Shaft mounting jig

Abstract

The utility model relates to the technical field of semiconductor manufacturing, and provides a shaft installation jig which comprises a jig body and a limiting assembly. A positioning structure is arranged on the jig body, and the positioning structure is used for positioning the jig body relative to a part of the epitaxial equipment; the limiting assembly is arranged on the jig body and used for calibrating the installation position of the shaft part. The fixture is used for mounting the shaft parts in the extension equipment, so that the assembly process of the shaft parts is standardized, and the mounting precision of the shaft parts is improved.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing technology, and in particular to a shaft mounting fixture. Background Technology

[0002] Epitaxial growth is the process of depositing a thin single-crystal layer on a single-crystal substrate; this newly deposited single-crystal layer is called an epitaxial layer. Epitaxial growth plays a crucial role in semiconductor device manufacturing.

[0003] Epitaxial processes typically require epitaxial equipment, which usually includes multiple shaft components, such as the usceptor support shaft and the wafer lift shaft. The usceptor support shaft supports the usceptor and rotates it, and the usceptor carries the wafer. The wafer lift shaft drives the lift pins to move up and down, passing through the usceptor support shaft to transport and transfer the wafer.

[0004] Epitaxial wafers require periodic process management (PM). During PM, all quartz components within the epitaxial wafer's cavity must be removed, cleaned, and reassembled. This process involves the disassembly and assembly of shaft-like components within the epitaxial wafer, such as the wafer lifting shaft. These shaft-like components typically have assembly precision requirements. Current assembly methods rely on visual inspection for the installation of these shaft-like components, which is insufficient to guarantee the required installation precision. If the installation precision is not met, it may affect the uniformity of the EPI (epitaxygen layer index), THK (thickness), and RS (surface resistivity) of the epitaxial wafer.

[0005] Therefore, this utility model provides a shaft mounting fixture, which is used to assist in the installation of shaft components to ensure the assembly accuracy of shaft components. Utility Model Content

[0006] The purpose of this utility model is to provide a shaft mounting fixture for mounting shaft components in an extension device, thereby standardizing the assembly process of shaft components and improving the mounting accuracy of shaft components.

[0007] This utility model provides a shaft mounting fixture, including: a fixture body and a limiting component;

[0008] The fixture body is provided with a positioning structure, which is used to position the fixture body relative to a component of the extension device.

[0009] The limiting component is disposed on the fixture body for calibrating the installation position of shaft components.

[0010] Optionally, the limiting component includes a first limiting member, which is used to mark the installation position of the central axis of the shaft component.

[0011] Optionally, the first limiting member has a first calibration surface, which is adapted to the outer peripheral surface of the shaft component.

[0012] The first limiting member has a second calibration surface, which is adapted to the surface of a component of the epitaxial device.

[0013] Optionally, the limiting component further includes a second limiting member, which is used to mark the installation angle of the shaft component along its own circumference.

[0014] Optionally, when the limiting component includes a first limiting member, the second limiting member is connected to the fixture body, and the first limiting member is connected to the second limiting member.

[0015] Optionally, the fixture body is annular, one end of the second limiting member is connected to the fixture body, and the other end of the second limiting member extends toward the center of the fixture body and is connected to the first limiting member.

[0016] Optionally, the positioning structure is a positioning protrusion disposed on the fixture body.

[0017] Optionally, the fixture body is provided with an observation notch.

[0018] Optionally, the fixture body is provided with a handle.

[0019] With this configuration, the aforementioned shaft mounting fixture can be used to assist in the installation of shaft-type components in epitaxial equipment, standardizing the assembly process of shaft-type components and effectively improving the consistency of process management. It also helps reduce the assembly and adjustment time of shaft-type components, shortens the process management time of epitaxial equipment, increases machine capacity, and reduces the installation difficulty of shaft-type components. This shaft mounting fixture also helps improve the installation accuracy of shaft-type components, thereby eliminating the impact of insufficient installation accuracy on the uniformity of EPI (epitaxy layer), THK (thickness), and RS (surface resistivity) of the wafer. This helps improve the epitaxial growth effect of the epitaxial equipment and also helps avoid wafer drop or wafer damage caused by large installation errors. Attached Figure Description

[0020] Figure 1 This is a schematic diagram of the structure of an existing epitaxial device;

[0021] Figure 2 This is a three-dimensional structural diagram of a shaft mounting fixture according to an embodiment of the present invention;

[0022] Figure 3 This is a side view of a shaft mounting fixture according to an embodiment of the present invention.

[0023] Figure 4 This is a schematic diagram of the structure of the shaft mounting fixture and the lower liner of the extension equipment according to an embodiment of the present invention;

[0024] Figure 5 This is a schematic diagram of the structure of the lower liner according to an embodiment of the present invention;

[0025] Figure 6 This is a schematic diagram of the internal assembly structure of a shaft mounting fixture according to an embodiment of the present invention;

[0026] Figure 7 This is a schematic diagram of the structure of the shaft mounting fixture and the wafer lifting shaft in one embodiment of the present invention.

[0027] The reference numerals in the attached figures are as follows:

[0028] 100 - Epitaxial equipment; 110 - Base support shaft; 120 - Wafer lifting shaft; 121 - Support branch; 130 - Base; 140 - Lifting pin; 150 - Lower cover; 151 - Lower dome; 160 - Lower pad; 161 - Through hole; 162 - Positioning groove;

[0029] 10- Fixture body; 11- Positioning protrusion; 12- Observation notch; 13- Handle;

[0030] 20 - Limiting component; 21 - First limiting member; 211 - First calibration surface; 212 - Second calibration surface; 22 - Second limiting member; 221 - First connecting arm; 222 - Second connecting arm; 223 - Third connecting arm. Detailed Implementation

[0031] The shaft mounting fixture proposed in this utility model will be further described in detail below with reference to the accompanying drawings and specific embodiments. The advantages and features of this utility model will become clearer from the following description. It should be noted that the drawings are all in a very simplified form and use non-precise proportions, and are only used to facilitate and clarify the illustration of the embodiments of this utility model.

[0032] As used in this invention, the singular forms “a,” “an,” and “the” include plural objects; the term “or” is generally used to mean “and / or”; the term “a number” is generally used to mean “at least one”; and the terms “at least two” or “more than” are generally used to mean “two or more”. Furthermore, the terms “first,” “second,” and “third” are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined with “first,” “second,” or “third” may explicitly or implicitly include one or at least two of that feature. Furthermore, the terms "installed," "connected," and "attached," as used in this utility model, and the term "set" on one element from another, should be interpreted broadly. They generally only indicate a connection, coupling, cooperation, or transmission relationship between the two elements, which can be direct or indirect through an intermediate element. They should not be construed as indicating or implying a spatial positional relationship between the two elements, meaning one element can be located inside, outside, above, below, or to one side of the other element, unless otherwise explicitly stated. Those skilled in the art can understand the specific meaning of these terms in this utility model according to the specific circumstances. Additionally, directional terms such as above, below, up, down, upward, downward, left, and right are used relative to exemplary embodiments as shown in the figures, with upward or up direction pointing towards the top of the corresponding figure, and downward or down direction pointing towards the bottom of the corresponding figure.

[0033] Epitaxial processes typically require epitaxial equipment; please refer to [reference needed]. Figure 1 As shown, the epitaxial device 100 typically includes multiple shaft-like components, such as a base support shaft 110 and a wafer lifting shaft 120. The base support shaft 110 supports the base 130 and drives it to rotate; the base 130 carries the wafer. The wafer lifting shaft 120 drives a lifting pin 140 to move vertically, the lifting pin 140 passing through the base 130 for wafer transport and transfer.

[0034] like Figure 1 As shown, multiple support branches 121 are connected above the wafer lifting shaft 120, and each support branch 121 is symmetrically distributed around the central axis of the wafer lifting shaft 120. The support branch 121 is used to drive the lifting pin 140 to move up and down.

[0035] Figure 1 The epitaxial apparatus 100 is used to introduce epitaxial gas into its internal cavity. The epitaxial gas flows over the surface of the substrate 130 to achieve epitaxial growth on the wafer surface. During the epitaxial process, the substrate support shaft 110 drives the substrate 130 and the wafer located on the substrate 130 to rotate, so that the epitaxial growth is carried out uniformly.

[0036] The wafer lifting shaft 120 is typically housed within the lower dome 151 of the lower cover 150 of the epitaxial device. During installation, there are assembly requirements between the wafer lifting shaft 120 and the lower dome 151; for example, the wafer lifting shaft 120 must be coaxially aligned with the lower dome 151.

[0037] Furthermore, the wafer lift axis 120 also has installation requirements along its own circumferential angle. Typically, during installation, one of its support branches 121 should be radially aligned with a designated position on the epitaxial device, such as a wafer transfer valve on the epitaxial device. By limiting the installation angle of the wafer lift axis 120 along its own circumference, the installation angle of the base 130 is limited, thereby limiting the initial angle at which the wafer is placed on the base 130, ensuring the correct circumferential positioning of the wafer.

[0038] The existing assembly method involves visually inspecting the installation of the wafer lifting shaft 120 and the coaxiality of the wafer lifting shaft 120 and the lower dome 151. Since the outer diameter of the wafer lifting shaft 120 is typically smaller than the outer diameter of the lower dome 151, when the wafer lifting shaft 120 and the lower dome 151 are coaxial, the outer circumferential surface of the wafer lifting shaft 120 does not contact the inner circumferential surface of the lower dome 151. This makes it difficult to accurately guarantee the coaxiality of the wafer lifting shaft 120 and the lower dome 151 during assembly by visual inspection.

[0039] If the coaxiality accuracy of the wafer lifting axis 120 has a large error, the base support axis 110 will be installed based on the position of the wafer lifting axis 120, which will cause corresponding errors in the installation of the base support axis 110. This will cause the base 130 to wobble relative to the central axis of the epitaxial equipment when it rotates with the base support axis 110, thus affecting the uniformity of the EPI (epitaxy layer), THK (thickness), and RS (surface resistivity) of the epitaxial wafer.

[0040] In addition, if the circumferential angle installation error of the wafer lifting axis 120 is large, it may cause the wafer to rub against the lifting pin 140 during the wafer transmission process, resulting in wafer damage or wafer drop.

[0041] Based on this, this embodiment provides a shaft mounting fixture made of acrylic material. The mounting fixture includes a fixture body 10 and a limiting component 20.

[0042] Combination Figure 2 As shown, in this embodiment, the fixture body 10 is configured as a ring to adapt to the shape of existing epitaxial device components.

[0043] The fixture body 10 is provided with a positioning structure, which is used to position the fixture body 10 relative to a component of the epitaxial device. In this embodiment, the fixture body 10 is positioned relative to the lower liner 160 of the epitaxial device (the specific positioning method is described in conjunction with the following content). Figures 4 to 7 (Detailed explanation).

[0044] In other alternative embodiments, the jig body 10 may be configured as a semi-circular or other shape. The specific shape of the jig body 10 may be adjusted based on its adaptability to the assembly method of existing epitaxial devices during use.

[0045] In other alternative embodiments, the fixture body 10 may be positioned in relation to other components of the extension device.

[0046] Please continue to refer to this. Figure 2 and Figure 3 As shown, in this embodiment, the positioning structure consists of two positioning protrusions 11 disposed on the fixture body 10. The two positioning protrusions 11 are disposed on the same side of the fixture body 10 along its axial direction. Figure 2 The lower end face of the fixture body 10 in the middle). During the use of the shaft mounting fixture, one end of the fixture body 10 ( Figure 2 The lower end face of the fixture body 10 is fitted onto a component (lower liner 160) of the existing epitaxial equipment, and two positioning protrusions 11 are conformally inserted into the grooves of the component so that the shaft mounting fixture is positioned relative to the existing epitaxial equipment (the specific assembly method of the positioning protrusions 11 is described in the following text). Figures 4 to 7 (Detailed explanation).

[0047] In this embodiment, the positioning protrusion 11 is a cylindrical protrusion, and there are two positioning protrusions 11, which are symmetrically arranged around the central axis of the fixture body 10. This arrangement is compatible with the existing lower liner 160 structure.

[0048] In other alternative embodiments, the positioning protrusion 11 can be in the shape of a frustum, cuboid, etc., and the number of positioning protrusions 11 can be one, three, or more. The specific shape and number of positioning protrusions 11 can be adjusted based on their adaptability to the assembly method of existing epitaxial devices during use.

[0049] Please continue to refer to this. Figure 2 As shown, the limiting component 20 is disposed on the fixture body 10 to calibrate the installation position of the shaft-type component. The installation position here can refer to the position of the shaft-type component's central axis during installation and the installation angle of the shaft-type component along its circumference. In this embodiment, the structure of the shaft mounting fixture is illustrated using a wafer lifting shaft 120 as an example.

[0050] Please continue to refer to this. Figure 2As shown, the limiting component 20 includes a first limiting member 21, which is used to mark the installation position of the central axis of the wafer lifting shaft 120.

[0051] Specifically, the first limiting member 21 has a first calibration surface 211, which is adapted to the outer peripheral surface of the wafer lifting shaft 120.

[0052] In this embodiment, the first calibration surface 211 is a semi-circular arc surface, and the central angle of the first calibration surface 211 is approximately 180°. After the axis mounting fixture is positioned relative to the epitaxial device, during the installation of the wafer lifting axis 120, the outer peripheral surface of the wafer lifting axis 120 is made to fit against the first calibration surface 211. At this time, the central axis of the wafer lifting axis 120 is collinear with the central axis of the first calibration surface 211, thus naturally determining the installation position of the central axis of the wafer lifting axis 120.

[0053] Since the wafer lifting axis 120 is required to be coaxial with the lower dome 151, it should be ensured that after the axis mounting fixture is positioned relative to the epitaxial equipment, the central axis of the first calibration surface 211 is coaxial with the lower dome 151.

[0054] In other alternative embodiments, when there are other requirements for the installation of the central axis of the wafer lifting shaft 120, the position and shape of the first calibration surface 211 are adjusted accordingly so that after the shaft mounting fixture is positioned relative to the epitaxial device, the central axis of the first calibration surface 211 is always located at the installation position of the central axis of the wafer lifting shaft 120.

[0055] In this embodiment, the first calibration surface 211 is an incomplete arc surface. In other alternative embodiments, the first calibration surface 211 can be a complete annular arc surface (with a central angle of 360°). In this case, the first calibration surface 211 essentially forms a circular hole structure, into which the wafer lifting shaft 120 is inserted during installation.

[0056] In this embodiment, the first calibration surface 211 is adapted to the outer peripheral surface of the wafer lifting shaft 120. Since the existing wafer lifting shaft 120 has a hollow structure, in other alternative embodiments, the first calibration surface 211 can be adapted to the inner peripheral surface of the wafer lifting shaft 120. During the installation of the wafer lifting shaft 120, the first limiting member 21 is inserted into the inner cavity of the wafer lifting shaft 120, and the first calibration surface 211 is in contact with the inner peripheral surface of the wafer lifting shaft 120, thus determining the position of the central axis of the wafer lifting shaft 120. The above-described mating method is applicable to hollow shaft-type components.

[0057] Please continue to refer to this. Figure 2As shown, the first limiting member 21 is semi-circular in shape, with its inner circumferential surface serving as the first calibration surface 211 and its outer circumferential surface serving as the second calibration surface 212. When the shaft mounting fixture is positioned relative to the extended device, the first limiting member 21 is conformally located inside the lower dome 151, and the second calibration surface 212 of the first limiting member 21 conformally fits the inner surface of the lower dome 151, so that the first limiting member 21 and the lower dome 151 are coaxially arranged, thus naturally positioning the first limiting member 21.

[0058] Of course, in other alternative embodiments, the second calibration surface 212 can be selected to conformally fit the surface of other components of the epitaxial device based on actual assembly requirements, so as to assist in the positioning of the first limiting member 21.

[0059] The axial dimension of the first limiting member 21 is set based on actual assembly requirements.

[0060] The second calibration surface 212 serves two purposes: firstly, it assists in positioning the first limiting member 21; secondly, it is used to verify the positional accuracy of the first limiting member 21. If, after the shaft mounting fixture is positioned relative to the extended device, the first limiting member 21 cannot conformally fit the inner circumferential surface of the lower dome 151, it means that the positional accuracy of the first limiting member 21 relative to the fixture body 10 is poor, and the position of the first limiting member 21 needs to be adjusted.

[0061] Of course, in other alternative embodiments, the first limiting member 21 can maintain the positional accuracy relative to the fixture body 10, so that after the shaft mounting fixture is positioned relative to the extension device, the first limiting member 21 is naturally coaxial with the lower dome 151, and at this time it is not necessary to rely on the second calibration surface 212 to cooperate with the lower dome 151 for auxiliary positioning.

[0062] Please continue to refer to this. Figure 2 As shown, the limiting component 20 also includes a second limiting member 22, which is used to mark the installation angle of the wafer lifting shaft 120 along its own circumference.

[0063] In this embodiment, the second limiting member 22 can be connected to the fixture body 10 by welding, bolting or other known connection methods, and the first limiting member 21 is connected to the second limiting member 22.

[0064] One end of the second limiting member 22 is connected to the fixture body 10, and the other end of the second limiting member 22 extends toward the center of the fixture body 10 and is connected to the first limiting member 21.

[0065] Combination Figure 2As shown, the second limiting member 22 has an overall irregular rod-shaped structure, which includes a first connecting arm 221, a second connecting arm 222, and a third connecting arm 223. The first connecting arm 221 and the second connecting arm 222 are vertically connected, and the first connecting arm 221 is connected to one axial side of the fixture body 10. Figure 2 and Figure 3 The second connecting arm 222 is located inside the fixture body 10, close to the inner wall of the fixture body 10 and maintaining a certain gap between them. The second connecting arm 222 extends radially along the fixture body 10, passes through the inner ring of the fixture body 10, and then connects with the third connecting arm 223. The third connecting arm 223 extends obliquely towards the central axis of the fixture body 10 and connects with the first limiting member 21. The central axis of the first limiting member 21 is collinear with the central axis of the fixture body 10.

[0066] The second limiting member 22 of this structure can be used to calibrate the circumferential mounting angle of the wafer lifting axis 120, and also serves as a connecting arm for mounting the first limiting member 21. This improves the overall consistency between the first limiting member 21 and the second limiting member 22, and also helps to simplify the overall structure of the axis mounting fixture.

[0067] The second limiting member 22 is used in conjunction with a support branch 121 of the wafer lifting shaft 120. When the wafer lifting shaft 120 is engaged with the first limiting member 21 to ensure its central axis meets installation requirements, rotating the wafer lifting shaft 120 causes one of the support branches 121 to circumferentially conform to the second limiting member 22, thus limiting the position of the support branch 121. This ensures that one of the support branches 121 is radially aligned with the wafer transfer valve. Since the support branches 121 on the wafer lifting shaft 120 are symmetrically distributed around the central axis of the wafer lifting shaft 120, when one support branch 121 is circumferentially conforming to the second limiting member 22, one of the support branches 121 will inevitably be directly aligned with the wafer transfer valve.

[0068] The aforementioned second limiting member 22 is composed of a first connecting arm 221, a second connecting arm 222, and a third connecting arm 223, such that the entire second limiting member 22 tends to extend radially toward the center of the fixture body 10 to match the installation position of the first limiting member 21. Simultaneously, the second limiting member 22 tends to extend axially, so that the first limiting member 21 and the fixture body 10 have a certain positional difference in the axial direction. Therefore, after the shaft mounting fixture is positioned relative to the extended device, the first limiting member 21 can extend into the lower dome 151, thereby allowing the outer circumferential surface (second calibration surface 212) of the first limiting member 21 to conformally fit with the inner circumferential surface of the lower dome 151.

[0069] In other alternative embodiments, the second limiting member 22 can be a diagonal bar structure or other irregularly shaped structure. The specific structure of the second limiting member 22 can be adapted based on actual usage requirements.

[0070] In this embodiment, the first limiting member 21 and the second limiting member 22 adopt an integrally molded connection structure. In other alternative embodiments, the first limiting member 21 and the second limiting member 22 can be detachably connected to facilitate the replacement of the first limiting member 21. Furthermore, the first limiting member 21 and the second limiting member 22 can also be not directly connected; for example, one limiting member 21 is directly connected to the fixture body 10, and the second limiting member 22 is also directly connected to the fixture body 10. The second limiting member 22 can be, for example, a limiting rod or limiting block connected to the fixture body 10. The installation method of the first limiting member 21 and the second limiting member 22, as well as the specific shapes of the first limiting member 21 and the second limiting member 22, can be adaptively adjusted based on actual needs.

[0071] The aforementioned second limiting member 22 is adapted to shaft components with supporting branches 121. When applied to shaft components of the optical shaft type, without supporting branches, the second limiting member 22 can be a component with a prominent marking, such as a color marking, groove, or raised marking provided on the first limiting member 21. Similarly, a corresponding prominent marking can be provided on the outer circumferential surface of the optical shaft component. In this case, by adjusting the rotation of the shaft component so that the markings of the two are radially aligned, the circumferential installation angle of the shaft component can be positioned. The specific structure of the second limiting member 22 can be flexibly adjusted based on the actual assembly method.

[0072] Please continue to refer to this. Figure 2 and Figure 3 As shown, the fixture body 10 is provided with a handle 13. The handle 13 facilitates the assembly and disassembly of the fixture body 10.

[0073] In this embodiment, the handle 13 is located at one end of the axial direction of the fixture body 10. Figure 2 and Figure 3 Two protrusions (on the upper end of the fixture body 10) are provided, with handles 13 and positioning protrusions 11 respectively located at both ends of the fixture body 10 along its axial direction. The handles 13 are designed for easy hand gripping or mechanical clamping to facilitate the assembly and disassembly of the fixture body 10. In other alternative embodiments, the handles 13 can be U-shaped or other irregularly shaped structures, and the specific shape and number of handles 13 can be adjusted based on actual needs.

[0074] Please continue to refer to this. Figure 2As shown, the fixture body 10 is provided with an observation notch 12. The observation notch 12 is semi-circular and is located on the outer periphery of the fixture body 10, extending through the fixture body 10 along its axial direction. The shape and position of the observation notch 12 can be adjusted according to its usage requirements.

[0075] The observation notch 12 serves as a marker to indicate the installation position of the fixture body 10; it is also used to observe other components of the extension equipment through the observation notch 12 to monitor whether the fixture body 10 moves relative to other components, or whether other components move relative to the extension equipment, during the assisted assembly process (the specific usage of the observation notch 12 is explained in the following text). Figures 4 to 7 (Detailed explanation).

[0076] The following is combined with Figures 4 to 7 The process of using the shaft mounting fixture is described in detail.

[0077] like Figure 4 The diagram shows the internal structure of the disassembled epitaxial device. A lower liner 160 is provided at the edge of the lower cover 150, and the lower liner 160 has a ring structure.

[0078] Combination Figure 5 As shown, the upper end face of the lower liner 160 has two through holes 161 and a positioning groove 162.

[0079] Combination Figure 4 and Figure 6 As shown, the fixture body 10 of the shaft mounting fixture is mounted on the lower liner 160, and the two positioning protrusions 11 of the fixture body 10 are conformally inserted into the two through holes 161 of the lower liner 160, and the lower end face of the fixture body 10 is in contact with the upper end face of the lower liner 160, thus positioning the fixture body 10 relative to the lower liner 160 of the extension device. Figure 6 As shown, at this time, a portion of the first limiting member 21 extends into the lower dome 151 of the lower cover 150, and the outer peripheral surface (second calibration surface 212) of the first limiting member 21 conforms to the inner peripheral surface of the lower dome 151. At this time, the first limiting member 21 and the lower dome 151 are coaxial.

[0080] Combination Figure 7As shown, when installing the wafer lifting shaft 120, the outer peripheral wall of the wafer lifting shaft 120 is adjusted to conformally fit with the first calibration surface 211 of the first limiting member 21 using the leveling mechanism built into the epitaxial equipment. At this time, the wafer lifting shaft 120 and the first limiting member 21 are coaxial, and therefore the wafer lifting shaft 120 and the lower dome 151 are coaxially set. Thus, the coaxiality of the wafer lifting shaft 120 meets the installation requirements. Then, the wafer lifting shaft 120 is rotated using the rotary link mechanism built into the epitaxial equipment, so that one of the support branches 121 fits with the second limiting member 22, and the circumferential installation angle of the wafer lifting shaft 120 meets the requirements.

[0081] like Figure 7 As shown, the notch 12 is designed so that a portion of the positioning groove 162 is not obscured by the fixture body 10 and can be observed. At this time, when rotating the wafer lifting shaft 120, the positioning groove 162 can be used as a reference to determine whether the fixture body 10 rotates relative to the lower liner 160, or whether the lower liner 160 rotates relative to the lower cover 150.

[0082] The aforementioned shaft mounting fixture can be used to assist in the installation of shaft-type components in epitaxial equipment, standardizing the assembly process and effectively improving the consistency of process management. It also helps reduce the assembly and adjustment time of shaft-type components, shortens the process management time of epitaxial equipment, increases machine capacity, and reduces the installation difficulty of shaft-type components. This shaft mounting fixture also helps improve the installation accuracy of shaft-type components, thereby eliminating the impact of insufficient installation accuracy on the uniformity of EPI (epitaxy layer), THK (thickness), and RS (surface resistivity) of the wafer. This helps improve the epitaxial growth effect of the epitaxial equipment and also helps avoid wafer drop or damage caused by large installation errors.

[0083] The above embodiments illustrate an example of using a shaft mounting fixture to assist in the mounting of the wafer lifting shaft 120. In other alternative embodiments, it can assist in the mounting of other shaft-type components, and the shaft mounting fixture can be structurally adjusted according to the mounting requirements of other shaft-type components. Furthermore, the aforementioned shaft mounting fixture is adaptable to the auxiliary assembly of existing 6-inch, 8-inch, and 12-inch wafer epitaxial equipment.

[0084] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on the differences from other embodiments. The same or similar parts between the various embodiments can be referred to each other.

[0085] The above description is only a description of the preferred embodiment of the present utility model and is not intended to limit the scope of the present utility model in any way. Any changes or modifications made by those skilled in the art based on the above disclosure shall fall within the protection scope of the claims.

Claims

1. A shaft mounting fixture, characterized in that, include: Fixture body and limiting components; The fixture body is provided with a positioning structure, which is used to position the fixture body relative to a component of the extended device. The limiting component is disposed on the fixture body for calibrating the installation position of shaft components.

2. The shaft mounting fixture as described in claim 1, characterized in that, The limiting component includes a first limiting member, which is used to mark the installation position of the central axis of the shaft component.

3. The shaft mounting fixture as described in claim 2, characterized in that, The first limiting member has a first calibration surface, which is adapted to the outer peripheral surface of the shaft component.

4. The shaft mounting fixture as described in claim 2, characterized in that, The first limiting member has a second calibration surface, which is adapted to the surface of a component of the epitaxial device.

5. The shaft mounting fixture as described in any one of claims 1 to 4, characterized in that, The limiting component further includes a second limiting member, which is used to mark the installation angle of the shaft component along its own circumference.

6. The shaft mounting fixture as described in claim 5, characterized in that, When the limiting component includes a first limiting member, the second limiting member is connected to the fixture body, and the first limiting member is connected to the second limiting member.

7. The shaft mounting fixture as described in claim 6, characterized in that, The fixture body is circular, one end of the second limiting member is connected to the fixture body, and the other end of the second limiting member extends towards the center of the fixture body and is connected to the first limiting member.

8. The shaft mounting fixture as described in claim 1, characterized in that, The positioning structure is a positioning protrusion provided on the fixture body.

9. The shaft mounting fixture as described in claim 1, characterized in that, The fixture body has an observation notch.

10. The shaft mounting fixture as described in claim 1, characterized in that, The fixture body is equipped with a handle.

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