Magnetic attraction platform capable of being turned over for machining

Abstract

The utility model relates to the technical field of machining, and discloses a magnetic attraction platform capable of being turned over for machining, which comprises a supporting device, a magnetic attraction assembly, a turning mechanism and a clamping device, the supporting device comprises a first base and a second base; the magnetic suction assembly comprises a plurality of first electromagnetic chucks and a plurality of second electromagnetic chucks, and the first electromagnetic chucks are arranged above the first base; the turnover mechanism comprises a rotating shaft and a turnover frame, the rotating shaft is fixedly connected with the turnover frame, and the second electromagnetic chuck is arranged on the turnover frame; the rotating shaft is mounted on the second base; the clamping device comprises a first clamp, and the first clamp is installed on the second base. The device further comprises a driving device, and the driving device is connected with the rotating shaft. The utility model aims to improve the positioning accuracy, the processing quality and the working efficiency of part polishing, and reduce the safety risk and the rejection rate at the same time.

Description

TECHNICAL FIELD

[0001] The utility model relates to mechanical processing technical field, concretely relates to a magnetic platform of processing of overturning. BACKGROUND

[0002] Shipbuilding industry, namely shipbuilding, is a modern comprehensive industry and also a strategic industry of military and civilian combination. As an important industry concerning national economic development and national security, shipbuilding industry provides necessary technical equipment for ocean development, shipping transportation, energy transportation and national defense construction and is an important component of Chinese manufacturing industry.

[0003] Modern ship parts processing more and more uses automatic and mechanical polishing mode, and in ship part polishing, polishing platform is usually used together for fixing parts to be processed, but the current parts are prone to displacement when placed on the polishing platform for processing, which leads to inaccurate position and affects polishing size precision and processing efficiency.

[0004] Therefore, it is urgent to improve the existing polishing platform. TECHNICAL CONTENT

[0005] In view of the deficiencies of the prior art, the utility model provides a magnetic platform of processing of overturning, which aims to improve the accuracy of part polishing position, processing quality and work efficiency, and reduce safety risk and scrap rate. The implementation mode of the technical scheme is as follows:

[0006] A magnetic platform of processing of overturning comprises a supporting device, a magnetic assembly, a turnover mechanism and a clamping device, the supporting device comprises a first base and a second base, the magnetic assembly comprises a plurality of first electromagnetic suction cups and a plurality of second electromagnetic suction cups, the first electromagnetic suction cups are arranged above the first base, the turnover mechanism comprises a rotating shaft and a turnover frame, the rotating shaft and the turnover frame are fixedly connected, the second electromagnetic suction cups are arranged on the turnover frame, the rotating shaft is installed on the second base, the clamping device comprises a first clamp, and the first clamp is installed on the second base, and the utility model further comprises a driving device, and the driving device is connected with the rotating shaft.

[0007] Preferably, the clamping device further comprises a second clamp, and the supporting device further comprises a third base, and the second clamp is installed on the third base.

[0008] Preferably, the utility model further comprises a buffer assembly, the buffer assembly comprises a first buffer and a second buffer, the first buffer is installed on the second base, and the second buffer is installed on the third base.

[0009] Preferably, the utility model further comprises a discharge frame, the supporting device further comprises a plurality of fourth bases, the discharge frame is installed on the fourth base, and the discharge frame is provided with a discharge port.

[0010] Preferably, the magnetic suction assembly further comprises a first platform and a second platform, the first electromagnetic suction disc is installed on the first platform, the second electromagnetic suction disc is installed on the second platform, and the second platform is installed on the turnover frame.

[0011] Preferably, a limiting mechanism is further included, the limiting mechanism comprises a first travel switch and a second travel switch, the first travel switch is installed on the second platform, and the second travel switch is installed on the second base.

[0012] Preferably, the magnetic suction assembly further comprises a pushing device, the pushing device comprises a telescopic cylinder, a support plate and a plurality of support columns, the support plate is installed on the telescopic cylinder, and the support columns are installed between the first platform and the support plate.

[0013] Preferably, the third base is provided with a cross beam, a plurality of buffer blocks are arranged on the cross beam, and the buffer blocks are uniformly arranged on the cross beam.

[0014] Preferably, the limiting mechanism further comprises a third travel switch, and the third travel switch is installed on the cross beam.

[0015] Compared with the prior art, the present application has the following beneficial effects:

[0016] (1) When the magnetic suction platform of the present application is used, the part is attracted to the first electromagnetic suction disc, and the polishing process is started. After the polishing tool polishes the front surface area of the part, the second electromagnetic suction disc on the turnover mechanism is driven by the driving device to the upper side of the first electromagnetic suction disc, and the pushing device drives the first electromagnetic suction disc to move upward; until the first travel switch is triggered, the pushing device stops running, and after the second electromagnetic suction disc attracts the part, it returns to the upper side of the third base; at this time, the polishing tool polishes the back surface of the part, and after the back surface is polished, it waits for unloading; the waste generated in the processing process flows out through the discharge frame. The whole process is controlled by an automatic control system, which can reduce the time of manually turning over the part, improve the work efficiency, and improve the production safety.

[0017] (2) When the driving device drives the turnover mechanism to the upper side of the first electromagnetic suction disc, the first clamp is used to fix the turnover frame, so as to ensure that the position of the part attracted to the second electromagnetic suction disc is kept accurate; after the turnover frame returns to the initial position, the second clamp fixes the turnover frame on the cross beam, so as to avoid the position deviation of the turnover frame in the polishing process, and affect the work efficiency.

[0018] (3) When the driving device drives the turnover mechanism to reach above the first electromagnetic chuck, the turnover mechanism will generate a certain impact; in the process of turning over, the first buffer will abut with the turnover frame; the second buffer will abut with the turnover frame when returning to the initial position after the second electromagnetic chuck adsorbs the part, which can provide support and relieve impact; the impact generated when the turnover mechanism runs is reduced through the first buffer and the second buffer, and the service life of the equipment is improved. BRIEF DESCRIPTION OF DRAWINGS

[0019] The drawings described herein are used to provide further understanding of the present application, and form a part of the present application, the illustrative embodiments of the present application and the description thereof are used to explain the present application, and do not constitute improper limitation on the present application. In the drawings:

[0020] Figure 1 It is a schematic view of the overall structure of the magnetic attraction platform of the utility model;

[0021] Figure 2 It is a partial structure view of the magnetic attraction platform of the utility model;

[0022] Figure 3 It is a partial structure view of the magnetic attraction platform of the utility model;

[0023] Figure 4 It is a schematic view of the structure of another view of Figure 3

[0024] Figure 5 It is a schematic view of the structure of the third base of the utility model;

[0025] Figure 6 It is a schematic view of the structure of the second base of the utility model;

[0026] Figure 7 It is a schematic view of the structure of the second base of the utility model;

[0027] Figure 8 It is a schematic view of the structure of another view of Figure 2

[0028] Figure 9 It is a schematic view of the structure of the discharge frame and the supporting device of the utility model.

[0029] Explanation of reference signs:

[0030] 1, supporting device; 11, first base; 12, second base; 13, third base; 131, cross beam; 1311, buffer block; 14, fourth base;

[0031] ​​2, magnetic assembly; 21, first electromagnetic chuck; 22, second electromagnetic chuck; 23, first platform; 24, second platform; 25, pushing device; 251, telescopic cylinder; 252, support plate; 253, support column;

[0032] 3, turnover mechanism; 31, rotating shaft; 32, turnover frame;

[0033] 4, clamping device; 41, first clamp; 42, second clamp;

[0034] 5, buffer assembly; 51, first buffer; 52, second buffer;

[0035] 6, driving device;

[0036] 7, discharge frame; 71, discharge port;

[0037] 8, limiting mechanism; 81, first travel switch; 82, second travel switch; 83, third travel switch; 84, touch block. DETAILED DESCRIPTION

[0038] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present application.

[0039] In the description of the present application, it should be noted that the terms "upper", "lower", "inner", "outer", "top / bottom end" and the like indicate the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In addition, the terms "first" and "second" are for descriptive purposes only and cannot be understood as indicating or implying relative importance.

[0040] In the description of the present application, it should be noted that unless otherwise explicitly specified and limited, the terms "mounting", "provided with", "sleeved / connected", "connected" and the like should be understood broadly, for example, "connected" can be fixedly connected, or can be detachably connected, or integrally connected; can be mechanically connected, or can be electrically connected; can be directly connected, or can be indirectly connected through an intermediate medium; can be internal communication of two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0041] Embodiments of this application provide a flip-up magnetic suction platform, such as... Figures 1-4 As shown, the magnetic platform includes: a support device 1, a magnetic suction assembly 2, a flipping mechanism 3, and a clamping device 4. The support device 1 includes a first base 11 and a second base 12. The magnetic suction assembly 2 includes a plurality of first electromagnetic chucks 21 and a plurality of second electromagnetic chucks 22, with the first electromagnetic chucks 21 disposed above the first base 11. The flipping mechanism 3 includes a rotating shaft 31 and a flipping frame 32, which are fixedly connected. The second electromagnetic chucks 22 are disposed on the flipping frame 32. The rotating shaft 31 is mounted on the second base 12. The clamping device 4 includes a first clamp 41, which is mounted on the second base 12. It also includes a driving device 6, which is connected to the rotating shaft 31.

[0042] To better understand some embodiments of this application, the reversible magnetic suction platform protected in this application is used in conjunction with a grinding tool. One application scenario is as follows: a part is placed on the magnetic suction platform, and the part is fixed by being attracted by the first electromagnetic chuck 21. The grinding tool performs front-side grinding on the part. After the front-side grinding is completed, the second electromagnetic chuck 22 installed in the flipping mechanism 3 flips over to be above the part. After the second electromagnetic chuck 22 picks up the part, it returns to its initial position. Figure 1 The position of the flipping mechanism 3 shown is the initial position; at this time, the reverse side of the part is on top, and the grinding tool grinds the reverse side of the part. After grinding is completed, wait for unloading.

[0043] The above describes the application scenarios of the flip-type magnetic suction platform of this application to facilitate understanding of the purpose of this application. It can also be used in other scenarios, which will not be elaborated here.

[0044] In some implementations, such as Figure 2 As shown, the magnetic suction assembly 2 also includes a first platform 23 and a pushing device 25. The first platform 23 is flat, and several first electromagnetic chucks 21 are installed on the first platform 23. The pushing device 25 includes a telescopic cylinder 251, a support plate 252, and several support columns 253. The support plate 252 is installed on the telescopic cylinder 251, and the support columns 253 are installed between the first platform 23 and the support plate 252. When the part attracted by the first electromagnetic chuck 21 is polished by a polishing tool, the second electromagnetic chuck 22 installed in the flipping mechanism 3 flips to the top of the part. At this time, the telescopic cylinder 251 drives the support columns 253 on the support plate 252 to push the first electromagnetic chuck 21 upward. After reaching the designated position, the second electromagnetic chuck 22 attracts the part, and then the second electromagnetic chuck 22 returns to the initial position.

[0045] In some implementations, such as Figure 3As shown, the second base 12 is provided with two, the driving device 6 is installed on one of the second base 12, the driving device 6 is used to drive the turnover mechanism 3 after the part processing is completed on the first electromagnetic chuck 21, the turnover mechanism 3 drives the second electromagnetic chuck 22 to turn to the upper side of the part, and the second electromagnetic chuck 22 returns to the initial position after the part is sucked.

[0046] Further, the magnetic suction assembly 2 further comprises a second platform 24, the second electromagnetic chuck 22 is installed on the second platform 24, and the second platform 24 is installed on the turnover frame 32; the second platform 24 is located away from one end of the rotating shaft 31.

[0047] In some embodiments, as shown in Figure 4 and Figure 5 As shown, the support device 1 further comprises a third base 13, the third base 13 is provided with a cross beam 131, the turnover frame 32 abuts against the cross beam 131, and the cross beam 131 is used to support the second platform 24 and the plurality of second electromagnetic chucks 22 to facilitate the machining of the part sucked by the second electromagnetic chuck 22; specifically, a plurality of buffer blocks 1311 are arranged on the cross beam 131, the number of the buffer blocks 1311 is preferably 3, and the buffer blocks 1311 are uniformly arranged on the cross beam 131, which can reduce the impact between the turnover frame 32 and the third base 13.

[0048] In some embodiments, as shown in Figures 5-8 The clamping device 4 comprises a first clamp 41 and a second clamp 42, the first clamp 41 is installed on the second base 12, and the first clamp 41 is provided in pairs; the first clamp 41 is usually in an open state; when the driving device 6 drives the second electromagnetic chuck 22 installed on the turnover mechanism 3 to turn to the upper side of the first electromagnetic chuck 21, the second electromagnetic chuck 22 sucks the part, in order to prevent the part from being displaced during the process of being sucked, the first clamp 41 is closed to clamp the turnover frame 32 before the second electromagnetic chuck 22 sucks the part.

[0049] Further, the second clamp 42 is installed on the third base 13, and the second clamp 42 is usually in an open state; after the turnover frame 32 drives the second electromagnetic chuck 22 to return to the initial position, the second clamp 42 is closed to clamp the turnover frame 32, so that the turnover frame 32 is fixed above the cross beam 131, so that the turnover frame 32 is more stable, and the reverse side of the part sucked by the second electromagnetic chuck 22 can be prevented from being vibrated and displaced during the polishing process, and the setting of the second clamp 42 can improve the machining quality and efficiency. The first clamp 41 and the second clamp 42 are directly obtained from the prior art, for example, the closing and opening of the first clamp 41 and the second clamp 42 can be controlled by an electromagnetic valve, and the structure thereof will not be specifically described in the present application, but it does not mean that it cannot be implemented.

[0050] In some embodiments, as shown in Figures 5-8 Further, the buffer assembly 5 includes a first buffer 51 and a second buffer 52, the first buffer 51 is installed on the second base 12, and the first buffer 51 is a spring buffer; when the driving device 6 drives the turnover mechanism 3 to the upper side of the first electromagnetic chuck 21, the turnover mechanism 3 will produce slight vibration, and the first buffer 51 will abut against the turnover frame 32 during the turnover process, so that the impact generated by the turnover frame 32 during the turnover process can be prevented by the first buffer 51, thereby improving the service life of the equipment.

[0051] Further, the second buffer 52 is installed on the third base 13, and the second buffer 52 is provided with two, which are respectively arranged at both ends of the cross beam 131 and correspond to both sides of the turnover frame 32; the second buffer 52 is a pneumatic buffer; when the second electromagnetic chuck 22 installed on the turnover frame 32 sucks the part and returns to the initial position, the second buffer 52 abuts against the turnover frame 32, and the second buffer 52 is also used to reduce the impact generated by the turnover mechanism 3 during the turnover process.

[0052] In some embodiments, as shown in Figure 4 , Figure 6 and Figure 8 Further, the limiting mechanism 8 includes a first travel switch 81, a second travel switch 82, a third travel switch 83 and a touch block 84, the first travel switch 81 is installed on the second platform 24, and the touch block 84 is installed on the first platform 23; when the turnover mechanism 3 drives the second electromagnetic chuck 22 to turn to the upper side of the part adsorbed on the first electromagnetic chuck 21, the telescopic cylinder 251 drives the support column 253 on the support plate 252 to push the first electromagnetic chuck 21 to move upward, and when moving upward to a certain position, the touch block 84 abuts against the first travel switch 81; at this time, the first travel switch 81 is triggered, the telescopic cylinder 251 stops moving, the second electromagnetic chuck 22 adsorbs the part, and then the turnover mechanism 3 returns to the initial position. In this way, due to the limiting effect of the first travel switch 81, the part is prevented from colliding with the second electromagnetic chuck 22 during the upward movement, thereby preventing the part from being damaged.

[0053] Further, the second travel switch 82 is installed on the second base 12; when the turnover mechanism 3 drives the second electromagnetic chuck 22 to turn to the upper side of the part adsorbed on the first electromagnetic chuck 21, the turnover frame 32 will touch the second travel switch 82, thereby stopping the driving device 6 from running; the second travel switch 82 is used to avoid overloading of the turnover mechanism 3.

[0054] Further, as shown in Figure 4As shown, the third travel switch 83 is installed on the crossbeam 131, when the driving device 6 drives the turnover mechanism 3 to return to the initial position, the turnover frame 32 will abut against the third travel switch 83, the third travel switch 83 is triggered, and the driving device 6 stops working.

[0055] In some embodiments, as shown in FIG. 1, the support device 1 further comprises a discharge frame 7, and the support device 1 further comprises a plurality of fourth bases 14, the discharge frame 7 is installed on the fourth bases 14, and the fourth bases 14 are uniformly distributed below the discharge frame 7 to provide stable support for the discharge frame 7; the discharge frame 7 is a square funnel structure, when the parts adsorbed on the first electromagnetic chuck 21 and the second electromagnetic chuck 22 are polished, waste will be generated, and the discharge frame 7 helps the waste to flow smoothly along the inclined surface, reducing the accumulation and blockage of the material during the discharging process; the discharge frame 7 is provided with a discharge port 71 for the waste generated during the platform processing to flow out. Figure 1 Figure 9 As shown in FIG. 1, the support device 1 further comprises a discharge frame 7, and the support device 1 further comprises a plurality of fourth bases 14, the discharge frame 7 is installed on the fourth bases 14, and the fourth bases 14 are uniformly distributed below the discharge frame 7 to provide stable support for the discharge frame 7; the discharge frame 7 is a square funnel structure, when the parts adsorbed on the first electromagnetic chuck 21 and the second electromagnetic chuck 22 are polished, waste will be generated, and the discharge frame 7 helps the waste to flow smoothly along the inclined surface, reducing the accumulation and blockage of the material during the discharging process; the discharge frame 7 is provided with a discharge port 71 for the waste generated during the platform processing to flow out.

[0056] The working principle of the magnetic platform of the embodiment is as follows:

[0057] The magnetic platform of the embodiment works in combination with the polishing tool, when the part is adsorbed on the first electromagnetic chuck 21, the polishing process starts, when the polishing tool polishes the front surface area of the part, the second electromagnetic chuck 22 on the turnover mechanism 3 driven by the driving device 6 comes to the upper side of the first electromagnetic chuck 21, and the pushing device 25 drives the first electromagnetic chuck 21 to move upward; until the first travel switch is triggered, the pushing device 25 stops running, and after the second electromagnetic chuck 22 adsorbs the part, it returns to the upper side of the third base 13, at this time, the polishing tool polishes the back surface of the part, and after the back surface is polished, it waits for discharging; the waste generated during the processing process flows out through the discharge frame 7.

[0058] The magnetic platform of the embodiment needs the clamping device 4 and the buffer assembly 5 to work together to improve the accuracy of the polishing position of the part and the processing quality.

[0059] When the driving device 6 drives the turnover mechanism 3 to the upper side of the first electromagnetic chuck 21, the first clamp 41 is used to fix the turnover frame 32, ensuring that the position of the part adsorbed on the second electromagnetic chuck 22 remains accurate; after the turnover frame 32 returns to the initial position, the second clamp 42 fixes the turnover frame 32 on the crossbeam 131, avoiding position deviation of the turnover frame 32 during the polishing process, which affects the work efficiency.

[0060] ​When the driving device 6 drives the turnover mechanism 3 to reach above the first electromagnetic chuck 21, the turnover mechanism 3 will produce a certain impact; in the process of turning over, the first buffer 51 will abut against the turnover frame 32; the second buffer 52 abuts against the turnover frame 32 when returning to the initial position after the second electromagnetic chuck adsorbs the part, can provide support and relieve impact; through the first buffer 51 and the second buffer 52, the impact generated when the turnover mechanism 3 runs is reduced, and the service life of the equipment is improved.

[0061] The above is only the embodiment of the present application and is not used to limit the present application. The present application can be variously changed and altered for those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the scope of claims of the present application.

Claims

1. A reversible processing magnetic platform, characterized in that, Include: Support device (1), the support device (1) includes first base (11) and second base (12); Magnetic assembly (2), the magnetic assembly (2) includes a plurality of first electromagnetic chuck (21) and a plurality of second electromagnetic chuck (22), the first electromagnetic chuck (21) is arranged above the first base (11); Turnover mechanism (3), the turnover mechanism (3) includes rotating shaft (31) and turnover frame (32), the rotating shaft (31) and turnover frame (32) are fixedly connected, the second electromagnetic chuck (22) is arranged on the turnover frame (32);The rotating shaft (31) is installed on the second base (12); Clamping device (4), the clamping device (4) includes first clamp (41), and the first clamp (41) is installed on the second base (12); Driving device (6), the driving device (6) is connected with rotating shaft (31).

2. The reversible processing magnetic platform of claim 1, wherein, The clamping device (4) further includes a second clamp (42), and the support device (1) further includes a third base (13), and the second clamp (42) is installed on the third base (13).

3. The reversible processing magnetic platform of claim 2, wherein, Further include buffer assembly (5), the buffer assembly (5) includes first buffer (51) and second buffer (52), the first buffer (51) is installed on the second base (12), and the second buffer (52) is installed on the third base (13).

4. The reversible processing magnetic platform of claim 1, wherein, Further include discharge frame (7), and the support device (1) further includes a plurality of fourth base (14), and the discharge frame (7) is installed on the fourth base (14), and the discharge frame (7) is provided with discharge port (71).

5. The reversible processing magnetic platform of claim 2, wherein, The magnetic assembly (2) further includes a first platform (23) and a second platform (24), the first electromagnetic chuck (21) is installed on the first platform (23), the second electromagnetic chuck (22) is installed on the second platform (24), and the second platform (24) is installed on the turnover frame (32).

6. The reversible processing magnetic platform of claim 5, wherein, Further include limiting mechanism (8), the limiting mechanism (8) includes first travel switch (81) and second travel switch (82), the first travel switch (81) is installed on the second platform (24), and the second travel switch (82) is installed on the second base (12).

7. The reversible processing magnetic platform of claim 6, wherein, The magnetic assembly (2) further includes a pushing device (25), the pushing device (25) includes a telescopic air cylinder (251), a support plate (252) and a plurality of support columns (253), the support plate (252) is installed on the telescopic air cylinder (251), and the support column (253) is installed between the first platform (23) and the support plate (252).

8. The reversible processing magnetic platform of claim 6, wherein, The third base (13) is provided with a cross beam (131), a plurality of buffer blocks (1311) are arranged on the cross beam (131), and the buffer blocks (1311) are uniformly arranged on the cross beam (131).

9. The reversible processing magnetic platform of claim 8, wherein, The limiting mechanism (8) further includes a third travel switch (83), and the third travel switch (83) is installed on the cross beam (131).

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