Exposure apparatus

Abstract

The utility model discloses exposure equipment, which comprises a working table provided with a table top, the table top is provided with at least two object carrying areas for carrying workpieces at intervals, each object carrying area is internally provided with a group of marker lamp components, and each marker lamp component comprises at least three marker lamps which are not collinear; the sliding frame is in sliding connection with the workbench; the exposure mechanism is arranged on the sliding frame and is used for carrying out exposure treatment on the workpiece on the table top; and the visual mechanism is used for identifying the position of the workpiece in the loading area. According to the exposure equipment disclosed by the utility model, a plurality of workpieces can be exposed in turn, and after the previous workpiece is exposed, the previous workpiece can be coated with photoresist and turned over when the next workpiece is exposed, so that the production efficiency is improved.

Description

Technical Field

[0001] This utility model belongs to the field of circuit board manufacturing technology, specifically relating to an exposure device. Background Technology

[0002] A circuit board, also known as a printed circuit board, can be made of ceramic, polymer, or metal materials. The manufacturing process of a circuit board includes an exposure process, in which photoresist is coated onto the substrate to obtain a photolithography layer. By exposing the photolithography layer, a photolithography layer with an exposure etching pattern is obtained on the substrate, which facilitates the arrangement of circuits on the substrate. When multiple photolithography layers on the substrate surface need to be exposed, it is necessary to wait until one layer of exposure is completed, then coat a new layer of photoresist before exposing again, which results in low work efficiency.

[0003] The information disclosed in this background section is intended only to enhance the understanding of the overall background of this utility model and should not be construed as an admission or in any way implying that the information constitutes prior art known to those skilled in the art. Utility Model Content

[0004] The purpose of this invention is to provide an exposure device that can improve exposure efficiency.

[0005] To achieve the above objectives, a specific embodiment of this utility model provides the following technical solution: an exposure device, comprising:

[0006] A workbench with a table surface, wherein multiple loading areas for supporting workpieces are spaced apart on the table surface;

[0007] A sliding frame is slidably connected to the worktable;

[0008] An exposure mechanism, mounted on the sliding frame, is used to expose workpieces on the table.

[0009] A vision mechanism used to identify the position of a workpiece within a carrying area.

[0010] In one or more embodiments of this utility model, each of the loading areas is provided with at least three non-collinear mounting holes, and each mounting hole is provided with a marking light for marking the side of the workpiece facing the table.

[0011] In one or more embodiments of the present invention, the sliding frame includes a first frame spaced apart from the worktable and a second frame fixedly connected between the first frames. The first frame is slidably connected to the worktable, and the exposure mechanism is slidably mounted on the second frame.

[0012] In one or more embodiments of this utility model, a sliding groove is provided on the table surface, the extending direction of the sliding groove is perpendicular to the extending direction of the second frame, and the sliding groove is slidably connected to the first frame.

[0013] In one or more embodiments of this utility model, the workbench is provided with a first drive unit and a connector connected to each other, and the first drive unit is connected to the first frame through the connector.

[0014] In one or more embodiments of this utility model, the first drive unit is a rotary motor, the connecting member is a screw, and the first frame is provided with a threaded hole that is threadedly connected to the screw.

[0015] In one or more embodiments of this utility model, the screw is rotatably mounted in the slide groove.

[0016] In one or more embodiments of this utility model, a second drive unit is provided on the second frame, the second drive unit is connected to the exposure mechanism, and is used to drive the exposure mechanism to slide relative to the second frame. The second frame is provided with a slide rail, and the exposure mechanism is provided with a slide groove that is slidably connected to the slide rail.

[0017] In one or more embodiments of this utility model, the second driving unit is a cylinder, and the piston rod of the cylinder is connected to the exposure mechanism.

[0018] In one or more embodiments of this utility model, the marking lamp is an ultraviolet marking lamp.

[0019] Compared with the prior art, the exposure equipment of this utility model divides the table into multiple bearing areas, each of which can hold a workpiece. With the help of the marking lamp assembly, the exposure mechanism and the vision mechanism, multiple workpieces can be exposed in turn. After the previous workpiece is exposed, the previous workpiece can be coated with photoresist and flipped over before exposing the next workpiece, thereby improving production efficiency. Attached Figure Description

[0020] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0021] Figure 1 This is a perspective view of the exposure device in one embodiment of the present invention;

[0022] Figure 2 This is a top view of the workbench and workpiece in one embodiment of the present invention;

[0023] Figure 3 This is a partial cross-sectional perspective view of the exposure device in one embodiment of the present invention.

[0024] Explanation of key figure labels:

[0025] 1. Worktable; 11. Tabletop; 12. Loading area; 13. Mounting hole; 14. Slide; 2. Exposure mechanism; 3. Sliding frame; 31. First frame; 311. Threaded hole; 32. Second frame; 4. Vision mechanism; 5. Marking light; 6. First drive unit; 7. Connector; 8. Workpiece. Detailed Implementation

[0026] To enable those skilled in the art to better understand the technical solutions of this utility model, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort should fall within the protection scope of this utility model.

[0027] As described in the background art, workpiece 8 includes a substrate and a photolithographic layer disposed on at least one surface of the substrate. When the substrate is a ceramic material, due to the special properties and uses of ceramic substrate circuit boards, ceramic boards are usually small in size, but the thickness of the photolithographic layer applied on the ceramic board is large, about three times the thickness of the photolithographic layer on conventional other substrates.

[0028] For example, if the thickness of the photolithographic layer on other substrates is 1 unit, then the thickness of the photolithographic layer on a ceramic substrate is 3 to 3.5 units. Existing commonly used exposure mechanisms are designed for photolithographic layers with a thickness of 1.2 units or less. In this case, without changing the exposure mechanism, the only solution is to extend the exposure time. Since the exposure process proceeds from the surface of the photolithographic layer inwards, the exposed surface hinders the energy transmission to the inner layers, resulting in a lower exposure rate for the inner layers compared to the surface. This is especially true as the thickness of the exposed surface layer increases, leading to increasingly slower exposure rates for the inner layers and consequently, longer exposure times. In other words, the exposure time for a 3 to 3.5 unit thick photolithographic layer is significantly longer than that for a 1 unit thick photolithographic layer, by 3 to 3.5 times. Even with extended exposure times, it may be impossible to fully expose the inner layers of the photolithographic layer.

[0029] Therefore, the above problem can be solved by using a layered exposure method, which involves dividing the thick photolithography layer into multiple photoresist coatings. After exposing one photoresist coating, a new photoresist coating is applied, and then the exposure is repeated. By repeating the above steps, the thick photolithography layer can be fully exposed.

[0030] like Figure 1 and 2 As shown, a specific embodiment of this utility model provides an exposure device that can be applied to the above-mentioned exposure method. The exposure device includes a worktable 1, a sliding frame 3, an exposure mechanism 2, and a vision mechanism 4. The worktable 1 has a table surface 11, and at least two carrying areas 12 for carrying workpieces 8 are spaced apart on the table surface 11. Each carrying area 12 is provided with a set of marking light assemblies, and the marking light assemblies include at least three non-collinear marking lights 5. The sliding frame 3 is slidably connected to the worktable 1. The exposure mechanism 2 is disposed on the sliding frame 3 and is used to expose the workpieces 8 on the table surface 11. The vision mechanism 4 is used to identify the position of the workpieces 8 in the carrying areas 12.

[0031] It is understood that each carrying area 12 contains a workpiece 8 to be exposed. By moving the sliding frame 3, the exposure mechanism 2 and the vision mechanism 4 are moved to a carrying area 12. At this time, the vision mechanism 4 can take pictures of the carrying area 12, acquire images, and determine whether there is a workpiece 8 in the area (including information such as the position of the workpiece 8) and whether there is a photoresist coating on the substrate of the workpiece 8, based on the content of the images. This information is then transmitted to the exposure mechanism 2. The exposure mechanism 2 uses the above information to expose the workpiece 8 in the carrying area 12. After the exposure is completed, the workpiece 8 in the carrying area 12 can be removed and coated with new photoresist. At the same time, the exposure mechanism 2 and the vision mechanism 4 can be moved to the next carrying area 12 by moving the sliding frame 3. By repeating the above steps, the workpiece 8 in the next carrying area 12 can be exposed. The exposure device of this invention can hold multiple workpieces 8 and expose multiple workpieces 8 in turn. After the previous workpiece 8 is exposed, when exposing the next workpiece 8, the previous workpiece 8 can be coated with photoresist and flipped over, thereby improving production efficiency.

[0032] For a workpiece 8 with multiple layers of photoresist coating on both sides of the substrate, both requiring exposure, when the exposure mechanism 2 exposes the photoresist coating on the side of the substrate facing away from the carrying area 12, a marker lamp 5 simultaneously marks the photoresist coating on the side of the substrate facing the carrying area 12, thus ensuring that the exposure patterns on the photoresist coatings on the two opposite sides of the substrate correspond. A marker lamp 5 is installed in each of the three non-collinear mounting holes 13 to form three non-collinear reference points on the photoresist coating. These three non-collinear reference points form a mark, thereby defining a plane. The vision mechanism 4 can be a common shooting or photographing device. The vision mechanism 4 and the exposure mechanism 2 can have their own processing system or be connected to a host computer. The processing system or host computer can control the vision mechanism 4 and process the image information it captures; the processing system or host computer can control the exposure process of the exposure mechanism 2. The functions of the vision mechanism 4, the exposure mechanism 2, and the host computer in processing the image information they capture and controlling the exposure mechanism 2 are all common programs or devices in the prior art.

[0033] The exposure mechanism 2 may include a laser source, an optical modulator (DMD), and a lens assembly. The laser source forms a light spot with a specific pattern after being reflected by the DMD. The light spot is then projected onto the photoresist coating of the workpiece 8 after passing through the lens assembly for exposure.

[0034] Specifically, each carrying area 12 is provided with a mounting hole 13 corresponding to the marking light 5. The marking light 5 is installed in the mounting hole 13. The mounting hole 13 serves to accommodate the marking light 5 and prevent the marking light 5 from protruding from the surface 11.

[0035] In a specific example, the exposure process can be as follows:

[0036] A first photoresist coating is formed on each of the two surfaces of the substrate;

[0037] A pattern is exposed on the first layer of photoresist coating on the first side of the substrate, and a mark corresponding to the position of the exposed pattern on the first side of the substrate is formed on the first layer of photoresist coating on the second side of the substrate.

[0038] A second photoresist coating is formed on the first surface of the substrate;

[0039] Based on the markings on the first layer of photoresist coating on the second side of the substrate, a pattern is exposed on the first layer of photoresist coating on the second side of the substrate, and a marking corresponding to the position of the exposed pattern on the second side is formed on the second layer of photoresist coating on the first side of the substrate.

[0040] Based on the markings on the second layer of photoresist coating on the first side, a pattern is exposed on the second layer of photoresist coating on the first side.

[0041] Specifically, the two opposite sides of the substrate can be considered as the first side and the second side. The substrate is placed on the platform 11, with the first side facing the exposure mechanism 2 and the second side covering the marker lamp 5 on the platform 11. While exposing a specific pattern on the photoresist coating on the first side of the substrate, the marker lamp 5 on the platform 11 illuminates a mark on the photoresist coating on the second side. This can be understood as the marker lamp 5 causing the photoresist coating to react and change color, thereby forming a mark that can be acquired by the vision mechanism 4. That is, the position of the exposed pattern on the photoresist coating on the first side of the substrate corresponds to the mark on the photoresist coating on the second side of the substrate. When the substrate is flipped over and the photoresist coating on the second side is exposed, the position of the exposed pattern on the photoresist coating on the first side can be determined based on the position of the mark on the photoresist coating on the second side, thereby determining the position of the pattern to be exposed on the photoresist coating on the second side. This operation allows the patterns on the first and second sides to be aligned.

[0042] Because the photoresist coating on the same side is relatively thick, multiple photoresist coatings on the same side need to be exposed separately. When exposing each photoresist coating, it is necessary to ensure that it is aligned with the photolithographic pattern of the previous layer on that side and with the photolithographic pattern of the other side. Therefore, after applying the photoresist again, it is necessary to mark the position of the exposed pattern before exposure, and this mark corresponds to the pattern already exposed on the other side.

[0043] Therefore, after the photoresist coating on the workpiece 8 in one carrying area 12 is exposed, the workpiece 8 can be removed for coating. After coating, the workpiece 8 can be placed back into the carrying area 12. After all the workpieces 8 in other carrying areas 12 have been exposed, the exposure mechanism 2 and the vision mechanism 4 can be moved back into the carrying area 12 by moving the sliding frame 3, and the exposure can be performed according to the marking. This avoids the problem that the exposure pattern on the subsequent photoresist coating does not correspond to the previous exposure pattern on the photoresist coating due to the workpiece 8 being removed from the carrying area 12 for coating.

[0044] like Figure 1 As shown, the sliding frame 3 includes a first frame 31 spaced apart from the worktable 1 and a second frame 32 fixedly connected between the first frame 31. The first frame 31 is slidably connected to the worktable 1, and the exposure mechanism 2 is slidably mounted on the second frame 32. The slidable mounting of the exposure mechanism 2 on the second frame 32 allows for further adjustment of the position of the exposure mechanism 2.

[0045] Furthermore, the platform 11 is provided with a sliding groove 14, the extension direction of which is perpendicular to the extension direction of the second frame 32, and the sliding groove 14 is slidably connected to the first frame 31. The sliding groove 14 serves to limit the sliding direction of the first frame 31 and to support the first frame 31.

[0046] Furthermore, such as Figure 3As shown, the worktable 1 is equipped with a first drive unit 6 and a connector 7 connected together. The first drive unit 6 is connected to the first frame 31 through the connector 7. By controlling the movement of the first frame 31 through the first drive unit 6, the automation level of the entire exposure equipment can be improved.

[0047] Specifically, the first drive unit 6 is a rotary motor, the connecting part 7 is a screw, and the first frame 31 is provided with a threaded hole 311 that is threadedly connected to the screw. When the rotary motor drives the screw to rotate, since the first frame 31 is located in the slide groove 14, the rotation of the first frame 31 is restricted, allowing the first frame 31 to move linearly along the slide groove 14.

[0048] Specifically, the screw is rotatably mounted within the slide groove 14. That is, both ends of the screw or the rest of the screw can be rotatably mounted within the slide groove 14 via bearings or other means, thereby improving the stability of the screw rotation.

[0049] In one specific embodiment, a second drive unit (not shown in the figure) is provided on the second frame 32. The second drive unit is connected to the exposure mechanism 2 and is used to drive the exposure mechanism 2 to slide relative to the second frame 32. The second frame 32 is provided with a slide rail, and the exposure mechanism 2 is provided with a slide groove 14 that is slidably connected to the slide rail.

[0050] Specifically, the second drive unit is a cylinder, the piston rod of which is connected to the exposure mechanism 2, and the cylinder body is fixedly mounted on the second frame 32.

[0051] In one specific embodiment, the marking lamp 5 is an ultraviolet marking lamp 5. The ultraviolet marking lamp 5 is a commonly available UV mark lamp. Since the photoresist coating is a photosensitive material, it can be irradiated with the ultraviolet marking lamp 5 to form a mark on the photoresist coating, such as forming a color portion on the photoresist coating that is different from the color of the photoresist coating itself, which is the mark.

[0052] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0053] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. An exposure apparatus, characterized in that, include: A workbench has a table surface, on which at least two loading areas for carrying workpieces are spaced apart. Each loading area is provided with a set of marking light assemblies, and the marking light assembly includes at least three non-collinear marking lights. A sliding frame is slidably connected to the worktable; An exposure mechanism, mounted on the sliding frame, is used to expose workpieces on the table. A vision mechanism used to identify the position of a workpiece within a carrying area.

2. The exposure apparatus according to claim 1, characterized in that, Each of the loading areas is provided with a mounting hole corresponding to the marking light, and the marking light is installed in the mounting hole.

3. The exposure apparatus according to claim 1, characterized in that, The sliding frame includes a first frame spaced apart from the worktable and a second frame fixedly connected between the first frames. The first frame is slidably connected to the worktable, and the exposure mechanism is slidably mounted on the second frame.

4. The exposure apparatus according to claim 3, characterized in that, The platform is provided with a sliding groove, the extension direction of which is perpendicular to the extension direction of the second frame, and the sliding groove is slidably connected to the first frame.

5. The exposure apparatus according to claim 4, characterized in that, The workbench is equipped with a first drive unit and a connector connected to each other. The first drive unit is connected to the first frame through the connector.

6. The exposure apparatus according to claim 5, characterized in that, The first drive unit is a rotary motor, the connecting component is a screw, and the first frame is provided with a threaded hole that is threadedly connected to the screw.

7. The exposure apparatus according to claim 6, characterized in that, The screw is rotatably mounted in the slide groove.

8. The exposure apparatus according to claim 3, characterized in that, The second frame is provided with a second drive unit, which is connected to the exposure mechanism and is used to drive the exposure mechanism to slide relative to the second frame. The second frame is provided with a slide rail, and the exposure mechanism is provided with a slide groove that is slidably connected to the slide rail.

9. The exposure apparatus according to claim 8, characterized in that, The second drive unit is a cylinder, and the piston rod of the cylinder is connected to the exposure mechanism.

10. The exposure apparatus according to claim 1, characterized in that, The marking lamp is an ultraviolet marking lamp.

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