Large-size coded disc photoetching exposure wafer bearing table

Abstract

The utility model discloses a large-size code disc photoetching exposure wafer bearing table which comprises a base and a bearing frame, an air suction channel is formed in the upper surface of the base, a non-pattern area of a code disc can be adsorbed to the base through the air suction channel, the bearing frame is arranged on the periphery of the base and spaced from the base, and part of the pattern area of the code disc is borne through the bearing frame. Therefore, the contact area between the pattern area and the wafer bearing table is reduced, the probability of scratches caused by friction, rubbing and the like is reduced, and the overall yield of products is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of code disc lithography exposure, and in particular to a large-size code disc lithography exposure wafer holding table. BACKGROUND

[0002] Code disc lithography exposure is a key step in code disc lithography process, which involves using lithography technology to accurately manufacture patterns and structures of code discs.

[0003] For some super large size code disc products, double-sided lithography processing is required in the lithography production process. The A surface is a one-time lithography surface, and the B surface is a second-time lithography surface. The conventional exposure fixture has the problems of easy friction, scratching and the like due to the lack of limiting and the large contact area of the position in contact with the B surface during taking and placing and the lithography process of the A surface. CONTENT OF THE UTILITY MODEL

[0004] The embodiment of the present application provides a large-size code disc lithography exposure wafer holding table, which can solve the problem of easy scratches on the surface of the code disc in the related art.

[0005] The embodiment of the present application provides a large-size code disc lithography exposure wafer holding table, which comprises:

[0006] a base, a suction passage is formed on the upper surface of the base, and the base is used to carry a non-pattern area of a code disc; and

[0007] a carrying frame, which is arranged at the outer periphery of the base, is spaced apart from the base, and is detachably connected with the base, and the carrying frame is used to carry a partial pattern area of the code disc.

[0008] When the base and the carrying frame carry the code disc, the outer edge of the code disc is flush with the outer edge of the carrying frame.

[0009] In some embodiments, the base comprises:

[0010] a body, a suction passage is formed on the upper surface of the body, and the body is used to carry a non-pattern area of a code disc; and

[0011] a support assembly arranged at the outer periphery of the body.

[0012] The carrying frame is used to be arranged on the upper surface of the support assembly.

[0013] In some embodiments, one of the support assembly and the carrying frame is provided with a clamping part, and the other of the support assembly and the carrying frame is provided with a clamping matching part. The clamping part can be matched with the clamping matching part to limit the translation of the carrying frame relative to the body.

[0014] In some embodiments, the support assembly has a first groove facing the bearing frame to form a clamping part, the bearing frame has a second groove facing the support assembly to form a clamping matching part, and the first groove can be clamped with the second groove to limit the bearing frame from translating relative to the body.

[0015] In some embodiments, the base includes an outer frame arranged at the outer periphery of the body and connected with the support assembly, and the upper surface of the outer frame is flush with the upper surface of the body.

[0016] In some embodiments, the outer frame has a limiting protrusion protruding from the upper surface of the outer frame.

[0017] In some embodiments, the base includes a plurality of support assemblies, and the plurality of support assemblies are evenly spaced at the outer periphery of the body.

[0018] In some embodiments, the outer edge of the bearing frame has a limiting protruding strip protruding from the upper surface of the bearing frame.

[0019] Based on the large-size code disc photolithography exposure wafer support table provided by the embodiments of the present application, the non-pattern area of the code disc can be adsorbed on the base through the air suction channel, the bearing frame is arranged at the outer periphery of the base and is spaced apart from the base, and the bearing frame bears part of the pattern area of the code disc, so that the contact area of the pattern area and the wafer support table is reduced, the probability of scratches caused by friction, scratching and the like is reduced, and the overall yield of the product is improved.

[0020] In addition, when the base and the bearing frame bear the code disc, the outer edge of the code disc is flush with the outer edge of the bearing frame, so that a certain limiting effect can be achieved, and the photolithography precision is ensured. BRIEF DESCRIPTION OF DRAWINGS

[0021] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or the prior art description. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can also be obtained by those skilled in the art without creative labor.

[0022] Figure 1 A structure schematic diagram of the large-size code disc photolithography exposure wafer support table provided by the embodiments of the present application is provided.

[0023] Figure 2 A structure schematic diagram of the bearing frame provided by the embodiments of the present application is provided.

[0024] Reference signs in the drawings:

[0025] 100, base; 100a, suction passage; 110, body; 120, support assembly; 121, clamping portion;

[0026] 200, bearing frame; 210, clamping fitting portion; 220, limiting convex strip;

[0027] 300, outer frame; 310, limiting convex block. DETAILED DESCRIPTION

[0028] In order to make the purpose, technical scheme and advantages of the present application more clear, the present application is further described in detail below in combination with the drawings and examples. It should be understood that the specific examples described herein are only used to explain the present application and do not limit the present application.

[0029] In the related art, for some super large size code disc products, double-sided photolithography processing is required in the photolithography production process, the A surface is a one-time photolithography surface, and the B surface is a two-time photolithography surface. The conventional exposure fixture has the problems of easy friction, scratching and scratch generation due to no limiting and large contact area during taking and placing and photolithography process of the A surface in contact with the B surface.

[0030] It should be understood that the A surface and the B surface refer to two opposite surfaces of the code disc.

[0031] In order to solve the above technical problems, please refer to Figure 1 The present application proposes a large size code disc photolithography exposure wafer bearing table, which comprises a base 100 and a bearing frame 200.

[0032] The base 100 can be used in cooperation with a photolithography machine, and can be connected through adsorption or bolt fixation, etc. without limitation. The upper surface of the base 100 is formed with a suction passage 100a, which can be communicated with an external negative pressure device. The base 100 is used to bear the non-pattern area of the code disc; and

[0033] The bearing frame 200 is arranged at the outer periphery of the base 100 and is spaced apart from the base 100. The bearing frame 200 is detachably connected with the base 100. The bearing frame 200 is used to bear part of the pattern area of the code disc.

[0034] It should be understood that the non-pattern area refers to the inner side of the circular code disc which does not need to be subjected to photolithography, and the pattern area refers to the outer side of the circular code disc which needs to be subjected to photolithography.

[0035] Therefore, the non-pattern area of the code disc can be adsorbed on the base 100 through the negative pressure device and the air suction channel 100a, and part of the pattern area of the code disc can be carried by the bearing frame 200 arranged at intervals, so that even if scratching and friction occur, only part of the pattern area and the non-pattern area are scratched and rubbed, and the pattern area between the bearing frame 200 and the base 100 is difficult to be scratched and rubbed. Compared with the traditional positive adsorption mode, the contact area between the pattern area and the support table is reduced in the embodiment of the application, so that the probability of generating scratches such as friction and scratching is reduced, and the overall yield of the product is improved.

[0036] The bearing frame 200 is detachably connected with the base 100, that is, bearing frames 200 of different specifications can be replaced. For example, when a larger code disc is used, a bearing frame 200 of a larger specification can be replaced, so that the bearing frame 200 only supports the edge part of the code disc, and the stress of the code disc is uniform.

[0037] In addition, when the base 100 and the bearing frame 200 carry the code disc, the outer edge of the code disc cannot exceed the outer edge of the bearing frame 200, that is, the outer edge of the code disc is flush with the outer edge of the bearing frame 200. In this way, the code disc can be preliminarily positioned, the precision of photolithography is ensured, and the overall yield of the product is further improved.

[0038] Further, in some embodiments, referring to Figure 1 The base 100 includes a body 110 and a support assembly 120.

[0039] The upper surface of the body 110 is formed with an air suction channel 100a, and the body 110 is used to carry the non-pattern area of the code disc. The support assembly 120 is arranged on the outer periphery of the body 110 and is connected with the body 110. The bearing frame 200 is used to be arranged on the upper surface of the support assembly 120. The bearing frame 200 can be conveniently and quickly replaced by being arranged in this way, and the process of replacing the bearing frame 200 is simplified.

[0040] Referring to Figure 1 One of the support assembly 120 and the bearing frame 200 is provided with a clamping portion 121, and the other of the support assembly 120 and the bearing frame 200 is provided with a clamping matching portion 210. The clamping portion 121 can be matched with the clamping matching portion 210 to limit the translation of the bearing frame 200 relative to the body 110.

[0041] By limiting the translation of the bearing frame 200 relative to the body 110, the stability of the code disc can be ensured when the code disc is arranged on the bearing frame 200, and the photolithography precision is ensured.

[0042] The clamping part 121 can be a protrusion, and the clamping matching part 210 can be a groove, or the clamping part 121 can be a groove, and the clamping matching part 210 can be a protrusion, or other clamping structures in the prior art, which are not limited in the present application. In some embodiments, the clamping part 121 is a groove arranged on the support assembly 120, and the clamping matching part 210 is a groove arranged on the bearing frame 200.

[0043] Referring to Figure 1 That is, the support assembly 120 has a first groove facing the bearing frame 200, and the bearing frame 200 has a second groove facing the support assembly 120. The first groove and the second groove are in staggered clamping. When the first groove and the second groove are clamped, the side wall of the support assembly 120 can be in contact with the side wall of the second groove, thereby limiting the translation of the bearing frame 200.

[0044] Of course, it can be understood that the first groove can be provided with multiple groups, and the multiple groups of first grooves are distributed along the radial direction of the main body. In this way, different groups of first grooves can correspond to different specifications of the second grooves on the bearing frame 200, thereby being able to support different specifications of the code disc.

[0045] The base 100 can also include multiple support assemblies 120, and the multiple support assemblies 120 are uniformly spaced on the outer periphery of the main body 110. The number of support assemblies 120 is not limited, and can be 3, 4, 5, etc. In order to ensure the support of the edge of the code disc and to minimize the contact with the code disc, in the embodiment of the present application, the support assembly 120 is provided with 4, and the bearing frame 200 is also a rectangular frame, that is, the multi-point support of the bearing frame 200 can be achieved, thereby ensuring the stability of the bearing frame 200. When the bearing frame 200 supports the code disc, the area in contact with the code disc is relatively small, thereby reducing the probability of scratches caused by friction, scratching, etc., and improving the overall yield of the product.

[0046] Referring to Figure 2 In order to improve the accuracy of placing the code disc on the bearing frame 200, the outer edge of the bearing frame 200 has a limiting protrusion 220 protruding from the upper surface of the bearing frame 200, that is, the limiting protrusion 220 forms a limiting surface on the side facing the main body 110. The bearing frame 200 has an upward supporting surface. When the code disc is placed, the supporting surface supports the upper side or lower side of the code disc, and the limiting surface abuts the outer circumferential side wall of the code disc, thereby eliminating the need for manual alignment by the human eye, and further improving the lithography precision.

[0047] Referring to Figure 1The base 100 comprises an outer frame 300 arranged at the outer periphery of the body 110 and connected with the support assembly 120, the upper surface of the outer frame 300 is flush with the upper surface of the body 110, that is, the outer frame 300 can also support the edge portion of the code disc, and the outer frame 300 is also located at the outer periphery of the bearing frame 200, that is, the size of the outer frame 300 limits the maximum lithography specification size of the code disc, thus, when the code disc is large, the bearing frame 200 is difficult to support the outer edge of the code disc, and the bearing frame 200 can be removed from the support assembly 120, and the outer edge of the code disc is supported by the outer frame 300.

[0048] In order to quickly position, the outer frame 300 has a limiting protrusion 310 protruding from the upper surface of the outer frame 300, the side of the limiting protrusion 310 facing the body 110 can form a limiting surface, by the outer peripheral side wall of the code disc abutting against the limiting surface, the code disc can be quickly positioned, so that manual alignment by the human eye is not needed, and the lithography precision is further improved.

[0049] In the drawings of the embodiment, the same or similar reference numerals correspond to the same or similar components; in the description of the present application, it should be understood that the orientations or positional relationships indicated by the terms "upper", "lower", "left", "right" and the like are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, therefore, the terms describing the positional relationship in the drawings are only used for exemplary illustration, and cannot be understood as a limitation on the present patent, for those skilled in the art, the specific meanings of the above terms can be understood according to the specific circumstances.

[0050] The above only describes the preferred embodiments of the present application and does not limit the present application, any modification, equivalent replacement and improvement made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A large scale reticle exposure stage for lithography, characterized by, The base includes: a base body having an upper surface with an air suction passage formed therein, the base body configured to support a non-pattern area of a code disc; and a support assembly disposed at an outer periphery of the base body, wherein the support assembly is configured to support a partial pattern area of the code disc. The base includes:

2. The large scale reticle exposure table according to claim 1, wherein a base body having an upper surface with an air suction passage formed therein, the base body configured to support a non-pattern area of a code disc; and a support assembly disposed at an outer periphery of the base body, wherein the support assembly is configured to support a partial pattern area of the code disc. The support assembly and the support frame are configured to be detachably coupled to each other.

3. The large scale reticle exposure table according to claim 2, wherein The support assembly and the support frame are configured to be detachably coupled to each other.

4. The large scale reticle exposure table according to claim 3, wherein The support assembly and the support frame are configured to be detachably coupled to each other.

5. The large scale reticle exposure table according to claim 2, wherein The support assembly and the support frame are configured to be detachably coupled to each other.

6. The large scale reticle exposure table according to claim 5, wherein, The support assembly and the support frame are configured to be detachably coupled to each other.

7. The large scale reticle exposure table according to claim 2, wherein The support assembly and the support frame are configured to be detachably coupled to each other.

8. The large scale reticle exposure table according to claim 1, wherein, The support assembly and the support frame are configured to be detachably coupled to each other. The support assembly and the support frame are configured to be detachably coupled to each other. The support assembly and the support frame are configured to be detachably coupled to each other. The support assembly and the support frame are configured to be detachably coupled to each other. The support assembly and the support frame are configured to be detachably coupled to each other. The support assembly and the support frame are configured to be detachably coupled to each other. The support assembly and the support frame are configured to be detachably coupled to each other. The support assembly and the support frame are configured to be detachably coupled to each other. The support assembly and the support frame are configured to be detachably coupled to each other. 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