Carrying table cleaning device and cleaning equipment
By designing a floating platform cleaning device, the problem of poor cleaning effect caused by changes in the height of the platform's bearing surface was solved, achieving a more efficient platform cleaning effect and equipment adaptability.
Patent Information
- Application Number
- CN202423042203.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-10
- Publication Date
- 2025-10-28
- Estimated Expiration
- 2034-12-10
AI Technical Summary
Existing platform cleaning devices cannot adapt to changes in the height of the bearing surface of different platforms, resulting in poor cleaning effect or equipment damage, and cannot meet the cleaning needs of different platforms.
A floating platform cleaning device was designed, with a floating gap between the cleaning component and the base, which can adapt to the changes in the bearing surface height of different platforms. The floating gap enables closer contact to improve the cleaning effect.
It significantly improved the cleaning effect of the platform, reducing the particulate matter detection rate from 15% to 5%, and enhanced the adaptability and cleanliness of the platform cleaning device.
Smart Images

Figure CN223487002U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of semiconductor technology, and in particular to a stage cleaning device and cleaning equipment. Background Technology
[0002] Chuck tables are widely used in wafer fabrication processes, such as planarization in semiconductor front-end manufacturing and back-side thinning in back-end manufacturing.
[0003] Taking wafer planarization as an example, planarization is a crucial step in wafer fabrication. With increasingly stringent requirements for wafer surface flatness, the industry often adds a grinding step before polishing to make the process easier to control. In the grinding step, one side of the wafer is held in place by a stage and rotates. A high-mesh grinding wheel rotates at high speed, grinding the other side of the wafer to achieve a smoother surface roughness and a flatter surface. However, if the stage's bearing surface is not thoroughly cleaned during vacuum adsorption, residual particles and other contaminants can easily cause pits on the wafer surface, worsening its flatness.
[0004] Therefore, after use, the mounting surface of the cleaning platform usually needs to be cleaned. Existing cleaning platforms mainly rely on fixed brushes that press down and rotate for cleaning. Since the downward stroke of the brush is fixed, the brush is generally suitable for cleaning fixed platforms. Different platforms typically have different heights on their mounting surfaces. If the downward stroke of the brush is fixed, changes in the height of the platform's mounting surface can easily lead to excessive pressure from the brush relative to the platform, causing the brush to jam and fail to rotate, or the connecting plate to break. Alternatively, insufficient pressure from the brush can result in poor cleaning performance. Therefore, existing brushes cannot effectively clean the surfaces of different platforms.
[0005] Therefore, a platform cleaning device and cleaning equipment are needed to improve the above-mentioned technical problems. Utility Model Content
[0006] This utility model provides a platform cleaning device and cleaning equipment. The cleaning device is configured as a floating structure, which can adaptively float based on the change of the height of the platform bearing surface to adapt to the cleaning of different platform bearing surfaces.
[0007] The platform cleaning device includes: a base and a cleaning component;
[0008] The cleaning component has a cleaning section at one end along the first direction;
[0009] The cleaning component is connected to the base;
[0010] The cleaning component and the base have a floating gap along the first direction.
[0011] Optionally, the base and the cleaning component are arranged along the first direction, the cleaning component has a cleaning part at one end away from the base along the first direction, and the floating gap is between the end of the cleaning component near the base along the first direction and the adjacent end of the base.
[0012] Optionally, the floating gap is less than 1 mm.
[0013] Optionally, the platform cleaning device further includes a connecting component that floats the cleaning component to the base along the first direction.
[0014] Optionally, the connecting assembly includes a first connector and a second connector. The first connector is connected to the base, the cleaning assembly is floatingly disposed on the first connector along a first direction, and the second connector is connected to the first connector for adjusting the floating gap between the cleaning assembly and the base.
[0015] Optionally, the platform cleaning device further includes a limiting component disposed on the base and / or the cleaning component, for limiting the rotation of the cleaning component relative to the base.
[0016] Optionally, the cleaning assembly includes a cleaning seat and a cleaning component, the cleaning component being connected to the cleaning seat, one end of the cleaning component serving as the cleaning part, the cleaning seat being connected to the base, and the cleaning seat and the base having the floating gap along the first direction.
[0017] Optionally, the cleaning assembly further includes a connecting bracket connected between the cleaning seat and the cleaning component.
[0018] Optionally, at least two connecting brackets are provided;
[0019] When the platform cleaning device includes a connecting assembly, each of the connecting frames is arranged around the connecting assembly.
[0020] This utility model also provides a cleaning device, including the platform cleaning device described above.
[0021] The platform cleaning device of this utility model has a cleaning component connected to a base, with a floating gap between the cleaning component and the base. This floating gap allows the cleaning component to adaptively float based on the actual shape of the platform's bearing surface when cleaning different platforms, provided the bearing surfaces have height differences. This enables the cleaning unit to make closer contact with the bearing surface, adapting to different machine platforms, improving compatibility, enhancing the cleaning capability of the platform cleaning device, and ultimately improving the cleanliness of the platform's bearing surface. Attached Figure Description
[0022] Figure 1 This is a schematic diagram of the platform cleaning device according to Embodiment 1 of this utility model.
[0023] In the attached diagram:
[0024] 10-Base;
[0025] 20-Cleaning component; 201-Cleaning part; 21-Cleaning seat; 22-Cleaning part; 23-Connecting bracket; 231-Upper connecting part; 232-Lower connecting part; 233-Intermediate connecting part;
[0026] 30 - Connecting assembly; 31 - First connector; 32 - Second connector; 321 - First nut; 322 - Second nut; 323 - Washer;
[0027] 40 - Limiting component;
[0028] a-First direction;
[0029] b - Floating gap. Detailed Implementation
[0030] The platform cleaning device proposed in this utility model will be further described in detail below with reference to the accompanying drawings and specific embodiments. The advantages and features of this utility model will become clearer from the following description. It should be noted that the drawings are all in a very simplified form and use non-precise proportions, and are only used to facilitate and clarify the illustration of the embodiments of this utility model.
[0031] In this invention, "outer diameter" and "inner diameter" refer to the diameter of a circular structure, while for a non-circular structure, the inner diameter refers to the diameter of its inscribed circle and the outer diameter refers to the diameter of its circumscribed circle. "Axial direction" refers to the direction of the central axis of a cylindrical rod, while for a non-cylindrical rod, the axial direction refers to the length direction of the rod.
[0032] As used in this invention, the singular forms “a,” “an,” and “the” include plural objects; the term “or” is generally used to mean “and / or”; the term “a number” is generally used to mean “at least one”; and the term “at least two” is generally used to mean “two or more”. Furthermore, the terms “first,” “second,” and “third” are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined with “first,” “second,” or “third” may explicitly or implicitly include one or at least two of that feature. Additionally, as used in this invention, “installed,” “connected,” “joined,” and “set” on one element from another should be interpreted broadly, generally indicating only a connection, coupling, cooperation, or transmission relationship between the two elements, which can be direct or indirect through an intermediate element. They should not be construed as indicating or implying a spatial positional relationship between the two elements, i.e., one element can be located inside, outside, above, below, or to one side of another element, unless otherwise explicitly stated. For those skilled in the art, the specific meanings of the above terms in this utility model can be understood according to the specific circumstances. Furthermore, directional terms such as above, below, up, down, upward, downward, left, right, etc., are used relative to exemplary embodiments as shown in the figures, with upward or up direction pointing towards the top of the corresponding figure, and downward or down direction pointing towards the bottom of the corresponding figure.
[0033] This embodiment provides a platform cleaning device, including a base 10 and a cleaning component 20.
[0034] Combination Figure 1 As shown, the base 10 is disc-shaped and serves as the foundation for the entire platform cleaning device.
[0035] One end of the cleaning component 20 along the first direction a ( Figure 1 The lower end of the cleaning component 20 has a cleaning section 201; the cleaning section 201 is used to clean the bearing surface of the stage. Since the stage is generally a circular disk, and its bearing surface is adapted to the existing wafer shape as a circle, the cleaning section 201 in this embodiment is adaptively set to a disk shape. In other alternative embodiments, the cleaning section 201 can be adaptively adjusted based on the shape of the bearing surface that actually needs to be cleaned.
[0036] The cleaning component 20 is connected to the base 10, and there is a floating gap b between the cleaning component 20 and the base 10 along the first direction a.
[0037] Combination Figure 1 As shown, the first direction a corresponds to Figure 1The cleaning component 20 and the base 10 have a vertical floating gap b. The cleaning component 20 can adaptively float in the vertical direction based on the floating gap b, and its floating stroke is the size of the floating gap b. The floating gap b exists in the natural state of the platform cleaning device. When the cleaning component 20 is subjected to an external force and floats relative to the base 10, the floating gap b will adaptively decrease or disappear.
[0038] like Figure 1 As shown, during normal cleaning, the cleaning part 201 of the cleaning component 20 faces downwards. The platform cleaning device can be driven downwards by an external device along the first direction a for a predetermined stroke. After the cleaning part 201 contacts the bearing surface of the platform, the cleaning component 20 is driven to rotate and clean the bearing surface of the platform by passing through the cleaning part 201 to remove residual particles on the bearing surface. When cleaning different platforms, if the bearing surfaces of the platforms have height differences, the cleaning component 20 can adaptively float based on the actual shape of the bearing surface of the platform, allowing the cleaning part 201 to contact the bearing surface more closely to adapt to the platforms of different machines, improve the adaptability to each platform, enhance the cleaning ability of the platform cleaning device, and improve the cleanliness of the bearing surface of the platform.
[0039] The aforementioned platform cleaning device, with its fixed structure changed to a floating structure, reduced the detection rate of solid particles after cleaning from approximately 15% to approximately 5% during actual use, a decrease of approximately 10%, resulting in a significant improvement in cleaning effectiveness.
[0040] The base 10 and the cleaning component 20 are along the first direction a( Figure 1 The cleaning components are arranged vertically (in the vertical direction), with the cleaning component 20 located below the base 10. The end of the cleaning component 20 that is away from the base 10 along the first direction a ( Figure 1 The lower end of the cleaning component 20 has a cleaning section 201, and the cleaning component 20 is located at one end near the base 10 along the first direction a. Figure 1 The upper end of the cleaning component 20 and the adjacent end of the base 10 Figure 1 The floating gap b is located between the lower end of the middle base 10 and the lower end of the base 10.
[0041] Combination Figure 1As shown, in the aforementioned platform cleaning device, the upper end of the cleaning component 20 is connected to the lower end of the base 10, and the floating gap b is located between the upper end of the cleaning component 20 and the lower end of the base 10. When the platform cleaning device is in its natural state, the cleaning component 20 is subject to its own gravity, and a floating gap b is naturally maintained between the upper end of the cleaning component 20 and the lower end of the base 10. When the cleaning component 20 is subjected to an external force, such as an upward force exerted by the platform during the cleaning process, the cleaning component 20 can adaptively float upwards, with its floating stroke being the size of the floating gap b. This configuration facilitates the adaptive floating of the cleaning component 20, allowing for better adaptation to the cleaning of different platforms.
[0042] Please refer to Figure 1 As shown, the cleaning assembly 20 includes a cleaning base 21, a cleaning component 22, and a connecting bracket 23.
[0043] The cleaning seat 21 and the cleaning component 22 are in the form of a disc, and the base 10 is also in the form of a disc. The outer diameter of the base 10 is smaller than the outer diameter of the cleaning seat 21, and the outer diameter of the cleaning seat 21 is smaller than the outer diameter of the cleaning component 22. The cleaning seat 21, the cleaning component 22 and the base 10 are coaxially arranged.
[0044] The cleaning component 22 is connected to the cleaning base 21 via a connecting bracket 23, meaning the connecting bracket 23 connects the cleaning base 21 and the cleaning component 22. The connecting bracket 23 maintains a certain distance between the cleaning base 21 and the cleaning component 22, providing installation space for other components (such as the connecting assembly 30 described below). In other alternative embodiments, the cleaning assembly 20 may consist only of the cleaning base 21 and the cleaning component 22, and the specific structure of the cleaning assembly 20 can be adaptively adjusted based on actual usage requirements.
[0045] Please continue to refer to Figure 1 As shown, the cleaning component 22 is a brush structure, which includes a base and cleaning filaments connected to the lower end of the base. The cleaning component 22 is located on one side of the cleaning filaments, which is the cleaning part 201. The cleaning filaments can be made of materials such as polyamide fiber (PA), polypropylene (PP) or polyethylene (PE).
[0046] One end of cleaning component 22 ( Figure 1 The lower end of the cleaning unit 201 is the cleaning part 201. The cleaning seat 21 is connected to the base 10 and is located below the base 10. The upper end of the cleaning seat 21 is the upper end of the entire cleaning assembly 20. The upper end of the cleaning seat 21 and the lower end of the base 10 have the floating gap b along the first direction a.
[0047] The floating gap b is greater than 0 and less than 1 mm. This configuration of the floating gap b can meet the needs of existing usage scenarios, and its small size has little impact on the overall dimensions of the platform cleaning device, making it compatible with other external drive devices of existing cleaning devices. The actual size of the floating gap b can be adjusted adaptively based on usage requirements.
[0048] The above arrangement ensures that the connection of the cleaning seat 21 does not affect the upper part of the base 10 or occupy the space on the upper side of the base 10. The external drive device can be configured on the upper side of the base 10 to drive the platform cleaning device to lift or rotate, which facilitates the overall layout.
[0049] In this embodiment, the base 10 is a single, integrated disc-shaped structure. In other alternative embodiments, the base 10 can be configured as a split structure, and its shape can be configured as a hexagonal columnar structure or other structures. In this case, the fit between the cleaning seat 21 and the base 10 can be adaptively adjusted based on the structure of the base 10.
[0050] In this embodiment, both the cleaning seat 21 and the cleaning component 22 are disc-shaped. In other alternative embodiments, the above-mentioned components can be set as cylindrical structures or other irregularly shaped structures, and their specific shapes can be adjusted according to actual usage requirements.
[0051] Combination Figure 1 As shown, in this embodiment, the platform cleaning device is also equipped with a connecting component 30, which connects the cleaning seat 21 to the base 10 in a floating manner along the first direction a.
[0052] The connecting component 30 includes a first connector 31 and a second connector 32;
[0053] Please refer to Figure 1 As shown, the first connector 31 is a stepped shaft structure. The axial direction of the first connector 31 extends along the first direction a. A connecting hole is provided at the center of the base 10. The large diameter section of the first connector 31 passes through the connecting hole and connects to the base 10. It can be connected by thread, interference fit or other known connection methods.
[0054] A connecting hole is provided in the middle of the cleaning seat 21, and the cleaning seat 21 is buoyantly fitted onto the first connecting member 31 along the first direction a. The second connecting member 32 is connected to the small diameter section of the first connecting member 31, and the second connecting member 32 is supported on the lower end face of the cleaning seat 21. The second connecting member 32 is used to adjust the floating gap b between the cleaning assembly 20 and the base 10.
[0055] like Figure 1As shown, in this embodiment, the second connecting member 32 includes a first nut 321, a second nut 322, and a washer 323. The small-diameter section of the first connecting member 31 is provided with external threads. The first nut 321 and the second nut 322 are threadedly connected to the small-diameter section of the first connecting member 31. The first nut 321 is located below the second nut 322, and the washer 323 is placed between the second nut 322 and the cleaning seat 21. The arrangement of the first nut 321 and the second nut 322 facilitates self-locking and prevents the nuts from loosening. Moreover, by adjusting the positions of the first nut 321 and the second nut 322, the position of the cleaning seat 21 relative to the base 10 can be appropriately adjusted, thereby adjusting the size of the floating gap b. For example, when the first nut 321 and the second nut 322 are screwed downwards, the cleaning seat 21 adaptively moves downwards, and at this time, the floating gap b increases.
[0056] In this embodiment, the first connector 31 is coaxially arranged with the base 10. That is, the base 10, the cleaning seat 21, the cleaning component 22, and the first connector 31 are coaxially arranged. In other alternative embodiments, the connecting component 30 can adopt other known connection methods, such as partial snap-fit, partial welding, or a combination of multiple connection methods to achieve a floating connection between the cleaning seat 21 and the base 10.
[0057] In this embodiment, there is no buffer structure in the floating gap between the base 10 and the cleaning seat 21. In other alternative embodiments, no buffer structure can be provided between the base 10 and the cleaning seat 21, such as a buffer pad, to prevent the cleaning seat 21 from rigidly colliding with the base 10 during relative floating. Furthermore, in other alternative embodiments, a potential energy component can be added to provide damping for the cleaning seat 21 during floating. For example, the potential energy component could be an elastic element disposed between the base 10 and the cleaning seat 21, providing an elastic force to prevent the floating gap from decreasing; or the potential energy component could be a pair of magnetic attractors, with like poles repelling each other, providing a magnetic force to prevent the floating gap from decreasing. By providing the potential energy component, a damping force is provided for the cleaning seat 21 during floating relative to the base 10, ensuring the stability of the cleaning seat 21 relative to the base 10.
[0058] In this embodiment, the cleaning component 20 consists of a cleaning base 21, a cleaning element 22, and a connecting frame 23, with the connecting component 30 connecting the base 10 and the cleaning base 21. In other alternative embodiments, the connection object of the connecting component 30 can be adapted based on the specific structure of the cleaning component 20. For example, when the cleaning component 20 only includes the cleaning element 22, the connecting component 30 can be connected between the cleaning element 22 and the base 10.
[0059] In this embodiment, the cleaning component 22 adopts a brush structure. In other alternative embodiments, the cleaning component 22 may adopt other cleaning structures suitable for cleaning the platform.
[0060] Please continue to refer to Figure 1 As shown, in this embodiment, two connecting frames 23 are provided, and the two connecting frames 23 are arranged around the connecting assembly 30. The connecting frame 23 has an approximate channel steel structure, which includes an upper connecting part 231, a lower connecting part 232, and a middle connecting part 233. The upper connecting part 231, the lower connecting part 232, and the middle connecting part 233 are all plate-type structures and are integrally formed. The upper connecting part 231 and the lower connecting part 232 are arranged in parallel and perpendicular to the first direction a, and the middle connecting part 233 is parallel to the first direction a. Therefore, the middle connecting part 233 is perpendicular to the upper connecting part 231 and the lower connecting part 232, and the middle connecting part 233 connects the upper connecting part 231 and the lower connecting part 232. The width dimension of the upper connecting part 231 along the perpendicular direction a is smaller than the width dimension of the lower connecting part 232 along the perpendicular direction a. The upper connecting part 231 is attached to and supported at the lower end of the cleaning seat 21. The upper connecting part 231 extends to the edge of the cleaning seat 21 and is connected to the cleaning seat 21 by bolts. The lower connecting part 232 is attached to the upper end of the cleaning component 22. The lower connecting part 232 extends to the edge of the cleaning component 22 and is connected to the cleaning component 22 by bolts.
[0061] The above description provides one embodiment of the connecting frame 23. In other alternative embodiments, the connecting frame 23 may be configured as a column or other shape, and the connecting frame 23 may be connected to the cleaning seat 21 and the cleaning component 22 by welding, snap-fit or other known connection methods.
[0062] In this embodiment, two connecting brackets 23 are provided. In other alternative embodiments, the number of connecting brackets 23 can be adjusted based on actual needs, for example, three or more can be provided.
[0063] Furthermore, the platform cleaning device also includes a limiting component 40, which is disposed on the base 10 and the cleaning component 20, and is used to limit the rotation of the cleaning component 20 relative to the base 10.
[0064] Please refer to Figure 1 As shown, in this embodiment, the limiting component 40 consists of multiple screws, the stud section of which is threaded through the cleaning seat 21 and connected to the base 10. The screw head is supported on the bottom of the cleaning seat 21. The limiting component 40 can restrict the relative rotation of the cleaning seat 21 and the base 10 around its central axis. The cleaning seat 21 can adaptively float along the vertical direction of the screw.
[0065] In other alternative embodiments, the limiting component 40 may be a structure such as a pin or bolt. The limiting component 40 may also be a positioning protrusion structure provided on the base 10 or the cleaning seat 21. The structure and specific arrangement of the limiting component 40 can be flexibly adjusted according to actual needs.
[0066] This embodiment also provides a cleaning device, which includes the platform cleaning device described above. Furthermore, the cleaning device includes a drive component for raising and lowering the platform cleaning device. The difference between the cleaning device in this embodiment and existing cleaning devices lies in the replacement of the platform cleaning device; other structures can remain consistent with those of existing cleaning devices, and will not be described further here.
[0067] The above description is merely a description of a preferred embodiment of the present utility model and is not intended to limit the scope of the present utility model in any way. Any changes or modifications made by those skilled in the art based on the above disclosure shall fall within the protection scope of the claims.
Claims
1. A platform cleaning device, characterized in that, include: Base and cleaning components; The cleaning component has a cleaning section at one end along the first direction; The cleaning component is connected to the base; The cleaning component and the base have a floating gap along the first direction.
2. The platform cleaning device as described in claim 1, characterized in that, The base and the cleaning component are arranged along the first direction. The cleaning component has a cleaning part at one end away from the base along the first direction. The floating gap is between the end of the cleaning component close to the base along the first direction and the adjacent end of the base.
3. The platform cleaning device as described in claim 1, characterized in that, The floating gap is less than 1 mm.
4. The platform cleaning device as described in claim 1, characterized in that, The platform cleaning device further includes a connecting component that floats the cleaning component to the base along the first direction.
5. The platform cleaning device as described in claim 4, characterized in that, The connecting assembly includes a first connector and a second connector. The first connector is connected to the base, and the cleaning assembly is floatingly disposed on the first connector along a first direction. The second connector is connected to the first connector and is used to adjust the floating gap between the cleaning assembly and the base.
6. The platform cleaning device as described in claim 1, characterized in that, The platform cleaning device further includes a limiting component, which is disposed on the base and / or the cleaning component to limit the rotation of the cleaning component relative to the base.
7. The platform cleaning device according to any one of claims 1 to 6, characterized in that, The cleaning assembly includes a cleaning seat and a cleaning component. The cleaning component is connected to the cleaning seat, and one end of the cleaning component serves as the cleaning part. The cleaning seat is connected to the base, and the cleaning seat and the base have the floating gap along the first direction.
8. The platform cleaning device as described in claim 7, characterized in that, The cleaning assembly also includes a connecting bracket that connects the cleaning seat and the cleaning component.
9. The platform cleaning device as described in claim 8, characterized in that, The connecting frame is provided in at least two forms; When the platform cleaning device includes a connecting assembly, each of the connecting frames is arranged around the connecting assembly.
10. A cleaning device, characterized in that, Includes the platform cleaning device as described in any one of claims 1 to 9.