Photoresist liquid supply structure with filtering function for spin coating developing machine

Abstract

The utility model discloses a photoresist liquid supply structure with a filtering function for a spin coating developer, which comprises a liquid supply cabinet and a liquid supply pipe fitting, and is characterized in that the liquid supply pipe fitting is arranged on one side of the liquid supply cabinet and comprises a liquid outlet pipe, a telescopic pipe, a filtering component and an adapter pipe, the filtering assembly is composed of a filtering sleeve, an intercepting net cover and a filtering element body, the intercepting net cover and the filtering element body are both arranged in the filtering sleeve, the input end of the telescopic pipe is fixedly connected with the output end of the liquid outlet pipe, and the output end of the telescopic pipe is rotationally connected with a first rotating connector. According to the utility model, the filtering assembly is arranged in the liquid supply pipe fitting and comprises the filtering sleeve, the intercepting net cover and the filtering core body, so that the photoresist liquid is filtered in the photoresist conveying process, particles and cakes in the photoresist liquid are effectively intercepted, and the purity and the quality of the photoresist are ensured, so that the stability and the precision of a photoetching process are improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to wafer production technical field, concretely relates to a photoresist liquid supply structure with filtering function for uniform glue developing machine. BACKGROUND

[0002] In the field of wafer production technology, photoresist, as a kind of light-sensitive mixed liquid material, its quality and stability have a crucial influence on the quality of the final product and production efficiency. Photoresist is mainly composed of resin, additives, photoinitiator and solvent and other raw materials, these components play their unique role in the process of photoetching. However, photoresist may face some problems during long-term storage, especially the phenomenon of caking, which poses a potential threat to its use effect and wafer production quality.

[0003] The photoresist supply device disclosed in the patent number CN211207071U, when in use, the photoresist is pressed out by introducing pressure gas into the supply container, replacing the method of using photoresist pump to extract photoresist, which can avoid the problem of unstable supply of photoresist caused by insufficient maximum suction force of photoresist pump when the viscosity of photoresist is large, and improve the quality of coating.

[0004] Although the above-mentioned photoresist supply device solves the problem of unstable supply of high-viscosity photoresist by using pressure gas to press out photoresist, and considers the functions of air pressure regulation, residual detection and bubble removal in design, there are still some deficiencies in actual application. During the storage and transportation of photoresist, due to the nature of photoresist itself or improper storage conditions, caking may occur. These caking will seriously affect the quality of coating and cause product defects if they enter the coating groove. However, the above-mentioned photoresist supply device does not contain a filter component, which cannot effectively filter out the caking in photoresist, thereby increasing the risk of product defects.

[0005] Therefore, it is necessary to invent a photoresist liquid supply structure with filtering function for uniform glue developing machine to solve the above-mentioned problems. UTILITY MODEL CONTENTS

[0006] The utility model aims to provide a photoresist liquid supply structure with filtering function for uniform glue developing machine to solve the problems in the above-mentioned technology.

[0007] In order to achieve the above object, the utility model provides the following technical scheme: A photoresist liquid supply structure with filtering function for uniform gluing developing machine, including liquid supply cabinet and liquid supply pipe spare, its characterized in be that: Liquid supply pipe spare sets up at one side of liquid supply cabinet, liquid supply pipe spare includes liquid outlet pipe, telescopic pipe, filter assembly and adapter pipe, filter assembly is composed of filter sleeve, intercepting screen cover and filter core body, intercepting screen cover and filter core body all set up in filter sleeve interior, the input end of telescopic pipe is fixedly connected with the output end of liquid outlet pipe, the output end of telescopic pipe is rotatably connected with No. 1 rotary interface, the input end of adapter pipe is rotatably connected with No. 2 rotary interface, the input end of filter sleeve is threadedly connected with No. 1 rotary interface, the output end of filter sleeve is threadedly connected with No. 2 rotary interface, a control valve is installed in the middle of liquid outlet pipe, a control valve is installed in the middle of adapter pipe.

[0008] Through the filter assembly of rotary interface and thread connection, the quick disassembly of filter assembly is realized, and regular maintenance and replacement are facilitated, so that the purity of photoresist and the stability of supply are guaranteed.

[0009] Preferably, the intercepting screen cover is installed on the inner top surface of the filter sleeve, one end of the filter core body abuts against the inner bottom surface of the filter sleeve, and the other end of the filter core body abuts against the bottom of the intercepting screen cover.

[0010] When the photoresist passes through the filter assembly, it is first filtered by the intercepting screen cover and then finely filtered by the filter core body, thereby improving the filtering effect.

[0011] Preferably, the intercepting screen cover is bowl-shaped, the opening of the intercepting screen cover faces the input end of the filter sleeve, and micropores are formed on the surface of the intercepting screen cover.

[0012] Large-particle impurities and clumps in the photoresist are intercepted in the bowl-shaped intercepting screen cover, thereby avoiding clogging of the filter core body.

[0013] Preferably, a first buckle, a second buckle, and a liquid container are installed on one side of the liquid supply cabinet, the output end of the liquid outlet pipe is clamped to the first buckle, the input end of the adapter pipe is clamped to the second buckle, and the output end of the adapter pipe is arranged directly above the liquid container.

[0014] Preferably, a first cavity and a second cavity are formed in the liquid supply cabinet, a nitrogen tank and a photoresist tank are arranged in the first cavity, the second cavity is arranged directly above the first cavity, and a gas pump is installed in the second cavity.

[0015] Through the design of the first buckle and the second buckle, stable connection of the liquid outlet pipe and the adapter pipe with the liquid supply cabinet is realized, and the liquid container is arranged to facilitate collection of photoresist dripping from the output end of the adapter pipe, thereby facilitating subsequent cleaning.

[0016] Preferably, the input end of the air pump is fixedly connected with a gas suction pipeline, the input end of the gas suction pipeline extends to the inside of the nitrogen storage tank, the output end of the air pump is fixedly connected with a gas supply pipeline, the output end of the gas supply pipeline extends to the inside of the photoresist storage tank, and the input end of the liquid outlet pipe extends to the inside of the photoresist storage tank.

[0017] The connection mode of the air pump, the gas suction pipeline and the gas supply pipeline and the interaction of them with the nitrogen storage tank and the photoresist storage tank can extrude the photoresist outward by means of air pressure to realize the outward conveying of the photoresist.

[0018] Preferably, the front surface of the liquid supply cabinet is provided with a control panel, and the air pump is electrically connected with the control panel.

[0019] The electrical connection of the control panel with the air pump enables the user to conveniently control the on-off and running state of the air pump through the control panel.

[0020] Preferably, the front surface of the liquid supply cabinet is provided with a cabinet door, the cabinet door is matched with the first cavity, and the back surface of the liquid supply cabinet is provided with a punched heat dissipation plate, the punched heat dissipation plate is matched with the second cavity.

[0021] The design of the cabinet door facilitates the user to open the first cavity to replace and maintain the nitrogen storage tank and the photoresist storage tank, and the punched heat dissipation plate ensures the heat dissipation requirement of the air pump and other devices in the second cavity.

[0022] In the above technical solution, the technical effects and advantages of the present application are as follows:

[0023] 1. By arranging the filter assembly in the liquid supply pipe, including the filter sleeve, the interception mesh cover and the filter core, the filtration of the photoresist is realized in the process of conveying the photoresist, the particles and agglomerates in the photoresist are effectively intercepted, the purity and quality of the photoresist are ensured, and the stability and precision of the photoetching process are improved.

[0024] 2. By arranging the first control valve and the second control valve, the conveying line of the photoresist can be cut off, the filter assembly can be conveniently replaced or maintained, the design of the first rotary interface and the second rotary interface makes the connection between the filter assembly and the liquid supply pipe flexible and easy to operate, and the filter assembly can be quickly disassembled by simply rotating the interface. BRIEF DESCRIPTION OF DRAWINGS

[0025] Figure 1 It is a first perspective overall structure schematic view of the present application.

[0026] Figure 2 It is an enlarged view of the A part structure in the present application. Figure 1

[0027] Figure 3 ​The second view overall structure schematic view of the utility model is shown in the figure.

[0028] Figure 4 The structure section view of the liquid supply cabinet of the utility model is shown in the figure.

[0029] Figure 5 The structure section view of the filter assembly of the utility model is shown in the figure.

[0030] Mark explanation:

[0031] 1, liquid supply cabinet, 2, liquid outlet pipe, 3, telescopic pipe, 4, adapter pipe, 5, filter sleeve, 6, intercepting net cover, 7, filter core, 8, No. 1 control valve, 9, No. 2 control valve, 10, No. 1 buckle, 11, No. 2 buckle, 12, liquid containing box, 13, nitrogen storage tank, 14, photoresist storage tank, 15, air pump, 16, air extraction pipeline, 17, air supply pipeline, 18, control panel, 19, cabinet door, 20, punched heat sink. Specific implementation

[0032] In order to make the technical personnel in the field better understand the technical scheme of the utility model, the utility model will be further introduced in detail in connection with the drawings below.

[0033] The utility model provides a kind of photoresist liquid supply structure with filtering function for uniform glue developing machine as Figures 1-5 The utility model provides a kind of photoresist liquid supply structure with filtering function for uniform glue developing machine as shown in the figure, including liquid supply cabinet 1 and liquid supply pipe fitting, liquid supply pipe fitting is set to one side of liquid supply cabinet 1, liquid supply pipe fitting includes liquid outlet pipe 2, telescopic pipe 3, filter assembly and adapter pipe 4, filter assembly is composed of filter sleeve 5, intercepting net cover 6 and filter core 7, intercepting net cover 6 and filter core 7 are all set to filter sleeve 5 inside, the input end of telescopic pipe 3 is fixedly connected with the output end of liquid outlet pipe 2, the output end of telescopic pipe 3 is rotatably connected with No. 1 rotary interface, the input end of adapter pipe 4 is rotatably connected with No. 2 rotary interface, the input end of filter sleeve 5 is screw connected with No. 1 rotary interface, the output end of filter sleeve 5 is screw connected with No. 2 rotary interface, No. 1 control valve 8 is installed in the middle of liquid outlet pipe 2, No. 2 control valve 9 is installed in the middle of adapter pipe 4.

[0034] In one aspect of the embodiment, the interception mesh cover 6 is installed on the inner top surface of the filter sleeve 5, one end of the filter core 7 abuts against the inner bottom surface of the filter sleeve 5, the other end of the filter core 7 abuts against the bottom of the interception mesh cover 6, the interception mesh cover 6 is in the shape of a bowl, the opening of the interception mesh cover 6 faces the input end of the filter sleeve 5, and the surface of the interception mesh cover 6 is provided with micropores, the liquid supply cabinet 1 is provided with a first buckle 10, a second buckle 11 and a liquid containing box 12 on one side, the output end of the liquid outlet pipe 2 is buckled with the first buckle 10, the input end of the adapter pipe 4 is buckled with the second buckle 11, and the output end of the adapter pipe 4 is arranged above the liquid containing box 12, a first chamber and a second chamber are formed in the liquid supply cabinet 1, the first chamber is internally provided with a nitrogen storage tank 13 and a photoresist storage tank 14, the second chamber is arranged above the first chamber, and a gas pump 15 is installed in the second chamber, the input end of the gas pump 15 is fixedly connected with a gas suction pipeline 16, the input end of the gas suction pipeline 16 extends into the nitrogen storage tank 13, the output end of the gas pump 15 is fixedly connected with a gas supply pipeline 17, the output end of the gas supply pipeline 17 extends into the photoresist storage tank 14, the input end of the liquid outlet pipe 2 extends into the photoresist storage tank 14, a control panel 18 is installed on the front surface of the liquid supply cabinet 1, the gas pump 15 is electrically connected with the control panel 18, a cabinet door 19 is installed on the back surface of the liquid supply cabinet 1, the cabinet door 19 is matched with the first chamber, and a punched heat dissipation plate 20 is installed on the back surface of the liquid supply cabinet 1 and matched with the second chamber.

[0035] The working principle of the utility model is as follows:

[0036] The utility model discloses a filter assembly for photoresist supply cabinet Figures 1-5 When the utility model is used, first, the adapter pipe 4 is connected with the glue supply pipeline of the uniform glue developing machine, then, the gas pump 15 is started, nitrogen is extracted from the nitrogen storage tank 13 through the gas suction pipeline 16, and the nitrogen is injected into the photoresist storage tank 14 through the gas supply pipeline 17, the photoresist flows out from the photoresist storage tank 14 under the action of gas pressure, enters the telescopic pipe 3 through the liquid outlet pipe 2, when the photoresist flows through the filter sleeve 5, the photoresist is preliminarily intercepted by the interception mesh cover 6 to remove large impurities, then, the photoresist is further filtered by the filter core 7 to remove small impurities and agglomerates, and the filtered photoresist flows out from the adapter pipe 4 and then enters the glue supply pipeline of the uniform glue developing machine, so that the uniform glue developing machine can be used subsequently.

[0037] The filter assembly is regularly checked for blockage, if the blockage is serious, the filter assembly is replaced or cleaned in time, first, the first control valve 8 in the middle of the liquid outlet pipe 2 is closed, then, the second control valve 9 in the middle of the adapter pipe 4 is closed, so that the photoresist conveying line is cut off, then, the first rotary joint is rotated to separate the filter sleeve 5 from the output end of the telescopic pipe 3, the second rotary joint is rotated to separate the filter sleeve 5 from the input end of the adapter pipe 4, so that the filter assembly is detached from the liquid supply pipeline, the filter assembly can be replaced in time, and the stable supply of photoresist and product quality can be ensured.

Claims

1. A photoresist liquid supply structure for a uniform coating and developing machine with a filtering function, comprising a liquid supply cabinet (1) and a liquid supply pipe fitting, characterized in that: The liquid supply pipe is arranged on one side of the liquid supply cabinet (1), and the liquid supply pipe comprises a liquid outlet pipe (2), an extension pipe (3), a filter assembly and an adapter pipe (4), the filter assembly is composed of a filter sleeve (5), an interception mesh cover (6) and a filter core (7), the interception mesh cover (6) and the filter core (7) are arranged inside the filter sleeve (5), the input end of the extension pipe (3) is fixedly connected with the output end of the liquid outlet pipe (2), the output end of the extension pipe (3) is rotatably connected with a first rotary interface, the input end of the adapter pipe (4) is rotatably connected with a second rotary interface, the input end of the filter sleeve (5) is threadedly connected with the first rotary interface, the output end of the filter sleeve (5) is threadedly connected with the second rotary interface, a first control valve (8) is arranged in the middle of the liquid outlet pipe (2), and a second control valve (9) is arranged in the middle of the adapter pipe (4).

2. The photoresist liquid supply structure for a uniform coating and developing machine with a filtering function according to claim 1, characterized in that: The interception mesh cover (6) is arranged on the inner top surface of the filter sleeve (5), one end of the filter core (7) abuts against the inner bottom surface of the filter sleeve (5), and the other end of the filter core (7) abuts against the bottom of the interception mesh cover (6).

3. The photoresist liquid supply structure for a uniform coating and developing machine with a filtering function according to claim 2, characterized in that: The interception mesh cover (6) is in the shape of a bowl, the opening of the interception mesh cover (6) faces the input end of the filter sleeve (5), and micropores are arranged on the surface of the interception mesh cover (6).

4. The photoresist liquid supply structure for a uniform coating and developing machine with a filtering function according to claim 1, wherein: A first buckle (10), a second buckle (11) and a liquid containing box (12) are arranged on one side of the liquid supply cabinet (1), the output end of the liquid outlet pipe (2) is buckled with the first buckle (10), the input end of the adapter pipe (4) is buckled with the second buckle (11), and the output end of the adapter pipe (4) is arranged directly above the liquid containing box (12).

5. The photoresist liquid supply structure for a uniform coating and developing machine with a filtering function according to claim 1, wherein: the photoresist liquid supply structure is provided with a filter. A first cavity and a second cavity are arranged in the liquid supply cabinet (1), the first cavity is internally provided with a nitrogen storage tank (13) and a photoresist storage tank (14), the second cavity is arranged directly above the first cavity, and a gas pump (15) is arranged in the second cavity.

6. The photoresist liquid supply structure for a uniform coating and developing machine with a filtering function according to claim 5, wherein: The input end of the gas pump (15) is fixedly connected with a gas suction pipeline (16), the input end of the gas suction pipeline (16) extends into the nitrogen storage tank (13), the output end of the gas pump (15) is fixedly connected with a gas supply pipeline (17), the output end of the gas supply pipeline (17) extends into the photoresist storage tank (14), and the input end of the liquid outlet pipe (2) extends into the photoresist storage tank (14).

7. The photoresist liquid supply structure for a uniform coating and developing machine with a filtering function according to claim 5, wherein: A control panel (18) is arranged on the front surface of the liquid supply cabinet (1), and the gas pump (15) is electrically connected with the control panel (18).

8. The photoresist liquid supply structure for a uniform coating and developing machine with a filtering function according to claim 5, wherein: A cabinet door (19) is arranged on the front surface of the liquid supply cabinet (1), the cabinet door (19) is matched with the first cavity, and a punched heat dissipation plate (20) is arranged on the back surface of the liquid supply cabinet (1), and the punched heat dissipation plate (20) is matched with the second cavity.

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