Air inlet structure applied to sputter coating equipment

Abstract

The utility model discloses an air inlet structure applied to sputter coating equipment, which comprises a base, a cathode column arranged in a mounting cavity on the inner side of the base, and an air inlet component arranged on the base, a protective cover covers the outside of an air outlet hole of the air inlet assembly, an air outlet communicated with the mounting cavity is formed in the protective cover, and the air outlet and the cathode columns are arranged in a staggered manner. The protective cover is wrapped outside the air outlet holes, so that plasmas sputtered during rotation of the cathode column can be effectively prevented from being in direct contact with the air outlet holes, in addition, in order to enable process gas discharged from the air outlet holes to smoothly enter the mounting cavity, the air outlets are formed in the protective cover, and the air outlets and the cathode column are arranged in a staggered manner; further, the phenomenon that the sputtered plasma is in contact with the air outlet hole and blocks the air outlet hole due to reflection when the cathode column rotates is effectively avoided, so that the air outlet hole blocking problem is solved, and normal operation of sputter coating equipment is guaranteed.

Description

TECHNICAL FIELD

[0001] The utility model relates to the field technology of coating equipment, especially to a gas inlet structure applied to sputtering coating equipment. BACKGROUND

[0002] Sputtering coating technology is the phenomenon that the atoms of target material are hit out by ion bombardment on the surface of target material, which is called sputtering. The deposition of atoms generated by sputtering on the surface of substrate to form film is called sputtering coating. Usually, gas ionization is generated by gas discharge, and the plasma is hit at high speed on the cathode target under the action of electric field, and the atoms or molecules of the cathode target are hit out and fly to the surface of the plated substrate to deposit into a thin film.

[0003] Because the target material rotates continuously to ensure that the material is uniformly utilized when the plasma is generated, some plasma will sputter around the chamber at this time, and at this time, the plasma contacts the exhaust pipe for injecting process gas, and under the long-term operation of the sputtering coating equipment, the exhaust holes of the exhaust pipe will be blocked, which causes the process gas to be unable to be injected into the chamber, the plasma cannot continue to be generated, and further causes the sputtering coating equipment to be unable to work normally. SUMMARY

[0004] Therefore, the utility model provides a gas inlet structure applied to sputtering coating equipment, which solves the problem that the target material rotates continuously to ensure that the material is uniformly utilized when the plasma is generated, some plasma will sputter around the chamber at this time, at this time, the plasma contacts the exhaust pipe for injecting process gas, and under the long-term operation of the sputtering coating equipment, the exhaust holes of the exhaust pipe will be blocked, which causes the process gas to be unable to be injected into the chamber, the plasma cannot continue to be generated, and further causes the sputtering coating equipment to be unable to work normally.

[0005] To achieve the above-mentioned purpose, the utility model adopts the following technical scheme: a gas inlet structure applied to sputtering coating equipment, comprising a base, a cathode column provided in the inner side of the base and installed in a cavity, and a gas inlet assembly provided on the base.

[0006] The gas outlet hole of the gas inlet assembly is covered with a protective cover, the protective cover is provided with a gas outlet opening communicating with the installation cavity, and the gas outlet opening is arranged in a staggered manner with the cathode column.

[0007] Further, the gas outlet opening is located on the first end face of the protective cover facing the base, and the first end face is arranged in a spaced manner with the inner wall of the base to form a gas outlet channel.

[0008] Further, the base comprises a main body and a door lining plate provided on the inner side of the main body, the protective cover is provided on the door lining plate, and the gas outlet opening is arranged in a spaced manner with the first inner wall of the door lining plate to form a gas outlet channel.

[0009] Further, the distance between the cathode column and the first inner wall is greater than the diameter of the gas outlet channel.

[0010] Further, the gas outlet direction of the gas outlet hole is different from the gas outlet direction of the gas outlet port.

[0011] Further, the gas outlet direction of the gas outlet hole corresponds to the cathode column.

[0012] Further, the gas outlet direction of the gas outlet hole corresponds to the outlet end of the mounting cavity.

[0013] Further, the gas outlet direction of the gas outlet hole is consistent with the gas outlet direction of the gas outlet port, and the gas outlet hole and the gas outlet port are arranged in a staggered manner.

[0014] Further, the door lining plate comprises a first plate body and two second plate bodies respectively extending inwardly on both sides of the first plate body, the first plate body and the two second plate bodies jointly form a mounting cavity, the protective cover is arranged on one of the second plate bodies, and the first inner wall is arranged on the first plate body.

[0015] Further, the opposite surfaces of the two second plate bodies are connected with movable correction assemblies, and the diameter of the outlet end of the mounting cavity is reduced by moving the two correction assemblies close to each other.

[0016] Compared with the prior art, the utility model has obvious advantages and beneficial effects, specifically, according to the above technical scheme, the protective cover is coated outside the gas outlet hole, which can effectively prevent the sputtered plasma from directly contacting the gas outlet hole when the cathode column rotates, in addition, in order to enable the process gas discharged from the gas outlet hole to smoothly enter the mounting cavity, the gas outlet port is arranged on the protective cover, and the gas outlet port and the cathode column are arranged in a staggered manner, which further effectively prevents the sputtered plasma from contacting and blocking the gas outlet hole due to reflection when the cathode column rotates, thereby solving the problem of blocking the gas outlet hole and ensuring the normal operation of the sputtering coating equipment.

[0017] In order to more clearly illustrate the structural features and effects of the utility model, the utility model will be described in detail below in combination with the drawings and specific embodiments. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 is the perspective view of embodiment 1 of the utility model.

[0019] Figure 2 is the perspective bottom view of embodiment 1 of the utility model.

[0020] Figure 3 is the connection diagram of the protective cover and the base of embodiment 1 of the utility model.

[0021] Figure 4 is the sectional view of the protective cover of embodiment 1 of the utility model.

[0022] Figure 5is the perspective view of the door lining plate of the embodiment 1 of the utility model.

[0023] Figure 6 is the plan view of the door lining plate of the embodiment 1 of the utility model.

[0024] Figure 7 is the display view of the air inlet assembly in the door lining plate of the embodiment 1 of the utility model.

[0025] Figure 8 is the display view of the protective cover of the embodiment 1 of the utility model.

[0026] Figure 9 is the perspective display view of the door lining plate and the protective cover of the embodiment 1 of the utility model.

[0027] The figure mark explanation is as follows:

[0028] 10 base, 101 installation cavity, 102 first end face, 103 air outlet channel, 11 main body, 12 door lining plate, 121 first inner wall, 122 first plate body, 123 second plate body;

[0029] 20 cathode column;

[0030] 30 air inlet assembly, 31 air outlet hole;

[0031] 40 protective cover, 41 air outlet;

[0032] 50 correction assembly. Specific implementation

[0033] Please refer to Figures 1-9 As shown in the figure, it shows the specific structure of the preferred first embodiment of the utility model, and it is an air inlet structure applied to sputtering coating equipment, which comprises a base 10, a cathode column 20 arranged in the installation cavity 101 on the inner side of the base and an air inlet assembly 30 arranged on the base 10.

[0034] The air outlet hole 31 of the air inlet assembly 30 is covered by a protective cover 40, the protective cover 40 is provided with an air outlet 41 which is communicated with the installation cavity 101, and the air outlet 41 is arranged in a staggered manner with the cathode column 20. Compared with the prior art air inlet structure applied to the sputtering coating equipment, the exhaust hole for discharging the process gas is not shielded and faces the cathode column, and when the cathode column rotates, the generated plasma will sputter, and when sputtering to the exhaust hole, the accumulation will be formed until the exhaust hole is blocked, and the normal operation of the sputtering coating equipment is affected. Compared with the prior art air inlet structure applied to the sputtering coating equipment, the exhaust hole for discharging the process gas is not shielded and faces the cathode column, and when the cathode column rotates, the generated plasma will sputter, and when sputtering to the exhaust hole, the accumulation will be formed until the exhaust hole is blocked, and the normal operation of the sputtering coating equipment is affected. The air inlet structure applied to the sputtering coating equipment, by covering the air outlet hole 31 with the protective cover 40, avoids the sputtered plasma from contacting the air outlet hole 31 when the cathode column 20 rotates, and in addition, in order to enable the process gas discharged from the air outlet hole 31 to smoothly enter the installation cavity 101, the air outlet 41 is provided on the protective cover 40, and the air outlet 41 is arranged in a staggered manner with the cathode column 20, further avoiding the sputtered plasma from contacting the air outlet hole 31 and blocking the air outlet hole 31 when the cathode column 20 rotates, thereby solving the problem of blocking the air outlet hole 31 and ensuring the normal operation of the sputtering coating equipment.

[0035] Specifically, the cathode column 20 and the air inlet assembly 30 are arranged in the installation cavity 101, and the installation cavity 101 limits the diffusion range of the process gas, so that the process gas discharged from the air inlet assembly 30 is more easily filled in the installation cavity 101, and cooperates with the cathode column 20 to generate plasma more quickly and contact the workpiece for coating. It should be noted that the workpiece is located in the coating cavity which is opposite and communicated with the installation cavity 101, and the sputtered plasma enters the coating cavity from the installation cavity 101 to coat the workpiece.

[0036] In an embodiment of the present application, the air inlet assembly 30 comprises an air inlet pipe, the air outlet hole 31 is located at the end of the air inlet pipe, the air inlet pipe penetrates the base 10 and is connected with the pipeline outside the base 10, and the process gas is guided into the air inlet pipe and discharged from the air outlet hole 31 into the installation cavity 101 to contact the cathode column 20.

[0037] The protective cover 40 covers the air inlet assembly 30 in the installation cavity 101, and an opening for the pipeline to penetrate is reserved, in order to avoid the sputtered plasma from entering the protective cover 40 through the opening when the cathode column 20 rotates, and contacting the air outlet hole 31 to cause the air outlet hole 31 to be blocked, the opening is arranged on the top wall of the protective cover 40 to avoid the above-mentioned situation.

[0038] As Figure 3As shown, for example, the gas outlet 41 is located on a first end surface 102 of the protective cover facing the base 10, and the first end surface 102 is spaced apart from the inner wall of the base 10 to form a gas outlet channel 103. To further prevent the sputtered plasma from entering the protective cover 40 through the gas outlet 41 and contacting the gas outlet hole 31 when the cathode column 20 rotates, the gas outlet 41 is provided on the first end surface 102 of the protective cover 40 corresponding to the base 10, thereby increasing the distance between the gas outlet 41 and the cathode column 20 and reducing the possibility of the sputtered plasma entering the gas outlet 41.

[0039] Specifically, one side of the protective cover 40 corresponds to the coating chamber, and the side opposite to the side is the first end face 102. One side of the base 10 corresponds to the coating chamber, and the side opposite to the side corresponds to the first end face 102. A gap is left between the two, and the gap is the air outlet channel 103.

[0040] It should be noted that the protective cover 40 has a certain length and is installed on the side wall next to the first end face 102 of the installation cavity 101. In order to prevent the sputtered plasma from entering the inner cavity of the protective cover 40 from the gas outlet 41 when the cathode column 20 rotates, the gas outlet 41 still corresponds to the first end face 102, but one side of the gas outlet 41 can contact the side wall of the installation cavity 101, thereby further reducing the possibility of the sputtered plasma from the gas outlet 41 when the cathode column 20 rotates.

[0041] like Figure 4 As shown, the base 10 exemplarily includes a main body 11 and a door lining 12 disposed on the inner side of the main body 11. The protective cover 40 is disposed on the door lining 12, and the gas outlet 41 is spaced apart from the first inner wall 121 of the door lining 12 to form a gas outlet channel 103. The formation of the gas outlet channel 103 ensures that the plasma sputtered by the cathode column 20 when rotating can pass through the gas outlet channel 103 before entering the gas outlet 41 and contacting the gas outlet hole 31. In this way, the possibility of plasma clogging the gas outlet hole 31 is reduced.

[0042] Specifically, the process gas is discharged from the gas outlet 41 to the gas outlet channel 103 to form an L-shaped gas flow route. The route has multiple bends, which can effectively prevent plasma from entering the protective cover 40.

[0043] like Figure 3 As shown, for example, the distance between the cathode column 20 and the first inner wall 121 is greater than the diameter of the gas outlet channel 103. Because the surface of the cathode column 20 corresponding to the first inner wall 121 is larger than the diameter of the gas outlet channel 103, plasma sputtered during the rotation of the cathode column 20 is less likely to enter the gas outlet channel 103, thereby reducing the possibility of plasma entering the gas outlet hole 31 and even the inner cavity of the protective cover 40 through the gas outlet channel 103.

[0044] like Figure 4As shown, the gas outlet direction of the gas outlet hole 31 is different from the gas outlet direction of the gas outlet 41. When the cathode column 20 rotates, some sputtered plasma will pass through the gas outlet channel 103 and enter the gas outlet 41. If the gas outlet hole 31 corresponds to the gas outlet 41, some plasma will enter the gas outlet hole 31 and cause the gas outlet hole 31 to be blocked. Therefore, the gas outlet direction of the gas outlet hole 31 is set to not correspond to the gas outlet 41, so as to reduce the possibility of plasma contacting the gas outlet hole 31.

[0045] As shown, the gas outlet direction of the gas outlet hole 31 corresponds to the cathode column 20. The gas outlet direction of the gas outlet hole 31 corresponds to the cathode column 20, so that the flow path of the gas flow from the gas outlet hole 31 to the gas outlet 41 to the gas outlet channel 103 is concave, thereby reducing the possibility of plasma contacting the gas outlet hole 31.

[0046] As shown, the gas outlet direction of the gas outlet hole 31 corresponds to the outlet end of the mounting cavity 101. Compared with the cathode column 20 corresponding to the gas outlet hole 31, the gas outlet direction of the gas outlet hole 31 corresponds to the outlet end of the mounting cavity 101, which reduces the length of the flow path of the gas flow at the gas outlet hole 31, so that the gas can enter the mounting cavity 101 more quickly.

[0047] As shown, the gas outlet direction of the gas outlet hole 31 corresponds to the gas outlet direction of the gas outlet 41, and the gas outlet hole 31 and the gas outlet 41 are arranged in a staggered manner. When the gas outlet hole 31 corresponds to the first inner wall 121, the length of the gas flow path is further reduced.

[0048] As shown, the door lining plate 12 includes a first plate body 122 and two second plate bodies 123 respectively extending inwardly on both sides of the first plate body 122. The first plate body 122 and the two second plate bodies 123 enclose the mounting cavity 101. The protective cover 40 is arranged on one of the second plate bodies 123, and the first inner wall 121 is arranged on the first plate body 122. Figure 4 The first plate body 122 and the second plate bodies 123 are designed in one piece, and the opposite faces of the two second plate bodies 123 extend inwardly, which makes the second plate bodies 123 inclined and reduces the diameter of the mounting cavity 101, so that the process gas can fill the mounting cavity 101 more quickly and cooperate with the cathode column 20 to generate plasma for coating the workpiece.

[0049] Specifically, the opposite faces of the two second plate bodies 123 are connected with movable correction assemblies 50. The correction assemblies 50 move closer to each other, thereby reducing the diameter of the outlet end of the mounting cavity 101. The correction assemblies 50 are used to adjust the film thickness during coating of the workpiece, mainly by the inner correction ruler and the movement of the correction assemblies 50 to reduce the diameter of the plasma channel.

[0050] The above merely describes the preferred embodiment of the present application, and is not intended to limit the technical scope of the present application in any way. Any slight modification, equivalent change, and modification made according to the technical essence of the present application shall still fall within the scope of the technical scheme of the present application.

Claims

1. An air intake structure for use in a sputtering coating device, comprising a base (10), a cathode column (20) disposed in a mounting cavity (101) inside the base, and an air intake assembly (30) disposed on the base (10), characterized in that: The air outlet (31) of the air inlet assembly (30) is covered with a protective cover (40), and the protective cover (40) is provided with an air outlet (41) communicating with the installation cavity (101), and the air outlet (41) and the cathode column (20) are arranged in a staggered manner.

2. The air intake structure used in a sputtering coating device according to claim 1, characterized in that: The air outlet (41) is located on the first end surface (102) of the protective cover facing the base (10), and the first end surface (102) is spaced apart from the inner wall of the base (10) to form an air outlet channel (103).

3. The air intake structure used in a sputtering coating device according to claim 2, characterized in that: The base (10) comprises a main body (11) and a door lining (12) arranged on the inner side of the main body (11); the protective cover (40) is arranged on the door lining (12); and the air outlet (41) is spaced apart from the first inner wall (121) of the door lining (12) to form the air outlet channel (103).

4. The air intake structure used in a sputtering coating device according to claim 3, characterized in that: The distance between the cathode column (20) and the first inner wall (121) is greater than the diameter of the gas outlet channel (103).

5. The air intake structure used in a sputtering coating device according to claim 1, characterized in that: The air outlet direction of the air outlet hole (31) and the air outlet direction of the air outlet port (41) are located in different directions.

6. The air intake structure used in a sputtering coating device according to claim 5, characterized in that: The gas outlet direction of the gas outlet hole (31) is toward the cathode column (20).

7. The air intake structure used in a sputtering coating device according to claim 5, characterized in that: The air outlet hole (31) has an air outlet direction toward the outlet end of the installation cavity (101).

8. The air intake structure used in a sputtering coating device according to claim 1, characterized in that: The air outlet direction of the air outlet hole (31) is consistent with the air outlet direction of the air outlet port (41), and the air outlet hole (31) and the air outlet port (41) are arranged in a staggered manner.

9. The air intake structure used in a sputtering coating device according to claim 3, characterized in that: The door lining (12) includes a first plate body (122) and second plate bodies (123) extending inward on both sides of the first plate body (122), the first plate body (122) and the two second plate bodies (123) together form the installation cavity (101), the protective cover (40) is provided on one of the second plate bodies (123), and the first inner wall (121) is located on the first plate body (122).

10. The air intake structure used in sputtering coating equipment according to claim 9, characterized in that: The opposite surfaces of the two second plates (123) are both connected with movable correction components (50), and as the two correction components (50) move closer together, the diameter of the outlet port of the installation cavity (101) is reduced.

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