Semiconductor cleaning equipment with self-cleaning function
By designing a semiconductor cleaning device that combines a motor-driven turntable and bevel gear transmission system with brush strips and rotating nozzles, the problem of cleaning corners, crevices, and strongly adhered stains during the self-cleaning process is solved, achieving all-round and efficient cleaning.
Patent Information
- Application Number
- CN202422827488.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-20
- Publication Date
- 2025-11-07
- Estimated Expiration
- 2034-11-20
AI Technical Summary
Existing semiconductor cleaning equipment has difficulty effectively cleaning corners, crevices, and complex-shaped areas during the self-cleaning process, and it is also difficult to remove stains with strong adhesion.
A semiconductor cleaning device with self-cleaning function was designed. It adopts a motor-driven turntable and bevel gear transmission system, combined with brush strips and rotating nozzles to achieve all-round cleaning of semiconductors and remove impurities by centrifugal force and spraying cleaning fluid.
It achieves comprehensive cleaning of semiconductors, ensuring cleaning efficiency, effectively removing stains from corners, crevices, and those with strong adhesion, and providing a clean cleaning environment.
Smart Images
Figure CN223518097U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to semiconductor cleaning technical field especially, relate to a kind of semiconductor cleaning equipment with self-cleaning function. BACKGROUND
[0002] Semiconductor refers to the conductivity performance between conductor and insulator at normal temperature, and the conductivity performance of semiconductor is controlled by doping and temperature change, and common semiconductor materials include silicon, germanium and gallium arsenide, wherein silicon is the most commonly used material, and semiconductor is widely used in multiple fields, including integrated circuit, consumer electronics, communication system, photovoltaic power generation, illumination and high-power power conversion, and semiconductor plays a core role in electronic products, computer, mobile phone and digital recorder cannot be separated from semiconductor, and if particulate impurities adhere to the surface of semiconductor, local short circuit can be caused.
[0003] These impurities can be effectively removed by cleaning, to ensure that the electrical performance of semiconductor meets design requirements, so semiconductor cleaning equipment is an indispensable key equipment in semiconductor manufacturing process, for removing various contaminants on the surface of semiconductor wafer, in the photoetching process, photoresist can appear residue, and in the etching process, reaction product can be left, and if these particulate impurities are left on the surface of semiconductor wafer, short circuit or open circuit can be caused when the particle size is greater than the characteristic size of semiconductor device, and semiconductor cleaning equipment can remove these particles by physical flushing, to ensure the line connectivity and normal function of semiconductor device.
[0004] Cleaning equipment and self-cleaning function are closely related and complementary to each other, and they aim to keep the equipment clean and efficient, traditional cleaning equipment focuses on cleaning specific objects, and self-cleaning function builds cleaning mechanism in the equipment itself to solve the problem of pollution in the working process of the equipment itself, but the existing equipment can cause some corners, gaps and complex-shaped parts to be difficult to clean in the self-cleaning process, and it is difficult to provide sufficient cleaning capacity for some stains with strong adhesion. UTILITY MODEL CONTENT
[0005] In order to make up for the above shortcomings, the utility model provides a kind of semiconductor cleaning equipment with self-cleaning function, to improve the problem that some corners, gaps and complex-shaped parts are difficult to be cleaned in the self-cleaning process in prior art, and it is difficult to provide sufficient cleaning capacity for some stains with strong adhesion.
[0006] In order to achieve the above object, the utility model discloses the following technical scheme: a semiconductor cleaning equipment with self -cleaning function, including square shell, the top rear side of square shell is fixedly connected with support plate, the top left side of support plate is fixedly connected with motor no.
[0007] As a further description of the above technical scheme:
[0008] The cleaning mechanism comprises a support frame, the front side of the support frame is fixedly connected with the rear bottom of the square shell, the top of the support frame is fixedly connected with a motor one, the output end of the motor one is rotatably connected with a bevel gear one, the top outer wall of the bevel gear one is meshedly connected with a bevel gear two, the top of the bevel gear two is fixedly connected with a tray, the top of the tray is provided with a semiconductor article, the bottom of the tray is rotatably connected with a support sleeve, the bottom end of the support sleeve is fixedly connected with the inner bottom of the square shell, and the inner top of the square shell is rotatably connected with a rotary spray head.
[0009] As a further description of the above technical scheme:
[0010] The left side of the square shell is fixedly connected with a display screen, and the left side of the square shell is fixedly connected with a controller.
[0011] As a further description of the above technical scheme:
[0012] The bottom of the square shell is fixedly connected with an antiskid pad, and the inside of the square shell is provided with a groove.
[0013] As a further description of the above technical scheme:
[0014] The right side of the groove is communicated with a liquid outlet pipe, and the top right side of the liquid outlet pipe is provided with a valve.
[0015] As a further description of the above technical scheme:
[0016] The left end of the front side of the square shell is rotatably connected with a rotating column, and the right side of the rotating column is fixedly connected with a baffle.
[0017] As a further description of the above technical scheme:
[0018] The front side right part of the baffle is rotationally connected with a handle, and the outer wall of the handle is fixedly connected with an anti-skid sleeve.
[0019] As a further description of the above technical solution:
[0020] The top of the square shell is fixedly connected with a display lamp, and the bottom of the tray is provided with a hole.
[0021] The utility model has the advantages of the following:
[0022] 1. In the utility model, the rotation of the disc is driven by the motor two, the left end of the short rod is rotationally connected with the connecting frame, so that the swing of the short rod moves the T-shaped frame connected with the connecting frame left and right under the fixation of the supporting rod, the movement of the T-shaped frame drives the bottom side of the flushing nozzle and the brush strip to flush the cleaning device, and the use of the flushing nozzle and the brush strip can remove the stains after cleaning, clean all parts, and ensure the cleaning efficiency, so as to provide a clean cleaning environment for subsequent semiconductors.
[0023] 2. In the utility model, the rotation of the disc is driven by the motor two, the rotation of the bevel gear two drives the rotation of the disc, and the rotation of the disc also drives the rotation of the internal semiconductor object, so that the cleaning liquid is sprayed on the surface of the semiconductor through the nozzle, and the bottom is rotated under the action of the centrifugal force, so that the impurities can be effectively removed, and the residual particles are reduced. BRIEF DESCRIPTION OF DRAWINGS
[0024] Figure 1 A square shell front side perspective view of the semiconductor cleaning equipment with the self-cleaning function is provided for the utility model;
[0025] Figure 2 A controller side view of the semiconductor cleaning equipment with the self-cleaning function is provided for the utility model;
[0026] Figure 3 A short rod top view of the semiconductor cleaning equipment with the self-cleaning function is provided for the utility model;
[0027] Figure 4 A flushing nozzle display view of the semiconductor cleaning equipment with the self-cleaning function is provided for the utility model;
[0028] Figure 5 A supporting sleeve split view of the semiconductor cleaning equipment with the self-cleaning function is provided for the utility model.
[0029] LEGEND:
[0030] 1, square shell; 2, cleaning mechanism; 201, support frame; 202, motor one; 203, rotating nozzle; 204, support sleeve; 205, tray; 206, bevel gear one; 207, bevel gear two; 208, semiconductor device; 3, support rod; 4, T-shaped frame; 5, short rod; 6, turntable; 7, rotating column; 8, baffle; 9, non-slip pad; 10, handle; 11, non-slip sleeve; 12, U-shaped frame; 13, display lamp; 14, display screen; 15, controller; 16, support plate; 17, motor two; 18, connecting frame; 19, flushing nozzle; 20, brush bar; 21, groove; 22, liquid outlet pipe; 23, valve; 24, hole. DETAILED DESCRIPTION
[0031] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the utility model.
[0032] Please refer to the drawings of the embodiments of the utility model in the drawings Figure 1 , the drawings Figure 3 and the drawings Figure 4 , the utility model provides an embodiment: a semiconductor cleaning equipment with self-cleaning function, including square shell 1, the top rear side of square shell 1 is fixedly connected with support plate 16, the top end left side of support plate 16 is fixedly connected with motor two 17, ensure the support effect of motor two 17, the output end of motor two 17 is rotatably connected with turntable 6, the front end left side of turntable 6 is rotatably connected with short rod 5, so that the rotation of turntable 6 can drive the swing of short rod 5, the right side of short rod 5 is rotatably connected with connecting frame 18, the right side of connecting frame 18 is fixedly connected with T-shaped frame 4, plays the role of connection, the bottom of T-shaped frame 4 is fixedly connected with brush bar 20, to clean particulate matter, the bottom of T-shaped frame 4 both sides is fixedly connected with flushing nozzle 19, to flush the impurities in the corner, the front and rear ends of T-shaped frame 4 are slidably connected with support rod 3, the left and right ends of support rod 3 are fixedly connected with U-shaped frame 12, the bottom of U-shaped frame 12 is fixedly connected with the top of square shell 1, plays the role of fixed support, the inner side of square shell 1 is provided with cleaning mechanism 2, cleaning mechanism 2 is used for the cleaning of semiconductor, ensure that the semiconductor reaches the best cleaning effect in the cleaning process.
[0033] Please refer to the drawings of the embodiments of the utility model in the drawings Figure 2 , the drawings Figure 4 and the drawings Figure 5The cleaning mechanism 2 comprises a support frame 201, the front side of the support frame 201 is fixedly connected with the bottom of the rear side of the square shell 1, the stability of the structure is ensured, the top of the support frame 201 is fixedly connected with a motor one 202, the output end of the motor one 202 is rotationally connected with a bevel gear one 206, the top outer wall of the bevel gear one 206 is meshedly connected with a bevel gear two 207, an effective transmission mechanism is formed, the top of the bevel gear two 207 is fixedly connected with a tray 205, the rotation of the bevel gear two 207 can drive the rotation of the tray 205 at the same time, the top of the tray 205 is provided with semiconductor articles 208, the upper surface of the tray 205 is used for placing the semiconductor articles 208, the bottom of the tray 205 is rotationally connected with a support sleeve 204, the bottom end of the support sleeve 204 is fixedly connected with the inside bottom of the square shell 1, the support of the gear is provided at the same time, the protection of the gear can be realized, the inside top of the square shell 1 is rotationally connected with a rotary nozzle 203, so that the whole device has the function of rotating and spraying.
[0034] Please refer to the accompanying drawings Figure 1 , the accompanying drawings Figure 3 and the accompanying drawings Figure 4 , the bottom of the square shell 1 is fixedly connected with an anti-skid pad 9, the anti-skid pad 9 can not only effectively prevent the square shell 1 from sliding during use, but also can absorb vibration to a certain extent, thereby improving the stability of the whole device, the inside of the square shell 1 is provided with a groove 21, which can accommodate and guide the flow of liquid, the right side of the groove 21 is communicated with a liquid outlet pipe 22, so that the liquid can flow smoothly from the groove 21 to the liquid outlet pipe 22, the top right side of the liquid outlet pipe 22 is provided with a valve 23, which can effectively control the flow rate and the amount of liquid flowing out, thereby ensuring the accuracy and safety during use, the top of the square shell 1 is fixedly connected with a display lamp 13, which indicates the working state of the equipment by different colors, the bottom of the tray 205 is provided with a hole 24, which prevents liquid accumulation and enables liquid to be discharged from the tray 205, thereby avoiding the inconvenience and potential pollution problems caused by liquid retention.
[0035] Please refer to the accompanying drawings Figure 1 , the accompanying drawings Figure 2 and the accompanying drawings Figure 3 , the left side of the square shell 1 is fixedly connected with a display screen 14, which can clearly view information and operation interface, the left side of the square shell 1 is fixedly connected with a controller 15, so that various operations and settings can be conveniently performed, the front left end of the square shell 1 is rotationally connected with a rotating column 7, the right side of the rotating column 7 is fixedly connected with a baffle 8, which can effectively prevent dust and other sundries from entering the inside of the equipment, and also can play a certain protection role, the front right side of the baffle 8 is rotationally connected with a handle 10, which facilitates operation, the outer wall of the handle 10 is fixedly connected with an anti-skid sleeve 11, which can hold the handle 10 more stably and avoid slipping, the models of the motor one 202 and the motor two 17 are MDS-D-V2-16080.
[0036] Working principle: the rotation of the motor 17 drives the rotation of the turntable 6, which will make the short rod 5 start to swing, and because the left end of the short rod 5 is rotationally connected to the connecting frame 18, the swinging of the short rod 5 will drive the T-shaped frame 4 connected with the connecting frame 18 to move left and right under the fixation of the supporting rod 3, the movement of the T-shaped frame 4 drives the bottom side of the flushing nozzle 19 and the brush strip 20 to flush the cleaning device, the flushing nozzle 19 flushes the corners, and the brush strip 20 cleans the impurities and particles that are not easy to remove, so that the combination of the two can remove the stains on the cleaned structure, remove the residues in the corners and gaps, and clean all parts to ensure cleaning efficiency and provide a clean cleaning environment for subsequent semiconductors.
[0037] The rotation of the motor 17 drives the rotation of the turntable 6, which will make the short rod 5 start to swing, and because the left end of the short rod 5 is rotationally connected to the connecting frame 18, the swinging of the short rod 5 will drive the T-shaped frame 4 connected with the connecting frame 18 to move left and right under the fixation of the supporting rod 3, the movement of the T-shaped frame 4 drives the bottom side of the flushing nozzle 19 and the brush strip 20 to flush the cleaning device, the flushing nozzle 19 flushes the corners, and the brush strip 20 cleans the impurities and particles that are not easy to remove, so that the combination of the two can remove the stains on the cleaned structure, remove the residues in the corners and gaps, and clean all parts to ensure cleaning efficiency and provide a clean cleaning environment for subsequent semiconductors.
[0038] Finally, it should be noted that the above description is only a preferred embodiment of the present application and is not intended to limit the present application. Although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent replacements to some technical features, and any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the present application shall be included in the protection scope of the present application.
Claims
1. A semiconductor cleaning apparatus having a self-cleaning function, comprising a square housing (1), characterized in that: The top rear side of the square shell (1) is fixedly connected with a support plate (16), the top left side of the support plate (16) is fixedly connected with a motor two (17), the output end of the motor two (17) is rotatably connected with a rotating disc (6), the front left side of the rotating disc (6) is rotatably connected with a short rod (5), the right side of the short rod (5) is rotatably connected with a connecting frame (18), the right side of the connecting frame (18) is fixedly connected with a T-shaped frame (4), the bottom of the T-shaped frame (4) is fixedly connected with a brush bar (20), the bottom of the T-shaped frame (4) is fixedly connected with a flushing nozzle (19) on both sides, the front and rear ends of the T-shaped frame (4) are slidably connected with a support rod (3), the left and right ends of the support rod (3) are fixedly connected with a U-shaped frame (12), the bottom of the U-shaped frame (12) is fixedly connected with the top of the square shell (1), the inner side of the square shell (1) is provided with a cleaning mechanism (2), and the cleaning mechanism (2) is used for cleaning the semiconductor.
2. The semiconductor cleaning apparatus having a self-cleaning function according to claim 1, wherein: The cleaning mechanism (2) comprises a support frame (201), the front side of the support frame (201) is fixedly connected with the rear bottom of the square shell (1), the top of the support frame (201) is fixedly connected with a motor one (202), the output end of the motor one (202) is rotatably connected with a bevel gear one (206), the top outer wall of the bevel gear one (206) is meshedly connected with a bevel gear two (207), the top of the bevel gear two (207) is fixedly connected with a tray (205), the top of the tray (205) is provided with a semiconductor object (208), the bottom of the tray (205) is rotatably connected with a support sleeve (204), the bottom end of the support sleeve (204) is fixedly connected with the inner bottom of the square shell (1), and the inner top of the square shell (1) is rotatably connected with a rotating nozzle (203).
3. The semiconductor cleaning apparatus having a self-cleaning function according to claim 1, wherein: The left side of the square shell (1) is fixedly connected with a display screen (14), and the left side of the square shell (1) is fixedly connected with a controller (15).
4. The semiconductor cleaning apparatus having a self-cleaning function according to claim 1, wherein: The bottom of the square shell (1) is fixedly connected with an anti-skid pad (9), and the inside of the square shell (1) is provided with a groove (21).
5. The semiconductor cleaning apparatus having a self-cleaning function according to claim 4, wherein: The right side of the groove (21) is communicated with a liquid outlet pipe (22), and the top right side of the liquid outlet pipe (22) is provided with a valve (23).
6. The semiconductor cleaning apparatus having a self-cleaning function according to claim 1, wherein: The front left end of the square shell (1) is rotatably connected with a rotating column (7), and the right side of the rotating column (7) is fixedly connected with a baffle (8).
7. The semiconductor cleaning apparatus having a self-cleaning function according to claim 6, wherein: The front right part of the baffle (8) is rotatably connected with a handle (10), and the outer wall of the handle (10) is fixedly connected with an anti-skid sleeve (11).
8. The semiconductor cleaning apparatus having a self-cleaning function according to claim 2, wherein: The top of the square shell (1) is fixedly connected with a display lamp (13), and the bottom of the tray (205) is provided with a hole (24).