Roll-to-roll magnetron sputtering vacuum equipment

Abstract

The utility model provides roll-to-roll magnetron sputtering vacuum equipment, and belongs to the technical field of coating. The roll-to-roll magnetron sputtering vacuum equipment comprises a vacuum chamber and a cathode mounting mechanism, a sealing door is mounted on the front face of the vacuum chamber, a cooling roller is rotatably mounted in an inner cavity of the vacuum chamber, winding drums are arranged on the tops of the two sides of the inner wall of the vacuum chamber, a cathode target body is arranged in the inner cavity of the vacuum chamber, and a mounting arc plate is mounted on the rear side of the inner wall of the vacuum chamber. The mounting arc plate is arranged on the base, the mounting groove is formed in the top of the mounting arc plate, the cathode target body is mounted on the inner wall of the mounting groove through the shaft body, the cathode mounting mechanism is arranged, the cathode target body can be mounted after the cathode mounting mechanism is mounted, and the cathode mounting mechanism is used for mounting the cathode target body in a non-fixed manner; the angle of the cathode target body can be adjusted, the cathode target body can be adjusted to the optimal film coating angle, then the film coating effect is improved, the cathode target body is extruded after the adjusting assembly is installed, and then the angle of the cathode target body is adjusted.

Description

Technical Field

[0001] This utility model relates to the field of coating technology, and more specifically, to roll-to-roll magnetron sputtering vacuum equipment. Background Technology

[0002] With the advancement of technology and market demand, coated flexible roll materials have developed rapidly, which has also driven the rapid development of coating technology and coating machines. This allows the substrate to be coated with a thin film during the unwinding and winding process. The coating structure is located between the unwinding and winding of the substrate. Its working principle can be any one of resistance evaporation, induction evaporation, electron beam evaporation, magnetron sputtering, or other vacuum coating methods.

[0003] However, in existing roll-to-roll magnetron sputtering coating equipment, the sputtering cathode is usually placed directly on the inner wall of the vacuum sputtering chamber. Since the sputtering chamber of the roll-to-roll magnetron sputtering coating equipment is often very large, the distance between the inner wall and the substrate wound on the cold roller is very far, and it is usually not adjustable. Therefore, it is not conducive to improving sputtering efficiency and controlling the quality of sputtering coating. Utility Model Content

[0004] To overcome the above deficiencies, this utility model provides a roll-to-roll magnetron sputtering vacuum device that overcomes or at least partially solves the above technical problems.

[0005] This utility model is implemented as follows:

[0006] This utility model provides a roll-to-roll magnetron sputtering vacuum device, including a vacuum chamber, a sealed door installed on the front of the vacuum chamber, a cooling roller rotatably installed in the inner cavity of the vacuum chamber, a take-up drum on the top of both sides of the inner wall of the vacuum chamber, and a cathode target in the inner cavity of the vacuum chamber.

[0007] Cathode mounting mechanism, the cathode mounting mechanism comprising;

[0008] The mounting arc plate is installed on the rear side of the inner wall of the vacuum chamber;

[0009] The mounting slots are located on the top of the mounting arc plate, and there are several mounting slots. The cathode target is mounted on the inner wall of the mounting slot via a shaft.

[0010] In a preferred embodiment, the cathode mounting mechanism includes an adjustment assembly, which includes a fixing plate mounted on the bottom of the inner wall of the vacuum chamber. A first rotating rod is threaded onto the bottom of the fixing plate, and the top of the first rotating rod extends through to the top of the fixing plate. A connecting plate is mounted on the bottom of the mounting arc plate, and the top of the first rotating rod is rotatably connected to the bottom of the connecting plate.

[0011] In a preferred embodiment, both sides of the inner wall of the mounting groove are fitted with adhesive pads, which are made of elastic material and are in contact with both sides of the cathode target.

[0012] In a preferred embodiment, a mounting plate is installed at the bottom of the mounting arc plate, and a second rotating rod is threaded onto the right side of the bottom of the mounting plate. The top of the second rotating rod extends through to the top of the mounting plate, and a compression pad is installed at the bottom of the cathode target. The top of the second rotating rod is rotatably connected to the bottom of the compression pad.

[0013] In a preferred embodiment, connecting plates are installed on the front and rear sides of the top two sides of the vacuum chamber wall, and a limiting frame is installed at the bottom of the connecting plate, with the inner side of the limiting frame provided on the winding drum.

[0014] In a preferred embodiment, a support rod is inserted into the inner side of the limiting frame, and the winding drum is sleeved on the surface of the support rod.

[0015] In a preferred embodiment, the front of the winding drum is provided with a rotating drum, the surface of which is threadedly connected to the inner wall of the limiting frame, and the support rod is rotatably engaged with the inner cavity of the rotating drum.

[0016] In a preferred embodiment, extension plates are installed on both sides of the front of the rotating cylinder, and a rotating plate is installed on the front of the extension plates.

[0017] The roll-to-roll magnetron sputtering vacuum equipment provided by this utility model has the following beneficial effects:

[0018] 1. By setting up a cathode mounting mechanism, the cathode target can be installed after the cathode mounting mechanism is installed. The cathode mounting mechanism provides a non-fixed installation of the cathode target, which allows the angle of the cathode target to be adjusted to the optimal coating angle, thereby improving the coating effect.

[0019] 2. By setting the adjustment component, the cathode target can be squeezed after the adjustment component is installed, thereby adjusting the angle of the cathode target, and the cathode target can also be limited after adjustment. Attached Figure Description

[0020] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this utility model and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained from these drawings without creative effort.

[0021] Figure 1This is an overall perspective view provided by an embodiment of the present utility model.

[0022] Figure 2 A three-dimensional cross-sectional structural diagram of the vacuum chamber provided for an embodiment of this utility model.

[0023] Figure 3 A three-dimensional cross-sectional structural diagram of the limiting frame provided for an embodiment of this utility model.

[0024] Figure 4 Provided for the embodiments of this utility model Figure 2 Enlarged three-dimensional cross-sectional structure diagram at point A.

[0025] Figure 5 A schematic diagram of the mounting arc plate structure provided for an embodiment of this utility model.

[0026] In the diagram: 1. Vacuum chamber; 2. Sealed door; 4. Cooling roller; 5. Rewinding drum; 6. Cathode target; 7. Mounting arc plate; 8. Mounting groove; 9. Fixing plate; 10. First rotating rod; 11. Connecting plate; 12. Adhesive pad; 13. Mounting plate; 14. Second rotating rod; 15. Extrusion pad; 16. Connecting plate; 17. Limiting frame; 18. Support rod; 19. Rotating cylinder; 20. Extension plate; 21. Rotating plate. Detailed Implementation

[0027] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.

[0028] Example: Refer to Figures 1-5 This utility model provides a technical solution: a roll-to-roll magnetron sputtering vacuum device, including a vacuum chamber 1 and a cathode mounting mechanism. A sealing door 2 is installed on the front of the vacuum chamber 1, and a cooling roller 4 is rotatably installed in the inner cavity of the vacuum chamber 1. A take-up drum 5 is provided on the top of both sides of the inner wall of the vacuum chamber 1. A cathode target 6 is provided in the inner cavity of the vacuum chamber 1. The cathode target 6 can be installed after the cathode mounting mechanism is installed. The cathode mounting mechanism installs the cathode target 6 in a non-fixed manner, so that the angle of the cathode target 6 can be adjusted to the optimal coating angle, thereby improving the coating effect.

[0029] Reference Figures 1-4In a preferred embodiment, a cathode mounting mechanism is provided, comprising a mounting arc plate 7 and a mounting groove 8. The mounting arc plate 7 is installed on the rear side of the inner wall of the vacuum chamber 1, and the mounting groove 8 is opened on the top of the mounting arc plate 7. Several mounting grooves are provided, and the cathode target 6 is mounted on the inner wall of the mounting groove 8 via a shaft. The shaft can be installed in the mounting groove 8 so that the shaft can install the cathode target 6, allowing the installed cathode target 6 to rotate around the cathode target 6, thereby adjusting the angle of the cathode target 6. Both sides of the inner wall of the mounting groove 8 are equipped with a bonding pad 12, which is made of elastic material and contacts both sides of the cathode target 6, so that the bonding pad 12 can adhere to the surface of the cathode target 6 after installation, thereby facilitating the compression and limiting of the cathode target 6.

[0030] Reference Figures 1-2 In a preferred embodiment, the cathode mounting mechanism includes an adjustment assembly, which includes a fixing plate 9. The fixing plate 9 is installed at the bottom of the inner wall of the vacuum chamber 1. A first rotating rod 10 is threadedly installed at the bottom of the fixing plate 9. The top of the first rotating rod 10 extends through to the top of the fixing plate 9. A connecting plate 11 is installed at the bottom of the mounting arc plate 7, and the top of the first rotating rod 10 is rotatably connected to the bottom of the connecting plate 11. This allows the fixing plate 9 to install the first rotating rod 10 after installation. When the first rotating rod 10 is rotated, the connecting plate 11 drives the mounting arc plate 7 to be squeezed, thereby moving the mounting arc plate 7. This allows the cathode target 6 installed on the mounting arc plate 7 to be closer to the workpiece passing through the cooling roller 4, enabling the cathode target 6 to adapt to the workpiece and facilitating the coating of the workpiece.

[0031] Reference Figures 1-4 In a preferred embodiment, a mounting plate 13 is mounted on the bottom of the mounting arc plate 7. A second rotating rod 14 is threaded onto the right side of the bottom of the mounting plate 13. The top of the second rotating rod 14 extends through to the top of the mounting plate 13. A pressing pad 15 is mounted on the bottom of the cathode target 6. The top of the second rotating rod 14 is rotatably connected to the bottom of the pressing pad 15, which allows the second rotating rod 14 to be mounted after the mounting plate 13 is installed. This allows the second rotating rod 14 to move during rotation, thereby facilitating the pressing pad 15 to press the cathode target 6 and adjust the angle of the cathode target 6, thus facilitating sputtering coating of the workpiece.

[0032] Reference Figures 1-3In a preferred embodiment, connecting plates 16 are installed on the front and rear sides of the top two sides of the inner wall of the vacuum chamber 1. A limiting frame 17 is installed at the bottom of the connecting plates 16. A support rod 18 is inserted into the inner side of the limiting frame 17 on the take-up drum 5. The take-up drum 5 is sleeved on the surface of the support rod 18, and the back of the support rod 18 is inserted into the limiting frame 17. This allows the connecting plates 16 to be installed after the limiting frame 17 is installed, enabling the support rod 18 to be inserted into the inner cavity of the take-up drum 5 and then into the inner cavity of the limiting frame 17, thereby limiting the position of the take-up drum 5. The front of the take-up drum 5 is provided with a rotating... The rotating cylinder 19 has its surface threadedly connected to the inner wall of the limiting frame 17, and the support rod 18 is rotatably engaged with the inner cavity of the rotating cylinder 19. This allows the rotating cylinder 19 to support the support rod 18 after installation, ensuring that both ends of the support rod 18 remain balanced. Extension plates 20 are installed on both sides of the front of the rotating cylinder 19, and a rotating plate 21 is installed on the front of the extension plate 20. By rotating the rotating plate 21, the rotating plate 21 can drive the rotating cylinder 19 to rotate through the extension plate 20, allowing the rotating cylinder 19 to be disassembled. This facilitates the removal of the support rod 18 and the disassembly of the winding drum 5, as well as the replacement of the winding drum 5 and the workpiece.

[0033] Specifically, the working process or principle of the roll-to-roll magnetron sputtering vacuum equipment is as follows: In use, firstly, the take-up drum 5 containing the workpiece is supported inside the limiting frame 17, and supported by the insert support rod 18. Next, the rotating drum 19 is installed into the limiting frame 17, causing the rotating drum 19 to press against the surface of the support rod 18, keeping the take-up drum 5 in the middle position of the support rod 18. Then, the vacuum chamber 1 is evacuated to a vacuum state, inert gas is added to the vacuum chamber 1, and the cathode target 6 is bombarded under high voltage, ejecting metal atoms and depositing them onto the workpiece surface. Finally, the mounting arc plate 7 needs to be moved to adjust the cathode target. The height of the cathode target 6 is adjusted to accommodate different workpieces. After the winding drum 5 is installed, the first rotating rod 10 is rotated to press the connecting plate 11, thereby lifting the mounting arc plate 7 upwards and adjusting the height of the mounting arc plate 7 and the cathode target 6. When the angle of the cathode target 6 needs to be adjusted, the second rotating rod 14 is rotated, causing the second rotating rod 14 to press one side of the cathode target 6 through the pressing pad 15, thereby causing the cathode target 6 to rotate around the axis and adjust the angle of the cathode target 6. This facilitates the adjustment of the height between the workpiece and the cathode target 6, thereby improving the coating effect and coating efficiency of the workpiece.

Claims

1. A roll-to-roll magnetron sputtering vacuum apparatus, comprising a vacuum chamber (1), characterized in that; The vacuum chamber (1) is equipped with a sealing door (2) on the front, and a cooling roller (4) is rotatably installed in the inner cavity of the vacuum chamber (1). A winding drum (5) is provided on the top of both sides of the inner wall of the vacuum chamber (1), and a cathode target (6) is provided in the inner cavity of the vacuum chamber (1). Cathode mounting mechanism, the cathode mounting mechanism comprising; The mounting arc plate (7) is installed on the rear side of the inner wall of the vacuum chamber (1); The mounting slot (8) is located on the top of the mounting arc plate (7). Several mounting slots (8) are provided, and the cathode target (6) is mounted on the inner wall of the mounting slot (8) via a shaft.

2. The roll-to-roll magnetron sputtering vacuum apparatus according to claim 1, characterized in that, The cathode mounting mechanism includes an adjustment assembly, which includes a fixing plate (9). The fixing plate (9) is installed at the bottom of the inner wall of the vacuum chamber (1). A first rotating rod (10) is threaded onto the bottom of the fixing plate (9). The top of the first rotating rod (10) extends through to the top of the fixing plate (9). A connecting plate (11) is installed at the bottom of the mounting arc plate (7), and the top of the first rotating rod (10) is rotatably connected to the bottom of the connecting plate (11).

3. The roll-to-roll magnetron sputtering vacuum apparatus according to claim 1, characterized in that, Both sides of the inner wall of the mounting groove (8) are fitted with pads (12), which are made of elastic material and are in contact with both sides of the cathode target (6).

4. The roll-to-roll magnetron sputtering vacuum apparatus according to claim 1, characterized in that, The bottom of the mounting arc plate (7) is fitted with a mounting plate (13), and a second rotating rod (14) is threaded on the right side of the bottom of the mounting plate (13). The top of the second rotating rod (14) extends through to the top of the mounting plate (13), and a compression pad (15) is fitted at the bottom of the cathode target (6). The top of the second rotating rod (14) is rotatably connected to the bottom of the compression pad (15).

5. The roll-to-roll magnetron sputtering vacuum apparatus according to any one of claims 1 to 4, characterized in that, Connecting plates (16) are installed on the front and rear sides of the top two sides of the inner wall of the vacuum chamber (1). A limiting frame (17) is installed at the bottom of the connecting plate (16). The inner side of the limiting frame (17) is provided on the winding drum (5).

6. The roll-to-roll magnetron sputtering vacuum apparatus according to claim 5, characterized in that, The inner side of the limiting frame (17) is provided with a support rod (18), and the winding drum (5) is sleeved on the surface of the support rod (18).

7. The roll-to-roll magnetron sputtering vacuum apparatus according to claim 6, characterized in that, The front of the winding drum (5) is provided with a rotating drum (19), the surface of the rotating drum (19) is threadedly connected to the inner wall of the limiting frame (17), and the support rod (18) is rotatably engaged with the inner cavity of the rotating drum (19).

8. The roll-to-roll magnetron sputtering vacuum apparatus according to claim 7, characterized in that, Extension plates (20) are installed on both sides of the front of the rotating cylinder (19), and a rotating plate (21) is installed on the front of the extension plate (20).

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