at least one of the four side surfaces of the mounting frame (6); the plurality of polishing liquid supply assemblies are mounted in the mounting frame (6), the upper part of the filter (3) is exposed outside the frame (6), and the electric control cabinet (7) is mounted on the mounting frame (6); the electric control cabinet (7) is used to control the operation of the plurality of polishing liquid supply assemblies.

10. A polishing liquid supply system according to claim 9, characterized in that: The device further comprises a liquid receiving tray (8) and a signal light (9), wherein the mounting frame (6) is placed on the liquid receiving tray (8), a liquid leakage detection device is provided on the liquid receiving tray (8), and the signal light (9) is mounted on the mounting frame (6), and the signal light (9) is electrically connected to the electric control cabinet (7).

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